JPS5146001B2 - - Google Patents
Info
- Publication number
- JPS5146001B2 JPS5146001B2 JP46073148A JP7314871A JPS5146001B2 JP S5146001 B2 JPS5146001 B2 JP S5146001B2 JP 46073148 A JP46073148 A JP 46073148A JP 7314871 A JP7314871 A JP 7314871A JP S5146001 B2 JPS5146001 B2 JP S5146001B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Silicon Polymers (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46073148A JPS5146001B2 (US07714131-20100511-C00001.png) | 1971-09-20 | 1971-09-20 | |
| US00289957A US3782940A (en) | 1971-09-20 | 1972-09-18 | Ion-etching method |
| DE2246020A DE2246020C3 (de) | 1971-09-20 | 1972-09-20 | Verfahren zur Herstellung von Reliefoberflächen und Verwendung des Verfahrens zur Herstellung von Druckformen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46073148A JPS5146001B2 (US07714131-20100511-C00001.png) | 1971-09-20 | 1971-09-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4838249A JPS4838249A (US07714131-20100511-C00001.png) | 1973-06-05 |
| JPS5146001B2 true JPS5146001B2 (US07714131-20100511-C00001.png) | 1976-12-07 |
Family
ID=13509808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46073148A Expired JPS5146001B2 (US07714131-20100511-C00001.png) | 1971-09-20 | 1971-09-20 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3782940A (US07714131-20100511-C00001.png) |
| JP (1) | JPS5146001B2 (US07714131-20100511-C00001.png) |
| DE (1) | DE2246020C3 (US07714131-20100511-C00001.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0654492A (ja) * | 1992-06-29 | 1994-02-25 | Besutetsuku:Kk | 巻線機 |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4968803A (US07714131-20100511-C00001.png) * | 1972-11-02 | 1974-07-03 | ||
| IT999819B (it) * | 1972-11-29 | 1976-03-10 | Philips Nv | Procedimento per la fabbricazione di strutture incise mediante inci sione ionica |
| US3890149A (en) * | 1973-05-02 | 1975-06-17 | American Can Co | Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers |
| JPS525884B2 (US07714131-20100511-C00001.png) * | 1973-05-09 | 1977-02-17 | ||
| JPS5086102U (US07714131-20100511-C00001.png) * | 1973-12-07 | 1975-07-22 | ||
| JPS53292B2 (US07714131-20100511-C00001.png) * | 1974-02-01 | 1978-01-07 | ||
| US3905816A (en) * | 1974-06-27 | 1975-09-16 | Hercules Inc | Preparing lithographic plates utilizing hydrolyzable azoand azido-silane compounds |
| US3907564A (en) * | 1974-06-27 | 1975-09-23 | Hercules Inc | Preparing lithographic plates utilizing hydrolyzable mercapto-silane compounds |
| US3924520A (en) * | 1974-06-27 | 1975-12-09 | Hercules Inc | Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups |
| JPS5230851B2 (US07714131-20100511-C00001.png) * | 1974-10-11 | 1977-08-11 | ||
| JPS5738897B2 (US07714131-20100511-C00001.png) * | 1974-11-19 | 1982-08-18 | ||
| US4207105A (en) * | 1975-01-27 | 1980-06-10 | Fuji Photo Film Co., Ltd. | Plasma-etching image in exposed AgX emulsion |
| JPS51105821A (en) * | 1975-03-14 | 1976-09-20 | Fuji Photo Film Co Ltd | Masukugazono keiseihoho |
| JPS51120804A (en) * | 1975-04-14 | 1976-10-22 | Dainippon Printing Co Ltd | Plate for lithographic printing |
| US4045318A (en) * | 1976-07-30 | 1977-08-30 | Rca Corporation | Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer |
| JPS5497101U (US07714131-20100511-C00001.png) * | 1977-12-21 | 1979-07-09 | ||
| GB2057476B (en) * | 1979-08-29 | 1983-06-22 | Shinetsu Chemical Co | Photocurable organopolysiloxane compositions |
| DE3106186A1 (de) * | 1981-02-19 | 1982-09-09 | Wacker-Chemie GmbH, 8000 München | Verfahren zur herstellung von organopolysiloxanen und verwendung dieser organop |
| US4500628A (en) * | 1981-04-22 | 1985-02-19 | At&T Bell Laboratories | Process of making solid state devices using silicon containing organometallic plasma developed resists |
| US4396704A (en) * | 1981-04-22 | 1983-08-02 | Bell Telephone Laboratories, Incorporated | Solid state devices produced by organometallic plasma developed resists |
| JPS6020919B2 (ja) * | 1981-09-18 | 1985-05-24 | 住友電気工業株式会社 | 印刷配線板の製造方法 |
| US4528081A (en) * | 1983-10-03 | 1985-07-09 | Loctite Corporation | Dual curing silicone, method of preparing same and dielectric soft-gel compositions thereof |
| DE3541327A1 (de) * | 1985-11-22 | 1987-05-27 | Schwerionenforsch Gmbh | Streuplatte zum auffangen eines reellen bildes in optischen systemen |
| FR2597110A1 (fr) * | 1986-04-14 | 1987-10-16 | Rhone Poulenc Multi Tech | Composition organopolysiloxane, potentiellement reticulable et utilisable notamment en microlithographie, et son procede d'application |
| US5063254A (en) * | 1988-04-04 | 1991-11-05 | Loctite Corporation | MTQ/polysiloxane hybrid resins, method of making the same, and coating/potting compositions containing the same |
| US5162472A (en) * | 1990-10-09 | 1992-11-10 | Siltech Inc. | Free radical silicone polymers |
| JP4909042B2 (ja) * | 2006-12-14 | 2012-04-04 | 本田技研工業株式会社 | ダブルクラッチ用クラッチドラム成形装置 |
| US8648125B2 (en) * | 2009-12-04 | 2014-02-11 | Dow Corning Corporation | Stabilization of silsesquioxane resins |
| WO2016115640A1 (en) * | 2015-01-23 | 2016-07-28 | Li Minggan | Methods and apparatus for creation of wrinkles in three-dimensional surfaces, and compositions of matter resulting from same |
| RU2696454C1 (ru) | 2015-07-06 | 2019-08-01 | Блюстар Силикон Франс Сас | Самоклеящееся многослойное изделие и способ его производства |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2922806A (en) * | 1957-02-01 | 1960-01-26 | Dow Corning | Preparation of acryloxyalkyl substituted siloxanes |
-
1971
- 1971-09-20 JP JP46073148A patent/JPS5146001B2/ja not_active Expired
-
1972
- 1972-09-18 US US00289957A patent/US3782940A/en not_active Expired - Lifetime
- 1972-09-20 DE DE2246020A patent/DE2246020C3/de not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0654492A (ja) * | 1992-06-29 | 1994-02-25 | Besutetsuku:Kk | 巻線機 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2246020A1 (de) | 1973-03-29 |
| DE2246020C3 (de) | 1982-01-14 |
| JPS4838249A (US07714131-20100511-C00001.png) | 1973-06-05 |
| DE2246020B2 (de) | 1981-04-23 |
| US3782940A (en) | 1974-01-01 |
