JPS51111072A - Photo etching method - Google Patents

Photo etching method

Info

Publication number
JPS51111072A
JPS51111072A JP3556675A JP3556675A JPS51111072A JP S51111072 A JPS51111072 A JP S51111072A JP 3556675 A JP3556675 A JP 3556675A JP 3556675 A JP3556675 A JP 3556675A JP S51111072 A JPS51111072 A JP S51111072A
Authority
JP
Japan
Prior art keywords
etching method
photo etching
improve
photo
adherence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3556675A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5540175B2 (cs
Inventor
Nobuo Hasegawa
Hiroshi Yanagisawa
Kikuo Doda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3556675A priority Critical patent/JPS51111072A/ja
Publication of JPS51111072A publication Critical patent/JPS51111072A/ja
Publication of JPS5540175B2 publication Critical patent/JPS5540175B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3556675A 1975-03-26 1975-03-26 Photo etching method Granted JPS51111072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3556675A JPS51111072A (en) 1975-03-26 1975-03-26 Photo etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3556675A JPS51111072A (en) 1975-03-26 1975-03-26 Photo etching method

Publications (2)

Publication Number Publication Date
JPS51111072A true JPS51111072A (en) 1976-10-01
JPS5540175B2 JPS5540175B2 (cs) 1980-10-16

Family

ID=12445290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3556675A Granted JPS51111072A (en) 1975-03-26 1975-03-26 Photo etching method

Country Status (1)

Country Link
JP (1) JPS51111072A (cs)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223401A (en) * 1975-08-15 1977-02-22 Hitachi Ltd Method of etching photography
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JPS5918634A (ja) * 1982-07-21 1984-01-31 Nec Kyushu Ltd 半導体装置の製造装置
JPS5919323A (ja) * 1982-07-23 1984-01-31 Matsushita Electric Ind Co Ltd エツチング方法
JPS6248018A (ja) * 1985-08-28 1987-03-02 Sony Corp レジスト膜の硬化処理方法
JPS6293935A (ja) * 1985-10-21 1987-04-30 Hitachi Ltd フオトレジストパタ−ンの形成方法
JPS62111426A (ja) * 1985-10-28 1987-05-22 Ushio Inc フオトレジストの処理方法
JPS62111425A (ja) * 1985-10-28 1987-05-22 Ushio Inc レジスト処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JPS62183521A (ja) * 1986-02-07 1987-08-11 Nec Kyushu Ltd 半導体装置の製造装置
JPS62241332A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS62241333A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS63115337A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp フオトレジストの処理方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TEHNICAL DISCLOSURE BULLETIN#V15#M1=1972US *

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223401A (en) * 1975-08-15 1977-02-22 Hitachi Ltd Method of etching photography
JPS56111221A (en) * 1980-01-25 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation on mask for etching
JPS5918634A (ja) * 1982-07-21 1984-01-31 Nec Kyushu Ltd 半導体装置の製造装置
JPS5919323A (ja) * 1982-07-23 1984-01-31 Matsushita Electric Ind Co Ltd エツチング方法
JPS6248018A (ja) * 1985-08-28 1987-03-02 Sony Corp レジスト膜の硬化処理方法
JPS6293935A (ja) * 1985-10-21 1987-04-30 Hitachi Ltd フオトレジストパタ−ンの形成方法
JPS62111426A (ja) * 1985-10-28 1987-05-22 Ushio Inc フオトレジストの処理方法
JPS62111425A (ja) * 1985-10-28 1987-05-22 Ushio Inc レジスト処理方法
JPS62113141A (ja) * 1985-11-13 1987-05-25 Fuji Electric Co Ltd フオトリソグラフイ法
JPS62183521A (ja) * 1986-02-07 1987-08-11 Nec Kyushu Ltd 半導体装置の製造装置
JPS62241332A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS62241333A (ja) * 1986-04-11 1987-10-22 Rohm Co Ltd 半導体装置の製造方法
JPS63115337A (ja) * 1986-11-04 1988-05-19 Matsushita Electronics Corp フオトレジストの処理方法
JPS63200531A (ja) * 1987-02-17 1988-08-18 Matsushita Electronics Corp 半導体装置の製造方法
JPH06186755A (ja) * 1993-07-01 1994-07-08 Fujitsu Ltd レジストパターンの形成方法

Also Published As

Publication number Publication date
JPS5540175B2 (cs) 1980-10-16

Similar Documents

Publication Publication Date Title
JPS51111072A (en) Photo etching method
JPS5223208A (en) Method of emphasing sharpness of pictures
JPS5318540A (en) Alpha-chloroacetamides and their use
JPS51111075A (en) Photo etching photo mask
JPS5219882A (en) Digital method of setting position
JPS5227280A (en) Method to form pinholes
JPS522951A (en) Thumb and arm of industrial robbot
JPS5232444A (en) Slidable bearing
JPS51114431A (en) Aqueous coating compositions
JPS5218834A (en) Long-acting perfumery composition
JPS5220644A (en) Structure
JPS5312878A (en) Preparation of cyanopyrazinecarboxyamide and its preparation
JPS51151094A (en) Light conductive element and its manufacturing method
JPS51126190A (en) Optical measurement, calculation circuit
JPS52179A (en) Method of fabricating semiconductor
JPS5371063A (en) Preparation of 4-(1-9x9-2-isoindolinyl)acetophenone
JPS51138874A (en) Manufacturing device of snow proof wire
JPS52118487A (en) Isotentoxin and method of preparing the same
JPS52153906A (en) 1-hexadecyne-6-one and its preparation
JPS537686A (en) 6-oxo-2-piperzinylacetic acid and its preparation
JPS52113907A (en) 1,1,1,3-tetrahalogeno-4-methyl-4-hydroxypentane and its preparation
JPS51151093A (en) Method of making activity of a light conductive film
JPS51141583A (en) Method for producing an electrode for use semiconductor units
JPS5259200A (en) Preparation of formylmethylrhodium(iii)-octaethylporphyrin
JPS5225747A (en) Preparation of 1,4-diformul-4-vinylcyclo hexene and 3-formylfuran