JPS5018585A - - Google Patents

Info

Publication number
JPS5018585A
JPS5018585A JP13892273A JP13892273A JPS5018585A JP S5018585 A JPS5018585 A JP S5018585A JP 13892273 A JP13892273 A JP 13892273A JP 13892273 A JP13892273 A JP 13892273A JP S5018585 A JPS5018585 A JP S5018585A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13892273A
Other languages
Japanese (ja)
Other versions
JPS543727B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5018585A publication Critical patent/JPS5018585A/ja
Publication of JPS543727B2 publication Critical patent/JPS543727B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
JP13892273A 1972-12-14 1973-12-14 Expired JPS543727B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31520772A 1972-12-14 1972-12-14

Publications (2)

Publication Number Publication Date
JPS5018585A true JPS5018585A (en) 1975-02-27
JPS543727B2 JPS543727B2 (en) 1979-02-26

Family

ID=23223361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13892273A Expired JPS543727B2 (en) 1972-12-14 1973-12-14

Country Status (9)

Country Link
JP (1) JPS543727B2 (en)
BR (1) BR7309820D0 (en)
CH (1) CH587500A5 (en)
DE (1) DE2361931A1 (en)
FR (1) FR2327569A1 (en)
GB (1) GB1463818A (en)
IT (1) IT1000315B (en)
NL (1) NL7317180A (en)
SE (1) SE404094B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same
JPS5938747A (en) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk Photosensitive lithographic plate
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU75749A1 (en) * 1976-09-08 1978-04-27
DE2948554A1 (en) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE
US4316949A (en) * 1979-12-14 1982-02-23 Minnesota Mining And Manufacturing Company Photoreactive oligomer composition and printing plate
JPS584421U (en) * 1981-07-02 1983-01-12 東海興業株式会社 Weatherstrip with curtain rail
DE3824146A1 (en) * 1988-07-16 1990-02-22 Hoechst Ag LIGHT-CURABLE ELASTOMERIC MIXTURE AND RECEIVED RECORD MATERIAL FOR THE PRODUCTION OF FLEXO PRINTING PLATES
WO1993006528A1 (en) * 1991-09-13 1993-04-01 Sun Chemical Corporation Positive-working coating compositions
GB2263906B (en) * 1992-01-21 1995-11-08 Du Pont Improvements in or relating to polyunsaturated diazonium compounds
US5466789A (en) * 1992-01-21 1995-11-14 Du Pont (Uk) Limited Polyunsaturated diazonium compounds
US5534623A (en) * 1993-01-21 1996-07-09 Du Pont (Uk) Limited Process for preparing a polyunsaturated diazonium compounds
EP1788431B1 (en) * 2005-11-18 2009-01-28 Agfa Graphics N.V. Method of making a lithographic printing plate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2102382B2 (en) * 1970-01-19 1973-02-01 Dainippon Ink and Chemicals, Ine , Tokio PHOTOPOLYMERIZABLE, POLYURETHANE MOLDING COMPOUNDS INCLUDING COATING COMPOUNDS AND ADHESIVES

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120028A (en) * 1979-02-27 1980-09-16 Minnesota Mining & Mfg Photooreactive composition and image forming system including same
JPS5938747A (en) * 1982-08-27 1984-03-02 Okamoto Kagaku Kogyo Kk Photosensitive lithographic plate
JPH047501B2 (en) * 1982-08-27 1992-02-12 Okamoto Kagaku Kogyo Kk
JPS6471114A (en) * 1987-05-02 1989-03-16 Hope Seiki Assembly and manufacturing device for tip type electrolytic capacitor

Also Published As

Publication number Publication date
AU6328473A (en) 1975-06-12
BR7309820D0 (en) 1974-09-24
NL7317180A (en) 1974-06-18
SE404094B (en) 1978-09-18
DE2361931A1 (en) 1974-06-20
JPS543727B2 (en) 1979-02-26
GB1463818A (en) 1977-02-09
FR2327569A1 (en) 1977-05-06
FR2327569B1 (en) 1978-03-24
CH587500A5 (en) 1977-05-13
IT1000315B (en) 1976-03-30

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