JPS4936961B1 - - Google Patents

Info

Publication number
JPS4936961B1
JPS4936961B1 JP45105391A JP10539170A JPS4936961B1 JP S4936961 B1 JPS4936961 B1 JP S4936961B1 JP 45105391 A JP45105391 A JP 45105391A JP 10539170 A JP10539170 A JP 10539170A JP S4936961 B1 JPS4936961 B1 JP S4936961B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45105391A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4936961B1 publication Critical patent/JPS4936961B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins
JP45105391A 1969-11-28 1970-11-28 Pending JPS4936961B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US88091869A 1969-11-28 1969-11-28

Publications (1)

Publication Number Publication Date
JPS4936961B1 true JPS4936961B1 (ja) 1974-10-04

Family

ID=25377392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45105391A Pending JPS4936961B1 (ja) 1969-11-28 1970-11-28

Country Status (2)

Country Link
US (1) US3660097A (ja)
JP (1) JPS4936961B1 (ja)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3751257A (en) * 1971-04-16 1973-08-07 Minnesota Mining & Mfg Polyamide-diazo resin composition
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
JPS4833905A (ja) * 1971-09-02 1973-05-15
DE2236941C3 (de) * 1972-07-27 1982-03-25 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
US3891438A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
JPS4968803A (ja) * 1972-11-02 1974-07-03
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
JPS5421089B2 (ja) * 1973-05-29 1979-07-27
JPS527364B2 (ja) * 1973-07-23 1977-03-02
US3951769A (en) * 1974-03-01 1976-04-20 American Can Company Epoxide photopolymerizable compositions containing cyclic amides as gelation inhibitor and methods of polymerizing
US4259430A (en) * 1974-05-01 1981-03-31 International Business Machines Corporation Photoresist O-quinone diazide containing composition and resist mask formation process
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
US4272605A (en) * 1975-06-09 1981-06-09 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
US4198470A (en) * 1975-06-09 1980-04-15 Western Litho Plate & Supply Co. Base plate and lithographic plate prepared by sensitization thereof
LU75749A1 (ja) * 1976-09-08 1978-04-27
US4125650A (en) * 1977-08-08 1978-11-14 International Business Machines Corporation Resist image hardening process
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
US4247616A (en) * 1979-07-27 1981-01-27 Minnesota Mining And Manufacturing Company Positive-acting photoresist composition
US4391897A (en) * 1979-10-12 1983-07-05 Howard A. Fromson Diazo lithographic printing plate developing process
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
DE3036077A1 (de) * 1980-09-25 1982-05-06 Hoechst Ag, 6000 Frankfurt Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial
US4568628A (en) * 1982-09-21 1986-02-04 Polychrome Corporation Water developable diazo printing plate composition with quaternary nitrogen stabilizer
DE3246037A1 (de) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
US4555468A (en) * 1983-05-04 1985-11-26 Daicel Chemical Industries, Ltd. Photosensitive diazonium material with precoat of graft polymer prepared by grafting cellulose derivation with radical polymerizable monomer
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
US5024922A (en) * 1988-11-07 1991-06-18 Moss Mary G Positive working polyamic acid/imide and diazoquinone photoresist with high temperature pre-bake
JP2584671B2 (ja) * 1989-04-26 1997-02-26 富士写真フイルム株式会社 感光性組成物
JP2584672B2 (ja) * 1989-04-28 1997-02-26 富士写真フイルム株式会社 感光性組成物
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US5242779A (en) * 1989-06-21 1993-09-07 Hoechst Aktiengesellschaft Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units
DE3920228A1 (de) * 1989-06-21 1991-01-10 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial
EP0441638B1 (en) 1990-02-08 1999-10-13 Konica Corporation Light sensitive litho printing plate
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5279917A (en) * 1991-05-09 1994-01-18 Konica Corporation Light-sensitive composition comprising a fluorine copolymer surfactant
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3567402B2 (ja) * 1996-06-12 2004-09-22 コニカミノルタホールディングス株式会社 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版
US6783914B1 (en) * 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826501A (en) * 1956-12-20 1958-03-11 Litho Chemical And Supply Co I Lithographic coating solution and lithographic plates coated therewith
NL280795A (ja) * 1958-11-26
NL270834A (ja) * 1960-10-31
US3208850A (en) * 1962-04-11 1965-09-28 Kalvar Corp Vesicular type photographic materials comprising a polyurethane resin containing light decomposable compounds

Also Published As

Publication number Publication date
US3660097A (en) 1972-05-02

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