JPS4859094A - - Google Patents

Info

Publication number
JPS4859094A
JPS4859094A JP9517971A JP9517971A JPS4859094A JP S4859094 A JPS4859094 A JP S4859094A JP 9517971 A JP9517971 A JP 9517971A JP 9517971 A JP9517971 A JP 9517971A JP S4859094 A JPS4859094 A JP S4859094A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9517971A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9517971A priority Critical patent/JPS4859094A/ja
Publication of JPS4859094A publication Critical patent/JPS4859094A/ja
Pending legal-status Critical Current

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  • Catalysts (AREA)
JP9517971A 1971-11-29 1971-11-29 Pending JPS4859094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9517971A JPS4859094A (en) 1971-11-29 1971-11-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9517971A JPS4859094A (en) 1971-11-29 1971-11-29

Publications (1)

Publication Number Publication Date
JPS4859094A true JPS4859094A (en) 1973-08-18

Family

ID=14130506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9517971A Pending JPS4859094A (en) 1971-11-29 1971-11-29

Country Status (1)

Country Link
JP (1) JPS4859094A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5874362A (en) * 1986-12-19 1999-02-23 Applied Materials, Inc. Bromine and iodine etch process for silicon and silicides

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5874362A (en) * 1986-12-19 1999-02-23 Applied Materials, Inc. Bromine and iodine etch process for silicon and silicides
US6020270A (en) * 1986-12-19 2000-02-01 Applied Materials, Inc. Bomine and iodine etch process for silicon and silicides

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