JPS48100075A - - Google Patents
Info
- Publication number
- JPS48100075A JPS48100075A JP3205372A JP3205372A JPS48100075A JP S48100075 A JPS48100075 A JP S48100075A JP 3205372 A JP3205372 A JP 3205372A JP 3205372 A JP3205372 A JP 3205372A JP S48100075 A JPS48100075 A JP S48100075A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3205372A JPS48100075A (cs) | 1972-03-29 | 1972-03-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3205372A JPS48100075A (cs) | 1972-03-29 | 1972-03-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS48100075A true JPS48100075A (cs) | 1973-12-18 |
Family
ID=12348108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3205372A Pending JPS48100075A (cs) | 1972-03-29 | 1972-03-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS48100075A (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5480673A (en) * | 1977-12-08 | 1979-06-27 | Ibm | Method of and device for producing epitaxial layer |
| JPS59204282A (ja) * | 1983-05-06 | 1984-11-19 | Fuji Xerox Co Ltd | 薄膜形成方法および薄膜形成装置 |
| JPS60137012A (ja) * | 1983-12-26 | 1985-07-20 | Ulvac Corp | イオンビ−ムエピタキシヤル成長装置 |
-
1972
- 1972-03-29 JP JP3205372A patent/JPS48100075A/ja active Pending
Non-Patent Citations (1)
| Title |
|---|
| JOURNAL APPLIED PHYSIC#V42#N7=1971 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5480673A (en) * | 1977-12-08 | 1979-06-27 | Ibm | Method of and device for producing epitaxial layer |
| JPS59204282A (ja) * | 1983-05-06 | 1984-11-19 | Fuji Xerox Co Ltd | 薄膜形成方法および薄膜形成装置 |
| JPS60137012A (ja) * | 1983-12-26 | 1985-07-20 | Ulvac Corp | イオンビ−ムエピタキシヤル成長装置 |