JPH1157579A - Drying furnace and drying device - Google Patents

Drying furnace and drying device

Info

Publication number
JPH1157579A
JPH1157579A JP26259597A JP26259597A JPH1157579A JP H1157579 A JPH1157579 A JP H1157579A JP 26259597 A JP26259597 A JP 26259597A JP 26259597 A JP26259597 A JP 26259597A JP H1157579 A JPH1157579 A JP H1157579A
Authority
JP
Japan
Prior art keywords
far
gas
drying
constant
organic substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26259597A
Other languages
Japanese (ja)
Inventor
Masahiko Izumi
正彦 和泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Device Plant Co
Original Assignee
Showa Device Plant Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Device Plant Co filed Critical Showa Device Plant Co
Priority to JP26259597A priority Critical patent/JPH1157579A/en
Publication of JPH1157579A publication Critical patent/JPH1157579A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/227Drying of printed circuits

Landscapes

  • Drying Of Solid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To shorten a drying time of an org. matter by a few tenths by irradiating the org. matter with far infrared ray having a wavelength of a specified range and also supplying a constant pressure and constant temp. gas containing oxygen to the org. matter to cause a chemical reaction on the surface of the org. matter. SOLUTION: A high temp. gas raised by a heat evolution of a radiation surface of a far infrared rays radiation body 22 and the heat evolution accompanied with a vibrational wavelength at about 3-7 micron wavelength zone of the far infrared rays irradiation is sent to a gas forming means 32 from a reaction chamber 28 through a circulating heat suction passage 38. The gas forming means 32 takes a cool air of the atmosphere by an atmosphere sucking fan 42 in only a necessary amount to keep the high temp. gas in the specified pressure and temp. to form the constant pressure and constant temp. gas containing the oxygen. The gas is transmitted by a circulation fan 44 and transferred to a circulation duct 48 through a circulation dust removing filter 46, moreover, the gas is introduced to the reaction chamber 28 from a circulation chamber 30, and an endothermic reaction and an oxidative polymerization reaction are executed on the surface of the org. matter together with the infrared rays irradiation and the org. matter is dried and cured.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は金属印刷やプリント基板
等において金属板等の表面に塗布された樹脂等の有機物
を乾燥するための遠赤外線を利用した乾燥炉及び乾燥炉
を備える乾燥装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drying furnace using far-infrared rays for drying organic substances such as resin applied to the surface of a metal plate or the like in metal printing or a printed circuit board, and a drying apparatus provided with the drying furnace. .

【0002】[0002]

【従来の技術】従来の遠赤外線を利用した乾燥炉は遠赤
外線の熱を使用して有機物を乾燥させていた。すなわ
ち、遠赤外線放射体が発熱体によって加熱されると共に
赤外線が放射する熱によって樹脂は硬化・乾燥される。
2. Description of the Related Art A conventional drying oven using far-infrared rays has dried organic matter using heat of far-infrared rays. That is, the far-infrared radiator is heated by the heating element and the resin is cured and dried by the heat radiated by the infrared rays.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、この乾
燥炉は熱のみの作用のために樹脂が乾燥されるために時
間がかかり、しかも乾燥時に樹脂から有害な物質が出さ
れ環境にとって好ましいことではなかった。
However, this drying oven is time-consuming because the resin is dried only by the action of heat, and harmful substances are emitted from the resin during drying, which is not preferable for the environment. Was.

【0004】本発明はこのような事情に鑑みてなされた
もので、その目的は乾燥時間を従来の装置に比べて数十
分の一に短縮することができると共に有害な物質を発生
することがない乾燥炉及び長時間乾燥を行っても常に良
好な乾燥膜質が得られる乾燥装置を提供することにあ
る。
[0004] The present invention has been made in view of such circumstances, and its object is to reduce the drying time to several tenths in comparison with the conventional apparatus and to generate harmful substances. It is an object of the present invention to provide a drying apparatus which can always obtain good dry film quality even if drying is performed without drying oven for a long time.

【0005】[0005]

【課題を解決するための手段】上記の課題を解決するた
めに、本発明では基部上に設けられた有機物に波長帯域
約3〜約7ミクロンの遠赤外線を当てると共に、前記有
機物に酸素含有定圧定温気体を供給して前記有機物の表
面で化学反応を行って有機物を乾燥することを特徴とす
る。
In order to solve the above-mentioned problems, in the present invention, far-infrared rays having a wavelength band of about 3 to about 7 microns are applied to an organic substance provided on a base, and an oxygen-containing constant pressure is applied to the organic substance. The method is characterized in that a constant-temperature gas is supplied to cause a chemical reaction on the surface of the organic substance to dry the organic substance.

【0006】本発明では基部上に設けられた有機物に波
長帯域約3〜約7ミクロンの遠赤外線及び電磁波を当
て、かつ前記有機物に酸素含有定圧定温気体を供給して
前記有機物の表面で化学反応を行って有機物を乾燥する
ことを特徴とする。
According to the present invention, far-infrared rays and electromagnetic waves having a wavelength band of about 3 to about 7 microns are applied to the organic substance provided on the base, and oxygen-containing constant-pressure constant-temperature gas is supplied to the organic substance to perform a chemical reaction on the surface of the organic substance. And drying the organic matter.

【0007】本発明では基部上に設けられた有機物に遠
赤外線を放射するための遠赤外線放射体と、前記遠赤外
線から波長帯域約3〜約7ミクロンの遠赤外線を当てる
と共に、炉外部から酸素を含む気体と前記放射体により
加熱された加熱気体とを混合して有機物の表面で化学反
応を行うための反応室とを備えることを特徴とする。
In the present invention, a far-infrared radiator for radiating far-infrared rays to an organic substance provided on a base, and a far-infrared ray having a wavelength band of about 3 to about 7 microns from the far-infrared rays are irradiated. And a reaction chamber for performing a chemical reaction on the surface of the organic material by mixing a gas containing the compound and a heated gas heated by the radiator.

【0008】前記遠赤外線放射体の発熱等により加熱さ
れた気体を収容するための収容室をさらに備え、かつ前
記収容室及び/又は反応室は加熱気体を加速冷却するた
めの加速冷却手段とを備えることを特徴とする。
[0008] A storage chamber for storing a gas heated by the heat of the far-infrared radiator or the like is further provided, and the storage chamber and / or the reaction chamber include an accelerating cooling means for accelerating and cooling the heated gas. It is characterized by having.

【0009】本発明では基部上に設けられた有機物に遠
赤外線を放射するための遠赤外線放射体と、酸素含有定
圧定温気体を形成するための気体形成手段と、前記遠赤
外線放射体から波長帯域約3〜約7ミクロンの遠赤外線
を当てると共に、前記酸素含有定圧定温気体を供給して
有機物の表面で化学反応を行うための反応室とを備える
ことを特徴とする。
According to the present invention, a far-infrared radiator for emitting far-infrared rays to an organic substance provided on a base, gas forming means for forming oxygen-containing constant-pressure constant-temperature gas, and a wavelength band from the far-infrared radiator are provided. And a reaction chamber for applying a far-infrared ray of about 3 to about 7 microns and supplying the oxygen-containing constant-pressure constant-temperature gas to perform a chemical reaction on the surface of the organic substance.

【0010】前記化学反応は吸熱反応と酸化重合反応で
あることを特徴とする。
[0010] The chemical reaction is an endothermic reaction and an oxidative polymerization reaction.

【0011】前記気体形成手段で形成された酸素含有定
圧定温気体の一部は前記反応室に導入され、そしてその
他の部分は大気に排出されることを特徴とする。
A part of the oxygen-containing constant-pressure constant-temperature gas formed by the gas forming means is introduced into the reaction chamber, and the other part is discharged to the atmosphere.

【0012】前記気体形成手段は前記遠赤外線放射体の
発熱等による高温気体に大気から導入される冷空気とを
混合して酸素含有定圧定温気体を形成することを特徴と
する。
The gas forming means mixes a high-temperature gas generated by the heat of the far-infrared radiator with cold air introduced from the atmosphere to form an oxygen-containing constant-pressure constant-temperature gas.

【0013】前記酸素含有定圧定温気体を循環するため
の循環室を前記乾燥炉内に備えることを特徴とする。
[0013] A circulating chamber for circulating the oxygen-containing constant-pressure constant-temperature gas is provided in the drying furnace.

【0014】前記酸素含有定圧定温気体を前記有機物に
供給する際に、その供給量を制御するための供給量調節
手段を備えることを特徴とする。
When the oxygen-containing constant-pressure constant-temperature gas is supplied to the organic substance, a supply amount adjusting means for controlling the supply amount is provided.

【0015】前記供給炉調節手段は前記遠赤外線放射体
を取り付けた取付板に形成された開口であり、該開口の
面積は前記取付板の面積の約1/6〜1/12であるこ
とを特徴とする。
The supply furnace adjusting means is an opening formed in a mounting plate on which the far-infrared radiator is mounted, and the area of the opening is about 1/6 to 1/12 of the area of the mounting plate. Features.

【0016】前記遠赤外線放射体は遠赤外線放射層を備
える所定の曲率半径の凸面形状の金属板と、前記金属板
を加熱するための発熱体と、前記金属板と前記発熱体と
を絶縁する絶縁部材と、前記発熱体の下方に設けられて
前記金属板の凸面形状を形状及び/又は維持するための
手段とを備えることを特徴とする。
The far-infrared radiator has a far-infrared radiating layer and a convex-shaped metal plate having a predetermined radius of curvature, a heating element for heating the metal plate, and insulating the metal plate and the heating element. It is characterized by comprising an insulating member and means provided below the heating element to shape and / or maintain the convex shape of the metal plate.

【0017】本発明ではそれぞれに遠赤外線放射体の組
立体を配設してなり、有機物中の溶剤を除去するための
乾燥前処理炉と主乾燥炉とを備え、前記乾燥前処理炉と
前記主乾燥炉に配設された前記遠赤外線放射体は電流値
において異なることを特徴とする。
In the present invention, an assembly of far-infrared radiators is provided for each, and a drying pretreatment furnace and a main drying furnace for removing a solvent in an organic substance are provided. The far-infrared radiator provided in the main drying furnace is different in current value.

【0018】前記乾燥前処理炉及び前記主乾燥炉の遠赤
外線放射体の組立体は複数の区分に分割されており、前
記遠赤外線放射体は各区分ごとに上下に移動可能に設け
られていることを特徴とする。
The assembly of the far-infrared radiator of the drying pretreatment furnace and the main drying oven is divided into a plurality of sections, and the far-infrared radiator is provided so as to be vertically movable in each section. It is characterized by the following.

【0019】前記主乾燥炉は請求項3又は5に記載の乾
燥炉を備えることを特徴とする。
The main drying furnace is provided with the drying furnace according to the third or fifth aspect.

【0020】[0020]

【作用】本発明に従う乾燥炉は樹脂等の有機物を約3〜
約7ミクロンの遠赤外線の放射による熱と遠赤外線放射
体の加熱に伴う熱、さらには遠赤外線放射体から出され
る電磁波が有機物に当てられると共に、有機物に酸素含
有定圧定温気体が供給される。かくして、有機物の表面
では遠赤外線による吸熱反応と酸素含有気体による酸化
重合反応とが起こり有機物が硬化・乾燥される。
The drying furnace according to the present invention can reduce the amount of organic matter such as resin from about 3 to
The heat generated by the radiation of the far-infrared ray of about 7 microns, the heat associated with the heating of the far-infrared radiator, and the electromagnetic waves emitted from the far-infrared radiator are applied to the organic matter, and the oxygen-containing constant-pressure constant temperature gas is supplied to the organic matter. Thus, on the surface of the organic substance, an endothermic reaction by far infrared rays and an oxidative polymerization reaction by an oxygen-containing gas occur, and the organic substance is cured and dried.

【0021】酸素含有定圧定温気体は遠赤外線放射体の
熱等による加熱気体と大気からの空気を適切に混合して
作られる。この作成された気体を乾燥炉内を循環させる
ことにより乾燥作用を長時間にわたりメンテナンスを必
要とすることなしに行うことが可能となる。
The oxygen-containing constant-pressure constant-temperature gas is produced by appropriately mixing a heating gas generated by the heat of the far-infrared radiator and air from the atmosphere. By circulating the produced gas in the drying furnace, the drying operation can be performed for a long time without requiring any maintenance.

【0022】主乾燥に先立つて乾燥される樹脂の有機物
中の溶剤を除去するために主乾燥中に有害な物質を出す
ことなく、しかも品質の優れた被乾燥膜を作ことができ
る。
Since the solvent in the organic matter of the resin to be dried prior to the main drying is removed, a harmful substance is not emitted during the main drying, and a high quality film to be dried can be produced.

【0023】本乾燥炉は金属印刷、プリント基板、液晶
及び内装材等の表面に塗布された有機物の乾燥に使用す
ることができる。これら用途に使用する場合には、遠赤
外線放射体の電流値を変えることによって適切な乾燥を
行うことができる。
The drying furnace can be used for drying organic substances applied on the surface of metal printing, printed circuit boards, liquid crystals, interior materials and the like. When used in these applications, appropriate drying can be performed by changing the current value of the far-infrared radiator.

【0024】[0024]

【発明の実施の形態】以下に本発明の実施例を図面に基
づき詳述する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0025】図1は乾燥装置の概略図を示す。該図にお
いて、乾燥装置10は乾燥前処理炉12と主乾燥炉14
を備える。さらに乾燥装置は基部に設けられた有機物を
乾燥する前に前記基部を予め加熱するための加熱装置を
乾燥装置の前に配置してもよい。乾燥された有機物は次
に冷却装置16で冷却される。ここで有機物を備えた基
部17は前記乾燥前処理炉12と主乾燥炉14からなる
前記乾燥装置10及び冷却装置16をベルトコンベヤに
乗せられて搬送される。なお、前処理炉12は排ガスを
集めるフード20がその上方に配設されている。
FIG. 1 shows a schematic view of a drying apparatus. In the figure, a drying apparatus 10 includes a pre-drying furnace 12 and a main drying furnace 14.
Is provided. Further, in the drying device, a heating device for preheating the base before drying the organic matter provided on the base may be arranged in front of the drying device. The dried organic matter is then cooled in the cooling device 16. Here, the base 17 provided with the organic matter is conveyed by placing the drying device 10 and the cooling device 16 comprising the drying pretreatment furnace 12 and the main drying furnace 14 on a belt conveyor. The hood 20 for collecting exhaust gas is disposed above the pretreatment furnace 12.

【0026】図2は乾燥装置を構成する乾燥前処理炉及
び主乾燥炉並びに冷却装置の平面図である。ここで遠赤
外線放射体は符号22で示されている。そして該放射体
は図3に示されるように開口24を有する取付板26に
千鳥状に配設されている。この取付板24はコ字形状枠
体内に配置され取付られている。これらの構成からなる
遠赤外線放射体の組立体は前記乾燥前処理炉及び主乾燥
炉においてそれぞれ3つの区分A、B、C、及びD,
E,Fに別れて設けられている。なお、分割の仕方はこ
れに限らず種々そ仕方、例えば2分割と4分割、3分割
と4分割等も可能である。そして、各区分はそれぞれ独
立して電気的に制御可能であり、しかも前記組立体は独
立して上下に移動可能である。この遠赤外線放射体と基
部上の有機物との距離は上述した吸熱反応並びに酸化重
合反応適切に行われるように設定される。
FIG. 2 is a plan view of a drying pretreatment furnace, a main drying furnace, and a cooling device constituting the drying device. Here, the far-infrared radiator is indicated by reference numeral 22. The radiators are arranged in a staggered manner on a mounting plate 26 having an opening 24 as shown in FIG. The mounting plate 24 is disposed and mounted in the U-shaped frame. The assembly of the far-infrared radiator having these configurations is divided into three sections A, B, C, and D, respectively, in the drying pretreatment oven and the main drying oven.
E and F are provided separately. The method of division is not limited to this, and various methods such as two divisions, four divisions, three divisions and four divisions are also possible. Each section is independently electrically controllable, and the assembly is independently movable up and down. The distance between the far-infrared radiator and the organic substance on the base is set so that the above-mentioned endothermic reaction and oxidative polymerization reaction are appropriately performed.

【0027】図4は主乾燥炉14の該略図を示す。該図
において、主乾燥炉14は約3〜約7ミクロンの遠赤外
線を放射するための遠赤外線放射体22と、有機物を備
える基部17及び前記遠赤外線放射体22を収納するた
めの反応炉28と、酸素含有定圧定温気体循環室30
と、定圧定温気体を作成すると共に酸素を含む気体を混
合して酸素含有定圧定温気体形成手段と32と、前記有
機物を備える基部を搬送するベルトコンベア34とを備
える。前記取付板26はフレキシブルダクト34に一体
的に取付けられて上下方向に移動可能である。前記循環
室30とダクト34との間に遮蔽体36が設けられてい
る。
FIG. 4 shows the schematic diagram of the main drying furnace 14. In the figure, a main drying furnace 14 includes a far-infrared radiator 22 for emitting far-infrared rays of about 3 to about 7 microns, a base 17 having organic matter, and a reaction furnace 28 for accommodating the far-infrared radiators 22. And an oxygen-containing constant-pressure constant-temperature gas circulation chamber 30
And an oxygen-containing constant-pressure constant-temperature gas forming means 32 for generating a constant-pressure constant-temperature gas and mixing a gas containing oxygen, and a belt conveyor 34 for transporting a base including the organic substance. The mounting plate 26 is integrally mounted on the flexible duct 34 and is movable in the vertical direction. A shield 36 is provided between the circulation chamber 30 and the duct 34.

【0028】酸素含有定圧定温気体が取付板26の開口
24を通して循環室30から反応室28に導入される。
この開口面積は放射体取付面積の約1/6〜約1/12
である。この面積割合を変えることによって供給される
気体の導入量が変化する。この導入される気体の量によ
って乾燥される有機物の硬度に影響を与える。かくし
て、上述した面積割合が有機物に最適な硬さを与えるの
に好ましい数値である。そして、遠赤外線放射体には例
えば200V、340Wが使用される。
An oxygen-containing constant-pressure constant-temperature gas is introduced from the circulation chamber 30 into the reaction chamber 28 through the opening 24 of the mounting plate 26.
This opening area is about 1/6 to about 1/12 of the radiator mounting area.
It is. By changing the area ratio, the introduced amount of supplied gas changes. The amount of the introduced gas affects the hardness of the dried organic matter. Thus, the above-mentioned area ratio is a preferable numerical value for giving the optimum hardness to the organic matter. For the far infrared radiator, for example, 200 V and 340 W are used.

【0029】前記気体形成手段32は有機物に所定の圧
力、所定の温度を提供するための定圧低温気体を形成す
ると共に有機物と酸化重合反応を生じさせるための酸素
含有気体を前記定圧定温気体と混合する作用を行う。
The gas forming means 32 forms a constant-pressure low-temperature gas for providing a predetermined pressure and a predetermined temperature to the organic substance, and mixes the oxygen-containing gas for causing an oxidative polymerization reaction with the organic substance with the constant-pressure constant-temperature gas. Perform the action of

【0030】すなわち、乾燥作用ににおいて遠赤外線放
射体の放射面の発熱及び遠赤外線放射の波長帯域の振動
波長に伴う発熱により上昇された高温気体が反応室28
から循環熱吸込通路38を通して気体形成手段32に運
ばれる。送られてきた気体の圧力、温度が所定の圧力、
温度より高いことがセンサーで検知されると、気体形成
手段32には大気の冷たい空気が空気取入口140を通
して大気吸入ファン42によって前記高温気体を所定の
圧力、所定の温度にするに必要な量だけ取り入れられ
る。かくして酸素含有定圧定温気体が形成される。
That is, in the drying operation, the high-temperature gas raised by the heat generated at the radiation surface of the far-infrared radiator and the heat generated by the vibration wavelength in the wavelength band of the far-infrared radiation is supplied to the reaction chamber 28.
From the circulating heat suction passage 38 to the gas forming means 32. The pressure and temperature of the sent gas are the specified pressure,
When the sensor detects that the temperature is higher than the temperature, the gas forming means 32 supplies the air required for bringing the high temperature gas to a predetermined pressure and a predetermined temperature by the air suction fan 42 through the air inlet 140. Only can be adopted. Thus, an oxygen-containing constant-pressure constant-temperature gas is formed.

【0031】このようにして作られた酸素含有定圧定温
気体は気体形成手段32内の循環ファン44によって送
り出されて循環除塵フィルター46を通して循環ダクト
48に運ばれる。そして循環室30から取付体の開口2
4を通して反応室28に導入される。反応室に入った酸
素含有定圧定温気体は遠赤外線の放射とともに有機物表
面で吸熱反応及び酸化重合反応を行って有機物を乾燥・
硬化させる。
The oxygen-containing, constant-pressure, constant-temperature gas thus produced is sent out by the circulation fan 44 in the gas forming means 32 and conveyed to the circulation duct 48 through the circulation dust filter 46. Then, from the circulation chamber 30, the opening 2
4 into the reaction chamber 28. The oxygen-containing constant-pressure constant-temperature gas entering the reaction chamber performs an endothermic reaction and an oxidative polymerization reaction on the surface of the organic material together with the emission of far-infrared rays to dry the organic material.
Let it cure.

【0032】なお、上述において大気から空気が気体形
成手段に導入されると、大気から導入された空気の量と
同量の気体及び大気の空気が昇温された分の気体が排気
口50から大気に排出される。ここで、大気から導入さ
れる空気の量と排出される定圧定温気体の量は取入口4
0及び排気口50に設けられた調節弁51によって調節
される。かくして、乾燥炉内に酸素含有定圧定温気体が
常に循環される。
In the above description, when air is introduced into the gas forming means from the atmosphere, the same amount of gas as the amount of air introduced from the atmosphere and the gas whose temperature is raised from the atmosphere are discharged from the exhaust port 50. Released to the atmosphere. Here, the amount of air introduced from the atmosphere and the amount of constant-pressure and constant-temperature gas discharged are determined by the intake 4
The pressure is adjusted by a control valve 51 provided at 0 and the exhaust port 50. Thus, the oxygen-containing constant-pressure constant-temperature gas is constantly circulated in the drying oven.

【0033】図5は本発明の主乾燥炉の他の実施例の正
面図を示す。該図において、乾燥炉は約3〜約7ミクロ
ンの遠赤外線を放射する遠赤外線放射体22と、遠赤外
線を当てると共に、大気より導入された酸素を含む気体
と遠赤外線放射体の発熱により昇温した気体とを混合し
て吸熱反応、酸化重合反応を生じるための反応室28と
を備え、さらに遠赤外線放射体の発熱により上方に移動
した昇温気体を冷却するための冷却室52を備える。
FIG. 5 is a front view of another embodiment of the main drying furnace of the present invention. In the figure, the drying furnace emits a far-infrared ray radiating a far-infrared ray of about 3 to about 7 microns, emits far-infrared ray, and rises due to oxygen-containing gas introduced from the atmosphere and heat generated by the far-infrared ray radiating element. A reaction chamber 28 for mixing the heated gas to cause an endothermic reaction and an oxidative polymerization reaction is provided, and a cooling chamber 52 for cooling a heated gas that has moved upward due to heat generated by the far-infrared radiator is provided. .

【0034】ここで、乾燥作用中で遠赤外線放射体の発
熱及び放射に伴う発熱によって昇温気体は遠赤外線放射
体の上方に設けられて空間62に留まる。従って、この
高温になった空間を冷やすことが炉の操作上好ましい。
そこでこの実施例では、排気筒54を前記空間52の気
圧より低くして空間内の昇温気体を加速的に排気させて
いる。この排気作用ににおいて空間内の昇温気体が排気
される際にこの空間に大気から空気が取入口56から強
制的に吹き込まれる。かくして大気から冷たい空気が吹
き込まれると該空間内の昇温気体は空冷されて該空間内
の温度は下げられる。よって該空間が冷却の作用を行う
冷却室に相当する。前記排気筒54は全長2メートル、
断面積75平方ミリメートルを有する。単に冷却さえる
場合には前記空間に多数の孔を設けることにしてもよ
い。
Here, the heating gas is provided above the far-infrared radiator and stays in the space 62 due to the heating of the far-infrared radiator and the heat generated by the radiation during the drying operation. Therefore, it is preferable for the operation of the furnace to cool the heated space.
Therefore, in this embodiment, the exhaust pipe 54 is made lower than the pressure of the space 52 to exhaust the heated gas in the space at an accelerated rate. When the temperature-raising gas in the space is exhausted by this exhaust operation, air is forcibly blown from the atmosphere into the space from the intake 56. Thus, when cold air is blown from the atmosphere, the heated gas in the space is air-cooled and the temperature in the space is reduced. Therefore, the space corresponds to a cooling chamber that performs a cooling operation. The exhaust cylinder 54 has a total length of 2 meters,
It has a cross-sectional area of 75 square millimeters. In the case of simply cooling, a large number of holes may be provided in the space.

【0035】一方、前記反応室において遠赤外線放射体
から約3〜約7ミクロンの遠赤外線並びに電磁波が有機
物に向かって供給される共に、大気より供給された酸素
を含有する気体と遠赤外線放射体の発熱により昇温した
気体とが混合されて吸熱反応、酸化重合反応が起こる。
また、この反応室においても、反応室内の昇温気体を排
気筒60を反応室の気圧より低くして室内の昇温気体を
加速的に排気している。この排気作用において、室内の
昇温気体が排気される際に、この室内に大気から空気が
取入口58を通して吹き込まれる。かくして、大気から
冷たい空気が吹き込まれると該室内の昇温気体は冷やさ
れてると共に、酸素含有定圧定温気体が反応室内に形成
される。
On the other hand, far-infrared rays and electromagnetic waves of about 3 to about 7 microns are supplied from the far-infrared radiator toward the organic substance in the reaction chamber, and a gas containing oxygen supplied from the atmosphere and a far-infrared radiator are supplied. The mixture is mixed with the gas whose temperature has been raised by the heat generated by the heat generation, and an endothermic reaction and an oxidative polymerization reaction occur.
Also in this reaction chamber, the exhaust gas 60 in the reaction chamber is set to be lower than the atmospheric pressure of the reaction chamber by exhausting the heated gas in the chamber at an accelerated rate. In this exhaust operation, when the heated gas in the room is exhausted, air is blown into the room from the atmosphere through the intake 58. Thus, when cold air is blown from the atmosphere, the heated gas in the chamber is cooled and an oxygen-containing constant-pressure constant-temperature gas is formed in the reaction chamber.

【0036】乾燥装置を構成している他方の乾燥前処理
炉12は乾燥される有機物に遠赤外線を放射するための
遠赤外線放射体22を備えている。この遠赤外線放射体
22は図6に示されうように取付片61に取付られてい
る。この取付片61は所定の間隔をもって配設されてい
る。なお、乾燥前処理炉12は有機物と酸化重合反応を
生じる必要がないために酸素を積極的に有機物に供給さ
せる必要はない。従って、主乾燥炉と異なり、空気を出
し入れする構成を有していない。該炉は前処理で処理さ
れた有機物中の溶剤を排気するために炉の頭部に多数の
孔が設けられている。該炉の遠赤外線放射体は例えば2
00V、220Wが使用される。
The other drying pretreatment furnace 12 constituting the drying apparatus is provided with a far-infrared radiator 22 for emitting far-infrared rays to the organic matter to be dried. This far-infrared radiator 22 is mounted on a mounting piece 61 as shown in FIG. The mounting pieces 61 are arranged at predetermined intervals. In addition, since the drying pretreatment furnace 12 does not need to cause an oxidative polymerization reaction with an organic substance, it is not necessary to actively supply oxygen to the organic substance. Therefore, unlike the main drying furnace, it does not have a configuration for taking in and out air. The furnace is provided with a large number of holes at the head of the furnace to exhaust the solvent in the organic matter treated in the pretreatment. The far infrared radiator of the furnace is, for example, 2
00V, 220W is used.

【0037】図6はこれらの乾燥炉で使用される遠赤外
線放射体の分解図を示す。該図において、遠赤外線放射
体22は遠赤外線放射層62を備え曲率半径1000R
の凸面形状を有する金属板64と、金属板64を加熱す
るための電極66を備える発熱体68と、金属板64、
74と前記発熱体68とを絶縁する絶縁部材70、71
と、前記発熱体の下方に設けられて前記金属板に凸面形
状を形成し及び/又は維持するための手段72とを備え
る金属板74とを備える。そして上下の金属板はかしめ
て固定される。なお符号76は取付板に固定するための
フランジであり、符号78はリード線である。
FIG. 6 shows an exploded view of the far-infrared radiator used in these drying ovens. In the figure, the far-infrared radiator 22 has a far-infrared radiating layer 62 and a radius of curvature of 1000
A heating plate 68 having an electrode 66 for heating the metal plate 64;
Insulating members 70 and 71 for insulating the heating element 68 from the heating element 68
And a metal plate 74 provided below the heating element and having means 72 for forming and / or maintaining a convex shape on the metal plate. The upper and lower metal plates are fixed by caulking. Reference numeral 76 denotes a flange for fixing to a mounting plate, and reference numeral 78 denotes a lead wire.

【0038】ここで前記遠赤外線放射層を備える金属板
はAl板又はステンレス板が使用される。前者はスカイ
アルニウム(株)製の商品名「スーパレイ」であり、後
者は川崎製鉄(株)製の商品名「サーファス」である。
Here, an Al plate or a stainless plate is used as the metal plate having the far-infrared radiation layer. The former is a product name "Superlay" manufactured by Sky Alnium Co., Ltd., and the latter is a product name "Surface" manufactured by Kawasaki Steel Corporation.

【0039】また、前記遠赤外線放射体の分光放射輝度
及び分光放射率は約3〜約7ミクロンの波長帯域でそれ
ぞれ理論値の90%以上に達している。
The spectral radiance and spectral emissivity of the far-infrared radiator each reach 90% or more of the theoretical value in a wavelength band of about 3 to about 7 microns.

【発明の効果】本発明による乾燥炉及び乾燥装置は乾燥
時間を従来の装置に比べて数十分の一に短縮することが
きると共に有害な物質を発生することなく、しかも長時
間使用しても常に良好な乾燥膜が得られる。
The drying furnace and the drying apparatus according to the present invention can shorten the drying time to several tenths compared with the conventional apparatus, and do not generate harmful substances and can be used for a long time. Also, a good dry film can always be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は本発明の乾燥装置の概略図である。FIG. 1 is a schematic view of a drying apparatus of the present invention.

【図2】図2は図1の乾燥装置の平面図である。FIG. 2 is a plan view of the drying device of FIG. 1;

【図3】図3は遠赤外線放射体を取り付けるための取付
板の平面図である。
FIG. 3 is a plan view of a mounting plate for mounting a far-infrared radiator.

【図4】図4は本発明の一実施例の乾燥炉の正面図であ
る。
FIG. 4 is a front view of a drying furnace according to one embodiment of the present invention.

【図5】図5は本発明の他の実施例の乾燥炉の正面図で
ある。
FIG. 5 is a front view of a drying furnace according to another embodiment of the present invention.

【図6】図6は遠赤外線を取り付けるための取付片の平
面図である。
FIG. 6 is a plan view of a mounting piece for mounting far infrared rays.

【図7】図7は遠赤外線放射体の分解図である。FIG. 7 is an exploded view of a far-infrared radiator.

【符号の説明】[Explanation of symbols]

10 乾燥装置 12 乾燥前処理炉 14 主乾燥炉 16 冷却装置 17 基部 22 遠赤外線放射体 24 開口 26 取付板 28 反応室 30 循環室 32 酸素含有定圧定温気体形成手段 38 熱吸収通路 40 56 58 空気取入口 50 排気口 52 冷却室 54 60 排気筒 DESCRIPTION OF SYMBOLS 10 Drying apparatus 12 Drying pretreatment furnace 14 Main drying furnace 16 Cooling apparatus 17 Base 22 Far infrared radiator 24 Opening 26 Mounting plate 28 Reaction chamber 30 Circulation chamber 32 Oxygen-containing constant pressure constant temperature gas forming means 38 Heat absorption passage 40 56 58 Air intake Inlet 50 Exhaust port 52 Cooling chamber 54 60 Exhaust tube

Claims (15)

【特許請求の範囲】[Claims] 【請求項1】基部上に設けられた有機物に波長帯域約3
〜約7ミクロンの遠赤外線を当てると共に、前記有機物
に酸素含有定圧定温気体を供給して前記有機物の表面で
化学反応を行って有機物を乾燥するための乾燥炉。
An organic material provided on a base has a wavelength band of about 3
A drying furnace for irradiating a far-infrared ray of about 7 microns and supplying an oxygen-containing constant-pressure constant-temperature gas to the organic substance to perform a chemical reaction on the surface of the organic substance to dry the organic substance;
【請求項2】基部上に設けられた有機物に波長帯域約3
〜約7ミクロンの遠赤外線及び電磁波を当て、かつ前記
有機物に酸素含有定圧定温気体を供給して前記有機物の
表面で化学反応を行って有機物を乾燥するための乾燥
炉。
2. An organic substance provided on a base has a wavelength band of about 3
A drying furnace for irradiating far-infrared rays and electromagnetic waves of about 7 microns and supplying oxygen-containing constant-pressure constant-temperature gas to the organic substance to perform a chemical reaction on the surface of the organic substance to dry the organic substance;
【請求項3】基部上に設けられた有機物に遠赤外線を放
射するための遠赤外線放射体と、前記遠赤外線から波長
帯域約3〜約7ミクロンの遠赤外線を当てると共に、炉
外部から酸素を含む気体と前記放射体により加熱された
加熱気体とを混合して有機物の表面で化学反応を行うた
めの反応室とを備える乾燥炉。
3. A far-infrared radiator for radiating far-infrared rays to an organic substance provided on a base, and irradiating far-infrared rays having a wavelength band of about 3 to about 7 microns from the far-infrared rays, and oxygen from the outside of the furnace. A drying furnace, comprising: a reaction chamber for mixing a gas containing gas and a heated gas heated by the radiator to perform a chemical reaction on the surface of an organic substance.
【請求項4】前記遠赤外線放射体の発熱により加熱され
た気体を収容するための収容室をさらに備え、かつ前記
収容室及び/又は前記反応室は加熱気体を加速冷却する
ための加速冷却手段を備えることを特徴とする請求項3
に記載の乾燥炉。
4. An accelerating cooling means for accelerating and cooling the heated gas, further comprising an accommodating chamber for accommodating a gas heated by heat generated by the far-infrared radiator. 4. The method according to claim 3, further comprising:
Drying furnace according to 1.
【請求項5】基部上に設けられた有機物に遠赤外線を放
射するための遠赤外線放射体と、酸素含有定圧定温気体
を形成するための気体形成手段と、前記遠赤外線放射体
から波長帯域約3〜約7ミクロンの遠赤外線を当てると
共に、前記酸素含有定圧定温気体を供給して有機物の表
面で化学反応を行うための反応室とを備える乾燥炉。
5. A far-infrared radiator for radiating far-infrared rays to an organic substance provided on a base, gas forming means for forming an oxygen-containing constant-pressure constant-temperature gas, and a wavelength band from the far-infrared radiator. A drying chamber for irradiating a far-infrared ray of 3 to about 7 microns and supplying the oxygen-containing constant-pressure constant-temperature gas to perform a chemical reaction on the surface of an organic substance;
【請求項6】前記化学反応は吸熱反応と酸化重合反応で
あることを特徴とする請求項1、2、3又は5に記載の
乾燥炉。
6. The drying furnace according to claim 1, wherein the chemical reaction is an endothermic reaction and an oxidative polymerization reaction.
【請求項7】前記気体形成手段で形成された酸素含有定
圧定温気体の一部は前記反応室に導入され、そしてその
他の部分は大気に排出されることを特徴とする請求項5
に記載の乾燥炉。
7. A part of the oxygen-containing constant-pressure constant-temperature gas formed by the gas forming means is introduced into the reaction chamber, and the other part is exhausted to the atmosphere.
Drying furnace according to 1.
【請求項8】前記気体形成手段は前記遠赤外線放射体の
発熱等による高温気体に大気から導入される冷空気とを
混合して酸素含有定圧定温気体を形成することを特徴と
する請求項5に記載の乾燥炉。
8. The oxygen-containing constant-pressure constant-temperature gas by mixing the high-temperature gas due to heat generation of the far-infrared radiator with cold air introduced from the atmosphere. Drying furnace according to 1.
【請求項9】前記酸素含有定圧定温気体を循環するため
の循環室を前記乾燥炉内に備えることを特徴とする請求
項5に記載の乾燥炉。
9. The drying furnace according to claim 5, wherein a circulation chamber for circulating the oxygen-containing constant-pressure constant-temperature gas is provided in the drying furnace.
【請求項10】前記酸素含有定圧定温気体を前記有機物
に供給する際に、その供給量を制御するための供給量調
節手段を備えることを特徴とする請求項5に記載の乾燥
炉。
10. The drying furnace according to claim 5, further comprising a supply amount control means for controlling a supply amount of said oxygen-containing constant-pressure constant-temperature gas to said organic substance.
【請求項11】前記供給炉調節手段は前記遠赤外線放射
体を取り付けた取付板に形成された開口であり、該開口
の面積は前記取付板の面積の約1/6〜1/12である
ことを特徴とする請求項10に記載の乾燥炉。
11. The supply furnace adjusting means is an opening formed in a mounting plate on which the far-infrared radiator is mounted, and the area of the opening is about 1/6 to 1/12 of the area of the mounting plate. The drying oven according to claim 10, wherein:
【請求項12】前記遠赤外線放射体は遠赤外線放射層を
備える所定の曲率半径の凸面形状の金属板と、前記金属
板を加熱するための発熱体と、前記金属板と前記発熱体
とを絶縁する絶縁部材と、前記発熱体の下方に設けられ
て前記金属板の凸面形状を形状及び/又は維持するため
の手段とを備えることを特徴とする請求項1、2、3及
び5に記載の乾燥炉。
12. The far-infrared radiator includes a convex-shaped metal plate having a far-infrared radiating layer and a predetermined radius of curvature, a heating element for heating the metal plate, and the metal plate and the heating element. 6. The device according to claim 1, further comprising: an insulating member that insulates, and a unit that is provided below the heating element to shape and / or maintain a convex shape of the metal plate. 7. Drying oven.
【請求項13】それぞれに遠赤外線放射体の組立体を配
設してなり、有機物中の溶剤を除去するための乾燥前処
理炉と主乾燥炉とを備え、前記乾燥前処理炉と前記主乾
燥炉に配設された前記遠赤外線放射体は電流値において
異なる乾燥装置。
13. A drying pretreatment furnace for removing a solvent in an organic substance and a main drying furnace, each of which is provided with an assembly of far-infrared radiators. A drying apparatus, wherein the far-infrared radiator provided in the drying furnace has a different current value.
【請求項14】前記乾燥前処理炉及び前記主乾燥炉の遠
赤外線放射体の組立体は複数の区分に分割されており、
前記遠赤外線放射体は各区分ごとに上下に移動可能に設
けられていることを特徴とする請求項13に記載の乾燥
装置。
14. The assembly of the far-infrared radiator of the drying pretreatment oven and the main drying oven is divided into a plurality of sections,
The drying apparatus according to claim 13, wherein the far-infrared radiator is provided so as to be vertically movable for each section.
【請求項15】前記主乾燥炉は請求項3又は5に記載の
乾燥炉を備える乾燥装置。
15. A drying apparatus comprising the drying oven according to claim 3 or 5, wherein the main drying oven is provided with a drying oven.
JP26259597A 1997-08-22 1997-08-22 Drying furnace and drying device Pending JPH1157579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26259597A JPH1157579A (en) 1997-08-22 1997-08-22 Drying furnace and drying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26259597A JPH1157579A (en) 1997-08-22 1997-08-22 Drying furnace and drying device

Publications (1)

Publication Number Publication Date
JPH1157579A true JPH1157579A (en) 1999-03-02

Family

ID=17377991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26259597A Pending JPH1157579A (en) 1997-08-22 1997-08-22 Drying furnace and drying device

Country Status (1)

Country Link
JP (1) JPH1157579A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102586740A (en) * 2012-02-27 2012-07-18 浙江理工大学 Preparation method of double-layer film superconducting rectifying device
CN102997637A (en) * 2012-11-19 2013-03-27 王兆进 Infrared dryer with dual circulating air duct
JP2015037128A (en) * 2013-08-14 2015-02-23 株式会社Screenホールディングス Substrate drying apparatus and substrate drying method
CN111988923A (en) * 2020-09-01 2020-11-24 陈圆圆 Electroplating device for processing integrated circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102586740A (en) * 2012-02-27 2012-07-18 浙江理工大学 Preparation method of double-layer film superconducting rectifying device
CN102997637A (en) * 2012-11-19 2013-03-27 王兆进 Infrared dryer with dual circulating air duct
JP2015037128A (en) * 2013-08-14 2015-02-23 株式会社Screenホールディングス Substrate drying apparatus and substrate drying method
CN111988923A (en) * 2020-09-01 2020-11-24 陈圆圆 Electroplating device for processing integrated circuit board

Similar Documents

Publication Publication Date Title
JP3735769B2 (en) Drying device, drying device assembly and drying method
US5058196A (en) Electric infrared heater having a gas permeable electroformed porous metallic panel coated with a porous ceramic far-infrared radiating layer
KR100886023B1 (en) Heat processing apparatus
JPS61502849A (en) Conveyor microwave heating system
US5340089A (en) Coolant controlled IR heat treat apparatus
JP2010511980A (en) Microwave heating device
JP2014022042A (en) Heater unit and heat treating apparatus
JPH1157579A (en) Drying furnace and drying device
US4967487A (en) Oven for the curing and cooling of painted objects and method
US20160181133A1 (en) Substrate processing apparatus and substrate processing method
JPH0552352A (en) Microwave oven
JPH1157580A (en) Dryer unit
JP6113927B2 (en) Heat treatment method and apparatus for friction lining
JP2001336878A (en) Dryer and drying method
JP2023523728A (en) Method for drying irradiated material and infrared irradiation device for carrying out the method
KR100620444B1 (en) Heat Conditioning Process
JP2734275B2 (en) Heating equipment using high frequency
JPH11257849A (en) Drying/heating apparatus
RU15070U1 (en) MICROWAVE
JP2581677Y2 (en) Far infrared heating continuous furnace
KR102551187B1 (en) PCR apparatus for real-time controlling well temperature individually, temperature controlling method for the same PCR apparatus and sample detecting method for the same PCR apparatus
JP2008309862A (en) Heating device
JPH094953A (en) Board cooler
JPH11248361A (en) In-furnace atmosphere circulating type heat treating furnace
KR100418492B1 (en) Heat treatment apparatus of sheet type heated body and heat treatment method of the same

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040402

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20040402

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060621

A131 Notification of reasons for refusal

Effective date: 20060912

Free format text: JAPANESE INTERMEDIATE CODE: A131

A02 Decision of refusal

Effective date: 20070123

Free format text: JAPANESE INTERMEDIATE CODE: A02