JPH11503720A - 空間的に配置されたアレイ中で複数の化学物質を製造する方法 - Google Patents
空間的に配置されたアレイ中で複数の化学物質を製造する方法Info
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- C40B50/08—Liquid phase synthesis, i.e. wherein all library building blocks are in liquid phase or in solution during library creation; Particular methods of cleavage from the liquid support
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- C40—COMBINATORIAL TECHNOLOGY
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- C40B30/04—Methods of screening libraries by measuring the ability to specifically bind a target molecule, e.g. antibody-antigen binding, receptor-ligand binding
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
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- G01N33/551—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals the carrier being inorganic
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- Y10S977/774—Exhibiting three-dimensional carrier confinement, e.g. quantum dots
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
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- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
- Y10S977/779—Possessing nanosized particles, powders, flakes, or clusters other than simple atomic impurity doping
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/788—Of specified organic or carbon-based composition
- Y10S977/789—Of specified organic or carbon-based composition in array format
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/788—Of specified organic or carbon-based composition
- Y10S977/789—Of specified organic or carbon-based composition in array format
- Y10S977/79—Of specified organic or carbon-based composition in array format with heterogeneous nanostructures
- Y10S977/791—Molecular array
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Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.下記工程を有する合成分子構造物のアレイを構成する方法: a.複数の分子構造物を形成する工程; b.前記分子構造物のサブアレイの論理配列を有するアレイを配置する工程; c.通常の分子コアと、他と異なる、少なくとも1種の構造化された分岐要素をを 有する各サブアレイを提供する工程;及び d.前記構造的分岐要素における相違により、全ての他のサブアレイに対し、該ア レイ内において各サブアレイを関連付ける工程。 2.前記分子構造物が機能化ビーズ、プレート、膜、積層物又はこれらの組み合 せである請求項1に記載の方法。 3.下記工程を有する、第1化合物を反応部位に結合させる能力を最適化する方 法: a.反応部位の三次元的及び静電気的構造を確認する工程; b.前記反応部位に対し相補的な少なくとも1種の構造的分岐要素に結合するため に骨格を選択する工程; c.異なる化合物のnxmアレイを形成する工程、該工程において、各化合物は前 記骨格と少なくとも1種の構造的分岐要素を有する; d.前記反応部位に対し、nxmアレイにおける各化合物を同時にスクリーニング し、前記反応部位に対し最も反応性を有する化合物を決定する工程。 4.さらに、(e)nxmアレイにおける化合物が前記反応部位に対しどのような 反応性を有するか確認し、これらの化合物を(n,m)によって指定される位置 に割り当てる工程を含む請求項3に記載の方法。 5.さらに、(f)前記反応部位に対し反応性を有する少なくとも1種の化合物を 含むoxpアレイを形成し、かつ前記少なくとも1種の化合物のそれぞれの、少 なくとも1種の同族体、異性体又は類似体を形成する工程を含む、請求項4に記 載の方法。 6.さらに、(g)oxpアレイにおける各化合物を同時にスクリーニングし、そ れぞれの化合物の反応部位に対する反応性を調べる工程を有する請求項5に記載 の方法。 7.(e)から(g)の工程を、少なくとも2度繰り返す請求項6に記載の方法。 8.さらに、下記構造を有する骨格を選択する工程を含む、請求項1に記載の方 法。 9.さらに、下記構造を有する骨格を選択する工程を含む、請求項1に記載の方 法。 10.さらに、下記構造を有する骨格を選択する工程を含む、請求項1に記載の方 法。 11.さらに、下記構造を有する骨格を選択する工程を含む、請求項1に記載の方 法。 12.さらに、限定的でない下記の群から構造的分岐要素を選択する工程を有する 請求項1に記載の方法。 13.結合能力を有する各化合物が、該化合物の構造的及び化学的データが提供さ れる、アレイにおける所定の位置に配置されている、請求項3に記載の方法。。 14.下記の工程を有する、異なる化合物のnxmアレイの空間的な配向を確認す る方法: a)配向されたくぼみのnxmアレイを形成する工程; b)該くぼみに化合物を形成できる反応性成分を加える工程; c)各くぼみに加えられたすべての成分のモル重量を測定し、各くぼみに位置(n ,m)を割り当てる工程; d)反応性成分を化合させ、各くぼみに化合物を形成させ、いずれか2個のくぼみ において、化学組成物のモル重量を測定する工程; e)いずれか2個のくぼみにおける化合物のモル重量と、各くぼみ(n,m)に加 えた化学成分のモル重量を一致させ、前記アレイの空間的配向を測定する工程。 15.前記モル重量を質量分光分析により測定する、請求項14に記載の方法。 16.下記工程を有する、反応部位と結合できる化合物の構造を決定する方法: a)反応部位の三次元的構造及び静電気的構造を確認する工程; b)反応部位に対し相補的になり得る構造的分岐要素に結合するために骨格を選択 する工程; c)異なる化合物のnxmアレイを形成する工程、該工程において、各化合物は前 記骨格と少なくとも1種の構造的分岐要素を有する; d)反応部位に対するnxmアレイにおける各化合物を同時にスクリーニングし、 分子認識部位に対し、最大の反応性を有する化合物を決定する工程。 17.上記骨格が下記構造を有する、請求項16記載の方法。 18.上記骨格が下記構造を有する、請求項16記載の方法。 19.上記骨格が下記構造を有する、請求項16記載の方法。 20.上記骨格が下記構造を有する、請求項16記載の方法。 21.少なくとも1種の構造的分岐要素が下記群から選択されるが、これに制限さ れない、請求項16記載の方法。 22.下記工程からなる、反応部位の少なくとも1部を決定する方法。 a)構造的分岐要素を結合するための骨格バックボーンを選択し; b)各化合物が骨格バックボーン及び少なくとも1種の構造的分岐要素を有する 異なる化合物のnxmアレイを形成し; c)反応部位に対して最も大きい反応性を有する化合物を決定するための反応部 位に対するnxmアレイを同時にスクリーニングし; d)最も大きい反応性を有するアレイ中の化合物(n,m)の構造を決定し; e)nxmアレイ、及びその異性体、同族体及び類似体から最も大きい反応性を 有する反応性化合物を含む第2のkxlアレイを形成し; f)反応部位に対して最も大きい反応性を有する化合物を決定するための反応部 位に対する化合物のkxlアレイを同時にスクリーニングし; g)最も大きい反応性を有するkxlアレイから化合物の構造及び静電気的構造 を決定し; f)oxpアレイ型に対して反応性を有する各化合物(n,m)の少なくとも1種の 同族体、異性体又は類似体を形成する。 23.下記工程からなる、分子認識部位と反応することができる化合物の理論的開 発 a)構造的分岐要素と結合する骨格を選択し; b)各化合物が骨格バックボーン及び少なくとも1種の構造的分岐要素を有する 異なる化合物のnxmアレイを同時に形成し;及び c)分子認識部位に対して最も大きい反応性を有する化合物を決定するための分 子認識部位に対する化合物のnxmアレイを同時にスクリーニングする。 24.下記工程からなる、化合物のnxmアレイを形成する方法。 a)部位が化学変化を受けうるように、一般の分子コア及びXを有する同一の分 子構造物のnxmアレイを形成し(ここで、Xは3以上である); b)少なくとも1種の異なる分子構造物上で反応を引き起こすために、nxmア レイ中において各分子構造物上で操作を同時に及び/又は共に実行し、; c)新 規化合物の生前とした完全にアドレス可能な配列を引き起こすために、十分なサ イクルのために、b)の生産物上でかぶせるか又は直交する操作を行なう。 25.下記工程からなる、反応部位と結合できる化合物の構造を決定する方法。 a)反応部位の三次元構造及び静電気的構造を確認し; b)反応部位に対し相補的になり得る構造的分岐要素に結合するための骨格バッ クボーンを選択し; c)異なる化合物のnxmアレイを形成し、該工程において、各化合物は上記骨 格バックボーンと少なくとも1種の構造的分岐要素を有し; d)反応部位に対するnxmアレイにおける各化合物を同時にスクリーニングし 、分子認識部位に対して最大の反応性を有する化合物を決定する。 26.更に、下記工程を有する請求項25記載の方法。 e)oxpアレイにおいて各化合物を同時にスクリーニングし; f)各ウエルに加えた全ての成分の分子量を決定し、位置を各ウエルに割り当て ; g)各ウエル中で化合物を形成するために結合する反応性成分を許容し、2つの ウエル内の化合物の分子量を決定し; h)化合物を形成し得る反応性成分のウエル内への添加を実行し; i)反応性部位に対するoxpアレイ内での各化合物を同時にスクリーニングす る。 27.下記工程からなる、反応部位の少なくとも1部を決定する方法。 a)構造的分岐要素と結合するための骨格バックボーンを選択し; b)異なる化合物のnxmアレイを形成し、各化合物は上記骨格バックボーンと 少なくとも1種の構造的分岐要素を有し; c)反応部位に対するnxmアレイにおける各化合物を同時にスクリーニングし 、反応部位に対して最大の反応性を有する化合物を決定し; d)アレイにおいて最大の反応性を有する化合物(n,m)の構造を決定し; e)nxmアレイ、及びその異性体、同族体及び類似体から最も反応性のある化 合物を含有する第2のkxlアレイを形成し; f)反応部位に対する化合物のkxlアレイを同時にスクリーニングし、反応部 位に対して最も大きい反応性を有する化合物を決定し; g)最も大きい反応性を有するkxlアレイからの化合物の構造及び静電気的構 造を決定する。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/375,838 US5712171A (en) | 1995-01-20 | 1995-01-20 | Method of generating a plurality of chemical compounds in a spatially arranged array |
US375,838 | 1995-01-20 | ||
PCT/US1996/001005 WO1996022529A1 (en) | 1995-01-20 | 1996-01-19 | A method of generating a plurality of chemical compounds in a spatially arranged array |
Publications (1)
Publication Number | Publication Date |
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JPH11503720A true JPH11503720A (ja) | 1999-03-30 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP8522446A Ceased JPH11503720A (ja) | 1995-01-20 | 1996-01-19 | 空間的に配置されたアレイ中で複数の化学物質を製造する方法 |
Country Status (13)
Country | Link |
---|---|
US (4) | US5712171A (ja) |
EP (1) | EP0804726A4 (ja) |
JP (1) | JPH11503720A (ja) |
KR (1) | KR100414424B1 (ja) |
AU (1) | AU719584C (ja) |
CA (1) | CA2210949A1 (ja) |
CZ (1) | CZ232297A3 (ja) |
HU (1) | HUP9802293A3 (ja) |
IL (1) | IL116838A0 (ja) |
NO (1) | NO973335L (ja) |
NZ (1) | NZ301594A (ja) |
PL (1) | PL327437A1 (ja) |
WO (1) | WO1996022529A1 (ja) |
Cited By (1)
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1995
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-
1996
- 1996-01-19 WO PCT/US1996/001005 patent/WO1996022529A1/en not_active Application Discontinuation
- 1996-01-19 KR KR1019970704928A patent/KR100414424B1/ko not_active IP Right Cessation
- 1996-01-19 IL IL11683896A patent/IL116838A0/xx unknown
- 1996-01-19 NZ NZ301594A patent/NZ301594A/xx unknown
- 1996-01-19 EP EP96902775A patent/EP0804726A4/en not_active Withdrawn
- 1996-01-19 AU AU47059/96A patent/AU719584C/en not_active Ceased
- 1996-01-19 JP JP8522446A patent/JPH11503720A/ja not_active Ceased
- 1996-01-19 CA CA002210949A patent/CA2210949A1/en not_active Abandoned
- 1996-01-19 HU HU9802293A patent/HUP9802293A3/hu unknown
- 1996-01-19 CZ CZ972322A patent/CZ232297A3/cs unknown
- 1996-01-19 PL PL96327437A patent/PL327437A1/xx unknown
- 1996-05-17 US US08/649,371 patent/US5736412A/en not_active Expired - Lifetime
-
1997
- 1997-07-18 NO NO973335A patent/NO973335L/no not_active Application Discontinuation
-
1998
- 1998-01-20 US US09/009,846 patent/US6878557B1/en not_active Expired - Fee Related
- 1998-01-26 US US09/013,709 patent/US5962736A/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007039702A (ja) * | 1996-12-26 | 2007-02-15 | Nippon Shokubai Co Ltd | 樹脂粒子の製造方法 |
JP4704317B2 (ja) * | 1996-12-26 | 2011-06-15 | 株式会社日本触媒 | 樹脂粒子の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
HUP9802293A3 (en) | 1999-03-29 |
KR19980703097A (ko) | 1998-10-15 |
US6878557B1 (en) | 2005-04-12 |
NO973335D0 (no) | 1997-07-18 |
KR100414424B1 (ko) | 2004-07-07 |
US5962736A (en) | 1999-10-05 |
CZ232297A3 (cs) | 1998-06-17 |
IL116838A0 (en) | 1996-07-23 |
EP0804726A1 (en) | 1997-11-05 |
NO973335L (no) | 1997-08-21 |
WO1996022529A1 (en) | 1996-07-25 |
AU4705996A (en) | 1996-08-07 |
CA2210949A1 (en) | 1996-07-25 |
AU719584C (en) | 2001-07-26 |
NZ301594A (en) | 1999-01-28 |
AU719584B2 (en) | 2000-05-11 |
PL327437A1 (en) | 1998-12-07 |
EP0804726A4 (en) | 2004-07-07 |
HUP9802293A2 (hu) | 1999-02-01 |
US5712171A (en) | 1998-01-27 |
US5736412A (en) | 1998-04-07 |
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