JPH1149990A - Coating liquid for forming clear conductive film and method for forming clear conductive film - Google Patents

Coating liquid for forming clear conductive film and method for forming clear conductive film

Info

Publication number
JPH1149990A
JPH1149990A JP9204996A JP20499697A JPH1149990A JP H1149990 A JPH1149990 A JP H1149990A JP 9204996 A JP9204996 A JP 9204996A JP 20499697 A JP20499697 A JP 20499697A JP H1149990 A JPH1149990 A JP H1149990A
Authority
JP
Japan
Prior art keywords
conductive film
salt
tin
indium
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9204996A
Other languages
Japanese (ja)
Inventor
Hiroyuki Tomonaga
浩之 朝長
Takeshi Morimoto
剛 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP9204996A priority Critical patent/JPH1149990A/en
Publication of JPH1149990A publication Critical patent/JPH1149990A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/25Oxides by deposition from the liquid phase
    • C03C17/253Coating containing SnO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • C03C2217/231In2O3/SnO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a coating liquid for forming a clear conductive film having a low resistance and a high transmittance by incorporating at least one glycol selected from among ethylene glycol, propylene glycol, and butanediol, an indium salt, a tin salt, and a monohydric alcohol at least having a specified number of carbon atoms into the same. SOLUTION: Pref., the indium salt is indium nitrate; the tin salt is at least either tin acetate or tin oxalate; and the alcohol is at least one alcohol selected from among methanol, ethanol, and isopropanol. Pref., this coating liquid for forming a clear electrode is applied to a substrate and thermally treated at 350 deg.C or higher to form a clear conductive film. Pref., the wt. ratio of the indium salt to the tin salt is (95/5)-(85/15); that of the glycol to the sum of the indium salt and the tin salt is (10/100)-(300/100); and the content of the alcohol in the coating liquid is 10-80 wt.%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は透明導電膜形成用塗
布液および透明導電膜の形成方法に関する。
The present invention relates to a coating solution for forming a transparent conductive film and a method for forming a transparent conductive film.

【0002】[0002]

【従来の技術】透明導電材料として代表的なアンチモン
ドープ酸化錫(ATO)や、錫ドープ酸化インジウム
(ITO)などは、特に薄膜として表示素子や面上発熱
体などで広汎な応用がされており、これらの多くはCV
D法、スパッタリング法などの乾式成膜法で製造されて
いる。しかしながら、これらの方法は設備コストがかか
り、また生産性にも問題があり、より簡便な方法とし
て、インジウム塩等の溶液を塗布し、熱分解させて被膜
を得る方法が数多く提案されている。
2. Description of the Related Art Antimony-doped tin oxide (ATO) and tin-doped indium oxide (ITO), which are typical examples of transparent conductive materials, have been widely applied to display elements and on-surface heating elements as thin films. , Many of these are CV
It is manufactured by a dry film forming method such as a D method or a sputtering method. However, these methods require equipment costs and also have a problem in productivity. As a simpler method, there have been proposed many methods of applying a solution of an indium salt or the like and thermally decomposing the solution to obtain a film.

【0003】しかし、これまで提案されてきたもので
は、たとえば入手しやすい硝酸インジウムや塩化インジ
ウム等を溶媒に溶解させ、そのまま塗布しても被膜は白
濁しやすく、機械的強度の面でも乏しいものしか得られ
ない。またゾルゲル法として知られる金属アルコキシド
は原料が非常に高価であり、またよい溶媒が少ないため
に塗布液化が困難であるし、オクチル酸インジウム等の
インジウム石鹸は化学的な安定性に乏しいために溶液の
安定性が低くなりやすいといった問題があった。
[0003] However, in those proposed so far, for example, even if easily available indium nitrate or indium chloride is dissolved in a solvent and applied as it is, the coating is liable to be cloudy and has poor mechanical strength. I can't get it. The metal alkoxide known as the sol-gel method is very expensive as a raw material, and it is difficult to liquefy a coating liquid because of a small amount of a good solvent. However, there is a problem that the stability of the resin tends to be low.

【0004】そこでこれらを解決するために提案されて
きたのがインジウム塩に有機配位子を配位させて熱的な
安定性を高め、被膜化した際の白濁化や機械的強度の低
下を防ぐ手法である。有機配位子としては、βジケトン
(セラミックス誌、21 236 (1986) )やアミノアルコー
ル(特開平1−287278)、多価アルコール縮合体
(特開平7−320541)などが提案されている。
[0004] In order to solve these problems, it has been proposed to coordinate an indium salt with an organic ligand to enhance the thermal stability and to reduce the white turbidity and the decrease in mechanical strength when forming a film. It is a technique to prevent. As organic ligands, β-diketones (Ceramics, 21 236 (1986)), amino alcohols (JP-A-1-287278), polyhydric alcohol condensates (JP-A-7-320541) and the like have been proposed.

【0005】しかし、アセチルアセトン等のβジケトン
やアミノアルコールは配位により形成される錯体の安定
性が高すぎるために有機物が膜中に残りやすく被膜の緻
密性向上に対しては不利である。また多価アルコール縮
合体はアセチルアセトン錯体ほど錯体が安定化されはし
ないために、より緻密な被膜形成には有利であったもの
の、多価アルコール縮合体そのものの沸点が高く、やは
り高温まで膜中に残存しやすいという問題点があった。
[0005] However, β-diketones such as acetylacetone and amino alcohols are too disadvantageous for improving the denseness of the film because organic substances tend to remain in the film because the stability of the complex formed by coordination is too high. The polyhydric alcohol condensate is not as stable as the acetylacetone complex, so it was advantageous for forming a denser film. There was a problem that it easily remained.

【0006】[0006]

【発明が解決しようとする課題】本発明は上記の問題点
を解決すべくなされたものであり、低抵抗で高透過率の
透明導電膜を形成することが可能な透明導電膜形成用塗
布液を提供することを目的としている。本発明はまた、
低抵抗で可視光線透過率が高い透明導電膜を形成する方
法を提供することを目的としている。
DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a coating liquid for forming a transparent conductive film capable of forming a transparent conductive film having low resistance and high transmittance. It is intended to provide. The present invention also provides
It is an object of the present invention to provide a method for forming a transparent conductive film having low resistance and high visible light transmittance.

【0007】[0007]

【課題を解決するための手段】本発明は、エチレングリ
コール、プロピレングリコールおよびブタンジオールか
ら選ばれる少なくとも1種のグリコールと、インジウム
塩と、錫塩と、炭素数8以下の1価アルコールとを含む
透明導電膜形成用塗布液を提供するものであり、また、
エチレングリコール、プロピレングリコールおよびブタ
ンジオールから選ばれる少なくとも1種のグリコール
と、インジウム塩と、錫塩と、炭素数8以下の1価アル
コールとを含む透明導電膜形成用塗布液を基体上に塗布
し、350℃以上の温度で熱処理することにより透明導
電膜を形成する透明導電膜の形成方法を提供するもので
ある。
The present invention comprises at least one glycol selected from ethylene glycol, propylene glycol and butanediol, an indium salt, a tin salt, and a monohydric alcohol having 8 or less carbon atoms. It is intended to provide a coating liquid for forming a transparent conductive film,
A transparent conductive film forming coating solution containing at least one glycol selected from ethylene glycol, propylene glycol and butanediol, an indium salt, a tin salt, and a monohydric alcohol having 8 or less carbon atoms is coated on a substrate. And a method for forming a transparent conductive film by performing a heat treatment at a temperature of 350 ° C. or higher.

【0008】本発明において、インジウム塩としては、
入手しやすい硝酸インジウム、硫酸インジウム、塩化イ
ンジウム等の無機塩が使用でき、なかでも後述するグリ
コールとの反応性やアルコールへの溶解性に優れる硝酸
インジウムが好ましい。また、錫塩としては、酢酸塩、
蓚酸塩といった短炭素鎖の有機酸塩や、塩化錫、硫酸錫
等が使用できるが、溶解性や反応性の観点から、酢酸錫
および蓚酸錫から選ばれる少なくとも1種の錫塩が好ま
しい。本発明の塗布液において、インジウム塩と錫塩の
割合は、低抵抗の透明導電膜を得るために、インジウム
と錫の重量比で、In/Sn=95/5〜85/15で
あることが好ましい。
In the present invention, the indium salt includes
Inorganic salts such as indium nitrate, indium sulfate, and indium chloride which can be easily obtained can be used, and among them, indium nitrate which is excellent in reactivity with glycol described later and solubility in alcohol is preferable. As tin salts, acetate,
An organic acid salt having a short carbon chain such as oxalate, tin chloride, tin sulfate, or the like can be used, but from the viewpoint of solubility and reactivity, at least one tin salt selected from tin acetate and tin oxalate is preferable. In the coating solution of the present invention, the ratio of indium salt to tin salt may be In / Sn = 95/5 to 85/15 in terms of weight ratio of indium to tin in order to obtain a low-resistance transparent conductive film. preferable.

【0009】本発明の塗布液におけるグリコールは、本
発明の根幹をなす重要な部分である。グリコールとして
は、比較的炭素鎖の短いエチレングリコール、プロピレ
ングリコール類(異性体2種)、ブタンジオール類(異
性体4種)のうち少なくとも1種を使用することが重要
である。プロピレングリコール類の異性体は1,2−プ
ロピレングリコールと1,3−プロピレングリコールの
2種があるが、錯体の安定性の点から、1,2−プロピ
レングリコールが好ましい。ブタンジオール類の異性体
は、1,2−、1,3−、1,4−、2,3−、の4種
があるが、構造上、錯体形成の点から、1,2−および
2,3−異性体が最も好ましく、1,3−異性体はやや
劣るが十分に使用可能である。
Glycol in the coating solution of the present invention is an important part that forms the basis of the present invention. As the glycol, it is important to use at least one of ethylene glycol, propylene glycols (two isomers), and butanediols (four isomers) having a relatively short carbon chain. There are two types of isomers of propylene glycols, 1,2-propylene glycol and 1,3-propylene glycol, but 1,2-propylene glycol is preferred from the viewpoint of the stability of the complex. There are four isomers of butanediols: 1,2-, 1,3-, 1,4-, 2,3-, but from the viewpoint of complex formation, 1,2- and 2,2- The 1,3-isomer is most preferred, and the 1,3-isomer is somewhat inferior but fully operable.

【0010】本発明の塗布液におけるグリコールは、イ
ンジウム塩および錫塩に配位して錯体を形成し、金属塩
の熱的安定性を高める働きがある。この作用により透明
な連続被膜が形成されるが、これらより炭素数の大きな
グリコールを使用すると、その揮発性の低さにより膜中
に高温まで残りやすく、焼成後の被膜の緻密性を低下さ
せる要因となるためである。このような理由により、こ
れらのなかでも特にエチレングリコールがもっとも好ま
しいグリコールとして使用される。
[0010] The glycol in the coating solution of the present invention functions to form a complex by coordinating with the indium salt and the tin salt, thereby increasing the thermal stability of the metal salt. A transparent continuous film is formed by this action, but when glycols having a larger number of carbon atoms are used, the higher volatility tends to remain in the film at high temperatures due to its low volatility, which causes a reduction in the denseness of the film after firing. This is because For this reason, among these, ethylene glycol is particularly used as the most preferred glycol.

【0011】本発明の塗布液におけるグリコールの配合
割合としては、インジウム塩および錫塩に対し、重量比
率で、(グリコール)/(インジウム塩+錫塩)=10
/100〜300/100の割合が好ましい。これ以上
グリコールが少ないと、錯体としての働きが期待できな
くなるし、これ以上多くなると不要な高沸点成分が増え
ることになり、前述のように被膜の緻密性を阻害する要
因となるおそれがあるからである。
The mixing ratio of glycol in the coating solution of the present invention is (glycol) / (indium salt + tin salt) = 10 with respect to indium salt and tin salt.
A ratio of / 100 to 300/100 is preferred. If the amount of glycol is less than this, the function as a complex cannot be expected, and if it is more than this, unnecessary high-boiling components will increase, which may be a factor that hinders the denseness of the film as described above. It is.

【0012】本発明の塗布液における炭素数8以下の1
価アルコールは、グリコールだけでは非常に粘度が高く
なるため、塗布に適した粘度にまで希釈するための溶媒
としての働きだけでなく、還元剤的な働きを有している
重要な成分である。酸化インジウム系透明導電材料はn
型半導体であり、酸素欠陥の生成により伝導電子を発生
するため、還元側に平衡を移動させたほうがより高い伝
導度を有する材料となりうる。該アルコールの添加によ
り、熱処理中の還元作用が働き、より低い比抵抗の被膜
が得られる。
[0012] In the coating solution of the present invention, 1 having not more than 8 carbon atoms.
The dihydric alcohol has an extremely high viscosity with glycol alone, and is therefore an important component having not only a function as a solvent for diluting to a viscosity suitable for coating but also a function as a reducing agent. Indium oxide based transparent conductive material is n
Since it is a type semiconductor and generates conduction electrons by generation of oxygen vacancies, a material having higher conductivity can be obtained by shifting the equilibrium to the reduction side. By the addition of the alcohol, a reducing action during the heat treatment works, and a film having a lower specific resistance is obtained.

【0013】使用するアルコールとしては、あまりに沸
点が高く、膜中に高温まで残りやすいものでなければ特
に制限されないが、希釈剤としての作用を考慮するとメ
タノール、エタノール、イソプロパノール等が好適な例
として挙げられるが、さらに、ガラスとのぬれ性を向上
させるために、エチレングリコールエーテル類、プロピ
レングリコールエーテル類などの炭素数8以下の1価ア
ルコールも、メタノール、エタノール、イソプロパノー
ル等とともに用いることができる。
The alcohol used is not particularly limited as long as it has an extremely high boiling point and does not easily remain at a high temperature in the film, but methanol, ethanol, isopropanol and the like are preferred examples in consideration of the action as a diluent. However, in order to further improve the wettability with glass, monohydric alcohols having 8 or less carbon atoms, such as ethylene glycol ethers and propylene glycol ethers, can be used together with methanol, ethanol, isopropanol and the like.

【0014】本発明の塗布液におけるアルコールの割合
は、後述する塗布方法によって適正な割合があり、一概
には規定できないが、前塗布液中の10〜80重量%を
占めるようにするのが好ましい。これ以上多くなると一
回に塗工できる膜厚が小さくなりすぎ、これより少ない
とアルコールの効果が得られなくなるおそれがある。
The proportion of the alcohol in the coating solution of the present invention is appropriate depending on the coating method described later, and cannot be specified unconditionally. However, it is preferable that the alcohol accounts for 10 to 80% by weight of the pre-coating solution. . If it is more than this, the film thickness that can be applied at one time becomes too small, and if it is less than this, the effect of alcohol may not be obtained.

【0015】本発明の塗布液には、必要に応じて基板へ
の濡れ性を向上させるための界面活性剤などを添加して
もよいが、添加量には細心の注意が必要である。すなわ
ち、界面活性剤は多くが揮発性の低い中〜高分子量の有
機物であり、添加量が多くなると被膜の緻密度を低下さ
せ、電気特性を劣化させるおそれがある。
The coating liquid of the present invention may contain a surfactant or the like for improving the wettability to the substrate, if necessary. That is, most of the surfactants are medium to high molecular weight organic substances having low volatility, and when added in large amounts, the denseness of the coating film may be reduced and the electrical properties may be deteriorated.

【0016】本発明の塗布液を基体に塗布、乾燥した
後、350℃以上の温度で熱処理を行うことにより透明
導電膜が形成される。透明導電膜の膜厚としては、10
〜500nmが好ましく、特に50〜200nmが好ま
しい。
After the coating solution of the present invention is applied to a substrate and dried, a heat treatment is performed at a temperature of 350 ° C. or higher to form a transparent conductive film. The thickness of the transparent conductive film is 10
The thickness is preferably from 500 to 500 nm, particularly preferably from 50 to 200 nm.

【0017】基体としては350℃以上の耐熱性がある
ものであれば特に制限されるものではないが、一般的に
はガラス、セラミックス等が使用される。また、塗布方
法としては公知の方法が利用でき、ディップコート法、
スピンコート法、スクリーン印刷法、ロールコート法、
などが例として挙げられる。なかでも、スピンコート
法、ディップコート法が好適である。焼成は350℃以
上、基板が変質してしまう温度以下であれば特に制限さ
れない。焼成雰囲気は空気が一般的であるが、前述のよ
うに還元気味にしてより抵抗値を下げる必要があるとき
には、不活性ガスや水素を含む還元性ガス雰囲気中で焼
成することも可能である。
The substrate is not particularly limited as long as it has a heat resistance of 350 ° C. or higher, but generally, glass, ceramics or the like is used. In addition, as a coating method, a known method can be used, and a dip coating method,
Spin coating, screen printing, roll coating,
And the like. Of these, spin coating and dip coating are preferred. The firing is not particularly limited as long as it is 350 ° C. or higher and is lower than the temperature at which the substrate deteriorates. The firing atmosphere is generally air. However, when it is necessary to reduce the resistance value by reducing the atmosphere as described above, the firing may be performed in an atmosphere of a reducing gas containing an inert gas or hydrogen.

【0018】[0018]

【実施例】以下、本発明の詳細を実施例を挙げて説明す
るが、本発明は以下の実施例に限定されるものではな
い。
EXAMPLES Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited to the following examples.

【0019】(例1)硝酸インジウム3水和物10g、
蓚酸第一錫0.58g(In/Sn=91/9(重量
比))をエチレングリコール17gが入った100cc
ナス型フラスコに添加し、75℃で3時間加熱して淡黄
色透明な粘ちょう溶液を得た。この溶液にメタノールを
17g、イソプロパノールを17g添加し、よく撹拌し
て塗布液とした。この塗布液を無アルカリガラス基板に
スピンコート法により成膜し、60℃で10分間乾燥さ
せた後550℃の電気炉で大気中1時間焼成を行った。
結果を表1に示す。表1において、透明性については、
スガ試験機製ヘーズコンピュータにおいて、全透過率
(散乱透過率+非散乱透過率)が85%以上、曇価が
0.5%以下のものを○とした。また、シート抵抗は直
流4端針法で測定した。また、緻密性については、エリ
プソメトリによる屈折率測定で、1.90以上のものを
○、1.90未満のものを×とした。
(Example 1) 10 g of indium nitrate trihydrate,
0.58 g of stannous oxalate (In / Sn = 91/9 (weight ratio)) and 100 cc of 17 g of ethylene glycol
The mixture was added to an eggplant-shaped flask and heated at 75 ° C. for 3 hours to obtain a pale yellow transparent viscous solution. 17 g of methanol and 17 g of isopropanol were added to this solution, and the mixture was stirred well to obtain a coating solution. This coating solution was formed into a film on a non-alkali glass substrate by spin coating, dried at 60 ° C. for 10 minutes, and baked in an electric furnace at 550 ° C. for 1 hour in the air.
Table 1 shows the results. In Table 1, regarding transparency,
In the haze computer manufactured by Suga Test Instruments, those having a total transmittance (scattered transmittance + non-scattered transmittance) of 85% or more and a haze value of 0.5% or less were evaluated as ○. The sheet resistance was measured by a DC four-point probe method. Regarding the denseness, in the measurement of the refractive index by ellipsometry, a value of 1.90 or more was evaluated as O, and a value of less than 1.90 was evaluated as X.

【0020】(例2)例1の蓚酸錫の添加量を変えて、
In/Sn=85/15(重量比)とした以外は例1と
同様に塗布、焼成して被膜つきガラスを得た。結果を表
1に示す。
(Example 2) The amount of tin oxalate added in Example 1 was changed,
Coating and baking were performed in the same manner as in Example 1 except that In / Sn = 85/15 (weight ratio) to obtain glass with a film. Table 1 shows the results.

【0021】(例3)例1の蓚酸錫の添加量を変えて、
In/Sn=94/6(重量比)とした以外は例1と同
様に塗布、焼成して被膜つきガラスを得た。結果を表1
に示す。
Example 3 The amount of tin oxalate added in Example 1 was changed.
Coating and baking were performed in the same manner as in Example 1 except that In / Sn = 94/6 (weight ratio) to obtain glass with a film. Table 1 shows the results
Shown in

【0022】(例4)例1の硝酸インジウム3水和物1
0gを、塩化インジウム7.8gに変更した以外は例1
と同様に塗布、焼成して被膜つきガラスを得た(In/
Sn=91/9(重量比))。結果を表1に示す。
Example 4 Indium nitrate trihydrate 1 of Example 1
Example 1 except that 0 g was changed to 7.8 g of indium chloride.
Was applied and baked in the same manner as described above to obtain a glass with a coating (In /
Sn = 91/9 (weight ratio)). Table 1 shows the results.

【0023】(例5)例1の「メタノールを17g、イ
ソプロパノールを17g」を、「メタノールを17g、
プロピレングリコールモノメチルエーテルを17g」に
変更した以外は例1と同様に塗布、焼成して被膜つきガ
ラスを得た。結果を表1に示す。
EXAMPLE 5 17 g of methanol and 17 g of isopropanol of Example 1 were replaced with 17 g of methanol and 17 g of methanol.
Coating and baking were performed in the same manner as in Example 1 except that the amount of propylene glycol monomethyl ether was changed to 17 g to obtain glass with a film. Table 1 shows the results.

【0024】(例6)例1の「メタノールを17g、イ
ソプロパノールを17g」を、「エタノールを17g、
イソプロパノールを17g」に変更した以外は例1と同
様に塗布、焼成して被膜つきガラスを得た。結果を表1
に示す。
Example 6 17 g of methanol and 17 g of isopropanol in Example 1 were replaced with 17 g of ethanol and 17 g of ethanol.
Coating and baking were performed in the same manner as in Example 1 except that the amount of isopropanol was changed to 17 g, to obtain a glass with a film. Table 1 shows the results
Shown in

【0025】(例7)例1の蓚酸錫を酢酸錫に変更した
以外は例1と同様に塗布、焼成して被膜つきガラスを得
た(In/Sn=91/9(重量比))。結果を表1に
示す。
(Example 7) Coating and firing were performed in the same manner as in Example 1 except that tin oxalate of Example 1 was changed to tin acetate to obtain a glass with a coating (In / Sn = 91/9 (weight ratio)). Table 1 shows the results.

【0026】(例8)例1で得られた被膜について、窒
素中400℃で30分の条件で再度熱処理した。結果を
表1に示す。
Example 8 The coating obtained in Example 1 was heat-treated again at 400 ° C. for 30 minutes in nitrogen. Table 1 shows the results.

【0027】(例9)例1のエチレングリコール17g
を1,2−プロピレングリコール17gに変更した以外
は例1と同様にして被膜つきガラスを得た。結果を表1
に示す。
Example 9 17 g of ethylene glycol of Example 1
Was changed to 17 g of 1,2-propylene glycol to obtain glass with a coating in the same manner as in Example 1. Table 1 shows the results
Shown in

【0028】(例10)例1のエチレングリコール17
gを2,3−ブタンジオール17gに変更した以外は例
1と同様にして被膜つきガラスを得た。結果を表1に示
す。
Example 10 Ethylene glycol 17 of Example 1
Glass with a coating was obtained in the same manner as in Example 1 except that g was changed to 17 g of 2,3-butanediol. Table 1 shows the results.

【0029】(例11(比較例))例1のエチレングリ
コール17gをジエチレングリコール17gにした以外
は例1と同様にして被膜つきガラスを得た。結果を表1
に示す。
Example 11 (Comparative Example) A coated glass was obtained in the same manner as in Example 1 except that 17 g of ethylene glycol in Example 1 was replaced with 17 g of diethylene glycol. Table 1 shows the results
Shown in

【0030】(例12(比較例))例1の「メタノール
を17g、イソプロパノールを17g」を、1−デカノ
ール34gに変更した以外は例1と同様にして、被膜つ
きガラスを得た。結果を表1に示す。
Example 12 (Comparative Example) A coated glass was obtained in the same manner as in Example 1 except that "17 g of methanol and 17 g of isopropanol" in Example 1 was changed to 34 g of 1-decanol. Table 1 shows the results.

【0031】(例13(比較例))例1のエチレングリ
コールを添加しないで被膜つきガラスを得た。結果を表
1に示す。
Example 13 (Comparative Example) A coated glass was obtained without adding the ethylene glycol of Example 1. Table 1 shows the results.

【0032】[0032]

【表1】 [Table 1]

【0033】[0033]

【発明の効果】本発明によれば、導電性と透明性に優れ
た透明導電膜を簡便な方法で安価に得ることができる。
According to the present invention, a transparent conductive film having excellent conductivity and transparency can be obtained at a low cost by a simple method.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】エチレングリコール、プロピレングリコー
ルおよびブタンジオールから選ばれる少なくとも1種の
グリコールと、インジウム塩と、錫塩と、炭素数8以下
の1価アルコールとを含む透明導電膜形成用塗布液。
1. A coating liquid for forming a transparent conductive film, comprising at least one glycol selected from ethylene glycol, propylene glycol and butanediol, an indium salt, a tin salt, and a monohydric alcohol having 8 or less carbon atoms.
【請求項2】炭素数8以下の1価アルコールが、メタノ
ール、エタノール、およびイソプロパノールから選ばれ
る少なくとも1種である請求項1記載の透明導電膜形成
用塗布液。
2. The coating liquid for forming a transparent conductive film according to claim 1, wherein the monohydric alcohol having 8 or less carbon atoms is at least one selected from methanol, ethanol, and isopropanol.
【請求項3】インジウム塩が硝酸インジウムである請求
項1または2記載の透明導電膜形成用塗布液。
3. The coating solution for forming a transparent conductive film according to claim 1, wherein the indium salt is indium nitrate.
【請求項4】錫塩が、酢酸錫および蓚酸錫から選ばれる
少なくとも1種である請求項1〜3いずれか1項記載の
透明導電膜形成用塗布液。
4. The coating solution for forming a transparent conductive film according to claim 1, wherein the tin salt is at least one selected from tin acetate and tin oxalate.
【請求項5】エチレングリコール、プロピレングリコー
ルおよびブタンジオールから選ばれる少なくとも1種の
グリコールと、インジウム塩と、錫塩と、炭素数8以下
の1価アルコールとを含む透明導電膜形成用塗布液を基
体上に塗布し、350℃以上の温度で熱処理することに
より透明導電膜を形成する透明導電膜の形成方法。
5. A coating solution for forming a transparent conductive film, comprising at least one glycol selected from ethylene glycol, propylene glycol and butanediol, an indium salt, a tin salt and a monohydric alcohol having 8 or less carbon atoms. A method for forming a transparent conductive film, which is applied on a substrate and heat-treated at a temperature of 350 ° C. or higher to form a transparent conductive film.
JP9204996A 1997-07-30 1997-07-30 Coating liquid for forming clear conductive film and method for forming clear conductive film Pending JPH1149990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9204996A JPH1149990A (en) 1997-07-30 1997-07-30 Coating liquid for forming clear conductive film and method for forming clear conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9204996A JPH1149990A (en) 1997-07-30 1997-07-30 Coating liquid for forming clear conductive film and method for forming clear conductive film

Publications (1)

Publication Number Publication Date
JPH1149990A true JPH1149990A (en) 1999-02-23

Family

ID=16499740

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH1149990A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001319530A (en) * 2000-05-02 2001-11-16 Kansai Research Institute In2O3-SnO2 PRECURSOR APPLICATION LIQUID AND ITS PREPARATION AS WELL AS PROCUDING METHOD OF In2O3-SnO2 THIN FILM
EP1464637A1 (en) * 2003-03-31 2004-10-06 Nof Corporation Low melting point tin salt of carboxylic acid and method for producing the same
US7741013B2 (en) 2000-06-30 2010-06-22 E.I. Du Pont De Nemours And Company Process for thick film circuit patterning

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001319530A (en) * 2000-05-02 2001-11-16 Kansai Research Institute In2O3-SnO2 PRECURSOR APPLICATION LIQUID AND ITS PREPARATION AS WELL AS PROCUDING METHOD OF In2O3-SnO2 THIN FILM
US7741013B2 (en) 2000-06-30 2010-06-22 E.I. Du Pont De Nemours And Company Process for thick film circuit patterning
EP1464637A1 (en) * 2003-03-31 2004-10-06 Nof Corporation Low melting point tin salt of carboxylic acid and method for producing the same
CN100393685C (en) * 2003-03-31 2008-06-11 日油株式会社 Low melting pant tin carboxylate and its manufacturing method

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