JPH11254332A - Wax grindstone and edge-face abrasive method of glass substrate - Google Patents

Wax grindstone and edge-face abrasive method of glass substrate

Info

Publication number
JPH11254332A
JPH11254332A JP5687998A JP5687998A JPH11254332A JP H11254332 A JPH11254332 A JP H11254332A JP 5687998 A JP5687998 A JP 5687998A JP 5687998 A JP5687998 A JP 5687998A JP H11254332 A JPH11254332 A JP H11254332A
Authority
JP
Japan
Prior art keywords
wax
grindstone
glass substrate
face
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5687998A
Other languages
Japanese (ja)
Inventor
Michio Kondo
道雄 近藤
Takaaki Kawai
孝昭 河合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP5687998A priority Critical patent/JPH11254332A/en
Publication of JPH11254332A publication Critical patent/JPH11254332A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a wax grindstone which can be reused after regeneration and an edge-face abrasive method of a glass substrate. SOLUTION: A wax grindstone 1 for abrading a glass substrate 5 is so composed that a board-like grindstone body 2 is formed by mixing abrasive grains with wax, and that plural long grooves 4 for edge-face abrasion of the glass substrate 5 are formed in parallel on the upper surface of the grindstone body 2. And the edge-face abrasive method of the glass substrate 5 is mentioned as follows. A rotary shaft 10 is inserted into the center hole of plural glass substrates 5, and the glass substrate 5 are set at specific intervals by fitting their centers 6 of the thickness side to the centers 6 of the width of the long grooves 4 of the wax grindstone 1. The rotary shaft 10 is rotated in a high speed, and simultaneously edge faces of the glass substrates 5 are pushed in the direction of the wax grindstone 1. The rotary shaft 10 is moved so that the glass substrates 5 may be moved along the long grooves 4 of the wax grindstone 1, and simultaneously abrasive parts are cooled by water, to thereby abrade the edge faces of the glass substrates 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ガラス基板等の端
面研磨用のワックス砥石およびガラス基板の端面研磨方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wax grindstone for polishing an end face of a glass substrate or the like and a method of polishing the end face of a glass substrate.

【0002】[0002]

【従来の技術】従来から、コンピュータのハードディス
クにドーナツ状のガラス基板が使用されている。このガ
ラス基板の外周端面をグラインダで荒削り研磨し、次
に、セリウム等の第1稀土類元素からなる砥石を取り付
けたグラインダで仕上げ研磨を行ない端面の鏡面つやだ
しを行なっている。
2. Description of the Related Art Conventionally, a doughnut-shaped glass substrate has been used for a hard disk of a computer. The outer peripheral end surface of the glass substrate is roughly ground and polished by a grinder, and then the finish polishing is performed by a grinder equipped with a grindstone made of a first rare earth element such as cerium, so that the end surface is mirror-polished.

【0003】詳しくは、図3(a)に示すように、荒削
り済みのガラス基板100を回転軸105にセットし、
止め具106でガラス基板100を回転軸105に固定
している。また、ガラス基板100の仕上げ形状の溝部
111の形状を円周部に有する酸化セリウム等の砥粒を
含有する砥石110を止め具116で回転軸115に固
定している。
More specifically, as shown in FIG. 3A, a rough-cut glass substrate 100 is set on a rotating shaft 105,
The glass substrate 100 is fixed to the rotation shaft 105 by the stopper 106. In addition, a grindstone 110 containing abrasive grains such as cerium oxide having the shape of the groove 111 of the finished shape of the glass substrate 100 on the circumference is fixed to the rotating shaft 115 with the stopper 116.

【0004】前記のガラス基板100の回転軸105を
矢印で示すように回転させると共に、砥石110の回転
軸115も矢印で示すように高速回転させ、ガラス基板
100を矢印で示すように砥石110側に移動させて砥
石110の溝部111にガラス基板100の端面を押し
込みガラス基板100の外周端面を仕上げ研磨してい
る。
The rotating shaft 105 of the glass substrate 100 is rotated as shown by the arrow, and the rotating shaft 115 of the grindstone 110 is also rotated at a high speed as shown by the arrow. Then, the end surface of the glass substrate 100 is pushed into the groove 111 of the grindstone 110 to finish-polish the outer peripheral end surface of the glass substrate 100.

【0005】[0005]

【発明が解決しようとする課題】しかし、このようにガ
ラス基板100の外周端面の研磨を行なうと、図3
(b)に示すように、軟質の酸化セリュウム製の砥石1
10の溝部111がすぐに変形してしまい続けてガラス
基板100を研磨することができなくなる。そこで溝部
111の形状修正(ツルーイングともいう)を頻繁に行
わなければならない。また、一度形状修正を行った後は
数十枚の研磨処理しかできなくなる。このために、形状
修正を頻繁に行なわなければならない。また、その都度
砥石の減量に合わせて装置の調整を行なわなければなら
ず、コストアップを招いていた。
However, when the outer peripheral end face of the glass substrate 100 is polished as described above, FIG.
As shown in (b), a whetstone 1 made of soft cerium oxide
The ten groove portions 111 are immediately deformed and the glass substrate 100 cannot be polished continuously. Therefore, the shape of the groove 111 must be frequently corrected (also called truing). Also, once the shape is corrected, only a few dozen polishing processes can be performed. For this purpose, the shape must be corrected frequently. In addition, the apparatus has to be adjusted in accordance with the reduction in the amount of grinding wheel each time, resulting in an increase in cost.

【0006】そこで、本発明はこのような問題に鑑みな
されたもので、再生使用可能なワックス砥石およびガラ
ス基板の端面研磨方法を提供することを目的とする。
The present invention has been made in view of such a problem, and an object of the present invention is to provide a reusable wax whetstone and a method for polishing an end face of a glass substrate.

【0007】[0007]

【課題を解決するための手段、及び発明の効果】上記目
的を達成するためになされた請求項1記載のワックス砥
石は、被研磨体を研磨するワックス砥石であって、常温
で固体の油脂のワックスに砥粒を混ぜ合わせて砥石本体
を形成したことを特徴とする。
Means for Solving the Problems and Effects of the Invention A wax whetstone according to claim 1 for achieving the above object is a wax whetstone for polishing an object to be polished, which is a solid oil and fat at room temperature. The abrasive body is formed by mixing abrasive grains with wax.

【0008】請求項1記載の発明によると、ワックスが
常温で固体となる性質を有しているから常温で被研磨体
を研磨することができる。また、ワックス砥石の形状が
損なわれた場合には、ワックス砥石を加熱溶融すること
により容易に再生することができる。
According to the first aspect of the present invention, the object to be polished can be polished at room temperature because the wax has a property of being solid at room temperature. When the shape of the wax grindstone is damaged, the wax grindstone can be easily regenerated by heating and melting the wax grindstone.

【0009】請求項2記載の発明は、請求項1記載のワ
ックス砥石において、前記砥石本体の上面にガラス基板
の端面研磨用の直線の長溝を複数本一定の間隔で平行に
設けたことを特徴とする。請求項2記載の発明による
と、砥石本体の上面に直線の長溝を複数本一定の間隔で
平行に設けるだけであるからワックス砥石の溝付け加工
が容易にできる。
According to a second aspect of the present invention, in the wax grinding stone according to the first aspect, a plurality of straight long grooves for polishing an end face of a glass substrate are provided in parallel on the upper surface of the grinding stone main body at a constant interval. And According to the second aspect of the present invention, since only a plurality of straight long grooves are provided in parallel on the upper surface of the grindstone main body at a constant interval, the grooving of the wax grindstone can be easily performed.

【0010】なお、砥石本体がワックスであるから加熱
したへらで容易に溝付けができる。請求項3記載のガラ
ス基板の端面研磨方法は、請求項2記載のワックス砥石
を用いたガラス基板の端面研磨方法であって、複数のド
ーナツ状のガラス基板の中央孔に回転軸を挿通し、前記
ワックス砥石の長溝の幅のセンタにガラス基板の厚さ側
のセンタを合わせて一定の間隔を設けてセツトし、前記
回転軸を高速回転させながら前記ガラス基板の端面を前
記ワックス砥石の長溝に押し込み、前記ガラス基板が該
ワックス砥石の長溝に沿わせて移動するように、前記回
転軸または前記ワックス砥石あるいは双方を同時に移動
させながら、且つ研磨部を冷却しながら、ガラス基板の
端面を研磨することを特徴とする。
Since the main body of the grindstone is made of wax, it can be easily grooved with a heated spatula. The method for polishing an end face of a glass substrate according to claim 3 is the method for polishing an end face of a glass substrate using the wax grindstone according to claim 2, wherein a rotating shaft is inserted through a center hole of a plurality of donut-shaped glass substrates, The center of the thickness of the glass substrate is aligned with the center of the width of the long groove of the wax grindstone and set at a constant interval, and the end face of the glass substrate is aligned with the long groove of the wax grindstone while rotating the rotating shaft at a high speed. Push in and polish the end surface of the glass substrate while simultaneously moving the rotating shaft and / or the wax grindstone and cooling the polishing unit so that the glass substrate moves along the long groove of the wax grindstone. It is characterized by the following.

【0011】請求項3記載の発明によると、回転軸に複
数のガラス基板をセットして回転軸を回転させながら研
磨するから一度に複数枚のガラス基板の端面研磨するこ
とができる。また、研磨部を冷却しながら研磨するか
ら、ワックス砥石が摩擦熱を受けて軟化するようなこと
がない。
According to the third aspect of the present invention, since a plurality of glass substrates are set on the rotating shaft and polished while rotating the rotating shaft, the end faces of a plurality of glass substrates can be polished at once. In addition, since the polishing is performed while cooling the polishing section, the wax grindstone does not soften due to frictional heat.

【0012】[0012]

【発明の実施の形態】本発明の実施の形態を図に基づい
て説明する。図1は、発明の実施の形態のワックス砥石
を表す斜視図。図2は、ガラス基板端面研磨のセットの
状態を表す正面図である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing a wax whetstone according to an embodiment of the present invention. FIG. 2 is a front view illustrating a state of the glass substrate end surface polishing set.

【0013】図1に示すように、ワックス砥石1は、板
状の砥石本体2の上面3にガラス基板5の仕上げ端面形
状と同一形状の角部をカットさせた直線の長溝4を複数
本一定の間隔を空けて平行に設けてある。次に、ワック
ス砥石1の製造工程を説明する。
As shown in FIG. 1, a wax whetstone 1 has a plurality of straight long grooves 4 formed by cutting a corner having the same shape as a finished end surface shape of a glass substrate 5 on an upper surface 3 of a plate-shaped whetstone main body 2. Are provided in parallel at intervals. Next, a manufacturing process of the wax grindstone 1 will be described.

【0014】常温で固体の油脂であるワックス(日化精
工株式会社製、商品名 スカイK−41)を180℃以
上の温度に加熱しワックスを溶融する。次に、Ce
2 ,La2 3 等の第1稀土類元素からなる粒度:1
μm以下の砥粒(三井金属鉱業株式会社製、商品名 ミ
レーク S−0)をワックスの重量比8に対して砥粒の
重量比2の割合で混合し、溶融ワックスに砥粒が均一に
分布するように攪拌する。次に冷却して幅が160m
m、長さが200mm、厚さが40mmの板状の砥石本
体2を形成する。
A wax (Sky K-41, manufactured by Nikka Seiko Co., Ltd.), which is a solid oil at normal temperature, is heated to a temperature of 180 ° C. or higher to melt the wax. Next, Ce
Particle size of first rare earth element such as O 2 , La 2 O 3 : 1
Abrasive grains of μm or less (Mirek S-0, manufactured by Mitsui Kinzoku Mining Co., Ltd.) are mixed at a weight ratio of abrasive grains of 2 to a weight ratio of wax of 8, and the abrasive grains are uniformly distributed in the molten wax. Stir so that Then cool down and the width is 160m
The plate-shaped grindstone main body 2 having a length of m, a length of 200 mm, and a thickness of 40 mm is formed.

【0015】次に砥石本体2の上面3の長手方向に加熱
したへらを当ててワックスを溶かしガラス基板5の仕上
げ端面と同一の直線の長溝4(ここではガラス基板の厚
さに対して20μm程幅の狭い長溝)を複数本平行に形
成する。このようにしてワックス砥石1を製造する。
Next, a heated spatula is applied in the longitudinal direction of the upper surface 3 of the grindstone body 2 to melt the wax, and the long straight groove 4 which is the same as the finished end surface of the glass substrate 5 (here, about 20 μm with respect to the thickness of the glass substrate) A plurality of long narrow grooves) are formed in parallel. Thus, the wax grindstone 1 is manufactured.

【0016】こうすると、ワックスが常温で固体となる
性質を有しているから常温でガラス基板5を研磨するこ
とができる。また、ワックス砥石1の形状が損なわれた
場合には、ワックス砥石1を加熱溶融することにより容
易に再生することができる。また、砥石本体2の上面3
に直線の長溝4を複数本一定の間隔で平行に設けるだけ
であるからワックス砥石1の溝付け加工が容易にでき
る。
Thus, the glass substrate 5 can be polished at room temperature because the wax has a property of being solid at room temperature. When the shape of the wax grindstone 1 is damaged, the wax grindstone 1 can be easily regenerated by heating and melting. Also, the upper surface 3 of the whetstone body 2
Since only a plurality of straight long grooves 4 are provided in parallel at a constant interval, the groove forming of the wax grindstone 1 can be easily performed.

【0017】なお、砥石本体1がワックスで形成してあ
るから加熱したへらで容易に溝付けができる。次に、ガ
ラス基板5の端面研磨方法を説明する。図2に示すよう
に、端面荒削り済みの直径100mm、中央孔径20m
m、厚さ1mmのドーナツ状のガラス基板5の中央孔に
回転軸10を挿通させて各ガラス基板5の間に筒状のス
ペーサ11を夫々に挟み込み、ワックス砥石1の長溝4
の幅のセンタにガラス基板5の厚さのセンタが夫々に合
わさる位置になるように一定の間隔を維持させて取り付
ける。なお、止め具13,13により複数のガラス基板
5を回転軸10にしっかりと固定し、回転軸10にガラ
ス基板5をセットする。
Since the grinding wheel body 1 is made of wax, it can be easily grooved with a heated spatula. Next, a method of polishing the end face of the glass substrate 5 will be described. As shown in FIG. 2, the diameter of the end face is roughly cut 100 mm, and the center hole diameter is 20 m.
The rotating shaft 10 is inserted through a central hole of a donut-shaped glass substrate 5 having a thickness of 1 mm and a thickness of 1 mm, and cylindrical spacers 11 are sandwiched between the respective glass substrates 5.
The glass substrate 5 is attached at a constant interval so that the center of the thickness of the glass substrate 5 is aligned with the center of the width of the glass substrate 5. The plurality of glass substrates 5 are firmly fixed to the rotating shaft 10 by the stoppers 13, 13, and the glass substrate 5 is set on the rotating shaft 10.

【0018】次に、ガラス基板5の厚さ側のセンタと長
溝4のセンタの両方のセンタ6を合わせて、回転軸10
を3000rpmの速さで高速回転させながらワックス
砥石1の方向に回転軸10を移動して、夫々の長溝4に
ガラス基板5の端面を矢印Aで示すように押し込み、長
溝4に沿わせてガラス基板5を回転させながら紙面の奥
方向に40mm/secの速さで回転軸10を移動させ
てガラス基板5の端面研磨を行なう。
Next, both the center 6 on the thickness side of the glass substrate 5 and the center of the long groove 4 are aligned to form a rotating shaft 10.
The rotating shaft 10 is moved in the direction of the wax grindstone 1 while rotating at a high speed of 3000 rpm, and the end face of the glass substrate 5 is pushed into each long groove 4 as shown by an arrow A, and the glass is moved along the long groove 4. The end face of the glass substrate 5 is polished by moving the rotating shaft 10 at a speed of 40 mm / sec in the depth direction of the paper while rotating the substrate 5.

【0019】なお、端面研磨する時に冷却水8を給水管
7から放水させて研磨部を十分に冷却してやりワックス
の軟化を防止する。このように、一度の研磨により複数
のガラス基板5の端面研磨を効率よく行なうことができ
る。
When the end face is polished, cooling water 8 is discharged from the water supply pipe 7 to sufficiently cool the polished portion to prevent the wax from softening. In this manner, the end faces of the plurality of glass substrates 5 can be efficiently polished by one polishing.

【0020】この場合の、ワックス砥石1は、一度使用
したらその後はワックス砥石1の再生原料として繰り返
し使用できる。また、回転軸10に複数のガラス基板5
をセットして回転軸10を回転させながら研磨するから
一度に複数枚のガラス基板5の端面を研磨することがで
きる。
In this case, the wax grindstone 1 can be repeatedly used as a raw material of the wax grindstone 1 after it has been used once. Further, a plurality of glass substrates 5 are
Is set and polishing is performed while rotating the rotating shaft 10, so that the end faces of a plurality of glass substrates 5 can be polished at once.

【0021】また、研磨部を冷却しながら研磨するか
ら、ワックス砥石1が摩擦熱を受けて軟化するようなこ
とがない。以上、本発明の実施の形態について説明した
が、本発明の趣旨の範囲を超えない限り種々の実施がで
きる。例えば、発明の実施の形態では第1稀土類元素か
らなる砥粒を使用して説明したが、砥粒は、炭化珪素、
アルミナ、ダイヤモンドカーボン等であってもよい。ま
た、発明の実施の形態では長溝4の角部をカットして説
明したが溝はU字形溝、V字形溝等どんな形状であって
もよい。
Since the polishing is performed while cooling the polishing section, the wax grindstone 1 does not soften due to frictional heat. As described above, the embodiments of the present invention have been described. However, various embodiments can be made without departing from the spirit of the present invention. For example, in the embodiments of the present invention, description has been made using abrasive grains made of the first rare earth element. However, the abrasive grains are made of silicon carbide,
Alumina, diamond carbon or the like may be used. In the embodiment of the present invention, the corners of the long groove 4 are cut, but the groove may have any shape such as a U-shaped groove or a V-shaped groove.

【0022】また、発明の実施の形態では長溝に沿わせ
てガラス基板5を移動させて説明したが、ワックス砥石
1を長溝方向に移動させてもよいし、また、ガラス基板
とワックス砥石を長溝に沿わせて向かい合う方向に同時
に移動させてもよい。また、ワックス砥石の形状は被研
磨体に合わせてあればどんな形状をしていてもよい。
In the embodiment of the invention, the glass substrate 5 is moved along the long groove. However, the wax grindstone 1 may be moved in the long groove direction, or the glass substrate and the wax grindstone may be moved along the long groove. May be moved at the same time in the facing direction. The shape of the wax grindstone may be any shape as long as it matches the object to be polished.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 発明の実施の形態のワックス砥石の要部を表
す斜視図。
FIG. 1 is a perspective view illustrating a main part of a wax whetstone according to an embodiment of the present invention.

【図2】 発明の実施の形態のガラス基板端面研磨のセ
ットの状態を表す正面図。
FIG. 2 is a front view illustrating a state of a set for polishing a glass substrate end face according to the embodiment of the present invention.

【図3】 従来例の砥石の説明図。FIG. 3 is an explanatory view of a conventional grindstone.

【符号の説明】[Explanation of symbols]

1…ワックス砥石、2…砥石本体、3…上面、4…長
溝、5…ガラス基板、6…センタ、10…回転軸。
DESCRIPTION OF SYMBOLS 1 ... Wax whetstone, 2 ... Whetstone main body, 3 ... Top surface, 4 ... Long groove, 5 ... Glass substrate, 6 ... Center, 10 ... Rotation axis.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被研磨体を研磨するワックス砥石であっ
て、 常温で固体の油脂のワックスに砥粒を混ぜ合わせて砥石
本体を形成したことを特徴とするワックス砥石。
1. A wax whetstone for polishing an object to be polished, wherein a whetstone main body is formed by mixing abrasive grains with a solid oil wax at room temperature.
【請求項2】 前記砥石本体の上面にガラス基板の端面
研磨用の直線の長溝を複数本一定の間隔で平行に設けた
ことを特徴とする請求項1記載のワックス砥石。
2. The wax grindstone according to claim 1, wherein a plurality of straight long grooves for polishing an end face of the glass substrate are provided in parallel on the upper surface of the grindstone main body at a predetermined interval.
【請求項3】 請求項2記載のワックス砥石を用いたガ
ラス基板の端面研磨方法であって、 複数のドーナツ状のガラス基板の中央孔に回転軸を挿通
し、 前記ワックス砥石の長溝の幅のセンタにガラス基板の厚
さ側のセンタを合わせて一定の間隔を設けてセツトし、 前記回転軸を高速回転させながら前記ガラス基板の端面
を前記ワックス砥石の前記長溝に押し込み、 前記ガラス基板が該ワックス砥石の長溝に沿わせて移動
するように、 前記回転軸または前記ワックス砥石あるいは双方を同時
に移動させながら、且つ研磨部を冷却しながら、ガラス
基板の端面を研磨することを特徴とするガラス基板の端
面研磨方法。
3. A method for polishing an end face of a glass substrate using a wax grindstone according to claim 2, wherein a rotation shaft is inserted into a center hole of a plurality of donut-shaped glass substrates, and a width of a long groove of the wax grindstone is determined. The center on the thickness side of the glass substrate is aligned with the center and set at a fixed interval. The end face of the glass substrate is pushed into the long groove of the wax grindstone while rotating the rotating shaft at a high speed. A glass substrate, characterized in that an end surface of a glass substrate is polished while simultaneously moving the rotating shaft and / or the wax whetstone or both so as to move along a long groove of the wax whetstone, and cooling a polishing part. End face polishing method.
JP5687998A 1998-03-09 1998-03-09 Wax grindstone and edge-face abrasive method of glass substrate Pending JPH11254332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5687998A JPH11254332A (en) 1998-03-09 1998-03-09 Wax grindstone and edge-face abrasive method of glass substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5687998A JPH11254332A (en) 1998-03-09 1998-03-09 Wax grindstone and edge-face abrasive method of glass substrate

Publications (1)

Publication Number Publication Date
JPH11254332A true JPH11254332A (en) 1999-09-21

Family

ID=13039711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5687998A Pending JPH11254332A (en) 1998-03-09 1998-03-09 Wax grindstone and edge-face abrasive method of glass substrate

Country Status (1)

Country Link
JP (1) JPH11254332A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003039309A (en) * 2001-08-01 2003-02-13 Nisshin Steel Co Ltd Solid polishing agent for polishing stainless steel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003039309A (en) * 2001-08-01 2003-02-13 Nisshin Steel Co Ltd Solid polishing agent for polishing stainless steel

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