JPH11228282A - Gas rectifying member for single crystal-pulling apparatus - Google Patents
Gas rectifying member for single crystal-pulling apparatusInfo
- Publication number
- JPH11228282A JPH11228282A JP3308898A JP3308898A JPH11228282A JP H11228282 A JPH11228282 A JP H11228282A JP 3308898 A JP3308898 A JP 3308898A JP 3308898 A JP3308898 A JP 3308898A JP H11228282 A JPH11228282 A JP H11228282A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- pulling apparatus
- thermosetting resin
- rectifying member
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、単結晶引き上げ装
置を構成するための部材に関し、特に、半導体材料とな
るチョクラルスキー法による単結晶引き上げ装置に使用
されるガス整流部材に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member for forming a single crystal pulling apparatus, and more particularly to a gas rectifying member used in a Czochralski single crystal pulling apparatus as a semiconductor material.
【0002】[0002]
【従来の技術】単結晶引き上げ装置は、所謂チョクラル
スキー法と称される方法により、雰囲気ガスの存在下
で、ルツボ内のシリコン融液からシリコン単結晶を引き
上げるもので、例えば、特公昭57−15079号公報
にて示されているような「単結晶製造装置」として知ら
れる。この公報に示された装置は、図3に示すように、
「炉体容器1内にその下方より回転軸2が導入され、そ
の回転軸2の端面上に載置台3を介してルツボ4が配さ
れる。又該ルツボ4の周りに発熱体5と保温筒6が配さ
れ、而してルツボ4内でシリコンが溶融され融液7を得
る。一方、炉体容器1の上方には上下に滑動する回転軸
9が設けられている。該回転軸9の遊端にシリコンの種
結晶8を取付け、回転軸9を種結晶8がルツボ4内の融
液7に触れている状態より上方に移動させて、種結晶8
の下に続くシリコンの単結晶10を得る。単結晶を育成
する際、不必要な反応生成ガスが、単結晶10及び融液
7の液面で反応しないように、これを排除する必要があ
る。このためにアルゴン等の不活性ガスを雰囲気ガスと
して、炉体容器1の上方より単結晶及び液面に送給し、
炉体容器1下部より排出する」というものである(上記
公報の第2欄)。2. Description of the Related Art A single crystal pulling apparatus pulls a silicon single crystal from a silicon melt in a crucible in the presence of an atmospheric gas by a so-called Czochralski method. It is known as a "single crystal manufacturing apparatus" as disclosed in JP-A-15079. The device shown in this publication, as shown in FIG.
"The rotary shaft 2 is introduced into the furnace body container 1 from below, and the crucible 4 is disposed on the end surface of the rotary shaft 2 via the mounting table 3. In addition, the heating element 5 and the heat insulation around the crucible 4 A cylinder 6 is arranged, and silicon is melted in the crucible 4 to obtain a melt 7. On the other hand, a rotating shaft 9 that slides up and down is provided above the furnace vessel 1. The rotating shaft 9 A silicon seed crystal 8 is attached to the free end of the seed crystal 8, and the rotating shaft 9 is moved above the state where the seed crystal 8 is in contact with the melt 7 in the crucible 4.
To obtain a silicon single crystal 10 below. When growing a single crystal, it is necessary to eliminate unnecessary reaction product gas so that it does not react on the liquid surfaces of the single crystal 10 and the melt 7. For this purpose, an inert gas such as argon is supplied as atmospheric gas to the single crystal and the liquid surface from above the furnace body container 1,
It is discharged from the lower part of the furnace body container 1 "(the second column of the above-mentioned publication).
【0003】この種の単結晶引き上げ装置では、出来上
がってくる半導体材料の純度を保つため、ルツボ内のS
i溶融液内に不純物が混入しないようにクリーンな雰囲
気を形成しておく必要がある。このため、Siを溶融さ
せるルツボ上には、上方より流れる不活性ガスを整流す
るためのガス整流部材が設置されている。このガスの整
流によって、高温下の炉内で発生するSiOガス等の不
純物がルツボ内に流入してSi溶融液内に混入するのを
防止する。また、Si単結晶の引き上げ速度に影響する
引き上げ方向におけるSi単結晶の温度勾配を大きくす
るためにピータ及びSi溶融液からの輻射熱を遮断する
役割もはたしている。[0003] In this type of single crystal pulling apparatus, in order to maintain the purity of the resulting semiconductor material, the S in the crucible is maintained.
i It is necessary to form a clean atmosphere so that impurities do not mix in the melt. For this reason, a gas rectifying member for rectifying the inert gas flowing from above is provided on the crucible for melting Si. This gas rectification prevents impurities such as SiO gas generated in the furnace at high temperature from flowing into the crucible and being mixed into the Si melt. In addition, in order to increase the temperature gradient of the Si single crystal in the pulling direction which affects the pulling speed of the Si single crystal, it also plays a role of blocking radiant heat from the Peter and the Si melt.
【0004】上記のように、Si単結晶の温度勾配を大
きくするためには、融液やルツボからの輻射熱を十分に
遮断しなければならない。また、黒鉛材は耐熱性に優れ
るものであっても、断熱性を十分に発揮し得るものでは
ない。そこで、単結晶引き上げ装置用のガス整流部材
は、熱輻射を遮断するために黒鉛を基材とし、断熱材を
組み合わせたものが提供されている。例えば、特開平9
−183686号公報は、引き上げ単結晶棒を同軸に囲
う円筒とカラーからなり、該カラーは、高純度黒鉛材で
形成され、複層に重ね合わせた断熱材がカラー上面を覆
うように設けられ、さらにこの上面は高純度黒鉛材で被
覆され、あるいは被覆する高純度黒鉛材の表面には炭化
珪素等が被覆されるものである。As described above, in order to increase the temperature gradient of a Si single crystal, it is necessary to sufficiently block radiant heat from a melt or a crucible. Further, even if the graphite material is excellent in heat resistance, it cannot sufficiently exhibit heat insulating properties. Therefore, a gas rectifying member for a single crystal pulling apparatus has been provided in which graphite is used as a base material and heat insulating material is combined to block thermal radiation. For example, JP-A-9
Japanese Patent Publication No. 183686 discloses a cylinder and a collar which coaxially surround a pulled single crystal rod. The collar is formed of a high-purity graphite material, and a heat insulating material which is superposed in a plurality of layers is provided so as to cover the upper surface of the collar. Further, the upper surface is coated with a high-purity graphite material, or the surface of the high-purity graphite material to be coated is coated with silicon carbide or the like.
【0005】しかし、ガス整流部材は、加工精度により
高価となるばかりか、熱容量も大きくなるという問題が
あり、更に介合部よりSiOガスが侵入し、次のような
化学反応が生じて、断熱材が珪化し、パーティクルの発
生の原因となることもあった。 SiO+2C→SiC+CO[0005] However, the gas rectifying member is not only expensive due to the processing accuracy but also has a problem that the heat capacity is increased. Further, SiO gas invades from the interposed portion, and the following chemical reaction occurs, resulting in heat insulation. In some cases, the material was silicified, causing particles to be generated. SiO + 2C → SiC + CO
【0006】[0006]
【発明が解決しようとする課題】そこで、本発明の目的
とするところは、単結晶の引き上げに必要な所望の温度
勾配を与え、かつ単結晶引き上げ装置内の汚染や単結晶
の汚染を引き起こすことのない耐久性が高くてコスト低
減が可能なガス整流部材を提供することである。SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a desired temperature gradient required for pulling a single crystal and to cause contamination in the single crystal pulling apparatus and contamination of the single crystal. It is an object of the present invention to provide a gas rectifying member having high durability without cost and capable of reducing costs.
【0007】[0007]
【課題を解決するための手段】上記の課題を解決するた
めに請求項1に記載の発明の採った手段を実施形態の説
明中において使用する符号を付して説明すると、「半導
体原料を溶融させるルツボ10上に設置され、密閉本体
50内に上方より流入する不活性ガスを整流するための
ガス整流部材60であって、炭素質繊維成形体61を基
材とし、この基材の表面に熱硬化性樹脂を加熱硬化した
後炭化してなる熱硬化性樹脂炭化物を中間層62として
形成し、さらに、この中間層62の表面に熱分解炭素か
らなる被膜63を形成してなることを特徴とする単結晶
引き上げ装置100用のガス整流部材60」というもの
である。In order to solve the above-mentioned problems, means adopted in the first aspect of the present invention will be described with reference numerals used in the description of the embodiments. A gas rectifying member 60 installed on the crucible 10 to rectify the inert gas flowing from above into the sealed main body 50. The gas rectifying member 60 has a carbonaceous fiber molded body 61 as a base material. It is characterized in that a thermosetting resin carbide formed by heating and curing a thermosetting resin and then carbonizing is formed as an intermediate layer 62, and further a coating 63 made of pyrolytic carbon is formed on the surface of the intermediate layer 62. And a gas rectifying member 60 for the single crystal pulling apparatus 100.
【0008】本発明に係るガス整流部材60は、図1に
示すように、半導体原料を溶融させるルツボ10の上方
に設置されるものであり、その基材全体を炭素質繊維成
形体61によって形成することが必要である。その理由
はこのような炭素質繊維成形体61は、熱伝導性が小さ
く高い断熱性を備えているため、ルツボ10の上方に形
成すれば、融液やルツボ10から単結晶に加えられる輻
射熱を十分に遮断でき、単結晶の引き上げに必要な所望
の温度勾配を得ることができるからである。As shown in FIG. 1, a gas rectifying member 60 according to the present invention is installed above a crucible 10 for melting a semiconductor raw material, and the entire base material is formed by a carbon fiber molding 61. It is necessary to. The reason is that such a carbonaceous fiber molded body 61 has a low thermal conductivity and a high heat insulation property. This is because it is possible to sufficiently shut off and obtain a desired temperature gradient required for pulling the single crystal.
【0009】次いで、炭素質繊維成形体61の表面に
は、熱硬化性樹脂炭化物からなる中間層62を形成する
必要がある。そして、この中間層62を形成する熱硬化
性樹脂炭化物は、フェノール樹脂、フラン樹脂、ジビニ
ルベンゼン樹脂、又は、縮合多環芳香族化合物とヒドロ
キシメチル基、ハロメチル基のいずれか少なくとも一種
の基を二個以上有する一環または二環以上の芳香環から
成る芳香族架橋剤と酸触媒とを組合せて成る組成物の中
から選ばれる、一種または二種以上の熱硬化性樹脂を加
熱硬化した後炭化して形成される。炭素質繊維成形体6
1の表面に熱硬化性樹脂炭化物からなる中間層62を形
成する理由は、中間層62が存在しないと熱分解炭素の
被膜63が形成されにくく、繊維1本1本に熱分解炭素
がコーティングされるので、さらに、その上に熱分解炭
素の被膜63が形成されることにより重量が増加した
り、それに伴う熱容量アップや断熱特性の劣化につなが
るからである。Then, it is necessary to form an intermediate layer 62 made of a thermosetting resin carbide on the surface of the carbonaceous fiber molded body 61. The thermosetting resin carbide forming the intermediate layer 62 is formed by combining a phenol resin, a furan resin, a divinylbenzene resin, or a condensed polycyclic aromatic compound with at least one of a hydroxymethyl group and a halomethyl group. One or two or more thermosetting resins selected from a composition comprising an aromatic cross-linking agent comprising one or more aromatic rings or two or more aromatic rings and an acid catalyst are heat-cured and then carbonized. Formed. Carbonaceous fiber molded body 6
The reason why the intermediate layer 62 made of the thermosetting resin carbide is formed on the surface of the substrate 1 is that the absence of the intermediate layer 62 makes it difficult to form the pyrolytic carbon film 63, so that each fiber is coated with the pyrolytic carbon. This is because the formation of the pyrolytic carbon film 63 thereon further increases the weight, thereby increasing the heat capacity and deteriorating the heat insulation properties.
【0010】さらに、中間層62として形成された熱硬
化性樹脂炭化物の表面には、熱分解炭素からなる被膜6
3を形成することが必要である。その理由は、熱分解炭
素の被膜63の表面層は緻密であるため、耐酸化性、気
体不浸透性も極めて向上し、SiOガスやSiガスと熱
硬化性樹脂炭化物とが接触して、熱硬化性樹脂炭化物の
炭素と反応することを防ぐためである。一方、熱分解炭
素からなる被膜63の表面層の熱伝導率は、熱分解炭素
沈積面に垂直な方向においては、非常に低いことから、
炭素質繊維成形体61の本来の熱伝導率は上昇せず、高
断熱性も十分確保されるからである。また、熱硬化性樹
脂炭化物からのカーボン落ちの虞もあるため、緻密質な
熱分解炭素からなる被膜63でこれらの不都合を防げ
ば、単結晶引き上げ装置100内の汚染や単結晶の汚染
を防ぐことができるからである。さらに、熱分解炭素か
らなる被膜63の表面層は緻密性が高いため、熱硬化性
樹脂炭化物からなる中間層62のみならず、炭素質繊維
成形体61の機械的強度も向上するだけでなく、耐酸化
性及び気体不浸透性も極めて向上するからである。Further, a coating 6 made of pyrolytic carbon is formed on the surface of the thermosetting resin carbide formed as the intermediate layer 62.
It is necessary to form 3. The reason is that, since the surface layer of the pyrolytic carbon film 63 is dense, oxidation resistance and gas impermeability are extremely improved. This is for preventing reaction with the carbon of the curable resin carbide. On the other hand, the thermal conductivity of the surface layer of the coating 63 made of pyrolytic carbon is very low in the direction perpendicular to the pyrolytic carbon deposition surface,
This is because the original thermal conductivity of the carbonaceous fiber molded body 61 does not increase and high heat insulation is sufficiently ensured. In addition, since there is a risk of carbon falling from the thermosetting resin carbide, if these problems are prevented by the coating film 63 made of dense pyrolytic carbon, contamination in the single crystal pulling apparatus 100 and contamination of the single crystal can be prevented. Because you can do it. Further, since the surface layer of the coating 63 made of pyrolytic carbon has high density, not only the intermediate layer 62 made of a thermosetting resin carbide, but also the mechanical strength of the carbonaceous fiber molded body 61 is improved, This is because oxidation resistance and gas impermeability are also significantly improved.
【0011】[0011]
【発明の実施の形態】次に本発明を、図面に示した実施
の形態について説明すると、図1には、本発明に係るガ
ス整流部材60が適用される単結晶引き上げ装置100
の縦断面図が示してある。この単結晶引き上げ装置10
0は、その密閉本体50内に、半導体原料を溶融させる
ためのルツボ10を回転軸にて回転可能に収容したもの
であり、このルツボ10の周囲にはこれを加熱するため
のヒータ20が配置してある。そして、ルツボ10の上
方には、本発明に係るガス整流部材60が配置してあ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to an embodiment shown in the drawings. FIG. 1 shows a single crystal pulling apparatus 100 to which a gas rectifying member 60 according to the present invention is applied.
Is shown in a vertical sectional view. This single crystal pulling apparatus 10
Numeral 0 denotes a crucible 10 for melting a semiconductor material rotatably accommodated in a hermetically sealed main body 50 around a rotary shaft. A heater 20 for heating the crucible 10 is disposed around the crucible 10. I have. A gas rectifying member 60 according to the present invention is disposed above the crucible 10.
【0012】ルツボ10は、溶融した半導体原料と直接
接触する部分を、石英ルツボ11とした二重構造のもの
であり、ヒータ20は、一般的には、所謂黒鉛ヒータが
採用されるものであり、図1に示したような位置関係で
略一定となるものである。The crucible 10 has a double structure in which a portion directly in contact with the molten semiconductor raw material is a quartz crucible 11, and the heater 20 generally employs a so-called graphite heater. , Are substantially constant in the positional relationship as shown in FIG.
【0013】ガス整流部材60は、図2に示したように
炭素質繊維成形体61を基材として形成され、さらに炭
素質繊維成形体61の表面には中間層62として熱硬化
性樹脂炭化物が形成され、さらに、この中間層62の表
面には、熱分解炭素からなる被膜63が形成される。上
記の炭素質繊維成形体61、中間層62を形成する熱硬
化性樹脂炭化物及び熱分解炭素からなる被膜63は、以
下の実施例にて詳細に示すように製造又は形成されるも
のである。(実施例1)長径の外径φ340mm、短径
の外径φ200mm、厚さ5mm、高さ350mmの逆
円錐状の炭素質繊維成形体61を形成した。得られた炭
素質繊維成形体61には、熱硬化性樹脂として、軟化点
80℃の石油系ピッチのベンゼン可溶分(平均分子量3
40)とP−キシレングリコールをモル比で1:2の割
合で混合し、そこに1wt%のP−トルエンスルホン酸
を加えた混合物を用い、これを130℃で40分間反応
させた。この反応生成物を130℃で溶融させ、前記炭
素質繊維成形体61に塗りつけ、180℃で硬化させた
後、再度塗布して硬化処理をし、1900℃で焼成し
た。As shown in FIG. 2, the gas flow regulating member 60 is formed using a carbonaceous fiber molded body 61 as a base material, and a thermosetting resin carbide is formed on the surface of the carbonaceous fiber molded body 61 as an intermediate layer 62. A coating 63 made of pyrolytic carbon is formed on the surface of the intermediate layer 62. The coating 63 made of the thermosetting resin carbide and the pyrolytic carbon forming the carbonaceous fiber molded body 61 and the intermediate layer 62 is manufactured or formed as described in detail in the following examples. (Example 1) An inverted conical carbonaceous fiber molded body 61 having a long outer diameter of 340 mm, a short outer diameter of 200 mm, a thickness of 5 mm, and a height of 350 mm was formed. In the obtained carbonaceous fiber molded body 61, as a thermosetting resin, a benzene-soluble component (average molecular weight: 3) of petroleum pitch having a softening point of 80 ° C.
40) and P-xylene glycol were mixed at a molar ratio of 1: 2, and a mixture obtained by adding 1 wt% of P-toluenesulfonic acid thereto was reacted at 130 ° C. for 40 minutes. The reaction product was melted at 130 ° C., applied to the carbon fiber molding 61, cured at 180 ° C., applied again, cured, and fired at 1900 ° C.
【0014】表面に熱硬化性樹脂炭化物からなる中間層
62が形成された炭素質繊維成形体61をCVD炉内に
入れて、蒸着温度2000℃、圧力30Torrの条件
下で、水素ガスをキャリアとしてメタンガスを炉内に連
続的に供給した。これにより、熱硬化性樹脂炭化物の表
面全体に厚さ50μmの熱分解炭素からなる被膜63を
形成した。A carbonaceous fiber molded body 61 having an intermediate layer 62 made of a thermosetting resin carbide formed on a surface thereof is placed in a CVD furnace, and hydrogen gas is used as a carrier at a deposition temperature of 2000 ° C. and a pressure of 30 Torr. Methane gas was continuously supplied into the furnace. Thus, a coating 63 made of pyrolytic carbon having a thickness of 50 μm was formed on the entire surface of the thermosetting resin carbide.
【0015】[0015]
【発明の効果】本発明に係る単結晶引き上げ装置100
用のガス整流部材60は、「半導体原料を溶融させるル
ツボ10上に設置され、密閉本体50内に上方より流入
する不活性ガスを整流するためのガス整流部材60であ
って、炭素質繊維成形体61を基材とし、この基材の表
面に熱硬化性樹脂を加熱硬化した後炭化してなる熱硬化
性樹脂炭化物を中間層62として形成し、さらに、この
中間層62の表面に熱分解炭素からなる被膜63を形成
してなる」ことを特徴とし、炭素質繊維成形体61は高
断熱性を備えるので、所望の温度勾配を得ることがで
き、良質な単結晶が得られる。 また、中間層62には
緻密質な熱分解炭素からなる被膜63が堅固に形成され
るので、密閉本体50内の汚染や単結晶の汚染を引き起
こさないばかりか、ガス整流部材60の珪化を防ぐこと
もできるので、耐久性が高い低コストの単結晶引き上げ
装置用のガス整流部材を得ることができる。The single crystal pulling apparatus 100 according to the present invention.
Gas rectifying member 60 is a gas rectifying member 60 that is installed on the crucible 10 that melts the semiconductor raw material and that rectifies the inert gas that flows into the sealed main body 50 from above. Using the body 61 as a base material, a thermosetting resin carbide formed by heating and hardening a thermosetting resin on the surface of the base material is formed as an intermediate layer 62, and the surface of the intermediate layer 62 is further thermally decomposed. The carbonaceous fiber molded body 61 is provided with high heat insulation, so that a desired temperature gradient can be obtained, and a high-quality single crystal can be obtained. Further, since the coating layer 63 made of dense pyrolytic carbon is firmly formed on the intermediate layer 62, not only does not cause contamination in the sealed main body 50 and contamination of the single crystal, but also prevents silicification of the gas flow regulating member 60. Therefore, a highly durable and low-cost gas rectifying member for a single crystal pulling apparatus can be obtained.
【図1】本発明に係るガス整流部材を採用した単結晶引
き上げ装置の概略縦断面図である。FIG. 1 is a schematic vertical sectional view of a single crystal pulling apparatus employing a gas rectifying member according to the present invention.
【図2】同ガス整流部材の部分拡大断面図である。FIG. 2 is a partially enlarged sectional view of the gas rectifying member.
【図3】従来のシリコン単結晶引き上げ装置を示す断面
図である。FIG. 3 is a cross-sectional view showing a conventional silicon single crystal pulling apparatus.
100 単結晶引き上げ装置 10 ルツボ 11 石英ルツボ 20 ヒータ 50 密閉本体 60 ガス整流部材 61 炭素質繊維成形体 62 熱硬化性樹脂炭化物からなる中間層 63 熱分解炭素からなる被膜 DESCRIPTION OF SYMBOLS 100 Single crystal pulling apparatus 10 Crucible 11 Quartz crucible 20 Heater 50 Hermetic body 60 Gas rectification member 61 Carbonaceous fiber molding 62 Intermediate layer composed of thermosetting resin carbide 63 Coating composed of pyrolytic carbon
Claims (1)
され、密閉本体内に上方より流入する不活性ガスを整流
するためのガス整流部材であって、炭素質繊維成形体を
基材とし、この基材の表面に熱硬化性樹脂を加熱硬化し
た後炭化してなる熱硬化性樹脂炭化物を中間層として形
成し、さらに、この中間層の表面に熱分解炭素からなる
被膜を形成してなることを特徴とする単結晶引き上げ装
置用のガス整流部材。1. A gas rectifying member installed on a crucible for melting a semiconductor raw material for rectifying an inert gas flowing from above into a sealed main body, comprising a carbonaceous fiber molded body as a base material, A thermosetting resin carbide formed by heating and curing the thermosetting resin on the surface of the base material and forming a carbonized thermosetting resin as an intermediate layer, and further forming a coating made of pyrolytic carbon on the surface of the intermediate layer. A gas rectifying member for a single crystal pulling apparatus, characterized in that:
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JP03308898A JP3637435B2 (en) | 1998-02-16 | 1998-02-16 | Gas rectifier for single crystal pulling device |
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JP03308898A JP3637435B2 (en) | 1998-02-16 | 1998-02-16 | Gas rectifier for single crystal pulling device |
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JP2004322452A Division JP4140601B2 (en) | 2004-11-05 | 2004-11-05 | Gas rectifying member for single crystal pulling apparatus and manufacturing method thereof |
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JPH11228282A true JPH11228282A (en) | 1999-08-24 |
JP3637435B2 JP3637435B2 (en) | 2005-04-13 |
Family
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009001489A (en) * | 2008-08-28 | 2009-01-08 | Sumco Techxiv株式会社 | Apparatus and method for producing single crystal |
JP2012091966A (en) * | 2010-10-27 | 2012-05-17 | Denso Corp | Apparatus and method for producing silicon carbide single crystal |
JP2016141581A (en) * | 2015-01-30 | 2016-08-08 | イビデン株式会社 | Fluid flow-rectification member |
JP2016141582A (en) * | 2015-01-30 | 2016-08-08 | イビデン株式会社 | Fluid flow-rectification member |
-
1998
- 1998-02-16 JP JP03308898A patent/JP3637435B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009001489A (en) * | 2008-08-28 | 2009-01-08 | Sumco Techxiv株式会社 | Apparatus and method for producing single crystal |
JP2012091966A (en) * | 2010-10-27 | 2012-05-17 | Denso Corp | Apparatus and method for producing silicon carbide single crystal |
JP2016141581A (en) * | 2015-01-30 | 2016-08-08 | イビデン株式会社 | Fluid flow-rectification member |
JP2016141582A (en) * | 2015-01-30 | 2016-08-08 | イビデン株式会社 | Fluid flow-rectification member |
Also Published As
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JP3637435B2 (en) | 2005-04-13 |
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