JPH1050585A5 - - Google Patents

Info

Publication number
JPH1050585A5
JPH1050585A5 JP1996208260A JP20826096A JPH1050585A5 JP H1050585 A5 JPH1050585 A5 JP H1050585A5 JP 1996208260 A JP1996208260 A JP 1996208260A JP 20826096 A JP20826096 A JP 20826096A JP H1050585 A5 JPH1050585 A5 JP H1050585A5
Authority
JP
Japan
Prior art keywords
optical system
projection
mask
illumination
photosensitive substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996208260A
Other languages
English (en)
Japanese (ja)
Other versions
JP3790833B2 (ja
JPH1050585A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP20826096A priority Critical patent/JP3790833B2/ja
Priority claimed from JP20826096A external-priority patent/JP3790833B2/ja
Priority to EP19970113696 priority patent/EP0823662A2/en
Publication of JPH1050585A publication Critical patent/JPH1050585A/ja
Publication of JPH1050585A5 publication Critical patent/JPH1050585A5/ja
Application granted granted Critical
Publication of JP3790833B2 publication Critical patent/JP3790833B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP20826096A 1996-08-07 1996-08-07 投影露光方法及び装置 Expired - Fee Related JP3790833B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP20826096A JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置
EP19970113696 EP0823662A2 (en) 1996-08-07 1997-08-07 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20826096A JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置

Publications (3)

Publication Number Publication Date
JPH1050585A JPH1050585A (ja) 1998-02-20
JPH1050585A5 true JPH1050585A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-11-04
JP3790833B2 JP3790833B2 (ja) 2006-06-28

Family

ID=16553300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20826096A Expired - Fee Related JP3790833B2 (ja) 1996-08-07 1996-08-07 投影露光方法及び装置

Country Status (1)

Country Link
JP (1) JP3790833B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4307620B2 (ja) 1999-03-30 2009-08-05 株式会社サトー ラベル貼付機におけるロール状ラベルの巻芯保持装置
JP3548464B2 (ja) 1999-09-01 2004-07-28 キヤノン株式会社 露光方法及び走査型露光装置
DE10000191B8 (de) * 2000-01-05 2005-10-06 Carl Zeiss Smt Ag Projektbelichtungsanlage der Mikrolithographie
JP2003532282A (ja) * 2000-04-25 2003-10-28 エーエスエムエル ユーエス，インコーポレイテッド レチクル回折誘起バイアスのない光学縮小システム
KR20060120629A (ko) * 2003-08-28 2006-11-27 가부시키가이샤 니콘 노광방법 및 장치, 그리고 디바이스 제조방법
JP4692753B2 (ja) * 2004-02-13 2011-06-01 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
US20080204682A1 (en) * 2005-06-28 2008-08-28 Nikon Corporation Exposure method and exposure apparatus, and device manufacturing method
JP5414968B2 (ja) * 2005-11-14 2014-02-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学撮像システムの測定装置および操作方法
US7511799B2 (en) * 2006-01-27 2009-03-31 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method
WO2008116886A1 (de) 2007-03-27 2008-10-02 Carl Zeiss Smt Ag Korrektur optischer elemente mittels flach eingestrahltem korrekturlicht
JP2009010131A (ja) 2007-06-27 2009-01-15 Canon Inc 露光装置及びデバイス製造方法
EP2048540A1 (en) 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
JP5346985B2 (ja) * 2011-05-10 2013-11-20 キヤノン株式会社 計測装置、露光装置、デバイスの製造方法及び計測方法
JP7062716B2 (ja) 2020-03-27 2022-05-06 キヤノン株式会社 半導体装置の製造方法

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