JPH10247632A - Washing and treating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a washing and treating device into which a washing and treating solution does not intrude, and the washing and treating solution does not creeped into the backside of a substrate. SOLUTION: This washing and treating device 20, is provided with a revolving body 22 which retains the material to be washed on the upper part, a cylindrical revolving shaft 23 which is provided in a freely rotatable manner and interlocked with the revolving body 22, a driving means which rotatably drives the revolving shaft 23, an unmovable shaft 24 which supports the revolving shaft 23 in a freely movable manner and having the upper end protruding from the through hole 25 of the revolving body 22, and a liquid receiving part 29 which receives the washing liquid intruded from the gap between the unmovable shaft 24 and the revolving body 22.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an apparatus for processing a substrate such as a semiconductor wafer, and more particularly to an apparatus for cleaning a substrate.

[0002]

2. Description of the Related Art In a manufacturing process for manufacturing a substrate such as a semiconductor wafer or a liquid crystal substrate, the substrate is subjected to a substrate processing for forming a circuit pattern on the substrate with a processing liquid such as a chemical solution, and After this process, a cleaning process for removing the processing solution remaining on the substrate is repeatedly performed.

[0003] In order to favorably repeat the substrate processing and the cleaning of the substrate with such a processing solution, a cleaning apparatus is used in these manufacturing steps. The cleaning apparatus performs a cleaning process by performing high-speed rotation while supplying a cleaning liquid from a nozzle or the like provided on the upper surface side of the substrate after performing the processing with the processing liquid on the substrate. Then, the supply of the cleaning liquid is stopped and the substrate is rotated at a high speed, whereby a drying process for removing the cleaning liquid remaining on the substrate by centrifugal force is performed.

[0004] As shown in FIG.
Has a rotating body 3 on which the substrate 2 is mounted on the upper surface side, and a nozzle 4 positioned above the rotating body 3 for the substrate 2 mounted on the rotating body 3 for a cleaning process. A cleaning liquid is supplied, and a cleaning process is performed.

The rotating body 3 has a structure in which the substrate 2 is simply mounted on the upper surface thereof. When the substrate 2 is mounted on the rotating body 3, the lower surface of the substrate 2 is not contaminated. The upper surface of the rotating body 3 is formed into a concave curved surface, so that the lower surface of the substrate 2 does not come into surface contact with the upper surface of the rotating body 3. That is, the substrate 2 is
Is supported only at the outer peripheral end portion so that the lower surface does not contact the rotating body 3.

A driven shaft 3 is provided at the center of the lower surface of the rotating body 3.
The lower end of the driven shaft 3a is connected to the drive shaft 6 of the motor 5 by a coupling 6a so as to be rotatable. The drive shaft 6 and the rotation shaft 3a are connected by a coupling 6b. For this reason, when the motor 5 is driven to rotate, the rotating body 3 is provided to be driven to rotate in conjunction therewith.

The rotary shaft 3a is rotatably supported by a cylindrical fixed shaft 8 via a pair of bearings 7 such as bearings. The fixed shaft 8 is attached to a fixed object such as the main body of the motor 5, for example. Therefore, the fixed shaft 8 does not rotate by itself and is supported so that the rotary shaft 3a can be favorably rotated. A supply path 9 for supplying a gas such as N _{2 to} the back surface of the substrate 2 mounted on the rotating body 3 is formed inside the fixed shaft 8. A suction path 10 is formed in the fixed shaft 8 for sucking particles and the like generated by mechanical rotation and sliding of the bearing 7 such as a bearing so that the particles do not go around the back side of the substrate 2 like the supply path 9. Have been.

[0008]

In [0005] Incidentally cleaning apparatus of the above configuration, a gas such as N ₂ is supplied to the back surface of the substrate, cleaning of the supply pressure of the gas to the rear surface side of the substrate It is configured to prevent liquid from flowing around.

In such a configuration, it is necessary to supply a large amount of N _{2 in} order to prevent the above-mentioned cleaning solution from flowing to the back side of the substrate. However, a large amount of N ₂ of the substrate is supplied on the back side, since the above-mentioned arrangement of the aforementioned structure having the substrate has not have any holding means provided are merely No戴to the rotating body, of the large amount of N ₂ The supply raises the substrate, which causes a problem that the cleaning process cannot be performed stably.

[0010] To prevent floating of such the substrate, the supply of N ₂ is limited to a degree that does not float is above the substrate, in turn rounding the cleaning liquid is generated on the back side of the substrate and thus the The cleaning liquid adheres to the back side of the substrate. This cleaning liquid is usually one that has been subjected to a cleaning treatment on the front surface side of the substrate, and contains a large amount of particles in the liquid, so that the particles adhere to the back surface side of the substrate together with the cleaning liquid. If particles adhere to the back surface of the substrate, the back surface of the substrate must be cleaned, and if the cleaning liquid that has adhered to the surface dries, the particles will stick, so they can be easily cleaned and removed. Sometimes you can't.

Further, when the cleaning liquid spills on the back side of the substrate, the cleaning liquid not only adheres to the back side of the substrate, but also enters the gap between the rotating shaft 3a and the fixed shaft 8; In this case, there is a problem that the cleaning liquid reaches bearings such as a motor and a bearing, and breaks them.

The present invention has been made based on the above circumstances, and an object of the present invention is to provide a cleaning apparatus in which a cleaning liquid does not enter between a fixed shaft and a rotating shaft and does not flow around the back surface of the substrate. It is intended to provide.

[0013]

According to a first aspect of the present invention, there is provided a cleaning apparatus for performing a cleaning process while rotating an object to be cleaned. Body, a rotating shaft formed in a cylindrical shape having a hollow inside and integrally provided on the lower surface side of the rotating body,
A fixed shaft that is inserted into the inside of the rotating shaft, rotatably supports the rotating shaft, and has an upper end protruding from a through hole formed in the center of the rotating body, and rotationally drives the rotating shaft. And a liquid receiving portion provided on a portion of the fixed shaft located below the rotating body, for receiving a cleaning liquid that enters a gap between the fixed shaft and the rotating body. I have.

According to a second aspect of the present invention, in the liquid receiving section,
2. A substrate cleaning apparatus according to claim 1, wherein said liquid receiving portion is provided with a detecting means for detecting intrusion of said cleaning liquid.

According to a third aspect of the present invention, there is provided a cleaning apparatus for performing a cleaning process while rotating an object to be cleaned, wherein a rotating body on which the object to be cleaned is held and an upper surface peripheral portion of the rotating body are provided. A first protruding body spaced apart from and facing the lower surface of the outer peripheral portion of the object to be cleaned held by the rotating body; and a cylinder formed in a cylindrical shape having a hollow interior and integrally provided on the lower surface side of the rotating body. And a fixed shaft that is inserted through the inside of the rotating shaft, rotatably supports the rotating shaft, and has an upper end protruding from a through hole formed at the center of the rotating body. Driving means for driving the rotation shaft to rotate,
It is characterized by having.

According to a fourth aspect of the present invention, the rotating body includes:
2. The cleaning apparatus according to claim 1, wherein a first projection is provided on a lower surface of an outer peripheral portion of the object held by the rotating body so as to be spaced apart and opposed.

According to a fifth aspect of the present invention, a second projection is provided on the upper surface of the rotating body radially inward of the first projection. Cleaning apparatus.

According to the first aspect of the present invention, a liquid receiving portion for receiving a cleaning liquid entering from a gap between the fixed shaft and the rotating body is provided below the rotating body of the fixed shaft.
The cleaning liquid that has entered through the gap is reliably received by the liquid receiving portion, and the cleaning liquid does not enter the internal structure below the liquid receiving portion. Therefore, it is possible to prevent a problem that the internal structure is damaged by the invasion of the cleaning liquid.

According to the second aspect of the present invention, since the liquid receiving portion is provided with a detecting means for detecting the intrusion of the cleaning liquid into the liquid receiving portion, the detecting means detects the intrusion of the cleaning liquid into the inside. Can be detected immediately. Therefore, if this detection is recognized, the supply of the cleaning liquid and the driving of the cleaning process itself can be adjusted accordingly.

According to the third aspect of the present invention, a structure is provided in which a first projection is provided at the periphery of the upper surface of the rotating body, which is opposed to the lower surface of the outer peripheral portion of the object to be cleaned held by the rotating body. Therefore, the first protrusion prevents the cleaning liquid from flowing to the rear surface of the substrate, and the cleaning liquid is less likely to adhere to the rear surface.

According to the fourth aspect of the present invention, in addition to the liquid receiving portion being provided on the fixed shaft below the rotary body, the rotary body is held by the rotary body around the upper surface of the rotary body. The structure in which the first protrusions are provided so as to oppose the lower surface of the outer peripheral portion of the object to be cleaned prevents the cleaning liquid from flowing to the back side of the substrate, and the cleaning liquid is provided below the rotating body. Even when the cleaning liquid enters, the cleaning liquid is received by the liquid receiving portion, and it is possible to prevent the cleaning liquid from entering the internal structure below the liquid receiving portion. For this reason, the cleaning liquid can be further prevented from entering.

According to the fifth aspect of the present invention, since the second projection is provided on the upper surface of the rotating body radially inward of the first projection, the first projection is provided. Even if the cleaning liquid cannot be prevented from entering due to the surface tension or the like depending on the body, the second protrusion can prevent the cleaning liquid from entering the internal structure.

[0023]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIGS. As shown in FIG. 1, a rotating body 22 on which a substrate 21 such as a semiconductor wafer or a liquid crystal substrate is mounted is provided on the upper side of the cleaning apparatus 20. Is connected to an inner cylinder rotating shaft 23 having a hollow cylindrical body.
A fixed shaft 24 is inserted into the inner cylinder rotating shaft 23,
The fixed shaft 24 is configured to rotatably support the inner cylinder rotation shaft 23 and the rotating body 22 connected to the inner cylinder rotation shaft 23.

The rotating body 22 has a through hole 25 formed at the center thereof, and the upper end of the fixed shaft 24 projects upward from the through hole 25 above the rotating body 22. When the substrate 21 is mounted on the upper surface of the rotating body 22, a first protrusion 26 having an annular shape is formed at a position facing the outer peripheral portion of the mounted substrate 21. I have. Because the first projection 26 was formed,
The cleaning liquid for cleaning the front side of the substrate 21 does not easily flow around the back side of the substrate 21.

Further, a second projection 27 is provided on the rotating body 22 radially inward of the first projection 26. The second projection 27 is provided so as to be closely opposed to the back surface side of the substrate 21 similarly to the first projection 26, but the second projection 27 is
The protrusion height may be formed lower than that of the projection 26 of FIG. That is, the height may be lower than the first protrusion 26 as long as the height is such that the intrusion of the cleaning liquid into the through hole 25 formed in the rotating body 22 is prevented.

Since the first projection 26 and the second projection 27 are provided, the portion of the rotating body 22 between the first projection 26 and the second projection 27 is Even if the cleaning liquid intrudes beyond the first projection 26, the cleaning liquid is stored in the groove, and the second projection 27 is formed.
The cleaning liquid is prevented from entering the inside of the inner cylinder rotating shaft 23 through the through hole 25 in the radial direction. The rotating body 22 is provided with the first protrusion 2
It has a substantially disk shape with irregularities such as 6 and the second protrusion 27 formed, and has a configuration in which a through hole 25 for communicating the fixed shaft 24 is provided in the center.

The fixed shaft 24 having an upper end protruding from the through hole 25 is configured such that the lower end thereof is connected to the fixed portion 20a of the cleaning apparatus 20 and does not rotate.
In the present embodiment, the upper end of the fixed shaft 24 protruding in proximity to the through hole 25 is formed in a disk-shaped shielding plate 24a having a larger diameter than the other portions and covering the through hole 25. The lower side of the shielding plate 24a and the peripheral portion of the through hole 25 of the rotating body 22 are close to each other with a small gap without contact.

On the outer periphery of the through hole 25, a cylindrical guide body 28 facing the fixed shaft 24 is formed so as to protrude downward by a predetermined dimension along the fixed shaft 24. The cleaning liquid that has entered the through hole 25 along the second protrusion 27 along the line 28 is guided to be introduced between the guide body 28 and the fixed shaft 24.

The guide body 28 is inserted in a non-contact manner inside a cylindrical liquid receiving portion 29 formed in the middle of the fixed shaft 24. That is, the bottom surface of the liquid receiving portion 29 is formed so as to spread outward from a middle portion of the fixed shaft 24, and a side surface portion forming a cylindrical shape is formed upward from the bottom surface. The upper surface of the liquid receiving portion 29 is formed open, and the guide body 28 is inserted from the upper surface side of the liquid receiving portion 29 toward the inside of the liquid receiving portion 29 by a predetermined dimension. Therefore, the cleaning liquid intrudes along the guide body 28, the cleaning liquid is reliably received by the liquid receiving portion 29, and the cleaning liquid does not enter the lower side.

The liquid receiving portion 29 has a detection sensor 30 as a detecting means for detecting the invasion of the cleaning liquid on the bottom surface.
Is provided. The detection sensor 30 is connected to a control device (not shown) in the present embodiment. If the detection sensor 30 detects intrusion of the cleaning liquid, for example, it issues an alarm or drives the rotation shaft 23 to rotate. The operation of 36 is immediately stopped to stop the rotation of the substrate 21, and the supply of the cleaning liquid from the nozzle 55 described later is also stopped.

In the present embodiment, the fixed shaft 24 is formed such that a portion below the liquid receiving portion 29 has a larger diameter than a portion above the liquid receiving portion 29. The cylinder rotating shaft 23 is rotatably supported by a pair of bearings 31.

When the substrate 21 is mounted on the rotating body 22, for example, N ₂ is provided inside the fixed shaft 24.
A gas supply path 32 for supplying such a gas to the back side of the substrate 21 is formed. This gas supply path 32
In the present embodiment, is formed vertically communicating vertically from the lower end to the upper end of the fixed shaft 24, and from the lower end side, the gas supply path 32 is, for example, N ₂
And other sources of gas (not shown). Further, since the bearing 31 is driven to rotate while performing mechanical sliding, particles are generated in accordance with the rotation. However, in order to attract the particles, the bearing 31 is provided inside the fixed shaft 24. A suction passage 33 is formed, and the vicinity of the bearing 31 is vacuum-sucked to remove the particles.

A driven pulley 34 is formed at the lower end of the inner cylinder rotating shaft 23 rotatably supported by the fixed shaft 24. A belt 35 is attached to the driven pulley 34 and a driving pulley 37 attached to a motor 36 serving as a driving source.
Is stretched. Therefore, when the motor 36 is driven to rotate, the driven pulley 34 is driven to rotate, and the inner cylinder rotating shaft 23 and the inner cylinder rotating shaft 2
The rotating body 22 mounted above the rotating member 3 is also driven to rotate. The motor 36 and the driving pulley 37 are provided radially outward of the inner cylinder rotating shaft 23. Therefore, even if the cleaning liquid enters the inner cylinder rotating shaft 23 and is transmitted downward, the cleaning liquid does not directly reach the motor 36.

An outer cylinder rotating body 38 is rotatably provided on the outer periphery of the inner cylinder rotating shaft 23 while being in contact with the inner cylinder rotating shaft 23. The upper end of the outer cylinder rotating body 38 has a flange 3
8a is formed, and the flange portion 38a is formed horizontally outward from the outer cylinder rotating body 38 by a predetermined dimension. The flange 38a is provided with a holding portion 39 for holding the substrate 21. The holding portion 39 is provided outward from the flange 38a toward the rotating body 22.

The structure of the holding section 39 shown in FIGS. 2 and 3 will be described below. One end of a first lever 41 is rotatably attached to the flange 38a with the support pin 40 as a fulcrum, and a second end of the first lever 41 with the support pin 42 as a fulcrum is attached to the other end of the first lever 41. A lever 43 is rotatably mounted. The other end of the second lever 43 is attached to a support shaft 44a vertically provided on the lower surface of the holding plate 44, and the support shaft 44a is rotatable in an insertion hole 45 formed in the rotating body 22. It is supported by.

The holding plate 44 is formed in a disk shape.
1 is provided with a substrate support pin 46 which is in contact with the outer peripheral portion. In this embodiment, about three such holding portions 39 are provided on the outer cylinder rotating body 38.

At the periphery of the rotating body 22 and between the holding portions 39, three substrate support mechanisms 47 for supporting the periphery of the lower surface of the substrate 21 are provided. The substrate support mechanism 47 has a claw portion 47b formed on the inner peripheral side of the circular plate 47a, and the substrate 21 is placed on the claw portion 47b. The substrate support mechanism 47 is vertically movable, so that the substrate 21 can be mounted on the substrate support mechanism 47 and can be adjusted to a free height. That is, the height of the substrate support mechanism 47 can be freely adjusted from a position where the supply of the substrate 21 is easily performed by an external robot or the like to a position where the substrate 21 can be favorably held by the holding portion 39. Has become.

In the present embodiment, the holding portions 39 and the substrate support mechanisms 47 are provided alternately at predetermined intervals along the circumferential direction of the rotating body 22. Also, as shown in FIG.
A first locking piece 48 protruding outward is formed on an outer peripheral surface of the outer cylinder rotating body 38, and a second locking piece 48 protruding outward also on the inner cylinder rotating shaft 23. Locking piece 49 is formed. In this case, the outer cylinder rotating body 38
Is cut out in the circumferential direction by a predetermined length, for example, so that the second locking piece 49 can protrude outward.

The first locking piece 48 and the second locking piece 49
A spring 50 is stretched between the first locking piece 48 and the second locking piece 49. When the first locking piece 48 and the second locking piece 49 are urged in the approaching direction by the urging force of the spring 50, The substrate support pins 46 are eccentrically rotated to contact the outer peripheral surface of the substrate 21,
The substrate 21 is held.

The holding of the substrate 21 held by the urging force of the spring 50 is released by the cylinder 51. That is, as shown in FIG. 3, a piston rod 52 is slidably provided in the cylinder 51, and a roller body 5 is provided at the tip of the piston rod 52.
3 is attached. When the piston rod 52 is urged in a direction to protrude from the cylinder 51, the roller body 53 presses the first locking piece 48 and rotates the outer cylinder rotating body 38 in the direction of the arrow.

In this case, the motor 36 is provided with, for example, a lock mechanism, and the second locking piece 49 provided on the inner cylinder rotating shaft 23 interlocked with the motor 36 by the lock mechanism is provided. Locked, only the outer cylinder rotating body 38 is rotated in the direction of the arrow by the roller body 53 via the first locking piece 48. As a result, the holding plate 44 rotates in the direction of the arrow via the first and second levers 41 and 43, so that the substrate holding pins 46 rotate eccentrically in a direction away from the outer peripheral surface of the substrate 21. That is, the holding of the substrate 21 is released.

A liquid receiving cup 54 for preventing the washing liquid and the like from the substrate 21 from scattering to the outside when the substrate 21 is rotated at a high speed.
Are formed.

A nozzle 55 for supplying a cleaning liquid to the substrate 21 mounted on the rotator 22 is provided above the rotator 22 at a predetermined distance above the rotator 22. Have been.

The cleaning apparatus 2 having the above configuration
The operation of 0 will be described below. Cleaning treatment device 20
The substrate 21 supplied onto the rotating body 22 is supported by the substrate support mechanism 47 at the lower peripheral portion. By moving the substrate support mechanism 47 up and down, the substrate 21 is adjusted to have an appropriate height. In this case, the holding section 39 is in a state where the holding of the substrate 21 is released, so that the substrate 21 can be easily mounted.

When the lock of the cylinder 51 pressing the first locking piece 48 is released, the holding portion 39 holds the substrate 21 by the restoring force of the spring 50. In this case, when the piston rod 52 slides from the extended state and contracts, the roller body 53 pressing the second locking piece 49 releases the pressing of the second locking piece 49 while being released. The first locking piece 48 is moved by the restoring force of the spring 50 so that the second locking piece 4
9 to rotate.

When the restoring force of the spring 50 is released, the substrate supporting pins 46 formed on the holding plate 44 operate inward of the diameter of the substrate 21, and the restoring force of the spring 50 remains. The substrate 21 is held in contact with the substrate 21 at a predetermined position.

After holding the substrate 21 in this manner, the motor 36 is driven to rotate, and the inner cylinder rotating shaft 23 and the rotating body 22 connected thereto are driven to rotate.
After rotating the substrate 21 in this manner, the substrate 21
A gas such as N _{2 is} supplied to the gas supply path 32
Feed through. Next, a cleaning liquid is supplied from the nozzle 55 above the substrate 21 to the upper surface side of the substrate 21.

In this case, since a gas such as N ₂ is supplied to the back surface of the substrate 21, it is possible to prevent the washing liquid from flowing to the back surface to some extent by the supply pressure of the gas. .

Here, when the cleaning liquid attempts to flow around the back surface of the substrate 21 even by the supply of the gas, the first protrusion 26 formed on the rotating body 22 and the periphery of the lower surface of the substrate 21 are removed. Since the cleaning liquid forms an annular film between the substrate 21 and the portion, the cleaning liquid hardly wraps around the rear surface of the substrate 21 any more.

When the cleaning liquid gets over the first protrusion 26 and goes around the back surface of the substrate 21, the cleaning liquid is formed on the inner side of the rotating body 22 with a diameter smaller than that of the first protrusion 26. The second protrusion 27 prevents the cleaning liquid from entering the inner side of the second protrusion 27. That is, in this case, the space between the first protrusion 26 and the second protrusion 27 is formed as a groove formed in the rotating body 22. Therefore, even if the cleaning liquid enters, the groove is formed. The washing liquid is stored in the shape-like portion to prevent further intrusion.

When the cleaning liquid gets over the second protrusion 27 and intrudes further inward in the radial direction, the rotating body 22
Flows into the through hole 25. However, a liquid receiving portion 29 is formed below the through hole 25 on the outer peripheral surface of the fixed shaft 24. Therefore, the cleaning liquid flowing into the through hole 25 is received by the liquid receiving unit 29. A detection sensor 30 is provided on the bottom surface of the liquid receiving portion 29 so that when the cleaning liquid enters the liquid receiving portion 29, the detection sensor 30 immediately detects the cleaning liquid.

In the present embodiment, when the detection sensor 30 detects the intrusion of the cleaning liquid, the intrusion of the cleaning liquid is transmitted to a control device (not shown) connected to the detection sensor 30, and the intrusion of the cleaning liquid is transmitted. By transmitting the information, the control unit issues an alarm, stops the rotation of the motor 36, and stops the supply of the cleaning liquid from the nozzle 55.

Therefore, the intrusion of the cleaning liquid into the liquid receiving portion 29 can be reliably detected, so that it is possible to reliably prevent the cleaning liquid from overflowing from the liquid receiving portion 29 and entering the bearing 31 portion. Therefore, the cleaning liquid enters into this,
Problems such as corrosion of the internal bearing 31 by the cleaning liquid and the like do not occur, and the rotational drive of the cleaning apparatus 20 can be improved over a long period of time.

After supplying the cleaning liquid through the nozzle 55 for a while, the supply of the cleaning liquid is stopped, and the motor 36 is driven to rotate at a high speed to remove the water such as the cleaning liquid existing on the substrate 21. In this case, the moisture existing on the substrate 21 is scattered by centrifugal force accompanying the high-speed rotation of the substrate 21 and collected by a liquid receiving cup 54 provided on the outermost side of the cleaning apparatus 20, and the cleaning is performed. It is configured to be discharged outside the processing device 20.

After the cleaning of the substrate 21 and the drying of the substrate 21 in this manner, the rotation of the motor 36 is stopped, and the cleaning by rotation of the substrate 21 is stopped. Then, after the rotation of the substrate 21 is stopped, the holding of the substrate 21 by the holding portion 39 is released.

That is, in the holding state, the first locking piece 48 and the second locking piece 49 are biased by the spring 50.
Are elastically restrained, and the holding pins 46 of the holding portion 39 interlocking with the distance between the first locking pieces 48 and the second locking pieces 49 press the outer peripheral surface of the substrate 21 to hold the same. doing. In this case, if the distance between the first locking piece 48 and the second locking piece 49 is increased by pressing the cylinder 51,
3 is pressed to move the support pin 40 provided on the outer cylinder rotating body 38, so that the first lever 41 is actuated to close inward as indicated by the arrow in FIG. I do. Also, the second lever 43 operates so as to open outward in connection with this, so that the holding plate 44 and the substrate support pins 46 are also indicated by arrows in FIG. 3 in conjunction with the second lever 43. To open outward.

By such an operation, the holding of the substrate 21 held by the holding portion 39 is released, and the substrate 21 having been subjected to the cleaning processing and the drying can be taken out.

The embodiment of the present invention has been described above, but the present invention can be variously modified in addition to the above. This is described below. In the above-described embodiment, three substrate supporting mechanisms 47 and three holding parts 39 are provided.
The number of 9 is not limited to this. Further, the substrate support mechanism 47 and the holding section 39 are not limited to the configuration of the above-described embodiment, but may be configured to support the substrate 21 by a mechanism having both functions of the substrate support mechanism 47 and the holding section 39, for example. It does not matter.

Further, in the above embodiment, the first projection 26 and the second projection 27 are provided on the rotating body 22, but the first projection 26 is provided on the rotating body 22.
Alternatively, a configuration in which only the second projection 27 is provided, or a configuration in which the rotating body 22 is provided with a plurality of projections may be used.

In the above embodiment, the first projection 26, the second projection 27, the liquid receiving portion 29, and the detection sensor 30 are all provided. A configuration in which only one is provided (however, the detection sensor 30 is limited to the case where the liquid receiving portion 29 is formed) or a configuration in which these are combined may be used. In addition, various modifications can be made without changing the gist.

[0061]

As described above, according to the first aspect of the present invention, the liquid receiver for receiving the cleaning liquid entering from the gap between the fixed shaft and the rotating body is provided below the rotating body of the fixed shaft. Since the portion is provided, the cleaning liquid that has entered through the gap is reliably received by the liquid receiving portion, so that the cleaning liquid does not enter the internal structure below the liquid receiving portion. Therefore, it is possible to prevent the internal structure from being damaged by the invasion of the cleaning liquid.

According to the second aspect of the present invention, since the liquid receiving portion is provided with the detecting means for detecting the intrusion of the cleaning liquid into the liquid receiving portion, even if the cleaning liquid enters the inside, Can be immediately detected by this detecting means. Therefore, this detection can prevent the cleaning liquid from overflowing from the liquid receiving section.

According to the third aspect of the present invention, the first projection opposed to the lower surface of the outer peripheral portion of the object to be cleaned held by the rotating body is provided around the upper surface of the rotating body.
The first projections allow the cleaning liquid to flow to the back surface of the substrate, making it difficult for the cleaning liquid to adhere.

According to the fourth aspect of the present invention, in addition to the provision of the liquid receiving portion on the fixed shaft below the rotating body, the rotating body is held by the rotating body around the upper surface of the rotating body. Since the first projections are provided so as to oppose the lower surface of the outer peripheral portion of the object to be cleaned, the cleaning liquid is prevented from sneaking into the back side of the substrate, and the cleaning liquid enters the lower side of the rotating body. In this case, the liquid receiving portion can prevent the cleaning liquid from entering the inner surface. Therefore, it is possible to further prevent the damage of the internal structure.

According to the fifth aspect of the present invention, the upper surface of the rotating body is provided with the second projection radially inward of the first projection.
Even if the first protrusions cannot prevent the intrusion of the cleaning liquid, the second protrusions are provided.
It is possible to prevent the cleaning liquid from entering the internal structure by the projections.

[Brief description of the drawings]

FIG. 1 is a front sectional view showing a configuration of a cleaning apparatus according to an embodiment of the present invention.

FIG. 2 is a plan view showing a configuration of a cleaning apparatus according to the embodiment.

FIG. 3 is a partial cross-sectional view showing an adjustment structure of a holding state of the substrate of the cleaning apparatus according to the embodiment;

FIG. 4 is a front sectional view showing a configuration of a cleaning apparatus according to a conventional example of the present invention.

[Explanation of symbols]

 Reference Signs List 20 cleaning apparatus 21 substrate 22 rotating body 23 inner cylinder rotating shaft 24 fixed shaft 26 first projection 27 second projection 29 liquid receiving unit 30 detection sensor 36 motor 38 Outer cylinder rotating body 39 holding section 44 holding pin 46 board support pin 47 board support mechanism 51 cylinder 55 nozzle

Claims (5)

[Claims] 1. A cleaning apparatus for performing a cleaning process while rotating an object to be cleaned, comprising: a rotating body that holds the object to be cleaned at an upper portion; and a lower surface side of the rotating body that is formed in a hollow cylindrical shape. A rotating shaft provided integrally with the rotating shaft; the rotating shaft is inserted into the rotating shaft, rotatably supports the rotating shaft, and has an upper end protruding from a through hole formed in a center portion of the rotating body. A fixed shaft, a driving unit for driving the rotating shaft to rotate, and a liquid provided at a portion of the fixed shaft located below the rotating body, for receiving a cleaning liquid that enters a gap between the fixed shaft and the rotating body. A cleaning unit, comprising: a receiving unit. 2. The substrate cleaning apparatus according to claim 1, wherein said liquid receiving portion is provided with a detecting means for detecting intrusion of said cleaning liquid into said liquid receiving portion. 3. A cleaning apparatus for performing a cleaning process while rotating an object to be cleaned, comprising: a rotating body on which the object to be cleaned is held; and a rotating body provided around the upper surface of the rotating body and held by the rotating body. A first protrusion that is spaced apart from the lower surface of the outer peripheral portion of the object to be cleaned, and a cylindrical rotation shaft that is formed in a cylindrical shape having a hollow inside and is integrally provided on the lower surface side of the rotating body; A fixed shaft that is inserted into the inside of the rotating shaft, rotatably supports the rotating shaft, and has an upper end provided to protrude from a through hole formed on a center portion side of the rotating body; and rotates the rotating shaft. A cleaning processing apparatus comprising: a driving unit that drives the cleaning processing apparatus. 4. The cleaning process according to claim 1, wherein the rotating body is provided with a first protrusion which is spaced apart and opposed to a lower surface of an outer peripheral portion of an object to be cleaned held by the rotating body. apparatus. 5. The cleaning apparatus according to claim 3, wherein a second projection is provided radially inward of the first projection on an upper surface of the rotating body.