JPH10208996A5 - - Google Patents

Info

Publication number
JPH10208996A5
JPH10208996A5 JP1997005441A JP544197A JPH10208996A5 JP H10208996 A5 JPH10208996 A5 JP H10208996A5 JP 1997005441 A JP1997005441 A JP 1997005441A JP 544197 A JP544197 A JP 544197A JP H10208996 A5 JPH10208996 A5 JP H10208996A5
Authority
JP
Japan
Prior art keywords
electron
electron beam
optical system
apertures
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997005441A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10208996A (ja
JP3832914B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP00544197A priority Critical patent/JP3832914B2/ja
Priority claimed from JP00544197A external-priority patent/JP3832914B2/ja
Priority to US09/007,107 priority patent/US5981954A/en
Publication of JPH10208996A publication Critical patent/JPH10208996A/ja
Publication of JPH10208996A5 publication Critical patent/JPH10208996A5/ja
Application granted granted Critical
Publication of JP3832914B2 publication Critical patent/JP3832914B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP00544197A 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法 Expired - Fee Related JP3832914B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP00544197A JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法
US09/007,107 US5981954A (en) 1997-01-16 1998-01-14 Electron beam exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00544197A JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JPH10208996A JPH10208996A (ja) 1998-08-07
JPH10208996A5 true JPH10208996A5 (enrdf_load_stackoverflow) 2004-11-11
JP3832914B2 JP3832914B2 (ja) 2006-10-11

Family

ID=11611295

Family Applications (1)

Application Number Title Priority Date Filing Date
JP00544197A Expired - Fee Related JP3832914B2 (ja) 1997-01-16 1997-01-16 電子ビーム露光装置及び該装置を用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3832914B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4756776B2 (ja) * 2001-05-25 2011-08-24 キヤノン株式会社 荷電粒子線露光装置、荷電粒子線露光方法およびデバイス製造方法
EP2302458B1 (en) * 2002-10-25 2016-09-14 Mapper Lithography Ip B.V. Lithography system
JP2006032613A (ja) * 2004-07-15 2006-02-02 Hitachi High-Technologies Corp 電子ビーム電流計測方法、電子ビーム描画方法および装置
JP2012238770A (ja) * 2011-05-12 2012-12-06 Canon Inc 静電レンズアレイ、描画装置、及びデバイスの製造方法
JP6195349B2 (ja) * 2013-04-26 2017-09-13 キヤノン株式会社 描画装置、描画方法、および物品の製造方法

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