JPH10168559A - Organic thin film forming device and method for reutilizing organic material - Google Patents
Organic thin film forming device and method for reutilizing organic materialInfo
- Publication number
- JPH10168559A JPH10168559A JP34265396A JP34265396A JPH10168559A JP H10168559 A JPH10168559 A JP H10168559A JP 34265396 A JP34265396 A JP 34265396A JP 34265396 A JP34265396 A JP 34265396A JP H10168559 A JPH10168559 A JP H10168559A
- Authority
- JP
- Japan
- Prior art keywords
- organic material
- organic
- shutter
- thin film
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011368 organic material Substances 0.000 title claims abstract description 118
- 239000010409 thin film Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims abstract description 13
- 238000001704 evaporation Methods 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 230000008020 evaporation Effects 0.000 claims description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 150000002894 organic compounds Chemical class 0.000 claims description 9
- 238000005401 electroluminescence Methods 0.000 claims description 6
- 239000000178 monomer Substances 0.000 claims description 5
- 238000003860 storage Methods 0.000 claims description 5
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 239000002826 coolant Substances 0.000 abstract description 4
- 238000012216 screening Methods 0.000 abstract 2
- 239000010408 film Substances 0.000 description 15
- 238000010586 diagram Methods 0.000 description 7
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000008236 heating water Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、例えば、有機ＥＬ
（電界発光）素子等を製造する際に、基板上に有機化合
物の蒸着膜を形成するための有機薄膜形成装置及び有機
材料の再利用方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention
(Electroluminescence) The present invention relates to an organic thin-film forming apparatus for forming a vapor-deposited film of an organic compound on a substrate when manufacturing an element or the like, and a method of reusing an organic material.
【０００２】[0002]
【従来の技術】従来、半導体を中心としたエレクトロニ
クスは無機物を対象として発展してきたが、近年、有機
化合物を用いた機能性薄膜が着目されている。有機化合
物を利用する理由として、 無機物より多様な反応系・特性が利用できる。 無機物より低エネルギーで表面処理ができる。 ということがあげられる。2. Description of the Related Art Conventionally, semiconductors and other electronics have been developed for inorganic substances, but in recent years, functional thin films using organic compounds have attracted attention. As a reason for using organic compounds, a wider variety of reaction systems and characteristics can be used than inorganic compounds. Surface treatment can be performed with lower energy than inorganic substances. That is mentioned.
【０００３】このような機能性薄膜として、有機ＥＬ素
子・圧電センサ・焦電センサ・電気絶縁膜等がある。こ
のような機能性薄膜は、主として蒸着によって形成され
るが、これらのうち、特に有機ＥＬ素子は、ディスプレ
イパネルとして利用が可能であることから、蒸着成膜の
大面積化が求められている。[0003] As such a functional thin film, there are an organic EL element, a piezoelectric sensor, a pyroelectric sensor, an electric insulating film and the like. Such a functional thin film is mainly formed by vapor deposition, and among them, particularly, an organic EL element can be used as a display panel. Therefore, a large area of the vapor deposition film formation is required.
【０００４】図５は、従来の有機薄膜形成装置の概略構
成を示すものである。図５に示すように、この有機薄膜
形成装置１００は、図示しない真空排気系に連結される
真空槽１０１を有し、この真空槽の下部に設けられる導
入部１０１Ａ、１０１Ｂに、複数の有機材料用蒸発源１
０２Ａ、１０２Ｂが仕切板１０３を挟んで両側に配設さ
れる。FIG. 5 shows a schematic configuration of a conventional organic thin film forming apparatus. As shown in FIG. 5, the organic thin film forming apparatus 100 has a vacuum chamber 101 connected to a vacuum evacuation system (not shown), and a plurality of organic materials are provided in introduction sections 101A and 101B provided at the lower part of the vacuum chamber. Evaporation source 1
02A and 102B are disposed on both sides of the partition plate 103.
【０００５】有機材料用蒸発源１０２Ａ、１０２Ｂの上
方近傍には、有機材料の蒸気を閉じこめておくためのシ
ャッター１０４Ａ、１０４Ｂがそれぞれ設けられ、これ
らのシャッター１０４Ａ、１０４の上方近傍には、成膜
速度を測定するための膜厚モニター１０５Ａ、１０５Ｂ
が設けられる。[0005] Shutters 104A and 104B are provided near the organic material evaporation sources 102A and 102B to confine the vapor of the organic material, respectively. Film thickness monitors 105A and 105B for measuring speed
Is provided.
【０００６】一方、真空槽１０１の上部には、蒸着膜を
成膜すべき基板１０６が配置される。そして、基板５４
の上方に、加熱部１０７を有する加熱手段１０８が、基
板１０６に密着するように設けられる。さらに、基板１
０６の下方には、有機材料の蒸気を遮るためのメインシ
ャッター１０９が設けられる。On the other hand, a substrate 106 on which a deposition film is to be formed is disposed above the vacuum chamber 101. Then, the substrate 54
A heating unit 108 having a heating unit 107 is provided above the substrate so as to be in close contact with the substrate 106. Further, the substrate 1
Below 06, a main shutter 109 for blocking the vapor of the organic material is provided.
【０００７】この有機薄膜形成装置１００を用いて基板
１０６上に蒸着を行う場合には、真空槽１０１内の真空
排気を行い、シャッター１０４Ａ、１０４Ｂ及びメイン
シャッター１０９を閉じた状態で有機材料用蒸発源１０
２Ａ、１０２Ｂ内の有機材料を所定の温度に加熱する。When vapor deposition is performed on the substrate 106 using the organic thin film forming apparatus 100, the vacuum chamber 101 is evacuated and the shutters 104A and 104B and the main shutter 109 are closed. Source 10
The organic materials in 2A and 102B are heated to a predetermined temperature.
【０００８】そして、各有機材料が所定の温度に達して
所要の蒸発量が得られた後に、シャッター１０４Ａ、１
０４Ｂ及びメインシャッター１０９を開き、所定の析出
速度で基板１０６上に有機材料を蒸着し、堆積させて所
定の厚みの有機薄膜を形成した後にシャッター１０４
Ａ、１０４Ｂ及びメインシャッター１０９を閉じる。After each organic material reaches a predetermined temperature and a required amount of evaporation is obtained, the shutters 104A, 104A,
04B and the main shutter 109 are opened, an organic material is deposited on the substrate 106 at a predetermined deposition rate, and an organic thin film having a predetermined thickness is formed.
A, 104B and the main shutter 109 are closed.
【０００９】[0009]
【発明が解決しようとする課題】しかしながら、従来の
有機薄膜形成装置１００の場合、有機材料用蒸発源１０
１Ａ、１０１Ｂ内の有機材料が所定の温度に達して所要
の蒸発量が得られるまでシャッター１０４Ａ、１０４Ｂ
を閉じておく必要があるため、シャッター１０４Ａ、１
０４Ｂの裏面、すなわち、有機材料用蒸発源１０１Ａ、
１０１Ｂと対向する面に有機材料が付着するという問題
がある。However, in the case of the conventional organic thin film forming apparatus 100, the evaporation source 10 for organic material is used.
Shutters 104A, 104B until the organic material in 1A, 101B reaches a predetermined temperature and a required amount of evaporation is obtained.
Need to be closed, the shutters 104A, 1
04B, that is, the organic material evaporation source 101A,
There is a problem that the organic material adheres to the surface facing 101B.
【００１０】このシャッター１０４Ａ、１０４Ｂの裏面
に付着した有機材料をそのまま放置しておくと、シャッ
ター１０４Ａ、１０４Ｂの開閉の際の振動によってこの
有機材料が粉体として舞い上がり、その結果、均一な厚
みの蒸着膜が得られない場合がある。このため、従来の
装置においては、頻繁にシャッター１０４Ａ、１０４Ｂ
の清掃を行わなければならなかった。If the organic material adhering to the back surfaces of the shutters 104A and 104B is left as it is, the organic material flies as a powder due to vibrations when the shutters 104A and 104B are opened and closed, and as a result, a uniform thickness is obtained. In some cases, a deposited film cannot be obtained. For this reason, in the conventional apparatus, the shutters 104A, 104B
Had to do the cleaning.
【００１１】また、従来、シャッター１０４Ａ、１０４
Ｂの裏面に付着した有機材料は捨てられていたが、この
種の有機材料は高価なものもあり、しかも、真空中で再
蒸発された有機材料は精製されている場合が多いため、
再利用したいという要望もあった。Conventionally, shutters 104A, 104
The organic material adhering to the back surface of B was discarded, but this kind of organic material is expensive, and the organic material re-evaporated in vacuum is often purified.
There was also a request to reuse.
【００１２】本発明は、このような従来の技術の課題を
解決するためになされたもので、有機材料用蒸発源から
の蒸気を遮蔽するためのシャッターに付着した有機材料
を容易に回収することができる有機薄膜形成装置及び有
機材料の再利用方法を提供することを目的とする。SUMMARY OF THE INVENTION The present invention has been made to solve the problems of the prior art, and it is intended to easily recover an organic material attached to a shutter for shielding vapor from an organic material evaporation source. It is an object of the present invention to provide an organic thin film forming apparatus and a method for recycling an organic material.
【００１３】[0013]
【課題を解決するための手段】上記目的を達成するた
め、請求項１記載の発明は、真空槽中で所定の有機材料
を蒸発させて基体上に有機薄膜を形成するための蒸発源
と、該蒸発源から蒸発した上記有機材料の蒸気を所定の
蒸発速度が得られるまで遮蔽し封じ込めておくためのシ
ャッターと、該シャッターに付着した上記有機材料を加
熱して再蒸発させるための加熱手段と、該シャッターか
ら蒸発した上記有機材料を捕獲して収容する収容手段と
を備えたことを特徴とする有機薄膜形成装置である。In order to achieve the above object, the invention according to claim 1 comprises an evaporation source for evaporating a predetermined organic material in a vacuum chamber to form an organic thin film on a substrate; A shutter for shielding and containing the vapor of the organic material evaporated from the evaporation source until a predetermined evaporation rate is obtained, and a heating means for heating and re-evaporating the organic material attached to the shutter. And an accommodating means for accommodating and accommodating the organic material evaporated from the shutter.
【００１４】この場合、請求項２記載の発明のように、
請求項１記載の発明において、収容手段が真空槽中の蒸
気を冷却するための冷却手段を有することも効果的であ
る。In this case, as in the invention according to claim 2,
In the first aspect of the present invention, it is also effective that the storage means has a cooling means for cooling the steam in the vacuum chamber.
【００１５】また、請求項３記載の発明のように、請求
項２記載の発明において、液体窒素によって真空槽中の
蒸気を冷却する冷却手段を有することも効果的である。Further, as in the third aspect of the invention, in the second aspect of the invention, it is effective to have a cooling means for cooling the vapor in the vacuum chamber with liquid nitrogen.
【００１６】さらに、請求項４記載の発明のように、請
求項１乃至３のいずれかに記載の発明において、所定の
有機材料が有機エレクトロルミネッセンス素子を形成す
るための有機化合物モノマーである場合に特に効果があ
る。Further, as in the invention according to the fourth aspect, in the invention according to any one of the first to third aspects, when the predetermined organic material is an organic compound monomer for forming an organic electroluminescence element, Especially effective.
【００１７】一方、請求項５記載の発明は、真空蒸着用
蒸発源から蒸発した所定の有機材料の蒸気をシャッター
によって所定の蒸発速度が得られるまで遮蔽し封じ込め
ておく有機薄膜形成装置において、該シャッターに付着
した上記有機材料を加熱して再蒸発させ、この有機材料
を捕獲収容して再び蒸発材料として用いることを特徴と
する有機蒸発材料の再利用方法である。On the other hand, the invention according to claim 5 is an organic thin film forming apparatus for shielding a vapor of a predetermined organic material evaporated from a vacuum evaporation source until a predetermined evaporation rate is obtained by a shutter. A method of recycling an organic evaporation material, wherein the organic material attached to the shutter is heated and re-evaporated, and the organic material is captured and stored and used again as an evaporation material.
【００１８】この場合、請求項６記載の発明のように、
請求項５記載の発明において、シャッターから再蒸発し
た有機材料の蒸気を冷却して捕獲収容することも効果的
である。In this case, as in the invention described in claim 6,
In the invention described in claim 5, it is also effective to cool and capture and store the vapor of the organic material re-evaporated from the shutter.
【００１９】また、請求項７記載の発明のように、請求
項６記載の発明において、液体窒素によって有機材料の
蒸気を冷却することも効果的である。In the invention according to the sixth aspect, it is also effective to cool the vapor of the organic material with liquid nitrogen.
【００２０】さらに、請求項８記載の発明のように、請
求項５乃至７のいずれかに記載の発明において、所定の
有機材料が有機エレクトロルミネッセンス素子を形成す
るための有機化合物モノマーである場合に特に効果があ
る。Furthermore, as in the invention according to claim 8, in the invention according to any one of claims 5 to 7, when the predetermined organic material is an organic compound monomer for forming an organic electroluminescence element, Especially effective.
【００２１】かかる構成を有する請求項１記載の発明の
場合、シャッターに付着した有機材料を加熱手段によっ
て加熱し、蒸発した有機材料を収容手段によって捕獲し
て収容するようにしたことから、有機材料用蒸発源と対
向するシャッターの面を容易に有機材料の付着しない状
態とすることができ、その結果、成膜時におけるシャッ
ターの開閉の際の振動によって有機材料が粉体として舞
い上がることがなくなり、また、頻繁に清掃する必要も
なくなる。In the case of the present invention having the above-mentioned structure, the organic material attached to the shutter is heated by the heating means, and the evaporated organic material is captured and stored by the storage means. The surface of the shutter facing the evaporation source for use can easily be in a state where the organic material does not adhere, and as a result, the organic material does not fly up as powder due to vibration when opening and closing the shutter during film formation, Also, there is no need for frequent cleaning.
【００２２】この場合、請求項２記載の発明のように、
収容手段が真空槽中の蒸気を冷却するための冷却手段を
有し、特に、請求項３記載の発明のように、液体窒素に
よって冷却するように構成すれば、有機材料の蒸気が捕
獲されやすくなる。In this case, as in the second aspect of the present invention,
The storage means has a cooling means for cooling the vapor in the vacuum chamber. In particular, if the storage means is configured to cool with liquid nitrogen as in the invention of claim 3, the vapor of the organic material is easily captured. Become.
【００２３】また、請求項５記載の発明のように、シャ
ッターに付着した有機材料を加熱して再蒸発させ、この
有機材料を捕獲収容して再び蒸発材料として用いた場
合、このシャッターに付着した有機材料は、真空中で蒸
発されたものであるため、精製されている場合が多く、
純度の高い有機蒸発材料を得ることができる。Further, when the organic material adhered to the shutter is heated and re-evaporated, and the organic material is captured and stored and used again as an evaporating material as in the fifth aspect of the present invention, the organic material adhered to the shutter is removed. Organic materials are often purified in vacuum because they have been evaporated,
An organic evaporation material with high purity can be obtained.
【００２４】この場合、請求項６記載の発明のように、
シャッターから再蒸発した有機材料の蒸気を冷却して捕
獲収容し、特に、請求項７記載の発明のように、液体窒
素によって所定の有機材料の蒸気を冷却すれば、有機材
料の蒸気が捕獲されやすくなり、有機材料の回収率が向
上する。In this case, as in the sixth aspect of the present invention,
The vapor of the organic material re-evaporated from the shutter is cooled and captured and accommodated. In particular, when the vapor of the predetermined organic material is cooled by liquid nitrogen as in the invention of claim 7, the vapor of the organic material is captured. This facilitates the recovery of the organic material.
【００２５】また、請求項４又は８記載の発明のよう
に、所定の有機材料が有機エレクトロルミネッセンス素
子を形成するための有機化合物モノマーである場合に
は、高価な材料を無駄にすることがなくなる。In the case where the predetermined organic material is an organic compound monomer for forming an organic electroluminescence device, as in the invention according to claim 4 or 8, no waste of expensive materials is achieved. .
【００２６】[0026]
【発明の実施の形態】以下、本発明に係る有機薄膜形成
装置及び有機材料の再利用方法の好ましい実施の形態を
図１〜４を参照して詳細に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of an organic thin film forming apparatus and an organic material recycling method according to the present invention will be described below in detail with reference to FIGS.
【００２７】図３は、本実施の形態に係る有機薄膜形成
装置の一例を示すものである。図３に示すように、この
有機薄膜形成装置１は、例えばクライオポンプ等の真空
排気系（図示せず）に連結される真空槽２を有し、この
真空槽２の下部に設けられる複数の導入部２Ａ、２Ｂ
に、有機材料用蒸発源３（３Ａ、３Ｂ）が仕切板１５を
挟んでそれぞれ配設される。FIG. 3 shows an example of the organic thin film forming apparatus according to the present embodiment. As shown in FIG. 3, the organic thin film forming apparatus 1 has a vacuum chamber 2 connected to a vacuum evacuation system (not shown) such as a cryopump, and a plurality of vacuum chambers 2 provided below the vacuum chamber 2. Introduction parts 2A, 2B
In addition, the organic material evaporation sources 3 (3A, 3B) are disposed with the partition plate 15 therebetween.
【００２８】各有機材料用蒸発源３Ａ、３Ｂの内部に
は、例えば、有機ＥＬ素子を作製するための有機化合物
オリゴマーとして、Ａｌｑ3［Tris(8-hydroxyquinolin
e) aluminium, sublimed］を初め、種々のものが充填さ
れる。In each of the organic material evaporation sources 3A and 3B, for example, Alq 3 [Tris (8-hydroxyquinolin) is used as an organic compound oligomer for producing an organic EL device.
e) aluminum, sublimed].
【００２９】[0029]
【化１】 Embedded image
【００３０】各有機材料用蒸発源３Ａ、３Ｂの上側近傍
には、有機材料の蒸気を遮断し封じこめておくためのシ
ャッター４（４Ａ、４Ｂ）がそれぞれ設けられ、これら
のシャッター４Ａ、４Ｂの上部には、後述する有機材料
を加熱するためのヒーター５（５Ａ、５Ｂ）がそれぞれ
設けられている。なお、各シャッター４Ａ、４Ｂの上方
近傍には、成膜速度を測定するための膜厚モニター６
（６Ａ、６Ｂ）が設けられる。Near the upper sides of the organic material evaporation sources 3A and 3B, shutters 4 (4A and 4B) for shutting off and sealing the vapor of the organic material are provided, respectively. At the upper part, heaters 5 (5A, 5B) for heating an organic material described later are provided, respectively. Note that a film thickness monitor 6 for measuring a film forming speed is provided near the upper part of each of the shutters 4A and 4B.
(6A, 6B) are provided.
【００３１】また、各有機材料用蒸発源３Ａ、３Ｂの周
囲には、シュラウド７が設けられている。このシュラウ
ド７は、後述するようにその内部に液体窒素等が循環さ
れるもので、各有機材料用蒸発源３Ａ、３Ｂ周辺の水分
及びシャッター４Ａ、４Ｂから再蒸発する有機材料１４
の蒸気を捕獲する機能を有するものである。A shroud 7 is provided around each of the organic material evaporation sources 3A and 3B. The shroud 7 circulates liquid nitrogen or the like therein, as described later. The shroud 7 has water around the organic material evaporation sources 3A and 3B and the organic material 14 re-evaporated from the shutters 4A and 4B.
It has a function of capturing steam.
【００３２】一方、真空槽２の上部には、蒸着膜を成膜
すべき基板８が配置される。そして、基板８の上方に、
加熱用の例えば温水パイプ９を有する加熱部１０が、基
板８に密着するように設けられる。さらに、基板８の下
方には、有機材料の蒸気を遮るためのメインシャッター
１１が設けられる。On the other hand, a substrate 8 on which a deposition film is to be formed is disposed above the vacuum chamber 2. Then, above the substrate 8,
For example, a heating unit 10 having a heating water pipe 9 for heating is provided so as to be in close contact with the substrate 8. Further, below the substrate 8, a main shutter 11 for blocking the vapor of the organic material is provided.
【００３３】また、真空槽２の側壁の近傍には、基板８
及びメインシャッター１１を取り囲むようにシュラウド
１２が設けられる。このシュラウド１２は、その内部に
液体窒素等が循環されるもので、基板８の周辺の水分及
び真空槽２の内壁から再蒸発する有機材料１４の蒸気を
捕獲する機能を有するものである。In the vicinity of the side wall of the vacuum chamber 2, the substrate 8
A shroud 12 is provided so as to surround the main shutter 11. The shroud 12 circulates liquid nitrogen or the like therein, and has a function of capturing moisture around the substrate 8 and vapor of the organic material 14 re-evaporating from the inner wall of the vacuum chamber 2.
【００３４】さらに、真空槽２には、窒素ガス等の不活
性ガスを真空槽２内に導入するためのガス導入手段１３
が連結されている。Further, gas introduction means 13 for introducing an inert gas such as nitrogen gas into the vacuum chamber 2 is provided in the vacuum chamber 2.
Are connected.
【００３５】図１は、本実施の形態の要部を示すもの
で、図１（ａ）は、一つのシャッター４近傍の構成を示
す概略構成図、図１（ｂ）は、シャッター４に付着した
有機材料の再利用方法を示す説明図である。FIG. 1 shows a main part of the present embodiment. FIG. 1A is a schematic configuration diagram showing a configuration in the vicinity of one shutter 4, and FIG. It is an explanatory view showing a recycling method of an organic material.
【００３６】図１（ａ）に示すように、有機材料用蒸発
源３の上方に設けられるシャッター４は、アーム４０に
よって支柱４１に取り付けられ、水平方向に回動自在と
なっている。シャッター４の上面に設けられるヒーター
５は、リード線５０を介して真空槽２の外部に設けた電
源装置５１に接続されている。As shown in FIG. 1A, a shutter 4 provided above the organic material evaporation source 3 is attached to a support column 41 by an arm 40, and is rotatable in a horizontal direction. The heater 5 provided on the upper surface of the shutter 4 is connected to a power supply device 51 provided outside the vacuum chamber 2 via a lead wire 50.
【００３７】シャッター４は、例えば、チタン（Ｔ
ｉ）、モリブデン（Ｍｏ）等の高融点金属製の円盤状の
部材からなり、その下面には鏡面が形成されている。The shutter 4 is made of, for example, titanium (T
i), a disc-shaped member made of a high melting point metal such as molybdenum (Mo), and a mirror surface is formed on the lower surface thereof.
【００３８】一方、図１（ｂ）に示すように、有機材料
用蒸発源４の周囲に設けられるシュラウド７の内部に
は、例えば、液体窒素等の冷却媒体７１が充填されてい
る。また、シュラウド７の上面には、シャッター４の下
面に付着した有機材料１４を回収するための凹部からな
る収容部７０が形成されている。On the other hand, as shown in FIG. 1B, the inside of the shroud 7 provided around the organic material evaporation source 4 is filled with a cooling medium 71 such as liquid nitrogen. On the upper surface of the shroud 7, there is formed an accommodating portion 70 composed of a concave portion for collecting the organic material 14 attached to the lower surface of the shutter 4.
【００３９】そして、図２に示すように、シャッター４
は、有機材料用蒸発源３の上方とシュラウド７の収容部
７０の上方との間を移動するように構成されている。こ
の場合、シャッター４はシュラウド７の収容部７０にご
く近接するように配される。Then, as shown in FIG.
Is configured to move between above the organic material evaporation source 3 and above the housing 70 of the shroud 7. In this case, the shutter 4 is disposed so as to be very close to the housing 70 of the shroud 7.
【００４０】また、図１及び図２に示すように、シュラ
ウド７の収容部７０はシャッター４の直径より大きい直
径を有する円形形状を有し、かつ、有機材料用蒸発源３
の口径より大きい直径を有するように構成される。As shown in FIGS. 1 and 2, the housing 70 of the shroud 7 has a circular shape having a diameter larger than the diameter of the shutter 4, and the evaporation source 3 for the organic material.
It is configured to have a diameter larger than the diameter of.
【００４１】図４は、有機材料用蒸発源３、シャッター
４及びシュラウド７の収容部７０の位置関係を示すもの
である。図４に示すように、真空槽２内において、複数
（図４に示す例では３つ）の同じ構成の有機材料用蒸発
源３（３Ａ、３Ｂ、３Ｃ）、シャッター４（４Ａ、４
Ｂ、４Ｃ）、シュラウド７（７Ａ、７Ｂ、７Ｃ）が設け
られる場合には、各有機材料用蒸発源３Ａ、３Ｂ、３
Ｃ、シャッター４Ａ、４Ｂ、４Ｃ、シュラウド７Ａ、７
Ｂ、７Ｃの収容部７０Ａ、７０Ｂ、７０Ｃが同芯円上に
配置される。そして、各シャッター４Ａ、４Ｂ、４Ｃ
は、支柱４１の回転により有機材料用蒸発源３Ａ、３
Ｂ、３Ｃの上方と上記収容部７０Ａ、７０Ｂ、７０Ｃの
上方との間を移動するように構成される。FIG. 4 shows the positional relationship between the organic material evaporation source 3, the shutter 4, and the accommodating portion 70 for the shroud 7. As shown in FIG. 4, a plurality of (three in the example shown in FIG. 4) organic material evaporation sources 3 (3A, 3B, 3C) and shutters 4 (4A,
B, 4C) and the shroud 7 (7A, 7B, 7C), the organic material evaporation sources 3A, 3B, 3
C, shutters 4A, 4B, 4C, shrouds 7A, 7
The accommodating portions 70A, 70B, 70C of B, 7C are arranged on a concentric circle. And each shutter 4A, 4B, 4C
Are the evaporation sources 3A, 3
It is configured to move between above B, 3C and above the accommodation sections 70A, 70B, 70C.
【００４２】このような構成を有する本実施の形態にお
いて、基板８上に有機薄膜を形成する場合には、真空槽
２内の真空排気を行って真空槽２内を所定の圧力にした
後、シャッター３及びメインシャッター１１を閉じた状
態で各有機材料用蒸発源３内の有機材料を所定の温度に
加熱する。In the present embodiment having such a configuration, when an organic thin film is formed on the substrate 8, the inside of the vacuum chamber 2 is evacuated to a predetermined pressure after evacuation of the vacuum chamber 2. The organic material in each organic material evaporation source 3 is heated to a predetermined temperature with the shutter 3 and the main shutter 11 closed.
【００４３】そして、各有機材料用蒸発源３内の有機材
料が所定の温度に達して所要の蒸発量が得られた後に、
シャッター４を開くとともにメインシャッター１１を開
き、所定の析出速度で基板８上に有機材料を蒸着して堆
積させる。そして、所定の厚みの有機薄膜を形成した後
にシャッター４及びメインシャッター１１を閉じる。After the organic material in each organic material evaporation source 3 reaches a predetermined temperature and a required amount of evaporation is obtained,
The shutter 4 is opened and the main shutter 11 is opened, and an organic material is deposited and deposited on the substrate 8 at a predetermined deposition rate. Then, after forming an organic thin film having a predetermined thickness, the shutter 4 and the main shutter 11 are closed.
【００４４】このような真空蒸着を繰り返すと、図１に
示すように、シャッター４の下面に有機材料１４が付着
して堆積する。このシャッター４に付着した有機材料
は、次のような方法によって回収し、再利用することが
できる。When such vacuum deposition is repeated, as shown in FIG. 1, the organic material 14 adheres and deposits on the lower surface of the shutter 4. The organic material attached to the shutter 4 can be collected and reused by the following method.
【００４５】まず、真空槽２の内部の圧力を大気圧に戻
し、図２に示すように、シャッター４を有機材料用蒸発
源３の上方から移動してシュラウド７の収容部７０の上
方に配置させる。First, the pressure inside the vacuum chamber 2 is returned to the atmospheric pressure, and as shown in FIG. 2, the shutter 4 is moved from above the organic material evaporation source 3 and placed above the housing 70 of the shroud 7. Let it.
【００４６】そして、シャッター４の上面に設けたヒー
ター５に通電してシャッター４を加熱し、その下面に付
着した有機材料１４を加熱する。この場合、有機材料１
４が蒸発する温度（例えば、Ａｌｑ3 の場合は３５０℃
程度）で有機材料１４を加熱する。Then, the heater 4 provided on the upper surface of the shutter 4 is energized to heat the shutter 4 and the organic material 14 attached to the lower surface thereof is heated. In this case, the organic material 1
Temperature at which 4 evaporates (for example, 350 ° C. for Alq 3)
), The organic material 14 is heated.
【００４７】この蒸発した有機材料１４の蒸気は、シュ
ラウド７の表面によって冷却され、固体状態となってシ
ュラウド７の収容部７０内に捕獲される。そして、この
有機材料１４を回収すれば、再度蒸着用の有機材料とし
て用いることができる。The vapor of the evaporated organic material 14 is cooled by the surface of the shroud 7 and solidified and captured in the housing 70 of the shroud 7. Then, if the organic material 14 is recovered, it can be used again as an organic material for vapor deposition.
【００４８】このような構成を有する本実施の形態によ
れば、容易にシャッター４の下面を有機材料１４の付着
しない状態とすることができ、その結果、成膜時におけ
るシャッター４の開閉の際の振動によって有機材料１４
が粉体として舞い上がることはない。このため、常に均
一な厚みの蒸着膜を得ることができる。また、シャッタ
ー４の清掃を行う頻度を少なくすることができる。According to the present embodiment having such a configuration, the lower surface of the shutter 4 can be easily made to have no organic material 14 attached thereto. As a result, when the shutter 4 is opened and closed during film formation, Material 14 by the vibration of
Do not soar as powder. For this reason, a deposition film having a uniform thickness can always be obtained. Further, the frequency of cleaning the shutter 4 can be reduced.
【００４９】また、シャッター４の下面に付着した有機
材料１４は、真空中で蒸発されたものであるため精製さ
れている場合が多く、純度の高い有機蒸発材料を得るこ
とができる。したがって、これを再利用することによ
り、より高品質の有機薄膜を形成することができる。Since the organic material 14 attached to the lower surface of the shutter 4 has been evaporated in a vacuum, the organic material 14 is often purified, so that a high-purity organic evaporated material can be obtained. Therefore, by reusing this, a higher quality organic thin film can be formed.
【００５０】一方、有機ＥＬ薄膜を形成するための有機
材料は高価なものもあるが、本実施の形態によれば、蒸
発材料を無駄にすることがなく、ひいてはコストダウン
を図ることができる。On the other hand, some organic materials for forming the organic EL thin film are expensive. However, according to the present embodiment, the evaporative material is not wasted, and the cost can be reduced.
【００５１】なお、本発明は上述の実施の形態に限られ
ることなく、種々の変更を行うことができる。例えば、
シャッター４上に設けられるヒーター５のパターンは種
々の形状とすることができる。また、ヒーター５とし
て、赤外線ランプヒーターを始め種々のものを用いるこ
とができる。It should be noted that the present invention is not limited to the above-described embodiment, and various changes can be made. For example,
The pattern of the heater 5 provided on the shutter 4 can have various shapes. Further, as the heater 5, various things such as an infrared lamp heater can be used.
【００５２】また、有機材料１４を収容するための容器
をシュラウド７と別に設けることもできるが、上述した
実施の形態のように、シュラウド７の上面に収容部７０
を設けるようにすれば、よりコンパクトな構成とするこ
とができる。Although a container for accommodating the organic material 14 can be provided separately from the shroud 7, as in the above-described embodiment, the accommodating portion 70 is provided on the upper surface of the shroud 7.
Is provided, a more compact configuration can be achieved.
【００５３】さらに、上述の実施の形態においては、シ
ュラウド７の内部に冷却媒体７１として液体窒素を循環
させるようにしたが、例えば、冷却水を循環させるよう
に構成してもよい。Furthermore, in the above-described embodiment, liquid nitrogen is circulated as the cooling medium 71 inside the shroud 7, but for example, cooling water may be circulated.
【００５４】さらにまた、シャッター４を加熱して有機
材料１４を回収する時期は、任意のものとすることがで
きる。ただし、真空中では有機材料１４の捕獲が困難で
あるため、例えば、メンテナンス時など大気中でシャッ
ター４を加熱することが好ましい。Further, the timing of heating the shutter 4 and recovering the organic material 14 can be arbitrary. However, since it is difficult to capture the organic material 14 in a vacuum, it is preferable to heat the shutter 4 in the atmosphere, for example, during maintenance.
【００５５】さらにまた、本発明は有機ＥＬ素子を作製
するための装置のみならず、例えば、有機センサーを作
製する装置や蒸着重合により高分子薄膜を形成する装置
にも適用することができる。もっとも、本発明は高価な
有機材料を用いる有機ＥＬ素子作製装置において特に効
果が大きいものである。Further, the present invention can be applied not only to an apparatus for producing an organic EL element but also to an apparatus for producing an organic sensor or an apparatus for forming a polymer thin film by vapor deposition polymerization. However, the present invention is particularly effective in an organic EL device manufacturing apparatus using an expensive organic material.
【００５６】[0056]
【発明の効果】以上述べたように本発明によれば、シャ
ッターの有機材料用蒸発源に対向する面を容易に有機材
料の付着しない状態とすることができ、成膜時における
シャッターの開閉の際の振動による有機材料の舞い上が
りを防止することができる。したがって、本発明によれ
ば、常に均一な厚みの蒸着膜を得ることができ、また、
シャッターの清掃を行う頻度を少なくすることができ
る。As described above, according to the present invention, the surface of the shutter facing the organic material evaporation source can easily be made free of the organic material, and the shutter can be opened and closed during film formation. It is possible to prevent soaring of the organic material due to vibration at the time. Therefore, according to the present invention, it is possible to always obtain a deposited film having a uniform thickness,
The frequency of cleaning the shutter can be reduced.
【００５７】さらに、シャッターに付着した有機材料
は、真空中で蒸発されたものであるため精製されている
場合が多く、純度の高い有機蒸発材料を得ることができ
る。したがって、これを再利用することにより、より高
品質の有機薄膜を形成することができる。Further, since the organic material attached to the shutter has been evaporated in a vacuum, it is often purified, so that a highly pure organic evaporated material can be obtained. Therefore, by reusing this, a higher quality organic thin film can be formed.
【００５８】一方、有機ＥＬ薄膜を形成するための有機
材料は高価なものもあるが、本発明を用いれば、蒸発材
料を無駄にすることがなく、ひいてはコストダウンを図
ることができる。On the other hand, some organic materials for forming the organic EL thin film are expensive. However, if the present invention is used, the evaporating material is not wasted, and the cost can be reduced.
【図１】図１は、本発明に係る有機薄膜形成装置の実施
の形態の要部を示すもので、図１（ａ）はシャッター近
傍の構成を示す概略構成図、図１（ｂ）はシャッターに
付着した有機材料の再利用方法を示す説明図である。FIG. 1 shows a main part of an embodiment of an organic thin film forming apparatus according to the present invention. FIG. 1 (a) is a schematic configuration diagram showing a configuration near a shutter, and FIG. FIG. 4 is an explanatory diagram showing a method of reusing an organic material attached to a shutter.
【図２】同実施の形態におけるシャッターの移動を示す
説明図である。FIG. 2 is an explanatory diagram showing movement of a shutter in the embodiment.
【図３】同実施の形態の全体構成を示す概略構成図であ
る。FIG. 3 is a schematic configuration diagram showing an overall configuration of the embodiment.
【図４】同実施の形態における有機材料用蒸発源、シャ
ッター及びシュラウドの収容部の位置関係を示す説明図
である。FIG. 4 is an explanatory diagram showing a positional relationship between an organic material evaporation source, a shutter, and a housing portion for a shroud in the embodiment.
【図５】従来の有機薄膜形成装置の概略構成図である。FIG. 5 is a schematic configuration diagram of a conventional organic thin film forming apparatus.
１……有機薄膜形成装置 ２……真空槽 ３（３
Ａ、３Ｂ、３Ｃ）……有機材料用蒸発源 ４（４Ａ、
４Ｂ、４Ｃ）……シャッター ５（５Ａ、５Ｂ、５
Ｃ）……ヒーター ６Ａ、６Ｂ……膜厚モニター
７（７Ａ、７Ｂ、７Ｃ）……シュラウド ８……基板
９……温水パイプ １０……加熱部 １１……メインシャッター １２……シュラウド
１４……有機材料 ５０……リード線 ５１……電
源装置 ７０（７０Ａ、７０Ｂ、７０Ｃ）……収容部
７１……冷却媒体1 ... Organic thin film forming apparatus 2 ... Vacuum chamber 3 (3
A, 3B, 3C) ... evaporation source for organic material 4 (4A,
4B, 4C) Shutter 5 (5A, 5B, 5)
C) ... heater 6A, 6B ... film thickness monitor
7 (7A, 7B, 7C) Shroud 8 Substrate 9 Hot water pipe 10 Heating unit 11 Main shutter 12 Shroud
14 Organic material 50 Lead wire 51 Power supply 70 (70A, 70B, 70C) Housing 71 Cooling medium
Claims (8)
体上に有機薄膜を形成するための蒸発源と、 該蒸発源から蒸発した上記有機材料の蒸気を所定の蒸発
速度が得られるまで遮蔽し封じ込めておくためのシャッ
ターと、 該シャッターに付着した上記有機材料を加熱して再蒸発
させるための加熱手段と、 該シャッターから蒸発した上記有機材料を捕獲して収容
する収容手段とを備えたことを特徴とする有機薄膜形成
装置。An evaporation source for evaporating a predetermined organic material in a vacuum chamber to form an organic thin film on a substrate, and a predetermined evaporation rate of the vapor of the organic material evaporated from the evaporation source. A shutter for shielding and enclosing the organic material, a heating means for heating and re-evaporating the organic material attached to the shutter, and a housing means for capturing and housing the organic material evaporated from the shutter. An organic thin film forming apparatus comprising:
の冷却手段を有することを特徴とする請求項１記載の有
機薄膜形成装置。2. The organic thin film forming apparatus according to claim 1, wherein said storage means has a cooling means for cooling the vapor in the vacuum chamber.
る冷却手段を有することを特徴とする請求項２記載の有
機薄膜形成装置。3. The organic thin film forming apparatus according to claim 2, further comprising cooling means for cooling the vapor in the vacuum chamber with liquid nitrogen.
センス素子を形成するための有機化合物モノマーである
ことを特徴とする請求項１乃至３のいずれか１項記載の
有機薄膜形成装置。4. The organic thin film forming apparatus according to claim 1, wherein the predetermined organic material is an organic compound monomer for forming an organic electroluminescence device.
材料の蒸気をシャッターによって所定の蒸発速度が得ら
れるまで遮蔽し封じ込めておく有機薄膜形成装置におい
て、該シャッターに付着した上記有機材料を加熱して再
蒸発させ、この有機材料を捕獲収容して再び蒸発材料と
して用いることを特徴とする有機蒸発材料の再利用方
法。5. An organic thin film forming apparatus for shielding a vapor of a predetermined organic material evaporated from an evaporation source for vacuum deposition by a shutter until a predetermined evaporation rate is obtained, wherein said organic material adhered to said shutter is removed. A method for reusing an organic evaporated material, wherein the organic evaporated material is heated and re-evaporated, and the organic material is captured and stored and used again as an evaporated material.
を冷却して捕獲収容することを特徴とする請求項５記載
の有機蒸発材料の再利用方法。6. The method according to claim 5, wherein the vapor of the organic material re-evaporated from the shutter is cooled and captured.
ることを特徴とする請求項６記載の有機蒸発材料の再利
用方法。7. The method according to claim 6, wherein the vapor of the organic material is cooled by liquid nitrogen.
センス素子を形成するための有機化合物モノマーである
ことを特徴とする請求項５乃至７のいずれか１項記載の
有機蒸発材料の再利用方法。8. The method according to claim 5, wherein the predetermined organic material is an organic compound monomer for forming an organic electroluminescence device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34265396A JP4059946B2 (en) | 1996-12-06 | 1996-12-06 | Organic thin film forming apparatus and organic material recycling method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34265396A JP4059946B2 (en) | 1996-12-06 | 1996-12-06 | Organic thin film forming apparatus and organic material recycling method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10168559A true JPH10168559A (en) | 1998-06-23 |
| JP4059946B2 JP4059946B2 (en) | 2008-03-12 |
Family
ID=18355445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34265396A Expired - Lifetime JP4059946B2 (en) | 1996-12-06 | 1996-12-06 | Organic thin film forming apparatus and organic material recycling method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4059946B2 (en) |
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