JPH10116779A - ステージ装置 - Google Patents

ステージ装置

Info

Publication number
JPH10116779A
JPH10116779A JP28910996A JP28910996A JPH10116779A JP H10116779 A JPH10116779 A JP H10116779A JP 28910996 A JP28910996 A JP 28910996A JP 28910996 A JP28910996 A JP 28910996A JP H10116779 A JPH10116779 A JP H10116779A
Authority
JP
Japan
Prior art keywords
stage
driving
movement stage
measuring
driving means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28910996A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10116779A5 (enrdf_load_stackoverflow
Inventor
Akimitsu Ebihara
明光 蛯原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP28910996A priority Critical patent/JPH10116779A/ja
Publication of JPH10116779A publication Critical patent/JPH10116779A/ja
Publication of JPH10116779A5 publication Critical patent/JPH10116779A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP28910996A 1996-10-11 1996-10-11 ステージ装置 Pending JPH10116779A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28910996A JPH10116779A (ja) 1996-10-11 1996-10-11 ステージ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28910996A JPH10116779A (ja) 1996-10-11 1996-10-11 ステージ装置

Publications (2)

Publication Number Publication Date
JPH10116779A true JPH10116779A (ja) 1998-05-06
JPH10116779A5 JPH10116779A5 (enrdf_load_stackoverflow) 2004-10-14

Family

ID=17738913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28910996A Pending JPH10116779A (ja) 1996-10-11 1996-10-11 ステージ装置

Country Status (1)

Country Link
JP (1) JPH10116779A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999016113A1 (fr) * 1997-09-19 1999-04-01 Nikon Corporation Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen
JP2005164878A (ja) * 2003-12-02 2005-06-23 Tadahiro Omi 露光装置
US7280182B2 (en) 2003-04-09 2007-10-09 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
KR20190019088A (ko) * 2016-06-20 2019-02-26 넥스페리아 비 브이 반도체 디바이스 위치 결정을 위한 반도체 디바이스 위치 결정 시스템과 방법

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331885B1 (en) 1997-09-19 2001-12-18 Nikon Corporation Stage apparatus, scanning type exposure apparatus, and device produced with the same
US6906782B2 (en) 1997-09-19 2005-06-14 Nikon Corporation Stage apparatus, scanning type exposure apparatus, and device produced with the same
WO1999016113A1 (fr) * 1997-09-19 1999-04-01 Nikon Corporation Platine, dispositif d'alignement de balayage et procede d'exposition de balayage, et dispositif fabrique par ce moyen
US7280182B2 (en) 2003-04-09 2007-10-09 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
JP2005164878A (ja) * 2003-12-02 2005-06-23 Tadahiro Omi 露光装置
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
KR20190019088A (ko) * 2016-06-20 2019-02-26 넥스페리아 비 브이 반도체 디바이스 위치 결정을 위한 반도체 디바이스 위치 결정 시스템과 방법
JP2019518339A (ja) * 2016-06-20 2019-06-27 ネクスペリア ベー．フェー． 半導体デバイス位置決めシステム及び半導体デバイス位置決め方法
TWI752022B (zh) * 2016-06-20 2022-01-11 荷蘭商耐智亞股份有限公司 半導體裝置定位系統及用於定位半導體裝置的方法

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