JPH0914836A - Rotating unit - Google Patents

Rotating unit

Info

Publication number
JPH0914836A
JPH0914836A JP16197495A JP16197495A JPH0914836A JP H0914836 A JPH0914836 A JP H0914836A JP 16197495 A JP16197495 A JP 16197495A JP 16197495 A JP16197495 A JP 16197495A JP H0914836 A JPH0914836 A JP H0914836A
Authority
JP
Japan
Prior art keywords
substrate
unit
substrate holding
rotating
holding pin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP16197495A
Other languages
Japanese (ja)
Inventor
Yoshinori Asano
由義 浅野
Original Assignee
Toshiba Corp
株式会社東芝
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, 株式会社東芝 filed Critical Toshiba Corp
Priority to JP16197495A priority Critical patent/JPH0914836A/en
Publication of JPH0914836A publication Critical patent/JPH0914836A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE: To facilitate the mounting and detaching of a liquid crystal substrate, etc., to and from a mounting part by a method wherein a weight part is pivotally fitted with the position of the gravity center of the weight part being outside so that a substrate holding pin part may tilt outside when the rotating unit is under a stationary state, and the substrate holding pin part may be put under a vertically standing state by a centrifugal force of the weight part when the rotating unit is under a rotating state. CONSTITUTION: On the outside of a substrate mounting part 6 of a rotating unit 2, radial four arm parts 7 are provided in the horizontal direction, and under the center of the substrate mounting part 6, a bearing part 16 which attaches a rotating shaft 4 to transmit the rotating force of a motor to the rotating unit 2, is provided. An end part is formed into a recessed shape for the arm part 7, and on a protruding part 9 of the arm part 7, a hole 10 through which a shaft 15 passes, is provided. Also, on a valley-shaped part 11 of the arm part 7, an inhibiting part 12 which restricts the position of an approx. L-shaped weight part 13 so that a substrate holding pin part 8 with a cylindrical head part may become a vertically standing state when the rotating unit 2 is under a rotating state, is provided. Then, a pivotally fitted part 14 is provided on the weight part 13 which is supported by the substrate holding pin part 8, and the weight part 13 is pivotally fitted in the end part of the arm 7.

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、液晶基板あるいは半導
体基板等の製造において用いられる回転ユニットに係
り、特に載置部への液晶基板あるいは半導体基板等の載
置、離脱を容易にし、基板等の載置、離脱に際して基板
等の位置決め精度を押さえ、基板等の不良の発生を解消
した回転ユニットに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary unit used in manufacturing a liquid crystal substrate, a semiconductor substrate or the like, and in particular, makes it easy to mount or dismount the liquid crystal substrate or the semiconductor substrate on or from a mounting portion, and thus the substrate or the like. The present invention relates to a rotation unit that suppresses the positioning accuracy of a substrate or the like when it is placed or removed, and eliminates the occurrence of defects such as the substrate.
【0002】[0002]
【従来の技術】従来から、液晶基板あるいは半導体基板
等の製造工程において、洗浄された基板等を乾燥させた
り、基板等の表面に例えばレジストを塗布する場合に
は、基板等を回転させることにより、基板等に付着した
液滴を除去したり、基板等の表面に滴下したレジストを
塗布するための、図6に示されるスピン装置1が使用さ
れている。
2. Description of the Related Art Conventionally, in a manufacturing process of a liquid crystal substrate or a semiconductor substrate, a washed substrate or the like is dried, or when the surface of the substrate or the like is coated with, for example, a resist, the substrate or the like is rotated. The spin apparatus 1 shown in FIG. 6 is used to remove droplets attached to a substrate or the like, or to apply resist dropped onto the surface of the substrate or the like.
【0003】スピン装置1は、回転ユニット2、回転力
を発生するモータ3、モータ3から発生した回転力を回
転ユニット2に伝達する回転軸4とから構成され、回転
ユニット2には基板5が載置されている。
The spin device 1 comprises a rotating unit 2, a motor 3 for generating a rotating force, and a rotating shaft 4 for transmitting the rotating force generated by the motor 3 to the rotating unit 2. The rotating unit 2 is provided with a substrate 5. It has been placed.
【0004】図7に示されるように、回転ユニット2は
基板5を載置する基板載置部6と、基板載置部6の外側
に水平方向に放射状に突設され基板5の形状あるいは質
量等により適宜決定された、この場合は4本のアーム部
7とを有している。そして、アーム部7の外側端部には
基板5に対し所定のクリアランスを有して固定され基板
5を基板載置部6のほぼ中心位置に保持する基板保持部
8が固定されている。また、基板載置部6の中心下部に
は、モータ3による回転力を回転ユニット2に伝達する
ための回転軸4を取着する軸受部16が設けられてい
る。
As shown in FIG. 7, the rotating unit 2 has a substrate placing portion 6 on which the substrate 5 is placed, and a shape or mass of the substrate 5 which is provided on the outside of the substrate placing portion 6 so as to radially project in the horizontal direction. In this case, it has four arm portions 7 which are appropriately determined by the above. A substrate holding portion 8 that is fixed to the substrate 5 with a predetermined clearance and holds the substrate 5 at a substantially central position of the substrate mounting portion 6 is fixed to an outer end portion of the arm portion 7. Further, a bearing portion 16 to which the rotary shaft 4 for transmitting the rotational force of the motor 3 to the rotary unit 2 is attached is provided below the center of the substrate platform 6.
【0005】このように構成された回転ユニット2にお
いて、基板5は回転ユニット2が静止状態のとき、不図
示の搬送装置により基板載置部6に載置され、次いで回
転ユニット2は不図示の、例えばモータによる回転力に
より、所定の回転数で回転する。回転ユニット2が回転
すると、基板5はアーム部7の外側端部に固定された基
板保持部8により基板載置部6のほぼ中心位置に保持さ
れ、例えばレジストの塗布といった所定の回転処理が行
われる。所定の回転処理が施行されると回転ユニット2
は静止し、基板5は不図示の搬送装置により基板載置部
6から離脱される。
In the rotating unit 2 thus constructed, the substrate 5 is placed on the substrate placing portion 6 by a carrying device (not shown) when the rotating unit 2 is in a stationary state, and then the rotating unit 2 is not shown. , Is rotated at a predetermined number of revolutions by the rotational force of a motor, for example. When the rotation unit 2 rotates, the substrate 5 is held at a substantially central position of the substrate placing portion 6 by the substrate holding portion 8 fixed to the outer end of the arm portion 7, and a predetermined rotation process such as resist coating is performed. Be seen. When a predetermined rotation process is performed, the rotation unit 2
Stands still, and the substrate 5 is removed from the substrate platform 6 by a transfer device (not shown).
【0006】このような従来の回転ユニット2では、基
板5とアーム部7の外側端部に固定され基板5を基板載
置部6のほぼ中心位置に保持する基板保持部8との間に
設けられたクリアランスを非常に小さく保つ必要があ
り、そのため基板5を基板載置部6に載置したり、離脱
したりすることが困難であるという問題があった。
In the conventional rotary unit 2 as described above, it is provided between the substrate 5 and the substrate holding portion 8 which is fixed to the outer end portion of the arm portion 7 and holds the substrate 5 at the substantially central position of the substrate placing portion 6. There is a problem in that it is difficult to mount or dismount the substrate 5 on or from the substrate mounting portion 6 because it is necessary to keep the created clearance very small.
【0007】また、基板保持部8と基板5の辺縁部とが
接触しやすいため、基板5に割れ、キズ等が発生し、基
板5を破損しやすいという問題があった。
Further, since the substrate holding portion 8 and the peripheral portion of the substrate 5 are likely to come into contact with each other, there is a problem that the substrate 5 is liable to be cracked or scratched, and the substrate 5 is easily damaged.
【0008】さらに、基板5の破損を減少させようとす
ると、基板5を基板載置部6に載置あるいは離脱する際
の位置決め精度を高精度にしなければならないという問
題があった。
Further, in order to reduce the damage of the substrate 5, there is a problem that the positioning accuracy when mounting or dismounting the substrate 5 on the substrate mounting portion 6 must be high.
【0009】[0009]
【発明が解決しようとする課題】本発明は、かかる従来
の問題を解消すべくなされたもので、主たる目的は、特
に載置部への液晶基板あるいは半導体基板等の載置、離
脱を容易にした回転ユニットを提供することを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made to solve such a conventional problem, and its main purpose is to easily mount and dismount a liquid crystal substrate or a semiconductor substrate on a mounting portion. It is an object of the present invention to provide a rotating unit.
【0010】本発明の他の目的は、基板等の載置、離脱
に際して基板等の不良の発生を解消した回転ユニットを
提供することを目的とする。
Another object of the present invention is to provide a rotary unit which eliminates the occurrence of defects in the substrate or the like when mounting or removing the substrate or the like.
【0011】本発明のさらに他の目的は、基板等の載
置、離脱に際して基板等の位置決め精度を押さえた回転
ユニットを提供することを目的とする。
Still another object of the present invention is to provide a rotary unit which suppresses the positioning accuracy of a substrate or the like when placing or removing the substrate or the like.
【0012】[0012]
【課題を解決するための手段】本発明の回転ユニット
は、回転可能な基板載置部と前記基板載置部の外側に等
配して設けられ基板を前記基板載置部のほぼ中心位置に
保持する基板保持部とを有する回転ユニットにおいて、
前記基板保持部が、前記基板を保持する基板保持ピン部
と前記基板保持ピン部の下部に連結する前記基板保持ピ
ン部の中心軸から偏心した重心を持つ重錘部とからな
り、前記回転ユニットが静止状態のとき前記基板保持ピ
ン部が外側に傾斜し、前記回転ユニットが回転状態のと
き前記基板保持ピン部が前記重錘部が遠心力により直立
状態となるように、前記重錘部の重心位置を外側にし
て、前記重錘部を前記基板載置部の外側端部へ枢着して
なることを特徴としている。
According to another aspect of the present invention, there is provided a rotating unit according to the invention, wherein a rotatable substrate mounting portion and a substrate mounting portion are provided on the outer side of the substrate mounting portion so as to be disposed at a substantially central position. In a rotation unit having a substrate holding unit for holding,
The substrate holding portion includes a substrate holding pin portion that holds the substrate and a weight portion that has a center of gravity that is eccentric from a central axis of the substrate holding pin portion that is connected to a lower portion of the substrate holding pin portion. When the stationary unit is in a stationary state, the substrate holding pin portion inclines outward, and when the rotating unit is in a rotating state, the substrate holding pin portion has the weight portion so that the weight portion is in an upright state by centrifugal force. It is characterized in that the position of the center of gravity is on the outer side, and the weight portion is pivotally attached to the outer end portion of the substrate mounting portion.
【0013】また、本発明の回転ユニットは、回転可能
な基板載置部と前記基板載置部の外側に水平方向に放射
状に突設された複数のアーム部と前記アーム部の外側端
部に設けられ基板を前記基板載置部のほぼ中心位置に保
持する基板保持部とを有する回転ユニットにおいて、前
記基板保持部が、前記基板を保持する基板保持ピン部と
前記基板保持ピン部の下部に連結する前記基板保持ピン
部の中心軸から偏心した重心を持つ重錘部とからなり、
前記回転ユニットが静止状態のとき前記基板保持ピン部
が外側に傾斜し、前記回転ユニットが回転状態のとき前
記基板保持ピン部が前記重錘部が遠心力により直立状態
となるように、前記重錘部の重心位置を外側にして、前
記重錘部を、前記アーム部と直交する軸により、前記ア
ーム部の外側端部に枢着してなることを特徴としてい
る。
Further, in the rotating unit of the present invention, a rotatable substrate mounting portion, a plurality of arms radially projected on the outside of the substrate mounting portion in a radial direction, and an outer end portion of the arm portion. In a rotation unit having a substrate holding portion which holds a substrate substantially at a central position of the substrate mounting portion, the substrate holding portion includes a substrate holding pin portion that holds the substrate and a lower portion of the substrate holding pin portion. And a weight portion having a center of gravity eccentric from the central axis of the substrate holding pin portion to be connected,
When the rotating unit is in a stationary state, the substrate holding pin portion inclines outward, and when the rotating unit is in a rotating state, the substrate holding pin portion causes the weight portion to stand upright by centrifugal force. It is characterized in that the center of gravity of the weight portion is located outside, and the weight portion is pivotally attached to an outer end portion of the arm portion by an axis orthogonal to the arm portion.
【0014】本発明の回転ユニットは、基板等を回転さ
せることにより、基板等に付着した液滴を除去したり、
基板等の表面に滴下したレジストを塗布するための、ス
ピン装置のみに限定されるものではなく、例えば遠心機
のような、回転力により対象物を処理する装置において
も適用可能である。
The rotating unit of the present invention removes liquid droplets adhering to a substrate or the like by rotating the substrate or the like,
The present invention is not limited to the spin device for applying the dropped resist on the surface of the substrate or the like, but is also applicable to a device such as a centrifuge for treating an object by a rotational force.
【0015】また、回転ユニットの回転数は特に限定さ
れないが、通常は500〜3000回転/分で運転され
る。
The number of revolutions of the rotating unit is not particularly limited, but it is normally operated at 500 to 3000 revolutions / minute.
【0016】本発明の主な対象となる「基板」は、例え
ば液晶装置のガラス基板あるいは半導体基板であり、そ
の形状も多様であるが、「基板」に限定されるものでは
なく形状もn回回転対称形(n=2、3…)であれば特
に限定されない。
The "substrate" which is the main object of the present invention is, for example, a glass substrate or a semiconductor substrate of a liquid crystal device, and its shape is various, but it is not limited to the "substrate" and the shape is n times. There is no particular limitation as long as it is rotationally symmetric (n = 2, 3, ...).
【0017】本発明の回転ユニットによる基板載置部
は、n回回転対称性(n=2、3…)を有するものであ
れば、特に限定はされない。
The substrate mounting portion by the rotating unit of the present invention is not particularly limited as long as it has n-fold rotational symmetry (n = 2, 3, ...).
【0018】重錘部に設けられる枢着部は、基板保持部
を枢着される方向に置いて外側領域と内側領域との2つ
の領域に分割したとき、外側領域の質量が内側領域の質
量より大きくなる範囲で、かつ基板保持部を上側領域と
下側領域との2つの領域に分割したとき下側領域の質量
が上側領域の質量より大きくなる範囲に設定される。こ
のとき、基板保持ピン部は、回転ユニットが静止状態の
とき外側に傾斜し、回転ユニットが回転状態のとき直立
状態となるように重錘部に固定されているが、これらの
条件を満たすならば、基板保持部は任意の形状をとりう
るものである。本発明の回転ユニットによる基板保持ピ
ン部は、基板との接触部分が最も少ない円柱形であるこ
とが望ましい。
The pivot portion provided on the weight portion is such that when the substrate holding portion is placed in the pivoting direction and divided into two regions, an outer region and an inner region, the mass of the outer region is the mass of the inner region. The mass is set to a larger range and the mass of the lower region is larger than the mass of the upper region when the substrate holder is divided into two regions, the upper region and the lower region. At this time, the substrate holding pin portion is fixed to the weight portion so that the substrate holding pin portion inclines outward when the rotating unit is in the stationary state and stands upright when the rotating unit is in the rotating state. For example, the substrate holding part can have any shape. It is desirable that the substrate holding pin portion formed by the rotating unit of the present invention has a columnar shape with the smallest contact portion with the substrate.
【0019】また、重錘部が枢着される基板載置部ある
いはアーム部の外側端部は、基板保持部が枢着可能であ
るならば、例えば凸状にしてもよく、特に限定されるも
のではない。
Further, the outer end of the substrate mounting portion or the arm portion to which the weight portion is pivotally attached may be, for example, convex if the substrate holding portion can be pivotally attached, and is not particularly limited. Not a thing.
【0020】さらに、回転ユニットが回転状態のとき基
板保持ピン部が直立状態となるように重錘部位置を規定
する抑止部の突設位置は、基板載置部あるいはアーム部
だけでなく、例えば重錘部に突設してもよい。
Further, the protruding position of the restraining portion that defines the position of the weight portion so that the substrate holding pin portion is in the upright state when the rotating unit is in the rotating state is not limited to the substrate mounting portion or the arm portion, but may be, for example, You may project in a weight part.
【0021】本発明の回転ユニットによる放射状に突設
されたアーム部は、基板の形状により適宜本数および長
さが決定されるものであり、回転ユニットがn回回転対
称性(n=2、3…)を有するように配置されるのであ
れば、本数および長さは特に限定されるものではない。
The number and length of the radially projecting arm portions of the rotating unit of the present invention are determined depending on the shape of the substrate, and the rotating unit has n-fold rotational symmetry (n = 2, 3). The number and length are not particularly limited as long as they are arranged so that
【0022】そして、アーム部の長さあるいはアーム部
の質量とアーム部の外側端部に枢着される基板保持部の
形状あるいは質量とは、回転ユニットが正確に回転する
範囲内で適宜組み合わされる。
The length of the arm portion or the mass of the arm portion and the shape or the mass of the substrate holding portion pivotally attached to the outer end portion of the arm portion are appropriately combined within a range in which the rotating unit rotates accurately. .
【0023】[0023]
【作用】本発明の回転ユニットにおいて、回転ユニット
が静止状態のとき基板保持ピン部は外側に傾斜してお
り、基板等は外部の搬送装置により基板載置部へ載置さ
れる。次いで、回転ユニットは外部の回転装置による回
転力により回転する。回転ユニットが回転すると、基板
載置部あるいはアーム部の外側端部に枢着された重錘部
は回転による遠心力により枢着部を軸として外側に移動
し、基板保持ピン部が直立する。直立した基板保持部に
より、基板等は基板載置部のほぼ中心位置に保持され、
所定の回転処理が行われる。所定の回転処理が施行され
ると回転ユニットは静止し、基板載置部あるいはアーム
部の外側端部に枢着された基板保持部は枢着部を軸とし
て静止位置に移動し、基板保持ピン部が外側に傾斜す
る。そして、基板等は外部の搬送装置により基板載置部
から離脱される。
In the rotating unit of the present invention, the substrate holding pin portion is inclined outward when the rotating unit is in a stationary state, and the substrate or the like is placed on the substrate placing portion by an external transfer device. Then, the rotating unit is rotated by the rotating force of the external rotating device. When the rotating unit rotates, the weight portion pivotally attached to the outer end of the substrate mounting portion or the arm portion moves outward with the pivotal portion as an axis by the centrifugal force due to the rotation, and the substrate holding pin portion stands upright. By the upright substrate holder, the substrate etc. is held at the substantially central position of the substrate placing part,
A predetermined rotation process is performed. When a predetermined rotation process is performed, the rotation unit is stationary, and the substrate holder pivotally attached to the outer end of the substrate holder or arm moves to a stationary position about the pivot to pivot the substrate holding pin. The part inclines outward. Then, the substrate and the like are detached from the substrate placing section by an external transfer device.
【0024】[0024]
【実施例】以下、本発明の実施例を図面を用いて詳細に
説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.
【0025】図1は、本発明の一実施例である回転ユニ
ット1の斜視図、図2は回転ユニット1のアーム部7の
端部を、回転ユニット1が静止状態のとき横方から見た
側面図、図3は上方から見た上面図である。また、図4
は、回転ユニット1のアーム部7の端部を、回転ユニッ
トが回転状態のとき横方から見た側面図、図5は上方か
ら見た上面図である。
FIG. 1 is a perspective view of a rotary unit 1 according to an embodiment of the present invention, and FIG. 2 is a side view of an end portion of an arm portion 7 of the rotary unit 1 when the rotary unit 1 is in a stationary state. A side view and FIG. 3 are top views seen from above. FIG.
5 is a side view of the end of the arm portion 7 of the rotary unit 1 as seen from the side when the rotary unit is in a rotating state, and FIG. 5 is a top view as seen from above.
【0026】図1において、回転ユニット2は基板5を
載置する基板載置部6と、基板載置部6の外側に水平方
向に放射状に突設された4本のアーム部7とを有してい
る。また、基板載置部6の中心下部には、モータ3によ
る回転力を回転ユニット2に伝達するための回転軸4を
取着する軸受部16が設けられている。アーム部7の端
部は凹状に加工され、アーム部7の突起部9には、軸1
5が貫通する穴部10が設けられている。また、アーム
部7の谷部11には、回転ユニット2が回転状態のと
き、頭部が円柱形の基板保持ピン部8が直立状態となる
ようにほぼL字形の重錘部13の位置を規定する抑止部
12が突設されている。基板保持ピン部8が支持された
重錘部13には枢着部14が設けられ、穴部10と枢着
部14とは整合されて軸15が軸通し、重錘部13はア
ーム部7の端部に枢着されている。次に、このように構
成された回転ユニット2の動作を説明する。
In FIG. 1, the rotary unit 2 has a substrate placing portion 6 on which the substrate 5 is placed, and four arm portions 7 which are provided on the outside of the substrate placing portion 6 so as to project radially in the horizontal direction. doing. Further, a bearing portion 16 to which the rotary shaft 4 for transmitting the rotational force of the motor 3 to the rotary unit 2 is attached is provided below the center of the substrate platform 6. The end portion of the arm portion 7 is processed into a concave shape, and the protrusion 9 of the arm portion 7 has a shaft 1
A hole portion 10 through which 5 passes is provided. Further, the trough portion 11 of the arm portion 7 is provided with a position of the substantially L-shaped weight portion 13 so that the substrate holding pin portion 8 having a cylindrical head portion is in an upright state when the rotating unit 2 is in a rotating state. The prescribed restraining portion 12 is provided so as to project. The weight portion 13 on which the substrate holding pin portion 8 is supported is provided with a pivot portion 14, the hole portion 10 and the pivot portion 14 are aligned with each other, and a shaft 15 is inserted therethrough. Is pivotally attached to the end of. Next, the operation of the rotating unit 2 configured as above will be described.
【0027】はじめに、回転ユニット2が静止状態のと
き、回転ユニット2のアーム部7の外側端部は図2およ
び図3のように示される。
First, when the rotary unit 2 is at rest, the outer end of the arm portion 7 of the rotary unit 2 is shown as shown in FIGS. 2 and 3.
【0028】すなわち、基板保持ピン部8を支持する重
錘部13は、基板保持ピン部8の中心軸から偏心した重
心を有しており、基板保持ピン部8は外側に傾斜してい
る。したがって、基板5と基板保持ピン部8とのクリア
ランスは、図2の矢印で示すように大きいものとなり、
基板5の基板載置部6への載置、離脱が容易となってい
る。
That is, the weight portion 13 that supports the substrate holding pin portion 8 has a center of gravity that is eccentric from the central axis of the substrate holding pin portion 8, and the substrate holding pin portion 8 is inclined outward. Therefore, the clearance between the substrate 5 and the substrate holding pin portion 8 becomes large as shown by the arrow in FIG.
It is easy to place and remove the substrate 5 on and from the substrate platform 6.
【0029】このとき、搬送装置により、基板5は基板
載置部6へ載置される。そして、不図示の回転装置によ
り、回転ユニット2は所定の回転数で回転する。
At this time, the substrate 5 is placed on the substrate placing section 6 by the transfer device. Then, the rotation unit 2 rotates at a predetermined rotation speed by a rotation device (not shown).
【0030】回転ユニット2が回転状態となると、アー
ム部7の端部は図4および図5のように示される。
When the rotating unit 2 is in the rotating state, the end portion of the arm portion 7 is shown as shown in FIGS. 4 and 5.
【0031】すなわち、回転時に発生する遠心力によ
り、重錘部13の基板保持ピン部8の中心軸から偏心し
た重心が外側に移動し、基板保持ピン部8を支持する重
錘部13は枢着部14を軸に外側に移動する。そのため
基板保持ピン部8は直立し、基板5と基板保持ピン部8
とのクリアランスは、図4の矢印で示すように小さくな
り、基板5は基板載置部6のほぼ中心に確実に保持され
る。そして、基板5は、不図示の処理装置により、例え
ばレジストの塗布といった所定の回転処理を施される。
このとき、アーム部7の谷部11に突設された抑止部1
2によって、基板保持ピン部8は回転ユニット2の回転
中、常に直立状態に規定されている。
That is, due to the centrifugal force generated during rotation, the center of gravity of the weight 13 which is eccentric from the central axis of the substrate holding pin 8 moves outward, and the weight 13 that supports the substrate holding pin 8 pivots. The attachment portion 14 is moved outwardly about the axis. Therefore, the substrate holding pin portion 8 stands upright, and the substrate 5 and the substrate holding pin portion 8
The clearance between and becomes small as shown by the arrow in FIG. 4, and the substrate 5 is securely held substantially at the center of the substrate platform 6. Then, the substrate 5 is subjected to predetermined rotation processing such as resist coating by a processing device (not shown).
At this time, the restraining portion 1 protruding from the valley portion 11 of the arm portion 7
2, the substrate holding pin portion 8 is always regulated in the upright state during the rotation of the rotating unit 2.
【0032】こうして所定の回転処理が終了すると、回
転ユニット2は回転を停止して静止し、再び基板保持ピ
ン部8を支持する重錘部13は枢着部14を軸に内側に
移動して基板保持ピン部8は外側に傾斜し、基板5と基
板保持ピン部8とのクリアランスは、図2の矢印で示す
ように大きくなる。
When the predetermined rotation process is completed in this way, the rotation unit 2 stops rotating and stands still, and the weight portion 13 supporting the substrate holding pin portion 8 moves inward about the pivot portion 14 as an axis. The substrate holding pin portion 8 is inclined outward, and the clearance between the substrate 5 and the substrate holding pin portion 8 becomes large as shown by the arrow in FIG.
【0033】そして、基板5は不図示の搬送装置によ
り、基板載置部6から離脱される。
Then, the substrate 5 is removed from the substrate platform 6 by a transfer device (not shown).
【0034】なお、基板5と基板保持ピン部8とのクリ
アランスは、回転ユニット2が静止状態のとき1〜3m
m程度が好ましく、回転ユニット2が回転状態のとき
0.1〜0.5mm程度が好ましい。
The clearance between the substrate 5 and the substrate holding pin portion 8 is 1 to 3 m when the rotary unit 2 is stationary.
m is preferably about 0.1 mm to 0.5 mm when the rotating unit 2 is in a rotating state.
【0035】[0035]
【発明の効果】以上説明したとおり、本願発明によれ
ば、次のような効果が得られる。
As described above, according to the present invention, the following effects can be obtained.
【0036】(1)回転ユニットが静止状態のとき、基
板保持ピン部が外側に傾斜して基板とのクリアランスが
大きくなるので、基板載置部への基板の載置および脱着
が容易となる。また、回転ユニットが回転状態のとき、
基板保持ピン部が直立して基板とのクリアランスが小さ
くなるので、基板は基板載置部のほぼ中心に確実に保持
される。
(1) When the rotary unit is in a stationary state, the substrate holding pin portion inclines outward and the clearance with the substrate increases, so that the substrate can be easily placed on and removed from the substrate placing portion. Also, when the rotating unit is in the rotating state,
Since the substrate holding pin portion stands upright and the clearance between the substrate holding pin portion and the substrate is small, the substrate is securely held substantially at the center of the substrate mounting portion.
【0037】(2)回転ユニットが静止状態のとき、基
板保持ピン部が外側に傾斜して基板とのクリアランスが
大きくなるので、基板載置部への基板の載置および脱着
に際し基板と基板保持ピン部との接触による基板の割
れ、キズ等の基板の不良の発生が解消される。
(2) When the rotary unit is in a stationary state, the substrate holding pin portion inclines outward and the clearance between the substrate and the substrate becomes large. The occurrence of substrate defects such as cracks and scratches due to contact with the pin portion is eliminated.
【0038】(3)同じ理由で、基板載置部への基板の
載置および脱着に際して基板の位置決め精度を押さえ
て、ゆるやかに設定可能となる。
(3) For the same reason, it is possible to set the positioning accuracy of the substrate at the time of mounting and demounting the substrate on the substrate mounting portion, and to set the positioning gently.
【図面の簡単な説明】[Brief description of the drawings]
【図1】本発明の一実施例である回転ユニットの斜視
図。
FIG. 1 is a perspective view of a rotary unit that is an embodiment of the present invention.
【図2】回転ユニットのアーム部の端部を、回転ユニッ
トが静止状態のとき横方から見た側面図。
FIG. 2 is a side view of an end portion of an arm portion of the rotating unit viewed from the side when the rotating unit is in a stationary state.
【図3】回転ユニットのアーム部の端部を、回転ユニッ
トが静止状態のとき上方から見た上面図。
FIG. 3 is a top view of an end portion of an arm portion of the rotary unit, which is viewed from above when the rotary unit is in a stationary state.
【図4】回転ユニットのアーム部の端部を、回転ユニッ
トが回転状態のとき横方から見た側面図。
FIG. 4 is a side view of an end portion of an arm portion of the rotating unit as seen laterally when the rotating unit is in a rotating state.
【図5】回転ユニットのアーム部の端部を、回転ユニッ
トが回転状態のとき上方から見た上面図。
FIG. 5 is a top view of an end portion of an arm portion of the rotating unit, viewed from above when the rotating unit is in a rotating state.
【図6】スピン装置の模式図。FIG. 6 is a schematic diagram of a spin device.
【図7】従来の回転ユニットの斜視図。FIG. 7 is a perspective view of a conventional rotation unit.
【符号の説明】[Explanation of symbols]
2……回転ユニット 6……基板載置部 7……アーム部 8……基板固定ピン部 13……重錘部 15……軸 2 ... Rotating unit 6 ... Board mounting part 7 ... Arm part 8 ... Board fixing pin part 13 ... Weight part 15 ... Shaft

Claims (4)

    【特許請求の範囲】[Claims]
  1. 【請求項1】 回転可能な基板載置部と前記基板載置部
    の外側に等配して設けられ基板を前記基板載置部のほぼ
    中心位置に保持する基板保持部とを有する回転ユニット
    において、 前記基板保持部が、前記基板を保持する基板保持ピン部
    と前記基板保持ピン部の下部に連結する前記基板保持ピ
    ン部の中心軸から偏心した重心を持つ重錘部とからな
    り、 前記回転ユニットが静止状態のとき前記基板保持ピン部
    が外側に傾斜し、前記回転ユニットが回転状態のとき前
    記基板保持ピン部が前記重錘部が遠心力により直立状態
    となるように、前記重錘部の重心位置を外側にして、前
    記重錘部を前記基板載置部の外側端部へ枢着してなるこ
    とを特徴とする回転ユニット。
    1. A rotating unit having a rotatable substrate mounting portion and a substrate holding portion which is provided on the outer side of the substrate mounting portion and is equally arranged to hold the substrate at a substantially central position of the substrate mounting portion. The substrate holding unit includes a substrate holding pin unit that holds the substrate and a weight unit that has a center of gravity that is eccentric from a central axis of the substrate holding pin unit that is connected to a lower portion of the substrate holding pin unit; When the unit is in a stationary state, the substrate holding pin portion inclines outward, and when the rotating unit is in a rotating state, the substrate holding pin portion causes the weight portion to stand upright by a centrifugal force. The rotation unit is configured such that the center of gravity position is outside and the weight portion is pivotally attached to an outer end portion of the substrate mounting portion.
  2. 【請求項2】 前記重錘部が枢着された前記基板載置部
    の外側端部は、前記基板載置部の外側に凹部が向いた凹
    状で、前記基板保持部はほぼL字形であり、前記凹部に
    は前記回転ユニットが回転状態のとき前記基板保持ピン
    部を直立状態に保持するための突設部が形成されたこと
    を特徴とする請求項1に記載の回転ユニット。
    2. An outer end portion of the substrate mounting portion on which the weight portion is pivotally mounted is a concave shape in which a concave portion faces the outside of the substrate mounting portion, and the substrate holding portion is substantially L-shaped. 2. The rotating unit according to claim 1, wherein the concave portion is formed with a protruding portion for holding the substrate holding pin portion in an upright state when the rotating unit is in a rotating state.
  3. 【請求項3】 回転可能な基板載置部と前記基板載置部
    の外側に水平方向に放射状に突設された複数のアーム部
    と前記アーム部の外側端部に設けられ基板を前記基板載
    置部のほぼ中心位置に保持する基板保持部とを有する回
    転ユニットにおいて、 前記基板保持部が、前記基板を保持する基板保持ピン部
    と前記基板保持ピン部の下部に連結する前記基板保持ピ
    ン部の中心軸から偏心した重心を持つ重錘部とからな
    り、 前記回転ユニットが静止状態のとき前記基板保持ピン部
    が外側に傾斜し、前記回転ユニットが回転状態のとき前
    記基板保持ピン部が前記重錘部が遠心力により直立状態
    となるように、前記重錘部の重心位置を外側にして、前
    記重錘部を、前記アーム部と直交する軸により、前記ア
    ーム部の外側端部に枢着してなることを特徴とする回転
    ユニット。
    3. A rotatable substrate mounting portion, a plurality of arm portions radially protruding outside the substrate mounting portion, and a substrate provided on the outer end of the arm portion for mounting the substrate on the substrate. In a rotary unit having a substrate holding part that holds the substrate at a substantially central position, the substrate holding part connects the substrate holding pin part that holds the substrate and the substrate holding pin part that is connected to a lower portion of the substrate holding pin part. And a weight portion having a center of gravity eccentric from the central axis of the substrate holding pin portion, the substrate holding pin portion is inclined outward when the rotating unit is in a stationary state, and the substrate holding pin portion is formed when the rotating unit is in a rotating state. The center of gravity of the weight unit is placed outside and the weight unit is pivoted to the outer end of the arm unit by an axis orthogonal to the arm unit so that the weight unit becomes upright by centrifugal force. Characterized by wearing Rotation unit.
  4. 【請求項4】 前記アーム部の外側端部は前記アーム部
    の外側に凹部が向いた凹状で、前記基板保持部はほぼL
    字形であり、前記凹部には前記回転ユニットが回転状態
    のとき前記基板保持ピン部を直立状態に保持するための
    突設部が形成されたことを特徴とする請求項3に記載の
    回転ユニット。
    4. The outer end portion of the arm portion has a concave shape with a concave portion facing the outer side of the arm portion, and the substrate holding portion is substantially L-shaped.
    4. The rotating unit according to claim 3, wherein the rotating unit has a letter shape, and a protruding portion for holding the substrate holding pin portion in an upright state is formed in the concave portion when the rotating unit is in a rotating state.
JP16197495A 1995-06-28 1995-06-28 Rotating unit Withdrawn JPH0914836A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16197495A JPH0914836A (en) 1995-06-28 1995-06-28 Rotating unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16197495A JPH0914836A (en) 1995-06-28 1995-06-28 Rotating unit

Publications (1)

Publication Number Publication Date
JPH0914836A true JPH0914836A (en) 1997-01-17

Family

ID=15745629

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16197495A Withdrawn JPH0914836A (en) 1995-06-28 1995-06-28 Rotating unit

Country Status (1)

Country Link
JP (1) JPH0914836A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002329773A (en) * 2001-04-27 2002-11-15 Shibaura Mechatronics Corp Spin processing equipment
KR100672937B1 (en) * 2004-07-19 2007-01-24 삼성전자주식회사 Apparatus for treating semiconductor substrates
US7399673B2 (en) 2005-07-08 2008-07-15 Infineon Technologies Ag Method of forming a charge-trapping memory device
US9255991B2 (en) 2010-12-14 2016-02-09 Robert Bosch Gmbh Method and device for acoustically sensing an area

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002329773A (en) * 2001-04-27 2002-11-15 Shibaura Mechatronics Corp Spin processing equipment
KR100672937B1 (en) * 2004-07-19 2007-01-24 삼성전자주식회사 Apparatus for treating semiconductor substrates
US7399673B2 (en) 2005-07-08 2008-07-15 Infineon Technologies Ag Method of forming a charge-trapping memory device
US9255991B2 (en) 2010-12-14 2016-02-09 Robert Bosch Gmbh Method and device for acoustically sensing an area

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