JPH09147754A - Plasma display device substrate and manufacture thereof - Google Patents

Plasma display device substrate and manufacture thereof

Info

Publication number
JPH09147754A
JPH09147754A JP30468895A JP30468895A JPH09147754A JP H09147754 A JPH09147754 A JP H09147754A JP 30468895 A JP30468895 A JP 30468895A JP 30468895 A JP30468895 A JP 30468895A JP H09147754 A JPH09147754 A JP H09147754A
Authority
JP
Japan
Prior art keywords
display device
plasma display
substrate
mixture
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30468895A
Other languages
Japanese (ja)
Other versions
JP3340004B2 (en
Inventor
Kiyohiro Sakasegawa
清浩 逆瀬川
Kouji Hamada
浩児 濱田
Toshikazu Kishino
敏和 岸野
Hisamitsu Sakai
久満 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP30468895A priority Critical patent/JP3340004B2/en
Priority to FR9610919A priority patent/FR2738393B1/en
Priority to US08/714,837 priority patent/US6023130A/en
Publication of JPH09147754A publication Critical patent/JPH09147754A/en
Application granted granted Critical
Publication of JP3340004B2 publication Critical patent/JP3340004B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/36Spacers, barriers, ribs, partitions or the like

Landscapes

  • Gas-Filled Discharge Tubes (AREA)

Abstract

PROBLEM TO BE SOLVED: To easily form fine bulkheads on a plasma display device substrate with high accuracy. SOLUTION: A mixture 21 of ceramic or glass powder, a solvent, and an organic additive is filled in the recesses 20a of a molding die 20, the projections 20b of the molding die 20 are coated with an electrode material 22, and a plasma display device substrate is manufactured in the process for connecting the mixture 21 and the electrode material 22 to one face of a back plate 10 made of ceramic or glass.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、高精度かつ安価な
薄型の大画面用カラー表示装置等に用いられるプラズマ
表示装置用基板及びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for a plasma display device used for a high-precision, inexpensive, thin, large-screen color display device and the like, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】薄型の大画面用カラー表示装置等に用い
られるプラズマ表示装置は、微小な表示セルと呼ばれる
隔壁で囲まれた空間に、対向する電極を設け、前記空間
に希ガス等の放電可能なガスを封入した構造を成してお
り、対向する電極間に放電によりプラズマを発生させ、
該プラズマにより蛍光体を発光させて画面の発光素子と
して利用するものである。
2. Description of the Related Art In a plasma display device used for a thin large-screen color display device or the like, opposed electrodes are provided in a space surrounded by partition walls called minute display cells, and discharge of rare gas or the like is performed in the space. It has a structure in which possible gas is sealed, and generates plasma by discharging between facing electrodes,
The phosphor emits light by the plasma and is used as a light emitting element of a screen.

【0003】具体的な構造を図3に示すように、背面板
10の一面に多数の隔壁11を形成して各隔壁11間を
セル13とし、このセル13の底面に電極12を備えた
ものを基板1とする。この基板1に対して、セル13の
内壁面13aに蛍光体を塗布し、一方電極15を備えた
正面板14を基板1の隔壁11上に接合して、セル13
にガスを封入することにより、プラズマ表示装置を構成
することができる。
As shown in FIG. 3, a specific structure is one in which a large number of partition walls 11 are formed on one surface of a back plate 10 to form cells 13 between the partition walls 11, and electrodes 12 are provided on the bottom surface of the cells 13. Is a substrate 1. For this substrate 1, a phosphor is applied to the inner wall surface 13a of the cell 13, and a front plate 14 having one electrode 15 is bonded onto the partition wall 11 of the substrate 1 to form the cell 13
By enclosing the gas in the plasma display device, a plasma display device can be constructed.

【0004】ところで、前記プラズマ表示装置用の基板
1を製造する際には、予め背面板10上に多数の電極1
2を形成した後で各電極12間に隔壁11を形成する
が、この隔壁11の製造方法としては、印刷積層法やグ
リーンシート多層積層法等が知られている。
When the substrate 1 for the plasma display device is manufactured, a large number of electrodes 1 are formed on the back plate 10 in advance.
The partition 11 is formed between the electrodes 12 after forming the partition 2. As a method for manufacturing the partition 11, a printing lamination method, a green sheet multilayer lamination method, or the like is known.

【0005】印刷積層法は、隔壁11を成す材料のペー
ストを用いて厚膜印刷法により背面板10上に所定パタ
ーンの隔壁11を印刷形成するもので、1回の印刷で形
成できる厚さが約10〜15μm程度であることから、
印刷・乾燥を繰り返しながら約100〜200μm程度
の高さを必要とする隔壁11を形成するものである(特
開平2−213020号公報等参照)。
In the printing lamination method, a partition 11 having a predetermined pattern is formed on the back plate 10 by printing using a paste of a material forming the partition 11 by a thick film printing method. Since it is about 10-15 μm,
The partition 11 which requires a height of about 100 to 200 μm is formed by repeating printing and drying (see Japanese Patent Application Laid-Open No. 2-213020).

【0006】また、前記グリーンシート多層積層法は、
所定形状に穿孔した複数枚のグリーンシートを前述の隔
壁11として必要な高さとなるように積層固着して隔壁
11を形成するものである(特開平1−213936号
公報参照)。
Further, the green sheet multilayer laminating method is
A plurality of green sheets perforated in a predetermined shape are laminated and fixed so that the partition 11 has a required height (see JP-A 1-213936).

【0007】[0007]

【発明が解決しようとする課題】しかし、上記の製造方
法により得られたプラズマ表示装置用基板1は、隔壁1
1と電極12の形成工程が別であるため、隔壁11と電
極12との位置ずれが生じやすく、高精度の基板1が得
られないという問題があった。しかも図3に示すよう
に、電極12と隔壁11の間には隙間が存在することを
避けられず、セル13の底面の一部にしか電極12が備
えられていないことから放電領域が狭く、発光効率が低
いという問題があった。
However, the plasma display device substrate 1 obtained by the above-described manufacturing method has the partition wall 1
Since the step of forming the electrode 1 and the step of forming the electrode 12 are different from each other, there is a problem that a positional deviation between the partition wall 11 and the electrode 12 is likely to occur and the substrate 1 with high accuracy cannot be obtained. Moreover, as shown in FIG. 3, it is unavoidable that there is a gap between the electrode 12 and the partition wall 11, and the discharge region is narrow because the electrode 12 is provided only on a part of the bottom surface of the cell 13. There was a problem of low luminous efficiency.

【0008】また、隔壁11を製造する際に、前記印刷
積層法では、所定の高さの隔壁11を形成するために何
回も印刷・乾燥工程を繰り返して積層しなければなら
ず、極めて工程数が多くなり、その上、積層毎に精度よ
く印刷する必要があるため、非常に歩留りが悪かった。
更に、印刷時の位置ズレにより隔壁11が変形し易く、
かつ印刷製版の伸び等のために、隔壁11の寸法精度と
しては、1000セル分の寸法を45列測定した時の測
定値の最大差が0.35mm程度あり、高精細度化の要
求を満足することができなかった。
Further, when the partition wall 11 is manufactured, the printing and laminating method must repeat the printing and drying steps many times in order to form the partition wall 11 with a predetermined height, which is an extremely process. Since the number is large, and moreover, it is necessary to print with high accuracy for each stack, the yield is very low.
Further, the partition 11 is easily deformed due to the positional deviation during printing,
Further, due to the elongation of the printing plate, the dimensional accuracy of the partition wall 11 has a maximum difference of about 0.35 mm between the measured values when measuring the size of 1000 cells in 45 columns, which satisfies the demand for high definition. I couldn't.

【0009】一方、前記グリーンシート多層積層法で
は、穿孔した複数枚のグリーンシートを一括して積層固
着して隔壁11を形成することはできるものの、セル1
3のピッチを微細化して、画面を高精細度化するために
セル13の開口部に対して隔壁11部を狭くすると、開
孔面積が増大してグリーンシートの強度が低下し、その
ために積層時に高精度な位置決めが困難であるという課
題があった。
On the other hand, in the green sheet multilayer laminating method, although the plurality of perforated green sheets can be collectively laminated and fixed to form the partition wall 11, the cell 1 is formed.
If the partition 11 is narrowed with respect to the opening of the cell 13 in order to make the pitch of 3 finer and to increase the definition of the screen, the opening area is increased and the strength of the green sheet is reduced. There was a problem that high-precision positioning was sometimes difficult.

【0010】また、この他にサンドブラスト法による製
造方法もあるが、高精度に隔壁11を形成することは困
難であった。
In addition to this, there is a manufacturing method by a sandblast method, but it is difficult to form the partition wall 11 with high accuracy.

【0011】従って、前記いずれの製造方法でも、高精
度で微細なピッチを有する大型のプラズマ表示装置用の
基板1を簡単な工程で安価に製造することは困難であっ
た。
Therefore, it has been difficult to manufacture the substrate 1 for a large-sized plasma display device having a high precision and a fine pitch at a low cost by a simple process by any of the above manufacturing methods.

【0012】[0012]

【発明の目的】本発明は上記課題に鑑みてなされたもの
で、その目的は、プラズマ表示装置用基板を、1回の簡
単な成形工程で、歩留り良く製造するとともに、変形の
ない平滑表面を有する高精度な隔壁を所定高さで得ら
れ、40インチ以上の大画面化が容易に実現できるプラ
ズマ表示装置用基板及びその製造方法を提供することに
ある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and an object thereof is to manufacture a substrate for a plasma display device in a single molding process with a high yield and to obtain a smooth surface without deformation. It is an object of the present invention to provide a substrate for a plasma display device, which can obtain a highly accurate partition wall having a predetermined height and can easily realize a large screen of 40 inches or more, and a manufacturing method thereof.

【0013】[0013]

【課題を解決するための手段】本発明のプラズマ表示装
置用基板は、セラミックス又はガラスから成る背面板
に、セラミックス又はガラスからなる複数の隔壁を備
え、各隔壁間に形成されたセルの底面全面に電極を備え
たことを特徴とするものである。
A substrate for a plasma display device according to the present invention comprises a back plate made of ceramics or glass and a plurality of partition walls made of ceramics or glass, and the entire bottom surface of a cell formed between the partition walls. It is characterized in that it is provided with an electrode.

【0014】また、本発明のプラズマ表示装置用基板の
製造方法は、セラミックス又はガラスの粉体と溶媒及び
有機性添加物との混合物を成形型の凹部中に充填すると
ともに、該成形型の凸部に電極材を塗布し、これら混合
物と電極材をセラミックス又はガラスからなる背面板に
接合する工程からなることを特徴とする。
Further, in the method for manufacturing a substrate for a plasma display device according to the present invention, a mixture of ceramic or glass powder, a solvent and an organic additive is filled in the concave portion of the molding die, and the convex portion of the molding die is formed. It is characterized in that it comprises a step of applying an electrode material to the portion and joining the mixture and the electrode material to a back plate made of ceramics or glass.

【0015】[0015]

【作用】本発明のプラズマ表示装置用基板によれば、セ
ルの底面全体に電極を形成することによって、電極と隔
壁との位置ずれをなくすとともに、放電領域を広くして
発光効率を高めることができる。
According to the plasma display device substrate of the present invention, by forming the electrode on the entire bottom surface of the cell, it is possible to eliminate the positional deviation between the electrode and the partition wall, and to widen the discharge region to enhance the luminous efficiency. it can.

【0016】また、本発明のプラズマ表示装置用基板の
製造方法によれば、セラミックス又はガラスの粉体とバ
インダーの混合物を成形型に充填して隔壁を成形するこ
とから、隔壁の表面状態が良好で、かつ成形型の寸法精
度がそのまま成形体に反映され、1回の成形工程で大型
の基板を容易に製造できる。
Further, according to the method for manufacturing a substrate for a plasma display device of the present invention, since the partition wall is molded by filling the mixture of the powder of ceramics or glass and the binder into the molding die, the surface state of the partition wall is good. In addition, the dimensional accuracy of the molding die is directly reflected on the molded body, and a large-sized substrate can be easily manufactured in one molding process.

【0017】また、隔壁と電極を一体成形するため、工
程を簡略化できるとともに、セルの底面全体に電極を有
する基板を容易に製造することができ、隔壁と電極の位
置ずれをなくすことができる。
Further, since the partition wall and the electrode are integrally molded, the process can be simplified, and the substrate having the electrode on the entire bottom surface of the cell can be easily manufactured, and the displacement of the partition wall and the electrode can be eliminated. .

【0018】[0018]

【発明の実施の形態】以下本発明の実施形態を説明す
る。
Embodiments of the present invention will be described below.

【0019】図1に示すように、プラズマ表示装置用の
基板1はセラミックス又はガラスから成る背面板10の
一面にセラミックス又はガラスから成る複数の隔壁11
を備え、各隔壁11間にセル13が形成される。そし
て、このセル13の底面全面に電極12を備え、この電
極12と隔壁11には隙間のない密着した状態となって
いる。
As shown in FIG. 1, a substrate 1 for a plasma display device has a plurality of partition walls 11 made of ceramics or glass on one surface of a back plate 10 made of ceramics or glass.
And the cells 13 are formed between the partition walls 11. The electrode 12 is provided on the entire bottom surface of the cell 13, and the electrode 12 and the partition wall 11 are in close contact with each other with no gap.

【0020】この基板1には、セル13の内壁面13a
に蛍光体が塗布された後、図3に示すように電極15を
備えた正面板14で隔壁11の上端を覆い、セル13に
ガスを封入することでプラズマ表示装置を構成すること
ができる。そして、電極12、15間で放電することに
より、セル13の内壁面13aに塗布した蛍光体を発光
させることができる。
On the substrate 1, the inner wall surface 13a of the cell 13 is formed.
After the phosphor is applied to the plasma display device, the front plate 14 having the electrodes 15 covers the upper end of the partition wall 11 as shown in FIG. Then, by discharging between the electrodes 12 and 15, the phosphor applied to the inner wall surface 13a of the cell 13 can emit light.

【0021】この時、上記電極12がセル13の底面全
面に備えられているため、放電領域が広くなり発光効率
を高められる。また、隔壁11と電極12との位置ずれ
をなくすことができ、高精度の基板1を得ることができ
る。
At this time, since the electrode 12 is provided on the entire bottom surface of the cell 13, the discharge region is widened and the luminous efficiency can be improved. Further, the positional deviation between the partition wall 11 and the electrode 12 can be eliminated, and the highly accurate substrate 1 can be obtained.

【0022】次に、上記基板1の製造方法を説明する。Next, a method of manufacturing the substrate 1 will be described.

【0023】まず、図2(a)に示すように、隔壁11
の形状に合致した凹部20aを有する成形型20を用意
し、この成形型20の凹部20aの間の凸部20bに電
極12を成す電極材22を塗布する。具体的には、電極
材22を成す金属ペーストまたは金属粉末と溶媒及び有
機性添加物からなるバインダーとの混合物を塗布する。
塗布方法としては、別の平板等に電極材22を塗布して
おいて、これに成形型20の凸部20bを当てて転写し
たり、あるいは成形型20の凸部20bにスクリーン印
刷やローラ塗布などで電極材22を塗布すれば良い。
First, as shown in FIG. 2A, the partition wall 11
The molding die 20 having the concave portions 20a conforming to the shape is prepared, and the electrode material 22 forming the electrode 12 is applied to the convex portions 20b between the concave portions 20a of the molding die 20. Specifically, a mixture of a metal paste or metal powder forming the electrode material 22 and a binder composed of a solvent and an organic additive is applied.
As an application method, the electrode material 22 is applied to another flat plate and the like, and the convex portion 20b of the molding die 20 is applied to the electrode material 22 for transfer, or screen printing or roller coating is applied to the convex portion 20b of the molding die 20. The electrode material 22 may be applied by, for example, the like.

【0024】次に、成形型20の凹部20aに、隔壁1
1を成す材質としてセラミックス又はガラス粉末と溶媒
及び有機性添加物のバインダーとの混合物21を充填す
る。この時、図2(a)では電極材22の表面と混合物
21の表面を同一面としてあるが、混合物21で電極材
22上を覆っても良く、いずれの場合も混合物21と電
極材22の間に隙間のない状態としておく。
Next, the partition wall 1 is placed in the recess 20a of the molding die 20.
A mixture 21 of ceramics or glass powder and a binder of a solvent and an organic additive is filled as a material forming No. 1. At this time, in FIG. 2A, the surface of the electrode material 22 and the surface of the mixture 21 are on the same plane, but the electrode material 22 may be covered with the mixture 21. In either case, the mixture material 21 and the electrode material 22 are There should be no gap between them.

【0025】一方、セラミックス又はガラスから成る背
面板10を別に用意し、この背面板10を上記成形型2
0に充填した混合物21と電極材22の上面に押し当て
て乾燥し、混合物21及び電極材22を固化させる。そ
の後、図2(b)に上下を逆にして示すように成形型2
0を離型することによって、背面板10上に隔壁11及
び電極12を転写する。最後に全体を同時焼成すること
により、図1に示すプラズマ表示装置用基板1を製造す
ることができる。
On the other hand, a back plate 10 made of ceramics or glass is prepared separately, and this back plate 10 is used for the molding die 2 described above.
The mixture 21 and the electrode material 22 filled with 0 are pressed against the upper surfaces of the electrode material 22 and dried to solidify the mixture 21 and the electrode material 22. Then, as shown in FIG.
By separating 0, the partition wall 11 and the electrode 12 are transferred onto the back plate 10. Finally, by co-firing the whole, the substrate 1 for plasma display device shown in FIG. 1 can be manufactured.

【0026】なお、以上の例では未焼成の状態で背面板
10に隔壁11と電極12を接合し、最後に同時焼成し
たが、予め隔壁11及び電極12を固化して別に焼成し
た後で、背面板10に熱圧着や接着により接合すること
もできる。即ち、背面板10に隔壁11と電極12を接
合するのは、互いの部材が未焼成体、脱バインダー状
態、焼結体のいずれの段階であっても良い。
In the above example, the partition wall 11 and the electrode 12 were joined to the back plate 10 in an unfired state and finally co-fired. However, after the partition wall 11 and the electrode 12 were solidified in advance and separately fired, It can also be joined to the back plate 10 by thermocompression bonding or adhesion. That is, the partition wall 11 and the electrode 12 may be bonded to the back plate 10 at any stage of the members being unbaked, debindered, or sintered.

【0027】このような本発明の製造方法によれば、一
回で隔壁11と電極12を同時に形成できるため製造工
程を極めて簡略化できる。しかも、隔壁11は成形型2
0の凹部20aの形状が転写されるため、微細形状を高
精度に成形できる。その結果、本発明の製造方法では、
1000セル分の寸法を45列測定した時の測定値の最
大差が0.05mm以下となるように高精度とすること
ができる。
According to the manufacturing method of the present invention as described above, since the partition wall 11 and the electrode 12 can be simultaneously formed at once, the manufacturing process can be extremely simplified. Moreover, the partition wall 11 is the mold 2
Since the shape of the concave portion 20a of 0 is transferred, a fine shape can be formed with high accuracy. As a result, in the manufacturing method of the present invention,
High accuracy can be achieved so that the maximum difference between the measured values when measuring the size of 1000 cells in 45 columns is 0.05 mm or less.

【0028】ここで、隔壁11を成すセラミックス粉体
とは、アルミナ(Al2 3 )、ジルコニア(Zr
2 )等の酸化物系セラミックスや、窒化珪素(Si3
4 )、窒化アルミニウム(AlN)、炭化珪素(Si
C)等の非酸化物系セラミックス等のいずれをも用いる
ことができ、これらのセラミックス粉体には各種焼結助
剤を所望量添加させることができる。
Here, the ceramic powder forming the partition wall 11 is alumina (Al 2 O 3 ) or zirconia (Zr).
Oxide ceramics such as O 2 ) and silicon nitride (Si 3
N 4 ), aluminum nitride (AlN), silicon carbide (Si
Any of non-oxide ceramics such as C) can be used, and various sintering aids can be added to these ceramic powders in desired amounts.

【0029】前記焼結助剤としては、アルミナ粉末には
シリカ(SiO2 )、カルシア(CaO)、イットリア
(Y2 3 )及びマグネシア(MgO)等を、ジルコニ
ア粉末にはイットリア(Y2 3 )やセリウム(C
e)、ジスプロシウム(Dy)、イッテルビウム(Y
b)等の希土類元素の酸化物を、また窒化珪素粉末には
イットリア(Y2 3 )とアルミナ(Al2 3 )等
を、窒化アルミニウム粉末には周期律表第3a族元素酸
化物(RE2 3 )等を、炭化珪素粉末にはホウ素
(B)とカーボン(C)等を所望量添加することができ
る。
[0029] As the sintering aid is silica (SiO 2) to alumina powder, calcia (CaO), yttria (Y 2 O 3) and magnesia (MgO) or the like, the zirconia powder yttria (Y 2 O 3 ) and cerium (C
e), dysprosium (Dy), ytterbium (Y
b) and other rare earth element oxides, silicon nitride powders such as yttria (Y 2 O 3 ) and alumina (Al 2 O 3 ), and aluminum nitride powders such as Group 3a element oxides of the periodic table ( RE 2 O 3 ) and the like, and boron (B) and carbon (C) and the like in desired amounts can be added to the silicon carbide powder.

【0030】また、隔壁11をガラス粉体で作る場合
は、ケイ酸塩を主成分とし、鉛(Pb)、硫黄(S)、
セレン(Se)、明礬等の一種以上を含有した各種ガラ
スを用いることができる。
When the partition wall 11 is made of glass powder, the main component is silicate, and lead (Pb), sulfur (S),
Various glasses containing one or more of selenium (Se), alum, and the like can be used.

【0031】尚、これらセラミックス又はガラス粉体の
粒径は、数十ミクロンからサブミクロンのものが好適に
用いることができ、具体的には0.2〜10μm、好ま
しくは0.2〜5μmの範囲のものが良い。
The ceramic or glass powder having a particle size of several tens of microns to submicrons can be suitably used, specifically, 0.2 to 10 μm, preferably 0.2 to 5 μm. Good in the range.

【0032】さらに、これらのセラミックス粉末又はガ
ラス粉末に添加する有機性添加物としては、尿素樹脂、
メラミン樹脂、フェノール樹脂、エポキシ樹脂、不飽和
ポリエステル樹脂、アルキド樹脂、ウレタン樹脂、エボ
ナイト、ポリシロキ酸シリケート等が挙げられる。そし
て、これらの有機性添加物を加熱硬化、紫外線照射硬
化、X線照射硬化等の手段で硬化させることにより、隔
壁材21を固化させることが可能である。なお作業、装
置上の点からは加熱硬化が最適であり、とりわけポット
ライフの点からは有機性添加物として不飽和ポリエステ
ル樹脂を用いることが好適である。
Further, as organic additives added to these ceramic powder or glass powder, urea resin,
Examples thereof include melamine resin, phenol resin, epoxy resin, unsaturated polyester resin, alkyd resin, urethane resin, ebonite, and polysiloxy silicate. The partition material 21 can be solidified by curing these organic additives by means such as heat curing, ultraviolet irradiation curing, and X-ray irradiation curing. It should be noted that heat curing is optimal from the viewpoint of work and equipment, and particularly from the viewpoint of pot life, it is preferable to use unsaturated polyester resin as the organic additive.

【0033】前記有機性添加物の含有量は、セラミック
ス又はガラス粉体と焼結助剤等との混合物の流動性及び
成形性を維持するためには、粘性が高くならないようす
る必要があり、一方、硬化時には十分な保形性を有して
いることが望ましい。このような点から、セラミックス
又はガラス粉体100重量部に対して0.5重量部以上
で、かつ硬化による成形体の収縮という点からは35重
量部以下が望ましく、なかでも焼成時の収縮を考慮する
と、1〜15重量部が最も好適である。
The content of the organic additive must be such that the viscosity does not become high in order to maintain the fluidity and moldability of the mixture of the ceramic or glass powder and the sintering aid. On the other hand, it is desirable to have sufficient shape retention at the time of curing. From this point of view, 0.5 parts by weight or more relative to 100 parts by weight of the ceramic or glass powder, and 35 parts by weight or less from the viewpoint of shrinkage of the molded body due to curing are preferable, and the shrinkage during firing is particularly preferable. Considering it, 1 to 15 parts by weight is most suitable.

【0034】また、混合物21中に加えられる溶媒と
は、前記有機性添加物を相溶するものであれば特に限定
するものではなく、例えば、トルエン、キシレン、ベン
ゼン、フタル酸エステル等の芳香族溶剤や、ヘキサノー
ル、オクタノール、デカノール、オキシアルコール等の
高級アルコール類、あるいは酢酸エステル、グリセライ
ド等のエステル類を用いることができる。
The solvent added to the mixture 21 is not particularly limited as long as it is compatible with the organic additive, and examples thereof include aromatic compounds such as toluene, xylene, benzene and phthalic acid ester. Solvents, higher alcohols such as hexanol, octanol, decanol, and oxyalcohol, or esters such as acetic acid ester and glyceride can be used.

【0035】とりわけ、前記フタル酸エステル、オキシ
アルコール等は好適に使用でき、更に、溶媒を緩やかに
揮発させるために、前記溶媒を2種類以上併用すること
も可能であるまた、前記溶媒の含有量は、成形性の点か
らは成形体の保形性を維持するためにセラミックス又は
ガラス粉体100重量部に対して0.1重量部以上必要
であり、一方セラミックス又はガラス粉体と有機性添加
物の混合物の粘性を低くすることが望ましいことから、
35重量部以下が望ましく、乾燥時と焼成時の収縮を考
慮すると1〜15重量部であることが最も望ましい。
Above all, the phthalic acid ester, oxyalcohol and the like can be preferably used, and in addition, two or more kinds of the above solvents can be used in combination in order to slowly volatilize the solvent. Is required to be 0.1% by weight or more per 100 parts by weight of the ceramic or glass powder in order to maintain the shape retention of the molded product from the viewpoint of moldability, while the ceramic or glass powder and the organic additive are added. Since it is desirable to lower the viscosity of the mixture of products,
The amount is preferably 35 parts by weight or less, and most preferably 1 to 15 parts by weight in consideration of shrinkage during drying and firing.

【0036】さらに、本発明における電極材22は、A
g,Pd,Pt,Au,W等の単体もしくは複数の組合
せによるペースト、あるいはこれらの金属粉末と溶媒及
び有機性添加物からなるバインダーとの混合物で作製す
ることができる。
Further, the electrode material 22 in the present invention is A
It can be prepared by using a paste of g, Pd, Pt, Au, W or the like alone or a combination of a plurality thereof, or a mixture of these metal powders and a binder made of a solvent and an organic additive.

【0037】なお、本発明における成形型20は、有機
性添加物を硬化させる時に何ら支障無きものであれば良
く、材質は特に限定されないが、例えば、金属や樹脂、
あるいはゴム等が使用でき、必要ならば、離型性向上や
磨耗防止のために、表面被覆等の表面処理を行ってもよ
い。
The molding die 20 in the present invention may be of any type as long as it does not hinder the curing of the organic additive, and the material is not particularly limited. For example, metal or resin,
Alternatively, rubber or the like can be used, and if necessary, surface treatment such as surface coating may be performed in order to improve releasability and prevent wear.

【0038】また、上記背面板10は、未焼成のグリー
ンシートあるいは焼結体で、材質は特に限定しないが、
例えば各種セラミックグリーンシートや各種ガラス基
板、磁器基板等で前記隔壁材21と熱膨張率が近似して
いることが望ましい。
The back plate 10 is an unsintered green sheet or a sintered body, and its material is not particularly limited.
For example, it is desirable that the coefficient of thermal expansion be close to that of the partition material 21 by using various ceramic green sheets, various glass substrates, porcelain substrates, and the like.

【0039】なお、前記混合物21や電極材22と背面
板10との接合は、その間に何も介在させずに圧着すれ
ば良いが、無機系、有機系のいずれかの接着剤を用いる
ことも可能である。
The mixture 21 or the electrode material 22 and the back plate 10 can be joined by pressure bonding without any intervening therebetween, but an inorganic or organic adhesive may be used. It is possible.

【0040】また、前記混合物21や電極材22と背面
板10とを圧着する際の接着性向上のために、シランカ
ップリング剤やチタネートカップリング剤、アルミネー
トカップリング剤等の各種カップリング剤を使用するこ
とができ、なかでも反応性が高いことからシランカップ
リング剤が好適である。
Further, various coupling agents such as a silane coupling agent, a titanate coupling agent, and an aluminate coupling agent for improving the adhesiveness when the mixture 21 or the electrode material 22 and the back plate 10 are pressure-bonded. A silane coupling agent is preferable because of its high reactivity.

【0041】さらに、混合物21や電極材22と背面板
10との圧着は、均一に圧力を加えるという点からは静
水圧の装置を用いるのが望ましく、加圧条件としては、
成形型を変形させない圧力範囲となり、該圧力範囲は成
形型の強度に左右されるが、例えばシリコンゴム製の成
形型を用いた場合、約100g/cm2 程度の加圧条件
で行うのが望ましい。
Further, for the pressure bonding of the mixture 21, the electrode material 22 and the back plate 10, it is desirable to use a device of hydrostatic pressure from the viewpoint of applying a uniform pressure.
The pressure range does not deform the mold, and the pressure range depends on the strength of the mold. For example, when a mold made of silicone rubber is used, it is desirable to perform the pressurizing condition at about 100 g / cm 2. .

【0042】また、混合物21において、セラミックス
又はガラス粉体の分散性の向上のために、例えば、ポリ
エチレングリコールエーテル、アルギルスルホン酸塩、
ポリカルボン酸塩、アルキルアンモニウム塩等の界面活
性剤を添加しても良く、その含有量としては分散性の向
上及び熱分解性の点から、セラミックス又はガラス粉体
100重量部に対して0.05〜5重量部が望ましい。
In order to improve the dispersibility of the ceramic or glass powder in the mixture 21, for example, polyethylene glycol ether, argyl sulfonate,
A surfactant such as a polycarboxylic acid salt or an alkylammonium salt may be added, and its content is 0.1% based on 100 parts by weight of the ceramic or glass powder from the viewpoint of improving dispersibility and thermal decomposability. 05 to 5 parts by weight is desirable.

【0043】さらに、混合物21中のバインダーには硬
化反応促進剤または重合開始剤等と称される硬化触媒を
添加することができる。前記硬化触媒としては、有機過
酸化物やアゾ化合物を使用することができ、例えば、ケ
トンパーオキサイド、ジアシルパーオキサイド、パーオ
キシケタール、パーオキシエステル、ハイドロパーオキ
サイド、パーオキシカーボネート、t−ブチルパーオキ
シ−2−エチルヘキサノエート、ビス(4−t−ブチル
シクロヘキシル)パーオキシジカーボネート、ジクミル
パーオキサイド等の有機過酸化物や、アゾビス、イソブ
チロニトリル等のアゾ化合物が挙げられる。
Further, a curing catalyst called a curing reaction accelerator or a polymerization initiator may be added to the binder in the mixture 21. As the curing catalyst, an organic peroxide or an azo compound can be used, and examples thereof include ketone peroxide, diacyl peroxide, peroxyketal, peroxyester, hydroperoxide, peroxycarbonate, t-butylperoxide. Examples thereof include organic peroxides such as oxy-2-ethylhexanoate, bis (4-t-butylcyclohexyl) peroxydicarbonate and dicumyl peroxide, and azo compounds such as azobis and isobutyronitrile.

【0044】なお、図1、2には台形状の隔壁11を示
したが、本発明はこの例に限るものではない。
Although the trapezoidal partition wall 11 is shown in FIGS. 1 and 2, the present invention is not limited to this example.

【0045】[0045]

【実施例】実施例1 まず、平板上に電極材22としてAgペーストを塗布
し、成形型20の凸部20bを上記平板に押し当てて、
電極材22を塗布し、乾燥した。一方、隔壁11を成す
混合物21として、表1に示すように平均粒径0.2〜
10μm(好ましくは0.2〜5μm)のガラス粉体と
各種溶媒、有機性添加物と若干の分散剤を加えたスラリ
ーを作製し、この混合物21を成形型20の凹部20a
に充填し、脱泡した。
Example 1 First, an Ag paste was applied as an electrode material 22 on a flat plate, and the convex portion 20b of the molding die 20 was pressed against the flat plate,
The electrode material 22 was applied and dried. On the other hand, as the mixture 21 forming the partition wall 11, as shown in Table 1, the average particle size of 0.2 to
A slurry was prepared by adding 10 μm (preferably 0.2 to 5 μm) of glass powder, various solvents, an organic additive and a small amount of a dispersant, and mixing this mixture 21 with the recess 20 a of the molding die 20.
And degassed.

【0046】この表面にガラス製の背面板10を載せて
加圧、乾燥後、混合物21及び電極材22が固化し背面
板10に接合したことを確認して成形型20を離型し
た。その後、全体を500〜700℃で焼成し、プラズ
マ表示装置用基板1を作製した。
The glass rear plate 10 was placed on this surface, pressed and dried, and after confirming that the mixture 21 and the electrode material 22 were solidified and bonded to the rear plate 10, the mold 20 was released. Thereafter, the whole was baked at 500 to 700 ° C. to produce a substrate 1 for a plasma display device.

【0047】[0047]

【表1】 [Table 1]

【0048】実施例2 表2に示す組成の混合物21を用い、この混合物21を
成形型20に充填する際に電極材22を覆うように充填
し、他は実施例1と同様にしてプラズマ表示装置用基板
1を作製した。
Example 2 A mixture 21 having the composition shown in Table 2 was used, and when the mixture 21 was filled in the molding die 20, the electrode material 22 was covered so as to cover the electrode material 22. A device substrate 1 was produced.

【0049】[0049]

【表2】 [Table 2]

【0050】実施例3 電極材22としてWペーストを用い、混合物21として
表3に示すように平均粒径0.2〜5μmのアルミナ、
ジルコニアを用いて、焼成温度を1450〜1600℃
とし、他は実施例1と同様にしてプラズマ表示装置用基
板1を作製した。
Example 3 W paste was used as the electrode material 22, and alumina having an average particle size of 0.2 to 5 μm was used as the mixture 21 as shown in Table 3.
Using zirconia, the firing temperature is 1450 to 1600 ° C.
A substrate 1 for a plasma display device was produced in the same manner as in Example 1 except for the above.

【0051】[0051]

【表3】 [Table 3]

【0052】比較例 一方、比較例として、従来の印刷方式により、ガラス製
の背面板10上にスクリーン印刷で電極12を形成し、
その間に隔壁11を形成すべくスクリーン印刷、乾燥を
10回繰り返した後、500〜700℃で焼成してプラ
ズマ表示装置用基板1を作製した(No.19)。
Comparative Example On the other hand, as a comparative example, the electrodes 12 are formed by screen printing on the glass rear plate 10 by the conventional printing method.
In the meantime, screen printing and drying were repeated 10 times to form the partition walls 11 and then baking was performed at 500 to 700 ° C. to manufacture the substrate 1 for plasma display device (No. 19).

【0053】以上のようにして得られたNo.1〜19
の試料について、隔壁11の形状、クラックの有無、電
極12との位置ずれを双眼顕微鏡で観察した結果を表4
に示す。この結果より、比較例であるNo.19は隔壁
11の形状が不明確であり、電極12との位置ずれが認
められた。これに対し、本発明実施例(No.1〜1
8)は電極12と隔壁11の位置ずれがなく、隔壁11
の形状も良好であった。なお、No.6,12,18は
溶媒量が多いために若干隔壁11に潰れが発生してい
た。
No. 1 obtained as described above. 1-19
Table 4 shows the results of observing the shape of the partition wall 11, the presence or absence of cracks, and the positional deviation from the electrode 12 with respect to the sample of Table 2 with a binocular microscope.
Shown in From this result, No. In No. 19, the shape of the partition wall 11 was unclear, and a positional deviation from the electrode 12 was recognized. On the other hand, the present invention example (No. 1 to 1)
8) shows that there is no positional deviation between the electrode 12 and the partition wall 11,
The shape of was also good. In addition, No. Nos. 6, 12, and 18 had a large amount of solvent, and thus the partition wall 11 was slightly crushed.

【0054】なお、上記実施例ではガラス製の背面板1
0を用いたが、アルミナ等の各種セラミックス製のもの
を用いても同様の結果であった。
In the above embodiment, the back plate 1 made of glass is used.
Although 0 was used, similar results were obtained even when various ceramics such as alumina were used.

【0055】[0055]

【表4】 [Table 4]

【0056】[0056]

【発明の効果】以上のように本発明によれば、セラミッ
クス又はガラスから成る背面板の一面に、セラミックス
又はガラスからなる複数の隔壁を備え、各隔壁間に形成
されたセルの底面全面に電極を備えてプラズマ表示装置
用基板を構成したことによって、放電領域を大きくして
発光効率を高めるとともに、隔壁と電極の位置ずれをな
くすことができる。
As described above, according to the present invention, a back plate made of ceramics or glass is provided with a plurality of partition walls made of ceramics or glass, and an electrode is formed on the entire bottom surface of the cell formed between the partition walls. By configuring the substrate for a plasma display device by including the above, it is possible to increase the discharge area to improve the light emission efficiency, and to eliminate the positional deviation between the partition wall and the electrode.

【0057】また、本発明によれば、セラミックス又は
ガラスの粉体と溶媒及び有機性添加物との混合物を成形
型の凹部中に充填するとともに、該成形型の凸部に電極
材を塗布し、これら混合物と電極材をセラミックス又は
ガラスからなる背面板の一面に接合する工程からプラズ
マ表示装置用基板を製造することによって、高精度で微
細な形状の隔壁を容易に形成することができ、しかも電
極と隔壁を同時に形成できることから製造工程を簡略化
することが可能で、低コストとすることができる。
Further, according to the present invention, a mixture of ceramics or glass powder, a solvent and an organic additive is filled in the concave portion of the molding die, and the electrode material is applied to the convex portion of the molding die. By manufacturing a substrate for a plasma display device from the step of joining the mixture and the electrode material to one surface of a back plate made of ceramics or glass, it is possible to easily form a partition wall with high precision and fine shape. Since the electrode and the partition can be formed at the same time, the manufacturing process can be simplified and the cost can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のプラズマ表示装置用基板を示す断面図
である。
FIG. 1 is a cross-sectional view showing a substrate for a plasma display device of the present invention.

【図2】(a)(b)は本発明のプラズマ表示装置用基
板の製造方法を説明するための図である。
2A and 2B are views for explaining a method of manufacturing a substrate for a plasma display device of the present invention.

【図3】従来のプラズマ表示装置用基板を示す断面図で
ある。
FIG. 3 is a cross-sectional view showing a conventional substrate for a plasma display device.

【符号の説明】[Explanation of symbols]

1:基板 10:背面板 11:隔壁 12:電極 13:セル 14:電極 15:正面板 20:成形型 20a:凹部 20b:凸部 21:混合物 22:電極材 1: Substrate 10: Back plate 11: Partition wall 12: Electrode 13: Cell 14: Electrode 15: Front plate 20: Mold 20a: Recess 20b: Convex 21: Mixture 22: Electrode material

───────────────────────────────────────────────────── フロントページの続き (72)発明者 酒井 久満 京都府京都市山科区東野北井ノ上町5番地 の22 京セラ株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hisami Sakai 22 Kyocera Corporation, 5-5 Higashinokitainouemachi, Yamashina-ku, Kyoto-shi, Kyoto

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】セラミックス又はガラスから成る背面板
に、セラミックス又はガラスからなる複数の隔壁を備
え、各隔壁間に形成されたセルの底面全面に電極を備え
たことを特徴とするプラズマ表示装置用基板。
1. A plasma display device comprising a back plate made of ceramics or glass, a plurality of partition walls made of ceramics or glass, and electrodes provided on the entire bottom surface of cells formed between the partition walls. substrate.
【請求項2】セラミックス又はガラスの粉体と溶媒及び
有機性添加物との混合物を成形型の凹部中に充填すると
ともに、該成形型の凸部に電極材を塗布し、これら混合
物と電極材をセラミックス又はガラスからなる背面板に
接合する工程からなるプラズマ表示装置用基板の製造方
法。
2. A mixture of ceramics or glass powder and a solvent and an organic additive is filled in a concave portion of a molding die, and an electrode material is applied to the convex portion of the molding die to prepare the mixture and the electrode material. A method for manufacturing a substrate for a plasma display device, which comprises the step of bonding a substrate to a back plate made of ceramics or glass.
JP30468895A 1995-09-06 1995-11-22 Method of manufacturing substrate for plasma display device Expired - Fee Related JP3340004B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP30468895A JP3340004B2 (en) 1995-11-22 1995-11-22 Method of manufacturing substrate for plasma display device
FR9610919A FR2738393B1 (en) 1995-09-06 1996-09-06 PLASMA DISPLAY SUBSTRATE AND METHOD FOR THE PRODUCTION THEREOF
US08/714,837 US6023130A (en) 1995-09-06 1996-09-06 Plasma display substrate and a production method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30468895A JP3340004B2 (en) 1995-11-22 1995-11-22 Method of manufacturing substrate for plasma display device

Publications (2)

Publication Number Publication Date
JPH09147754A true JPH09147754A (en) 1997-06-06
JP3340004B2 JP3340004B2 (en) 2002-10-28

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Country Link
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990012635A (en) * 1997-07-30 1999-02-25 엄길용 Manufacturing Method of Plasma Display Device
WO2000048218A1 (en) * 1999-02-12 2000-08-17 Toppan Printing Co., Ltd. Plasma display panel, method and device for production therefor
JP2001133758A (en) * 1999-11-09 2001-05-18 Toppan Printing Co Ltd Rear side plate for plasma addressed liquid crystal panel and its manufacturing method
US6247986B1 (en) 1998-12-23 2001-06-19 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6352763B1 (en) 1998-12-23 2002-03-05 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US7033534B2 (en) 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US7176492B2 (en) 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
JPWO2010030032A1 (en) * 2008-09-12 2012-02-02 日本碍子株式会社 Solid forming part manufacturing method

Cited By (18)

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KR19990012635A (en) * 1997-07-30 1999-02-25 엄길용 Manufacturing Method of Plasma Display Device
US6713526B2 (en) 1998-12-23 2004-03-30 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6352763B1 (en) 1998-12-23 2002-03-05 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6802754B2 (en) 1998-12-23 2004-10-12 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6325610B2 (en) 1998-12-23 2001-12-04 3M Innovative Properties Company Apparatus for precise molding and alignment of structures on a substrate using a stretchable mold
USRE40967E1 (en) * 1998-12-23 2009-11-10 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6616887B2 (en) 1998-12-23 2003-09-09 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6247986B1 (en) 1998-12-23 2001-06-19 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6984935B2 (en) 1998-12-23 2006-01-10 3M Innovative Properties Company Method for precise molding and alignment of structures on a substrate using a stretchable mold
US6632116B2 (en) 1999-02-12 2003-10-14 Toppan Printing Co., Ltd. Plasma display panel, manufacturing method and manufacturing apparatus of the same
WO2000048218A1 (en) * 1999-02-12 2000-08-17 Toppan Printing Co., Ltd. Plasma display panel, method and device for production therefor
JP2001133758A (en) * 1999-11-09 2001-05-18 Toppan Printing Co Ltd Rear side plate for plasma addressed liquid crystal panel and its manufacturing method
JP4590664B2 (en) * 1999-11-09 2010-12-01 凸版印刷株式会社 Back plate of plasma addressed liquid crystal panel and manufacturing method thereof
US6821178B2 (en) 2000-06-08 2004-11-23 3M Innovative Properties Company Method of producing barrier ribs for plasma display panel substrates
US7033534B2 (en) 2001-10-09 2006-04-25 3M Innovative Properties Company Method for forming microstructures on a substrate using a mold
US7176492B2 (en) 2001-10-09 2007-02-13 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold and articles formed by the method
US7429345B2 (en) 2001-10-09 2008-09-30 3M Innovative Properties Company Method for forming ceramic microstructures on a substrate using a mold
JPWO2010030032A1 (en) * 2008-09-12 2012-02-02 日本碍子株式会社 Solid forming part manufacturing method

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