JPH09102580A - Resin-sealed semiconductor device and fabrication thereof - Google Patents

Resin-sealed semiconductor device and fabrication thereof

Info

Publication number
JPH09102580A
JPH09102580A JP7336464A JP33646495A JPH09102580A JP H09102580 A JPH09102580 A JP H09102580A JP 7336464 A JP7336464 A JP 7336464A JP 33646495 A JP33646495 A JP 33646495A JP H09102580 A JPH09102580 A JP H09102580A
Authority
JP
Japan
Prior art keywords
metal substrate
resin
circuit
metal
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7336464A
Other languages
Japanese (ja)
Other versions
JP3130239B2 (en
Inventor
Hideki Takehara
秀樹 竹原
浩司 ▲高▼田
Koji Takada
Ryutaro Arakawa
竜太郎 荒川
Kazuhiro Aoi
和廣 青井
Takahiro Kumakawa
隆博 隈川
Masami Yokozawa
眞覩 横沢
Toru Nomura
徹 野村
Tatsuo Maeoka
達夫 前岡
Hiroyuki Handa
浩之 半田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP07336464A priority Critical patent/JP3130239B2/en
Publication of JPH09102580A publication Critical patent/JPH09102580A/en
Application granted granted Critical
Publication of JP3130239B2 publication Critical patent/JP3130239B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4911Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
    • H01L2224/49111Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires

Abstract

PROBLEM TO BE SOLVED: To provide a resin-sealed semiconductor device which is improved in its insulating and heat-radiating characteristics. SOLUTION: A power semiconductor device 12, a controlling integrated circuit device 13, etc., are mounted on metallic substrates 11a and 11b which are made by blanking operation to form part of a circuit. The devices and substrate are connected by a metallic thin wire 15. The metal substrates 11a and 11b are sealingly fixedly molded with first molding resin 16 having a high thermal conductivity between the substrates and on their bottom sides. The metal substrates 11a and 11b having the power semiconductor device 12 and so on mounted thereon are further molded and sealed with second molding resin 17 having a high thermal conductivity. One ends of the metal substrates 11a and 11b form external terminals 18. Since the metal substrates 11a and 11b are sealed at their peripheries with the first and second molding resins 16 and 17 having high thermal conductivities, the heat radiating characteristic is improved. When the resins are increased in their thickness, the dielectric strength of the semiconductor device is improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明はパワー半導体素子、
制御用集積回路素子等を搭載して大電力を扱う樹脂封止
型半導体装置およびその製造方法、特に放熱特性を改善
した小型の樹脂封止型半導体装置およびその製造方法に
関するものである。
TECHNICAL FIELD The present invention relates to a power semiconductor device,
The present invention relates to a resin-encapsulated semiconductor device that mounts a control integrated circuit element or the like and handles a large amount of power, and a method for manufacturing the same, and particularly to a small-sized resin-encapsulated semiconductor device with improved heat dissipation characteristics and a method for manufacturing the same.

【0002】[0002]

【従来の技術】パワー半導体素子と制御用集積回路素子
とを搭載し、大電力を扱う樹脂封止型半導体装置の代表
例はインテリジェントパワーモジュール(以下、IPM
と称す)と呼ばれるものである。ほとんどのIPMは、
金属基板の絶縁膜上に形成した導電性金属膜回路にパワ
ー半導体素子、制御用集積回路素子、その他の電子部品
を搭載し、絶縁材からなるケースに収納したものであっ
た。すなわち図16に示すように、従来の樹脂封止型半
導体装置は、放熱用の金属基板1上に絶縁膜2を設け、
前記絶縁膜2上の目的とする箇所に導電性金属膜回路3
を設けたもので、その上にパワー半導体素子4や制御用
集積回路素子5を搭載し、金属細線で結線した構造を有
していた。なお、図16において、外部との接続用に外
部端子6〜10が接続されているものである。
2. Description of the Related Art A typical example of a resin-encapsulated semiconductor device that mounts a power semiconductor element and a control integrated circuit element and handles a large amount of power is an intelligent power module (hereinafter referred to as IPM).
It is called). Most IPMs
A power semiconductor element, a control integrated circuit element, and other electronic parts are mounted on a conductive metal film circuit formed on an insulating film of a metal substrate and housed in a case made of an insulating material. That is, as shown in FIG. 16, the conventional resin-encapsulated semiconductor device has an insulating film 2 provided on a metal substrate 1 for heat dissipation,
A conductive metal film circuit 3 is provided at a desired position on the insulating film 2.
And the power semiconductor element 4 and the control integrated circuit element 5 are mounted thereon, and they are connected by metal thin wires. In addition, in FIG. 16, external terminals 6 to 10 are connected for external connection.

【0003】[0003]

【発明が解決しようとする課題】上述のような従来の構
成では、放熱特性は金属基板上の絶縁膜の厚みに依存
し、その膜厚を薄くすれば放熱特性が良好となるが、絶
縁特性が悪化してしまう。逆に絶縁膜の膜厚を厚くすれ
ば絶縁特性が良好となるものの、放熱特性が悪化してし
まう。
In the conventional structure as described above, the heat dissipation characteristic depends on the thickness of the insulating film on the metal substrate, and the thinner the film thickness, the better the heat dissipation characteristic. Will get worse. On the contrary, if the thickness of the insulating film is increased, the insulation characteristic is improved, but the heat dissipation characteristic is deteriorated.

【0004】本発明は、絶縁特性と放熱(熱抵抗)特性
という二つの特性を改善しようとするものであり、樹脂
封止型半導体装置として、一体化させるのに用いる封止
樹脂によって従来の金属基板上の絶縁膜に相当する絶縁
領域を得るものである。
The present invention is intended to improve two characteristics of insulation characteristics and heat dissipation (thermal resistance) characteristics. As a resin-encapsulated semiconductor device, a conventional resin is used by a sealing resin used for integration. This is to obtain an insulating region corresponding to the insulating film on the substrate.

【0005】[0005]

【課題を解決するための手段】本発明は、従来のIPM
の放熱性、絶縁性のための構造を打破し、パッケージ素
子構造をIPMに適用できるように、放熱性、絶縁性の
面から構造改革した点に特徴を有するものであり、その
構成として、金属板を打ち抜き加工して各金属基板領域
を有する回路構成を形成し、パワー半導体素子や制御用
集積回路素子などの電子部品を搭載し、前記各金属基板
領域を固定する第1の樹脂部を設け、また前記回路構成
された前記樹脂部の開口部を通っている金属板部分やタ
イバーを切断し、一部回路を形成して電気的試験を連続
して行ない、その後で金属基板の外枠を切断して電極を
形成して回路構成体を形成し、そして前記回路構成体を
第2の樹脂で封止した構成である。また第1の樹脂と第
2の樹脂とは、絶縁性のエポキシ樹脂またはポリフェニ
レンサルファイド(PPS樹脂)により構成されるもの
である。
The present invention provides a conventional IPM.
It is characterized by structural reform from the viewpoint of heat dissipation and insulation so that the structure for heat dissipation and insulation can be broken down and the package element structure can be applied to the IPM. A plate is punched to form a circuit configuration having each metal substrate region, electronic components such as a power semiconductor element and a control integrated circuit element are mounted, and a first resin portion for fixing each metal substrate region is provided. In addition, the metal plate portion or the tie bar passing through the opening of the resin portion configured as the circuit is cut, a part of the circuit is formed and the electrical test is continuously performed, and then the outer frame of the metal substrate is removed. In this structure, the electrodes are cut to form a circuit structure, and the circuit structure is sealed with a second resin. The first resin and the second resin are made of insulating epoxy resin or polyphenylene sulfide (PPS resin).

【0006】また第1の回路基板である前記回路構成体
と電子部品を搭載した第2の回路基板とを積層し、樹脂
で封止するものである。
Further, the above-mentioned circuit structure body which is a first circuit board and a second circuit board on which electronic parts are mounted are laminated and sealed with a resin.

【0007】[0007]

【発明の実施の形態】上述の構成のように、熱伝導率の
大きい成型樹脂材料(第1の樹脂、第2の樹脂)を絶縁
部の形成にも利用することで、放熱特性を向上(熱抵抗
を低く)させ、また絶縁部の厚みを大きくして、絶縁耐
圧を高くすることができるようになり、従来のような絶
縁性と放熱性のトレードオフの関係を改善できるもので
ある。すなわち、放熱性や絶縁性の点で好適な絶縁性の
エポキシ樹脂またはポリフェニレンサルファイド(PP
S樹脂)で外囲領域を封止することにより、パワー半導
体素子、制御用集積回路素子等を搭載して大電力を扱う
樹脂封止型半導体装置の放熱性と絶縁耐性を向上させる
ことができる。
BEST MODE FOR CARRYING OUT THE INVENTION As in the above-described structure, the molding resin material (first resin, second resin) having a large thermal conductivity is also used for forming the insulating portion, so that the heat radiation characteristic is improved ( By lowering the thermal resistance and increasing the thickness of the insulating portion to increase the withstand voltage, it is possible to improve the conventional trade-off relationship between the insulating property and the heat radiation property. That is, insulative epoxy resin or polyphenylene sulfide (PP) suitable for heat dissipation and insulation.
By sealing the surrounding area with (S resin), it is possible to improve the heat dissipation and insulation resistance of the resin-sealed semiconductor device that mounts a power semiconductor element, a control integrated circuit element, etc. and handles a large amount of power. .

【0008】また第1の樹脂で金属基板間および底面領
域を封止固定したものに対して、タイバーの切断等を行
ない、一部回路を構成し、この時点で所定の電気的特性
を測定する電気的試験を連続で行ない、回路構成の初期
動作特性を確認することもできる。また金属板の打ち抜
き加工により、回路構成した金属基板には外部電極(外
部端子)に相当する領域を形成しておくことにより、そ
の後の金属基板の切断や折曲げ加工などで外部電極とす
ることができる。これも材料部品コストを低減させ、製
造原価を安価にする一因となる。
A tie bar is cut off from a first resin which has been sealed and fixed between the metal substrates and in the bottom region to form a part of the circuit, and at this time, predetermined electrical characteristics are measured. It is also possible to carry out electrical tests continuously to confirm the initial operating characteristics of the circuit configuration. Also, by punching the metal plate, areas corresponding to the external electrodes (external terminals) are formed on the circuit-configured metal substrate, so that the external electrodes can be formed by subsequent cutting or bending of the metal substrate. You can This also contributes to the reduction of material parts cost and the manufacturing cost.

【0009】次に本発明の実施の形態について図面を参
照しながら説明する。図1は本発明の樹脂封止型半導体
装置における実施の形態の一例の構成を示す概略断面図
である。図1に示すように本実施の形態は、パッケージ
素子の構造を有しており、パッケージ素子構造をIPM
に適用した場合の従来にない特徴について、以降、詳細
に述べ、単なる構造の転化ではない旨を説明する。
Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a schematic cross-sectional view showing the configuration of an example of an embodiment of a resin-sealed semiconductor device of the present invention. As shown in FIG. 1, the present embodiment has a package element structure, and the package element structure is an IPM.
The feature which is not existent in the prior art when applied to is described in detail below, and it is explained that it is not merely a structural conversion.

【0010】図1の本実施の形態の樹脂封止型半導体装
置は、厚み0.5mmの銅板をリードフレーム加工のご
とく、打ち抜き加工によって所望の金属板領域を有して
回路構成された金属基板11a,11b上にパワー半導
体素子12、および制御用集積回路素子13、その他の
電子部品14が搭載され、図においては、パワー半導体
素子12と外部端子18とが金属細線15で接続されて
いる。そして、高熱伝導率の成形用の第1の樹脂16で
金属基板11a,11b間およびその底面領域が封止固
定されている。また、パワー半導体素子12、制御用集
積回路素子13、その他の電子部品14が搭載された金
属基板11a,11b面および底面の前記第1の樹脂1
6の端部領域は、高熱伝導率の成形用の第2の樹脂17
で封止されている。なお、外部端子18は金属基板11
aの端部で構成されている。
The resin-encapsulated semiconductor device of the present embodiment shown in FIG. 1 is a metal substrate having a circuit structure having a desired metal plate region by punching a copper plate having a thickness of 0.5 mm like lead frame processing. A power semiconductor element 12, a control integrated circuit element 13, and other electronic components 14 are mounted on 11a and 11b. In the figure, the power semiconductor element 12 and an external terminal 18 are connected by a thin metal wire 15. Then, between the metal substrates 11a and 11b and the bottom surface region thereof are sealed and fixed by the first resin 16 having a high thermal conductivity for molding. Further, the first resin 1 on the surfaces and bottom surfaces of the metal substrates 11a and 11b on which the power semiconductor element 12, the control integrated circuit element 13, and other electronic components 14 are mounted.
The end region of 6 has a second resin 17 for molding with high thermal conductivity.
It is sealed with. The external terminal 18 is the metal substrate 11
It is composed of the end of a.

【0011】本実施の形態の樹脂封止型半導体装置によ
れば、銅板等の金属板の打ち抜き加工により形成した回
路基板である金属基板11a,11bの周囲領域を高熱
伝導率の成形用の第1,第2の樹脂16,17で封止し
ているので、放熱特性を向上させ、またその樹脂の厚み
を大きくすることで、絶縁耐圧を向上させることができ
る。
According to the resin-encapsulated semiconductor device of this embodiment, the peripheral regions of the metal substrates 11a and 11b, which are circuit boards formed by punching a metal plate such as a copper plate, are used for molding with high thermal conductivity. Since the first and second resins 16 and 17 are used for sealing, the heat dissipation characteristics can be improved, and the withstand voltage can be improved by increasing the thickness of the resin.

【0012】前記第1の樹脂16および第2の樹脂17
としては、絶縁性のエポキシ樹脂またはポリフェニレン
サルファイド(PPS樹脂)が放熱性、絶縁性の点で好
適であり、いずれも封止成形工程に使用しても支障はな
い。また他には、液晶ポリマー、ポリスチレンなどの樹
脂材料も封止成形用に利用できる。さらに、前記の樹脂
に対して、放熱性向上のための添加するフィラーとして
は、シリカ(SiC)、アルミナ、マグネシア、および
窒化アルミニウムなどがよく、特にシリカ、およびアル
ミナは、熱伝導率性、樹脂の熱応力の低減において有用
なものである。
The first resin 16 and the second resin 17
For this, an insulating epoxy resin or polyphenylene sulfide (PPS resin) is preferable in terms of heat dissipation and insulating properties, and any of them can be used in the encapsulation molding step. In addition, resin materials such as liquid crystal polymer and polystyrene can also be used for encapsulation molding. Further, silica (SiC), alumina, magnesia, aluminum nitride and the like are preferable as a filler added to the above resin for improving heat dissipation, and particularly silica and alumina have thermal conductivity, resin It is useful in reducing the thermal stress of.

【0013】また、金属基板11a,11bにおいてそ
の厚みに差を設け、金属基板11aも厚みを0.7mm
としてパワー半導体素子12を搭載し、金属基板11b
の厚みを0.5mmとして制御用集積回路素子13を搭
載することで、放熱特性、絶縁特性がさらに向上する。
そのときの金属基板11a,11bの底面領域の樹脂厚
は、パワー半導体素子12の下部の第1の樹脂16では
(0.3±0.08)mm、制御用集積回路素子13の下
部では(0.5±0.1)mmである。なお、金属基板1
1aと金属基板11bとに厚み差を設ける方法として
は、金属板を打ち抜き加工した後に、目的とする箇所の
部分エッチングや部分研磨をするという方法がある。ま
た目的とする箇所に部分的に厚み差を設けた金属板を打
ち抜き加工することで、金属基板11a,11bに厚み
差を設けることもできる。
Further, the metal substrates 11a and 11b have different thicknesses, and the metal substrate 11a also has a thickness of 0.7 mm.
Power semiconductor element 12 is mounted as a metal substrate 11b
By mounting the control integrated circuit element 13 with the thickness of 0.5 mm, the heat dissipation characteristics and the insulation characteristics are further improved.
The resin thickness of the bottom surface regions of the metal substrates 11a and 11b at that time is (0.3 ± 0.08) mm in the first resin 16 below the power semiconductor element 12 and (0.3 ± 0.08) mm in the lower portion of the control integrated circuit element 13. It is 0.5 ± 0.1) mm. The metal substrate 1
As a method of providing a thickness difference between 1a and the metal substrate 11b, there is a method of punching a metal plate and then partially etching or polishing a target portion. Further, it is also possible to provide a thickness difference between the metal substrates 11a and 11b by punching a metal plate having a thickness difference partially provided at a target location.

【0014】なお、銅板を打ち抜き加工によって所望の
金属板領域を有して回路構成された金属基板11a,1
1bは、あらかじめメッキした金属板を打ち抜き加工し
たものであり、さらに金属基板11は、成形用の第1の
樹脂16との密着性を向上させるため、その底面領域の
みを黒化処理により、その表面を荒し、粗面としたもの
である。
The metal boards 11a, 1 having a circuit structure having a desired metal plate area by punching a copper plate.
1b is obtained by punching a pre-plated metal plate. Further, the metal substrate 11 has its bottom surface region blackened to improve its adhesion to the first resin 16 for molding. The surface is roughened and roughened.

【0015】次に本発明の樹脂封止型半導体装置の製造
方法における実施の形態の一例として、図1に示した樹
脂封止型半導体装置を製造する方法について説明する。
図2〜図6は本実施の形態の工程を示す斜視図である。
Next, a method for manufacturing the resin-encapsulated semiconductor device shown in FIG. 1 will be described as an example of the embodiment of the method for manufacturing the resin-encapsulated semiconductor device of the present invention.
2 to 6 are perspective views showing the steps of this embodiment.

【0016】まず図2に示すように、たとえばあらかじ
め表面をメッキした厚み0.5mmの銅板を打ち抜き加
工し、さらに底面領域を粗面加工し、回路構成した厚み
0.5mmの金属基板11上の目的とする各領域(11
a,11b)上にパワー半導体素子12、制御用集積回
路素子13、その他の電子部品14を搭載する。この搭
載は、半田、導電性接着剤等を用いて行なう。そして、
パワー半導体素子12と金属基板11aや、パワー半導
体素子12間とを金属細線15により結線する。この結
線は、通常のワイヤーボンディング工法により行なう。
First, as shown in FIG. 2, for example, a copper plate having a thickness of 0.5 mm and having a surface plated in advance is punched, and a bottom surface region is roughened to form a circuit on a metal substrate 11 having a thickness of 0.5 mm. Target areas (11
A power semiconductor element 12, a control integrated circuit element 13, and other electronic components 14 are mounted on a, 11b). This mounting is performed using solder, a conductive adhesive, or the like. And
The power semiconductor element 12 is connected to the metal substrate 11a and between the power semiconductor elements 12 by a metal thin wire 15. This connection is performed by a normal wire bonding method.

【0017】次に図3に示すように、高熱伝導率の成形
用の第1の樹脂16で金属基板11間および底面領域を
封止固定する。この工程では、後工程で金属基板11の
タイバーカット部11cの切断や外枠フレーム11dを
切断して回路構成体を形成した際に、各金属基板11
a,11bが離脱しないように連結固定する。なお、図
においては、第1の樹脂16の部分を示すため、一部ハ
ッチングしている。またこの工程では、金属基板11の
底面領域は、黒化処理等により、その表面を荒し、粗面
としているので、第1の樹脂16との密着性は向上して
いる。また第1の樹脂16で金属基板11間および底面
領域を封止固定する際、金属基板11のパワー半導体素
子12、制御用集積回路素子13、その他の電子部品1
4が搭載される領域以外を封止して被覆することによ
り、樹脂の変形応力により金属基板11に反りが発生
し、金属基板11が変形するのを抑制することができ
る。
Next, as shown in FIG. 3, the first resin 16 for molding having high thermal conductivity is used to seal and fix the space between the metal substrates 11 and the bottom surface region. In this step, when the tie bar cut portion 11c of the metal substrate 11 or the outer frame 11d is cut to form a circuit structure in a later step, each metal substrate 11 is cut.
Connect and fix so that a and 11b do not separate. In addition, in the drawing, in order to show the portion of the first resin 16, it is partially hatched. Further, in this step, the bottom surface region of the metal substrate 11 is roughened and roughened by blackening treatment or the like, so that the adhesion with the first resin 16 is improved. Further, when the metal substrates 11 and the bottom surface region are sealed and fixed by the first resin 16, the power semiconductor element 12, the control integrated circuit element 13, and the other electronic components 1 of the metal substrate 11 are sealed.
By sealing and covering the area other than the area on which 4 is mounted, it is possible to prevent the metal substrate 11 from warping due to the deformation stress of the resin and deforming the metal substrate 11.

【0018】次に図4に示すように、第1の樹脂16で
金属基板11a,11b間および底面領域を封止固定し
たものに対して、タイバーカットしてタイバーカット部
11cを形成して一部外部端子18を形成したり、一部
樹脂領域内の開口部を通っている金属板部分を切断し
て、一部回路を形成する。この時点で所定の電気的特性
を測定する電気的試験を行ない、回路構成の初期動作特
性を確認することができる。したがって、この時点で不
良の素子が発見された場合は交換することができる。ま
た電気的特性も外枠フレーム11dを切断していないの
で、フレーム状で順次連続して測定することができ、検
査効率を高めることができる。
Next, as shown in FIG. 4, a tie bar is cut to form a tie bar cut portion 11c on the metal resin substrate 11a, 11b sealed and fixed between the metal substrates 11a and 11b and the bottom surface region with the first resin 16. The external terminals 18 are formed, or the metal plate portion passing through the opening in the partial resin region is cut to form a partial circuit. At this point, an electrical test for measuring a predetermined electrical characteristic can be performed to confirm the initial operating characteristic of the circuit configuration. Therefore, if a defective element is found at this point, it can be replaced. In addition, since the outer frame 11d is not cut in terms of electrical characteristics, it is possible to successively and sequentially measure in a frame shape, and inspection efficiency can be improved.

【0019】次に図5に示すように、金属基板11の外
枠フレーム11dを切断して回路構成体を完成させ、ま
た切断後の金属基板11の端部の加工により外部端子1
8を形成し、樹脂封止型半導体装置構成体19(回路基
板)を形成する。
Next, as shown in FIG. 5, the outer frame 11d of the metal substrate 11 is cut to complete the circuit structure, and the external terminal 1 is processed by processing the end portion of the metal substrate 11 after cutting.
8 is formed to form a resin-encapsulated semiconductor device structure 19 (circuit board).

【0020】なお、金属基板11の端部の加工による外
部端子18の形成は、打ち抜き加工により形成するが、
その場合、打ち抜き加工時の金型の雄型と雌型との寸法
に差を設け、雌型を雄型よりも寸法を大きくした金型に
より打ち抜くことにより、外部端子18に丸みを形成す
ることができる。そして雄型と雌型との寸法差は、金属
基板厚の10%〜80%程度とする。寸法差が80%を
超えると、打ち抜き加工自体ができなくなり、また打ち
抜き精度も低下する。外部端子18の丸みは、完成した
樹脂封止型半導体装置をマザーボード(プリント基板)
に半田接合する場合、マザーボード側の穴に容易に外部
端子18を嵌入させることができ、実装効率を向上させ
るものである。また外部端子18の形成時の打ち抜き加
工に限定することなく、金属基板11の打ち抜き加工に
おいては、その打ち抜き方向を金属基板11の底面側、
すなわち、第1の樹脂16で封止固定する側から打ち抜
き、金属基板11の上面の幅が下面の幅より小さくなる
ようにした方がよい。これは金属基板11の上面の幅が
下面の幅より小さくなるように打ち抜くことにより、金
属基板11の上面の幅が下面の幅より大きくなるように
打ち抜いたときよりも、金属基板11の樹脂封止領域の
局部的な樹脂厚の違いにより発生する絶縁強度の低下や
熱抵抗の増大を防止できるものである。
Although the external terminals 18 are formed by processing the end portions of the metal substrate 11, they are formed by punching.
In that case, the outer terminal 18 is rounded by punching the female die with a die having a larger dimension than the male die, by providing a difference in the dimensions of the male die and the female die during punching. You can The dimensional difference between the male mold and the female mold is about 10% to 80% of the thickness of the metal substrate. When the dimensional difference exceeds 80%, the punching process itself cannot be performed, and the punching accuracy also deteriorates. For the roundness of the external terminals 18, the completed resin-encapsulated semiconductor device is used as a mother board (printed circuit board).
In the case of solder joining to, the external terminal 18 can be easily fitted into the hole on the motherboard side, and the mounting efficiency is improved. The punching process for forming the external terminals 18 is not limited to the punching process for the metal substrate 11.
That is, it is better to punch out from the side that is sealed and fixed with the first resin 16 so that the width of the upper surface of the metal substrate 11 is smaller than the width of the lower surface. This is because the metal substrate 11 is punched so that the width of the upper surface of the metal substrate 11 is smaller than that of the lower surface thereof, and the resin sealing of the metal substrate 11 is performed more than when the punching is performed so that the width of the upper surface of the metal substrate 11 is larger than that of the lower surface. It is possible to prevent a decrease in insulation strength and an increase in thermal resistance caused by a local difference in resin thickness in the stop region.

【0021】最後に図6に示すように、前記外部端子1
8を突出させた構成になるように、前記形成した樹脂封
止型半導体装置構成体19の外囲、すなわちパワー半導
体素子12、制御用集積回路素子13、その他の電子部
品14が搭載された金属基板11面の表面領域および底
面の前記第1の樹脂16の端部領域を、高熱伝導率の成
形用の第2の樹脂17で封止する。図6では、外部端子
18は第2の樹脂17部より水平に突出した構成として
いるが、加工により、下方に折曲げたり、上方に折曲げ
たりしてもよい。また外部端子18については、金属基
板11の打ち抜き加工の段階で外部端子18となる領域
を大きめに形成することで長さの調整は容易にできる。
Finally, as shown in FIG. 6, the external terminal 1
A metal on which the outer periphery of the resin-encapsulated semiconductor device structure 19 formed as described above, that is, the power semiconductor element 12, the control integrated circuit element 13, and other electronic components 14 are mounted so as to have a configuration in which 8 is projected. The surface region of the surface of the substrate 11 and the end region of the first resin 16 on the bottom face are sealed with a second resin 17 for molding having a high thermal conductivity. In FIG. 6, the external terminal 18 is configured to project horizontally from the second resin 17 portion, but it may be bent downward or upward depending on the processing. Further, the length of the external terminal 18 can be easily adjusted by forming a large area for the external terminal 18 at the stage of punching the metal substrate 11.

【0022】なお、図1に示した実施の形態で説明した
ように、第1の樹脂16、および第2の樹脂17には絶
縁性のエポキシ樹脂またはポリフェニレンサルファイド
(PPS樹脂)が好適であり、いずれも成形工程に使用
しても支障はない。また他には、液晶ポリマー、ポリス
チレンなどの樹脂材料も封止成形用に利用できる。さら
に、前記の樹脂に対して、放熱性向上のための添加する
フィラーとしては、シリカ(SiC)、アルミナ、マグ
ネシア、窒化アルミニウムなどがよく、特にシリカ、ア
ルミナは、熱伝導率性、樹脂の熱応力の低減において
は、有用である。
As described in the embodiment shown in FIG. 1, an insulating epoxy resin or polyphenylene sulfide (PPS resin) is suitable for the first resin 16 and the second resin 17, Both can be used in the molding process without any problems. In addition, resin materials such as liquid crystal polymer and polystyrene can also be used for encapsulation molding. Further, silica (SiC), alumina, magnesia, aluminum nitride and the like are preferable as the filler added to the above resin for improving heat dissipation, and silica and alumina are particularly preferable for the thermal conductivity and the heat of the resin. It is useful in reducing stress.

【0023】また金属基板11a,11bに厚み差を設
け、金属基板11aを0.7mmとしてパワー半導体素
子12を搭載し、金属基板11bを0.5mmとして制
御用集積回路素子13を搭載することにより、放熱特
性、絶縁特性がさらに好適となる。そのときの金属基板
11a,11bの底面領域の樹脂厚については、パワー
半導体素子12の下部の第1の樹脂16を(0.3±0.
08)mm、制御用集積回路素子13の下部の第1の樹
脂16を(0.5±0.1)mmとした。なお、金属基板
11a,11bに厚み差を設ける方法については、図1
に示した実施の形態で説明した通りである。
By providing a thickness difference between the metal substrates 11a and 11b, mounting the power semiconductor element 12 with the metal substrate 11a set to 0.7 mm, and mounting the control integrated circuit element 13 with the metal substrate 11b set to 0.5 mm. Further, the heat dissipation characteristics and the insulation characteristics become more preferable. Regarding the resin thickness of the bottom surface regions of the metal substrates 11a and 11b at that time, the first resin 16 under the power semiconductor element 12 is (0.3 ± 0.
08) mm, and the first resin 16 under the control integrated circuit element 13 was (0.5 ± 0.1) mm. As for the method of providing the metal substrates 11a and 11b with a thickness difference, FIG.
This is as described in the embodiment shown in FIG.

【0024】本実施の形態では、金属板を打ち抜き加工
した金属基板11上の目的とする各領域(11a,11
b)上にパワー半導体素子12、制御用集積回路素子1
3、その他の電子部品14を搭載し、金属細線15によ
り結線した後に高熱伝導率の成形用の第1の樹脂16で
金属基板11間および底面領域を封止固定する例を示し
たが、このような工程順序において、他の実施の形態と
しては、金属板を打ち抜き加工した金属基板11a,1
1b間および底面領域を封止固定した後に、金属基板1
1a,11b上にパワー半導体素子12、および制御用
集積回路素子13、その他の電子部品14を搭載し、金
属細線15により結線する場合もある。このように、パ
ワー半導体素子12などを搭載する前に金属基板の底面
領域等を封止固定する場合、パワー半導体素子12等の
電子部品が搭載された金属基板11に対して封止する場
合に比較し、金属基板11上の表面凹凸が少ない分、封
止の精度を向上できるという利点があり、封止固定の際
に、パワー半導体素子12等の電子部品に対して損傷を
与えることもなくなる。また封止工程の際の金属基板1
1a,11bに付着した第1の樹脂16の樹脂ばりを除
去した後で、パワー半導体素子12等の電子部品を搭載
できる。
In the present embodiment, the respective target regions (11a, 11a) on the metal substrate 11 obtained by punching a metal plate.
b) Power semiconductor device 12 and control integrated circuit device 1 on top
3, an example in which the other electronic components 14 are mounted, the metal thin wires 15 are connected, and then the first resin 16 for molding having high thermal conductivity is used to seal and fix the space between the metal substrates 11 and the bottom surface region. In such a process sequence, as another embodiment, metal substrates 11a, 1 obtained by punching a metal plate are used.
After sealing and fixing the space between 1b and the bottom area, the metal substrate 1
In some cases, the power semiconductor element 12, the control integrated circuit element 13 and other electronic components 14 are mounted on the la and la, and are connected by the thin metal wires 15. In this way, when sealing and fixing the bottom area of the metal substrate before mounting the power semiconductor element 12 or the like, when sealing the metal substrate 11 on which electronic components such as the power semiconductor element 12 are mounted, In comparison, the surface unevenness on the metal substrate 11 is small, so that there is an advantage that the accuracy of sealing can be improved, and electronic components such as the power semiconductor element 12 are not damaged at the time of sealing and fixing. . In addition, the metal substrate 1 in the sealing step
After removing the resin flash of the first resin 16 adhering to 1a and 11b, electronic components such as the power semiconductor element 12 can be mounted.

【0025】次に本発明の樹脂封止型半導体装置におけ
る実施の形態の他の例について、図7を参照して説明す
る。
Next, another example of the embodiment of the resin-sealed semiconductor device of the present invention will be described with reference to FIG.

【0026】図7(a)に示す樹脂封止型半導体装置
は、図5に示した樹脂封止型半導体装置構成体19(回
路基板)の外部端子18を折り曲げ加工したものに対し
て、集積回路素子20をはじめ、抵抗素子、コンデンサ
等の電子部品を搭載した回路基板21をその周辺端部に
形成した貫通穴22や切角部23などの固定手段を通し
て、係合させて積層したものであり、2層基板による樹
脂封止型半導体装置である。そして外部端子18を突出
させるように、第2の樹脂17で各基板の間隙および外
囲領域を封止した構成である。前記固定手段である貫通
穴22や切角部23の形成は、回路基板の打ち抜き加工
により形成できる。なお、図7(a)は、便宜上、内部
の状態が認識できるように透視図としている。また前記
固定手段である貫通穴22や切角部23への外部端子1
8の係合状態は、図7(b),(c)に示している。
The resin-encapsulated semiconductor device shown in FIG. 7A is integrated with the resin-encapsulated semiconductor device structure 19 (circuit board) shown in FIG. A circuit board 21 on which electronic components such as a circuit element 20 and a resistance element, a capacitor, etc. are mounted is engaged and laminated through fixing means such as a through hole 22 and a cut corner portion 23 formed in a peripheral end portion thereof. It is a resin-sealed semiconductor device with a two-layer substrate. Then, the gap and the surrounding area of each substrate are sealed with the second resin 17 so that the external terminals 18 are projected. The through holes 22 and the cut corners 23 serving as the fixing means can be formed by punching the circuit board. Note that FIG. 7A is a perspective view so that the internal state can be recognized for convenience. Further, the external terminal 1 to the through hole 22 and the cut corner portion 23 which are the fixing means is provided.
The engagement state of No. 8 is shown in FIGS.

【0027】また前記樹脂封止型半導体装置構成体19
の外部端子18に対して、図8(a)〜(d)に示すよ
うに、切欠部18a、突出部18b、突出部18c、お
よび、くぼみ部18dを設けることにより、回路基板2
1を樹脂封止型半導体装置構成体19に対して、容易に
係合させて積層することができる。また外部端子18に
図8(e)〜(g)に示すような係合穴18e,18
f,18gを形成し、その係合穴18e,18f,18
gに対して、突起等を形成した回路基板21の貫通穴2
2や切角部23を係合させることにより、積層すること
もできる。
The resin-encapsulated semiconductor device structure 19 is also provided.
As shown in FIGS. 8A to 8D, the external terminal 18 is provided with the cutout portion 18a, the protruding portion 18b, the protruding portion 18c, and the recessed portion 18d.
1 can be easily engaged with the resin-sealed semiconductor device structure 19 to be laminated. Further, the external terminals 18 are provided with engaging holes 18e, 18e as shown in FIGS.
f, 18g are formed and their engaging holes 18e, 18f, 18 are formed.
g of the through hole 2 of the circuit board 21 in which a protrusion or the like is formed.
It is also possible to stack them by engaging the two and the cut corners 23.

【0028】なお、図7に示す2層基板による樹脂封止
型半導体装置において、第1の基板である樹脂封止型半
導体装置構成体19と、第2の基板である回路基板21
とは、電気的に信号のやりとりが可能なように、回路基
板21に形成した配線24と外部端子18とが導通して
いるものである。
In the resin-encapsulated semiconductor device using the two-layer substrate shown in FIG. 7, the resin-encapsulated semiconductor device structure 19 which is the first substrate and the circuit board 21 which is the second substrate.
Here, the wiring 24 formed on the circuit board 21 and the external terminal 18 are electrically connected so that signals can be electrically exchanged.

【0029】また、図7(a)に示すような2層基板に
よる樹脂封止型半導体装置の製造方法では、樹脂封止型
半導体装置構成体19に対して、回路基板21を積層し
ているので、その回路基板21が蓋として作用する場合
があり、第2の樹脂17で樹脂封止型半導体装置構成体
19と回路基板21との間隙ならびに外囲領域を樹脂封
止する際、第2の樹脂17が樹脂封止型半導体装置構成
体19と回路基板21との間隙に十分充填されず、ボイ
ドや空間部が形成されてしまうという問題がある。その
ため、回路基板21の動作上影響のない箇所に貫通孔、
開口部などのスルー手段を形成し、封止樹脂である第2
の樹脂17の注入を促進させ、樹脂封止する必要があ
る。
In the method of manufacturing a resin-sealed semiconductor device using a two-layer substrate as shown in FIG. 7A, the circuit board 21 is laminated on the resin-sealed semiconductor device structure 19. Therefore, the circuit board 21 may act as a lid, and when the gap between the resin-sealed semiconductor device structure 19 and the circuit board 21 and the surrounding area are resin-sealed with the second resin 17, There is a problem that the resin 17 is not sufficiently filled in the gap between the resin-encapsulated semiconductor device structure 19 and the circuit board 21, and voids or spaces are formed. Therefore, a through hole is formed in a portion that does not affect the operation of the circuit board 21,
A through means such as an opening is formed, and a second sealing resin is used.
It is necessary to accelerate the injection of the resin 17 and to seal the resin.

【0030】次に本発明の樹脂封止型半導体装置におけ
る実施の形態のさらに他の例について、図9を参照して
説明する。
Next, still another example of the embodiment of the resin-sealed semiconductor device of the present invention will be described with reference to FIG.

【0031】図9においては、図7に示した樹脂封止型
半導体装置ともっとも異なるところは、外部端子18の
先端領域に蛇行部25および突起部26をさらに付設し
たことである。
In FIG. 9, the most different point from the resin-sealed semiconductor device shown in FIG. 7 is that a meandering portion 25 and a protrusion 26 are additionally provided in the tip region of the external terminal 18.

【0032】蛇行部25は、この樹脂封止型半導体装置
を外部端子18により、マザーボード等に半田接合する
際の外部端子18にかかる応力を緩和するための手段で
あり、その形状は、図9に示すような平面S字の他、断
面S字、波状などでもよい。なお、前記蛇行部25の形
成に関して、型締めによる加圧によって、外部端子18
の所定の箇所を変形させ、断面S字、波状の蛇行部を形
成したり、または圧延により、外部端子18の所定の箇
所を幅広にし、そして切欠加工により、平面S字の蛇行
部を形成するものである。
The meandering portion 25 is a means for relieving the stress applied to the external terminal 18 when the resin-encapsulated semiconductor device is soldered to the mother board or the like by the external terminal 18, and its shape is shown in FIG. In addition to the plane S-shape as shown in FIG. 3, the cross-section may be S-shaped or wavy. Regarding the formation of the meandering portion 25, the external terminal 18 is pressed by pressurizing the mold.
To form a wavy portion having an S-shaped cross section, or by rolling, to widen a predetermined portion of the external terminal 18 and form a plane S-shaped meandering portion by notching. It is a thing.

【0033】また突起部26は、前記外部端子18の突
出部18b,18cとは目的が異なり、この樹脂封止型
半導体装置を外部端子18により、マザーボード等に半
田接合する際のマザーボードに固定するための係合手段
であり、その形状は、図9に示すように、マザーボード
の孔へ嵌入容易なように先端部鋭利な鍵状の突起の他、
先端部幅広の突起等、係合可能な形状であればよい。ま
た突起部26を各外部端子18に対して均一に設けるこ
とにより、マザーボード接合時の高さ位置の調整もでき
る。また突起部26の形成は、圧延により、外部端子1
8の先端部を幅広にし、そして切欠加工により、鍵状の
突起部を形成するものである。
The projecting portion 26 has a different purpose from the projecting portions 18b and 18c of the external terminal 18, and the resin-encapsulated semiconductor device is fixed to the mother board by soldering to the mother board or the like by the outer terminal 18. As shown in FIG. 9, the shape of the engaging means is a key-like protrusion having a sharp tip so that it can be easily fitted into the hole of the motherboard.
Any shape that can be engaged, such as a protrusion with a wide tip, may be used. Further, by uniformly providing the protrusions 26 with respect to the respective external terminals 18, it is possible to adjust the height position at the time of joining the motherboard. The projection 26 is formed by rolling the external terminal 1
The tip end of 8 is widened, and a key-like protrusion is formed by a notch process.

【0034】次に、本発明の樹脂封止型半導体装置の製
造方法における実施の形態の他の例について、図10〜
図13を参照して説明する。
Next, another example of the embodiment of the method for manufacturing the resin-sealed semiconductor device of the present invention will be described with reference to FIGS.
This will be described with reference to FIG.

【0035】前記図2〜図6に示した本発明の方法にお
ける実施の形態では、金属板を打ち抜き加工し、目的と
する金属基板11a,11bなどを各領域を形成し、パ
ワー半導体素子12などを搭載した後に第1の樹脂16
で金属基板11a,11b間および底面領域を封止固定
する例を示したが、本実施の形態では、この金属基板1
1に第1の樹脂16を付設する別の方法を説明する。
In the embodiment of the method of the present invention shown in FIGS. 2 to 6, the metal plate is punched to form the respective regions of the desired metal substrates 11a and 11b, and the power semiconductor element 12 and the like are formed. After mounting the first resin 16
Although the example of sealing and fixing the space between the metal substrates 11a and 11b and the bottom surface region has been described above, in the present embodiment, this metal substrate 1 is used.
Another method of attaching the first resin 16 to No. 1 will be described.

【0036】まず図10に示すように、図2〜図6に示
した実施の形態と同様に、厚さ0.5mm程度の銅板な
どの金属板を打ち抜き加工し、目的とする金属基板11
a,11b、外部端子18となる領域などの各領域を形
成し、さらに金属基板11の動作上影響のない領域に貫
通孔27aもしくは切欠部27bなどの係止手段27を
形成する。
First, as shown in FIG. 10, similarly to the embodiment shown in FIGS. 2 to 6, a metal plate such as a copper plate having a thickness of about 0.5 mm is punched to obtain a desired metal substrate 11
Each region such as a and 11b and a region to be the external terminal 18 is formed, and further, a locking means 27 such as a through hole 27a or a cutout 27b is formed in a region of the metal substrate 11 which does not affect the operation.

【0037】そして、図11に示すように、あらかじめ
成形加工によって第1の樹脂16により形成した厚さ
1.0mmの樹脂板28を、前記貫通孔27aもしくは
切欠部27bなどの係止手段27を設けた金属基板11
に嵌合させ、金属基板11a,11b間および底面領域
を固定する。ここで金属基板11と樹脂板28との嵌合
は、樹脂板28に設けた突起部28aを金属基板11に
形成した貫通孔27aもしくは切欠部27bなどの係止
手段27に嵌合させることにより行なう。
Then, as shown in FIG. 11, a resin plate 28 having a thickness of 1.0 mm, which is previously formed from the first resin 16 by a molding process, is provided with locking means 27 such as the through hole 27a or the notch 27b. Provided metal substrate 11
To fix the space between the metal substrates 11a and 11b and the bottom surface region. Here, the metal substrate 11 and the resin plate 28 are fitted to each other by fitting the protrusion 28a provided on the resin plate 28 to the locking means 27 such as the through hole 27a or the notch 27b formed in the metal substrate 11. To do.

【0038】その後、図12に示すように、樹脂板28
を金属基板11に嵌合させたものに対して、回路を構成
する金属基板11a,11b上にパワー半導体素子12
などを搭載し、結線する。
Thereafter, as shown in FIG. 12, the resin plate 28
The power semiconductor element 12 is mounted on the metal substrates 11a and 11b forming the circuit, as compared with the case where the power semiconductor element 12 is fitted to the metal substrate 11.
Etc. are installed and connected.

【0039】そしてタイバーカットなどを行ない、表面
領域を第2の樹脂17で封止し、外部端子18の加工を
することで図13に示すように樹脂封止型半導体装置を
構成する。
Then, a tie bar is cut, the surface region is sealed with the second resin 17, and the external terminals 18 are processed to form a resin-sealed semiconductor device as shown in FIG.

【0040】この方法では、あらかじめ第1の樹脂16
により樹脂板28を形成するので、容易に樹脂板28の
厚みを均一にすることができ、金属基板11の底面の樹
脂の厚みを均一にし、各領域内、たとえば金属基板11
aの領域での放熱性の偏りを減少させることができる。
また樹脂板28と金属基板11とを嵌合固定するので、
樹脂封止に比べて、樹脂ばりの発生はなく、その作業が
容易であり、作業性を向上させることができる。
In this method, the first resin 16 is previously prepared.
Since the resin plate 28 is formed by the above method, the thickness of the resin plate 28 can be easily made uniform, the thickness of the resin on the bottom surface of the metal substrate 11 is made uniform, and each region, for example, the metal substrate 11 is made uniform.
It is possible to reduce the unevenness of heat dissipation in the area a.
Further, since the resin plate 28 and the metal substrate 11 are fitted and fixed,
Compared with resin encapsulation, resin flash does not occur, the work is easy, and workability can be improved.

【0041】次に本発明の樹脂封止型半導体装置におけ
る実施の形態のさらに他の例について、図14を参照し
て説明する。図14は本実施の形態を示す平面図であ
る。
Next, still another example of the embodiment of the resin-sealed semiconductor device of the present invention will be described with reference to FIG. FIG. 14 is a plan view showing this embodiment.

【0042】図14に示す構成は、厚み0.5mmの銅
板をリードフレーム加工のごとく、打ち抜き加工によっ
て所望の金属板領域を有して回路構成された金属基板1
1a,11b上にパワー半導体素子12、および制御用
集積回路素子13、その他の電子部品14が搭載され、
パワー半導体素子12と外部端子18とが金属細線15
で接続されている。また図中、破線で囲んだ領域は、高
熱伝導率の成形用の第1の樹脂16で封止固定される領
域である。さらに本実施の形態では、外部端子18群間
に第1のタイバー29、第2のタイバー30を設けたも
のであり、2重のタイバー29,30により、後工程の
樹脂封止時の樹脂ばりの外部端子18への付着を防止で
きるものである。すなわち、樹脂封止時、第1のタイバ
ー29で防ぎきれなかった樹脂を第2のタイバー30で
止め、外部端子18の先端部分への樹脂の流動を止め、
外部端子18のマザーボードとの接合部分となる箇所へ
の樹脂の流出を止め、樹脂ばりの付着を防止できるもの
である。
In the structure shown in FIG. 14, a metal board 1 having a circuit structure having a desired metal plate region is formed by punching a copper plate having a thickness of 0.5 mm like a lead frame process.
Power semiconductor element 12, control integrated circuit element 13, and other electronic components 14 are mounted on 1a and 11b,
The power semiconductor element 12 and the external terminal 18 are composed of a thin metal wire 15.
Connected by Further, in the figure, the region surrounded by the broken line is a region which is sealed and fixed by the first resin 16 for molding having high thermal conductivity. Further, in the present embodiment, the first tie bar 29 and the second tie bar 30 are provided between the groups of external terminals 18, and the double tie bars 29, 30 allow the resin burrs at the time of resin sealing in the subsequent process. It is possible to prevent the adhesion of the to the external terminal 18. That is, at the time of resin sealing, the resin that cannot be completely prevented by the first tie bar 29 is stopped by the second tie bar 30, and the flow of the resin to the tip portion of the external terminal 18 is stopped,
The resin can be prevented from adhering to the portion where the external terminal 18 is to be joined to the mother board, thereby preventing the resin flash from adhering.

【0043】本実施の形態のように、2重タイバーによ
り、樹脂封止時の樹脂流の外部端子18の接合部分への
流出を抑え、樹脂ばりの付着を防止できるので、外部端
子18をマザーボードなどに半田接合した際の接着強度
の劣化を防止できる。参考として、第1のタイバー29
のみの場合の半田接合不良率は0.35%、第2のタイ
バー30のみの場合の半田接合不良率は0.25%、第
1,第2のタイバー29,30を設けた場合の半田接合
不良率は0.05%、タイバーを設けない場合の半田接
合不良率は1.45%であった。
As in the present embodiment, the double tie bar can prevent the resin flow during resin sealing from flowing to the joint portion of the external terminal 18 and prevent the resin flash from adhering to the mother board. It is possible to prevent the adhesive strength from being deteriorated when soldered to. For reference, the first tie bar 29
The failure rate of solder joints is 0.35% in the case of only, the failure rate of solder joints in the case of only the second tie bar 30 is 0.25%, and the solder joints in the case of providing the first and second tie bars 29, 30 The defect rate was 0.05%, and the solder joint defect rate without the tie bar was 1.45%.

【0044】また、本実施の形態の樹脂封止型半導体装
置では、ネジ止め部31を外部端子18群間に4ケ所配
置している。したがって、リードフレームを利用したパ
ッケージ素子の構造をIPMに適用しても、完成した樹
脂封止型半導体装置をネジ止め部31で放熱板などにネ
ジ固定でき、パワー半導体素子、制御用集積回路素子等
を搭載して大電力を扱う樹脂封止型半導体装置を実現し
ても放熱性を向上させることができる。本実施の形態で
はネジ止め部31は4ケ所としているが、対角線上に対
向する箇所に2ケ所としてもよい。
Further, in the resin-sealed semiconductor device of this embodiment, the screw fastening portions 31 are arranged at four places between the groups of external terminals 18. Therefore, even if the structure of the package element using the lead frame is applied to the IPM, the completed resin-encapsulated semiconductor device can be screw-fixed to the heat dissipation plate or the like by the screw fastening portion 31, and the power semiconductor element or the control integrated circuit element can be obtained. Even if a resin-encapsulated semiconductor device that is equipped with the above components and handles a large amount of power is realized, the heat dissipation can be improved. In the present embodiment, the screw fastening portions 31 are provided at four places, but may be provided at two places which are diagonally opposed to each other.

【0045】なお、ネジ止め部31の内側の第1の樹脂
16で封止される箇所には、フック部32が形成されて
おり、第1の樹脂16で封止した後、フック部32が第
1の樹脂16に係合し、アンカー効果を有して、ネジ止
めの際の応力などでネジ止め部31が抜けてしまうのを
防止できる。
A hook portion 32 is formed inside the screwing portion 31 at a portion sealed with the first resin 16. After the sealing with the first resin 16, the hook portion 32 is removed. By engaging with the first resin 16 and having an anchor effect, it is possible to prevent the screw-fastened portion 31 from coming off due to stress at the time of screw-fastening or the like.

【0046】以上、本実施の形態で示した樹脂封止型半
導体装置は、金属板を打ち抜き加工して各金属基板領域
を有する回路構成を形成し、パワー半導体素子12や制
御用集積回路素子13などの電子部品を搭載し、前記各
金属基板領域を固定する第1の樹脂16部を設け、その
後で前記回路構成された金属基板11のタイバーをカッ
トしてタイバーカット部11cを形成して一部外部端子
18を形成したり、一部樹脂領域内の開口部を通ってい
る金属板部分を切断して、一部回路を形成する。そして
電気的試験を連続で行なった後、外枠フレーム11dを
切断して外部電極18を形成し、次いで回路構成体19
を第2の樹脂17で封止した構成であり、第1の樹脂1
6と第2の樹脂17とは、絶縁性のエポキシ樹脂または
ポリフェニレンサルファイド(PPS樹脂)により構成
したものであり、パッケージ構造を形成しても大電力を
扱うIPMの放熱性と絶縁耐性を向上させることができ
るものである。
As described above, in the resin-sealed semiconductor device shown in the present embodiment, the metal plate is punched to form a circuit configuration having each metal substrate region, and the power semiconductor element 12 and the control integrated circuit element 13 are formed. The first resin 16 part for mounting the electronic parts such as the above and fixing the respective metal substrate regions is provided, and then the tie bar of the metal substrate 11 having the circuit structure is cut to form the tie bar cut part 11c. The external terminals 18 are formed, or the metal plate portion passing through the opening in the partial resin region is cut to form a partial circuit. After conducting electrical tests continuously, the outer frame 11d is cut to form the external electrodes 18, and then the circuit structure 19 is formed.
Is sealed with the second resin 17, and the first resin 1
6 and the second resin 17 are made of insulating epoxy resin or polyphenylene sulfide (PPS resin), and improve the heat dissipation and insulation resistance of the IPM that handles a large amount of power even when the package structure is formed. Is something that can be done.

【0047】[0047]

【発明の効果】本発明の樹脂封止型半導体装置によれ
ば、パッケージ構造を有したIPMであって、金属板の
周囲領域を高熱伝導率の成形用の樹脂で封止しているの
で、放熱特性を向上させ、またその樹脂の厚みを大きく
することで、絶縁耐圧を向上させることができるもので
ある。また、その実効果は図15の熱抵抗・絶縁耐圧の
比較図に示すように、絶縁耐圧、熱抵抗の両特性におい
て従来例に比較していちじるしい効果を奏するものであ
る。
According to the resin-encapsulated semiconductor device of the present invention, since it is an IPM having a package structure and the peripheral region of the metal plate is encapsulated with a molding resin having a high thermal conductivity, By improving the heat dissipation characteristics and increasing the thickness of the resin, the withstand voltage can be improved. As shown in the thermal resistance / dielectric withstand voltage comparison diagram of FIG. 15, the actual effect is remarkably effective as compared with the conventional example in both of the dielectric strength and thermal resistance characteristics.

【0048】また製造方法においては、第1の樹脂で金
属基板領域を固定し、タイバーカットや一部樹脂領域部
の金属板部分の切断を行ない、回路形成し、フレームで
固定した状態にて第2の樹脂で全面封止を行なう前に電
気的試験を順次連続で行ない、回路構成の段階で諸特性
データを得ることができ、検査効率、製品の信頼性も向
上する。
Further, in the manufacturing method, the metal substrate region is fixed with the first resin, the tie bar is cut or the metal plate portion of the partial resin region is cut, the circuit is formed, and the metal plate region is fixed with the frame. Electrical tests are successively performed in sequence before the entire surface is sealed with the resin No. 2, various characteristic data can be obtained at the stage of circuit configuration, and inspection efficiency and product reliability are improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の樹脂封止型半導体装置における実施の
形態の一例の断面図
FIG. 1 is a sectional view of an example of an embodiment of a resin-sealed semiconductor device of the present invention.

【図2】本発明の樹脂封止型半導体装置の製造方法にお
ける実施の形態の一例の工程図
FIG. 2 is a process diagram of an example of an embodiment of a method for manufacturing a resin-encapsulated semiconductor device of the present invention.

【図3】本発明の樹脂封止型半導体装置の製造方法にお
ける実施の形態の一例の工程図
FIG. 3 is a process chart of an example of an embodiment in a method for manufacturing a resin-encapsulated semiconductor device of the present invention.

【図4】本発明の樹脂封止型半導体装置の製造方法にお
ける実施の形態の一例の工程図
FIG. 4 is a process diagram of an example of an embodiment of a method of manufacturing a resin-encapsulated semiconductor device of the present invention.

【図5】本発明の樹脂封止型半導体装置の製造方法にお
ける実施の形態の一例の工程図
FIG. 5 is a process chart of an example of an embodiment of a method for manufacturing a resin-encapsulated semiconductor device of the present invention.

【図6】本発明の樹脂封止型半導体装置の製造方法にお
ける実施の形態の一例の工程図
FIG. 6 is a process chart of an example of an embodiment in a method of manufacturing a resin-encapsulated semiconductor device of the present invention.

【図7】本発明の樹脂封止型半導体装置における実施の
形態の他の例を示す図
FIG. 7 is a diagram showing another example of the embodiment in the resin-encapsulated semiconductor device of the present invention.

【図8】本発明の樹脂封止型半導体装置における実施の
形態の他の例の端子構成を示す図
FIG. 8 is a diagram showing a terminal configuration of another example of the embodiment in the resin-sealed semiconductor device of the present invention.

【図9】本発明の樹脂封止型半導体装置における実施の
形態のさらに他の例を示す図
FIG. 9 is a view showing still another example of the embodiment in the resin-sealed semiconductor device of the present invention.

【図10】本発明の樹脂封止型半導体装置の製造方法に
おける実施の形態の他の例の工程図
FIG. 10 is a process drawing of another example of the embodiment in the method for manufacturing the resin-sealed semiconductor device of the present invention.

【図11】本発明の樹脂封止型半導体装置の製造方法に
おける実施の形態の他の例の工程図
FIG. 11 is a process drawing of another example of the embodiment in the method for manufacturing the resin-sealed semiconductor device of the present invention.

【図12】本発明の樹脂封止型半導体装置の製造方法に
おける実施の形態の他の例の工程図
FIG. 12 is a process chart of another example of the embodiment in the method for manufacturing the resin-sealed semiconductor device of the present invention.

【図13】本発明の樹脂封止型半導体装置の製造方法に
おける実施の形態の他の例の工程図
FIG. 13 is a process drawing of another example of the embodiment in the method for manufacturing the resin-sealed semiconductor device of the present invention.

【図14】本発明の樹脂封止型半導体装置における実施
の形態のさらに他の例の平面図
FIG. 14 is a plan view of still another example of the embodiment of the resin-encapsulated semiconductor device of the present invention.

【図15】本発明の樹脂封止型半導体装置の放熱性、お
よび絶縁耐圧を示す図
FIG. 15 is a diagram showing heat dissipation and withstand voltage of the resin-encapsulated semiconductor device of the present invention.

【図16】従来の樹脂封止型半導体装置を示す断面図FIG. 16 is a sectional view showing a conventional resin-sealed semiconductor device.

【符号の説明】[Explanation of symbols]

11 金属基板 12 パワー半導体素子 13 制御用集積回路素子 14 電子部品 15 金属細線 16 第1の樹脂 17 第2の樹脂 18 外部端子 19 樹脂封止型半導体装置構成体 20 集積回路素子 21 回路基板 22 貫通穴 23 切角部 24 配線 25 蛇行部 26 突起部 27 係止手段 28 樹脂板 29 第1のタイバー 30 第2のタイバー 31 ネジ止め部 Reference Signs List 11 metal substrate 12 power semiconductor element 13 control integrated circuit element 14 electronic component 15 metal thin wire 16 first resin 17 second resin 18 external terminal 19 resin-sealed semiconductor device component 20 integrated circuit element 21 circuit board 22 penetration Hole 23 Cutting angle portion 24 Wiring 25 Meandering portion 26 Projection portion 27 Locking means 28 Resin plate 29 First tie bar 30 Second tie bar 31 Screw fixing portion

───────────────────────────────────────────────────── フロントページの続き (72)発明者 荒川 竜太郎 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 (72)発明者 青井 和廣 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 (72)発明者 隈川 隆博 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 (72)発明者 横沢 眞覩 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 (72)発明者 野村 徹 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 (72)発明者 前岡 達夫 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 半田 浩之 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ryutaro Arakawa 1-1 Sachimachi, Takatsuki City, Osaka Prefecture Matsushita Electronics Industrial Co., Ltd. (72) Kazuhiro Aoi 1-1, Sachimachi Takatsuki City, Osaka Matsushita Electronics Industrial Co., Ltd. (72) Inventor Takahiro Kumakawa 1-1 Sachimachi, Takatsuki City, Osaka Prefecture Matsushita Electronics Industrial Co., Ltd. (72) Inventor Makoto Yokozawa 1-1, Sachimachi Takatsuki City, Osaka Matsushita Electronics Industrial Co., Ltd. (72) Inventor Toru Nomura 1-1, Sachimachi, Takatsuki-shi, Osaka Matsushita Denshi Kogyo Co., Ltd. (72) Inventor Tatsuo Maeoka 1006, Kadoma, Kadoma-shi, Osaka Matsushita Electric Industrial Co., Ltd. (72) Invention Person Hiroyuki Handa 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (25)

【特許請求の範囲】[Claims] 【請求項1】 金属板の加工によって回路構成された金
属基板と、前記金属基板上に搭載された電子部品と、前
記金属基板の底面領域を固定した第1の樹脂部と、少な
くとも前記電子部品を搭載した金属基板の表面領域を封
止した第2の樹脂部と、前記第2の樹脂部より突出して
設けられた外部電極とを備えた樹脂封止型半導体装置。
1. A metal substrate having a circuit formed by processing a metal plate, an electronic component mounted on the metal substrate, a first resin portion fixing a bottom surface region of the metal substrate, and at least the electronic component. A resin-encapsulated semiconductor device comprising: a second resin portion encapsulating a surface area of a metal substrate on which is mounted; and an external electrode provided so as to project from the second resin portion.
【請求項2】 金属板の加工によって回路構成された少
なくとも第1の金属基板および第2の金属基板と、前記
第1の金属基板上に搭載されたパワー半導体素子と、前
記第2の金属基板上に搭載された制御用集積回路素子
と、前記第1,第2の金属基板の底面領域を固定した第
1の樹脂部と、少なくとも前記パワー半導体素子および
前記制御用集積回路素子を搭載した前記第1,第2の金
属基板の表面領域を封止した第2の樹脂部と、前記第2
の樹脂部より突出して設けられ、前記第1,第2の金属
基板と接続した外部電極とを備えた樹脂封止型半導体装
置。
2. A metal plate at least a first metal substrate and a second metal substrate having a circuit structure, a power semiconductor element mounted on the first metal substrate, and the second metal substrate. The control integrated circuit element mounted on the above, the first resin portion fixing the bottom surface regions of the first and second metal substrates, and the power semiconductor element and the control integrated circuit element mounted at least A second resin portion sealing the surface regions of the first and second metal substrates;
The resin-encapsulated semiconductor device, which is provided so as to project from the resin portion and has an external electrode connected to the first and second metal substrates.
【請求項3】 金属板の加工によって回路構成された金
属基板と、前記金属基板上に搭載された電子部品と、前
記金属基板の底面領域を固定した第1の樹脂部と、少な
くとも前記電子部品を搭載した前記金属基板の表面領域
を封止した第2の樹脂部と、前記第2の樹脂部より突出
して設けられた外部電極とよりなる第1の回路基板と、
電子部品を搭載し、周辺端部に固定手段を設けた第2の
回路基板とよりなり、前記第2の回路基板の固定手段に
前記第1の回路基板の外部電極が固定されて積層構造を
形成し、前記第1の回路基板と前記第2の回路基板との
間隙および外囲領域を前記外部電極を突出させるように
封止した第2の樹脂とを備えた樹脂封止型半導体装置。
3. A metal substrate having a circuit formed by processing a metal plate, an electronic component mounted on the metal substrate, a first resin portion fixing a bottom surface region of the metal substrate, and at least the electronic component. A first circuit board including a second resin portion that seals a surface region of the metal substrate on which the substrate is mounted, and an external electrode that is provided so as to project from the second resin portion,
A second circuit board having electronic parts mounted thereon and having fixing means provided at the peripheral end thereof, wherein the external electrodes of the first circuit board are fixed to the fixing means of the second circuit board to form a laminated structure. A resin-encapsulated semiconductor device comprising: a second resin which is formed and seals a gap and an outer peripheral region between the first circuit board and the second circuit board so as to project the external electrode.
【請求項4】 金属板の加工によって回路構成された少
なくとも第1の金属基板および第2の金属基板と、前記
第1の金属基板上に搭載されたパワー半導体素子と、前
記第2の金属基板上に搭載された制御用集積回路素子
と、前記第1,第2の金属基板の底面領域を固定した樹
脂部と、前記第1,第2の金属基板と接続し、折り曲げ
加工された外部電極とよりなる第1の回路基板と、集積
回路素子、抵抗素子、コンデンサなどの電子部品を搭載
し、周辺端部に固定手段を設けた第2の回路基板とより
なり、前記第2の回路基板の固定手段に前記第1の回路
基板の外部電極が固定されて積層構造を形成し、前記第
1の回路基板と前記第2の回路基板との間隙および外囲
領域を前記外部電極を突出させるように封止した第2の
樹脂とを備えた樹脂封止型半導体装置。
4. A at least first metal substrate and a second metal substrate which are circuit-configured by processing a metal plate, a power semiconductor element mounted on the first metal substrate, and the second metal substrate. A control integrated circuit element mounted thereon, a resin portion fixing the bottom surface regions of the first and second metal substrates, and an external electrode that is bent by connecting to the first and second metal substrates. And a second circuit board on which electronic components such as integrated circuit elements, resistance elements, and capacitors are mounted, and fixing means is provided at a peripheral end portion. The external electrode of the first circuit board is fixed to the fixing means to form a laminated structure, and the external electrode is projected in the gap and the surrounding area between the first circuit board and the second circuit board. Sealing with a second resin sealed as Static semiconductor device.
【請求項5】 金属板の加工によって回路構成された少
なくとも第1の金属基板および第2の金属基板におい
て、前記第1の金属基板が前記第2の金属基板より厚い
請求項2または請求項4記載の樹脂封止型半導体装置。
5. The at least first metal substrate and second metal substrate circuit-configured by processing a metal plate, wherein the first metal substrate is thicker than the second metal substrate. The resin-encapsulated semiconductor device described.
【請求項6】 第1の樹脂および第2の樹脂が絶縁性の
エポキシ樹脂である請求項1〜請求項4のうちの一つに
記載の樹脂封止型半導体装置。
6. The resin-encapsulated semiconductor device according to claim 1, wherein the first resin and the second resin are insulating epoxy resins.
【請求項7】 第1の樹脂および第2の樹脂が絶縁性の
ポリフェニレンサルファイドである請求項1〜請求項4
のうちの一つに記載の樹脂封止型半導体装置。
7. The first resin and the second resin are insulating polyphenylene sulfides.
A resin-encapsulated semiconductor device according to one of the above.
【請求項8】 第2の回路基板の固定手段が、回路基板
に設けた貫通穴と切角である請求項3または請求項4記
載の樹脂封止型半導体装置。
8. The resin-encapsulated semiconductor device according to claim 3, wherein the fixing means of the second circuit board has a cut-off angle with a through hole provided in the circuit board.
【請求項9】 第1の回路基板の外部電極が突出部を有
する請求項3または請求項4記載の樹脂封止型半導体装
置。
9. The resin-sealed semiconductor device according to claim 3, wherein the external electrode of the first circuit board has a protrusion.
【請求項10】 金属板を加工して金属基板回路を構成
する工程と、前記金属基板回路上に電子部品を搭載する
工程と、搭載した電子部品および金属板を電気的に接続
する工程と、前記金属基板回路の金属板間および底面領
域を第1の樹脂で封止固定する工程と、前記金属基板回
路の外枠フレームを切断して回路を形成し、切断後の金
属基板回路の端部を加工し外部電極を形成する工程と、
前記外部電極を突出させるように、少なくとも前記電子
部品が搭載された金属基板回路の表面領域を第2の樹脂
で封止する工程とを備えた樹脂封止型半導体装置の製造
方法。
10. A step of processing a metal plate to form a metal substrate circuit, a step of mounting an electronic component on the metal substrate circuit, and a step of electrically connecting the mounted electronic component and the metal plate. A step of sealing and fixing between metal plates and a bottom surface region of the metal substrate circuit with a first resin, and cutting an outer frame of the metal substrate circuit to form a circuit, and an end portion of the metal substrate circuit after cutting And a step of forming an external electrode,
And a step of sealing at least a surface region of the metal substrate circuit on which the electronic component is mounted with a second resin so as to project the external electrode.
【請求項11】 金属板を加工して金属基板回路を構成
する工程と、前記金属基板回路の金属基板間および底面
領域を第1の樹脂で封止固定する工程と、前記金属基板
回路上に電子部品を搭載する工程と、搭載した電子部品
および金属板を電気的に接続する工程と、前記金属基板
回路の外枠フレームを切断して回路を形成し、切断後の
金属基板回路の端部を加工し外部電極を形成する工程
と、前記外部電極を突出させるように、少なくとも前記
電子部品が搭載された金属基板回路の表面領域を第2の
樹脂で封止する工程とを備えた樹脂封止型半導体装置の
製造方法。
11. A step of processing a metal plate to form a metal substrate circuit, a step of sealing and fixing between metal substrates and a bottom surface region of the metal substrate circuit with a first resin, and on the metal substrate circuit. A step of mounting an electronic component, a step of electrically connecting the mounted electronic component and a metal plate, cutting an outer frame of the metal substrate circuit to form a circuit, and an end portion of the metal substrate circuit after the cutting. And a step of forming an external electrode, and a step of sealing at least the surface region of the metal substrate circuit on which the electronic component is mounted with a second resin so as to project the external electrode. Method of manufacturing static semiconductor device.
【請求項12】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記金
属基板回路の前記第1の金属基板領域上にパワー半導体
素子を、前記第2の金属基板領域上に制御用集積回路素
子をそれぞれ搭載する工程と、搭載したパワー半導体素
子、制御用集積回路素子および各金属基板を電気的に接
続する工程と、前記第1,第2の金属基板領域を連結固
定するために前記第1,第2の金属基板領域間および底
面領域を第1の樹脂で封止固定する工程と、前記金属基
板回路の外枠フレームを切断して回路を形成し、切断後
の金属基板回路の端部を加工し外部電極を形成する工程
と、前記外部電極を突出させるように、パワー半導体素
子、制御用集積回路素子が搭載された前記第1,第2の
金属基板領域面および底面の前記第1の樹脂の端部領域
を第2の樹脂で封止する工程とを備えた樹脂封止型半導
体装置の製造方法。
12. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, and a power semiconductor element on the first metal substrate region of the metal substrate circuit. A step of mounting a control integrated circuit element on the second metal substrate area, a step of electrically connecting the mounted power semiconductor element, the control integrated circuit element and each metal substrate, A step of sealing and fixing the first and second metal substrate regions and a bottom face region with a first resin to connect and fix the second metal substrate region; and cutting the outer frame of the metal substrate circuit. To form an external electrode by processing an end portion of the metal substrate circuit after cutting, and the power semiconductor element and the control integrated circuit element mounted so as to project the external electrode. 1, second metal substrate area surface and And a step of sealing the end region of the first resin on the bottom surface with a second resin, the method for manufacturing a resin-sealed semiconductor device.
【請求項13】 金属板を加工して少なくとも第1,第
2の金属基板領域を有した金属基板回路を構成する工程
と、前記金属基板回路の前記第1の金属基板領域、第2
の金属基板を連結固定するために前記第1,第2の金属
基板領域間および底面領域を第1の樹脂で封止固定する
工程と、前記第1の金属基板領域上にパワー半導体素子
を、また前記第2の金属基板領域上に制御用集積回路素
子をそれぞれ搭載する工程と、搭載した前記パワー半導
体素子、前記制御用集積回路素子および前記第1,第2
の金属基板領域を電気的に接続する工程と、前記金属基
板回路の外枠フレームを切断して回路を形成し、切断後
の前記金属基板回路の端部を加工して外部電極を形成す
る工程と、前記外部電極を突出させるように、前記パワ
ー半導体素子、前記制御用集積回路素子が搭載された前
記第1,第2の金属基板領域面および底面の前記第1の
樹脂の端部領域を第2の樹脂で封止する工程とを備えた
樹脂封止型半導体装置の製造方法。
13. A step of processing a metal plate to form a metal substrate circuit having at least first and second metal substrate regions, said first metal substrate region of said metal substrate circuit, and second.
Sealing and fixing between the first and second metal substrate regions and the bottom region for connecting and fixing the metal substrates, and a power semiconductor element on the first metal substrate region, Further, a step of mounting control integrated circuit elements on the second metal substrate area, respectively, the mounted power semiconductor element, the control integrated circuit element, and the first and second
Of electrically connecting the metal substrate regions of, and cutting the outer frame of the metal substrate circuit to form a circuit, and processing the end portion of the metal substrate circuit after cutting to form an external electrode. And the end regions of the first resin on the first and second metal substrate area surfaces and the bottom surface on which the power semiconductor element and the control integrated circuit element are mounted so as to project the external electrodes. And a step of sealing with a second resin.
【請求項14】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記金
属基板回路の前記第1の金属基板領域上にパワー半導体
素子を、また前記第2の金属基板領域上に制御用集積回
路素子をそれぞれ搭載する工程と、搭載した前記パワー
半導体素子、前記制御用集積回路素子および前記第1,
第2の金属基板を電気的に接続する工程と、前記第1,
第2の金属基板領域を連結固定するために前記第1,第
2の金属基板領域間および底面領域を第1の樹脂で封止
固定する工程と、前記金属基板回路の金属基板領域の一
部やタイバーを切断して一部回路を形成し、電気的試験
を行なう工程と、前記金属基板回路の外枠フレームを切
断して回路構成体を形成し、切断後の金属基板回路の端
部を加工し外部電極を形成する工程と、前記外部電極を
突出させるように、前記パワー半導体素子、制御用集積
回路素子が搭載された前記第1,第2の金属基板領域面
および底面の前記第1の樹脂の端部領域を第2の樹脂で
封止する工程とを備えた樹脂封止型半導体装置の製造方
法。
14. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, and a power semiconductor element on the first metal substrate region of the metal substrate circuit. And a step of mounting control integrated circuit elements on the second metal substrate area, respectively, and the mounted power semiconductor element, control integrated circuit element, and the first and second power semiconductor elements.
Electrically connecting the second metal substrate, and
A step of sealing and fixing the first and second metal substrate regions and a bottom region with a first resin to connect and fix the second metal substrate region; and a part of the metal substrate region of the metal substrate circuit. And a tie bar are cut to form a part of a circuit, an electrical test is performed, and an outer frame of the metal substrate circuit is cut to form a circuit structure, and an end portion of the cut metal substrate circuit is removed. A step of processing to form an external electrode, and the first and second metal substrate area surfaces and the bottom surface of the first and second metal substrate on which the power semiconductor element and the control integrated circuit element are mounted so as to project the external electrode. And a step of sealing the end region of the resin with a second resin.
【請求項15】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記第
1,第2の金属基板領域を連結固定するために前記第
1,第2の金属基板領域間および底面領域を第1の樹脂
で封止固定する工程と、前記金属基板回路の前記第1の
金属基板領域上にパワー半導体素子を、また前記第2の
金属基板領域上に制御用集積回路素子をそれぞれ搭載す
る工程と、搭載した前記パワー半導体素子、前記制御用
集積回路素子および前記第1,第2の金属基板を電気的
に接続する工程と、前記金属基板回路の金属基板領域の
一部やタイバーを切断して一部回路を形成し、電気的試
験を行なう工程と、前記金属基板回路の外枠フレームを
切断して回路構成体を形成し、切断後の金属基板回路の
端部を加工し外部電極を形成する工程と、前記外部電極
を突出させるように、前記パワー半導体素子、前記制御
用集積回路素子が搭載された前記第1,第2の金属基板
領域面および底面の前記第1の樹脂の端部領域を第2の
樹脂で封止する工程とを備えた樹脂封止型半導体装置の
製造方法。
15. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, and a step of connecting and fixing the first and second metal substrate regions. 1, a step of sealing and fixing a region between the second metal substrate regions and the bottom region with a first resin, a power semiconductor element on the first metal substrate region of the metal substrate circuit, and a second metal Mounting a control integrated circuit element on a substrate region, electrically connecting the mounted power semiconductor element, the control integrated circuit element, and the first and second metal substrates, and the metal. A step of cutting a part of the metal board area of the board circuit or the tie bar to form a part of the circuit and performing an electrical test, and cutting the outer frame of the metal board circuit to form a circuit structure and cutting. The end of the metal substrate circuit after is processed and the external electrode And a step of forming the first resin on the first and second metal substrate region surfaces and the bottom surface on which the power semiconductor element and the control integrated circuit element are mounted so as to project the external electrode. And a step of sealing the end region with a second resin.
【請求項16】 金属板を加工して金属基板回路を構成
する工程と、前記金属基板回路上に電子部品を搭載する
工程と、搭載した電子部品および金属板を電気的に接続
する工程と、前記金属基板回路の金属板間および底面領
域を第1の樹脂で封止固定する工程と、前記金属基板回
路の外枠フレームを切断して回路を形成し、切断後の金
属基板回路の端部を加工し外部電極を形成して第1の回
路基板を形成する工程と、回路基板上に複数の電子部品
を搭載し、周辺端部に固定手段を形成し、第2の回路基
板を形成する工程と、前記第1の回路基板の外部電極を
前記第2の回路基板の固定手段に係合させ、前記第1の
回路基板に前記第2の回路基板を積層固定する工程と、
前記第1,第2の回路基板間の間隙および外囲領域を前
記外部電極を突出させるように第2の樹脂で封止する工
程とを備えた樹脂封止型半導体装置の製造方法。
16. A step of processing a metal plate to form a metal substrate circuit, a step of mounting an electronic component on the metal substrate circuit, and a step of electrically connecting the mounted electronic component and the metal plate. A step of sealing and fixing between metal plates and a bottom surface region of the metal substrate circuit with a first resin, and cutting an outer frame of the metal substrate circuit to form a circuit, and an end portion of the metal substrate circuit after cutting And forming external electrodes to form a first circuit board, and mounting a plurality of electronic components on the circuit board, forming fixing means at a peripheral edge portion, and forming a second circuit board. And a step of engaging external electrodes of the first circuit board with fixing means of the second circuit board to stack and fix the second circuit board on the first circuit board.
And a step of sealing a gap between the first and second circuit boards and a surrounding area with a second resin so as to project the external electrode.
【請求項17】 金属板を加工して金属基板回路を構成
する工程と、前記金属基板回路の金属板間および底面領
域を第1の樹脂で封止固定する工程と、前記金属基板回
路上に電子部品を搭載する工程と、搭載した電子部品お
よび金属板を電気的に接続する工程と、前記金属基板回
路の外枠フレームを切断して回路を形成し、切断後の金
属基板回路の端部を加工し外部電極を形成して第1の回
路基板を形成する工程と、回路基板上に複数の電子部品
を搭載し、周辺端部に固定手段を形成し、第2の回路基
板を形成する工程と、前記第1の回路基板の前記外部電
極を前記第2の回路基板の前記固定手段に係合させ、前
記第1の回路基板に前記第2の回路基板を積層固定する
工程と、前記第1,第2の回路基板間の間隙および外囲
領域を前記外部電極を突出させるように第2の樹脂で封
止する工程とを備えた樹脂封止型半導体装置の製造方
法。
17. A step of processing a metal plate to form a metal substrate circuit; a step of sealing and fixing a space between metal plates and a bottom surface region of the metal substrate circuit with a first resin; A step of mounting an electronic component, a step of electrically connecting the mounted electronic component and a metal plate, cutting an outer frame of the metal substrate circuit to form a circuit, and an end portion of the metal substrate circuit after the cutting. And forming external electrodes to form a first circuit board, and mounting a plurality of electronic components on the circuit board, forming fixing means at a peripheral edge portion, and forming a second circuit board. A step of: engaging the external electrode of the first circuit board with the fixing means of the second circuit board to stack and fix the second circuit board on the first circuit board; The space between the first and second circuit boards and the surrounding area are defined by the external electrodes. And a step of encapsulating with a second resin so as to project the resin. A method of manufacturing a resin-encapsulated semiconductor device.
【請求項18】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記第
1の金属基板領域上にパワー半導体素子を、また前記第
2の金属基板領域上に制御用集積回路素子をそれぞれ搭
載する工程と、搭載した前記パワー半導体素子、前記制
御用集積回路素子および前記第1,第2の金属基板領域
を電気的に接続する工程と、前記第1,第2の金属基板
領域を連結固定するために前記第1,第2の金属基板間
および底面領域を第1の樹脂で封止固定する工程と、前
記金属基板回路の外枠フレームを切断して回路を形成
し、切断後の金属基板回路の端部を折り曲げ加工して外
部電極を形成して第1の回路基板を形成する工程と、回
路基板に集積回路素子、抵抗素子、コンデンサなどの電
子部品を搭載し、周辺端部に貫通穴および切角の固定手
段を形成し、第2の回路基板を形成する工程と、前記第
1の回路基板の前記外部電極を前記第2の回路基板の固
定手段である前記貫通穴および前記切角に係合させ、前
記第1の回路基板に前記第2の回路基板を積層固定する
工程と、前記第1,第2の回路基板間の間隙および外囲
領域を前記外部電極を突出させるように第2の樹脂で封
止する工程とを備えた樹脂封止型半導体装置の製造方
法。
18. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, a power semiconductor element on the first metal substrate region, and the second semiconductor substrate region. Mounting a control integrated circuit element on each of the metal substrate areas, and electrically connecting the mounted power semiconductor element, the control integrated circuit element, and the first and second metal substrate areas. A step of sealing and fixing between the first and second metal substrates and a bottom region with a first resin for connecting and fixing the first and second metal substrate regions, and an outer frame of the metal substrate circuit. A step of cutting the frame to form a circuit, bending the end portion of the cut metal substrate circuit to form an external electrode to form a first circuit board, and an integrated circuit element and a resistance element on the circuit board. , Electronic components such as capacitors A step of forming a through hole and a fixing means of a cut corner at an end to form a second circuit board; and a step of forming the external electrode of the first circuit board by the through means which is a fixing means of the second circuit board. A step of engaging the holes and the cut corners and stacking and fixing the second circuit board on the first circuit board; and a gap and a surrounding area between the first and second circuit boards for the external electrode. And a step of encapsulating with a second resin so as to project the resin. A method of manufacturing a resin-encapsulated semiconductor device.
【請求項19】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記第
1,第2の金属基板領域を連結固定するために前記第
1,第2の金属基板間および底面領域を第1の樹脂で封
止固定する工程と、前記第1の金属基板領域上にパワー
半導体素子を、また前記第2の金属基板領域上に制御用
集積回路素子をそれぞれ搭載する工程と、搭載した前記
パワー半導体素子、前記制御用集積回路素子および前記
第1,第2の金属基板領域を電気的に接続する工程と、
前記金属基板回路の外枠フレームを切断して回路を形成
し、切断後の金属基板回路の端部を折り曲げ加工して外
部電極を形成して第1の回路基板を形成する工程と、回
路基板に集積回路素子、抵抗素子、コンデンサなどの電
子部品を搭載し、周辺端部に貫通穴および切角の固定手
段を形成し、第2の回路基板を形成する工程と、前記第
1の回路基板の前記外部電極を前記第2の回路基板の固
定手段である前記貫通穴および前記切角に係合させ、前
記第1の回路基板に前記第2の回路基板を積層固定する
工程と、前記第1,第2の回路基板間の間隙および外囲
領域を前記外部電極を突出させるように第2の樹脂で封
止する工程とを備えた樹脂封止型半導体装置の製造方
法。
19. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, and a step of connecting and fixing the first and second metal substrate regions. 1, a step of sealing and fixing the space between the second metal substrate and the bottom surface region with the first resin, a power semiconductor element on the first metal substrate region, and a control on the second metal substrate region. Mounting each integrated circuit element, and electrically connecting the mounted power semiconductor element, the control integrated circuit element, and the first and second metal substrate regions,
A step of cutting the outer frame of the metal substrate circuit to form a circuit, bending an end portion of the cut metal substrate circuit to form external electrodes, and forming a first circuit board; A step of mounting an electronic component such as an integrated circuit element, a resistance element, a capacitor, etc. on a peripheral edge portion, forming a through hole and a fixing means for a cutting angle to form a second circuit board; and the first circuit board. Engaging the external electrode with the through hole and the cut corner that are fixing means of the second circuit board, and stacking and fixing the second circuit board on the first circuit board; 1. A method of manufacturing a resin-encapsulated semiconductor device, which comprises a step of encapsulating a gap between a second circuit board and an outer peripheral area with a second resin so that the external electrodes protrude.
【請求項20】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記第
1の金属基板領域上にパワー半導体素子を、また前記第
2の金属基板領域上に制御用集積回路素子を搭載する工
程と、搭載した前記パワー半導体素子、前記制御用集積
回路素子および前記第1,第2の金属基板を電気的に接
続する工程と、前記第1,第2の金属基板領域を連結固
定するために前記第1,第2の金属基板領域間および底
面領域を第1の樹脂で封止固定する工程と、前記金属基
板回路の金属基板の一部やタイバーを切断して一部回路
を形成し、電気的試験を行なう工程と、前記金属基板回
路の外枠フレームを切断して回路を形成し、切断後の金
属基板回路の端部を折り曲げ加工して外部電極を形成し
て第1の回路基板を形成する工程と、回路基板に集積回
路素子、抵抗素子、コンデンサなどの電子部品を搭載
し、周辺端部に貫通穴および切角の固定手段を形成し、
第2の回路基板を形成する工程と、前記第1の回路基板
の前記外部電極を前記第2の回路基板の固定手段である
前記貫通穴および前記切角に係合させ、前記第1の回路
基板に前記第2の回路基板を積層固定する工程と、前記
第1,第2の回路基板間の間隙および外囲領域を前記外
部電極を突出させるように第2の樹脂で封止する工程と
を備えた樹脂封止型半導体装置の製造方法。
20. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, a power semiconductor element on the first metal substrate region, and the second semiconductor substrate region. A step of mounting a control integrated circuit element on the metal substrate region, and a step of electrically connecting the mounted power semiconductor element, the control integrated circuit element and the first and second metal substrates, A step of sealing and fixing the first and second metal substrate regions between the first and second metal substrate regions and a bottom region with a first resin in order to connect and fix the first and second metal substrate regions; A step of cutting a part or a tie bar to form a part of the circuit and performing an electrical test, and cutting the outer frame of the metal board circuit to form a circuit, and cutting the end part of the metal board circuit after cutting. The first circuit board is formed by bending and forming external electrodes. The process of forming and mounting electronic components such as integrated circuit elements, resistance elements, capacitors on the circuit board, and forming the through holes and the fixing means for the cut corners at the peripheral edge,
Forming a second circuit board, and engaging the external electrodes of the first circuit board with the through holes and the cut corners that are fixing means of the second circuit board to form the first circuit. Stacking and fixing the second circuit board on the board; and sealing the gap and the surrounding area between the first and second circuit boards with a second resin so that the external electrodes protrude. A method of manufacturing a resin-encapsulated semiconductor device, comprising:
【請求項21】 金属板を加工して第1,第2の金属基
板領域を有した金属基板回路を構成する工程と、前記第
1,第2の金属基板領域を連結固定するために前記第
1,第2の金属基板領域間および底面領域を第1の樹脂
で封止固定する工程と、前記第1の金属基板領域上にパ
ワー半導体素子を、また前記第2の金属基板領域上に制
御用集積回路素子をそれぞれ搭載する工程と、搭載した
前記パワー半導体素子、前記制御用集積回路素子および
前記第1,第2の金属基板を電気的に接続する工程と、
前記金属基板回路の金属基板の一部やタイバーを切断し
て一部回路を形成し、電気的試験を行なう工程と、前記
金属基板回路の外枠フレームを切断して回路を形成し、
切断後の金属基板回路の端部を折り曲げ加工して外部電
極を形成して第1の回路基板を形成する工程と、回路基
板に集積回路素子、抵抗素子、コンデンサなどの電子部
品を搭載し、周辺端部に貫通穴および切角の固定手段を
形成し、第2の回路基板を形成する工程と、前記第1の
回路基板の前記外部電極を前記第2の回路基板の固定手
段である前記貫通穴および前記切角に係合させ、前記第
1の回路基板に前記第2の回路基板を積層固定する工程
と、前記第1,第2の回路基板領域間の間隙および外囲
領域を前記外部電極を突出させるように第2の樹脂で封
止する工程とを備えた樹脂封止型半導体装置の製造方
法。
21. A step of processing a metal plate to form a metal substrate circuit having first and second metal substrate regions, and the step of connecting and fixing the first and second metal substrate regions. 1. A step of sealing and fixing between the second metal substrate region and the bottom region with a first resin, and controlling a power semiconductor element on the first metal substrate region and on the second metal substrate region. Mounting respective integrated circuit elements for use, and electrically connecting the mounted power semiconductor element, the controlling integrated circuit element, and the first and second metal substrates,
Forming a circuit by cutting a part of the metal substrate or the tie bar of the metal substrate circuit, performing an electrical test, and cutting the outer frame of the metal substrate circuit to form a circuit,
A step of bending the end portion of the metal substrate circuit after cutting to form an external electrode to form a first circuit board, and mounting an electronic component such as an integrated circuit element, a resistance element, or a capacitor on the circuit board, A step of forming a through hole and a fixing means of a cut corner at a peripheral end portion to form a second circuit board; and a step of fixing the external electrode of the first circuit board to the second circuit board. A step of engaging the through hole and the corner and stacking and fixing the second circuit board on the first circuit board; and a gap between the first and second circuit board areas and a surrounding area. And a step of sealing with a second resin so as to project the external electrode.
【請求項22】 第1の樹脂および第2の樹脂が絶縁性
のエポキシ樹脂である請求項10〜請求項21のうちの
一つに記載の樹脂封止型半導体装置の製造方法。
22. The method for manufacturing a resin-encapsulated semiconductor device according to claim 10, wherein the first resin and the second resin are insulating epoxy resins.
【請求項23】 第1の樹脂および第2の樹脂が絶縁性
のポリフェニレンサルファイドである請求項10〜請求
項21のうちの一つに記載の樹脂封止型半導体装置の製
造方法。
23. The method of manufacturing a resin-encapsulated semiconductor device according to claim 10, wherein the first resin and the second resin are insulating polyphenylene sulfides.
【請求項24】 金属板を加工して目的とする金属基板
領域と外部端子となる領域を形成し、さらに金属基板領
域の動作上影響のない領域に貫通孔もしくは切欠部など
の係止手段を形成する工程と、あらかじめ成形加工によ
って第1の樹脂により形成した樹脂板を前記貫通孔もし
くは切欠部などの係止手段を設けた金属基板に嵌合さ
せ、金属基板領域間および底面領域を樹脂固定する工程
と、前記樹脂板を金属基板に嵌合させたものに対して、
前記金属基板領域にパワー半導体素子、制御用素子を搭
載し、結線する工程と、表面領域を第2の樹脂で封止す
る工程と、外部端子の加工をする工程とを有することを
特徴とする樹脂封止型半導体装置製造方法。
24. A metal plate is processed to form a target metal substrate region and a region to be an external terminal, and a locking means such as a through hole or a notch is provided in a region of the metal substrate region which does not affect operation. Forming step and fitting a resin plate previously formed of the first resin by molding into a metal substrate provided with locking means such as the through hole or notch, and fixing the resin between the metal substrate regions and the bottom region. And the resin plate fitted to the metal substrate,
It has a step of mounting a power semiconductor element and a control element in the metal substrate area and connecting them, a step of sealing the surface area with a second resin, and a step of processing an external terminal. Method for manufacturing resin-sealed semiconductor device.
【請求項25】 金属板を加工して目的とする金属基板
領域と外部端子となる領域を形成し、さらに前記外部端
子群間に第1のタイバー、第2のタイバーを形成し、金
属基板領域を有して回路構成された金属基板を用意する
工程と、前記金属基板領域を有して回路構成された金属
基板上にパワー半導体素子および制御用集積回路素子お
よびその他の電子部品を搭載する工程と、前記パワー半
導体素子、制御用集積回路素子およびその他の電子部品
と外部端子とを金属細線で接続する工程と、前記パワー
半導体素子、制御用集積回路素子およびその他の電子部
品の搭載領域を樹脂により封止する工程とよりなる樹脂
封止型半導体装置の製造方法であって、前記樹脂封止工
程においては、前記外部端子群間に第1のタイバー、第
2のタイバーの2重のタイバーを形成したことにより、
樹脂封止時、第1のタイバーで防ぎきれなかった樹脂を
第2のタイバーで止め、外部端子の先端部分への樹脂の
流動を止め、外部端子のマザーボードとの接合部分とな
る箇所への樹脂の流出を止め、樹脂ばりの付着を防止し
て樹脂封止することを特徴とする樹脂封止型半導体装置
の製造方法。
25. A metal plate is processed to form a target metal substrate region and a region to be an external terminal, and further a first tie bar and a second tie bar are formed between the external terminal groups to form a metal substrate region. A step of preparing a circuit-configured metal substrate having the step of mounting a power semiconductor element, a control integrated circuit element, and other electronic components on the circuit-configured metal substrate having the metal substrate region. And a step of connecting the power semiconductor element, the control integrated circuit element and other electronic parts to an external terminal with a thin metal wire, and a mounting area of the power semiconductor element, the control integrated circuit element and the other electronic parts with a resin. A method of manufacturing a resin-encapsulated semiconductor device, comprising: a step of encapsulating with a first tie bar and a second tie bar between the external terminal groups in the resin encapsulation step. By forming the tie bar of
At the time of resin sealing, the resin that could not be prevented by the first tie bar is stopped by the second tie bar to stop the resin from flowing to the tip part of the external terminal, and the resin to the part where the external terminal is joined to the mother board. The method for manufacturing a resin-encapsulated semiconductor device, characterized in that the resin encapsulation is performed by stopping the outflow of the resin and preventing the resin flash from adhering.
JP07336464A 1995-08-02 1995-12-25 Resin-sealed semiconductor device and method of manufacturing the same Expired - Fee Related JP3130239B2 (en)

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