JPH08134692A - High dielectric constant composite aluminum oxide coating film and its production - Google Patents

High dielectric constant composite aluminum oxide coating film and its production

Info

Publication number
JPH08134692A
JPH08134692A JP27784194A JP27784194A JPH08134692A JP H08134692 A JPH08134692 A JP H08134692A JP 27784194 A JP27784194 A JP 27784194A JP 27784194 A JP27784194 A JP 27784194A JP H08134692 A JPH08134692 A JP H08134692A
Authority
JP
Japan
Prior art keywords
salt
acid
aluminum oxide
dielectric constant
composite aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27784194A
Other languages
Japanese (ja)
Inventor
Makoto Ue
誠 宇恵
Bunichi Mizutani
文一 水谷
Takako Takahashi
孝子 高橋
Sachie Sekikawa
佐千江 関川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP27784194A priority Critical patent/JPH08134692A/en
Priority to US08/551,999 priority patent/US5733661A/en
Publication of JPH08134692A publication Critical patent/JPH08134692A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a composite aluminum oxide coating film contg. a specified amt. of central atoms of anions of an inorg. oxo acid salt by anodically oxidizing aluminum in a nonaq. electrolytic soln. contg. the inorg. oxo acid salt. CONSTITUTION: Aluminum is anodically oxidized in a nonaq. electrolytic soln. contg. about 0.1-2mol/l inorg. oxo acid salt and having <=5wt.%, preferably about <=2% water content. Ammonium salt, alkali metallic salt, phosphonium salt or sulfonium salt of nitric acid, phosphoric acid, boric acid, vanadic acid or tungstic acid is suitable for use as the inorg. oxo acid salt. Ethylene glycol or toluene may be used as a nonaq. solvent. By the anodic oxidation, the objective composite aluminum oxide coating film contg. 1-50% central atoms of anions of the inorg. oxo acid salt, e.g. N, P, B, V or W and having a relative dielectric constant of >=20 is obtd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は高誘電率複合酸化アルミ
ニウム皮膜およびその製造方法に関する。高誘電率複合
酸化アルミニウム皮膜は、高い静電容量の要求される電
解コンデンサやプリント基板上の印刷コンデンサ、マイ
クロ波用の誘電体共振器、IC、液晶TFTの誘電体、
絶縁体として利用される。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high dielectric constant composite aluminum oxide film and a method for producing the same. The high-dielectric-constant composite aluminum oxide film is an electrolytic capacitor that requires high capacitance, a printed capacitor on a printed board, a dielectric resonator for microwaves, an IC, a liquid crystal TFT dielectric,
Used as an insulator.

【0002】[0002]

【従来の技術】アルミニウムの陽極酸化は古くから良く
知られた原理であり、工業的に多方面に利用されてい
る。陽極酸化は通常、水系の電解液中で実施され、使用
する電解液の種類によってポーラス型とバリアー型と言
われる2種類の酸化皮膜が形成されることが知られてい
る。バリアー型皮膜は緻密で電気絶縁性が高いので、電
解コンデンサの誘電膜や半導体上のアルミニウム配線の
絶縁膜等に応用されている。
2. Description of the Related Art The anodic oxidation of aluminum has been a well-known principle since ancient times and has been industrially used in various fields. It is known that anodization is usually carried out in an aqueous electrolytic solution, and two types of oxide films called porous type and barrier type are formed depending on the type of electrolytic solution used. Since the barrier type film is dense and has high electric insulation, it is applied to a dielectric film of an electrolytic capacitor, an insulating film of aluminum wiring on a semiconductor, and the like.

【0003】アルミニウム電解コンデンサは、電気化学
的あるいは化学的に表面を粗面化したアルミニウム箔を
ほう酸系、リン酸系あるいはアジピン酸系の水溶液で陽
極酸化処理し、酸化アルミニウム皮膜層を形成した化成
箔を陽極側電極に用いている(金属表面技術便覧 67
1頁(1976)日刊工業新聞社、実験表面技術 35
(6)、261(1988))。
In an aluminum electrolytic capacitor, an aluminum foil whose surface is electrochemically or chemically roughened is anodized with an aqueous solution of boric acid, phosphoric acid or adipic acid to form an aluminum oxide film layer. Foil is used for the anode electrode (Handbook of Metal Surface Technology 67
Page 1 (1976) Nikkan Kogyo Shimbun, Experimental Surface Technology 35
(6), 261 (1988)).

【0004】一般に、平行板コンデンサの静電容量C
は、 C=ε0・εr・A/d (ただし、ε0;真空の誘電率、εr;比誘電率、A;電
極面積、d;誘電体の厚み)によって定義される。高い
静電容量のコンデンサを得るためには、(1)誘電体の
比誘電率を向上させるか、(2)表面積を拡大するかあ
るいは薄くするかのいずれかの方法になる。酸化アルミ
ニウムの比誘電率は7〜10であり、また、酸化皮膜を
薄くすると耐電圧が低下するので、電極表面積を電解エ
ッチングで拡大することで高静電容量化が達成されてき
た。
Generally, the capacitance C of a parallel plate capacitor
Is defined by C = ε 0 · ε r · A / d (where, ε 0 is a vacuum permittivity, ε r is a relative permittivity, A is an electrode area, and d is a dielectric thickness). In order to obtain a capacitor having a high capacitance, either (1) improving the relative permittivity of the dielectric material, or (2) expanding or thinning the surface area is used. Aluminum oxide has a relative permittivity of 7 to 10, and since the withstand voltage decreases when the oxide film is thinned, high electrostatic capacity has been achieved by increasing the electrode surface area by electrolytic etching.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、近年の
電子機器の軽薄短小化の流れのなかで、電解コンデンサ
もチップ化、小型化の要求が強く、そのためには電極箔
のさらなる高静電容量化が望まれている。また、プリン
ト基板回路あるいは半導体回路上の誘電膜や絶縁膜にも
同様な課題がある。本発明は、このような要請に応え得
る高誘電率複合酸化アルミニウム皮膜及びその製法を提
供しようというものである。
However, in the recent trend toward lighter, thinner, shorter, and smaller electronic devices, there is a strong demand for electrolytic capacitors to be made into chips and smaller in size. For that purpose, the electrostatic capacitance of electrode foils is further increased. Is desired. Further, a dielectric film or an insulating film on a printed circuit board or a semiconductor circuit has a similar problem. The present invention aims to provide a high-dielectric-constant composite aluminum oxide film and a method for producing the same, which can meet such demands.

【0006】[0006]

【課題を解決するための手段】即ち、本発明の第1は、
無機オキソ酸塩のアニオンの中心原子を含有する比誘電
率20以上の高誘電率複合酸化アルミニウム皮膜を提供
するものである。本発明の第2は、無機オキソ酸塩を含
んでなる水分量5%以下の非水系電解液中でアルミニウ
ムを電解陽極酸化することにより高誘電率複合酸化アル
ミニウム皮膜を製造する方法を提供するものである。
That is, the first aspect of the present invention is to:
The present invention provides a high dielectric constant composite aluminum oxide film containing a central atom of an anion of an inorganic oxoacid salt and having a relative dielectric constant of 20 or more. A second aspect of the present invention provides a method for producing a high dielectric constant composite aluminum oxide film by electrolytic anodizing aluminum in a non-aqueous electrolytic solution containing an inorganic oxo acid salt and having a water content of 5% or less. Is.

【0007】[0007]

【作用】水が存在しない系あるいは微量な系での陽極酸
化においては、電解液の溶質である無機オキソ酸塩のア
ニオンを形成している酸素が酸素源となりうる。そのた
め、陽極酸化により無機オキソ酸塩のアニオンを形成す
る酸素原子とともに該オキソ酸塩のアニオンの中心原子
が含有され、従来の酸化アルミニウムに比べ比誘電率が
2倍以上高い、即ち比誘電率が20以上に大幅に増加す
る。
In the anodic oxidation in a system in which water does not exist or in a trace amount, oxygen forming the anion of the inorganic oxo acid salt, which is the solute of the electrolytic solution, can be the oxygen source. Therefore, the central atom of the anion of the oxo acid salt is contained together with the oxygen atom forming the anion of the inorganic oxo acid salt by anodization, and the relative dielectric constant is twice or more higher than that of conventional aluminum oxide, that is, the relative dielectric constant is higher. Greatly increased to over 20.

【0008】(発明の概要)高誘電率複合酸化アルミニウム皮膜の製造方法 本発明の高誘電率複合酸化アルミニウム皮膜は無機オキ
ソ酸塩を含んでなる水分量5%以下の非水系電解液中で
アルミニウムを電解陽極酸化することにより得られる。
(Summary of the Invention) Method for Producing High Dielectric Constant Composite Aluminum Oxide Film The high dielectric constant composite aluminum oxide film of the present invention comprises aluminum in a non-aqueous electrolyte containing an inorganic oxo acid salt and having a water content of 5% or less. Is obtained by electrolytic anodic oxidation.

【0009】本発明の方法に用いる非水系電解液として
は、無機オキソ酸塩の非水系溶媒溶液が用いられる。上
記無機オキソ酸塩としては、無機オキソ酸の1、2、3
または4級のアンモニウム塩、アルカリ金属塩、四級ホ
スホニウム塩、スルホニウム塩を例示することができ
る。無機オキソ酸塩のアニオンを形成する無機オキソ酸
としては、硝酸、リン酸およびホウ酸のように中心原子
が窒素、リン、ホウ素等の非金属のオキソ酸であって
も、クロム酸、バナジン酸、タングステン酸のように中
心原子がクロム、バナジウム、タングステン等の金属の
オキシ酸であってもよい。また、オキソ酸は、ポリ酸で
あってもよく、さらにイソポリ酸でもヘテロポリ酸でも
よい。
As the non-aqueous electrolytic solution used in the method of the present invention, a non-aqueous solvent solution of an inorganic oxo acid salt is used. Examples of the inorganic oxoacid salt include inorganic oxoacids 1, 2, 3
Alternatively, a quaternary ammonium salt, an alkali metal salt, a quaternary phosphonium salt, or a sulfonium salt can be exemplified. Examples of the inorganic oxo acid forming the anion of the inorganic oxo acid salt include chromic acid, vanadic acid, even if the central atom is a non-metal oxo acid such as nitrogen, phosphorus, or boron, such as nitric acid, phosphoric acid, and boric acid. Alternatively, an oxyacid having a central atom such as chromium, vanadium, or tungsten such as tungstic acid may be used. Further, the oxo acid may be a poly acid, and may be an isopoly acid or a heteropoly acid.

【0010】非水系溶媒としては、エチレングリコー
ル、メチルセロソルブ等のアルコール系溶媒;γ−ブチ
ロラクトン、γ−バレロラクトン、δ−バレロラクトン
等のラクトン系溶媒;エチレンカーボネート、プロピレ
ンカーボネート、ブチレンカーボネート等のカーボネー
ト系溶媒;N−メチルホルムアミド、N−エチルホルム
アミド、N,N−ジメチルホルムアミド、N,N−ジエ
チルホルムアミド、N−メチルアセトアミド、N,N−
ジメチルアセトアミド、N−メチルピロリジノン等のア
ミド系溶媒;3−メトキシプロピオニトリル、グルタロ
ニトリル等のニトリル系溶媒;トリメチルホスフェー
ト、トリエチルホスフェート等のリン酸エステル系溶
媒;及び、これらの2種以上の溶媒の混合物等の極性溶
媒、並びに、ヘキサン、トルエン、シリコンオイル等の
非極性溶媒を例示することが出来るが無機オキソ酸塩を
溶解し易い極性溶媒の方が好ましい。
Examples of the non-aqueous solvent include alcohol solvents such as ethylene glycol and methyl cellosolve; lactone solvents such as γ-butyrolactone, γ-valerolactone and δ-valerolactone; carbonates such as ethylene carbonate, propylene carbonate and butylene carbonate. System solvent; N-methylformamide, N-ethylformamide, N, N-dimethylformamide, N, N-diethylformamide, N-methylacetamide, N, N-
Amide solvents such as dimethylacetamide and N-methylpyrrolidinone; nitrile solvents such as 3-methoxypropionitrile and glutaronitrile; phosphate ester solvents such as trimethyl phosphate and triethyl phosphate; and two or more of these. Examples thereof include polar solvents such as a mixture of solvents, and nonpolar solvents such as hexane, toluene, and silicon oil, but polar solvents in which the inorganic oxo acid salt is easily dissolved are preferable.

【0011】使用する無機オキソ酸塩の濃度は、得るべ
き電解液の電導度、火花電圧により異なるが、一般的に
飽和濃度以下、好ましくは0.1〜2mol/〓であ
る。また、高誘電率複合酸化アルミニウム皮膜を得るた
めには、電解液は実質的に無水である必要があり、電解
液の水分量は5重量%以下、好ましくは2重量%以下に
する必要がある。水分量を減らすことにより高誘電率複
合酸化アルミニウム皮膜の比誘電率をさらに高くするこ
とができる。水分量が多すぎると水分を酸素源とする従
来の酸化皮膜を形成するため、得られる酸化皮膜の比誘
電率は向上しない。陽極酸化は一般的に、上記の電解浴
中で、室温〜150℃の温度範囲で、電流密度0.5〜
50mA/cm2 の範囲で行われる。電解陽極酸化時間は電
極面積により定められる。
The concentration of the inorganic oxo acid salt used varies depending on the conductivity and spark voltage of the electrolytic solution to be obtained, but is generally below the saturation concentration, preferably 0.1 to 2 mol / 〓. Further, in order to obtain a high dielectric constant composite aluminum oxide film, the electrolytic solution must be substantially anhydrous, and the water content of the electrolytic solution must be 5% by weight or less, preferably 2% by weight or less. . By reducing the water content, the relative dielectric constant of the high dielectric constant composite aluminum oxide film can be further increased. If the water content is too large, a conventional oxide film using water as an oxygen source is formed, so that the relative permittivity of the obtained oxide film is not improved. Anodization is generally carried out in the above electrolytic bath at a temperature range of room temperature to 150 ° C. and a current density of 0.5 to
It is performed in the range of 50 mA / cm 2 . The electrolytic anodic oxidation time is determined by the electrode area.

【0012】高誘電率複合酸化アルミニウム皮膜 上記の方法により、無機オキソ酸塩のアニオンの中心原
子を1〜50重量%含有する比誘電率20以上、好まし
くは30以上の高誘電率複合酸化アルミニウム皮膜を得
ることができる。本発明の高誘電率複合酸化アルミニウ
ム皮膜の膜厚は化成電圧により任意に定められ、10〜
1000nmのものが得られる。
High dielectric constant composite aluminum oxide film A high dielectric constant composite aluminum oxide film having a relative permittivity of 20 or more, preferably 30 or more, containing 1 to 50% by weight of the central atom of the anion of the inorganic oxoacid salt by the above method. Can be obtained. The film thickness of the high dielectric constant composite aluminum oxide film of the present invention is arbitrarily determined by the formation voltage,
A wavelength of 1000 nm is obtained.

【0013】上記の方法で得られる高誘電率複合酸化ア
ルミニウム皮膜は、陽極酸化において使用された電解質
である無機オキソ酸塩のアニオンの中心原子、即ち、硝
酸塩、リン酸塩またはホウ酸塩のようなオキソ酸塩では
それぞれ窒素、リン、ホウ素が、またバナジン酸塩また
はタングステン酸塩のようなオキシ酸塩ではそれぞれバ
ナジウム、タングステンを含有する。
The high-dielectric-constant composite aluminum oxide film obtained by the above-mentioned method has a central atom of the anion of the inorganic oxoacid salt which is the electrolyte used in the anodization, that is, nitrate, phosphate or borate. The oxo acid salts contain nitrogen, phosphorus, and boron, and the oxy acid salts such as vanadate and tungstate contain vanadium and tungsten, respectively.

【0014】[0014]

【実施例】以下に実施例および比較例を挙げて本発明を
さらに詳細に説明する。 (実施例1)1モル濃度の硝酸のテトラエチルアンモニ
ウム塩を含むエチレングリコール溶液を調製し、減圧加
熱して脱水した。このときの電解液の水分は15ppm
であった。この電解液を使用して、アルミニウム箔を5
mA/cm2 の定電流で50Vまで陽極酸化して化成箔を得
た。
EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples below. (Example 1) An ethylene glycol solution containing 1 molar concentration of tetraethylammonium salt of nitric acid was prepared and dehydrated by heating under reduced pressure. The water content of the electrolyte at this time is 15 ppm
Met. Using this electrolyte, 5 aluminum foil
Anodized to 50 V with a constant current of mA / cm 2 to obtain a formed foil.

【0015】得た化成箔のTEM(走査透過型電子顕微
鏡)による断面の観察の結果、皮膜はほぼ平滑で、表面
積は陽極酸化前とほとんど変化しておらず、膜厚は20
nmであった。この化成箔を10重量%のアジピン酸ア
ンモニウム水溶液に浸し、LCRメータで120Hzに
おける静電容量を測定した。120Hzにおける静電容
量は4.1μF/cm2 であった。静電容量と膜厚から
求めた比誘電率を表1に示す。
As a result of observing the cross section of the obtained chemical conversion foil with a TEM (scanning transmission electron microscope), the film was almost smooth, the surface area was almost unchanged from that before anodic oxidation, and the film thickness was 20.
was nm. This formed foil was dipped in a 10 wt% aqueous solution of ammonium adipate, and the capacitance at 120 Hz was measured with an LCR meter. The capacitance at 120 Hz was 4.1 μF / cm 2 . Table 1 shows the relative permittivity obtained from the capacitance and the film thickness.

【0016】(実施例2)1モル濃度のほう酸のテトラ
エチルアンモニウム塩を含むエチレングリコール溶液を
調製し、減圧加熱して脱水した。このときの電解液の水
分は500ppmであった。この電解液を使用して、ア
ルミニウム箔を5mA/cm2の定電流で38Vまで陽極酸
化して化成箔を得た。得た化成箔を、10重量%のアジ
ピン酸アンモニウム水溶液に浸し、LCRメータで12
0Hzにおける静電容量を測定した。実施例1と同様に
して求めた比誘電率を表1に示す。
(Example 2) An ethylene glycol solution containing a tetraethylammonium salt of boric acid at a molar concentration of 1 was prepared and dehydrated by heating under reduced pressure. The electrolytic solution had a water content of 500 ppm. Using this electrolytic solution, an aluminum foil was anodized to 38 V at a constant current of 5 mA / cm 2 to obtain a formed foil. The obtained formed foil was dipped in a 10% by weight aqueous solution of ammonium adipate, and was immersed in an LCR meter for 12 hours.
The capacitance at 0 Hz was measured. Table 1 shows the relative permittivity obtained in the same manner as in Example 1.

【0017】(実施例3)1モル濃度のリン酸のテトラ
エチルアンモニウム塩を含むエチレングリコール溶液を
調製し、減圧加熱して脱水した。このときの電解液の水
分は400ppmであった。この電解液を使用して、ア
ルミニウム箔を5mA/cm2の定電流で25Vまで陽極酸
化して化成箔を得た。得た化成箔を、10重量%のアジ
ピン酸アンモニウム水溶液に浸し、LCRメータで12
0Hzにおける静電容量を測定した。実施例1と同様に
して求めた比誘電率を表1に示す。
Example 3 An ethylene glycol solution containing 1 molar concentration of tetraethylammonium phosphate was prepared and heated under reduced pressure for dehydration. The electrolytic solution had a water content of 400 ppm. Using this electrolytic solution, an aluminum foil was anodized to 25 V at a constant current of 5 mA / cm 2 to obtain a chemical conversion foil. The obtained formed foil was dipped in a 10% by weight aqueous solution of ammonium adipate, and was immersed in an LCR meter for 12 hours.
The capacitance at 0 Hz was measured. Table 1 shows the relative permittivity obtained in the same manner as in Example 1.

【0018】(実施例4)1モル濃度のバナジン酸のテ
トラエチルアンモニウム塩を含むエチレングリコール溶
液を調製し、減圧加熱して脱水した。このときの電解液
の水分は0.9重量%であった。この電解液を使用し
て、アルミニウム箔を5mA/cm2の定電流で60Vまで
陽極酸化して化成箔を得た。得た化成箔を、10重量%
のアジピン酸アンモニウム水溶液に浸し、LCRメータ
で120Hzにおける静電容量を測定した。実施例1と
同様にして求めた比誘電率を表1に示す。FESTEM
(電界放射型走査透過型電子顕微鏡)−EDX(エネル
ギー分散型X線分光法)により酸化皮膜の構造を調べ
た。
(Example 4) An ethylene glycol solution containing a tetraethylammonium salt of vanadic acid at a molar concentration of 1 was prepared and dehydrated by heating under reduced pressure. The electrolytic solution had a water content of 0.9% by weight. Using this electrolytic solution, an aluminum foil was anodized to 60 V at a constant current of 5 mA / cm 2 to obtain a formed foil. 10% by weight of the obtained formed foil
Was immersed in an aqueous solution of ammonium adipate and the capacitance at 120 Hz was measured with an LCR meter. Table 1 shows the relative permittivity obtained in the same manner as in Example 1. FESTEM
(Field Emission Scanning Transmission Electron Microscope) -The structure of the oxide film was examined by EDX (energy dispersive X-ray spectroscopy).

【0019】図1はFESTEMによる酸化皮膜の断面
図である。図1の1〜4に示した部分の元素分析をED
Xによって行った結果、それぞれ原子比にして、1
(O;75.30%, Al;22.15%, V;
2.55%)、2(O;73.69%, Al;25.
08%, V;1.23%)、3(O;69.44%,
Al;29.38%, V;1.18%)および4
(O;3.56%, Al;96.28%, V;0.
16%)であり、酸化皮膜にはバナジン酸の中心原子で
あるバナジウムが含有されていた。
FIG. 1 is a sectional view of an oxide film by FESTEM. The elemental analysis of the parts shown in FIGS.
As a result of X, 1 in atomic ratio
(O; 75.30%, Al; 22.15%, V;
2.55%), 2 (O; 73.69%, Al; 25.
08%, V; 1.23%), 3 (O; 69.44%,
Al; 29.38%, V; 1.18%) and 4
(O; 3.56%, Al; 96.28%, V;
16%), and the oxide film contained vanadium, which is the central atom of vanadic acid.

【0020】(実施例5)1モル濃度のタングステン酸
のテトラエチルアンモニウム塩を含むエチレングリコー
ル溶液を調製し、減圧加熱して脱水した。このときの電
解液の水分1重量%であった。この電解液を使用して、
アルミニウム箔を5mA/cm2の定電流で38Vまで陽極
酸化して化成箔を得た。得た化成箔を、10重量%のア
ジピン酸アンモニウム水溶液に浸し、LCRメータで1
20Hzにおける静電容量を測定した。実施例1と同様
にして求めた比誘電率を表1に示す。
(Embodiment 5) An ethylene glycol solution containing a tetraethylammonium salt of tungstic acid at a molar concentration of 1 was prepared and dehydrated by heating under reduced pressure. The electrolytic solution had a water content of 1% by weight. Using this electrolyte,
The aluminum foil was anodized at a constant current of 5 mA / cm 2 to 38 V to obtain a chemical conversion foil. The obtained formed foil was dipped in a 10% by weight aqueous solution of ammonium adipate, and 1
The capacitance at 20 Hz was measured. Table 1 shows the relative permittivity obtained in the same manner as in Example 1.

【0021】(比較例1)化成用電解液としてアルミニ
ウム電解コンデンサ用化成箔の製造に使用されている1
0重量%のアジピン酸アンモニウム水溶液を用い、化成
電圧を75Vとした他は実施例1と同様にしてアルミニ
ウム箔を陽極酸化した。得た化成箔を、10重量%のア
ジピン酸アンモニウム水溶液に浸し、LCRメータで静
電容量を測定した。120Hzにおける静電容量は0.
088μF/cm2 であった。また、TEMによる断面
の観察から皮膜の膜厚は80nmであり、静電容量と膜
厚から求めた比誘電率は8.0であった。
(Comparative Example 1) Used as a chemical conversion electrolytic solution in the production of a chemical conversion foil for aluminum electrolytic capacitors 1
The aluminum foil was anodized in the same manner as in Example 1 except that a 0% by weight ammonium adipate aqueous solution was used and the formation voltage was set to 75V. The obtained formed foil was dipped in a 10% by weight ammonium adipate aqueous solution, and the capacitance was measured with an LCR meter. The capacitance at 120 Hz is 0.
It was 088 μF / cm 2 . Further, the film thickness of the film was 80 nm from the observation of the cross section by TEM, and the relative dielectric constant obtained from the capacitance and the film thickness was 8.0.

【0022】(比較例2)化成用電解液として1モル濃
度のバナジン酸テトラエチルアンモニウム水溶液を用い
た他は実施例1と同様にしてアルミニウム箔を50Vま
で陽極酸化した。得た化成箔を、10重量%のアジピン
酸アンモニウム水溶液に浸し、LCRメータで静電容量
を測定した。120Hzにおける静電容量は、0.12
μF/cm 2 であり、実施例1と同様にして比誘電率を
求めると7.4となり、比較例1の比誘電率とほぼ同じ
であった。
(Comparative Example 2) Concentration of 1 mol as an electrolytic solution for chemical conversion
With tetraethylammonium vanadate solution
Other than that, the same procedure as in Example 1 was performed on the aluminum foil up to 50V.
Anodized. 10% by weight of adipine obtained from the formed foil
Immersion in ammonium acid aqueous solution, capacitance by LCR meter
Was measured. The capacitance at 120Hz is 0.12
μF / cm 2And the relative permittivity is determined in the same manner as in Example 1.
The calculated value is 7.4, which is almost the same as the relative dielectric constant of Comparative Example 1.
Met.

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【発明の効果】本発明の高誘電率複合酸化アルミニウム
皮膜は、従来の水系化成用電解液で形成された酸化皮膜
よりも2倍以上高い、20以上の比誘電率の皮膜であ
り、本発明の高誘電率複合酸化アルミニウム皮膜を用い
ることにより、同一サイズで高い静電容量あるいは同一
静電容量で小さいサイズの電解コンデンサを実現するこ
とが可能になる。
The high-dielectric-constant composite aluminum oxide film of the present invention is a film having a relative dielectric constant of 20 or more, which is at least twice as high as that of an oxide film formed by a conventional aqueous chemical conversion electrolyte solution. By using the high-dielectric-constant composite aluminum oxide film, it is possible to realize an electrolytic capacitor having the same size and high capacitance or the same capacitance and small size.

【図面の簡単な説明】[Brief description of drawings]

【図1】 図1は実施例4で得た高誘電率複合酸化アル
ミニウム皮膜の断面の組織を示す図である。図中の符号
1〜4はEDXによる元素分析のポイントを示す。
FIG. 1 is a diagram showing a structure of a cross section of a high dielectric constant composite aluminum oxide film obtained in Example 4. Reference numerals 1 to 4 in the figure indicate the points of elemental analysis by EDX.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 関川 佐千江 茨城県稲敷郡阿見町中央8丁目3番1号 三菱化学株式会社筑波研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Sachie Sachie 8-3-1 Chuo, Ami-cho, Inashiki-gun, Ibaraki Mitsubishi Chemical Corporation Tsukuba Research Center

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 無機オキソ酸塩のアニオンの中心原子を
1〜50重量%含有する、比誘電率20以上の高誘電率
複合酸化アルミニウム皮膜。
1. A high dielectric constant composite aluminum oxide film having a relative dielectric constant of 20 or more, containing 1 to 50% by weight of the central atom of an anion of an inorganic oxoacid salt.
【請求項2】 無機オキソ酸塩のアニオンが硝酸、リン
酸、ホウ酸、バナジン酸またはタングステン酸から選ば
れる請求項1記載の高誘電率複合酸化アルミニウム皮
膜。
2. The high dielectric constant composite aluminum oxide film according to claim 1, wherein the anion of the inorganic oxoacid salt is selected from nitric acid, phosphoric acid, boric acid, vanadic acid or tungstic acid.
【請求項3】 無機オキソ酸塩を含んでなる水分量5重
量%以下の非水系電解液中でアルミニウムを電解陽極酸
化することを特徴とする高誘電率複合酸化アルミニウム
皮膜の製造方法。
3. A method for producing a high dielectric constant composite aluminum oxide film, which comprises electrolytically anodizing aluminum in a nonaqueous electrolytic solution containing an inorganic oxoacid salt and having a water content of 5% by weight or less.
【請求項4】 無機オキソ酸塩が硝酸塩、リン酸塩、ホ
ウ酸塩、バナジン酸塩またはタングステン酸塩塩から選
ばれる請求項3記載の高誘電率複合酸化アルミニウム皮
膜の製造方法。
4. The method for producing a high dielectric constant composite aluminum oxide film according to claim 3, wherein the inorganic oxo acid salt is selected from nitrates, phosphates, borates, vanadates or tungstates.
JP27784194A 1994-11-11 1994-11-11 High dielectric constant composite aluminum oxide coating film and its production Pending JPH08134692A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP27784194A JPH08134692A (en) 1994-11-11 1994-11-11 High dielectric constant composite aluminum oxide coating film and its production
US08/551,999 US5733661A (en) 1994-11-11 1995-11-02 High-permittivity composite oxide film and uses thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27784194A JPH08134692A (en) 1994-11-11 1994-11-11 High dielectric constant composite aluminum oxide coating film and its production

Publications (1)

Publication Number Publication Date
JPH08134692A true JPH08134692A (en) 1996-05-28

Family

ID=17589016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27784194A Pending JPH08134692A (en) 1994-11-11 1994-11-11 High dielectric constant composite aluminum oxide coating film and its production

Country Status (1)

Country Link
JP (1) JPH08134692A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999025906A1 (en) * 1997-11-18 1999-05-27 Mitsubishi Chemical Corporation Chemical conversion fluid for forming metal oxide film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999025906A1 (en) * 1997-11-18 1999-05-27 Mitsubishi Chemical Corporation Chemical conversion fluid for forming metal oxide film
US6368485B1 (en) 1997-11-18 2002-04-09 Mitsubishi Chemical Corporation Forming electrolyte for forming metal oxide coating film

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