JPH07312302A - Chip-like electronic part - Google Patents

Chip-like electronic part

Info

Publication number
JPH07312302A
JPH07312302A JP6104104A JP10410494A JPH07312302A JP H07312302 A JPH07312302 A JP H07312302A JP 6104104 A JP6104104 A JP 6104104A JP 10410494 A JP10410494 A JP 10410494A JP H07312302 A JPH07312302 A JP H07312302A
Authority
JP
Japan
Prior art keywords
conductive resin
containing conductive
layer
layers
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6104104A
Other languages
Japanese (ja)
Inventor
Keiji Yamanaka
啓治 山中
Etsuji Miyanaga
悦治 宮永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP6104104A priority Critical patent/JPH07312302A/en
Publication of JPH07312302A publication Critical patent/JPH07312302A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To form a satisfactory electrode layer with a simplified plating process or without plating, by sequentially forming a silver-containing conductive resin layer, a nickel-containing conductive resin layer and a solder-plating layer. CONSTITUTION:Ag-containing conductive resin paste is applied onto both lateral sides of an alumina base plate 1 so as to cover an upper electrode layer 2 and a lower electrode layer 3, and is pre-dried by a tunnel-type drying furnace with hot air circulation. Then, Ni-containing conductive resin paste is applied onto the pre-dried layer of Ag-containing conductive resin paste and is pre-dried. The Ni-containing conductive resin paste is then cured by the tunnel-type drying furnace with hot air circulation. Thus, Ag-containing conductive resin layers 6, 6 and Ni-containing conductive resin layers 7, 7 are formed. Then, solder- plating layers 8, 8 are formed on the Ni-containing conductive resin layers 7, 7 by electroplating. Thus, lateral side electrode layers 9, 9 for connecting the upper electrode layers 2, 2 with the lower electrode layers 3, 3 are formed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば抵抗器、コンデ
ンサ、発振子等のチップ状電子部品に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to chip-shaped electronic parts such as resistors, capacitors and oscillators.

【0002】[0002]

【従来の技術】この種のチップ状電子部品は、その側面
に側面電極層が形成されており、プリント基板等に対し
て上記側面電極層を半田付けにより接続して用いられ
る。例えばチップ抵抗器は、図3に断面図を示すよう
に、絶縁基板11の上面に対向する一対の上面電極層1
2,12が形成され、上記絶縁基板11の下面に上記上
面電極層12,12と対向するように一対の下面電極層
13,13が形成され、上記上面電極層13,13に跨
るように抵抗層14が形成され、該抵抗層14上に保護
層15が形成され、上記絶縁基板11の側面に上記上面
電極層12,12と下面電極層13,13とを接続する
ように側面電極層16,16が形成されるという構成を
有する。そして、上記側面電極層16,16上にはニッ
ケルメッキ層17a及び半田メッキ層17bからなるメ
ッキ層17,17が形成されている。従来、上記側面電
極層16,16は、ガラスをバインダーとしてAg、P
d等の金属粉を混入させたAgペースト、Ag−Pdペ
ーストを印刷し焼成するか、或いはエポキシ樹脂等の熱
硬化性樹脂をバインダーとして上記金属粉を混入させた
導電性樹脂ペーストを印刷し硬化して形成されている。
2. Description of the Related Art This type of chip-shaped electronic component has a side electrode layer formed on its side surface, and is used by connecting the side electrode layer to a printed circuit board or the like by soldering. For example, the chip resistor has a pair of upper surface electrode layers 1 facing the upper surface of the insulating substrate 11, as shown in the sectional view of FIG.
2 and 12 are formed, a pair of lower surface electrode layers 13 and 13 are formed on the lower surface of the insulating substrate 11 so as to face the upper surface electrode layers 12 and 12, and a resistance is formed so as to extend over the upper surface electrode layers 13 and 13. A layer 14 is formed, a protective layer 15 is formed on the resistance layer 14, and side surface electrode layers 16 are formed so as to connect the upper surface electrode layers 12 and 12 and the lower surface electrode layers 13 and 13 to the side surfaces of the insulating substrate 11. , 16 are formed. Then, on the side surface electrode layers 16 and 16, plating layers 17 and 17 including a nickel plating layer 17a and a solder plating layer 17b are formed. Conventionally, the side surface electrode layers 16 and 16 are made of Ag and P by using glass as a binder.
The Ag paste or Ag-Pd paste mixed with metal powder such as d is printed and baked, or the conductive resin paste mixed with the above metal powder is printed and cured using a thermosetting resin such as an epoxy resin as a binder. Is formed.

【0003】[0003]

【発明が解決しようとする課題】上記従来のチップ状電
子部品における側面電極層16,16は、Ag及びガラ
ス、或いはAg及び熱硬化性樹脂のペーストから形成さ
れたものであるために、該側面電極層16,16をその
ままにプリント基板に半田付けを行っても満足な合金化
が得られず、上記側面電極層16,16と半田との融着
性が不十分で接続不良を生じたり、チップ状電子部品が
プリント基板の所定の位置から脱落したりするのであ
る。そこで、上記側面電極層16,16上に下地用のニ
ッケルメッキ層17a及び半田メッキ層17bを順次形
成することにより、半田付け性を得ているのである。
The side surface electrode layers 16 and 16 in the above-mentioned conventional chip-shaped electronic component are formed from a paste of Ag and glass, or Ag and a thermosetting resin. Even if the electrode layers 16 and 16 are soldered to the printed circuit board as they are, satisfactory alloying cannot be obtained and the fusion between the side electrode layers 16 and 16 and the solder is insufficient, resulting in poor connection. The chip-shaped electronic component may fall off from a predetermined position on the printed board. Therefore, the nickel plating layer 17a for the base and the solder plating layer 17b are sequentially formed on the side surface electrode layers 16 and 16 to obtain solderability.

【0004】このように、従来のチップ状電子部品にお
ける側面電極層上には半田付けを可能とするためにニッ
ケルメッキ層17a及び半田メッキ層17bを介在させ
ることが不可欠であり、そのために2度のメッキ処理工
程を必要としていた。メッキ処理工程を実施するために
は、大きな設備を必要とし、工程管理が煩わしい等生産
性を低下させる要因を多く含むものである。また、環境
問題に関する廃液処理等の付随設備も必要とされ、製造
コストの大幅な増大を招いている。
As described above, it is indispensable to interpose the nickel plating layer 17a and the solder plating layer 17b on the side surface electrode layer in the conventional chip-shaped electronic component in order to enable soldering. Required a plating treatment step. In order to carry out the plating process, a large facility is required, and there are many factors that reduce productivity such as complicated process control. In addition, auxiliary equipment such as waste liquid treatment relating to environmental problems is required, resulting in a large increase in manufacturing cost.

【0005】本発明は、上記メッキ処理工程を簡素化も
しくは省略しても良好な電極層を形成することができる
技術を提供することを技術的課題とするものである。
An object of the present invention is to provide a technique capable of forming a good electrode layer even if the plating process is simplified or omitted.

【0006】[0006]

【課題を解決するための手段】本発明者は、上記技術的
課題を達成すべくなされたもので、次のチップ状電子部
品に係るものである。 チップ基体の側面に電極層を備えたチップ状電子部
品において、上記電極層が、銀含有導電性樹脂層、ニッ
ケル含有導電性樹脂層及び半田メッキ層を順次形成して
なることを特徴とするチップ状電子部品。 チップ基体の側面に電極層を備えたチップ状電子部
品において、上記電極層が、銀含有導電性樹脂層、ニッ
ケル含有導電性樹脂層及び半田含有導電性樹脂層を順次
形成してなることを特徴とするチップ状電子部品。
The present inventor has been made to achieve the above technical problems, and relates to the following chip-shaped electronic parts. A chip-shaped electronic component having an electrode layer on a side surface of a chip base, wherein the electrode layer is formed by sequentially forming a silver-containing conductive resin layer, a nickel-containing conductive resin layer, and a solder plating layer. Electronic components. In a chip-shaped electronic component having an electrode layer on a side surface of a chip substrate, the electrode layer is formed by sequentially forming a silver-containing conductive resin layer, a nickel-containing conductive resin layer, and a solder-containing conductive resin layer. Chip-shaped electronic parts to be.

【0007】本発明において、電極層の一部を構成する
銀含有導電性樹脂層におけるAgの含有率としては、6
0〜90重量%程度、好ましくは70〜85重量%程度
である。Agの含有率が60重量%を下回ると電極層と
したときの導電性が低くなり好ましくなく、一方90重
量%を上回ると電極層としたときの被塗着体に対する密
着性が低くなり好ましくない。上記銀含有導電性樹脂層
は、例えばAg粉末を熱硬化性樹脂及び溶剤と混練した
Ag含有導電性樹脂ペーストを塗着、熱硬化して形成さ
れることができる。このとき、Ag粉末以外にNi、A
u、Pt、Cu、Al、Pd等の導電性粉末を、電極と
しての導電性を必要以上に阻害しない範囲であれば適宜
加えても構わない。
In the present invention, the content ratio of Ag in the silver-containing conductive resin layer forming a part of the electrode layer is 6
It is about 0 to 90% by weight, preferably about 70 to 85% by weight. If the Ag content is less than 60% by weight, the conductivity when used as an electrode layer will be low, and if it exceeds 90% by weight, the adhesion to the adherend when used as an electrode layer will be low, which is not preferable. . The silver-containing conductive resin layer can be formed by, for example, applying an Ag-containing conductive resin paste obtained by kneading Ag powder with a thermosetting resin and a solvent and thermosetting. At this time, in addition to Ag powder, Ni, A
A conductive powder such as u, Pt, Cu, Al, or Pd may be appropriately added as long as the conductivity of the electrode is not unnecessarily hindered.

【0008】本発明において、電極層の一部を構成する
ニッケル含有導電性樹脂層におけるNiの含有率として
は、60〜90重量%程度、好ましくは70〜85重量
%程度である。Niの含有率が60%を下回ると電極層
としたときの導電性が低くなるとともに、半田付け性が
低下して好ましくなく、一方90%を上回ると上記Ag
含有導電性樹脂層に対する密着性が低くなり好ましくな
い。上記ニッケル含有導電性樹脂層は、例えばNi粉末
を熱硬化性樹脂及び溶剤と混練したNi含有導電性樹脂
ペーストを塗着、熱硬化して形成されることができる。
このとき、Ni粉末以外にAg、Au、Pt、Cu、A
l、Pd等の導電性粉末を、半田付け性を必要以上に低
下させない範囲であれば適宜加えても構わない。
In the present invention, the nickel content of the nickel-containing conductive resin layer forming a part of the electrode layer is about 60 to 90% by weight, preferably about 70 to 85% by weight. When the content of Ni is less than 60%, the conductivity of the electrode layer is lowered and the solderability is deteriorated, which is not preferable.
Adhesion to the contained conductive resin layer is low, which is not preferable. The nickel-containing conductive resin layer can be formed, for example, by applying a Ni-containing conductive resin paste obtained by kneading Ni powder with a thermosetting resin and a solvent and thermosetting.
At this time, besides Ni powder, Ag, Au, Pt, Cu, A
Conductive powders such as l and Pd may be appropriately added as long as the solderability is not unnecessarily reduced.

【0009】上記銀含有導電性樹脂層及びニッケル含有
導電性樹脂層を形成するときに用いるAg粉末、Ni粉
末等の導電性粉末の形態としては、例えば、球状、樹枝
状、フレーク状、不定形の何れであってもよく、導電性
を高める点で樹枝状が特に好ましい。また、上記導電性
粉末の平均粒径は、高密度とし導電性を高め得る点で小
さい程好ましく、30μm程度以下、より好ましくは1
〜10μm程度である。
The form of the conductive powder such as Ag powder and Ni powder used when forming the silver-containing conductive resin layer and the nickel-containing conductive resin layer is, for example, spherical, dendritic, flake-shaped, or amorphous. Any of these may be used, and a dendritic form is particularly preferable in terms of enhancing conductivity. The average particle size of the conductive powder is preferably as small as possible in order to increase the density and increase the conductivity, and is about 30 μm or less, more preferably 1 μm or less.
It is about 10 μm.

【0010】また、上記銀含有導電性樹脂層又はニッケ
ル含有導電性樹脂層を形成するときに用いる熱硬化性樹
脂としては、特に限定されず導電性樹脂に用いられる公
知のものを広く使用でき、より具体的には、例えばエポ
キシ樹脂、アクリル樹脂、ポリイミド樹脂、フェノール
樹脂等の耐熱性のものを挙げることができ、これらの1
種もしくは2種以上を有効に用いることができる。これ
らの熱硬化性樹脂の中でもエポキシ樹脂が硬化温度及び
耐熱性の点で好ましい。熱硬化性樹脂の配合率として
は、銀含有もしくはニッケル含有導電性樹脂ペーストに
おける溶剤を除く全重量に対して10〜40%程度、好
ましくは10〜25%程度である。
The thermosetting resin used for forming the silver-containing conductive resin layer or the nickel-containing conductive resin layer is not particularly limited, and widely known ones can be used. More specifically, for example, heat resistant materials such as epoxy resin, acrylic resin, polyimide resin and phenol resin can be mentioned.
One kind or two or more kinds can be effectively used. Among these thermosetting resins, epoxy resins are preferable in terms of curing temperature and heat resistance. The compounding ratio of the thermosetting resin is about 10 to 40%, preferably about 10 to 25% with respect to the total weight of the silver-containing or nickel-containing conductive resin paste excluding the solvent.

【0011】上記溶剤としては、上記熱硬化性樹脂を分
散乃至溶解させ、導電性樹脂ペーストを電極層とするた
めの加熱時に蒸発するものであれば特に限定されること
なく使用することができ、具体的には、例えばテルピネ
オール、ブチルカルビトールアセテート、エチレングリ
コールジメチルエーテル等の各種有機溶剤を挙げること
ができる。上記溶剤の配合量は、溶剤の種類、熱硬化性
樹脂の種類及び配合率、混練条件等により異なり、混練
後の導電性樹脂ペーストが塗着可能な範囲の粘度になる
ように調整されるのが好ましい。
Any solvent can be used without particular limitation as long as it is capable of dispersing or dissolving the thermosetting resin and evaporating at the time of heating for forming the conductive resin paste into the electrode layer. Specific examples include various organic solvents such as terpineol, butyl carbitol acetate, and ethylene glycol dimethyl ether. The blending amount of the solvent varies depending on the type of the solvent, the type and blending ratio of the thermosetting resin, the kneading conditions, etc., and is adjusted so that the conductive resin paste after the kneading has a viscosity within a coatable range. Is preferred.

【0012】上記Ag粉末もしくはNi粉末、及び熱硬
化性樹脂は、溶剤により粘度を調整し、ディスパー、ボ
ールミル、3本ロール等により十分に混練されて導電性
樹脂ペーストとされる。上記導電性樹脂ペーストは、例
えば被塗着物に塗着され、一定時間加熱されて熱硬化性
樹脂を硬化させ、その後常温に戻され電極層とされる。
The Ag powder or Ni powder and the thermosetting resin are adjusted in viscosity with a solvent and sufficiently kneaded with a disper, a ball mill, a triple roll or the like to form a conductive resin paste. The conductive resin paste is applied to an object to be coated, heated for a certain period of time to cure the thermosetting resin, and then returned to room temperature to form an electrode layer.

【0013】また、上記Ag粉末、Ni粉末等の導電性
粉末、熱硬化性樹脂及び溶剤以外に、上記導電性粉末の
酸化を防止するための酸化防止剤、フィラー、顔料等の
各種添加剤を得られる電極層の導電性及び半田との融着
性を低減させない範囲で用いてもかまわない。本発明に
おいて、上記ニッケル含有導電性樹脂層上に半田メッキ
層を形成する場合、半田メッキ層は、例えば電気メッ
キ、溶融メッキ、メタリコン、無電解メッキ等の公知の
各種メッキ方法により形成されることができる。
In addition to the conductive powders such as Ag powder and Ni powder, the thermosetting resin and the solvent, various additives such as antioxidants, fillers and pigments for preventing the conductive powders from being oxidized. It may be used in a range that does not reduce the conductivity of the obtained electrode layer and the fusion property with solder. In the present invention, when the solder plating layer is formed on the nickel-containing conductive resin layer, the solder plating layer is formed by various known plating methods such as electroplating, hot dipping, metallikon, and electroless plating. You can

【0014】また、本発明において上記ニッケル含有導
電性樹脂層上に半田含有導電性樹脂層を形成する場合に
は、該半田含有導電性樹脂層中の半田の含有率として
は、60〜90重量%程度、好ましくは70〜85重量
%程度である。半田の含有率が60重量%を下回ると電
極層としたときの導電性が低くなり好ましくなく、一方
90重量%を上回ると下層に対する密着性が低くなり好
ましくない。上記半田含有導電性樹脂層も、上記銀含有
導電性樹脂層、ニッケル含有導電性樹脂層のときと同
様、半田粉末を熱硬化性樹脂、溶剤等と混練され、半田
含有導電性樹脂ペーストとして塗着、熱硬化して形成さ
れることができる。
When the solder-containing conductive resin layer is formed on the nickel-containing conductive resin layer in the present invention, the content of the solder in the solder-containing conductive resin layer is 60 to 90% by weight. %, Preferably about 70 to 85% by weight. If the solder content is less than 60% by weight, the conductivity of the electrode layer is low, which is not preferable, while if it exceeds 90% by weight, the adhesion to the lower layer is low, which is not preferable. Similarly to the silver-containing conductive resin layer and the nickel-containing conductive resin layer, the solder-containing conductive resin layer is kneaded with a thermosetting resin, a solvent, etc., and applied as a solder-containing conductive resin paste. It can be formed by coating and heat curing.

【0015】[0015]

【実施例】以下実施例を示し、本発明の特徴とするとこ
ろをより詳細に説明するが、本発明がこれら実施例に限
定されることはない。 (Ag含有導電性樹脂ペーストの調製)平均粒径5μm
のAg粉末とエポキシ樹脂とをAg:エポキシ樹脂=1
3:3の重量比で配合し、この配合物80重量%及びテ
ルピネオール20重量%をディスパーにより十分混練し
てAg含有導電性樹脂ペーストを得た。 (Ni含有導電性樹脂ペーストの調製)平均粒径5μm
のNi粉末とエポキシ樹脂とをNi:エポキシ樹脂=1
3:3の重量比で配合し、この配合物を80重量%及び
テルピネオール20重量%をディスパーにより十分混練
してNi含有導電性樹脂ペーストを得た。 (半田含有導電性樹脂ペーストの調製)平均粒径5μm
の半田粉末とエポキシ樹脂とをNi:エポキシ樹脂=1
3:3の重量比で配合し、この配合物を80重量%及び
テルピネオール20重量%をディスパーにより十分混練
して半田含有導電性樹脂ペーストを得た。 (電極層の形成及び評価)電極層をチップ抵抗器におけ
る側面電極層として評価した。 (実施例1)図1及び図2に斜視図及び断面図を示すよ
うに、矩形板状のアルミナ基板1の上面の両側部に対向
する一対のAg−ガラス系の上面電極層2,2を形成
し、上記アルミナ基板1の下面に、上記上面電極層2,
2とアルミナ基板1を挟んで対向するように一対のAg
−ガラス系の下面電極層3,3を形成し、上記上面電極
層2,2に跨るように抵抗層4を形成し、該抵抗層を覆
い且つ上記上面電極層2,2のアルミナ基板1の側部側
を露出するようにガラス保護層5を形成した。そして、
上記Ag含有導電性樹脂ペーストを、上記上面電極層2
及び下面電極層3を部分的に覆うように、上記アルミナ
基板1の両側面に塗着させ、熱風循環式トンネル型乾燥
炉にてピーク温度120℃で7分間の条件で予備乾燥を
行った。次いで、上記Ag含有導電性樹脂ペーストを予
備乾燥した層上に、上記Ni含有導電性樹脂ペーストを
塗着し、上記と同じ条件で予備乾燥を行った後、熱風循
環式トンネル型乾燥炉にてピーク温度200℃で60分
間の条件で硬化させ、層厚10μm程度のAg含有導電
性樹脂層6,6及び層厚10μm程度のNi含有導電性
樹脂層7,7を形成した。次に、電気メッキ法により上
記Ni含有導電性樹脂層7,7上に層厚10μm程度の
半田メッキ層8,8を形成した。このようにして、上面
電極層2,2と下面電極層3,3とを接続する側面電極
層9,9を形成した。
EXAMPLES The features of the present invention will be described in more detail below with reference to examples, but the present invention is not limited to these examples. (Preparation of Ag-containing conductive resin paste) Average particle size 5 μm
Ag powder and epoxy resin of Ag: Epoxy resin = 1
80% by weight of this mixture and 20% by weight of terpineol were sufficiently kneaded with a disper to obtain an Ag-containing conductive resin paste. (Preparation of Ni-containing conductive resin paste) Average particle size 5 μm
Ni powder and epoxy resin Ni: epoxy resin = 1
The mixture was mixed in a weight ratio of 3: 3, and 80% by weight of this mixture and 20% by weight of terpineol were sufficiently kneaded with a disper to obtain a Ni-containing conductive resin paste. (Preparation of conductive resin paste containing solder) Average particle size 5 μm
Solder powder and epoxy resin of Ni: Epoxy resin = 1
80% by weight and 20% by weight of terpineol were sufficiently kneaded with a disper to obtain a solder-containing conductive resin paste. (Formation and Evaluation of Electrode Layer) The electrode layer was evaluated as a side surface electrode layer in the chip resistor. (Embodiment 1) As shown in the perspective view and the sectional view in FIGS. 1 and 2, a pair of Ag-glass based upper electrode layers 2 and 2 opposed to both sides of the upper surface of a rectangular plate-shaped alumina substrate 1 are provided. Formed on the lower surface of the alumina substrate 1, the upper electrode layer 2,
2 and a pair of Ag so as to face each other with the alumina substrate 1 interposed therebetween.
-Glass-based lower surface electrode layers 3 and 3 are formed, a resistance layer 4 is formed so as to extend over the upper surface electrode layers 2 and 2, and the resistance layer is covered and the alumina substrate 1 of the upper surface electrode layers 2 and 2 is formed. The glass protective layer 5 was formed so that the side portions were exposed. And
The Ag-containing conductive resin paste is applied to the upper electrode layer 2
And the lower surface electrode layer 3 so as to partially cover the lower surface electrode layer 3 and were applied to both side surfaces of the alumina substrate 1, and preliminarily dried in a hot air circulation tunnel type drying furnace at a peak temperature of 120 ° C. for 7 minutes. Then, the Ni-containing conductive resin paste is applied onto the layer obtained by pre-drying the Ag-containing conductive resin paste and pre-dried under the same conditions as above, and then in a hot-air circulation tunnel type drying furnace. It was cured at a peak temperature of 200 ° C. for 60 minutes to form Ag-containing conductive resin layers 6 and 6 having a layer thickness of about 10 μm and Ni-containing conductive resin layers 7 and 7 having a layer thickness of about 10 μm. Next, solder plating layers 8 having a layer thickness of about 10 μm were formed on the Ni-containing conductive resin layers 7 by electroplating. In this way, the side surface electrode layers 9, 9 connecting the upper surface electrode layers 2, 2 and the lower surface electrode layers 3, 3 were formed.

【0016】次に、斯くして得られたチップ抵抗器を、
プリント基板に200〜250℃で半田付けにより実装
した。その結果、上記チップ抵抗器は、その側面電極層
9,9と半田との融着性に極めて優れたものであった。 (実施例2)上記実施例1と同様にして、チップ抵抗器
におけるアルミナ基板1の両側面にAg含有導電性樹脂
ペーストを塗着して予備乾燥し、更にその上にNi含有
導電性樹脂ペーストを塗着して予備乾燥した。次いで、
このAg含有導電性樹脂ペースト及びNi含有導電性樹
脂ペーストを予備乾燥した層上に、上記半田含有導電性
樹脂ペーストを塗着し、同様に予備乾燥した。その後、
熱風循環式トンネル型乾燥炉にてピーク温度200℃で
60分間の条件で硬化させ、Ag含有導電性樹脂層6,
6、Ni含有導電性樹脂層7,7及び層厚10μm程度
の半田含有導電性樹脂層を形成した。このようにして上
記3層からなる上面電極層2,2と下面電極層3,3と
を電気的に接続する側面電極層を形成したチップ抵抗器
を得た。この得られたチップ抵抗器を、上記実施例1に
おけるのと同様にしてプリント基板に半田付けを行った
ところ、極めて良好な半田付け性を有することが判っ
た。
Next, the chip resistor thus obtained is
The printed circuit board was mounted by soldering at 200 to 250 ° C. As a result, the chip resistor was extremely excellent in the fusion property between the side surface electrode layers 9 and 9 and the solder. (Example 2) In the same manner as in Example 1, the Ag-containing conductive resin paste was applied to both side surfaces of the alumina substrate 1 of the chip resistor, pre-dried, and the Ni-containing conductive resin paste was further formed thereon. Was applied and pre-dried. Then
The above-mentioned solder-containing conductive resin paste was applied onto the layer obtained by pre-drying the Ag-containing conductive resin paste and the Ni-containing conductive resin paste, and similarly pre-dried. afterwards,
Cured in a hot air circulation type tunnel type drying furnace at a peak temperature of 200 ° C. for 60 minutes to obtain an Ag-containing conductive resin layer 6,
6. The Ni-containing conductive resin layers 7 and 7 and the solder-containing conductive resin layer having a layer thickness of about 10 μm were formed. In this way, a chip resistor was obtained in which the side surface electrode layers for electrically connecting the upper surface electrode layers 2 and 2 and the lower surface electrode layers 3 and 3 composed of the above three layers were formed. When the obtained chip resistor was soldered to a printed circuit board in the same manner as in Example 1, it was found that the chip resistor had extremely good solderability.

【0017】以上、チップ抵抗器に適用した場合を例に
説明したが、本発明はこれに限定されることなく、チッ
プ型の積層セラミックコンデンサ、固体電解コンデン
サ、発振子等の、半田付けに供される電極層を有するチ
ップ状電子部品に広く適用されるものである。
Although the case where the present invention is applied to a chip resistor has been described above, the present invention is not limited to this, and is used for soldering a chip type multilayer ceramic capacitor, a solid electrolytic capacitor, an oscillator, or the like. It is widely applied to a chip-shaped electronic component having an electrode layer to be formed.

【0018】[0018]

【発明の作用及び効果】本発明において、銀含有導電性
樹脂層、ニッケル含有導電性樹脂層及び半田メッキ層を
順次形成して電極層とするときは、上記銀含有導電性樹
脂層における銀は、その高い導電性により電気的コンタ
クトを良好にし得、またニッケル含有導電性樹脂層は、
上記銀含有導電性樹脂層を覆うように形成することで、
プリント基板等に対して半田付けする場合に銀含有導電
性樹脂層中の銀が半田中に取り込まれて銀含有導電性樹
脂層の電気的コンタクトが不安定になることを効果的に
防止するものである。また、上記半田メッキ層は、電極
層の表面層として設けられ半田濡れ性を向上して半田付
けを容易とするのである。このようにしてなる電極層
は、その形成過程において、メッキ処理工程を半田メッ
キのみとすることができ、生産性の向上を図れるととも
にチップ状電子部品の製造設備の省スペース化を図るこ
とができる。
In the present invention, when the silver-containing conductive resin layer, the nickel-containing conductive resin layer and the solder plating layer are sequentially formed into the electrode layer, the silver in the silver-containing conductive resin layer is , Its high conductivity can improve electrical contact, and the nickel-containing conductive resin layer is
By forming so as to cover the silver-containing conductive resin layer,
What effectively prevents the silver in the silver-containing conductive resin layer from being taken into the solder and destabilizing the electrical contact of the silver-containing conductive resin layer when soldering to a printed circuit board or the like. Is. The solder plating layer is provided as a surface layer of the electrode layer to improve solder wettability and facilitate soldering. In the formation process of the electrode layer thus formed, the plating process can be performed only by solder plating, which can improve the productivity and save the space for the manufacturing equipment of the chip-shaped electronic component. .

【0019】また、本発明において、銀含有導電性樹脂
層、ニッケル含有導電性樹脂層及び半田含有導電性樹脂
層を順次形成して電極層とするときは、メッキ処理工程
を完全に省略でき、チップ状電子部品の製造工程を容易
にし得、生産性を一層向上でき、更に設備の一層の省ス
ペース化及び製造コストの低減を図ることができる。以
上のように、本発明によれば、メッキ処理工程を簡素化
もしくは省略しても良好な半田付け性を有する電極層を
得ることができるのである。
Further, in the present invention, when the silver-containing conductive resin layer, the nickel-containing conductive resin layer and the solder-containing conductive resin layer are sequentially formed into the electrode layer, the plating treatment step can be completely omitted. The manufacturing process of the chip-shaped electronic component can be facilitated, the productivity can be further improved, the space of the equipment can be further saved, and the manufacturing cost can be reduced. As described above, according to the present invention, it is possible to obtain an electrode layer having good solderability even if the plating process is simplified or omitted.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例におけるチップ抵抗器を示す斜
視図である。
FIG. 1 is a perspective view showing a chip resistor according to an embodiment of the present invention.

【図2】図1のチップ抵抗器のX−X断面図である。2 is a cross-sectional view taken along the line XX of the chip resistor of FIG.

【図3】従来のチップ抵抗器を示す断面図である。FIG. 3 is a sectional view showing a conventional chip resistor.

【符号の説明】[Explanation of symbols]

1 アルミナ基板 2 上面電極層 3 下面電極層 4 抵抗層 5 保護層 6 銀含有導電性樹脂層 7 ニッケル含有導電性樹脂層 8 半田メッキ層 9 側面電極層 1 Alumina substrate 2 Upper surface electrode layer 3 Lower surface electrode layer 4 Resistance layer 5 Protective layer 6 Silver-containing conductive resin layer 7 Nickel-containing conductive resin layer 8 Solder plating layer 9 Side electrode layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 チップ基体の側面に電極層を備えたチッ
プ状電子部品において、上記電極層が、銀含有導電性樹
脂層、ニッケル含有導電性樹脂層及び半田メッキ層を順
次形成してなることを特徴とするチップ状電子部品。
1. A chip-shaped electronic component having an electrode layer on a side surface of a chip substrate, wherein the electrode layer is formed by sequentially forming a silver-containing conductive resin layer, a nickel-containing conductive resin layer and a solder plating layer. Chip-shaped electronic parts characterized by.
【請求項2】 チップ基体の側面に電極層を備えたチッ
プ状電子部品において、上記電極層が、銀含有導電性樹
脂層、ニッケル含有導電性樹脂層及び半田含有導電性樹
脂層を順次形成してなることを特徴とするチップ状電子
部品。
2. A chip-shaped electronic component having an electrode layer on a side surface of a chip substrate, wherein the electrode layer sequentially forms a silver-containing conductive resin layer, a nickel-containing conductive resin layer and a solder-containing conductive resin layer. A chip-shaped electronic component characterized by being formed.
JP6104104A 1994-05-18 1994-05-18 Chip-like electronic part Pending JPH07312302A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6104104A JPH07312302A (en) 1994-05-18 1994-05-18 Chip-like electronic part

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6104104A JPH07312302A (en) 1994-05-18 1994-05-18 Chip-like electronic part

Publications (1)

Publication Number Publication Date
JPH07312302A true JPH07312302A (en) 1995-11-28

Family

ID=14371818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6104104A Pending JPH07312302A (en) 1994-05-18 1994-05-18 Chip-like electronic part

Country Status (1)

Country Link
JP (1) JPH07312302A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002019347A1 (en) * 2000-08-30 2002-03-07 Matsushita Electric Industrial Co., Ltd. Resistor and production method therefor
US6853074B2 (en) 1999-12-27 2005-02-08 Matsushita Electric Industrial Co., Ltd. Electronic part, an electronic part mounting element and a process for manufacturing such the articles
JP2018032670A (en) * 2016-08-22 2018-03-01 Koa株式会社 Chip component, mounting structure of chip component, and manufacturing method of chip resistor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6853074B2 (en) 1999-12-27 2005-02-08 Matsushita Electric Industrial Co., Ltd. Electronic part, an electronic part mounting element and a process for manufacturing such the articles
US7151306B2 (en) 1999-12-27 2006-12-19 Matsushita Electric Industrial Co., Ltd. Electronic part, and electronic part mounting element and an process for manufacturing such the articles
WO2002019347A1 (en) * 2000-08-30 2002-03-07 Matsushita Electric Industrial Co., Ltd. Resistor and production method therefor
US7057490B2 (en) 2000-08-30 2006-06-06 Matsushita Electric Industrial Co. Ltd. Resistor and production method therefor
JP2018032670A (en) * 2016-08-22 2018-03-01 Koa株式会社 Chip component, mounting structure of chip component, and manufacturing method of chip resistor

Similar Documents

Publication Publication Date Title
US20050248908A1 (en) Termination coating
JPH0759660B2 (en) Conductive composition
EP0797220B1 (en) A resistor composition and resistors using the same
JPH07312302A (en) Chip-like electronic part
KR100212225B1 (en) Electronic chip components and method of manufacturing the same
JP3273015B2 (en) Method for producing conductive paste
JPH07282621A (en) Electrode material, chip-shaped electronic part using this electrode material and surface treating method for electrode layer
JP3798979B2 (en) Conductive paste and use thereof
JPH0864469A (en) Electrode material and chiplike electronic component using the same
JPH03296205A (en) Ceramic capacitor
JPH07282622A (en) Electrode material and chip-shaped electronic part using this electrode material
JPS6348914B2 (en)
JP2004288956A (en) Chip electronic component
JPH09266129A (en) External electrode of chip type electronic parts
JP2757949B2 (en) Chip electronic components
JPS62163389A (en) Method of forming conductive circuit on board
JP2000082332A (en) Conductive paste composition for via filling
JPH07297006A (en) Chip electronic part
JP3739830B2 (en) Chip-shaped electronic component and manufacturing method thereof
JPH0410754B2 (en)
GB1574438A (en) Printed circuits
JPS60130495A (en) Conductive paste
JP2001023438A (en) Conductive paste and ceramic electronic component
JP3246229B2 (en) Chip electronic component and method of manufacturing the same
JPS6142406B2 (en)