JPH07311911A - Thin film magnetic head, manufacture for thin film magnetic head and exposure device - Google Patents

Thin film magnetic head, manufacture for thin film magnetic head and exposure device

Info

Publication number
JPH07311911A
JPH07311911A JP10093894A JP10093894A JPH07311911A JP H07311911 A JPH07311911 A JP H07311911A JP 10093894 A JP10093894 A JP 10093894A JP 10093894 A JP10093894 A JP 10093894A JP H07311911 A JPH07311911 A JP H07311911A
Authority
JP
Japan
Prior art keywords
substrate
layer
magnetic head
insulating layer
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10093894A
Other languages
Japanese (ja)
Inventor
Yuji Komata
Tatsuo Mifune
達雄 三舩
雄二 小俣
Original Assignee
Matsushita Electric Ind Co Ltd
松下電器産業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd, 松下電器産業株式会社 filed Critical Matsushita Electric Ind Co Ltd
Priority to JP10093894A priority Critical patent/JPH07311911A/en
Publication of JPH07311911A publication Critical patent/JPH07311911A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent a recording/reproducing efficiency of a thin film magnetic head from being deteriorated by forming an insulating layer in a plurality of steps, making positions of end parts of insulating layers formed each time agree with each other, and eliminating a step difference at a bonded part of the insulating layers. CONSTITUTION:A lower magnetic layer 2, a gap layer 3, a plurality of coil layers 5 held between insulating layers 40a and 40b, an upper magnetic layer 6 and a protecting layer 7 are sequentially layered on a substrate 1, thus forming the thin film magnetic head. An end part of the insulating layer 40 in a direction perpendicular to the substrate 1 is inclined an angle theta of 30-40 deg. to the substrate 1. The insulating layer 40 is formed in a plurality of steps. End parts of the insulating layers 40a and 40b formed separately each time are agreed in position. Therefore, no positional shift as observed in a prior art manufacture is generated among the end parts of the insulating layers. There is no step difference at a bonded part of the insulating layers 40a and 40b. The magnetic head attains superior characteristics.

Description

【発明の詳細な説明】Detailed Description of the Invention
【0001】[0001]
【産業上の利用分野】本発明は、コンピューターのハー
ドディスク等に用いられる薄膜磁気ヘッド及びその製造
方法、及びその製造方法に適する露光装置に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head used for a hard disk of a computer, a manufacturing method thereof, and an exposure apparatus suitable for the manufacturing method.
【0002】[0002]
【従来の技術】従来の薄膜磁気ヘッドの構成を、そのト
ラック部付近の拡大断面図である図7を用いて説明す
る。図7において、例えばAl23−TiC等のセラミ
ック基板1の上には、パーマロイ等の下部磁性層2及び
Al23等のギャップ層3が積層されている。ギャップ
層3の上には、トラック部10を除き、フォトレジスト
を焼成した第1及び第2の絶縁層4a及び4bに分割さ
れた絶縁層4が形成され、さらに絶縁層4の上には、パ
ーマロイ等の上部磁性層7およびAl23等の保護層8
が順次積層されている。また、周囲を絶縁層4で囲まれ
るように複数のコイル層5が設けられている。
2. Description of the Related Art The structure of a conventional thin film magnetic head will be described with reference to FIG. 7 which is an enlarged sectional view of the vicinity of a track portion thereof. 7, for example, on the Al 2 O 3 ceramic substrate 1, such as -TiC, the lower magnetic layer 2 and Al 2 O 3 gap layer, such as 3 permalloy or the like is laminated. On the gap layer 3, an insulating layer 4 is formed, which is divided into first and second insulating layers 4a and 4b obtained by baking photoresist, except for the track portion 10, and further on the insulating layer 4, Upper magnetic layer 7 such as permalloy and protective layer 8 such as Al 2 O 3
Are sequentially stacked. Further, a plurality of coil layers 5 are provided so that the periphery thereof is surrounded by the insulating layer 4.
【0003】一般に、磁性層4ギャップ層6がギャップ
層3に対してなす傾斜角度αが薄膜磁気ヘッドの記録再
生効率に大きな影響を与える。例えば傾斜角度αが小さ
い場合、記録時に磁束がトラック部10の先端に到達す
る前にリターンしてしまい、記録効率が低下する。逆
に、傾斜角度αが大きい場合には再生効率が低下する。
このため、薄膜磁気ヘッドでは磁性層4とギャップ層3
のなす傾斜角度αに最適な角度が存在する。薄膜磁気ヘ
ッドの特性等を考慮すると、一般に30度から40度の
範囲が傾斜角度αとして適当であると考えられている。
Generally, the inclination angle α formed by the magnetic layer 4 and the gap layer 6 with respect to the gap layer 3 has a great influence on the recording / reproducing efficiency of the thin film magnetic head. For example, when the inclination angle α is small, the magnetic flux returns before recording reaches the tip of the track portion 10 during recording, and the recording efficiency decreases. On the contrary, when the inclination angle α is large, the reproduction efficiency is lowered.
Therefore, in the thin film magnetic head, the magnetic layer 4 and the gap layer 3 are
There is an optimum angle for the inclination angle α formed by. Considering the characteristics of the thin film magnetic head and the like, it is generally considered that a range of 30 to 40 degrees is suitable as the inclination angle α.
【0004】しかしながら、従来、トラック部に接する
絶縁層4がギャップ層3に対してなす傾斜角度αを定量
的にかつ再現良く制御する方法はなかった。そのため、
絶縁層4を第1の絶縁層4aと第2の絶縁層4bとに分
割し、第1の絶縁層4aがギャップ層3に対してなす傾
斜角度と第2の絶縁層4bが第1の絶縁層4aに対して
なす傾斜角度とを合わせた平均の傾斜角度αが所定の傾
斜角度になるように、第1の絶縁層4aの端部8と第2
の絶縁層4bの端部9の位置とを距離Xだけずらして第
1及び第2の絶縁層4a及び4bを形成し、第1の絶縁
層4aと第2の絶縁層4bの膜厚及びずらし量(距離
X)を調節していた。例えば、磁性層4がギャップ層3
に対してなす傾斜角度αを30度から40度の範囲内に
する場合、第1の絶縁層4aがギャップ層3に対してな
す傾斜角度及び第2の絶縁層4bが第1の絶縁層4aに
対してなす角度をそれぞれ15度から20度の範囲内に
制御する。
However, conventionally, there has been no method for quantitatively and reproducibly controlling the inclination angle α formed by the insulating layer 4 in contact with the track portion with respect to the gap layer 3. for that reason,
The insulating layer 4 is divided into a first insulating layer 4a and a second insulating layer 4b, and the inclination angle formed by the first insulating layer 4a with respect to the gap layer 3 and the second insulating layer 4b are the first insulating layers. The end portion 8 of the first insulating layer 4a and the second insulating layer 4a are arranged so that the average inclination angle α, which is the sum of the inclination angles with respect to the layer 4a, becomes a predetermined inclination angle.
The first and second insulating layers 4a and 4b are formed by shifting the position of the end portion 9 of the insulating layer 4b from the first insulating layer 4b by a distance X, and the film thickness and the shift of the first insulating layer 4a and the second insulating layer 4b are changed. The amount (distance X) was adjusted. For example, the magnetic layer 4 is the gap layer 3
When the inclination angle α formed with respect to is within the range of 30 degrees to 40 degrees, the inclination angle formed by the first insulating layer 4a with respect to the gap layer 3 and the second insulating layer 4b are formed by the first insulating layer 4a. The angles formed with respect to each other are controlled within the range of 15 to 20 degrees.
【0005】[0005]
【発明が解決しようとする課題】しかし、上記従来の薄
膜磁気ヘッドの製造方法では、第1の絶縁層4aの端部
8の位置と第2の絶縁層4bの端部9の位置が距離Xだ
けずれているため、図7に示すように、第1の絶縁層a
4と第2の絶縁層4bの接合部分に段差が生じる。この
段差は、これらの上に積層される上部磁性層7の断面形
状にも影響を与え、上部磁性層7の断面が折れ曲がった
ような形状となる。その結果、段差部分8、9に応力が
集中し、磁性膜7の剥離等の原因となったり、段差部分
8、9に磁極が生じ、応力集中により磁区構造が乱れ、
薄膜磁気ヘッドの記録再生効率が低下するという問題点
を有していた。
However, in the above-described conventional method for manufacturing a thin film magnetic head, the position of the end 8 of the first insulating layer 4a and the position of the end 9 of the second insulating layer 4b are separated by the distance X. As shown in FIG. 7, the first insulating layer a
A step is formed at the junction between the second insulating layer 4b and the second insulating layer 4b. This step also affects the cross-sectional shape of the upper magnetic layer 7 stacked on them, and the upper magnetic layer 7 has a bent shape in cross section. As a result, stress concentrates on the step portions 8 and 9 and causes separation of the magnetic film 7, or magnetic poles are generated on the step portions 8 and 9, and the magnetic domain structure is disturbed due to the stress concentration.
There is a problem that the recording / reproducing efficiency of the thin film magnetic head is lowered.
【0006】本発明は、以上のような問題点を解決する
ためになされたものであり、絶縁層を複数の層に分けて
形成する薄膜磁気ヘッドであって、各絶縁層の端部のず
らし量をなくし、かつ各絶縁層の端部のなす傾斜角度を
任意の角度に制御したものを提供することを目的として
いる。さらに、その薄膜磁気ヘッドの製造方法及びその
方法に適する露光装置を提供することを目的としてい
る。
The present invention has been made in order to solve the above problems, and is a thin film magnetic head in which an insulating layer is divided into a plurality of layers, and the ends of each insulating layer are shifted. It is an object of the present invention to eliminate the amount and control the inclination angle formed by the end of each insulating layer to an arbitrary angle. Another object of the present invention is to provide a method for manufacturing the thin film magnetic head and an exposure apparatus suitable for the method.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するた
め、本発明の薄膜磁気ヘッドは、基板上に下部磁性層、
ギャップ層、上下を絶縁層で挟まれた複数のコイル層、
上部磁性層及び保護層を順次積層した構造を有するもの
であって、基板に垂直な方向における絶縁層の端部の基
板に対する傾斜角度が30度から40度の範囲にあり、
絶縁層は複数回に分けて形成され、各回ごとに形成され
た絶縁層の端部の位置が一致しているように構成されて
いる。または、本発明の薄膜磁気ヘッドは、基板上に下
部磁性層、ギャップ層、上下を絶縁層で挟まれた複数の
コイル層、上部磁性層及び保護層を順次積層した構造を
有するものであって、基板に垂直な方向における絶縁層
の端部の基板に対する傾斜角度が30度から40度の範
囲にあり、絶縁層は複数回に分けて形成され、各回ごと
に形成された絶縁層の端部の基板に対する傾斜角度がそ
れぞれ15度以下であるように構成されている。また
は、本発明の薄膜磁気ヘッドは、基板上に下部磁性層、
ギャップ層、上下を絶縁層で挟まれた複数のコイル層、
上部磁性層及び保護層を順次積層した構造を有するもの
であって、基板に垂直な方向における絶縁層の端部の基
板に対する傾斜角度が30度から40度の範囲にあり、
絶縁層は複数回に分けて形成され、各回ごとに形成され
た絶縁層の端部の位置が一致し、かつ各回ごとに形成さ
れた絶縁層の端部の基板に対する傾斜角度がそれぞれ1
5度以下であるように構成されている。上記各構成にお
いて、絶縁層は、基板上に塗布されたフォトレジストを
露光して形成したものであることが好ましい。また、上
記構成において、フォトレジストは少なくとも3μmの
厚さを有することが好ましい。
To achieve the above object, a thin film magnetic head of the present invention comprises a lower magnetic layer on a substrate,
Gap layer, multiple coil layers sandwiched between insulating layers,
The structure has a structure in which an upper magnetic layer and a protective layer are sequentially stacked, and an inclination angle of an end portion of the insulating layer with respect to the substrate in a direction perpendicular to the substrate is in the range of 30 degrees to 40 degrees,
The insulating layer is formed a plurality of times, and the positions of the ends of the insulating layer formed at each time are the same. Alternatively, the thin-film magnetic head of the present invention has a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiched by insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate. The inclination angle of the end portion of the insulating layer in the direction perpendicular to the substrate with respect to the substrate is in the range of 30 degrees to 40 degrees, the insulating layer is formed in a plurality of times, and the end portion of the insulating layer formed at each time. The inclination angles with respect to the substrate are each 15 degrees or less. Alternatively, the thin-film magnetic head of the present invention has a lower magnetic layer on the substrate,
Gap layer, multiple coil layers sandwiched between insulating layers,
The structure has a structure in which an upper magnetic layer and a protective layer are sequentially stacked, and an inclination angle of an end portion of the insulating layer with respect to the substrate in a direction perpendicular to the substrate is in the range of 30 degrees to 40 degrees,
The insulating layer is formed a plurality of times, the positions of the ends of the insulating layer formed at each time are the same, and the inclination angle of the end of the insulating layer formed at each time is 1 degree with respect to the substrate.
It is configured to be 5 degrees or less. In each of the above structures, the insulating layer is preferably formed by exposing a photoresist applied on the substrate to light. Further, in the above structure, the photoresist preferably has a thickness of at least 3 μm.
【0008】一方、本発明の薄膜磁気ヘッドの製造方法
は、基板上に下部磁性層、ギャップ層、上下を絶縁層で
挟まれた複数のコイル層、上部磁性層及び保護層を順次
積層した構造を有する方法であって、コイル層を形成す
る工程の前後に複数回に分けてフォトレジストを露光し
焼成して絶縁層を形成し、各回における絶縁層のパター
ニングを行う際に、フォトマスクと基板との距離を増加
させつつ基板上に塗布されたフォトレジストを露光し、
基板に垂直な方向におけるフォトレジストの端部の基板
に対する傾斜角度を制御するように構成されている。上
記構成において、フォトレジストは少なくとも3μmの
厚さを有し、フォトマスクと基板とは少なくとも100
μm離れていることが好ましい。また、上記構成におい
て、フォトレジストの端部の基板に対する傾斜角度は1
5度以下であることが好ましい。
On the other hand, the method of manufacturing a thin film magnetic head of the present invention has a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiched by insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate. A method including the steps of: forming a insulating layer by exposing and baking the photoresist in a plurality of times before and after the step of forming the coil layer, and performing a patterning of the insulating layer at each time; Exposing the photoresist coated on the substrate while increasing the distance between
It is configured to control the tilt angle of the edge of the photoresist with respect to the substrate in a direction perpendicular to the substrate. In the above structure, the photoresist has a thickness of at least 3 μm, and the photomask and the substrate have at least 100 μm.
It is preferable that they are separated by μm. Further, in the above structure, the inclination angle of the end portion of the photoresist with respect to the substrate is 1
It is preferably 5 degrees or less.
【0009】また、本発明の露光装置は、光源、レンズ
及びフォトマスクを具備し、光源からの光をレンズによ
りフォトマスク上に集光し、フォトマスクから所定の距
離だけ離れた位置にある基板上に塗布された所定厚のフ
ォトレジストを露光してパターニングを行う露光装置で
あって、露光中にフォトマスクと基板との距離を増加さ
せ、基板に垂直な方向におけるフォトレジストの端部の
基板に対する傾斜角度を制御するように構成されてい
る。上記構成において、フォトレジストは少なくとも3
μmの厚さを有し、フォトマスクと基板とは少なくとも
100μm離れていることが好ましい。
Further, the exposure apparatus of the present invention comprises a light source, a lens and a photomask, the light from the light source is condensed on the photomask by the lens, and the substrate is located a predetermined distance from the photomask. An exposure device for performing patterning by exposing a photoresist having a predetermined thickness applied on the substrate, wherein the distance between the photomask and the substrate is increased during the exposure, and the substrate at the end of the photoresist in a direction perpendicular to the substrate is exposed. Is configured to control the tilt angle with respect to. In the above structure, the photoresist is at least 3
Preferably, it has a thickness of μm and the photomask and the substrate are separated by at least 100 μm.
【0010】[0010]
【作用】本発明の薄膜磁気ヘッドによれば、絶縁層を複
数回(少なくとも2回)に分けて形成し、各回ごとに形
成される絶縁層の端部の位置が一致するように構成した
ので、従来例に見られたような各回ごとに形成された絶
縁層の端部の位置のずれはなく、各絶縁層の接合部分に
段差が生じない。そのため、これらの上に積層される上
部磁性層の断面形状も折れ曲がることはなく、なめらか
な形状となる。また、段差部分に応力が集中することも
なく、磁性膜の剥離や磁区構造の乱れによる薄膜磁気ヘ
ッドの記録再生効率の低下も生じない。また、複数回
(例えば2回)に分けて形成された各絶縁層の端部の基
板に対する傾斜角度がそれぞれ15度以下であるように
構成したので、基板に垂直な方向における全体としての
絶縁層の端部の基板に対する傾斜角度が30度から40
度の範囲となり、優れた磁気ヘッド特性が得られる。さ
らに、絶縁層を基板上に塗布したフォトレジストを露光
して形成するように構成したので、後述する本発明の薄
膜磁気ヘッドの製造方法及び露光装置を用いることによ
り、容易に端部の基板に対する傾斜角度を任意の角度に
制御することが可能となる。特に、フォトレジストの厚
さを少なくとも3μm以上とすることにより、15度以
下の絶縁層の端部の基板に対する傾斜角度が得られる。
According to the thin-film magnetic head of the present invention, the insulating layer is formed a plurality of times (at least twice), and the positions of the ends of the insulating layer formed at each time are the same. The position of the end portion of the insulating layer formed every time as seen in the conventional example is not displaced, and no step is formed at the joint portion of each insulating layer. Therefore, the cross-sectional shape of the upper magnetic layer laminated on them is not bent and has a smooth shape. Further, the stress is not concentrated on the stepped portion, and the recording / reproducing efficiency of the thin film magnetic head is not deteriorated due to the peeling of the magnetic film or the disorder of the magnetic domain structure. Further, since the inclination angle of the end of each insulating layer formed a plurality of times (for example, twice) with respect to the substrate is 15 degrees or less, the insulating layer as a whole in the direction perpendicular to the substrate is formed. The angle of inclination of the edge of the substrate with respect to the substrate is 30 to 40 degrees.
And the magnetic head has excellent magnetic head characteristics. Further, since the insulating layer is formed by exposing the photoresist applied on the substrate by exposure, by using the method for manufacturing a thin film magnetic head and the exposure apparatus of the present invention described later, it is possible to easily perform the process on the substrate at the end portion. It is possible to control the inclination angle to any angle. In particular, by setting the thickness of the photoresist to at least 3 μm or more, the inclination angle of the end portion of the insulating layer with respect to the substrate of 15 degrees or less can be obtained.
【0011】一方、本発明の薄膜磁気ヘッドの製造方法
によれば、コイル層を形成する工程の前後に複数回に分
けてフォトレジストを露光して絶縁層を形成し、各回に
おける絶縁層のパターニングを行う際に、フォトマスク
と基板との距離を増加させつつ基板上に塗布されたフォ
トレジストを露光するので、基板の位置がレンズの焦点
からずれ、レンズの焦点に近い位置に基板を設置した場
合に比較してフォトマスクのパターンがぼけて露光され
る。そのため、基板に垂直な方向における露光されたフ
ォトレジストの端部の基板に対する角度が小さくなる。
さらに、フォトマスクと基板との距離を増加させ、基板
を光源から遠ざけるようにして露光することにより、フ
ォトマスクのパターンのぼけが大きくなり、さらにフォ
トレジストの端部の基板に対する角度が徐々に小さくな
る。特に、フォトレジストの厚さを3μm以上とし、フ
ォトマスクと基板との距離を100μm以上にして露光
した場合、一層の絶縁層の端部の傾斜角度を15度以下
の角度で再現良く制御することが可能になる。
On the other hand, according to the method of manufacturing the thin-film magnetic head of the present invention, the photoresist is exposed in plural times before and after the step of forming the coil layer to form the insulating layer, and the insulating layer is patterned at each time. When performing, since the photoresist coated on the substrate is exposed while increasing the distance between the photomask and the substrate, the position of the substrate deviates from the focus of the lens, and the substrate is placed at a position close to the focus of the lens. Compared to the case, the pattern of the photomask is blurred and exposed. Therefore, the angle of the end portion of the exposed photoresist with respect to the substrate in the direction perpendicular to the substrate becomes small.
Furthermore, by increasing the distance between the photomask and the substrate and exposing the substrate away from the light source, the blur of the pattern of the photomask becomes large, and the angle of the edge of the photoresist with respect to the substrate gradually decreases. Become. Especially, when the photoresist is exposed to a thickness of 3 μm or more and the distance between the photomask and the substrate is 100 μm or more, the inclination angle of the end portion of one insulating layer should be controlled with good reproducibility at an angle of 15 ° or less. Will be possible.
【0012】また、本発明の露光装置によれば、光源か
らの光をレンズによりフォトマスク上に照射し、フォト
マスクから所定の距離だけ離れた位置にある基板上に塗
布された所定厚のフォトレジストを露光してパターニン
グを行い、露光中にフォトマスクと基板との距離を増加
させ、基板に垂直な方向におけるフォトレジストの端部
の基板に対する傾斜角度を制御するので、この装置を上
記薄膜磁気ヘッドの製造方法に用いることにより、上記
構成を有する薄膜磁気ヘッドを容易に製作することが可
能となる。
Further, according to the exposure apparatus of the present invention, the light from the light source is irradiated onto the photomask by the lens, and the photomask of a predetermined thickness is applied on the substrate located at a predetermined distance from the photomask. The resist is exposed to patterning, the distance between the photomask and the substrate is increased during the exposure, and the inclination angle of the edge of the photoresist with respect to the substrate in the direction perpendicular to the substrate is controlled. By using the method for manufacturing the head, it becomes possible to easily manufacture the thin film magnetic head having the above structure.
【0013】また、この露光装置及び薄膜磁気ヘッドの
製造方法を用いることにより、複数回に分けて形成した
各絶縁層の端部の位置が一致し、各絶縁層の接合部分に
段差がなくなり、かつ基板に垂直な方向における、全体
としての絶縁層の端部の基板に対する傾斜角度を30度
から40度の範囲で任意の角度に制御した薄膜磁気ヘッ
ドを製造することが可能となる。また、複数回に分けて
形成した各絶縁層の端部基板に対する傾斜角度をそれぞ
れ15度以下にすることが可能となる。このため、従来
の薄膜磁気ヘッドと比較して、複数回に分けて形成した
各絶縁層の端部の位置のずれを大幅に少なくすることが
可能となり、膜剥離の不良率が低下し記録再生効率が非
常に高い薄膜磁気ヘッドが得られる。
Further, by using this exposure apparatus and the method of manufacturing a thin film magnetic head, the positions of the end portions of the insulating layers formed separately in a plurality of times coincide with each other, and there is no step at the joint portion of each insulating layer. Further, it is possible to manufacture a thin film magnetic head in which the inclination angle of the end portion of the insulating layer as a whole in the direction perpendicular to the substrate is controlled to an arbitrary angle within the range of 30 ° to 40 °. Further, the inclination angle of each insulating layer formed in a plurality of times with respect to the end substrate can be set to 15 degrees or less. Therefore, compared to the conventional thin-film magnetic head, it is possible to significantly reduce the positional deviation of the end portion of each insulating layer formed in multiple times, and the defective rate of film peeling is reduced, resulting in recording / reproducing. A thin film magnetic head having a very high efficiency can be obtained.
【0014】[0014]
【実施例】本発明の薄膜磁気ヘッドの製造方法及び露光
装置の好適な一実施例を図1を参照しつつ説明する。図
1は本発明の露光装置の一実施例構成を示す図である。
図1において、本実施例の露光装置は、光源12と、光
源12からの光を平行光にするコリメータ−レンズ13
と、ミラー14と、平行光を集光するためのコンデンサ
ーレンズ15と、露光パターンを有するフォトマスク1
6と、基板18を光軸方向に上下動させるテーブル19
とを具備する。光源12には紫外線ランプを用いた。光
源12から出力された光はコリメーターレンズ15によ
り平行光にされ、ミラー14で反射され、コンデンサー
レンズ15に入射する。コンデンサーレンズ15を通過
した光は、フォトマスク16を通過し、コンデンサーレ
ンズ15の焦点の位置に設置した基板18上のフォトレ
ジスト17を露光する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of a method of manufacturing a thin film magnetic head and an exposure apparatus of the present invention will be described with reference to FIG. FIG. 1 is a view showing the arrangement of an embodiment of the exposure apparatus of the present invention.
In FIG. 1, the exposure apparatus of this embodiment includes a light source 12 and a collimator lens 13 for collimating the light from the light source 12 into parallel light.
, A mirror 14, a condenser lens 15 for collecting parallel light, and a photomask 1 having an exposure pattern
6 and a table 19 for moving the substrate 18 up and down in the optical axis direction.
And. An ultraviolet lamp was used as the light source 12. The light output from the light source 12 is collimated by the collimator lens 15, is reflected by the mirror 14, and is incident on the condenser lens 15. The light passing through the condenser lens 15 passes through the photomask 16 and exposes the photoresist 17 on the substrate 18 placed at the focal point of the condenser lens 15.
【0015】まず、基板18の表面にポジ系フォトレジ
スト17を塗布し、フォトマスク16と基板18との距
離Zを30μm程度に設定する。この状態で基板18と
フォトマスク16の位置合わせを行い、その後距離Zを
50μm以上にして露光を行った。その後現像を行い、
100℃以上の温度で1時間以上電気炉中で焼成を行っ
た。距離Zを50μm以上にしたため、基板18がコリ
メーターレンズ15の焦点からずれ、フォトマスク16
からの散乱光がフォトレジスト17を照射し、フォトマ
スク16のパターンがぼけて露光され、基板に垂直な方
向におけるフォトレジスト17の端部の基板に対する傾
斜角度が小さくなった。また、焼成後のフォトレジスト
17は焼成中に収縮するため、その端部の傾斜角度は焼
成前に比較して小さくなるが、焼成条件と塗布厚を制御
することにより、再現良くフォトレジストの角度を制御
することができた。
First, a positive photoresist 17 is applied to the surface of the substrate 18, and the distance Z between the photomask 16 and the substrate 18 is set to about 30 μm. In this state, the substrate 18 and the photomask 16 were aligned with each other, and then exposure was performed with the distance Z set to 50 μm or more. Then develop it,
Firing was performed in an electric furnace at a temperature of 100 ° C. or higher for 1 hour or longer. Since the distance Z is set to 50 μm or more, the substrate 18 is displaced from the focus of the collimator lens 15, and the photomask 16
The scattered light from irradiates the photoresist 17 so that the pattern of the photomask 16 is blurred and exposed, and the inclination angle of the end portion of the photoresist 17 with respect to the substrate in the direction perpendicular to the substrate is reduced. Further, since the photoresist 17 after baking shrinks during baking, the inclination angle of its end becomes smaller than that before baking, but by controlling the baking conditions and the coating thickness, the angle of the photoresist can be reproduced with good reproducibility. Could be controlled.
【0016】ポジ系フォトレジスト17の厚さをそれぞ
れ3μm、4μm、及び6μmとし、180℃で2時間
焼成して得られたフォトレジスト17の端部の基板に対
する傾斜角度σと、フォトマスク16と基板18との距
離Zとの関係を図3に示す。フォトレジスト17の厚さ
が3μmの場合、距離Zが100μmの時、σが15度
であった。また、距離Zが200μmの時、σが約5度
であった。一方、フォトレジスト17の厚さが4μmの
場合、距離Zが100μmの時、σが18度であった。
また、距離Zが130μm以上の時にσが15度以下に
なった。さらに、フォトレジスト17の厚さが6μmの
場合、距離Zが100μmの時、σが24度でった。ま
た、距離Zが180μm以上の時にσが15度以下にな
った。以上のように、本発明の露光装置を用いて実験し
たフォトレジスト17の厚さが少なくとも3μmから6
μmの場合、15度以下のフォトレジスト17の端部の
傾斜角度が得られることがわかった。
The thickness of the positive photoresist 17 is set to 3 μm, 4 μm, and 6 μm, respectively, and the inclination angle σ of the end portion of the photoresist 17 obtained by firing at 180 ° C. for 2 hours with respect to the substrate and the photomask 16 are obtained. The relationship with the distance Z from the substrate 18 is shown in FIG. When the thickness of the photoresist 17 was 3 μm, when the distance Z was 100 μm, σ was 15 degrees. When the distance Z was 200 μm, σ was about 5 degrees. On the other hand, when the thickness of the photoresist 17 is 4 μm, when the distance Z is 100 μm, σ is 18 degrees.
Further, when the distance Z is 130 μm or more, σ becomes 15 degrees or less. Further, when the thickness of the photoresist 17 is 6 μm, when the distance Z is 100 μm, σ is 24 degrees. Further, when the distance Z is 180 μm or more, σ becomes 15 degrees or less. As described above, the thickness of the photoresist 17 tested using the exposure apparatus of the present invention is at least 3 μm to 6 μm.
It has been found that, in the case of μm, an inclination angle of the end portion of the photoresist 17 of 15 degrees or less can be obtained.
【0017】上記本発明の薄膜磁気ヘッドの製造方法を
用いて製作した薄膜磁気ヘッドの一実施例の構成を、そ
のトラック部付近の断面拡大図である図3に示す。図3
において、例えばAl23−TiC等のセラミック基板
1の上には、パーマロイ等の下部磁性層2及びAl23
等のギャップ層3が積層されている。ギャップ層3の上
には、トラック部10を除き、フォトレジストを焼成し
た第1及び第2の絶縁層40a及び40bに分割された
絶縁層40が形成され、さらに絶縁層40の上には、パ
ーマロイ等の上部磁性層7およびAl23等の保護層8
が順次積層されている。また、周囲を絶縁層40で囲ま
れるように複数のコイル層5が設けられている。
The construction of one embodiment of the thin film magnetic head manufactured by the method for manufacturing a thin film magnetic head of the present invention is shown in FIG. Figure 3
In the above, on the ceramic substrate 1 made of, for example, Al 2 O 3 —TiC, the lower magnetic layer 2 made of permalloy and the Al 2 O 3 are made.
Gap layers 3 of the same type are laminated. An insulating layer 40 is formed on the gap layer 3 except for the track portion 10 and is divided into first and second insulating layers 40a and 40b obtained by baking a photoresist, and further on the insulating layer 40, Upper magnetic layer 7 such as permalloy and protective layer 8 such as Al 2 O 3
Are sequentially stacked. Further, the plurality of coil layers 5 are provided so that the periphery thereof is surrounded by the insulating layer 40.
【0018】図7に示した従来例と異なる点は、第1の
絶縁層40aの端部8と第2の絶縁層40bの端部9の
位置は一致していたことである。また、第1の絶縁層4
0aの傾斜角度θと第2の絶縁層40bの系や角度θ’
を13度から23度まで変化させ、第1及び第2の絶縁
層40a及び40bの合計の傾斜角度γを26度から4
6度まで変化した場合における、傾斜角度γとこのヘッ
ドの規格化出力の相対値の関係を図4に示す。図4によ
ると、傾斜角度γが30度から40度の範囲において規
格化出力が相対的に高いことがわかる。
The difference from the conventional example shown in FIG. 7 is that the positions of the end 8 of the first insulating layer 40a and the end 9 of the second insulating layer 40b are the same. In addition, the first insulating layer 4
The inclination angle θ of 0a and the system and angle θ ′ of the second insulating layer 40b
Is changed from 13 degrees to 23 degrees, and the total inclination angle γ of the first and second insulating layers 40a and 40b is changed from 26 degrees to 4 degrees.
FIG. 4 shows the relationship between the inclination angle γ and the relative value of the normalized output of this head when the head angle is changed up to 6 degrees. It can be seen from FIG. 4 that the normalized output is relatively high in the range of the inclination angle γ of 30 degrees to 40 degrees.
【0019】上記本発明の薄膜磁気ヘッドの製造方法を
用いて製作した薄膜磁気ヘッドの別の実施例の構成を、
そのトラック部付近の断面拡大図である図5に示す。図
5において、第1の絶縁層40aの端部8と第2の絶縁
層40bの端部9の位置が距離Xだけずれている。第1
の絶縁層40aの傾斜角度θ及び第2の絶縁層40bの
傾斜角度θ’は共に15度以下である。第1及び第2の
絶縁層40a及び40bの合計の傾斜角度βは30度以
下である。距離Xとこのヘッドの規格化出力の関係を図
6に示す。図6によると距離Xが小さくなるほど、規格
化出力の相対値が高いことがわかる。
The structure of another embodiment of the thin-film magnetic head manufactured by using the method for manufacturing a thin-film magnetic head of the present invention described above,
FIG. 5 is an enlarged sectional view of the vicinity of the track portion. In FIG. 5, the positions of the end portion 8 of the first insulating layer 40a and the end portion 9 of the second insulating layer 40b are displaced by the distance X. First
The inclination angle θ of the insulating layer 40a and the inclination angle θ ′ of the second insulating layer 40b are both 15 degrees or less. The total inclination angle β of the first and second insulating layers 40a and 40b is 30 degrees or less. The relationship between the distance X and the standardized output of this head is shown in FIG. According to FIG. 6, the smaller the distance X is, the higher the relative value of the standardized output is.
【0020】[0020]
【発明の効果】以上のように、本発明の薄膜磁気ヘッド
によれば、絶縁層を複数回に分けて形成し、各回ごとに
形成される絶縁層の端部の位置が一致するように構成し
たので、従来例に見られたような各回ごとに形成された
絶縁層の端部の位置のずれはなく、各絶縁層の接合部分
に段差が生じない。そのため、これらの上に積層される
上部磁性層の断面形状も折れ曲がることはなく、なめら
かな形状となり、段差部分の応力集中による磁性膜の剥
離や磁区構造の乱れによる薄膜磁気ヘッドの記録再生効
率の低下が発生しない。また、複数回(例えば2回)に
分けて形成された各絶縁層の端部の基板に対する傾斜角
度がそれぞれ15度以下であるように構成することによ
り、基板に垂直な方向における全体としての絶縁層の端
部の基板に対する傾斜角度が30度から40度の範囲と
なり、優れた磁気ヘッド特性が得られる。さらに、絶縁
層を基板上に塗布したフォトレジストを露光して形成す
るように構成することにより、本発明の薄膜磁気ヘッド
の製造方法及び露光装置を用いて、容易に端部の基板に
対する傾斜角度を任意の角度に制御することが可能とな
る。特に、フォトレジストの厚さを少なくとも3μm以
上とすることにより、15度以下の絶縁層の端部の基板
に対する傾斜角度が得られる。
As described above, according to the thin film magnetic head of the present invention, the insulating layer is formed by dividing it into a plurality of times, and the positions of the end portions of the insulating layer formed at each time are the same. Therefore, the position of the end portion of the insulating layer formed every time as in the conventional example is not displaced, and no step is formed in the joint portion of each insulating layer. Therefore, the cross-sectional shape of the upper magnetic layer laminated on them does not bend and becomes a smooth shape, and the recording and reproducing efficiency of the thin film magnetic head due to the peeling of the magnetic film due to the stress concentration at the step portion and the disorder of the magnetic domain structure No decrease occurs. In addition, by configuring the inclination angle of the end portion of each insulating layer formed a plurality of times (for example, twice) with respect to the substrate to be 15 degrees or less, the insulation of the whole in the direction perpendicular to the substrate is achieved. The inclination angle of the end of the layer with respect to the substrate is in the range of 30 to 40 degrees, and excellent magnetic head characteristics are obtained. Further, by forming the insulating layer by exposing a photoresist applied on the substrate by exposure, it is possible to easily use the thin film magnetic head manufacturing method and the exposure apparatus of the present invention to easily incline the tilt angle of the end portion with respect to the substrate. Can be controlled to an arbitrary angle. In particular, by setting the thickness of the photoresist to at least 3 μm or more, the inclination angle of the end portion of the insulating layer with respect to the substrate of 15 degrees or less can be obtained.
【0021】一方、本発明の薄膜磁気ヘッドの製造方法
によれば、コイル層を形成する工程の前後に複数回に分
けてフォトレジストを露光して絶縁層を形成し、各回に
おける絶縁層のパターニングを行う際に、フォトマスク
と基板との距離を増加させつつ基板上に塗布されたフォ
トレジストを露光するので、基板の位置がレンズの焦点
からずれ、レンズの焦点に近い位置に基板を設置した場
合に比較してフォトマスクのパターンがぼけて露光さ
れ、基板に垂直な方向における露光されたフォトレジス
トの端部の基板に対する角度を小さくすることができ
る。さらに、フォトマスクと基板との距離を増加させ、
基板を光源から遠ざけるようにして露光することによ
り、フォトマスクのパターンのぼけが大きくなり、さら
にフォトレジストの端部の基板に対する角度を徐々に小
さくすることができる。特に、フォトレジストの厚さを
3μm以上とし、フォトマスクと基板との距離を100
μm以上にして露光した場合、一層の絶縁層の端部の傾
斜角度を15度以下の角度で再現良く制御することが可
能になる。
On the other hand, according to the method of manufacturing the thin-film magnetic head of the present invention, the photoresist is exposed in plural times before and after the step of forming the coil layer to form the insulating layer, and the insulating layer is patterned at each time. When performing, since the photoresist coated on the substrate is exposed while increasing the distance between the photomask and the substrate, the position of the substrate deviates from the focus of the lens, and the substrate is placed at a position close to the focus of the lens. Compared with the case, the pattern of the photomask is blurred and exposed, and the angle of the edge of the exposed photoresist with respect to the substrate in the direction perpendicular to the substrate can be reduced. Furthermore, increasing the distance between the photomask and the substrate,
By exposing the substrate away from the light source, the blur of the pattern of the photomask becomes large, and the angle of the end portion of the photoresist with respect to the substrate can be gradually decreased. In particular, the thickness of the photoresist is 3 μm or more, and the distance between the photomask and the substrate is 100
When the exposure is performed with a thickness of μm or more, it becomes possible to control the inclination angle of the end portion of one insulating layer with an angle of 15 degrees or less with good reproducibility.
【0022】また、本発明の露光装置によれば、光源か
らの光をレンズによりフォトマスク上に照射し、フォト
マスクから所定の距離だけ離れた位置にある基板上に塗
布された所定厚のフォトレジストを露光してパターニン
グを行い、露光中にフォトマスクと基板との距離を増加
させ、基板に垂直な方向におけるフォトレジストの端部
の基板に対する傾斜角度を制御するので、この装置を上
記薄膜磁気ヘッドの製造方法に用いることにより、上記
構成を有する薄膜磁気ヘッドを容易に製作することが可
能となる。
Further, according to the exposure apparatus of the present invention, the light from the light source is irradiated onto the photomask by the lens, and the photomask having a predetermined thickness is applied onto the substrate located at a predetermined distance from the photomask. The resist is exposed to patterning, the distance between the photomask and the substrate is increased during the exposure, and the inclination angle of the edge of the photoresist with respect to the substrate in the direction perpendicular to the substrate is controlled. By using the method for manufacturing the head, it becomes possible to easily manufacture the thin film magnetic head having the above structure.
【0023】また、この露光装置及び薄膜磁気ヘッドの
製造方法を用いることにより、複数回に分けて形成した
各絶縁層の端部の位置が一致し、各絶縁層の接合部分に
段差がなくなり、かつ基板に垂直な方向における、全体
としての絶縁層の端部の基板に対する傾斜角度を30度
から40度の範囲で任意の角度に制御した薄膜磁気ヘッ
ドを製造することが可能となる。また、複数回に分けて
形成した各絶縁層の端部基板に対する傾斜角度をそれぞ
れ15度以下にすることが可能となる。このため、従来
の薄膜磁気ヘッドと比較して、複数回に分けて形成した
各絶縁層の端部の位置のずれを大幅に少なくすることが
可能となり、膜剥離の不良率が低下し記録再生効率が非
常に高い薄膜磁気ヘッドが得られる。
Further, by using this exposure apparatus and the method of manufacturing the thin film magnetic head, the positions of the end portions of the insulating layers formed in a plurality of times are aligned with each other, and there is no step at the joint portion of each insulating layer. Further, it is possible to manufacture a thin film magnetic head in which the inclination angle of the end portion of the insulating layer as a whole in the direction perpendicular to the substrate is controlled to an arbitrary angle within the range of 30 ° to 40 °. Further, the inclination angle of each insulating layer formed in a plurality of times with respect to the end substrate can be set to 15 degrees or less. Therefore, compared to the conventional thin-film magnetic head, it is possible to significantly reduce the positional deviation of the end portion of each insulating layer formed in multiple times, and the defective rate of film peeling is reduced, resulting in recording / reproducing. A thin film magnetic head having a very high efficiency can be obtained.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明の露光装置の一実施例の構成を示す図FIG. 1 is a diagram showing a configuration of an embodiment of an exposure apparatus of the present invention.
【図2】本発明の薄膜磁気ヘッドの製造方法によるフォ
トレジストの端部の傾斜角度σとフォトマスクと基板と
の間の距離Zの関係を示す図
FIG. 2 is a diagram showing a relationship between a tilt angle σ of an end portion of a photoresist and a distance Z between a photomask and a substrate according to the method of manufacturing a thin film magnetic head of the invention.
【図3】本発明の薄膜磁気ヘッドの一実施例のトラック
部付近の構成を示す断面拡大図
FIG. 3 is an enlarged cross-sectional view showing a configuration near a track portion of an embodiment of the thin film magnetic head of the present invention.
【図4】上記一実施例における薄膜磁気ヘッドの傾斜角
度と規格化出力の相対値の関係を示す図
FIG. 4 is a diagram showing a relationship between a tilt angle of a thin-film magnetic head and a relative value of standardized output in the above-mentioned embodiment.
【図5】本発明の薄膜磁気ヘッドの別の実施例のトラッ
ク部付近の構成を示す断面拡大図
FIG. 5 is an enlarged cross-sectional view showing the structure in the vicinity of the track portion of another embodiment of the thin film magnetic head of the present invention.
【図6】上記別の実施例における薄膜磁気ヘッドの絶縁
層のずれと規格化出力の相対値の関係を示す図
FIG. 6 is a diagram showing a relationship between a deviation of an insulating layer of a thin film magnetic head and a relative value of a standardized output in the another embodiment.
【図7】従来の薄膜磁気ヘッドのトラック部付近の構成
を示す断面拡大図
FIG. 7 is an enlarged cross-sectional view showing a configuration near a track portion of a conventional thin film magnetic head.
【符号の説明】[Explanation of symbols]
1 :基板 2 :下部磁性層 3 :ギャップ層 4 :絶縁層 4a:第1の絶縁層 4b:第2の絶縁層 5 :コイル層 6 :上部磁性層 7 :保護層 8 :第1の絶縁層の端部 9 :第2の絶縁層の端部 10 :トラック部 12 :光源 13 :コリメーターレンズ 14 :ミラー 15 :コンデンサーレンズ 16 :フォトマスク 17 :フォトレジスト 18 :基板 19 :テーブル 40 :絶縁層 40a:第1の絶縁層 40b:第2の絶縁層 1: Substrate 2: Lower magnetic layer 3: Gap layer 4: Insulating layer 4a: First insulating layer 4b: Second insulating layer 5: Coil layer 6: Upper magnetic layer 7: Protective layer 8: First insulating layer End part 9: End part of second insulating layer 10: Track part 12: Light source 13: Collimator lens 14: Mirror 15: Condenser lens 16: Photomask 17: Photoresist 18: Substrate 19: Table 40: Insulating layer 40a: 1st insulating layer 40b: 2nd insulating layer

Claims (10)

    【特許請求の範囲】[Claims]
  1. 【請求項1】 基板上に下部磁性層、ギャップ層、上下
    を絶縁層で挟まれた複数のコイル層、上部磁性層及び保
    護層を順次積層した構造を有する薄膜磁気ヘッドであっ
    て、基板に垂直な方向における絶縁層の端部の基板に対
    する傾斜角度が30度から40度の範囲にあり、絶縁層
    は複数回に分けて形成され、各回ごとに形成された絶縁
    層の端部の位置が一致している薄膜磁気ヘッド。
    1. A thin film magnetic head having a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiched between insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate, the thin film magnetic head comprising: The angle of inclination of the edge of the insulating layer with respect to the substrate in the vertical direction is in the range of 30 degrees to 40 degrees, the insulating layer is formed in multiple times, and the position of the edge of the insulating layer formed in each time is Matching thin film magnetic head.
  2. 【請求項2】 基板上に下部磁性層、ギャップ層、上下
    を絶縁層で挟まれた複数のコイル層、上部磁性層及び保
    護層を順次積層した構造を有する薄膜磁気ヘッドであっ
    て、基板に垂直な方向における絶縁層の端部の基板に対
    する傾斜角度が30度から40度の範囲にあり、絶縁層
    は複数回に分けて形成され、各回ごとに形成された絶縁
    層の端部の基板に対する傾斜角度がそれぞれ15度以下
    である薄膜磁気ヘッド。
    2. A thin film magnetic head having a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiching insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate, The inclination angle of the end portion of the insulating layer with respect to the substrate in the vertical direction is in the range of 30 to 40 degrees, the insulating layer is formed in a plurality of times, and the end portion of the insulating layer with respect to the substrate is formed in each time. A thin film magnetic head having an inclination angle of 15 degrees or less.
  3. 【請求項3】 基板上に下部磁性層、ギャップ層、上下
    を絶縁層で挟まれた複数のコイル層、上部磁性層及び保
    護層を順次積層した構造を有する薄膜磁気ヘッドであっ
    て、基板に垂直な方向における絶縁層の端部の基板に対
    する傾斜角度が30度から40度の範囲にあり、絶縁層
    は複数回に分けて形成され、各回ごとに形成された絶縁
    層の端部の位置が一致し、かつ各回ごとに形成された絶
    縁層の端部の基板に対する傾斜角度がそれぞれ15度以
    下である薄膜磁気ヘッド。
    3. A thin film magnetic head having a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiched between insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate. The angle of inclination of the edge of the insulating layer with respect to the substrate in the vertical direction is in the range of 30 degrees to 40 degrees, the insulating layer is formed in multiple times, and the position of the edge of the insulating layer formed in each time is A thin-film magnetic head in which the inclination angles of the edges of the insulating layers that are matched and formed each time are 15 degrees or less with respect to the substrate.
  4. 【請求項4】 絶縁層は、基板上に塗布されたフォトレ
    ジストを露光して形成したものである請求項1、2又は
    3記載の薄膜磁気ヘッド。
    4. The thin film magnetic head according to claim 1, wherein the insulating layer is formed by exposing a photoresist coated on the substrate to light.
  5. 【請求項5】 フォトレジストは少なくとも3μmの厚
    さを有する請求項4記載の薄膜磁気ヘッド。
    5. The thin film magnetic head according to claim 4, wherein the photoresist has a thickness of at least 3 μm.
  6. 【請求項6】 基板上に下部磁性層、ギャップ層、上下
    を絶縁層で挟まれた複数のコイル層、上部磁性層及び保
    護層を順次積層した構造を有する薄膜磁気ヘッドの製造
    方法であって、コイル層を形成する工程の前後に複数回
    に分けてフォトレジストを露光し焼成して絶縁層を形成
    し、各回における絶縁層のパターニングを行う際に、フ
    ォトマスクと基板との距離を増加させつつ基板上に塗布
    されたフォトレジストを露光し、基板に垂直な方向にお
    けるフォトレジストの端部の基板に対する傾斜角度を制
    御する薄膜磁気ヘッドの製造方法。
    6. A method of manufacturing a thin film magnetic head having a structure in which a lower magnetic layer, a gap layer, a plurality of coil layers sandwiched by insulating layers above and below, an upper magnetic layer and a protective layer are sequentially laminated on a substrate. Before and after the step of forming the coil layer, the photoresist is exposed and baked plural times to form the insulating layer, and when the insulating layer is patterned at each time, the distance between the photomask and the substrate is increased. A method of manufacturing a thin film magnetic head, in which a photoresist applied on a substrate is exposed while controlling an inclination angle of an end portion of the photoresist in a direction perpendicular to the substrate with respect to the substrate.
  7. 【請求項7】 フォトレジストは少なくとも3μmの厚
    さを有し、フォトマスクと基板とは少なくとも100μ
    m離れている請求項6記載の薄膜磁気ヘッドの製造方
    法。
    7. The photoresist has a thickness of at least 3 μm, and the photomask and the substrate have at least 100 μm.
    The method of manufacturing a thin film magnetic head according to claim 6, wherein the thin film magnetic heads are separated from each other by m.
  8. 【請求項8】 フォトレジストの端部の基板に対する傾
    斜角度は15度以下である請求項6又は7記載の薄膜磁
    気ヘッドの製造方法。
    8. The method of manufacturing a thin film magnetic head according to claim 6, wherein an inclination angle of the end portion of the photoresist with respect to the substrate is 15 degrees or less.
  9. 【請求項9】 光源、レンズ及びフォトマスクを具備
    し、光源からの光をレンズによりフォトマスク上に集光
    し、フォトマスクから所定の距離だけ離れた位置にある
    基板上に塗布された所定厚のフォトレジストを露光して
    パターニングを行う露光装置であって、露光中にフォト
    マスクと基板との距離を増加させ、基板に垂直な方向に
    おけるフォトレジストの端部の基板に対する傾斜角度を
    制御する露光装置。
    9. A light source, a lens, and a photomask, the light from the light source is condensed on the photomask by the lens, and the predetermined thickness is applied on a substrate located at a predetermined distance from the photomask. Exposure device for exposing and patterning the photoresist of (1), which increases the distance between the photomask and the substrate during the exposure and controls the inclination angle of the end portion of the photoresist with respect to the substrate in the direction perpendicular to the substrate. apparatus.
  10. 【請求項10】 フォトレジストは少なくとも3μmの
    厚さを有し、フォトマスクと基板とは少なくとも100
    μm離れている請求項9記載の露光装置。
    10. The photoresist has a thickness of at least 3 μm, and the photomask and the substrate are at least 100.
    The exposure apparatus according to claim 9, wherein the exposure apparatuses are separated by μm.
JP10093894A 1994-05-16 1994-05-16 Thin film magnetic head, manufacture for thin film magnetic head and exposure device Pending JPH07311911A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10093894A JPH07311911A (en) 1994-05-16 1994-05-16 Thin film magnetic head, manufacture for thin film magnetic head and exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10093894A JPH07311911A (en) 1994-05-16 1994-05-16 Thin film magnetic head, manufacture for thin film magnetic head and exposure device

Publications (1)

Publication Number Publication Date
JPH07311911A true JPH07311911A (en) 1995-11-28

Family

ID=14287301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10093894A Pending JPH07311911A (en) 1994-05-16 1994-05-16 Thin film magnetic head, manufacture for thin film magnetic head and exposure device

Country Status (1)

Country Link
JP (1) JPH07311911A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6804088B1 (en) 1998-07-15 2004-10-12 Nec Corporation Thin film magnetic head, manufacturing method thereof and magnetic storage
US7640178B2 (en) 1999-04-22 2009-12-29 Ceats, Inc. System and method for selecting and reserving seats using a touch screen device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6804088B1 (en) 1998-07-15 2004-10-12 Nec Corporation Thin film magnetic head, manufacturing method thereof and magnetic storage
US7640178B2 (en) 1999-04-22 2009-12-29 Ceats, Inc. System and method for selecting and reserving seats using a touch screen device
US7657449B2 (en) 1999-04-22 2010-02-02 Ceats, Inc. System and method for selecting and reserving time slots for an appointment
US7660728B2 (en) 1999-04-22 2010-02-09 Ceats, Inc. System and method for selecting and reserving airline seats
US7660727B2 (en) 1999-04-22 2010-02-09 Ceats, Inc. System and method for selecting and reserving rooms at a venue
US7660729B2 (en) 1999-04-22 2010-02-09 Ceats, Inc. System and method for selecting and reserving airline seats
US7664663B2 (en) 1999-04-22 2010-02-16 Ceats, Inc. System and method for displaying airline seats
US7685009B2 (en) 1999-04-22 2010-03-23 Ceats, Inc. Individual location selection and reservation system
US7881954B2 (en) 1999-04-22 2011-02-01 Ceats, Inc. System and method for managing seat reservations
US7881953B2 (en) 1999-04-22 2011-02-01 Ceats, Inc. System and method for selecting and reserving airline seats
US7885839B2 (en) 1999-04-22 2011-02-08 Ceats, Inc. User interface for displaying travel information

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