JPH07261010A - Replica diffraction grating - Google Patents
Replica diffraction gratingInfo
- Publication number
- JPH07261010A JPH07261010A JP4817294A JP4817294A JPH07261010A JP H07261010 A JPH07261010 A JP H07261010A JP 4817294 A JP4817294 A JP 4817294A JP 4817294 A JP4817294 A JP 4817294A JP H07261010 A JPH07261010 A JP H07261010A
- Authority
- JP
- Japan
- Prior art keywords
- replica
- diffraction grating
- thin film
- substrate
- replica substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、超高真空中での分光な
どに利用されるレプリカ回折格子に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a replica diffraction grating used for spectroscopy in ultrahigh vacuum.
【0002】[0002]
【従来の技術】マスター回折格子から多くのレプリカを
作製して、回折格子(レプリカ回折格子)の量産を行う
手法は従来より行われており、その代表的な手法として
は次のものがある。2. Description of the Related Art A method of mass-producing diffraction gratings (replica diffraction gratings) by making many replicas from a master diffraction grating has been conventionally performed, and a typical method thereof is as follows.
【0003】すなわち、まず、ガラス基板にアルミニウ
ムなどの金属薄膜を蒸着し、該膜に格子溝を形成するこ
とによりマスター回折格子を製作する。このマスターを
母型として、その格子面に離形剤として薄く油膜を形成
し、その上に真空蒸着によりアルミニウム薄膜を形成し
た後、このアルミニウム薄膜上にレプリカ基板を接着剤
(耐熱性樹脂)を介して接着し、接着剤の硬化後、レプ
リカ基板を母型より剥離することによりアルミニウム薄
膜はレプリカ基板側に移り、レプリカ回折格子が得られ
る。ここで、用いられるレプリカ基板は、BK7,BS
C2,パイレックスガラス、ソーダガラスなどが一般的
である。That is, first, a master diffraction grating is manufactured by depositing a metal thin film such as aluminum on a glass substrate and forming a grating groove in the film. Using this master as a mold, a thin oil film is formed on the lattice surface as a release agent, and an aluminum thin film is formed on it by vacuum deposition, and then a replica substrate is applied with an adhesive (heat resistant resin) on this aluminum thin film. After the adhesive is cured and the adhesive is cured, the replica substrate is peeled from the mother die, whereby the aluminum thin film moves to the replica substrate side, and a replica diffraction grating is obtained. The replica substrate used here is BK7, BS.
C2, Pyrex glass, soda glass, etc. are common.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、従来の
レプリカ基板に用いている材質は、膨張係数が大きいた
め、入射光源や入射光自体により、回折格子の温度が上
昇し、基板が膨張することがあった。この基板の膨張
は、格子溝間隔の変化をもたらし、波長分散変化の原因
になっていた。そのため、状況によっては、波長校正を
やり直す必要や、分光器に温調を施す必要が生じ、装置
自体が大掛かりなものになる。However, since the material used for the conventional replica substrate has a large expansion coefficient, the temperature of the diffraction grating may rise and the substrate may expand due to the incident light source or the incident light itself. there were. The expansion of the substrate brings about a change in grating groove spacing, which causes a change in chromatic dispersion. Therefore, depending on the situation, it is necessary to recalibrate the wavelength or to adjust the temperature of the spectroscope, and the apparatus itself becomes large-scale.
【0005】また、大出力レーザ、真空紫外域等に用い
られる回折格子は、温度上昇に耐え、放射損傷を受けに
くいものである必要があるが、従来のレプリカ回折格子
では温度により格子溝間隔が変化したので、このような
分野には利用できなかった。Further, a diffraction grating used for a high-power laser, a vacuum ultraviolet region, etc. needs to be resistant to temperature rise and less susceptible to radiation damage. Because of the change, it was not available in these areas.
【0006】そこで、本発明は、前記課題がなく、安定
した分光の行えるレプリカ回折格子を提供することを目
的とする。Therefore, an object of the present invention is to provide a replica diffraction grating which does not have the above-mentioned problems and can perform stable spectroscopy.
【0007】[0007]
【課題を解決するための手段】本件発明は前記課題を解
決するため、マスター回折格子の格子面に金属薄膜を形
成し、該金属薄膜とレプリカ基板とを接着剤を介して圧
接した後剥離させ、該金属薄膜をレプリカ基板に反転接
着させてなるレプリカ回折格子において、前記レプリカ
基板を低膨脹率の材質で構成したことを特徴とする。In order to solve the above problems, the present invention forms a metal thin film on the grating surface of a master diffraction grating, press-contacts the metal thin film and a replica substrate with an adhesive, and then peels them off. In a replica diffraction grating in which the metal thin film is reverse-bonded to a replica substrate, the replica substrate is made of a material having a low expansion coefficient.
【0008】ここで、マスター回折格子とは、ガラス、
SiO2 などの無機材料基板に直接刻線を施すか、又は
基板にアルミニウムなどの金属薄膜を蒸着してそこに刻
線を施こしたものをいい、刻線を施こしたところが格子
面になる。刻線は、回折格子彫刻装置による機械刻線で
も、イオンビームエッチングによる刻線でも良い。Here, the master diffraction grating is glass,
An inorganic material such as SiO 2 is directly engraved on the substrate, or a metal thin film such as aluminum is vapor-deposited on the substrate and engraved on it. The engraved area becomes the lattice plane. . The engraved line may be a machine engraved line by a diffraction grating engraving device or an engraved line by ion beam etching.
【0009】金属薄膜としては、例えば、アルミニウ
ム、金、白金などの薄膜を挙げることができ、これら薄
膜は、マスター回折格子の格子面に例えば、真空蒸着に
より形成する。なお、金属薄膜を形成した後に、マスタ
ー回折格子の格子面に離形剤を塗布しておく。離形剤と
しては、例えば、シリコングリースなどを用いることが
できる。Examples of the metal thin film include thin films of aluminum, gold, platinum and the like, and these thin films are formed on the grating surface of the master diffraction grating by, for example, vacuum deposition. After forming the metal thin film, a release agent is applied to the grating surface of the master diffraction grating. As the release agent, for example, silicone grease or the like can be used.
【0010】レプリカ基板として用いる低膨張率の材質
としては、例えば、石英ガラス、ゼロデュア(SCHO
TT社製)、クリストロン(HOYA(株)製)のよう
な低膨張結晶ガラスを挙げることができる。As the material having a low coefficient of expansion used as the replica substrate, for example, quartz glass or zerodur (SCHO) is used.
Examples thereof include low expansion crystal glass such as TT Co., Ltd. and Cristlon (manufactured by HOYA Co., Ltd.).
【0011】金属薄膜とレプリカ基板とを接着させる接
着剤としては、尿素樹脂、メラミン樹脂、フェノール樹
脂、エポキシ樹脂などの熱硬化性樹脂、又は紫外線硬化
樹脂等を用いることができるが、熱歪の影響を少なくす
る目的で、可視光硬化樹脂を用いることもできる。特
に、可視光硬化樹脂を用いれば、紫外線硬化樹脂を用い
る際に必要な大掛かりな設備や操作時の事故(失明、や
けど)などの危険性がなくなる。また、紫外線硬化樹脂
では不可能であったcmオーダーの厚肉ガラスの接着が
可能となる。なお、可視光硬化樹脂としては、例えばB
ENEFIXVL((株)アーデル製)を挙げることがで
きるが、これに限定されない。As an adhesive for adhering the metal thin film and the replica substrate, a thermosetting resin such as urea resin, melamine resin, phenol resin, epoxy resin, or an ultraviolet curable resin can be used. A visible light curable resin may be used for the purpose of reducing the influence. In particular, the use of the visible light curable resin eliminates the risk of large-scale equipment required when using the ultraviolet curable resin and accidents (blindness, burns) during operation. Further, it is possible to bond thick glass on the order of cm, which was impossible with the ultraviolet curable resin. As the visible light curable resin, for example, B
ENEFIX VL (manufactured by Adel Co., Ltd.) can be mentioned, but the present invention is not limited thereto.
【0012】[0012]
【作用】本発明によれば、レプリカ基板に低膨張率の材
質を用いているので、温度変化に対して分散角が安定な
レプリカ回折格子が得られる。According to the present invention, since the replica substrate is made of a material having a low expansion coefficient, a replica diffraction grating having a stable dispersion angle with respect to temperature changes can be obtained.
【0013】[0013]
<レプリカ回折格子の製作>本発明のレプリカ回折格子
を製作する工程を図に基づいて説明する。<Production of Replica Diffraction Grating> A process of producing the replica diffraction grating of the present invention will be described with reference to the drawings.
【0014】先ず、平面ガラス基板1(石英ガラス:6
0mm×60mm×11.3mm)にフォトレジストO
FPR5000(東京応化製)を0.4μmコーティン
グし、そこにホログラフィック露光法(レーザー波長4
41.6nm)により格子溝(1200本/mm)を形
成する。その後、上記レジストパターンをマスクにして
イオンビーム・エッチングによりブレーズ角4度の溝断
面形状が鋸歯状になるようにし、その上にアルミニウム
薄膜(厚さ0.2μm)2を真空蒸着し、マスター回折
格子を製作する。この状態が図1(a)である。First, the flat glass substrate 1 (quartz glass: 6)
0mm x 60mm x 11.3mm) photoresist O
FPR5000 (manufactured by Tokyo Ohka Co., Ltd.) is coated to a thickness of 0.4 μm, and the holographic exposure method (laser wavelength 4
41.6 nm) to form lattice grooves (1200 / mm). Then, using the resist pattern as a mask, the cross-sectional shape of the groove with a blaze angle of 4 degrees is made into a sawtooth shape by ion beam etching, and an aluminum thin film (thickness 0.2 μm) 2 is vacuum-deposited on it, and the master diffraction Produce a lattice. This state is shown in FIG.
【0015】このマスター回折格子にシリコングリース
を離形剤として薄い油膜3(厚さ約1nm)を形成し、
その上にアルミニウム薄膜(厚さ0.2μm)4を真空
蒸着する。この状態が図1(b)である。A thin oil film 3 (thickness: about 1 nm) is formed on the master diffraction grating using silicon grease as a mold release agent.
An aluminum thin film (having a thickness of 0.2 μm) 4 is vacuum-deposited thereon. This state is shown in FIG.
【0016】次にレプリカ基板(石英ガラス;60mm
×60mm×11.3mm)6を用意し、その表面をフ
ロン113(或いはフレオン(三井・デュポンフロロケ
ミカル製)のどちらか)などで洗浄した後、接着剤(耐
熱性エポキシ樹脂)5を塗布する。そして、レプリカ基
板6と前述のマスター回折格子を接着させる。この状態
が図1(c)、(d)である。Next, a replica substrate (quartz glass; 60 mm)
X 60 mm x 11.3 mm) 6 is prepared, and the surface thereof is washed with Freon 113 (or either Freon (made by Mitsui DuPont Fluorochemical)) or the like, and then an adhesive (heat resistant epoxy resin) 5 is applied. . Then, the replica substrate 6 and the above-mentioned master diffraction grating are bonded. This state is shown in FIGS. 1 (c) and 1 (d).
【0017】接着硬化後、離形剤3を境にしてレプリカ
基板6を剥離すると(図1(e))、アルミニウム薄膜
4はレプリカ基板6に移り溝本数1200本/mmのレ
プリカ回折格子が作製される。このときの状態が図1
(f)である。After the adhesive is cured, the replica substrate 6 is peeled off with the release agent 3 as a boundary (FIG. 1 (e)), the aluminum thin film 4 is transferred to the replica substrate 6, and a replica diffraction grating having 1200 grooves / mm is produced. To be done. The state at this time is shown in Figure 1.
(F).
【0018】<温度による溝本数変化の測定>本発明の
レプリカ回折格子と基板がソーダ・ガラスであるレプリ
カ回折格子をハロゲンランプで加熱し、溝本数の変化を
測定した結果を表1に示す。なお、溝本数の測定は、H
e−Neレーザ光を回折格子に垂直に入射させ、1次回
折光がレーザに戻るように回折格子を回転させ、その回
転角をロータリエンコーダにより読み取ることによって
行った。また、温度測定は、レーザ光が当たっている回
折格子部分に熱電対をはりつけて測定した。<Measurement of Change in Number of Grooves with Temperature> Table 1 shows the results of measuring the change in the number of grooves by heating the replica diffraction grating of the present invention and the replica diffraction grating whose substrate is soda glass with a halogen lamp. In addition, the measurement of the number of grooves is H
The e-Ne laser light was made incident vertically on the diffraction grating, the diffraction grating was rotated so that the first-order diffracted light returned to the laser, and the rotation angle was read by a rotary encoder. The temperature was measured by attaching a thermocouple to the portion of the diffraction grating where the laser light was applied.
【0019】[0019]
【表1】 この表より、本発明のレプリカ回折格子によれば、温度
変化が生じても溝本数が変化しないのがわかる。[Table 1] From this table, it can be seen that the replica diffraction grating of the present invention does not change the number of grooves even if the temperature changes.
【0020】[0020]
【発明の効果】本発明によれば、温度変化に対して分散
角が安定なレプリカ回折格子が得られるので、どのよう
な温度でも安定した分光ができ、今まで測定できなかっ
た物理現象を発見できる。According to the present invention, since a replica diffraction grating having a stable dispersion angle with respect to temperature changes can be obtained, stable spectroscopy can be performed at any temperature, and a physical phenomenon that could not be measured until now was discovered. it can.
【0021】また、SR光のような強力なビームの分光
のような熱のかかる用途にも使用することができ、科学
技術の発展に貢献できる。It can also be used for heat-intensive applications such as spectroscopy of a strong beam such as SR light, which can contribute to the development of science and technology.
【図1】本発明のレプリカ回折格子を製作する工程図FIG. 1 is a process drawing of manufacturing a replica diffraction grating of the present invention.
1:ガラス基板 2:アルミニウム薄膜 3:離形剤 4:アルミニウム薄膜 5:接着剤 6:レプリカ基板 7:シリコングリース 1: Glass substrate 2: Aluminum thin film 3: Release agent 4: Aluminum thin film 5: Adhesive 6: Replica substrate 7: Silicon grease
Claims (2)
形成し、該金属薄膜とレプリカ基板とを接着剤を介して
圧接した後剥離させ、該金属薄膜をレプリカ基板に反転
接着させてなるレプリカ回折格子において、前記レプリ
カ基板を低膨脹率の材質で構成したことを特徴とするレ
プリカ回折格子。1. A replica obtained by forming a metal thin film on a grating surface of a master diffraction grating, press-contacting the metal thin film and a replica substrate with an adhesive, and then peeling the metal thin film and inverting and adhering the metal thin film to the replica substrate. In the diffraction grating, the replica diffraction grating, wherein the replica substrate is made of a material having a low expansion coefficient.
接着剤として可視光硬化樹脂を用いることを特徴とする
レプリカ回折格子。2. The replica diffraction grating according to claim 1, wherein
A replica diffraction grating using a visible light curable resin as an adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4817294A JPH07261010A (en) | 1994-03-18 | 1994-03-18 | Replica diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4817294A JPH07261010A (en) | 1994-03-18 | 1994-03-18 | Replica diffraction grating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07261010A true JPH07261010A (en) | 1995-10-13 |
Family
ID=12795982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4817294A Pending JPH07261010A (en) | 1994-03-18 | 1994-03-18 | Replica diffraction grating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07261010A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2779534A1 (en) * | 1998-06-09 | 1999-12-10 | Commissariat Energie Atomique | PROCESS FOR PRODUCING OPTICAL COMPONENTS BY REPLICATION |
JP2006084885A (en) * | 2004-09-17 | 2006-03-30 | Shimadzu Corp | Method for manufacturing replica grating |
JP2006098428A (en) * | 2004-09-28 | 2006-04-13 | Shimadzu Corp | Replica diffraction grating |
JP2006177994A (en) * | 2004-12-20 | 2006-07-06 | Shimadzu Corp | Replica optical element |
JP2007019481A (en) * | 2005-06-07 | 2007-01-25 | Fujifilm Holdings Corp | Structure for forming functional film pattern and method of manufacturing functional film |
JP2007199540A (en) * | 2006-01-30 | 2007-08-09 | Shimadzu Corp | Reflection-type replica photonic device |
JP2007233283A (en) * | 2006-03-03 | 2007-09-13 | Shimadzu Corp | Reflection-type diffraction grating |
JP2009031615A (en) * | 2007-07-30 | 2009-02-12 | Shimadzu Corp | Replica diffraction grating and manufacturing method thereof |
JP2009518674A (en) * | 2005-12-08 | 2009-05-07 | エシロール アンテルナシオナル (コンパニー ジェネラレ ドプテイク) | Method for transferring micron-scale pattern onto optical product, and optical product using the same |
JP2013092754A (en) * | 2011-10-06 | 2013-05-16 | Canon Inc | Echelle diffraction grating and manufacturing method thereof, and excimer laser and manufacturing method thereof |
US10405823B1 (en) | 2018-09-06 | 2019-09-10 | Shimadzu Corporation | Radiation imaging apparatus |
-
1994
- 1994-03-18 JP JP4817294A patent/JPH07261010A/en active Pending
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999064901A1 (en) * | 1998-06-09 | 1999-12-16 | Commissariat A L'energie Atomique | Method for making optical components by replication |
US6579477B1 (en) | 1998-06-09 | 2003-06-17 | Commissariat A L'energie Atomique | Method for making optical components by replication |
FR2779534A1 (en) * | 1998-06-09 | 1999-12-10 | Commissariat Energie Atomique | PROCESS FOR PRODUCING OPTICAL COMPONENTS BY REPLICATION |
US7501035B2 (en) | 2004-09-17 | 2009-03-10 | Shimadzu Corporation | Method of manufacturing replica diffraction grating |
JP2006084885A (en) * | 2004-09-17 | 2006-03-30 | Shimadzu Corp | Method for manufacturing replica grating |
JP2006098428A (en) * | 2004-09-28 | 2006-04-13 | Shimadzu Corp | Replica diffraction grating |
JP4576961B2 (en) * | 2004-09-28 | 2010-11-10 | 株式会社島津製作所 | Method for manufacturing replica diffraction grating |
JP2006177994A (en) * | 2004-12-20 | 2006-07-06 | Shimadzu Corp | Replica optical element |
JP2007019481A (en) * | 2005-06-07 | 2007-01-25 | Fujifilm Holdings Corp | Structure for forming functional film pattern and method of manufacturing functional film |
JP2009518674A (en) * | 2005-12-08 | 2009-05-07 | エシロール アンテルナシオナル (コンパニー ジェネラレ ドプテイク) | Method for transferring micron-scale pattern onto optical product, and optical product using the same |
JP2007199540A (en) * | 2006-01-30 | 2007-08-09 | Shimadzu Corp | Reflection-type replica photonic device |
JP2007233283A (en) * | 2006-03-03 | 2007-09-13 | Shimadzu Corp | Reflection-type diffraction grating |
JP2009031615A (en) * | 2007-07-30 | 2009-02-12 | Shimadzu Corp | Replica diffraction grating and manufacturing method thereof |
JP2013092754A (en) * | 2011-10-06 | 2013-05-16 | Canon Inc | Echelle diffraction grating and manufacturing method thereof, and excimer laser and manufacturing method thereof |
US10405823B1 (en) | 2018-09-06 | 2019-09-10 | Shimadzu Corporation | Radiation imaging apparatus |
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