JPH0719551B2 - Optical filter with electromagnetic wave shielding property - Google Patents
Optical filter with electromagnetic wave shielding propertyInfo
- Publication number
- JPH0719551B2 JPH0719551B2 JP60084662A JP8466285A JPH0719551B2 JP H0719551 B2 JPH0719551 B2 JP H0719551B2 JP 60084662 A JP60084662 A JP 60084662A JP 8466285 A JP8466285 A JP 8466285A JP H0719551 B2 JPH0719551 B2 JP H0719551B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical filter
- electromagnetic wave
- hard coat
- wave shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/89—Optical or photographic arrangements structurally combined or co-operating with the vessel
- H01J29/896—Anti-reflection means, e.g. eliminating glare due to ambient light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
- H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/89—Optical components associated with the vessel
- H01J2229/8913—Anti-reflection, anti-glare, viewing angle and contrast improving treatments or devices
- H01J2229/8918—Anti-reflection, anti-glare, viewing angle and contrast improving treatments or devices by using interference effects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/89—Optical components associated with the vessel
- H01J2229/8913—Anti-reflection, anti-glare, viewing angle and contrast improving treatments or devices
- H01J2229/8922—Apparatus attached to vessel and not integral therewith
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電磁波シールド性を有するプラスチック光学フ
ィルターに関する。さらに詳しくはディスプレイやテレ
ビのブラウン管などから発生する有害な電磁波を有効に
遮断することが可能な光学フィルターに関する。TECHNICAL FIELD The present invention relates to a plastic optical filter having an electromagnetic wave shielding property. More specifically, the present invention relates to an optical filter capable of effectively blocking harmful electromagnetic waves generated from a display or television cathode ray tube.
オフィスオートメーション機器、例えばワードプロセッ
サーや各種のコンピュータなどのディスプレイや、ゲー
ム器、テレビのブラウン管などからは有害な電磁波が多
量に発生しており、健康障害が指摘されたり、また他の
機器への障害が問題となっている。たとえばコンピュー
タに誤信号が入ったり、テレビとステレオを同時につけ
るとステレオから雑音が聞えることはしばしば見受けら
れる。Large amounts of harmful electromagnetic waves are emitted from office automation equipment such as displays of word processors and various computers, game consoles, and cathode ray tubes of televisions, which may cause health problems and damage other equipment. It's a problem. For example, it is often found that a computer has an erroneous signal, or noise is heard from the stereo when the TV and the stereo are turned on at the same time.
そこで従来よりかかる障害を取り除くため種々の改良が
なされてきた。その有効な手段は金属などの導電物で覆
うことである。たとえば細い繊維の表面にカーボンを粘
着させてメッシュ構造にしたものを貼りつけるとか、蝶
理株式会社の商品名“アイセーバー”のように、合わせ
ガラスの内部に金属細線を導入させたものがある。しか
しこれらの方法ではディスプレーから発生する光を透過
しない部分を生ずるので、ワードプロセッサーなどの使
用者にとっては見にくいという欠点を有していた。また
他の公知例としては、ガラス基材に対して導電物質を高
温蒸着した技術が提案されているが（特公昭49−18447
号公報）、この方法ではプラスチック基材は軟化あるい
は溶融するものが多く、また表面に傷がつき易いという
欠点を改良できず利用できないものであった。Therefore, various improvements have been made in the past to remove such obstacles. An effective means is to cover it with a conductor such as metal. For example, there is one in which carbon is adhered to the surface of a thin fiber to form a mesh structure, or a thin glass wire is introduced into the laminated glass as in the product name "Isaber" of Chori Co., Ltd. However, these methods have a drawback in that it is difficult for a user such as a word processor to see because a portion that does not transmit the light generated from the display is generated. As another known example, a technique of vapor-depositing a conductive material on a glass substrate at high temperature has been proposed (Japanese Patent Publication No. Sho 49-18447).
In this method, many plastic substrates are softened or melted by this method, and the drawback that the surface is easily scratched cannot be improved and cannot be used.
従ってプラスチックの透明板に対しては、その有効な技
術がなく、現在のところ全く改善がなされていないのが
現状である。Therefore, there is no effective technique for the transparent plate made of plastic, and no improvement has been made at present.
本発明は上記従来技術の欠点を改善する技術を提供す
る。すなわちプラスチックの光学フィルターであって
も、表層に導電層をコーティングすることにより電磁波
をシールドできる技術を提供する。さらには、表面硬度
の低いプラスチック材料であっても、表面にシリカ層を
設けて硬度を高め傷がつきにくい特性を付与する技術を
提供する。加えて、導電層のさらに表層に低屈折率の層
を設けることにより、反射防止機能を付与した技術を提
供する。The present invention provides a technique for remedying the above drawbacks of the prior art. That is, even with a plastic optical filter, there is provided a technique capable of shielding electromagnetic waves by coating a surface layer with a conductive layer. Further, a technique is provided in which a silica layer is provided on the surface of a plastic material having a low surface hardness to increase the hardness and to impart a property of being less likely to be scratched. In addition, a technique having an antireflection function is provided by providing a layer having a low refractive index on the surface layer of the conductive layer.
上記目的を達成するため本発明は下記の構成を有する。 In order to achieve the above object, the present invention has the following configurations.
プラスチック透明基材の両面に耐擦禍性を有するハード
コート層を設け、一方の面に導電層を設け、さらに該導
電層上に無機シリカ層を設け、さらにもう一方の面のハ
ードコート層上に、反射防止層を設けたことを特徴とす
る電磁波シールド性を有する光学フィルター。A hard coat layer having abrasion resistance is provided on both sides of a transparent plastic substrate, a conductive layer is provided on one side, an inorganic silica layer is further provided on the conductive layer, and a hard coat layer is provided on the other side. An optical filter having an electromagnetic wave shielding property, which is provided with an antireflection layer.
本発明においては、プラスチック透明基材の両面に耐擦
禍性を有するハードコート層を設けることがまず必要で
ある。ここでプラスチックとは、公知のいかなるもので
あってもよい。また透明基材とは、光が通過し得るもの
であればいかなるものであってもよい。ワードプロセッ
サーなどのディスプレーの前面に使用するものにあって
は、原着、または染色により可視光線透過率を25〜70％
としたものが好ましい。目の疲労を減少するためであ
る。また耐擦禍性を有するハードコート層とは、ポリオ
ルガノシロキサン、シリカ、アルミナなどの硬度の高い
コーティング層、またはアクリル成分を含む層をいう。
プラスチック製品の表面は一般に傷がつき易いので、こ
れを改良するため、及び表層にコートする電磁波シール
ド層のアンダーコートして密着性を高めるためである。
そして特に好ましくは、ハードコート層はメチルトリメ
トキシシラン、およびビニルトリエトキシシラン、また
はこれらの加水分解物をコーティングした後に加熱縮合
させたポリオルガノシロキサンである。In the present invention, it is first necessary to provide a hard coat layer having abrasion resistance on both sides of the plastic transparent substrate. Here, the plastic may be any known material. Further, the transparent substrate may be any as long as light can pass therethrough. For those used in front of displays such as word processors, visible light transmittance is 25 to 70% by dyeing or dyeing.
Are preferred. This is to reduce eye fatigue. The abrasion-resistant hard coat layer refers to a coating layer having high hardness such as polyorganosiloxane, silica, or alumina, or a layer containing an acrylic component.
This is because the surface of the plastic product is generally easily scratched, so that it is improved, and the electromagnetic wave shield layer coated on the surface layer is undercoated to enhance the adhesion.
And particularly preferably, the hard coat layer is polyorganosiloxane that is coated with methyltrimethoxysilane and vinyltriethoxysilane, or a hydrolyzate thereof and then heat-condensed.
そしてハードコート層の好ましい膜厚は、１〜10ミクロ
ン程度である。The preferable film thickness of the hard coat layer is about 1 to 10 μm.
またアクリル系ハードコート層とは、メタクリル酸など
のアクリル化合物と、ペンタエリスリトール、グリセリ
ンなどの多官能グリコールとのエステル化合物を架橋さ
せたものなどをいう。The acrylic hard coat layer refers to a layer obtained by crosslinking an acrylic compound such as methacrylic acid with an ester compound of a polyfunctional glycol such as pentaerythritol or glycerin.
次に本発明においては、前記のハードコート層の一方の
面の表層に導電層を設ける。電磁波を有効に遮断するた
めである。導電層としては、可視光線を透過し得るもの
であればいかなるものであってもよいが、好ましくは、
1n2O3（酸化インジウム）とSnO2（酸化スズ）との混合
物（以下ITOという。）である。導電性能が高く、電磁
波を有効に遮断でき、さらに可視光線を透過できるから
である。ITO層の膜厚はかかる効果を奏する程度であれ
ばいかなる厚さでもよいが、好ましくは100〜3000Åで
ある。3000Å以上ではひび割れの欠点を生じ易くなる。
かかるITO層はスパッタリング法でコーティングするこ
とができる。他の方法としては、150℃以下で酸素雰囲
気中、高周波放電によるプラズマを用いて蒸着し、同時
にイオン銃を用いてアシストする技術も採用することが
できる。Next, in the present invention, a conductive layer is provided on the surface layer on one surface of the hard coat layer. This is to effectively block electromagnetic waves. The conductive layer may be any as long as it can transmit visible light, but preferably,
It is a mixture of 1n 2 O 3 (indium oxide) and SnO 2 (tin oxide) (hereinafter referred to as ITO). This is because it has high conductivity, can effectively block electromagnetic waves, and can transmit visible light. The ITO layer may have any thickness as long as it exerts such an effect, but it is preferably 100 to 3000 Å. If it is more than 3000Å, crack defects are likely to occur.
Such an ITO layer can be coated by a sputtering method. As another method, it is also possible to employ a technique in which vapor deposition is performed using plasma by high-frequency discharge in an oxygen atmosphere at 150 ° C. or lower, and at the same time assist is performed using an ion gun.
次に本発明においては、前記導電層の表層に、無機シリ
カ層を設けることが必要である。導電層は一般に金属の
層からなるので屈折率が高く、例えば前記ITO層の屈折
率は約2.0である。しかしこれでは反射が高過ぎ、使用
者の目が疲れる。従って高い屈折率の導電層の表層に無
機シリカ層を設けることにより、反射防止機能を与える
ことが必要となるのである。Next, in the present invention, it is necessary to provide an inorganic silica layer on the surface layer of the conductive layer. Since the conductive layer is generally made of a metal layer, it has a high refractive index. For example, the ITO layer has a refractive index of about 2.0. However, this causes the reflection to be too high and tires the eyes of the user. Therefore, it is necessary to provide an antireflection function by providing an inorganic silica layer on the surface layer of the conductive layer having a high refractive index.
かかる無機シリカ層は、シリカをスパッタリング、ある
いは真空蒸着することにより得ることができる。膜厚は
可視光線を反射防止できる程度の厚さであればいかなる
厚さでもよい。Such an inorganic silica layer can be obtained by sputtering or vacuum depositing silica. The film thickness may be any thickness as long as it can prevent reflection of visible light.
本発明においては、上記の積層をプラスチック基材の１
面に設ける。反対面の傷付防止をするため、上記で説明
した第１層のハードコートを設け、さらにはハードコー
ト層の表面に反射防止層を設ける。In the present invention, the above-mentioned lamination is a plastic substrate.
Provide on the surface. In order to prevent scratches on the opposite surface, the hard coat of the first layer described above is provided, and further an antireflection layer is provided on the surface of the hard coat layer.
以下図面により説明する。This will be described below with reference to the drawings.
第１図は本発明の好ましい電磁波シールド性を有する光
学フィルターの１実施態様の断面を示す。プラスチック
透明基材１の上に耐擦禍性を有するハードコート層２を
設け、その表層に導電層３を設け、さらにその表層に前
記導電層の屈折率よりも低い屈折率の層４を設けたもの
である。そして反対面にも耐擦禍性を有するハードコー
ト層２′と反射防止層４′を設けたものである。FIG. 1 shows a cross section of one embodiment of an optical filter having a preferable electromagnetic wave shielding property of the present invention. A hard coat layer 2 having abrasion resistance is provided on a plastic transparent substrate 1, a conductive layer 3 is provided on the surface layer thereof, and a layer 4 having a refractive index lower than that of the conductive layer is provided on the surface layer. It is a thing. A hard coat layer 2'having anti-abrasive property and an antireflection layer 4'are also provided on the opposite surface.
本発明の電磁波シールド性を有する光学フィルターは、
テレビやディスプレーの画面などに好適に用いられる。The optical filter having electromagnetic wave shielding properties of the present invention,
It is suitably used for screens of televisions and displays.
以下実施例により説明する。 An example will be described below.
実施例１ 基材して市販のポリメタクリレート板（三菱レイヨン株
式会社製、商標“アクアライト"LN−084、グレー原着、
厚さ約2mm）を使用した。ハードコート用塗料として
は、特開昭59−114501号公報の実施例１の記載のとお
り、ビニルトリエトキシシラン氷酢酸で加水分解したも
のと、メチルトリエトキシシランを氷酢酸で加水分解し
たものを混合して用いた。この混合溶解物に硬化剤であ
る酢酸ナトリウムを加え、さらにシリコーン系表面平滑
剤を加えて塗料とした。Example 1 A commercially available polymethacrylate plate as a base material (trade name "Aqualite" LN-084, manufactured by Mitsubishi Rayon Co., Ltd., gray original coating,
A thickness of about 2 mm) was used. As the coating material for hard coat, as described in Example 1 of JP-A-59-114501, there are those hydrolyzed with vinyltriethoxysilane glacial acetic acid and those hydrolyzed with methyltriethoxysilane with glacial acetic acid. The mixture was used. Sodium acetate, which is a curing agent, was added to this mixed solution, and a silicone-based surface smoothing agent was further added to obtain a coating material.
この塗料を基材の表面に２ミクロンの厚さに塗布し、加
熱キュアした。This coating material was applied on the surface of the base material to a thickness of 2 μm and cured by heating.
次いでこのハードコート層の上に、導電層として、スパ
ッタリング法でIn2O3（酸化インジウム）とSnO2（酸化
スズ）との混合物をコーティングし、700Åの膜厚とし
た。スパッタリング法の条件は、特開昭60−32053号公
報の実施例７〜９に記載のされているとおり、インジウ
ム−錫合金（錫;10重量％）をターゲットとして、マグ
ネトロンスパッタ装置を用いて、アルゴンガスと酸素の
混合ガス（酸素30体積％）を導入しながら、１×10-3To
rrの圧力で行なった。Then, a mixture of In 2 O 3 (indium oxide) and SnO 2 (tin oxide) was coated on the hard coat layer as a conductive layer by a sputtering method to have a film thickness of 700 Å. The conditions of the sputtering method are as described in Examples 7 to 9 of JP-A-60-32053, using an indium-tin alloy (tin; 10% by weight) as a target and using a magnetron sputtering apparatus. While introducing a mixed gas of argon gas and oxygen (oxygen 30% by volume), 1 × 10 -3 To
It was performed at a pressure of rr.
次いで反射防止膜として、真空蒸着装置（真空機械工業
製BMC−800T型）を用いてEB法により、二酸化ケイ素膜
を形成した。膜厚は940Åであった。Then, as the antireflection film, a silicon dioxide film was formed by the EB method using a vacuum vapor deposition device (BMC-800T type manufactured by Vacuum Machine Industry Co., Ltd.). The film thickness was 940Å.
また基材の反対面には、上記のハードコート層を設け、
次に酸化アルミニウムと二酸化ケイ素膜を順次形成し
て、表面の硬度化と反射防止機能を付与した。Further, the above hard coat layer is provided on the opposite surface of the base material,
Next, an aluminum oxide film and a silicon dioxide film were sequentially formed to impart surface hardness and an antireflection function.
得られたプラスチックコーティングされた光透過板は、
周波数10GHzにおける電磁波の透過量は約10分の１に減
衰することができた。さらにこれをワードプロセッサー
の光学フィルターとして使用したところ、反射防止機能
に優れ、使用者の目が疲れない点において著るしい効果
があった。The resulting plastic coated light transmitting plate is
The amount of electromagnetic waves transmitted at a frequency of 10 GHz could be attenuated to about 1/10. Further, when it was used as an optical filter of a word processor, it had an excellent antireflection function and had a remarkable effect in that the user's eyes were not tired.
また表面の硬度が高く、傷のつきにくいものであった。Further, the surface had a high hardness and was not easily scratched.
実施例２ 実施例１において、基材の表面にハードーコート層を設
ける工程まで同一とし、次にアンダーコートとして約10
0Åの二酸化ケイ素膜をスパッタリング法で形成し、次
に実施例１と同様にスパッタリング法によるITO層（140
0Åの膜厚）と、その上に真空蒸着法により、二酸化ケ
イ素膜を形成した。Example 2 In Example 1, the steps up to the step of forming a hard coat layer on the surface of the substrate were the same, and then an undercoat of about 10 was used.
A 0Å silicon dioxide film is formed by a sputtering method, and then an ITO layer (140
A film thickness of 0Å), and a silicon dioxide film was formed thereon by the vacuum deposition method.
また基材の反対面は実施例１と同様にハードーコート層
を設けた上に、真空蒸着によってY2O3（λ/4）、TiO
2（λ/2）、SIO2（λ/4）の層を各々設けた。Further, on the opposite surface of the base material, a hard coat layer was provided in the same manner as in Example 1, and then Y 2 O 3 (λ / 4) and TiO 2 were formed by vacuum deposition.
2 (λ / 2) and SIO 2 (λ / 4) layers were provided, respectively.
得られたコーティングされた光透過板は、周波数10GHz
における電磁波の透過量は約22分の１に減衰することが
できた。さらにこれをワードプロセッサーの光学フィル
ターとして使用したところ、反射防止機能、表面の硬度
による傷のつきにくさは、実施例１のもの以上であっ
た。The resulting coated light transmitting plate has a frequency of 10 GHz.
The transmission amount of the electromagnetic wave in was able to be attenuated to about 1/22. Further, when this was used as an optical filter of a word processor, the antireflection function and the scratch resistance due to the hardness of the surface were more than those of Example 1.
実施例３ 実施例１において、ハードコートを有する基材として、
グレー色に原着した市販のポリメタクリレート板（三菱
レイヨン株式会社製、商標“アクアライト"AR、厚さ約2
mm）を使用した他は同一の処方により、表面にITO層を
設け、さらに反射防止膜を形成した。このものも実施例
１の透過板と同様に優れたものとなった。Example 3 In Example 1, as a substrate having a hard coat,
Commercially available gray polymethacrylate board (trade name "Aqualite" AR, manufactured by Mitsubishi Rayon Co., Ltd., thickness about 2
mm) was used, and an ITO layer was provided on the surface and an antireflection film was further formed by the same formulation. This was also excellent as was the transmission plate of Example 1.
本発明は上記のとおりの技術であるので、プラスチック
の光学フィルターであっても、表層に導電層をコーティ
ングすることにより電磁波をシールドでき、さらには、
表面硬度の低いプラスチック材料であっても、表面にハ
ードコート層を設けて硬度を高め傷がつきにくい特性を
付与することができる。加えて、導電層のさらに表層に
低屈折率の層を設けることにより、耐傷付防止性ととも
に反射防止機能をも付与することができ、全体として顕
著な効果を奏する発明である。Since the present invention is a technique as described above, even with a plastic optical filter, electromagnetic waves can be shielded by coating a conductive layer on the surface layer, and further,
Even a plastic material having a low surface hardness can be provided with a hard coat layer on the surface to increase the hardness and impart a property of being hard to be scratched. In addition, by providing a layer having a low refractive index on the surface layer of the conductive layer, it is possible to provide not only scratch resistance but also antireflection function, and it is an invention that exhibits a remarkable effect as a whole.
第１図は本発明の好ましい電磁波シールド性を有する光
学フィルターの１実施態様の断面を示す。 1;プラスチック透明基材、２、２′；耐擦禍性を有する
ハードコート層、3;導電層、４、４′；導電層の屈折率
よりも低い屈折率の層。FIG. 1 shows a cross section of one embodiment of an optical filter having a preferable electromagnetic wave shielding property of the present invention. 1; Plastic transparent substrate, 2 and 2 '; Scratch-resistant hard coat layer, 3; Conductive layer, 4 and 4'; Layers having a refractive index lower than that of the conductive layer.
Claims (5)
有するハードコート層を設け、一方の面に導電層を設
け、さらに該導電層上に無機シリカ層を設け、さらにも
う一方の面のハードコート層上に、反射防止層を設けた
ことを特徴とする電磁波シールド性を有する光学フィル
ター。1. A transparent plastic base material having hard coat layers having abrasion resistance provided on both surfaces thereof, a conductive layer provided on one surface thereof, and an inorganic silica layer provided on the conductive layer, and the other surface thereof. An optical filter having an electromagnetic wave shielding property, comprising an antireflection layer provided on the hard coat layer.
む層であることを特徴とする特許請求の範囲第（１）項
記載の電磁波シールド性を有する光学フィルター。2. The optical filter having an electromagnetic wave shielding property according to claim 1, wherein the conductive layer is a layer containing indium oxide and tin oxide.
含む層であることを特徴とする特許請求の範囲第（１）
項記載の電磁波シールド性を有する光学フィルター。3. The hard coat layer is a layer containing an organic polysiloxane, and the hard coat layer is a layer (1).
An optical filter having electromagnetic wave shielding properties according to the item.
特徴とする特許請求の範囲第（１）項記載の電磁波シー
ルド性を有する光学フィルター。4. The optical filter having an electromagnetic wave shielding property according to claim 1, wherein the transparent substrate is colored.
ることを特徴とする特許請求の範囲第（１）項記載の電
磁波シールド性を有する光学フィルター。5. An optical filter having an electromagnetic wave shielding property according to claim (1), wherein the film thickness of the conductive layer is in the range of 100 to 3000Å.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084662A JPH0719551B2 (en) | 1985-04-22 | 1985-04-22 | Optical filter with electromagnetic wave shielding property |
| US06/853,035 US4732454A (en) | 1985-04-22 | 1986-04-17 | Light-transmissible plate shielding electromagnetic waves |
| EP86302982A EP0200452B1 (en) | 1985-04-22 | 1986-04-21 | Light-transmissible plate shielding electromagnetic waves |
| DE3689989T DE3689989T2 (en) | 1985-04-22 | 1986-04-21 | Transparent electromagnetic screen. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084662A JPH0719551B2 (en) | 1985-04-22 | 1985-04-22 | Optical filter with electromagnetic wave shielding property |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61245449A JPS61245449A (en) | 1986-10-31 |
| JPH0719551B2 true JPH0719551B2 (en) | 1995-03-06 |
Family
ID=13836931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60084662A Expired - Fee Related JPH0719551B2 (en) | 1985-04-22 | 1985-04-22 | Optical filter with electromagnetic wave shielding property |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0200452B1 (en) |
| JP (1) | JPH0719551B2 (en) |
| DE (1) | DE3689989T2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6417619B1 (en) | 1997-04-10 | 2002-07-09 | Sumitomo Chemical Company, Limited | Front panel board for plasma display |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE450436B (en) * | 1986-10-03 | 1987-06-22 | Glasforskningsinstitutet | SCREEN WITH REDUCED ELECTROSTATIC FIELD AND SETS AND MEANS FOR PRODUCING THE SCREEN |
| GB8702357D0 (en) * | 1987-02-03 | 1987-03-11 | Pilkington Brothers Plc | Coated glass |
| JPH0637361Y2 (en) * | 1987-03-02 | 1994-09-28 | 東レ株式会社 | Antistatic multi-layer antireflection light transmission plate |
| JPS63280790A (en) * | 1987-05-13 | 1988-11-17 | Toray Ind Inc | Antistatic article |
| EP0301118A1 (en) * | 1987-07-29 | 1989-02-01 | Walter Lämmler | Radiation reduction device for CRT |
| JPH0262509U (en) * | 1988-10-28 | 1990-05-10 | ||
| US5051652A (en) * | 1988-12-06 | 1991-09-24 | Asahi Glass Company, Ltd. | Panel with anti-reflective multi-layered film thereon |
| SG42911A1 (en) * | 1990-11-21 | 1997-10-17 | Catalysts & Chem Ind Co | Coating solution for forming transparent conductive coating process for preparing same conductive substrateprocess for preparing same and (see file for full title) |
| FR2670981B1 (en) * | 1990-12-19 | 1993-04-16 | Clausse Georges | COMPOSITE FILTER WITH MORE THAN TWO USEFUL SURFACES FOR VISUALIZATION SCREEN. |
| FR2690041A1 (en) * | 1992-04-14 | 1993-10-15 | Clausse Georges | Shielding frame against electromagnetic fields emitted by CRT - has medium image filter for visualisation screen composed of magnetically permeable material. |
| FR2696277B1 (en) * | 1992-09-25 | 1994-10-28 | Thomson Csf | Display device with compromising low radiation screen. |
| JPH06130202A (en) * | 1992-10-15 | 1994-05-13 | Toray Ind Inc | Heat resistant optical resin plate |
| DE69620065T2 (en) * | 1995-07-06 | 2002-11-14 | Sony Corp | Electrically conductive, anti-reflective coating |
| JP3520627B2 (en) * | 1995-09-14 | 2004-04-19 | ソニー株式会社 | Anti-reflection member, method of manufacturing the same, and cathode ray tube |
| JPH10144237A (en) * | 1996-11-11 | 1998-05-29 | Sony Corp | Explosion-proof film and cathode-ray tube |
| TW392189B (en) * | 1997-01-17 | 2000-06-01 | Koninkl Philips Electronics Nv | Method of manufacturing a cathode ray tube and a cathode ray tube |
| JP2001242302A (en) * | 1999-12-22 | 2001-09-07 | Sony Corp | Light-absorbing antireflection film, display device and method of manufacturing thereof |
| US6686031B2 (en) * | 2000-02-23 | 2004-02-03 | Fuji Photo Film Co., Ltd. | Hard coat film and display device having same |
| KR100735176B1 (en) | 2000-04-28 | 2007-07-03 | 엘지전자 주식회사 | Structure for screen in cathode ray tube |
| JPWO2011122152A1 (en) * | 2010-03-30 | 2013-07-08 | 日本電気硝子株式会社 | Electromagnetic wave shielding film and electromagnetic wave shielding member |
| JP6251899B1 (en) | 2017-03-31 | 2017-12-27 | グンゼ株式会社 | Antireflection film |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3760215A (en) * | 1972-08-22 | 1973-09-18 | Us Navy | Low-reflection filter for cathode ray tube face plate |
| JPS542820B2 (en) * | 1972-11-18 | 1979-02-14 | ||
| US3984581A (en) * | 1973-02-28 | 1976-10-05 | Carl Zeiss-Stiftung | Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers |
| US4128303A (en) * | 1976-04-05 | 1978-12-05 | Kabushiki Kaisha Hoya Lens | Anti reflection coating with a composite middle layer |
| JPS53147549A (en) * | 1977-05-30 | 1978-12-22 | Toshiba Corp | Forming method of antireflection film |
| US4246613A (en) * | 1979-01-10 | 1981-01-20 | Delta Data Systems Corporation | Anti-glare screen with electromagnetic interference rejection |
| US4381421A (en) * | 1980-07-01 | 1983-04-26 | Tektronix, Inc. | Electromagnetic shield for electronic equipment |
| JPS57204002A (en) * | 1981-06-10 | 1982-12-14 | Toray Ind Inc | Plastic filter for luminous displaying |
| US4433247A (en) * | 1981-09-28 | 1984-02-21 | Varian Associates, Inc. | Beam sharing method and apparatus for ion implantation |
| JPS58209549A (en) * | 1982-06-01 | 1983-12-06 | 株式会社豊田中央研究所 | Heat-wave shielding laminate |
| JPS597902A (en) * | 1982-07-06 | 1984-01-17 | Seiko Epson Corp | Plastic lens |
| JPS5910901A (en) * | 1982-07-12 | 1984-01-20 | Nippon Kogaku Kk <Nikon> | Optical laminate |
| US4422721A (en) * | 1982-08-09 | 1983-12-27 | Optical Coating Laboratory, Inc. | Optical article having a conductive anti-reflection coating |
| DE3430406A1 (en) * | 1983-08-20 | 1985-03-14 | Riken EMC Co., Ltd., Nagoya, Aichi | TRANSPARENT PLATE FOR OPTICAL CHARACTER DEVICE |
| EP0145201A1 (en) * | 1983-11-10 | 1985-06-19 | Optical Coating Laboratory, Inc. | Antireflection optical coating with antistatic properties |
-
1985
- 1985-04-22 JP JP60084662A patent/JPH0719551B2/en not_active Expired - Fee Related
-
1986
- 1986-04-21 EP EP86302982A patent/EP0200452B1/en not_active Expired - Lifetime
- 1986-04-21 DE DE3689989T patent/DE3689989T2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6417619B1 (en) | 1997-04-10 | 2002-07-09 | Sumitomo Chemical Company, Limited | Front panel board for plasma display |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0200452B1 (en) | 1994-07-27 |
| EP0200452A2 (en) | 1986-11-05 |
| DE3689989T2 (en) | 1995-02-09 |
| EP0200452A3 (en) | 1989-02-01 |
| JPS61245449A (en) | 1986-10-31 |
| DE3689989D1 (en) | 1994-09-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |