JPH07134052A - Mass flow controller device and its calibrating method - Google Patents
Mass flow controller device and its calibrating methodInfo
- Publication number
- JPH07134052A JPH07134052A JP28220293A JP28220293A JPH07134052A JP H07134052 A JPH07134052 A JP H07134052A JP 28220293 A JP28220293 A JP 28220293A JP 28220293 A JP28220293 A JP 28220293A JP H07134052 A JPH07134052 A JP H07134052A
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- processing chamber
- vacuum processing
- mass flow
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はマスフローコントローラ
に関し、特にガスの実流量と設定流量のズレを補正する
マスフローコントローラ装置及びその校正方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mass flow controller, and more particularly to a mass flow controller device for correcting a deviation between an actual gas flow rate and a set flow rate and a calibration method thereof.
【０００２】[0002]
【従来の技術】マスフローコントローラ（質量流量制御
器）は長期に使用していると徐々に絶対流量がシフト
（ズレ）することが知られている。図３に示すようにマ
スフローコントローラの校正方法として、真空処理室７
とマスフローコントローラ４をつなぐ配管を分岐し、標
準質量流量計２４をつなぎ校正用ガス供給源２１から校
正用ガスを流し、標準質量流量計によってマスフローコ
ントローラのシフト量を調べて校正する方法（特開昭６
３−４０７３９号公報）やマスフローコントローラから
流れるガスの流量自体を質量流量測定装置にて測定し、
マスフローコントローラの設定流量と実際に流れている
ガスの実流量の差を演算回路にて計算し流量を一致させ
るように制御するマスフローコントローラ（特開平４−
２６２４０８号公報）があった。2. Description of the Related Art It is known that a mass flow controller (mass flow rate controller) gradually shifts (shifts) the absolute flow rate when it is used for a long period of time. As shown in FIG. 3, the vacuum processing chamber 7 is used as a calibration method for the mass flow controller.
And a mass flow controller 4 are branched, a standard mass flow meter 24 is connected, a calibration gas is supplied from a calibration gas supply source 21, and a standard mass flow meter is used to check the shift amount of the mass flow controller for calibration. Sho 6
3-40739) and the flow rate of the gas flowing from the mass flow controller itself is measured by a mass flow rate measuring device,
A mass flow controller that calculates the difference between the set flow rate of the mass flow controller and the actual flow rate of the gas that is actually flowing by an arithmetic circuit and controls so that the flow rates match.
262408).
【０００３】[0003]
【発明が解決しようとする課題】これら従来の校正方法
では校正用ガスを使用してマスフローコントローラを校
正するため、校正用ガスと実ガスの比熱や密度が大きく
異なる場合、補正しきれないことがある。また質量流量
測定装置を使用して設定流量と実流量の差を演算補正回
路にて制御する方式においては質量流量測定装置自体の
測定値シフトのため実流量が異なってくる場合がある。In these conventional calibration methods, since the mass flow controller is calibrated using the calibration gas, the correction gas may not be completely corrected when the specific heat and the density of the actual gas greatly differ from each other. is there. Further, in a system in which the difference between the set flow rate and the actual flow rate is controlled by the calculation correction circuit using the mass flow rate measuring device, the actual flow rate may differ due to the shift of the measurement value of the mass flow rate measuring device itself.
【０００４】[0004]
【課題を解決するための手段】前記の欠点を解消するた
めに、本発明は、真空処理室内を真空にした時の真空度
と一定時間後の真空度とをそれぞれ、圧力計で測定して
その差の値を求め、次で、再び真空処理室内を真空にし
た時の真空度とプロセスガスをマスフローコントローラ
によって設定流量値で一定時間流した後の真空度とをそ
れぞれ、圧力計で測定してその差の値を求め、前記２つ
の差の値と、一定時間とそして、真空処理室と圧力計と
の総体積、及び温度との関係式より前記マスフローコン
トローラの実流量値を求め、前記設定流量値に実流量値
が等しくなるように流量設定の補正を行なう。In order to solve the above-mentioned drawbacks, the present invention measures the degree of vacuum when the vacuum processing chamber is evacuated and the degree of vacuum after a certain period of time by measuring with a pressure gauge. Obtain the value of the difference, and then measure the degree of vacuum when the vacuum processing chamber is evacuated again and the degree of vacuum after the process gas has flowed for a certain time at the set flow rate by the mass flow controller with the pressure gauge. The value of the difference is calculated, and the actual flow rate value of the mass flow controller is calculated from the relational expression of the two difference values, the fixed time, the total volume of the vacuum processing chamber and the pressure gauge, and the temperature. Correct the flow rate setting so that the actual flow rate value is equal to the set flow rate value.
【０００５】また、真空ポンプに接続された真空処理室
と、該真空処理室内に流すプロセスガスの流量を設定す
るガス流量設定入力部及び入力された設定流量のプロセ
スガスを前記真空処理室内に流すマスフローコントロー
ラから成るマスフローコントローラ装置において、前記
真空処理室内の圧力を測定する圧力計と、入力された設
定流量を真空処理室内に一定時間だけ流し、真空処理室
内の圧力増加値より実際に流したガス流量を演算して求
める実流量演算部と、実流量と設定流量とを比較してそ
の差から補正値を求める補正値演算部と、前記補正値に
基づいて前記マスフローコントローラの流量を補正する
補正手段とを具備する。Further, a vacuum processing chamber connected to a vacuum pump, a gas flow rate setting input section for setting a flow rate of a process gas to flow into the vacuum processing chamber, and a process gas having an input set flow rate to flow into the vacuum processing chamber. In a mass flow controller device composed of a mass flow controller, a pressure gauge for measuring the pressure in the vacuum processing chamber, and a set flow rate that has been input flowed into the vacuum processing chamber for a certain period of time, the gas actually flowed from the pressure increase value in the vacuum processing chamber An actual flow rate calculation unit that calculates the flow rate, a correction value calculation unit that compares the actual flow rate and the set flow rate and obtains a correction value from the difference, and a correction that corrects the flow rate of the mass flow controller based on the correction value. And means.
【０００６】[0006]
【作用】入力される設定流量にもとづいて、マスフロー
コントローラによって真空処理室内にプロセスガスを一
定時間流す前と流した後との室内の圧力をそれぞれ測定
し、その圧力差を演算して求めることで、マスフローコ
ントローラが実際に流した実流量を検知することがで
き、この実流量が設定流量からずれている分はマスフロ
ーコントローラの誤差に起因することから、このずれ分
だけコントローラを補正することによって、校正をする
ことができる。With the mass flow controller, the pressure inside the vacuum processing chamber before and after flowing the process gas for a certain period of time is measured based on the input set flow rate, and the pressure difference is calculated and obtained. , The mass flow controller can detect the actual flow rate actually flowing, and the amount of deviation of this actual flow rate from the set flow rate is due to the error of the mass flow controller. Therefore, by correcting the controller by this deviation, Can calibrate.
【０００７】[0007]
【実施例】次に本発明の実施例について図を参照して説
明する。Embodiments of the present invention will now be described with reference to the drawings.
【０００８】実施例１ 図１は、本発明の第１の実施例の構成を示すブロック
図、図２は、第１の実施例における校正手順を示すフロ
ーチャートである。Embodiment 1 FIG. 1 is a block diagram showing the configuration of the first embodiment of the present invention, and FIG. 2 is a flow chart showing the calibration procedure in the first embodiment.
【０００９】図１において、１はガス流量設定入力部
で、マスフローコントローラで流す流量値を設定する。
４はマスフローコントローラであり、例えば、真空処理
室内に導入するプロセスガスの流量制御を行う。７は半
導体素子製造等に用いる真空処理室であり、マスフロー
コントローラ４とは配管５とバルブ１４を介して接続さ
れる。８は真空処理室７と真空ポンプ（不図示）との配
管に設けた真空排気バルブである。９は真空処理室７内
の真空度を計るためのバラトロンゲージ等のガスの種類
によって影響を受けない圧力計である。１０は、マスフ
ローコントローラ４より実際に流れた流量を圧力計の測
定値より求める実流量演算部、１１は実流量として許容
できる限界値及び設定流量値を記憶する実流量許容限界
設定部である。１２は実流量演算部１０及び限界設定部
からの実流量値と許容値とを比較し、出力する比較回路
部、１３は許容範囲外の場合にズレ量を演算する補正値
演算部である。２は補正回路で、実流量と設定流量とを
一致させるために、マスフローコントローラ制御部３に
入力される流量制御信号の変更を行う。３は、マスフロ
ーコントローラ４へ制御信号を出力するマスフローコン
トローラ制御部である。In FIG. 1, reference numeral 1 denotes a gas flow rate setting input section for setting a flow rate value to be flown by a mass flow controller.
A mass flow controller 4 controls the flow rate of the process gas introduced into the vacuum processing chamber, for example. Reference numeral 7 denotes a vacuum processing chamber used for manufacturing semiconductor elements and the like, which is connected to the mass flow controller 4 via a pipe 5 and a valve 14. Reference numeral 8 is a vacuum exhaust valve provided in the piping of the vacuum processing chamber 7 and a vacuum pump (not shown). Reference numeral 9 denotes a pressure gauge such as a Baratron gauge for measuring the degree of vacuum in the vacuum processing chamber 7, which is not affected by the type of gas. Reference numeral 10 is an actual flow rate calculation unit that obtains the actual flow rate from the mass flow controller 4 from the measured value of the pressure gauge, and 11 is an actual flow rate allowable limit setting unit that stores the limit value and the set flow rate value that are allowable as the actual flow rate. Reference numeral 12 is a comparison circuit unit that compares and outputs the actual flow rate values from the actual flow rate calculation unit 10 and the limit setting unit with the allowable value, and 13 is a correction value calculation unit that calculates the deviation amount when the value is outside the allowable range. A correction circuit 2 changes the flow rate control signal input to the mass flow controller control unit 3 in order to match the actual flow rate with the set flow rate. A mass flow controller control unit 3 outputs a control signal to the mass flow controller 4.
【００１０】次に、図２にもとづいて、校正手順につい
て説明する。Next, the calibration procedure will be described with reference to FIG.
【００１１】まず真空処理室７内を真空排気し到達真空
にする（ステップ２１）。圧力計９にて到達真空圧力Ｐ
0 を測定する（ステップ２２）。次に真空排気バルブ８
を閉じ圧力計９にてｔ時間後の圧力Ｐ1 を測定する（ス
テップ２３）。この（Ｐ1 −Ｐ0 ）の値は真空処理室７
自身の脱ガスによるもので真空処理室自身の真空リーク
量を示している。その後、再び真空処理室７を真空排気
バルブ８を開くことにより到達真空にする（ステップ２
４）。次に再び真空排気バルブ８を閉めて校正すべきマ
スフローコントローラ４と真空処理室７間のバルブ１４
を開き、ガス流量設定入力部１で設定したガス流量をマ
スフローコントローラ制御部３を介してマスフローコン
トローラ４で制御しながらプロセスガスを実際に真空処
理室７内に流し、ｔ時間後の圧力Ｐ2 を圧力計９で測定
する（ステップ２５）。そしてマスフローコントローラ
４での流量制御を止め、バルブ１４を閉める。（Ｐ2 −
Ｐ 0 ）の値はｔ時間の間、真空処理室７自身の脱ガスに
よるものとマスフローコントローラ４によるプロセスガ
スの処理室内への流入による圧力の増加量と考えて良
い。したがって（Ｐ2 −Ｐ0 ）と（Ｐ1 −Ｐ0 ）の値
と、時間ｔと処理室と圧力計の体積Ｖを用い、気体状態
方程式を使うことによりマスフローコントローラ４が流
した実流量値ｘを実流量演算部１０で演算して求める
（ステップ２６）。First, the inside of the vacuum processing chamber 7 is evacuated to reach the ultimate vacuum.
(Step 21). Vacuum pressure P reached by pressure gauge 9
0 Is measured (step 22). Next, the vacuum exhaust valve 8
Close the pressure gauge 9 and use the pressure gauge 9 to measure the pressure P after t hours.1 To measure
Step 23). This (P1 -P0 The value of) is for the vacuum processing chamber 7
Vacuum leak of the vacuum processing chamber itself due to its own degassing
The amount is shown. After that, the vacuum processing chamber 7 is evacuated again.
An ultimate vacuum is achieved by opening the valve 8 (step 2
4). Next, close the vacuum exhaust valve 8 again and perform calibration.
Valve 14 between the flow controller 4 and the vacuum processing chamber 7
Open the gas flow rate setting input section 1
Mass flow controller via the flow controller controller 3.
The process gas is actually vacuumed while being controlled by the tracker 4.
Flow into the processing room 7 and pressure P after t hours2 Measured with pressure gauge 9
(Step 25). And mass flow controller
The flow control at 4 is stopped, and the valve 14 is closed. (P2 −
P 0 The value of) is for degassing of the vacuum processing chamber 7 itself for t hours.
And process flow by mass flow controller 4
Is considered to be the amount of pressure increase due to the inflow of gas into the processing chamber.
Yes. Therefore (P2 -P0 ) And (P1 -P0 )The value of the
And the time t and the volume V of the processing chamber and the pressure gauge,
The mass flow controller 4 flows by using the equation.
The calculated actual flow rate value x is calculated by the actual flow rate calculation unit 10 and obtained.
(Step 26).
【００１２】[0012]
【数１】 実流量値ｘは、比較回路１２で、流量制御した時の設定
値およびその許容限界設定値を記憶している実流量許容
限界設定値１１と比較する（ステップ２７）。ｘ値が許
容範囲内ならば、マスフローコントローラ４の校正は必
要ない。しかし許容範囲外ならば補正値演算部１３によ
ってどの程度設定流量とズレているかを演算し、補正回
路２で実流量と設定流量を一致させるためにマスフロー
コントローラ制御部３に入力されてくる流量制御信号の
変更を行う。[Equation 1] The actual flow rate value x is compared by the comparison circuit 12 with the actual flow rate allowable limit set value 11 that stores the set value and the allowable limit set value when the flow rate is controlled (step 27). If the x value is within the allowable range, the mass flow controller 4 does not need to be calibrated. However, if the flow rate is outside the allowable range, the correction value calculation unit 13 calculates how much the flow rate deviates from the set flow rate, and the correction circuit 2 inputs the flow rate control input to the mass flow controller control unit 3 in order to match the actual flow rate with the set flow rate. Make signal changes.
【００１３】前述した動作、つまり真空処理室７を到達
真空にすることから制御信号の変更を行うまでのサイク
ルを数回くり返し、ガスの設定流量に実流量を一致させ
る。数回くり返しても一致しない場合、装置の故障等が
考えられるため、校正サイクルを中止する。The above-described operation, that is, the cycle from setting the ultimate vacuum in the vacuum processing chamber 7 to changing the control signal is repeated several times to match the actual flow rate with the set flow rate of the gas. If the results do not match even after repeating several times, the device may be out of order, so the calibration cycle is stopped.
【００１４】また、実施例のように真空処理室内の圧力
から実流量を求める際、理論式どおりに気体の状態方程
式より算出するのは困難であると思われるので、予め装
置に校正の完了したマスフローコントローラを取り付け
た際に実流量演算部１０で流量値ｘの値を測定してお
き、この値を設定流量値として次回からの校正時に比較
回路部１２にて比較し、使用する方法もある。When obtaining the actual flow rate from the pressure in the vacuum processing chamber as in the embodiment, it seems difficult to calculate from the equation of state of gas according to the theoretical formula, so the apparatus has been calibrated in advance. There is also a method in which the flow rate value x is measured by the actual flow rate calculating section 10 when the mass flow controller is attached, and this value is used as a set flow rate value in the comparison circuit section 12 at the time of calibration from the next time. .
【００１５】[0015]
【発明の効果】以上説明したように本発明は、圧力計を
用いてガス流量を決定するため、プロセスガスをマスフ
ローコントローラに流すことができ、実ガスにてマスフ
ローコントローラの校正を行うことができる。またマス
フローコントローラを装置からはずさずに流量チェッ
ク、校正が可能なため、真空処理装置内部、配管、バル
ブ等が大気や校正用ガスに触れることがない。そして何
よりも質量流量計を使用して校正を行なわないため、校
正用質量流量計自体のドリフト等に影響されない。As described above, according to the present invention, since the gas flow rate is determined by using the pressure gauge, the process gas can be passed through the mass flow controller, and the mass flow controller can be calibrated with the actual gas. . In addition, since the flow rate can be checked and calibrated without removing the mass flow controller from the device, the inside of the vacuum processing device, piping, valves, etc. will not come into contact with the atmosphere or the calibration gas. Since the mass flowmeter is not used for calibration above all, it is not affected by the drift of the calibration mass flowmeter itself.
【図１】本発明の実施例の構成を示すブロック図FIG. 1 is a block diagram showing a configuration of an embodiment of the present invention.
【図２】本発明の実施例の校正手順を示すフローチャー
トFIG. 2 is a flowchart showing a calibration procedure according to the embodiment of the present invention.
【図３】従来例の構成を示すブロック図FIG. 3 is a block diagram showing a configuration of a conventional example.
１ ガス流量設定入力部 ２ 補正回路 ４ マスフローコントローラ ７ 真空処理室 ９ 圧力計 １０ 実流量演算部 １２ 比較回路 １３ 補正値演算部 ３１ 校正用ガス供給源 ３２ 原料ガス供給源 ３４ 標準質量流量計 1 gas flow rate setting input unit 2 correction circuit 4 mass flow controller 7 vacuum processing chamber 9 pressure gauge 10 actual flow rate calculation unit 12 comparison circuit 13 correction value calculation unit 31 calibration gas supply source 32 source gas supply source 34 standard mass flowmeter
Claims (2)
一定時間後の真空度とをそれぞれ、圧力計で測定してそ
の差の値を求め、 次で、再び真空処理室内を真空にした時の真空度とプロ
セスガスをマスフローコントローラによって設定流量値
で一定時間流した後の真空度とをそれぞれ、圧力計で測
定してその差の値を求め、 前記２つの差の値、一定時間、真空処理室と圧力計との
総体積、及び温度との関係式より前記マスフローコント
ローラの実流量値を求め、 前記設定流量値に実流量値が等しくなるように流量設定
の補正を行なうマスフローコントローラ装置の校正方
法。1. A vacuum degree when the inside of the vacuum processing chamber is evacuated and a degree of vacuum after a certain period of time are respectively measured by a pressure gauge to obtain a difference value, and then the vacuum processing chamber is evacuated again. The degree of vacuum and the degree of vacuum after flowing the process gas at a set flow rate by the mass flow controller for a certain period of time are measured with a pressure gauge to obtain the difference value, and the difference between the two values and the certain period of time. , The total volume of the vacuum processing chamber and the pressure gauge, and the actual flow rate of the mass flow controller is obtained from the relational expression, and the flow rate setting is corrected so that the actual flow rate is equal to the set flow rate. Instrument calibration method.
該真空処理室内に流すプロセスガスの流量を設定するガ
ス流量設定入力部及び入力された設定流量のプロセスガ
スを前記真空処理室内に流すマスフローコントローラか
ら成るマスフローコントローラ装置において、前記真空
処理室内の圧力を測定する圧力計と、入力された設定流
量を真空処理室内に一定時間だけ流し、真空処理室内の
圧力増加値より実際に流したガス流量を演算して求める
実流量演算部と、実流量と設定流量とを比較してその差
から補正値を求める補正値演算部と、前記補正値に基づ
いて前記マスフローコントローラの流量を補正する補正
手段とを具備するマスフローコントローラ装置。2. A vacuum processing chamber connected to a vacuum pump,
In a mass flow controller device comprising a gas flow rate setting input section for setting a flow rate of a process gas to flow into the vacuum processing chamber and a mass flow controller to flow a process gas having an input set flow rate into the vacuum processing chamber, a pressure in the vacuum processing chamber is set. A pressure gauge to be measured and an actual flow rate calculation unit that calculates the actual flow rate of the gas flowed from the pressure increase value in the vacuum processing chamber by flowing the input set flow rate into the vacuum processing chamber for a certain period of time A mass flow controller device comprising: a correction value calculation unit that compares a flow rate and obtains a correction value from the difference; and a correction unit that corrects the flow rate of the mass flow controller based on the correction value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5282202A JP2500788B2 (en) | 1993-11-11 | 1993-11-11 | Mass flow controller device and its calibration method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5282202A JP2500788B2 (en) | 1993-11-11 | 1993-11-11 | Mass flow controller device and its calibration method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07134052A true JPH07134052A (en) | 1995-05-23 |
| JP2500788B2 JP2500788B2 (en) | 1996-05-29 |
Family
ID=17649403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5282202A Expired - Fee Related JP2500788B2 (en) | 1993-11-11 | 1993-11-11 | Mass flow controller device and its calibration method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2500788B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7108009B2 (en) | 2002-11-15 | 2006-09-19 | Renesas Technology Corp. | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| JP2006337346A (en) * | 2005-06-06 | 2006-12-14 | Ckd Corp | Absolute flow rate calibration system in flow rate control device |
| US7918238B2 (en) | 2004-06-21 | 2011-04-05 | Hitachi Metals, Ltd. | Flow controller and its regulation method |
| JP2012150840A (en) * | 2002-06-24 | 2012-08-09 | Mks Instruments Inc | Apparatus and method for pressure fluctuation insensitive mass flow control |
| US8738187B2 (en) | 2002-06-24 | 2014-05-27 | Mks Instruments, Inc. | Apparatus and method for pressure fluctuation insensitive mass flow control |
| CN105403266A (en) * | 2015-12-16 | 2016-03-16 | 宁波水表股份有限公司 | Automatic correction large-caliber ultrasound water meter and correction method of same |
| US10845232B2 (en) | 2017-12-01 | 2020-11-24 | Samsung Electronics Co., Ltd. | Mass flow controller, apparatus for manufacturing semiconductor device, and method for maintenance thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5890124A (en) * | 1981-11-25 | 1983-05-28 | Sigma Gijutsu Kogyo Kk | Measuring method for gas flow rate |
| JPH01110218A (en) * | 1987-10-24 | 1989-04-26 | Denki Kagaku Keiki Co Ltd | Gas flowmeter and gas flow rate controller |
| JPH02196423A (en) * | 1989-01-25 | 1990-08-03 | Fujitsu Ltd | Semiconductor manufacturing apparatus |
-
1993
- 1993-11-11 JP JP5282202A patent/JP2500788B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5890124A (en) * | 1981-11-25 | 1983-05-28 | Sigma Gijutsu Kogyo Kk | Measuring method for gas flow rate |
| JPH01110218A (en) * | 1987-10-24 | 1989-04-26 | Denki Kagaku Keiki Co Ltd | Gas flowmeter and gas flow rate controller |
| JPH02196423A (en) * | 1989-01-25 | 1990-08-03 | Fujitsu Ltd | Semiconductor manufacturing apparatus |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012150840A (en) * | 2002-06-24 | 2012-08-09 | Mks Instruments Inc | Apparatus and method for pressure fluctuation insensitive mass flow control |
| US8738187B2 (en) | 2002-06-24 | 2014-05-27 | Mks Instruments, Inc. | Apparatus and method for pressure fluctuation insensitive mass flow control |
| US7108009B2 (en) | 2002-11-15 | 2006-09-19 | Renesas Technology Corp. | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| US7658204B2 (en) | 2002-11-15 | 2010-02-09 | Renesas Technology Corp. | Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| US7918238B2 (en) | 2004-06-21 | 2011-04-05 | Hitachi Metals, Ltd. | Flow controller and its regulation method |
| JP2006337346A (en) * | 2005-06-06 | 2006-12-14 | Ckd Corp | Absolute flow rate calibration system in flow rate control device |
| CN105403266A (en) * | 2015-12-16 | 2016-03-16 | 宁波水表股份有限公司 | Automatic correction large-caliber ultrasound water meter and correction method of same |
| US10845232B2 (en) | 2017-12-01 | 2020-11-24 | Samsung Electronics Co., Ltd. | Mass flow controller, apparatus for manufacturing semiconductor device, and method for maintenance thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2500788B2 (en) | 1996-05-29 |
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