JPH07120062B2 - Electrophotographic photoreceptor - Google Patents

Electrophotographic photoreceptor

Info

Publication number
JPH07120062B2
JPH07120062B2 JP63110125A JP11012588A JPH07120062B2 JP H07120062 B2 JPH07120062 B2 JP H07120062B2 JP 63110125 A JP63110125 A JP 63110125A JP 11012588 A JP11012588 A JP 11012588A JP H07120062 B2 JPH07120062 B2 JP H07120062B2
Authority
JP
Japan
Prior art keywords
film thickness
admittance
photosensitive member
aqueous solution
anodic oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63110125A
Other languages
Japanese (ja)
Other versions
JPH01280768A (en
Inventor
重徳 大塚
護 臨
政行 廣井
増田  稔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP63110125A priority Critical patent/JPH07120062B2/en
Publication of JPH01280768A publication Critical patent/JPH01280768A/en
Publication of JPH07120062B2 publication Critical patent/JPH07120062B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers
    • G03G5/142Inert intermediate layers
    • G03G5/144Inert intermediate layers comprising inorganic material

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電子写真感光体に関するものであり、特に反転
現像方式のプロセスにおいて使用するに適した電子写真
感光体に関するものである。
The present invention relates to an electrophotographic photosensitive member, and more particularly to an electrophotographic photosensitive member suitable for use in a reversal development type process.

〔従来の技術〕[Conventional technology]

電子写真方式を利用した画像形成システムは、従来から
広く複写分野に応用され、そのシステムに使用される感
光体として、無機系、有機系の種々の感光体が開発され
ている。
An image forming system using an electrophotographic system has been widely applied to the field of copying, and various inorganic and organic photoconductors have been developed as photoconductors used in the system.

一方、最近はディジタル信号データ処理システムが進
歩、普及し、これらデータを印字出力するいわゆるプリ
ンターの機能も向上が望まれており、この分野への電子
写真方式の印字システムの利用が検討され実用化されて
いる。
On the other hand, recently, the digital signal data processing system has advanced and spread, and the function of a so-called printer that prints out these data is also desired to be improved. The use of an electrophotographic printing system in this field has been studied and put into practical use. Has been done.

これらは、電気信号のデータをレーザースキャナー、発
光ダイオード(LED)アレイ、あるいは液晶シャッター
などの手段によって、光信号に変換し、感光体へ照射
し、感光体上に潜像を形成し、トナー現像によって可視
化し、画像を得るプロセスであり、光プリンターとも呼
ばれている。
These convert electrical signal data into optical signals by means of laser scanners, light emitting diode (LED) arrays, liquid crystal shutters, etc., irradiate the photoconductor, form a latent image on the photoconductor, and develop toner. It is a process of visualizing and obtaining an image, and is also called an optical printer.

この方式は従来のインパクト式に比べ、極めて印字スピ
ードが早く、かつ騒音もなく、高品位な印字が可能であ
ることから、急激に普及しつつある。
Compared with the conventional impact type, this type has an extremely high printing speed, is free from noise, and is capable of high-quality printing, and is rapidly spreading.

この様な光プリンターに使用する感光体として、Se,CdS
などの無機系の光導電体、ポリビニルカルバゾールとト
リニトロフルオレノンの電荷移動錯体などの有機系の感
光体などが使用されてきたが、感光波長域の選択容易
性、特に半導体レーザーの出力波長域である近赤外域で
感度をもたせることが比較的容易な有機光導電体が極め
て適しており、種々の材料が開発されている。特に電荷
発生層と電荷移動層とを積層してなる積層型有機光導電
体は、有機化合物の種類の豊富さを十分生かせるもの
で、高感度、高耐刷力の感光体が得られており、又、安
全性の面でも無公害な材料を選択できる点においても、
極めて有用である。
Se, CdS are used as photoconductors for such optical printers.
Inorganic photoconductors such as, and organic photoconductors such as charge transfer complexes of polyvinylcarbazole and trinitrofluorenone have been used, but it is easy to select the photosensitive wavelength range, especially in the output wavelength range of the semiconductor laser. Organic photoconductors, which are relatively easy to have sensitivity in a certain near infrared region, are extremely suitable, and various materials have been developed. In particular, the laminated organic photoconductor formed by laminating the charge generation layer and the charge transfer layer makes full use of the abundance of types of organic compounds, and a high-sensitivity and high printing durability photoreceptor has been obtained. Also, in terms of safety, you can select non-polluting materials,
Extremely useful.

一方、光プリンターでの画像形成方法としては、光の有
効利用、あるいは解像力を上げる目的から、光を照射し
た部分にトナーを付着させ画像を形成する、いわゆる反
転現像方式を採用することが多い。
On the other hand, as an image forming method in an optical printer, a so-called reversal development method in which a toner is adhered to a portion irradiated with light to form an image is often employed for the purpose of effectively utilizing light or increasing resolution.

反転現像プロセスにおいては、暗電位部が白地となり、
明電位部が黒地部(画線部)になるが、このシステムに
おいては、感光体上に欠陥等による局所的帯電不良が存
在すると、白地への黒点、あるいは多数存在すると地か
ぶりのような現像となり、著るしい画像不良となって現
われる。
In the reversal development process, the dark potential part becomes a white background,
The bright potential part becomes a black background part (image area), but in this system, if there is a local charging failure due to a defect on the photoconductor, black spots on a white background or development such as background fog if there are many And appears as a marked image defect.

この様な局所的帯電不良は、正規現像において使用した
場合には、何ら問題を引き起すことのないレベルであっ
ても、反転現像においては画像不良となり易く、しかも
従来より得られている積層系感光体では、程度の差こそ
あれ、黒点、かぶりに問題を持っていることが判った。
Such a local electrification defect is liable to cause an image defect in reversal development even when it is at a level such that it does not cause any problem when used in regular development, and moreover, it is a laminated system obtained in the past. It has been found that the photoconductor has problems with black spots and fog to some extent.

この問題の原因、即ち局所的帯電不良には種々の原因が
考えられるが、電極である導電性支持体と感光層の間
で、電荷の注入が局所的に起り、帯電電位が上がらない
ものと考えられる。これを改善するために、導電性支持
体と感光層の間にブロッキング層を設けることが考えら
れる。
Various causes can be considered for the cause of this problem, that is, local electrification failure, but it is considered that the injection of charges locally occurs between the conductive support that is the electrode and the photosensitive layer, and the charging potential does not rise. Conceivable. In order to improve this, it is conceivable to provide a blocking layer between the conductive support and the photosensitive layer.

この様なブロッキング層を設けることは、従来から公知
の技術として知られており、その材料として酸化アルミ
ニウム、水酸化アルミニウムなどの無機層、ポリビニル
アルコール、カゼイン、ポリビニルピロリドン、ポリア
クリル酸、セルロース類、ゼラチン、デンプン、ポリウ
レタン、ポリイミド、ポリアミドなどの樹脂層が使用さ
れている。
Providing such a blocking layer is known as a conventionally known technique, and its material is an inorganic layer such as aluminum oxide or aluminum hydroxide, polyvinyl alcohol, casein, polyvinylpyrrolidone, polyacrylic acid, celluloses, Resin layers such as gelatin, starch, polyurethane, polyimide, polyamide are used.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

しかしながら、これら従来のブロッキング層を有する感
光体を、反転現像方式のプロセスで使用しても、黒点を
完全になくすことは難かしく、特に高湿の環境条件のも
とで地がぶりが著しく、実用に耐えないものであること
が多く、より一層の改善が望まれていた。
However, even if the photoreceptor having these conventional blocking layers is used in the process of the reversal development method, it is difficult to completely eliminate the black spots, and particularly, the background fogging is remarkable under the environmental conditions of high humidity, In many cases, it cannot be put to practical use, and further improvement has been desired.

〔課題を解決するための手段〕[Means for Solving the Problems]

そこで、本発明者らは以上の様な、特に反転現像方式の
プロセスで使用される電子写真感光体の地かぶり、微少
黒点等の問題を解決すべく、鋭意検討した結果、特定の
陽極酸化被膜を有するアルミニウム基体を用いることに
よって、低湿,高湿を含めた広い環境条件下で、地かぶ
りのない良好な画像特性、電気特性を有する感光体が得
られることを見い出し、本発明に到達した。
Therefore, as a result of diligent studies, the inventors of the present invention have conducted a diligent study to solve the problems such as background fogging and microscopic black spots of the electrophotographic photosensitive member used in the process of the reversal development method. It has been found that a photosensitive member having good image characteristics and electric characteristics without background fog can be obtained under a wide range of environmental conditions including low humidity and high humidity by using an aluminum base material having the above-mentioned characteristics.

即ち本発明の要旨は、陽極酸化被膜を有するアルミニウ
ム基体上に、少なくとも、膜厚0.1〜1μmの電荷発生
層および電荷移動層がこの順に積層された光導電層が設
けられた電子写真感光体において、該陽極酸化被膜が封
孔処理をされており、該陽極酸化被膜の平均膜厚をd,下
記測定法により求めたアドミッタンスをYmとした場合、
Ym×dが4×10-10(S・m)以下であることを特徴と
する電子写真感光体に存する。
That is, the gist of the present invention is to provide an electrophotographic photosensitive member comprising a photoconductive layer having at least a 0.1 to 1 μm-thickness charge generation layer and a charge transfer layer laminated in this order on an aluminum substrate having an anodized film. When the anodic oxide coating is subjected to sealing treatment, the average film thickness of the anodic oxide coating is d, and the admittance obtained by the following measurement method is Ym,
An electrophotographic photosensitive member is characterized in that Ym × d is 4 × 10 −10 (S · m) or less.

〔アドミッタンスの測定法〕[Measurement method of admittance]

25℃の環境下で、サンプルの被膜表面に、内面積133mm2
の非導電性電解セルを取り付け3.5重量%の硫酸カリウ
ム水溶液を電解セルに満たした状態で30分間放置した
後、アドミッタンス測定器の電極の一端を素地に接続
し、一方の電極を試験液に挿入し、周波数1kHzのもとで
測定する。
Internal area of 133 mm 2 on the coating surface of the sample in the environment of 25 ℃
After attaching the non-conductive electrolysis cell of No. 3 for 3.5 minutes to the electrolytic cell and leaving it for 30 minutes, connect one end of the electrode of the admittance measuring instrument to the substrate and insert one electrode into the test solution. Then, measure at a frequency of 1 kHz.

以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

本発明の感光体は、特定の陽極酸化被膜を有するアルミ
ニウム基体上に光導電層が設けられる。
The photoconductor of the present invention has a photoconductive layer provided on an aluminum substrate having a specific anodized film.

アルミニウム基体は、陽極酸化処理を施す前に、酸、ア
ルカリ、有機溶剤、界面活性剤、エマルジョン、電解な
どの各種脱脂洗浄方法により脱脂処理されることが好ま
しい。
The aluminum substrate is preferably degreased by various degreasing cleaning methods such as acid, alkali, organic solvent, surfactant, emulsion and electrolysis before anodizing treatment.

陽極酸化被膜は通常の方法、例えば、クロム酸、硫酸、
シュウ酸、ホウ酸、スルファミン酸などの酸性浴中で、
陽極酸化処理することにより形成されるが、硫酸中での
陽極酸化処理が最も良好な結果を与える。硫酸中での陽
極酸化の場合、硫酸濃度は100〜300g/l、溶存アルミニ
ウム濃度は2〜15g/l、液温は15〜30℃、電解電圧は10
〜20V、電流密度は0.5〜2A/dm2の範囲内に設定されるの
が好ましいが、これに限られるものではない。
The anodic oxide coating is formed by a conventional method, for example, chromic acid, sulfuric acid,
In an acidic bath of oxalic acid, boric acid, sulfamic acid, etc.,
It is formed by anodizing, but anodizing in sulfuric acid gives the best results. In the case of anodizing in sulfuric acid, sulfuric acid concentration is 100 ~ 300g / l, dissolved aluminum concentration is 2 ~ 15g / l, liquid temperature is 15 ~ 30 ℃, electrolysis voltage is 10
The current density is preferably set to -20 V and the current density is set to 0.5-2 A / dm 2 , but the present invention is not limited to this.

このようにして形成された陽極酸化被膜に対して封孔処
理を行なう。封孔処理方法は通常の方法でよいが、たと
えば主成分としてフッ化ニッケルを含有する水溶液中に
浸漬させる低温封孔処理、あるいは主成分として酢酸ニ
ッケルを含有する水溶液中に浸漬させる高温封孔処理が
施されることが好ましい。
A sealing treatment is performed on the anodized film thus formed. The sealing treatment method may be an ordinary method, for example, low temperature sealing treatment by immersing in an aqueous solution containing nickel fluoride as a main component, or high temperature sealing treatment by immersing in an aqueous solution containing nickel acetate as a main component. Is preferably applied.

上記低温封孔処理の場合に使用されるフッ化ニッケル水
溶液の濃度は適宜選べるが、3〜6g/lの範囲内で使用さ
れた場合が最も効果的である。
The concentration of the nickel fluoride aqueous solution used in the case of the low-temperature sealing treatment can be appropriately selected, but it is most effective when it is used in the range of 3 to 6 g / l.

また封孔処理をスムーズに進めるために、処理温度とし
ては25〜40℃、好ましくは30〜35℃で、又フッ化ニッケ
ル水溶液のpHは4.5〜6.5、好ましくは5.5〜6.0の範囲で
処理するのが良い。pH調節剤としては、シュウ酸、ホウ
酸、ギ酸、酢酸、水酸化ナトリウム、酢酸ナトリウム、
アンモニア水等を用いることができる。処理時間は、被
膜の膜厚1μm当り1〜3分の範囲内で処理するのが好
ましい。
In order to smoothly proceed the sealing treatment, the treatment temperature is 25 to 40 ° C, preferably 30 to 35 ° C, and the pH of the nickel fluoride aqueous solution is 4.5 to 6.5, preferably 5.5 to 6.0. Is good. As the pH adjusting agent, oxalic acid, boric acid, formic acid, acetic acid, sodium hydroxide, sodium acetate,
Ammonia water or the like can be used. The treatment time is preferably within a range of 1 to 3 minutes per 1 μm of the film thickness.

なお、被膜物性を更に改良するためフッ化コバルト、酢
酸コバルト、硫酸ニッケル、界面活性剤等をフッ化ニッ
ケル水溶液に添加しておいてもよい。次いで水洗、乾燥
して低温封孔処理を終える。
In order to further improve the physical properties of the coating, cobalt fluoride, cobalt acetate, nickel sulfate, a surfactant, etc. may be added to the nickel fluoride aqueous solution. Then, it is washed with water and dried to complete the low-temperature sealing treatment.

前記高温封孔処理の場合の封孔剤としては、酢酸ニッケ
ル、酢酸コバルト、酢酸鉛、酢酸ニッケル−コバルト、
硝酸バリウム等の金属塩水溶液を用いることができる
が、特に酢酸ニッケルを用いるのが好ましい。
As the sealing agent in the case of the high-temperature sealing treatment, nickel acetate, cobalt acetate, lead acetate, nickel acetate-cobalt,
An aqueous solution of a metal salt such as barium nitrate can be used, but nickel acetate is particularly preferably used.

酢酸ニッケル水溶液を用いる場合の濃度は5〜20g/lの
範囲内で使用するのが好ましい。処理温度は80〜100
℃、好ましくは90〜98℃で、又酢酸ニッケル水溶液のpH
は5.0〜6.0の範囲で処理するのが良い。ここでpH調節剤
としてはアンモニア水、酢酸ナトリウム等を用いること
ができる。
When using an aqueous nickel acetate solution, the concentration is preferably within the range of 5 to 20 g / l. Processing temperature is 80-100
℃, preferably 90 ~ 98 ℃, the pH of the nickel acetate aqueous solution
Should be processed in the range of 5.0 to 6.0. Ammonia water, sodium acetate or the like can be used as the pH adjuster.

処理時間は10分以上、好ましくは20分以上処理するのが
良い。なお、この場合も被膜物性を改良するために酢酸
ナトリウム、有機カルボン酸塩、アニオン系、ノニオン
系界面活性剤等を酢酸ニッケル水溶液に添加しても良
い。次いで水洗、乾燥して高温封孔処理を終える。
The treatment time is 10 minutes or longer, preferably 20 minutes or longer. Also in this case, sodium acetate, an organic carboxylate, an anionic surfactant, a nonionic surfactant and the like may be added to the nickel acetate aqueous solution in order to improve the physical properties of the coating. Then, it is washed with water and dried to complete the high-temperature sealing treatment.

以上の様にして形成された被膜のアドミッタンスは、本
発明では次の様にして測定することができる。
The admittance of the film formed as described above can be measured in the following manner in the present invention.

25℃の環境下で、サンプルの被膜表面に、内面積133mm2
の非導電性電解セルを取り付け、3.5wt%の硫酸カリウ
ム水溶液を電解セルに満たす。30分間放置した後、市販
のアドミッタンス測定器の電極の一端を素地に接続し、
一方の電極を試験液に挿入し、周波数1KHzのもとで、ア
ドミッタンスYmを測定する。
Internal area of 133 mm 2 on the coating surface of the sample in the environment of 25 ℃
Attach the non-conductive electrolysis cell of, and fill the electrolysis cell with a 3.5 wt% potassium sulfate aqueous solution. After leaving it for 30 minutes, connect one end of the electrode of a commercially available admittance measuring instrument to the substrate,
Insert one electrode into the test solution and measure the admittance Ym at a frequency of 1 KHz.

ここでYm×dが4×10-10(S・m)以下となる被膜を
得るためには、封孔条件或いは被膜厚さいづれかあるい
は両方を調節することにより得られるが、平均膜厚が厚
い場合には、同じYm×d値を得るために、封孔液の高濃
度化、高温・長時間処理の様により強い封孔条件を必要
とする。従って生産性が悪くなると共に、被膜表面にし
み、汚れ、粉ふきといった表面欠陥が生じやすくなる。
Here, in order to obtain a film having Ym × d of 4 × 10 −10 (S · m) or less, it can be obtained by adjusting either the sealing condition or the film thickness, or both, but the average film thickness is large. In this case, in order to obtain the same Ym × d value, stronger sealing conditions are required such as increasing the concentration of the sealing liquid and treating at high temperature for a long time. Therefore, the productivity is deteriorated, and surface defects such as stains, stains, and dusts are likely to occur on the coating surface.

このような点から、陽極酸化被膜の平均膜厚は通常20μ
m以下、特に7μm以下で形成されることが好ましい。
From this point of view, the average thickness of anodized film is usually 20μ.
The thickness is preferably m or less, particularly preferably 7 μm or less.

このような陽極酸化被膜上に設けられる光導電層として
は、無機系、有機系の各種光導電層が使用できるが、電
荷発生層、電荷移動層より成る積層型光導電体を用いた
場合が極めて有用である。
As the photoconductive layer provided on such an anodized film, various inorganic and organic photoconductive layers can be used, but in the case of using a laminated photoconductor including a charge generation layer and a charge transfer layer, Extremely useful.

この場合の電荷発生層には、公知の電荷発生材料、例え
ばSe及びその合金、ヒ素−セレン、硫化カドミニウム、
その他の無機光導電体、フタロシアニン、アゾ色素、キ
ナクリドン、多環キノンなどの各種有機顔料が使用でき
る。中でも無金属フタロシアニン、銅、塩化インジウ
ム、塩化ガリウム、スズ、オキシチタニウム、亜鉛、バ
ナジウム、などの金属又はその酸化物、塩化物の配位し
たフタロシアニン類;モノアゾ、ビスアゾ、トリスア
ゾ、ポリアゾ類などのアゾ顔料が好ましい。
The charge generation layer in this case includes a known charge generation material such as Se and its alloys, arsenic-selenium, cadmium sulfide,
Other inorganic photoconductors, phthalocyanines, azo dyes, quinacridones, various organic pigments such as polycyclic quinones can be used. Among them, metal-free phthalocyanines, copper, indium chloride, gallium chloride, tin, oxytitanium, zinc, vanadium, and other metals or their oxides, phthalocyanines coordinated with chlorides; azo such as monoazo, bisazo, trisazo, polyazos Pigments are preferred.

電荷発生層はこれらの電荷発生材料の均一層として、あ
るいはバインダー樹脂中に微粒子分散した状態で形成さ
れる。ここで使用されるバインダー樹脂としては、フェ
ノキシ、エポキシ、ポリエステル、アクリル、ポリビニ
ルブチラール、ポリカーボネート樹脂などが挙げられ
る。膜厚としては通常0.1〜1μm、好ましくは0.15〜
0.6μmが好適である。
The charge generation layer is formed as a uniform layer of these charge generation materials or in a state where fine particles are dispersed in a binder resin. Examples of the binder resin used here include phenoxy, epoxy, polyester, acrylic, polyvinyl butyral, and polycarbonate resins. The film thickness is usually 0.1 to 1 μm, preferably 0.15 to
0.6 μm is preferable.

電荷移動層中の電荷移動材料としては、ポリビニルカル
バゾール、ポリビニルピレン、ポリアセナフチレンなど
の高分子化合物、又は各種ピラゾリン誘導体、オキサゾ
ール誘導体、ヒドラゾン誘導体、スチルベン誘導体など
の低分子化合物が使用できる。これらの電荷移動材料と
ともに必要に応じてバインダー樹脂が配合される。好ま
しいバインダーとしては、ポリメチルメタクリレート、
ポリスチレン、ポリ塩化ビニルなどのビニル重合体及び
その共重合体、ポリカーボネート、ポリエステル、フェ
ノキシ、エポキシ、シリコーン樹脂などが挙げられ、ま
たこれらの部分的架橋硬化物も使用される。
As the charge transfer material in the charge transfer layer, polymer compounds such as polyvinylcarbazole, polyvinylpyrene, polyacenaphthylene, and low molecular compounds such as various pyrazoline derivatives, oxazole derivatives, hydrazone derivatives, and stilbene derivatives can be used. A binder resin is blended with these charge transfer materials as needed. Preferred binders include polymethylmethacrylate,
Examples thereof include vinyl polymers such as polystyrene and polyvinyl chloride and copolymers thereof, polycarbonate, polyester, phenoxy, epoxy, silicone resin, and the like, and partially cross-linked cured products thereof are also used.

また電荷移動層には、必要に応じて酸化防止剤、増感剤
などの各種添加剤を含んでいても良い。
Further, the charge transfer layer may contain various additives such as an antioxidant and a sensitizer, if necessary.

電荷移動層の膜厚は通常10〜30μm、好ましくは13〜25
μmの厚みで使用されるのが良い。
The thickness of the charge transfer layer is usually 10 to 30 μm, preferably 13 to 25
It is better to use with a thickness of μm.

〔発明の効果〕〔The invention's effect〕

本発明によって得られた電子写真感光体を、反転現像方
式のプロセスを含む電子写真システムにて使用すると、
高湿下を含めた広い環境条件下でかぶりのない良好な画
像が得られる。
When the electrophotographic photosensitive member obtained by the present invention is used in an electrophotographic system including a reversal development type process,
Good images without fog can be obtained under a wide range of environmental conditions including high humidity.

〔実施例〕〔Example〕

以下、実施例により本発明を更に具体的に説明するが、
本発明はその要旨をこえない限り、以下の実施例に限定
されるものではない。
Hereinafter, the present invention will be described in more detail with reference to Examples.
The present invention is not limited to the following examples unless it exceeds the gist.

製造例−1 表面を鏡面仕上げした肉厚1mmのアルミニウムシリンダ
ーを、脱脂剤トップアルクリーン160(商品名、奥野製
薬工業(株)製)の30g/l水溶液中で、60℃、5分かけ
て脱脂洗浄を行なった。続いて水洗を行なった後、7%
硝酸に25℃で1分間浸漬した。更に水洗後180g/lの硫酸
電解液中(溶存アルミニウム濃度7g/l)で1.0A/dm2の電
流密度で陽極酸化を行ない平均膜厚6μmの陽極酸化被
膜を形成した。なお、この平均膜厚は電磁膜厚計Permas
cope(パーマスコープ)(商品名、フィッシャー社製)
によりシリンダー上の20箇所の膜厚を測定し、平均した
ものである(以下、同じ方法を用いた)。
Production Example-1 An aluminum cylinder having a mirror-finished surface with a thickness of 1 mm was placed in a 30 g / l aqueous solution of a degreasing agent Top Alclean 160 (trade name, manufactured by Okuno Chemical Industries Co., Ltd.) at 60 ° C for 5 minutes. It was degreased and washed. After washing with water, 7%
It was immersed in nitric acid at 25 ° C for 1 minute. After washing with water, anodic oxidation was performed at a current density of 1.0 A / dm 2 in a 180 g / l sulfuric acid electrolytic solution (dissolved aluminum concentration 7 g / l) to form an anodic oxide coating having an average film thickness of 6 μm. In addition, this average film thickness is the electromagnetic film thickness meter Permas.
cope (permascope) (trade name, manufactured by Fisher)
The film thickness is measured at 20 points on the cylinder by means of and averaged (the same method is used hereinafter).

次いで水洗後酢酸ニッケルを主成分とする高温封孔剤ト
ップシールDX-500(商品名、奥野製薬工業(株)製)の
10g/l水溶液に、95℃で18分間浸漬し、封孔処理を行な
った。続いて純水により十分な洗浄を行ない乾燥した。
Next, after washing with water, a high-temperature sealing agent with a main component of nickel acetate, Topseal DX-500 (trade name, manufactured by Okuno Chemical Industry Co., Ltd.)
It was immersed in a 10 g / l aqueous solution at 95 ° C. for 18 minutes for sealing treatment. Then, it was thoroughly washed with pure water and dried.

この被膜のアドミッタンスを測定したところ41μSであ
った。またYm×dは2.46×10-10(S・m)であった。
When the admittance of this coating was measured, it was 41 μS. Further, Ym × d was 2.46 × 10 −10 (S · m).

一方、オキシチタニウムフタロシアニン10重量部、ポリ
ビニルブチラール(積水化学工業社製、商品名 エスレ
ックBH-3)5重量部に、1,2−ジメトキシエタン500重量
部を加え、サンドグラインドミルで粉砕、分散処理を行
なった。
On the other hand, to 10 parts by weight of oxytitanium phthalocyanine and 5 parts by weight of polyvinyl butyral (Sekisui Chemical Co., Ltd., trade name Eslec BH-3), add 500 parts by weight of 1,2-dimethoxyethane, and grind and disperse with a sand grind mill. Was done.

この分散液に、先に陽極酸化被膜を設けたアルミシリン
ダーを浸漬塗布し、乾燥後の膜厚が0.4μmとなるよう
に電荷発生層を設けた。
An aluminum cylinder previously provided with an anodic oxide coating was applied by dip coating to this dispersion, and a charge generation layer was provided so that the film thickness after drying was 0.4 μm.

次にこのアルミシリンダーを、次に示されるヒドラゾン
化合物56重量部、 次に示すヒドラゾン化合物14重量部、 次のシアノ化合物1.5重量部 及びポリカーボネート樹脂(三菱化成工業(株)製、ノ
バレックス 7030A)100重量部を1,4−ジオキサン1,000
重量部に溶解させた液に浸漬塗布することにより、乾燥
後の膜厚が17μmとなるように電荷移動層を設けた。
Next, this aluminum cylinder, the hydrazone shown below
56 parts by weight of compound,14 parts by weight of the hydrazone compound shown below,1.5 parts by weight of the following cyano compoundsAnd polycarbonate resin (manufactured by Mitsubishi Kasei Co., Ltd.
Barex 7030A) 100 parts by weight of 1,4-dioxane 1,000
Dry by applying by dipping in a solution dissolved in parts by weight
A charge transfer layer was provided so that the subsequent film thickness would be 17 μm.

この様にして得られたドラムを、以下、感光体Aとす
る。
The drum thus obtained is hereinafter referred to as a photoconductor A.

製造例−2〜5 陽極酸化被膜の形成において、被膜の膜厚、高温封孔液
の濃度、温度、処理時間を表−1に示す通りに変えた以
外は、製造例1と同様に行ない感光体B〜Eを作成し
た。なお、これらの陽極酸化被膜のYm×dは表−1に示
すとおりであった。
Production Examples-2 to 5 Photosensitization was performed in the same manner as in Production Example 1 except that the film thickness of the coating, the concentration of the high-temperature sealing liquid, the temperature, and the treatment time were changed as shown in Table 1 in the formation of the anodic oxide coating. Created bodies B-E. The Ym × d of these anodized films was as shown in Table 1.

製造例6 表面を鏡面仕上げした肉厚1mmのアルミシリンダーを脱
脂剤P3T-580S(商品名、ヘンケル白水社製)の50g/l水
溶液中で60℃、5分間の脱脂洗浄を行なった。続いて水
洗を行なった後、170g/lの硫酸電解液中(溶存アルミニ
ウム濃度6g/l)で1.2A/dm2の電流密度で陽極酸化を行な
い、平均膜厚5.5μmの陽極酸化被膜を形成した。
Production Example 6 An aluminum cylinder having a mirror-finished surface and a thickness of 1 mm was degreased and washed in a 50 g / l aqueous solution of a degreasing agent P 3 T-580S (trade name, manufactured by Henkel Hakusui Co., Ltd.) at 60 ° C. for 5 minutes. Then, after washing with water, anodic oxidation was performed at a current density of 1.2 A / dm 2 in 170 g / l sulfuric acid electrolyte (dissolved aluminum concentration 6 g / l) to form an anodized film with an average film thickness of 5.5 μm. did.

次いで水洗後酢酸によりpH6.0に調製したフッ化ニッケ
ルを主成分とする封孔剤ハードウォールNo.5(日華化学
工業(株)製)の5g/l水溶液に35℃で5分間浸漬し、封
孔処理を行なった。続いて純水により十分な洗浄を行な
い乾燥した。なお、この被膜のYm×dは1.26×10
-10(S・m)であった。
Then, after rinsing with water, it was immersed in a 5 g / l aqueous solution of nickel fluoride fluoride-based sealing agent hard wall No. 5 (manufactured by Nichika Chemical Industry Co., Ltd.) adjusted to pH 6.0 with acetic acid at 35 ° C. for 5 minutes. , Sealing treatment was performed. Then, it was thoroughly washed with pure water and dried. The Ym x d of this film is 1.26 x 10
It was -10 ( Sm ).

その後は製造例1と同様に電荷発生層、電荷移動層を順
次塗布、乾燥し、感光体Fを作成した。
After that, a charge generation layer and a charge transfer layer were sequentially applied and dried in the same manner as in Production Example 1 to prepare a photoconductor F.

比較製造例−1〜3 陽極酸化被膜の形成において、被膜の膜厚、封孔液濃
度、処理温度、処理時間を表−2に示す通りに変えた以
外は、製造例−1と同様に行ない、感光体G,H,Iを作成
した。なおこれらの陽極酸化被膜のYm×dは表−2に示
すとおりであった。
Comparative Production Examples-1 to 3 The procedure of Production Example-1 was repeated except that the film thickness of the coating, the concentration of the sealing liquid, the treatment temperature, and the treatment time were changed as shown in Table 2 in the formation of the anodic oxide coating. , Photoconductors G, H, and I were prepared. The Ym × d of these anodized films was as shown in Table-2.

実施例1〜6,比較例1〜3 感光体A〜Iを、反転現像用に改造した市販の複写機に
装着し、各環境条件において画像特性を評価した。その
結果を表−3に示すが、本発明の感光体A,B,C,D,E,F,G
では、いづれの条件下でもかぶり、微小黒点のない良好
な画像が得られたが、比較例の感光体では、いづれも特
に高温、高湿下でひどいかぶりが発生し、実用に耐えな
いものであることがわかった。
Examples 1 to 6 and Comparative Examples 1 to 3 Photoreceptors A to I were mounted on a commercially available copying machine modified for reversal development, and image characteristics were evaluated under each environmental condition. The results are shown in Table-3, the photoreceptor A, B, C, D, E, F, G of the present invention
In each case, a good image without fog and fine black spots was obtained under any of the conditions.However, in each of the photoconductors of Comparative Examples, bad fog occurs especially under high temperature and high humidity, which is not practical. I knew it was.

以上の結果から明らかなように、本発明の特定の陽極酸
化被膜を使用した電子写真感光体は、良好な画像特性を
示し、優れた性能を有していることが確認された。
As is clear from the above results, it was confirmed that the electrophotographic photosensitive member using the specific anodic oxide coating of the present invention showed good image characteristics and had excellent performance.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 増田 稔 神奈川県横浜市緑区鴨志田町1000番地 三 菱化成工業株式会社総合研究所内 (56)参考文献 特開 昭54−89637(JP,A) 特開 昭61−263490(JP,A) 特開 昭61−263493(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Minoru Masuda 1000 Kamoshida-cho, Midori-ku, Yokohama-shi, Kanagawa Sanryo Kasei Kogyo Co., Ltd. (56) Reference JP-A-54-89637 (JP, A) Kai 61-263490 (JP, A) JP-A 61-263349 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】陽極酸化被膜を有するアルミニウム基体上
に、少なくとも、膜厚0.1〜1μmの電荷発生層および
電荷移動層がこの順に積層された光導電層が設けられた
電子写真感光体において、該陽極酸化被膜が封孔処理さ
れており、該陽極酸化被膜の平均膜厚をd、下記測定法
により求めたアドミッタンスをYmとした場合Ym×dが4
×10-10(S・m)以下であることを特徴とする電子写
真感光体。 〔アドミッタンスの測定法〕 25℃の環境下で、サンプルの被膜表面に、内面積133mm2
の非導電性電解セルを取り付け、3.5重量%の硫酸カリ
ウム水溶液を電解セルに満たした状態で30分間放置した
後、アドミッタンス測定器の電極の一端を素地に接続
し、一方の電極を試験液に挿入し、周波数1kHzのもとで
測定する。
1. An electrophotographic photosensitive member comprising a photoconductive layer having a film thickness of 0.1 to 1 μm and a charge transfer layer laminated in this order on an aluminum substrate having an anodized film. When the anodic oxide coating is subjected to sealing treatment, and the average film thickness of the anodic oxide coating is d and the admittance obtained by the following measurement method is Ym, Ym × d is 4
An electrophotographic photosensitive member characterized by having a density of not more than × 10 −10 (S · m). [Measurement method of admittance] The internal area of 133 mm 2
After attaching the non-conductive electrolysis cell of No. 3, and leaving it for 30 minutes while filling the electrolysis cell with 3.5 wt% potassium sulfate aqueous solution, connect one end of the electrode of the admittance measuring instrument to the substrate, and use one of the electrodes as the test solution. Insert and measure at a frequency of 1kHz.
JP63110125A 1988-05-06 1988-05-06 Electrophotographic photoreceptor Expired - Lifetime JPH07120062B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63110125A JPH07120062B2 (en) 1988-05-06 1988-05-06 Electrophotographic photoreceptor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63110125A JPH07120062B2 (en) 1988-05-06 1988-05-06 Electrophotographic photoreceptor

Publications (2)

Publication Number Publication Date
JPH01280768A JPH01280768A (en) 1989-11-10
JPH07120062B2 true JPH07120062B2 (en) 1995-12-20

Family

ID=14527663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63110125A Expired - Lifetime JPH07120062B2 (en) 1988-05-06 1988-05-06 Electrophotographic photoreceptor

Country Status (1)

Country Link
JP (1) JPH07120062B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2679253B2 (en) * 1989-06-14 1997-11-19 富士電機株式会社 Electrophotographic photoreceptor
US5284727A (en) * 1990-12-21 1994-02-08 Mita Industrial Co., Ltd. Electrophotographic element with alumite layer
JP3020334B2 (en) * 1990-12-25 2000-03-15 三田工業株式会社 Organic photoreceptor
US5723241A (en) * 1992-12-28 1998-03-03 Minolta Co., Ltd. Photosensitive member comprising thick photosensitive layer formed on anodized aluminum layer
JP2737649B2 (en) * 1994-04-26 1998-04-08 日本電気株式会社 Electrophotographic photoreceptor

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5489637A (en) * 1977-12-19 1979-07-16 Mita Industrial Co Ltd Improvement of electrophotographic method
JPH0727264B2 (en) * 1986-11-04 1995-03-29 ミノルタ株式会社 Multilayer photoconductor
JPH0727266B2 (en) * 1986-11-04 1995-03-29 ミノルタ株式会社 Multilayer photoconductor

Also Published As

Publication number Publication date
JPH01280768A (en) 1989-11-10

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