JPH0665775A - Electrodeposition method of metal - Google Patents

Electrodeposition method of metal

Info

Publication number
JPH0665775A
JPH0665775A JP22388992A JP22388992A JPH0665775A JP H0665775 A JPH0665775 A JP H0665775A JP 22388992 A JP22388992 A JP 22388992A JP 22388992 A JP22388992 A JP 22388992A JP H0665775 A JPH0665775 A JP H0665775A
Authority
JP
Japan
Prior art keywords
metal
porous
electrodeposited
electrolyte
electrodeposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22388992A
Other languages
Japanese (ja)
Other versions
JP2716325B2 (en
Inventor
Yoshiyuki Kito
義之 鬼頭
Tomoyasu Higa
智保 比嘉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IKETSUKUSU KOGYO KK
Original Assignee
IKETSUKUSU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IKETSUKUSU KOGYO KK filed Critical IKETSUKUSU KOGYO KK
Priority to JP4223889A priority Critical patent/JP2716325B2/en
Publication of JPH0665775A publication Critical patent/JPH0665775A/en
Application granted granted Critical
Publication of JP2716325B2 publication Critical patent/JP2716325B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Moulds For Moulding Plastics Or The Like (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE:To make an electrodeposition metal sufficiently porous regardless of the presence or absence of a treatment for making the surface of a work porous in the method for electrodepositing the metal on the work. CONSTITUTION:An anode and the work consisting of a metallic sheet are arranged within a plating cell (electrolyte) and a DC current is passed therebetween at the time of executing electrodeposition. The electrolyte prepd. by combining cations and anions having high ion mobility, for example, hydrobromic acid, is added to the electrolyte at this time. A large quantity of fine bubbles of gaseous hydrogen are then generated on the surface of the work regardless of the presence or absence of the treatment for forming the porous film and the metal is precipitated while the metal extends to enclose these bubbles. The porous electrodeposited nickel layer which is made sufficiently porous is thereby obtd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば電気メッキや電
鋳加工等の電着方法において、電着金属の多孔質化を図
るようにした金属の電着方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrodeposition method for electroplating, electroforming, or the like, in which the electrodeposited metal is made porous so as to be porous.

【0002】[0002]

【従来の技術】例えば電気メッキは、金属(例えばニッ
ケル)イオンを含む電解液中に、金属製あるいは表面が
導電処理された被メッキ物を陰極として配置すると共
に、例えば電着すべき金属(ニッケル)からなる陽極を
配置し、それら両極間に直流電流を流すことにより、前
記被メッキ物の表面に金属(ニッケル)を薄膜状に電着
させるものである。また、電鋳加工は、例えばプラスチ
ック製の母型の表面に導電処理を行ったものを陰極と
し、電気メッキと同様に、その表面に金属を所定厚みに
電着させた後、電着金属を母型から剥がすことにより成
形型等の求める製品を得るものである。
2. Description of the Related Art For example, in electroplating, an object to be plated made of metal or having its surface subjected to conductive treatment is placed as a cathode in an electrolytic solution containing metal (for example, nickel) ions, and the metal to be electrodeposited (nickel, for example). ) Is disposed and a direct current is passed between the both electrodes to deposit a metal (nickel) in a thin film on the surface of the object to be plated. Further, the electroforming process uses, for example, a cathode obtained by subjecting the surface of a plastic mold to a conductive treatment, and similarly to electroplating, a surface of a metal is electrodeposited to a predetermined thickness, and then an electrodeposited metal is deposited. The desired product such as a molding die is obtained by peeling it from the mother die.

【0003】このような電着の技術にあっては、電着金
属にピットが発生することを極力防止するために、電解
液にアンチピット剤を添加するなどの対策を施し、陰極
に水素の気泡が発生することを極力防止するようにして
いる。
In such an electrodeposition technique, in order to prevent the formation of pits in the electrodeposited metal as much as possible, measures such as adding an anti-pit agent to the electrolytic solution are taken, and hydrogen is added to the cathode. I try to prevent the generation of air bubbles as much as possible.

【0004】これに対し、近年では、電鋳加工により、
例えばプラスチック成形品の真空成形に使用される多孔
質の成形型を製造する技術が開発されてきている(例え
ば特開昭60−152692号,特開昭61−2533
92号公報)。この技術は、上述のような一般の電着方
法とは正反対に、成形品と同一外形を有する母型(陰
極)の表面に水素ガスの微細な気泡を多数発生させ、こ
の気泡を包み込むように金属を析出させることにより、
電着金属の多孔質化を図ろうとするものである。そのた
めに、母型に対し、その表面層を導電部と絶縁部とのい
わば微細な斑状とするポーラス化用処理を行い、導電部
と絶縁部と境界部で過電界を生じさせて水素ガスを積極
的に発生させようとするものである。
On the other hand, in recent years, by electroforming,
For example, techniques for producing a porous molding die used for vacuum molding of plastic molded products have been developed (for example, JP-A-60-152692 and JP-A-61-2533).
No. 92). This technique, contrary to the above-mentioned general electrodeposition method, generates many fine bubbles of hydrogen gas on the surface of the mother die (cathode) having the same outer shape as the molded product and wraps the bubbles. By precipitating a metal,
It is intended to make the electrodeposited metal porous. For that purpose, the mother die is subjected to a porosity-treating process in which its surface layer is in a so-called fine mottled pattern between the conductive part and the insulating part, and an over electric field is generated at the boundary part between the conductive part and the insulating part to generate hydrogen gas. It is an attempt to actively generate it.

【0005】尚、このポーラス化用処理は、母型の表面
に、導電塗料に絶縁性ラッカーを混合したスプレー液を
吹付けたり、母型の表面に銀鏡反応により導電層を形成
した後、その導電層に銀腐食剤を塗布して銀の一部を除
去するといった方法により行われるようになっている。
In this porosifying treatment, a spray liquid prepared by mixing a conductive paint with an insulating lacquer is sprayed on the surface of the mother die, or a conductive layer is formed on the surface of the mother die by a silver mirror reaction, and then the treatment is performed. This is performed by applying a silver corrosive agent to the conductive layer to remove a part of silver.

【0006】[0006]

【発明が解決しようとする課題】ところで、電着により
多孔質金属を得る技術は、上述のような真空成形用の成
形型を製造する他にも、今後、様々な分野,用途に利用
することができる可能性がある。一例を上げれば、例え
ば金属板に多孔質金属をメッキしたものを、バッテリー
の電極として利用することにより、表面積の極めて大き
な電極を得ることができ、バッテリーの高容量化や小形
化等を図ることができるのである。
By the way, the technique for obtaining a porous metal by electrodeposition should be utilized in various fields and applications in the future, in addition to the production of the above-mentioned vacuum forming mold. There is a possibility that As an example, by using a metal plate plated with a porous metal as a battery electrode, it is possible to obtain an electrode having an extremely large surface area and to achieve high capacity and downsizing of the battery. Can be done.

【0007】しかしながら、上記した従来の電鋳加工に
より多孔質成形型を製造する技術では、母型の表面に対
して、導電部と絶縁部とを微細斑状に混在させたポーラ
ス化用の処理を行うことが必須であった。このため、被
電着物が金属(導電体)である場合には、金属を多孔状
に電着させることは不可能であり、また、例えば絶縁性
の被電着物にポーラス化用処理を行った場合でも、一旦
電鋳加工を中断してしまうと、後に電鋳加工を再開して
もその後は電着金属が多孔状とならない不具合があっ
た。
However, in the above-mentioned conventional technique for producing a porous mold by electroforming, the surface of the mother die is subjected to a porous treatment in which conductive portions and insulating portions are mixed in fine spots. It was essential to do. Therefore, when the electrodeposited object is a metal (electric conductor), it is impossible to electrodeposit the metal in a porous form. Further, for example, an insulating electrodeposited object is subjected to a porosification treatment. Even in this case, once the electroforming process was interrupted, there was a problem that the electrodeposited metal did not become porous even after the electroforming process was restarted.

【0008】本発明は上記事情に鑑みてなされたもの
で、その目的は、被電着物に金属を電着させる方法にあ
って、被電着物の表面のポーラス化用処理の有無にかか
わらず、電着金属の多孔質化を十分に図ることができる
金属の電着方法を提供するにある。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a method for electrodepositing a metal on an object to be electrodeposited, regardless of whether the surface of the object to be electrodeposited is porous or not. Another object of the present invention is to provide a method for electrodepositing a metal which can sufficiently make the electrodeposited metal porous.

【0009】[0009]

【課題を解決するための手段】本発明の金属の電着方法
は、金属イオンを含む電解液中に、陽極及び被電着物を
配置し、それら陽極と被電着物との間に電流を流すこと
により、前記被電着物に金属を電着させる方法であっ
て、電解液に、イオン移動度の高い陽イオンと陰イオン
とを組合わせた電解質からなる添加剤を添加することに
より、電着金属の多孔質化を図るようにしたところに特
徴を有する。
In the method for electrodepositing a metal of the present invention, an anode and an electrodeposit are placed in an electrolytic solution containing metal ions, and an electric current is passed between the anode and the electrodeposit. A method for electrodepositing a metal on the object to be electrodeposited by adding an additive consisting of an electrolyte in which a cation and anion having high ion mobility are combined to the electrolytic solution. The feature is that the metal is made porous.

【0010】また、この場合、添加剤としてはハロゲン
化水素酸が好適である。
In this case, hydrohalic acid is preferable as the additive.

【0011】[0011]

【作用】被電着物に電着される金属を多孔質化させるに
は、被電着物の表面に水素ガス等の微細な気泡を無数に
発生させ、その気泡を包み込むようにさせながら金属を
電着させれば良い。この場合、従来では、多孔質化に必
要な気泡を発生させるためには、被電着物の表面に対し
て、導電部と絶縁部とを微細斑状に混在させたポーラス
化用処理を行うことが必須であると考えられていた。
[Function] In order to make the metal electrodeposited on the electrodeposit to be porous, an infinite number of fine bubbles such as hydrogen gas are generated on the surface of the electrodeposit and the metal is charged while enclosing the bubbles. Just wear it. In this case, conventionally, in order to generate the bubbles necessary for the porosity, the surface of the electrodeposited object may be subjected to a porosification treatment in which conductive parts and insulating parts are mixed in fine spots. Was considered essential.

【0012】これに対し、本発明者等は、そのような従
来の常識に囚われずに、電解液側において新たな手段を
講じることにより、ポーラス化用処理によらずとも、電
着金属の多孔質化に必要な気泡を発生させることを可能
にできるのではないかという着想を得、種々の実験,研
究を重ねた。その結果、電解液に、イオン移動度の高い
陽イオンと陰イオンとを組合わせた電解質からなる添加
剤を添加することにより、表面がポーラス化用処理され
た被電着物は勿論、表面全体が導電層である被電着物に
あっても、電着金属の多孔質化に必要な気泡を発生させ
ることができることを究明したのである。
On the other hand, the present inventors, without being bound by such conventional common sense, take new measures on the side of the electrolytic solution so that the porosity of the electrodeposited metal can be obtained regardless of the porous treatment. Based on the idea that it would be possible to generate the bubbles necessary for quality improvement, various experiments and studies were repeated. As a result, by adding to the electrolytic solution an additive composed of an electrolyte in which a cation and an anion having high ion mobility are combined, the surface of the entire surface is, of course, not only the object to be electrodeposited which has been treated for porosity. It has been clarified that even in the object to be electrodeposited which is a conductive layer, bubbles necessary for making the electrodeposited metal porous can be generated.

【0013】即ち、電解質からなる添加剤は、電解液中
で陽イオン及び陰イオンに電離しており、通電が開始さ
れることにより、それらイオンが夫々陰極及び陽極に引
寄せられるのであるが、それらイオンのイオン移動度が
高いため、両極におけるそれらイオンの反応が速やかに
行われるようになり、陰極即ち被電着物の表面において
多量の水素ガスが発生するようになる。従って、本発明
によれば、ポーラス化用処理の有無にかかわらず、電着
金属の十分な多孔質化に必要な気泡を発生させることが
可能となる。
That is, the additive composed of the electrolyte is ionized into cations and anions in the electrolytic solution, and when the energization is started, these ions are attracted to the cathode and the anode, respectively. Since the ions have high ion mobility, the reactions of the ions at both electrodes are promptly performed, and a large amount of hydrogen gas is generated on the surface of the cathode, that is, the surface of the electrodeposit. Therefore, according to the present invention, it is possible to generate bubbles necessary for sufficiently making the electrodeposited metal porous regardless of the presence or absence of the porous treatment.

【0014】この場合、添加剤としては、イオン移動度
の高い陽イオンと陰イオンとを組合わせた電解質であれ
ば、種々のものが使用できるが、HCl,HBr,HI
等のハロゲン化水素酸が特に好適する。
In this case, various additives can be used as the additive as long as they are electrolytes in which cations and anions having a high ion mobility are combined, but HCl, HBr, HI.
Particularly preferred are hydrohalic acids such as

【0015】[0015]

【実施例】以下、本発明の実施例について、図面を参照
しながら説明する。まず、金属薄板にニッケルの電気メ
ッキを行う場合における、本実施例の電着方法を説明す
る。図2は本実施例において使用される電気メッキ装置
1を概略的に示しており、ここで、メッキ槽2内には、
例えばスルファミン酸ニッケルを主な組成としてなる電
解液3が、所要のpH及び温度に保たれた状態で収容さ
れている。
Embodiments of the present invention will be described below with reference to the drawings. First, the electrodeposition method of the present embodiment when electroplating nickel on a thin metal plate will be described. FIG. 2 schematically shows an electroplating apparatus 1 used in this embodiment, in which the plating bath 2 contains:
For example, the electrolytic solution 3 having nickel sulfamate as a main composition is contained in a state of being maintained at a required pH and temperature.

【0016】そして、この電解液3中には、イオン移動
度の高い陽イオンと陰イオンとを組合わせた電解質から
なる添加剤例えば臭化水素酸(HBr)が、所要量(例
えば2cc/l)添加されている。
In the electrolytic solution 3, an additive such as hydrobromic acid (HBr), which is an electrolyte in which a cation having a high ion mobility and an anion are combined, is required (for example, 2 cc / l). ) Has been added.

【0017】この場合、イオン移動度の高い陽イオン及
び陰イオンとしては、次の表1に示すものが上げられ
る。
In this case, as the cations and anions having high ion mobility, those shown in Table 1 below are listed.

【0018】[0018]

【表1】 [Table 1]

【0019】添加剤としては、この表1に示された陽イ
オンと陰イオンとを組合わせた電解質であれば、どの組
合わせでも採用することができるが、水素イオンとハロ
ゲンイオンとを組合わせたHCl,HBr,HI等のハ
ロゲン化水素酸が特に好適する。
As the additive, any combination of the cations and anions shown in Table 1 can be used, but a combination of hydrogen ions and halogen ions can be used. Especially preferred are hydrohalic acids such as HCl, HBr, HI and the like.

【0020】さて、電気メッキを行うにあたっては、メ
ッキ槽2内に、ニッケルからなる陽極4を配置すると共
に、陰極として金属薄板からなる被電着物5を配置す
る。そして、それら両極4,5間に直流電源6を接続し
て所要の電流密度となるように直流電流を流す。
When performing electroplating, the anode 4 made of nickel is placed in the plating bath 2 and the electrodeposit 5 made of a thin metal plate is placed as a cathode. Then, a DC power supply 6 is connected between the both poles 4 and 5 to flow a DC current so as to obtain a required current density.

【0021】すると、電解反応により被電着物5の表面
にニッケル金属が析出し電着が行われるのであるが、こ
の際、電解液3に添加されている添加剤(臭化水素酸)
が、水素イオン及び臭素イオンに電離し、通電により、
それらイオンが夫々陰極(被電着物5)及び陽極4に引
寄せられる。このとき、それらイオンのイオン移動度が
高いため、被電着物5の表面や陽極4におけるそれらイ
オンの反応が速やかに行われるようになり、陰極即ち被
電着物5の表面において水素ガスの微細な気泡が多量に
発生するようになる。
Then, an electrolytic reaction causes nickel metal to be deposited on the surface of the material 5 to be electrodeposited for electrodeposition. At this time, an additive (hydrobromic acid) added to the electrolytic solution 3 is used.
Ionizes hydrogen ions and bromine ions, and
These ions are attracted to the cathode (electrodeposit 5) and the anode 4, respectively. At this time, since the ions have a high ion mobility, the reaction of the ions on the surface of the electrodeposited material 5 and the anode 4 is promptly performed, and the hydrogen gas on the cathode, that is, the surface of the electrodeposited material 5 becomes fine. A lot of bubbles will be generated.

【0022】ニッケルは、被電着物5の表面に付着して
いる多数個の微細な気泡を包み込むように延びながら被
電着物5の表面に析出するようになり、ニッケルの電着
が進行するに伴い、被電着物5の表面部の気泡から連続
するようにして被電着物5の外側に向けてさらに気泡が
付着し、ニッケルはさらにその気泡を包むように延びな
がら析出して行く。
Nickel comes to be deposited on the surface of the electrodeposited object 5 while extending so as to wrap around a large number of fine bubbles adhering to the surface of the electrodeposited object 5, and the nickel electrodeposition progresses. Along with this, bubbles are further attached to the outside of the electrodeposit 5 so as to be continuous from the bubbles on the surface of the electrodeposit 5, and nickel is further deposited while extending so as to wrap the bubbles.

【0023】これにて、ニッケルは被電着物5表面に多
孔状に電着されるようになり、所定厚みの電着が完了す
ることにより、図1に示すように、薄板状の被電着物5
の表面に、連続した無数の気孔7aを備えてなる多孔質
の電着金属(ニッケル)層7を一体的に有する多孔質金
属板8が得られるのである。
As a result, nickel is electrodeposited in a porous manner on the surface of the electrodeposited material 5, and when the electrodeposition of a predetermined thickness is completed, as shown in FIG. 5
Thus, the porous metal plate 8 integrally having the porous electrodeposited metal (nickel) layer 7 including the innumerable continuous pores 7a on the surface thereof is obtained.

【0024】このようにして得られた多孔質金属板8
は、例えばバッテリーの電極として利用することができ
る。この多孔質金属板8は、表面積が極めて大くなって
いるため、電極として採用すれば、バッテリーの高電圧
化,高容量化や小形化等を図ることができるのである。
この場合、焼結により多孔状としたニッケル板等がバッ
テリーの電極として従来より供されているが、本実施例
の多孔質金属板8は、それに比べて遥かに微細且つ多量
の気孔7aが形成されるため、極めて大きな表面積(例
えば平板の70〜80倍)が得られ、電極としての機能
は数段優れたものとなるのである。
The porous metal plate 8 thus obtained
Can be used, for example, as an electrode of a battery. Since the surface area of the porous metal plate 8 is extremely large, if it is used as an electrode, it is possible to increase the voltage, capacity, and size of the battery.
In this case, a nickel plate or the like made porous by sintering has been conventionally provided as an electrode of a battery, but the porous metal plate 8 of the present embodiment has much finer and larger number of pores 7a. Therefore, an extremely large surface area (for example, 70 to 80 times as large as that of a flat plate) can be obtained, and the function as an electrode becomes much superior.

【0025】このように本実施例の電着方法によれば、
電解液3に、イオン移動度の高い陽イオンと陰イオンと
を組合わせた電解質からなる添加剤を添加したことによ
り、金属板からなる被電着物5の表面にあっても、微細
で多量の気泡を発生させることが可能となった。従っ
て、従来必須と考えられていた被電着物5の表面のポー
ラス化用処理の有無にかかわらず、電着ニッケル層7の
多孔質化を十分に図ることができるものである。
As described above, according to the electrodeposition method of this embodiment,
By adding an additive composed of an electrolyte in which cations and anions having a high ion mobility are combined to the electrolytic solution 3, even if it is on the surface of the electrodeposited object 5 made of a metal plate, a large amount of fine particles can be obtained. It became possible to generate bubbles. Therefore, it is possible to sufficiently make the electrodeposited nickel layer 7 porous regardless of the presence or absence of the treatment for making the surface of the object 5 to be electrodeposited, which has been conventionally considered essential.

【0026】図3は、本発明の他の実施例を示すもので
あり、例えばプラスチック製の薄板からなる被電着物1
1の表面に金属を多孔状に電着させたものである。この
場合には、まず、被電着物11の電着を行いたい表面
に、化学メッキや蒸着等の方法により導電層12を形成
し、この後、上記実施例と同様に、添加剤を含んだ電解
液3を用いて電着を行うものである。これにて、表面に
多孔状の電着金属層13を備えたプラスチック板14を
得ることができるものである。このようにして得られた
多孔質金属層13を備えたプラスチック板14は、例え
ば高品質の電波吸収体として電波シールド等の用途に利
用することができる。
FIG. 3 shows another embodiment of the present invention. For example, the electrodeposit 1 made of a thin plastic plate.
A metal is electrodeposited on the surface of No. 1 in a porous form. In this case, first, the conductive layer 12 is formed on the surface of the object 11 to be electrodeposited by a method such as chemical plating or vapor deposition, and thereafter, an additive is added as in the above-mentioned embodiment. The electrolytic solution 3 is used for electrodeposition. In this way, the plastic plate 14 having the porous electrodeposited metal layer 13 on the surface can be obtained. The plastic plate 14 provided with the porous metal layer 13 thus obtained can be used as a high-quality radio wave absorber for applications such as radio wave shields.

【0027】そして、図4は、異なる他の実施例を示す
ものであり、被電着物として例えば注射針の如き金属製
の極細の管15の先端部に、多孔質金属層16を球状に
電着させたものである。この場合には、管15の先端部
以外の部分を例えばシリコン樹脂等でマスキングした状
態で上記と同様に電着を行わせれば良い。このようにし
て得られた球状の多孔質金属層16を先端に有する管1
5は、例えば筆記具のペン先やドットプリンタの印字ヘ
ッド等の用途に利用することができる。
FIG. 4 shows another embodiment in which a porous metal layer 16 is spherically charged at the tip of a metal-made ultrafine tube 15 such as an injection needle as an object to be electrodeposited. It is a dress. In this case, the electrodeposition may be performed in the same manner as above with the portion of the tube 15 other than the tip end portion being masked with, for example, a silicone resin. A tube 1 having a spherical porous metal layer 16 thus obtained at its tip
5 can be used, for example, as a pen tip of a writing instrument or a print head of a dot printer.

【0028】さらに、図示及び詳しい説明は省略する
が、電鋳加工により例えば真空成形用の多孔質成形型を
製造することもできる。この多孔質成形型は、成形品と
同一外形を有する被電着物たる母型の表面に、金属を多
孔状に電着させ、その後、多孔質電着金属層を母型から
剥がすことにより多孔質成形型を得ることができる。こ
の場合、電鋳加工の中断,再開が可能となる。尚、母型
の表面を導電部と絶縁部とのいわば微細な斑状とするポ
ーラス化用処理を行っておくようにすればより一層効果
的である。
Further, although illustration and detailed description are omitted, for example, a porous molding die for vacuum molding can be manufactured by electroforming. This porous mold has a porous metal by electrodepositing a metal on the surface of a master mold, which is an electrodeposit having the same outer shape as the molded product, and then peeling the porous electrodeposited metal layer from the master mold. A mold can be obtained. In this case, the electroforming process can be suspended and restarted. It is even more effective if the surface of the mother die is subjected to a porosity treatment in which the conductive portion and the insulating portion are in a so-called minute spot shape.

【0029】その他、本発明は上記し且つ図面に示した
実施例に限定されるものではなく、種々の材質や形状の
被電着物に対して、電着金属の多孔質化を図ることがで
き、その電着金属層の厚みや形状、気孔の大きさや数量
なども種々変更することができる。この場合、本発明に
よるメッキ層の表面の外観は、金属的な派手な光沢では
なく、いぶし銀の如きくすんだ落着いた色調となり、意
匠上の効果を得ることもできる。
Besides, the present invention is not limited to the embodiments described above and shown in the drawings, and it is possible to make the electrodeposited metal porous for the materials to be electrodeposited of various materials and shapes. The thickness and shape of the electrodeposited metal layer, and the size and number of pores can be variously changed. In this case, the appearance of the surface of the plating layer according to the present invention is not a metallic luster, but a dull and dull color tone like smoky silver, and a design effect can be obtained.

【0030】また、電着金属の種類としても、ニッケル
はもとより、金,銀,銅,クロム,亜鉛,錫等の様々な
ものがあるなど、本発明は要旨を逸脱しない範囲内で種
々の変形が可能である。そして、本発明の金属の電着方
法を用いて得られる製品は、今後、様々な分野,用途に
広く利用することができる可能性がある。
Further, as the kind of electrodeposited metal, not only nickel but also various kinds such as gold, silver, copper, chromium, zinc, tin, etc. are variously modified without departing from the scope of the present invention. Is possible. The product obtained by using the metal electrodeposition method of the present invention may be widely used in various fields and applications in the future.

【0031】[0031]

【発明の効果】以上の説明にて明らかなように、本発明
の金属の電着方法によれば、電解液にイオン移動度の高
い陽イオンと陰イオンとを組合わせた電解質からなる添
加剤を添加するようにしたので、被電着物の表面のポー
ラス化用処理の有無にかかわらず、電着金属の多孔質化
を十分に図ることができ、その製品は広い用途に利用す
ることができるという優れた効果を奏するものである。
As is clear from the above description, according to the metal electrodeposition method of the present invention, an additive composed of an electrolyte in which a cation and an anion having high ion mobility are combined in an electrolytic solution. Since it is added, it is possible to sufficiently make the electrodeposited metal porous regardless of the presence or absence of the treatment for making the surface of the electrodeposited substance porous, and the product can be used for a wide range of purposes. That is an excellent effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示すもので、多孔質金属板
の部分的な拡大縦断面図
FIG. 1 is a partial enlarged vertical sectional view of a porous metal plate showing an embodiment of the present invention.

【図2】電気メッキ装置を概略的に示す図FIG. 2 is a diagram schematically showing an electroplating apparatus.

【図3】本発明の他の実施例を示すプラスチック板の部
分的な拡大縦断面図
FIG. 3 is a partially enlarged vertical sectional view of a plastic plate showing another embodiment of the present invention.

【図4】異なる他の実施例を示す拡大正面図FIG. 4 is an enlarged front view showing another different embodiment.

【符号の説明】[Explanation of symbols]

図面中、1は電気メッキ装置、2はメッキ槽、3は電解
液、4は陽極、5,11,15は被電着物、6は直流電
源、7,13,16は多孔質電着金属層、8は多孔質金
属板、12は導電層を示す。
In the drawing, 1 is an electroplating apparatus, 2 is a plating tank, 3 is an electrolytic solution, 4 is an anode, 5, 11 and 15 are electrodeposits, 6 is a DC power source, and 7, 13 and 16 are porous electrodeposited metal layers. , 8 is a porous metal plate, and 12 is a conductive layer.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属イオンを含む電解液中に、陽極及び
被電着物を配置し、それら陽極と被電着物との間に電流
を流すことにより、前記被電着物に金属を電着させる方
法において、前記電解液に、イオン移動度の高い陽イオ
ンと陰イオンとを組合わせた電解質からなる添加剤を添
加することにより、電着金属の多孔質化を図るようにし
たことを特徴とする金属の電着方法。
1. A method of depositing a metal on an electrodeposited material by placing an anode and an electrodeposited material in an electrolytic solution containing metal ions and applying a current between the anode and the electrodeposited material. In addition, in the electrolytic solution, by adding an additive comprising an electrolyte in which a cation and an anion having high ion mobility are combined, the electrodeposited metal is made porous. Metal electrodeposition method.
【請求項2】 添加剤は、ハロゲン化水素酸からなるこ
とを特徴とする請求項1記載の金属の電着方法。
2. The method for electrodepositing a metal according to claim 1, wherein the additive comprises hydrohalic acid.
JP4223889A 1992-08-24 1992-08-24 Metal electrodeposition method Expired - Fee Related JP2716325B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4223889A JP2716325B2 (en) 1992-08-24 1992-08-24 Metal electrodeposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4223889A JP2716325B2 (en) 1992-08-24 1992-08-24 Metal electrodeposition method

Publications (2)

Publication Number Publication Date
JPH0665775A true JPH0665775A (en) 1994-03-08
JP2716325B2 JP2716325B2 (en) 1998-02-18

Family

ID=16805300

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2716325B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009220397A (en) * 2008-03-17 2009-10-01 Murata Mfg Co Ltd Mold for imprinting and method for imprinting using the same
JP2014508399A (en) * 2011-01-06 2014-04-03 ソンギュングヮン ユニバーシティ ファウンデーション フォー コーポレート コラボレーション Nanoporous electrode for supercapacitor and method for producing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102330119A (en) * 2011-10-12 2012-01-25 电子科技大学 Method for preparing high-purity porous iron film by adopting electrochemical method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5824519A (en) * 1981-08-06 1983-02-14 Masatoshi Yamato Antiallergic
JPS6256959A (en) * 1985-09-06 1987-03-12 Chiyuugai Shashin Yakuhin Kk Developer for silver halide photographic sensitive material
JPS62228497A (en) * 1986-02-27 1987-10-07 Nippon Mining Co Ltd Cobalt-nickel alloy striking solution
JPH0214434A (en) * 1988-06-30 1990-01-18 Toshiba Corp Focus controller

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5824519A (en) * 1981-08-06 1983-02-14 Masatoshi Yamato Antiallergic
JPS6256959A (en) * 1985-09-06 1987-03-12 Chiyuugai Shashin Yakuhin Kk Developer for silver halide photographic sensitive material
JPS62228497A (en) * 1986-02-27 1987-10-07 Nippon Mining Co Ltd Cobalt-nickel alloy striking solution
JPH0214434A (en) * 1988-06-30 1990-01-18 Toshiba Corp Focus controller

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009220397A (en) * 2008-03-17 2009-10-01 Murata Mfg Co Ltd Mold for imprinting and method for imprinting using the same
JP2014508399A (en) * 2011-01-06 2014-04-03 ソンギュングヮン ユニバーシティ ファウンデーション フォー コーポレート コラボレーション Nanoporous electrode for supercapacitor and method for producing the same
US9847183B2 (en) 2011-01-06 2017-12-19 Sungkyunkwan University Foundation For Corporate Collaboration Nano-porous electrode for super capacitor and manufacturing method thereof

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