JPH0653113A - Scanning projection aligner - Google Patents

Scanning projection aligner

Info

Publication number
JPH0653113A
JPH0653113A JP20463892A JP20463892A JPH0653113A JP H0653113 A JPH0653113 A JP H0653113A JP 20463892 A JP20463892 A JP 20463892A JP 20463892 A JP20463892 A JP 20463892A JP H0653113 A JPH0653113 A JP H0653113A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
scanning
mask
substrate
mirror
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20463892A
Other languages
Japanese (ja)
Inventor
Yoshio Mochida
Masaki Suzuki
Toshiyuki Watanabe
省郎 持田
利幸 渡辺
正樹 鈴木
Original Assignee
Matsushita Electric Ind Co Ltd
松下電器産業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70791Large workpieces, e.g. in the shape of web or polygon

Abstract

PURPOSE:To expose a large substrate easily and to eliminate a pattern distortion caused by yawing and rolling in scanning, in a scanning projection aligner which is used for manufacturing a semiconductor and a substrate of a liquid crystal display. CONSTITUTION:This equipment is constituted of a device for casting light from a light source 8 on a mask 11, two concave mirrors 13 and 15, one plane mirror 12, one convex mirror 14 and one right and left reversal mirror 16. This equipment has a 1:1 erect projection optical system which projects a pattern of the mask 11 on a substrate 17, a mechanism for holding the mask 11 and the substrate 17 without changing a relative position of the two, and a scanning device for letting this holding device make a scanning as one body.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、半導体や液晶表示装置基板の製造などに用いられる走査投影露光装置に関する。 The present invention relates to a scanning projection exposure apparatus used for semiconductors and the manufacture of liquid crystal display device substrate.

【0002】 [0002]

【従来の技術】一般に半導体や液晶表示装置基板などの製造においては走査投影露光装置により露光処理をしている。 It is an exposure process by a scanning projection exposure apparatus in the manufacture of such Related Art Generally a semiconductor or a liquid crystal display device substrate.

【0003】図7は、従来の走査投影露光装置の概略構成を示すものである。 [0003] Figure 7 shows a schematic configuration of a conventional scanning projection exposure apparatus. 図中の1は照明光学系であり、水銀灯1aと各種の光学部品を備え、水銀灯1aより円弧スリット1bを通してマスク2に、図8に示すような円弧状照明光を照射するようにしている。 1 in the drawing is illumination optical system, comprising a mercury lamp 1a and various optical components, the mask 2 through the arc slit 1b than mercury lamp 1a, so that irradiates the arcuate illumination light as shown in FIG.

【0004】円弧状に照明されたマスク2のパターンは、台形ミラー3、凹面鏡4、および凸面鏡5で構成される投影光学系を経て、基板6植えに投影される。 [0004] pattern of the mask 2 is illuminated in an arcuate shape, a trapezoidal mirror 3, the concave mirror 4, and via the constructed projection optical system in a convex mirror 5 and projected onto a planting substrate 6. したがって、基板6上に投影される像の領域は円弧状となる。 Therefore, the area of ​​the image projected on the substrate 6 is arcuate. 前記マスク2はキャリッジ7の上端に、また基板6 The upper end of the mask 2 the carriage 7, also the substrate 6
はキャリッジ7の下端に保持されており、キャリッジ7 Is held at the lower end of the carriage 7, the carriage 7
をB方向に走査することにより、マスク2上の全パターンを基板6上に露光するようなっている。 The by scanning in the direction B, which is to expose the entire pattern on the mask 2 on the substrate 6.

【0005】 [0005]

【発明が解決しようとする課題】しかしながら、上記のような構成では、大型基板を露光する場合、露光エリア全面をカバーするためにおおよそ基板幅の2倍程度の直径を持つ大口径凹面鏡などの大型光学部品を必要とするため製作が難しく高価である。 However [0005] In the above configuration, when exposing a large substrate, a large such as a large-diameter concave mirror having an approximate diameter of about twice the width of the substrate to cover the exposure area over the entire surface manufacture because it requires optical components is difficult and expensive. さらには、倒立光学系であるため、キャリッジの直線走査のヨーイングおよび横振れが露光のパターン歪となってしまうという問題点を有していた。 Furthermore, since an inverted optical system, the shake yawing and lateral linear scan of the carriage had a problem that a pattern distortion of exposure.

【0006】本発明は、上記問題点に鑑み、製作が容易で、低コストであり、大型基板の露光が簡単に行え、走査のヨーイングや横振れがパターン歪とならない走査投影露光装置を提供することを目的とするものである。 [0006] The present invention has been made in view of the above problems, easy manufacture, low cost, the exposure of the large substrate is easy, shake yawing and lateral scanning is to provide a scanning projection exposure apparatus that do not pattern distortion it is an object of the present invention.

【0007】 [0007]

【課題を解決するための手段】上記目的を達成するために本発明の走査投影露光装置は、光源と、その光をマスクに照射する手段と、2個の凹面鏡と1個の平面鏡と1 Scanning projection exposure apparatus of the present invention in order to achieve the above object In order to achieve the above, a light source, a means for irradiating the light to the mask, and two concave mirrors and one plane mirror 1
個の凸面鏡と1個の左右反転鏡により構成され、前記マスクのパターンを基板に投影するに1正立投影光学系と、前記マスクおよび基板を相対位置を変えずに保持する保持機構と、前記保持機構を一体的に走査運動させる走査手段とを備えた構成とするものである。 Is composed of pieces of the convex mirror and one horizontally inverted mirror 1 and erecting projection optical system for projecting a pattern of the mask on the substrate, a holding mechanism for holding the mask and the substrate without changing the relative position, wherein a holding mechanism in which a structure in which a scanning means for integrally scanning motion.

【0008】 [0008]

【作用】上記した構成において、マスクおよび基板を相対位置を変えずに走査運動させることにより、光を照射されたマスクの部分パターンの像を基板全面にわたって1:1に投影露光する。 [Action] In the above configuration, by scanning motion of the mask and the substrate without changing the relative position, 1 the image of the partial pattern of the mask is irradiated with light over the entire surface of the substrate: projection exposure to 1. そして1:1正立投影光学系を用いるため、走査のヨーイングや横振れがパターン歪とならないこととなる。 The 1: 1 for using the erecting projection optical system, so that the deflection yawing and lateral scanning is not a pattern distortion.

【0009】 [0009]

【実施例】以下、本発明の走査投影露光装置について、 EXAMPLES Hereinafter, the scanning projection exposure apparatus of the present invention,
図1〜図4を参照しながら説明する。 With reference to FIGS. 1 to 4 will be described.

【0010】図1は、本発明の第1の実施例の走査投影露光装置である。 [0010] Figure 1 is a scanning projection exposure apparatus of the first embodiment of the present invention. 図中の8は光源である水銀灯であり、 8 in the figure is a mercury lamp as a light source,
この水銀灯8の光を反射するように熱線透過型の楕円面反射鏡9を関係づけている。 Implicate the elliptical reflecting mirror 9 of the heat ray transmissive so as to reflect the light of the mercury lamp 8. 楕円面反射鏡9で反射された光は集光光学系10を介して、マスク11に投射されるようになっている。 The light reflected by the elliptical reflecting mirror 9 via the condensing optical system 10, and is projected to the mask 11. マスクのパターン情報を含んだ光は平面鏡12、凹面鏡13、凸面鏡14、凹面鏡15、 Light including the pattern information of the mask plane mirror 12, a concave mirror 13, convex mirror 14, a concave mirror 15,
左右反転鏡16を介して基板17に投射されるようになっている。 It is adapted to be projected to the substrate 17 via a mirror reversed mirror 16. すなわち前記の12〜16で1:1正立投影光学系を構成している。 That is, 12 to 16 of the constituting a 1: 1 erecting projection optical system. この1:1正立投影光学系は図4に示すように、O 2は、凸面鏡14の光軸33上に位置する凸面鏡14の曲率半径rの中心となっており、前記凹面鏡13および15は、曲率半径Rが等しくかつ曲率半径の中心がO 1の位置で一致するが、O 1は前記凸面鏡の光軸33上からわずかだけずらした位置に配置されている。 The 1: 1 erecting projection optical system, as shown in FIG. 4, O 2 is the heart of the radius of curvature r of the convex mirror 14 located on the optical axis 33 of the convex mirror 14, the concave mirror 13 and 15 Although the radius of curvature R is equal and the radius of curvature of the center coincides with the position of O 1, O 1 is disposed only slightly offset position from the optical axis 33 of the convex mirror.

【0011】前記マスク11は支持部材18に支持固定されており、前記基板17は支持部材19で支持固定されている。 [0011] The mask 11 is supported by and fixed to the support member 18, the substrate 17 is supported and fixed by the supporting member 19. そしてこれに支持部材18,19は回転軸2 And to this supporting member 18 and 19 is the rotation axis 2
0に一体的に固定されている。 It is integrally fixed to 0. 前記回転軸20は、キャリッジ23に回転軸受22により回転可能に取り付けられている。 The rotary shaft 20 is rotatably mounted by a rotary bearing 22 on the carriage 23. 前記回転軸20はモータ21で回転させられるようになっており、前記キャリッジ23は別のモータ24によりボールねじ34を介してX方向に直動駆動されるようになっている。 The rotary shaft 20 is adapted to have adapted to be rotated by the motor 21, the carriage 23 is linear driven in the X direction via the ball screw 34 by a separate motor 24.

【0012】なお図2は、図1のCC断面図であり、2 [0012] Note that FIG. 2 is a CC sectional view of FIG. 1, 2
5は前記集光光学系10から照射された、マスク11上の照明スポットである。 5 emitted from the light converging optical system 10, an illumination spot on the mask 11. 図3は、前記左右反転鏡の作用説明図であり、図2および図3におけるRは、光学系内での像の向きを表現するための記号である。 Figure 3 is a view illustrating the operation of the left and right reversed mirror, R in FIG. 2 and FIG. 3 is a symbol for representing the orientation of the image in the optical system.

【0013】以上のように構成された走査投影露光装置についてその動作を説明する。 [0013] The constructed scanning projection exposure apparatus as described above will be described the operation. 水銀灯8から出た光は、 The light emitted from the mercury lamp 8,
楕円面反射鏡9および集光光学系10により集光され、 Is condensed by the elliptical reflecting mirror 9 and the condensing optical system 10,
マスク11の下面上に照明スポット25を形成する。 Forming the illumination spot 25 on the lower surface of the mask 11. 照明スポット25内のマスクパターン情報を含んだ光は、 Light including a mask pattern information in the illumination spot 25,
次に平面鏡12で反射して凹面鏡13、凸面鏡14、凹面鏡15、左右反転鏡16を経て、基板17の上面に前記マスク11の部分パターンの像を結ぶ。 Then the concave mirror 13 is reflected by the flat mirror 12, convex mirror 14, a concave mirror 15, through the horizontally inverted mirror 16, forms an image of the partial pattern of the mask 11 on the upper surface of the substrate 17. このとき、図2で示される照明スポット25内のマスクパターンは、 At this time, the mask pattern in the illumination spot 25 shown in Figure 2,
凹面鏡15で反射した後は図3で示されるように左右が反転しており、左右反転鏡16により正立像に変換して基板17上に投影される。 After being reflected by the concave mirror 15 left and right are reversed as shown in Figure 3, is projected by the mirror-reversed mirror 16 is converted into an erect image on the substrate 17. 前記マスク11および基板1 The mask 11 and the substrate 1
7は、支持部材18,19および回転軸20により相対位置が変化しないよう一体的に支持されており、モータ21によりθ方向に回転走査されると同時にモータ24 7, the support members 18, 19 and the rotary shaft 20 and the relative position is integrally supported so as not to change, the motor 24 at the same time is rotated scanned in θ direction by the motor 21
によりX方向に直線走査される。 It is linearly scanned in the X direction by. したがって、照明スポット25はマスク11の全面を走査し、基板17上にはマスク11の全パターンが露光されることになる。 Accordingly, illumination spot 25 scans the entire surface of the mask 11, the entire pattern of the mask 11 is to be exposed on the substrate 17. また、本実施例では図1、図2に示すように、マスク1 Further, FIG. 1 in the present embodiment, as shown in FIG. 2, the mask 1
1、基板17を同時に複数処理できるよう構成されている。 1 is configured to the substrate 17 can more processed simultaneously.

【0014】また、図4に示すように、凹面鏡13,1 Further, as shown in FIG. 4, the concave mirror 13, 1
5の曲率半径の中心O 1を凸面鏡の光軸からわずかずらすことにより、投影光学系の非点隔差を小さくでき、焦点深度を大きくすることができる。 The center of curvature O 1 of radius 5 by slightly shifting it from the optical axis of the convex mirror, can be reduced astigmatism of the projection optical system, it is possible to increase the depth of focus.

【0015】以上のように、本実施例によれば、光源と、その光をマスクに照射する手段と、2個の凹面鏡と1個の平面鏡と1個の凸面鏡と1個の左右反転鏡よりなり、前記マスクのパターンを基板に投影する1:1正立投影光学系と、前記マスクおよび基板を相対位置を変えずに保持する保持機構と、前記保持機構を一体的に走査運動させる回転走査機構および直線走査機構を備えたことにより、以下のような優れた効果を有する。 [0015] As described above, according to this embodiment, a light source, a means for irradiating the light to the mask, than two concave mirrors and one flat mirror and one convex mirror and one mirror-reversed mirror becomes, 1 projects the pattern of the mask on the substrate: 1 and erecting projection optical system, a holding mechanism for holding the mask and the substrate without changing the relative position, rotational scanning for integrally scanning motion of the holding mechanism by including a mechanism and a linear scanning mechanism, having the following excellent effects.

【0016】1)投影光学系および照明光学系を構成する光学部品は、小さなものでよいので、製作が容易で安価である。 [0016] 1) optical components constituting the projection optical system and the illumination optical system, since it is small, it is easy and inexpensive manufacture. 2)露光の領域が光学系の大きさに制限されず、また、 2) region of exposure is not limited to the size of the optical system, also,
非点隔差が小さく焦点深度が大きいので、大型基板の投影露光が容易に行える。 Since astigmatism is small depth of focus is large, the projection exposure of the large substrate can be easily.

【0017】3)1度に複数の基板を処理できるので、 [0017] 3) it is possible to process a plurality of substrates at a time,
生産性が高い。 Productivity is high. 4)1:1正立投影光学系であるため、走査のヨーイングおよび横振れが露光のパターン歪とならない。 4) 1: 1 because it is erecting projection optical system, the shake yawing and lateral scanning is not a pattern distortion of exposure.

【0018】次に本発明の第2の実施例について図5および図6を参照しながら説明する。 [0018] will be described with reference to FIGS. 5 and 6 a second embodiment of the present invention. 図5は、本発明の第2の実施例における走査投影露光装置である。 Figure 5 is a scanning projection exposure apparatus according to a second embodiment of the present invention. この実施例において、照明光学系(8〜10)および1:1正立投影光学系(12〜16)は第1の実施例と全く同様である。 In this embodiment, the illumination optical system (8-10) and 1: 1 erecting projection optical system (12-16) is exactly the same as the first embodiment. そして、この実施例の特徴的構成は、マスク26 The characteristic structure of this embodiment, the mask 26
と基板27を相対位置を変えずに一体的に支持しているコ字状の支持部材を用いたこと、モーター30により図6のY方向に直線駆動されるYステージ29と、モータ32により図6のX方向に直線駆動されるXステージ3 Figure and for the use of U-shaped support member that is integrally supported without changing the relative position of the substrate 27, a Y stage 29 that is linearly driven in the Y direction in FIG. 6 by the motor 30, the motor 32 6 X stage 3 is linearly driven in the X direction
1を設けたことにある。 It lies in the provision of the 1. 図中の25は前記マスク26の下面上に照射された照明スポットである。 25 in the figure denotes an illumination spot irradiated on the lower surface of the mask 26.

【0019】以上のように構成された走査投影露光装置についてその動作を説明する。 [0019] The constructed scanning projection exposure apparatus as described above will be described the operation. 照明光学系(8〜10) The illumination optical system (8-10)
および1:1正立投影光学系(12〜16)については、第1の実施例と全く同様である。 And 1: 1 for erecting a projection optical system (12-16) is the same as the first embodiment. 前記マスク26および基板27は、支持部材28で、相対位置が変化しないよう一体的に支持されており、モータ30、ボールねじ35およびモータ32、ボールねじ36によりY,X The mask 26 and the substrate 27, the support member 28, the relative positions are integrally supported so as not to change, the motor 30, Y by a ball screw 35 and the motor 32, the ball screw 36, X
方向に直線走査される。 It is linearly scanned in a direction. たとえば図6のように、X,Y For example, as in FIG. 6, X, Y
方向に交互に走査運動させれば渦巻状の走査となり、前記照明スポット25はマスク26の全面を走査し、基板27上にはマスク26の全パターンが露光されることになる。 Be scanned motion alternately in a direction becomes spiral scan, the illumination spot 25 scans the entire surface of the mask 26, the entire pattern of the mask 26 is to be exposed on the substrate 27.

【0020】以上のように、本実施例によれば、光源8 [0020] As described above, according to this embodiment, the light source 8
と、その光をマスク26に照射する手段と、2個の凹面鏡13,15と1個の平面鏡12と1個の凸面鏡14と1個の左右反転鏡16により構成される1:1正立投影光学系と、前記マスク26および基板27を相対位置を変えずに保持する保持機構と、前記保持機構を一体的に走査運動させる2つの直線走査機構を備えたことにより、本発明の第1の実施例とほぼ同様の効果が得られる他に、大型基板の露光を行う場合でも装置が小さくすみ、安価で製作できるという特有の効果を有する。 When the means for irradiating the light to the mask 26, composed of two concave mirrors 13, 15 and one planar mirror 12 and one convex mirror 14 and one horizontally inverted mirror 16 1: 1 erecting projection an optical system, a holding mechanism for holding the mask 26 and the substrate 27 without changing the relative position, by having the two linear scan mechanism which integrally scanning motion of the holding mechanism, the first of the present invention Besides obtained almost the same effects as in example, corner small device even when performing exposure of a large substrate, having a unique advantageous effect that can be manufactured at low cost.

【0021】なお第1、第2の実施例において、照明スポット25を形成するのに楕円面反射鏡9と屈折光学系よりなる集光光学系10を用いているが、要は光源である水銀灯8の光をマスク11,26の下面上に集光させればよく、他の光学部品を用いても同様の効果を奏する。 [0021] In the first and second embodiments, a mercury lamp is used a condensing optical system 10 and the elliptical reflecting mirror 9 made of the refractive optical system to form the illumination spot 25, a short light source 8 of the light it is sufficient condensed on the lower surface of the mask 11 and 26, even using the other optical components the same effect.

【0022】また、第1、第2の実施例において、光源は水銀灯としているが、たとえばエキシマレーザー光源、キセノンランプ、太陽光など、他の光源でも全く同様の効果を奏する。 [0022] In the first and second embodiments, the light source has been a mercury lamp exhibits for example excimer laser light source, a xenon lamp, such as sunlight, the same effect in other sources.

【0023】また、第1、第2の実施例において、光学系(8〜16)を固定してマスク11,26と基板1 Further, first, in the second embodiment, the mask 11 and 26 to fix the optical system (8-16) and the substrate 1
7,27を一体的に走査運動させているが、逆にマスクと基板を固定して光学系を走査運動させても全く同様の効果を奏する。 7 and 27 are integrally by scanning motion, but exhibits the same effect even by scanning motion of the optical system by a mask and the substrate was fixed to the reverse.

【0024】また、第1の実施例で、マスク11と基板17を4組としているが、これは1組あるいは4以外の複数でもよい。 Further, in the first embodiment, although the mask 11 and the substrate 17 four sets and, which may be a plurality of non-pair or 4. また、第1、第2の実施例において、マスク11,26と基板16,27は機械的に結合されて一体的に走査運動しているが、これはたとえば複数の駆動系により別々に走査運動させ、電気的に同期させても同様の効果が得られる。 The first, in the second embodiment, the mask 11, 26 and the substrate 16, 27 is being scanned motion integrally are mechanically coupled, which is for example separately scanning motion by a plurality of drive systems is, the same effect can be obtained by electrically synchronized.

【0025】 [0025]

【発明の効果】以上の実施例の説明より明らかなように、本発明の走査投影露光装置は、光源と、その光をマスクに照射する手段と、2個の凹面鏡と1個の平面鏡と1個の凸面鏡と1個の左右反転鏡により構成され、マスクパターンを基板に投影する1:1正立投影光学系と、 As apparent from the above description of the embodiments according to the present invention, the scanning projection exposure apparatus of the present invention includes a light source, a means for irradiating the light to the mask, and two concave mirrors and one plane mirror 1 is composed of pieces of the convex mirror and one horizontally inverted mirror 1 for projecting a mask pattern on a substrate: and 1 erecting projection optical system,
前記マスクおよび基板を相対位置を変えずに保持する保持機構と、前記保持機構または光学系を一体的に走査運動させる走査手段とを備えたことにより、小型の光学部品で構成でき、製作が容易で安価であり、大型基板の露光が容易に行え、また、1:1正立投影光学系を用いるため、走査のヨーイングや横振れがパターン歪とならないという優れた効果が得られる。 A holding mechanism for holding the mask and the substrate without changing the relative position, by providing a scanning means for integrally scanning motion of the holding mechanism or an optical system, can be configured in compact optical component, facilitates manufacture in inexpensive, exposure of the large substrate is easily performed, and 1: 1 for using the erecting projection optical system, an excellent effect that deflection yawing and lateral scanning is not a pattern distortion is obtained.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の第1の実施例の走査投影露光装置の構成図 Configuration diagram of a scanning projection exposure apparatus of a first embodiment of the present invention; FIG

【図2】図1のC−C断面矢視図 [Figure 2] section C-C arrow view of FIG. 1

【図3】左右反転鏡の説明図 FIG. 3 is an explanatory view of the left and right reversed mirror

【図4】凹面鏡と凸面鏡の配置図 [Figure 4] layout view of a concave mirror and a convex mirror

【図5】本発明の第2の実施例の走査投影露光装置の構成図 Configuration diagram of a scanning projection exposure apparatus of the second embodiment of the present invention; FIG

【図6】図5のD−D断面矢視図 [6] D-D cross-sectional arrow view of FIG. 5

【図7】従来の走査投影露光装置の1例を示す構成図 Figure 7 is a configuration diagram showing an example of a conventional scanning projection exposure apparatus

【図8】同露光パターンを示す平面図 Figure 8 is a plan view showing the same exposure pattern

【符号の説明】 DESCRIPTION OF SYMBOLS

8 水銀灯(光源) 11 マスク 12 平面鏡 13,15 凹面鏡 14 凸面鏡 16 左右反転鏡 17 基板 18,19 支持部材 23 キャリッジ 8 mercury lamp (light source) 11 mask 12 plane mirror 13, 15 a concave mirror 14 convex mirror 16 Mirror mirror 17 substrate 18, 19 support member 23 carriage

Claims (4)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 光源と、その光をマスクに照射する手段と、2個の凹面鏡と1個の平面鏡と1個の凸面鏡と1個の左右反転鏡により構成され、マスクのパターンを基板に投影する1:1正立投影光学系と、前記マスクおよび基板を相対位置を変えずに保持する保持機構と、前記保持機構または光学系を一体的に走査運動させる走査手段よりなる走査投影露光装置。 And 1. A light source, and means for irradiating the light to the mask, is constituted by two concave mirrors and one flat mirror and one convex mirror and one horizontally inverted mirror, projecting a pattern of a mask onto a substrate to 1: 1 erecting projection optics and system, and a holding mechanism for holding the mask and the substrate without changing the relative position, a scanning projection exposure apparatus comprising the scanning means for integrally scanning motion of the holding mechanism or an optical system.
  2. 【請求項2】 1:1正立投影光学系において、2つの凹面鏡の曲率が等しく、かつ曲率中心が合致するように配置され、前記2つの凹面鏡の曲率中心が凸面鏡の光軸上に位置しないように配置された請求項1記載の走査投影露光装置。 2. A 1: 1 erecting projection optical system, equal curvature of the two concave mirrors, and the center of curvature is arranged to match, the center of curvature of the two concave mirrors is not located on the optical axis of the convex mirror scanning projection exposure apparatus arranged according to claim 1 as.
  3. 【請求項3】 走査手段が、回転運動系と直線運動系により構成された請求項1記載の走査投影露光装置。 Wherein the scanning means, rotational movement system and the scanning projection exposure apparatus according to claim 1, wherein which is constituted by the linear motor system.
  4. 【請求項4】 走査手段が、直交する2つの直線運動系により構成された請求項1記載の走査投影露光装置。 4. A scanning means, the scanning projection exposure apparatus constructed according to claim 1, wherein the two orthogonal linear motion system.
JP20463892A 1992-07-31 1992-07-31 Scanning projection aligner Pending JPH0653113A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20463892A JPH0653113A (en) 1992-07-31 1992-07-31 Scanning projection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20463892A JPH0653113A (en) 1992-07-31 1992-07-31 Scanning projection aligner

Publications (1)

Publication Number Publication Date
JPH0653113A true true JPH0653113A (en) 1994-02-25

Family

ID=16493797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20463892A Pending JPH0653113A (en) 1992-07-31 1992-07-31 Scanning projection aligner

Country Status (1)

Country Link
JP (1) JPH0653113A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
JP2008233932A (en) * 2003-06-30 2008-10-02 Asml Holding Nv Exposure system for manufacturing flat panel display, and unit magnification ring-shaped optical system for manufacturing flat panel display
CN104864241A (en) * 2015-05-28 2015-08-26 周子涵 Swinging moving displayer platform

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US6351305B1 (en) 1993-06-30 2002-02-26 Nikon Corporation Exposure apparatus and exposure method for transferring pattern onto a substrate
US6480262B1 (en) 1993-06-30 2002-11-12 Nikon Corporation Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein
US6509954B1 (en) 1993-06-30 2003-01-21 Nikon Corporation Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
US6556278B1 (en) 1993-06-30 2003-04-29 Nikon Corporation Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
US6795169B2 (en) 1993-06-30 2004-09-21 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP2008233932A (en) * 2003-06-30 2008-10-02 Asml Holding Nv Exposure system for manufacturing flat panel display, and unit magnification ring-shaped optical system for manufacturing flat panel display
CN104864241A (en) * 2015-05-28 2015-08-26 周子涵 Swinging moving displayer platform

Similar Documents

Publication Publication Date Title
US5459539A (en) Optical projection apparatus
US3951546A (en) Three-fold mirror assembly for a scanning projection system
US4023126A (en) Scanning photographic printer for integrated circuits
US4844568A (en) Scanning type projection exposure system
US5610754A (en) Method and apparatus for photolithography by rotational scanning
JP2004519850A (en) A method and apparatus for exposing a dual reticle image
US6552779B2 (en) Flying image of a maskless exposure system
JPH07201723A (en) Aligning method and device
US7030962B2 (en) Projection exposure mask, projection exposure apparatus, and projection exposure method
JPH08330220A (en) Scanning exposure device
JP2005166871A (en) Illumination optical device, projection aligner, exposure method and device manufacturing method
US6411362B2 (en) Rotational mask scanning exposure method and apparatus
JPS6312134A (en) Exposure apparatus
US20020092993A1 (en) Scaling method for a digital photolithography system
JPH10284408A (en) Exposure method
US6666560B2 (en) Reflection type demagnification optical system, exposure apparatus, and device fabricating method
KR20010051438A (en) Illumination optical apparatus, exposure apparatus having the same and micro device manufacturing method using the same
US6271514B1 (en) Multi-beam scanner including a dove prism array
JP2000058442A (en) Lithographic projection apparatus
WO1993009469A1 (en) Exposure device
US3884573A (en) Apparatus for high resolution projection printing
US5159483A (en) Projecting and exposing device
JP2001110707A (en) Optical system of peripheral aligner
US5414239A (en) Optical apparatus for laser machining
CN1461973A (en) Lighting optical device, exposure device and exposure method