JPH06196614A - Lead frame - Google Patents

Lead frame

Info

Publication number
JPH06196614A
JPH06196614A JP43A JP34428092A JPH06196614A JP H06196614 A JPH06196614 A JP H06196614A JP 43 A JP43 A JP 43A JP 34428092 A JP34428092 A JP 34428092A JP H06196614 A JPH06196614 A JP H06196614A
Authority
JP
Japan
Prior art keywords
semiconductor device
lead frame
stress
adhesive layer
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP43A
Other languages
Japanese (ja)
Inventor
Hisaharu Sakamoto
本 久 晴 阪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP43A priority Critical patent/JPH06196614A/en
Publication of JPH06196614A publication Critical patent/JPH06196614A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PURPOSE:To provide a lead frame having excellent stress resisting crack property, maintaining property of a lead shape, mechanical strength and heat dissipation property. CONSTITUTION:A heat dissipating base stage 4, a stress buffering member 6, which is bonded on the upper part of the heat dissipating base stage 4 through an insulating bonding layer 5, and an outer lead member 9 comprising rigid metal, which is bonded to the edge part of the heat dissipating base stage 4 with an insulating bonding agent 5, are provided. A semiconductor device is fixed on the upper part of the stress buffering member 6 through a bonding agent layer 10. A lead frame is constituted of these parts.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、リードフレームに関
し、特に、耐応力クラック性、リード形状の保持性、機
械的強度および放熱性に優れたリードフレームに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lead frame, and more particularly to a lead frame which is excellent in stress crack resistance, lead shape retention, mechanical strength and heat dissipation.

【0002】[0002]

【従来の技術】IC、LSI等の半導体装置は、リード
フレームに搭載され、さらに金属、セラミックまたは樹
脂からなるハウジング内に収納されたり、あるいは全体
を樹脂モールドにより封止されたパッケージとして実用
に供される。このパッケージは、プリント配線板等に実
装され、また市販に供される。このパッケージとして、
樹脂モールドによる封止型のパッケージを例にとると、
図2の模式断面図に示すように、半導体装置21と、該
半導体装置21を搭載し、かつ半導体装置21の配線パ
ターンと外部回路とを連絡する役割を担うリードフレー
ム22と、半導体装置21とリードフレーム22を被包
する樹脂モールド23とから構成される。リードフレー
ム22は、半導体装置21をその上部に搭載する基台2
4と、基台24の端部25に連結された外側リード部材
26とからなる。半導体装置21は、基台24の上部に
絶縁性接着層27によって接着されて固定される。ま
た、外側リード部材26は、基台24の端部25に絶縁
性接着層28によって接続されている。また、基台24
は、半導体装置21の動作時の発熱を吸収し、外部に放
熱する放熱板としての役割をも担うものであり、通常、
熱伝導性の高い金属、例えば、銅等で形成されている。
また、外側リード部材26は、半導体装置21とワイヤ
ボンディング等(図示せず)によって電気的に接続され
る。さらに、図2においては、外側リード部材26は単
独で示されているが、通常、リードフレームでは、搭載
される半導体装置21が有する入出力端に対応して複数
個、多いときには数100ピンの外側リード部材が、基
台24に設けられる。
2. Description of the Related Art A semiconductor device such as an IC or LSI is mounted on a lead frame and then housed in a housing made of metal, ceramic or resin, or is put into practical use as a package entirely sealed with a resin mold. To be done. This package is mounted on a printed wiring board or the like and is commercially available. As this package,
Taking a resin-molded package as an example,
As shown in the schematic cross-sectional view of FIG. 2, a semiconductor device 21, a lead frame 22 mounted with the semiconductor device 21, and having a role of connecting a wiring pattern of the semiconductor device 21 and an external circuit, and the semiconductor device 21. It is composed of a resin mold 23 that encloses the lead frame 22. The lead frame 22 is a base 2 on which the semiconductor device 21 is mounted.
4 and an outer lead member 26 connected to the end portion 25 of the base 24. The semiconductor device 21 is adhered and fixed to the upper part of the base 24 by an insulating adhesive layer 27. The outer lead member 26 is connected to the end portion 25 of the base 24 by an insulating adhesive layer 28. Also, the base 24
Also serves as a heat dissipation plate that absorbs heat generated during operation of the semiconductor device 21 and radiates heat to the outside.
It is formed of a metal having high thermal conductivity, such as copper.
The outer lead member 26 is electrically connected to the semiconductor device 21 by wire bonding or the like (not shown). Further, in FIG. 2, the outer lead member 26 is shown alone, but normally, in the lead frame, a plurality of lead members 26 are provided corresponding to the input / output ends of the semiconductor device 21 to be mounted, and when there are many lead pins, there are several hundred pins. The outer lead member is provided on the base 24.

【0003】[0003]

【発明が解決しようとする課題】しかし、前記従来のリ
ードフレームにおいては、基台と半導体装置、例えば、
銅板からなる基台とSiウェーハからなる半導体装置で
は、両者の熱膨張率が大きく相違し、半導体装置の動作
時の発熱によって応力が発生し、半導体装置にクラック
が発生してしまう問題があった。そのため、従来のリー
ドフレームでは、近年の半導体装置の高集積化および高
速化に伴って増加する動作時の発熱量に対応することが
できなかったり、基台と半導体装置の接着に特殊な接着
剤が必要となり、コスト上昇の原因となるなどの問題が
あった。また、従来のリードフレームでは、外側リード
部材は、銅等の柔らかく機械的強度が低い材質で形成さ
れているため、取扱い中に折れ曲がって形状が保持され
なかったり、あるいは配線基板等に実装する際に、折れ
曲がりにより実装作業が困難となるなどの問題があっ
た。
However, in the above conventional lead frame, the base and the semiconductor device, for example,
In the semiconductor device made of a copper plate and the semiconductor device made of a Si wafer, the thermal expansion coefficients of the two are significantly different, and stress is generated due to heat generated during the operation of the semiconductor device, which causes a problem that the semiconductor device is cracked. . Therefore, the conventional lead frame cannot handle the amount of heat generated during operation, which increases with the recent trend toward higher integration and higher speeds of semiconductor devices, and special adhesives for bonding the base and the semiconductor device. However, there was a problem that the cost was increased. Also, in the conventional lead frame, the outer lead member is formed of a material such as copper that is soft and has low mechanical strength, so that it may be bent during handling and the shape may not be retained, or when mounted on a wiring board or the like. In addition, there is a problem that mounting work becomes difficult due to bending.

【0004】そこで本発明の目的は、耐応力クラック
性、リード形状の保持性、機械的強度および放熱性に優
れたリードフレームを提供することにある。
Therefore, an object of the present invention is to provide a lead frame which is excellent in stress crack resistance, lead shape retention, mechanical strength and heat dissipation.

【0005】[0005]

【課題を解決するための手段】前記課題を解決するため
に、本発明は、放熱性基台と、該放熱性基台の上部に絶
縁性接着層を介して接着された応力緩衝部材と、該放熱
性基台の端部に絶縁性接着層を介して接着された、剛性
金属からなる外側リード部材とを有し、前記応力緩衝部
材の上部に接着剤層を介して半導体装置が固設されるよ
うにしてなるリードフレームを提供するものである。
In order to solve the above-mentioned problems, the present invention provides a heat-dissipating base, and a stress buffer member adhered to the upper part of the heat-dissipating base via an insulating adhesive layer. An outer lead member made of a rigid metal, which is adhered to an end of the heat dissipation base via an insulating adhesive layer, and a semiconductor device is fixed on the stress buffer member via an adhesive layer. The present invention provides a lead frame as described above.

【0006】前記応力緩衝部材が、半導体装置の基板の
熱膨張率と等しいもしくは近似している熱膨張率を有す
る素材から形成されていると、好ましい。
It is preferable that the stress buffering member is formed of a material having a coefficient of thermal expansion equal to or close to that of the substrate of the semiconductor device.

【0007】以下、本発明の実施態様に係るリードフレ
ームを用いてなる半導体装置パッケージの模式部分断面
図を示す図1に基づいて、本発明のリードフレームにつ
いて詳細に説明する。
Hereinafter, the lead frame of the present invention will be described in detail with reference to FIG. 1 showing a schematic partial sectional view of a semiconductor device package using the lead frame according to the embodiment of the present invention.

【0008】図1に示す半導体装置パッケージは、半導
体装置1と、該半導体装置1を搭載するための本発明の
リードフレーム2と、半導体装置1を封止する樹脂モー
ルド3とから構成される。
The semiconductor device package shown in FIG. 1 comprises a semiconductor device 1, a lead frame 2 of the present invention for mounting the semiconductor device 1, and a resin mold 3 for sealing the semiconductor device 1.

【0009】リードフレーム2は、基本的に、放熱性基
台4と、該放熱性基台4上に絶縁性接着層5を介して接
着された応力緩衝部材6と、該放熱性基台4の端部7に
絶縁性接着層8によって接着された、外側リード部材9
とからなるものである。
The lead frame 2 basically has a heat-dissipating base 4, a stress buffer member 6 adhered to the heat-dissipating base 4 via an insulating adhesive layer 5, and the heat-dissipating base 4. Outer lead member 9 adhered to the end 7 of the insulating layer 8 by an insulating adhesive layer 8.
It consists of and.

【0010】放熱性基台4は、半導体装置の動作時に発
生する熱を吸収し、その熱をパッケージ外に放熱できる
ものであれば、特に制限されず、例えば、Cu等の熱伝
導性の高いもので形成すればよい。
The heat dissipating base 4 is not particularly limited as long as it absorbs heat generated during the operation of the semiconductor device and can dissipate the heat to the outside of the package. For example, Cu or the like having high thermal conductivity. It may be formed of a thing.

【0011】応力緩衝部材6は、その上部に接着剤層1
0を介して半導体装置1を接着し、該半導体装置1を固
定するものであり、また、加熱時における半導体装置1
の熱膨張と放熱性基台4の熱膨張の差に起因する応力を
緩和して、該緩和による半導体装置1のクラックの発生
を防止するためのものである。この応力緩衝部材の材質
は、半導体装置の動作時の発熱あるいは信頼性試験等に
おける加熱による半導体装置1の熱膨張と放熱性基台4
の熱膨張の差により発生する応力を緩和して、半導体装
置1のクラックの発生を防止できる材質のものであれ
ば、特に限定されない。例えば、半導体装置1を構成す
る素材の熱膨張率と等しいもしくは近似の熱膨張率を有
するものから構成すればよい。具体的には、半導体装置
1がSiウェーハからなるものである場合は、この応力
緩衝部材を、Siと熱膨張率が等しいまたはほぼ等し
い、Si板等で構成すればよい。
The stress buffer member 6 has an adhesive layer 1 on the upper portion thereof.
The semiconductor device 1 is adhered to the semiconductor device 1 via 0, and the semiconductor device 1 is fixed.
This is to alleviate the stress caused by the difference between the thermal expansion of the above and the thermal expansion of the heat dissipation base 4 and prevent the occurrence of cracks in the semiconductor device 1 due to the relaxation. The material of the stress buffering member is such that heat generation during operation of the semiconductor device or thermal expansion of the semiconductor device 1 due to heating in a reliability test or the like and the heat dissipation base 4
There is no particular limitation as long as it is made of a material that can alleviate the stress generated by the difference in thermal expansion of the semiconductor device 1 and prevent the semiconductor device 1 from cracking. For example, the semiconductor device 1 may be made of a material having a thermal expansion coefficient equal to or close to that of the material forming the semiconductor device 1. Specifically, when the semiconductor device 1 is made of a Si wafer, this stress buffering member may be made of a Si plate or the like having a thermal expansion coefficient equal to or substantially equal to that of Si.

【0012】この応力緩衝部材の厚さ、形状、面積等
は、搭載される半導体装置の形状、大きさ、動作時の発
熱量等に応じて適宜決定される。
The thickness, shape, area, etc. of the stress buffer member are appropriately determined according to the shape, size, amount of heat generated during operation, etc. of the mounted semiconductor device.

【0013】外側リード部材9は、ボンディングワイヤ
(図示せず)によって、半導体装置1の配線パターンに
おける入出力端と接続され、この半導体装置と外部回路
とを電気的に接続するものである。
The outer lead member 9 is connected to the input / output end of the wiring pattern of the semiconductor device 1 by a bonding wire (not shown), and electrically connects this semiconductor device and an external circuit.

【0014】本発明のリードフレームにおいて、この外
側リード部材9は、曲がり変形による不良の発生を防止
するために、剛性金属から構成されている。この剛性金
属としては、例えば、鉄、銅−ニッケル合金(例えば、
42合金)等が挙げられる。
In the lead frame of the present invention, the outer lead member 9 is made of a rigid metal in order to prevent defects due to bending deformation. As the rigid metal, for example, iron, copper-nickel alloy (for example,
42 alloy) and the like.

【0015】また、図1のリードフレームにおいて、絶
縁性接着層5、絶縁性接着層8および接着剤層10は、
特に制限されず、常用の接着剤を使用することができ
る。特に、本発明においては、応力緩衝部材6によって
半導体装置と基台との熱膨張の差に起因する応力を緩和
することができるため、半導体装置と基台の熱膨張の差
が大きいため、両者の接着に使用できる接着剤が制限さ
れ、高価な接着剤を必要としたりするため、コスト上昇
の原因となるという従来の問題を解消することができ
る。
In the lead frame of FIG. 1, the insulating adhesive layer 5, the insulating adhesive layer 8 and the adhesive layer 10 are
There is no particular limitation, and a conventional adhesive can be used. Particularly, in the present invention, since the stress buffering member 6 can relieve the stress caused by the difference in thermal expansion between the semiconductor device and the base, the difference in thermal expansion between the semiconductor device and the base is large. Since the adhesive agent that can be used for the adhesion is limited and an expensive adhesive agent is required, it is possible to solve the conventional problem that causes an increase in cost.

【0016】本発明のリードフレームの製造は、常法に
したがって、基台、外側リード部材等の構成部材をエッ
チングやプレス等に形成し、これらを接着して所定の構
造に組立て、さらに応力緩衝部材を基台上に接着するこ
とにより、行なうことができ、通常のリードフレームの
製造工程に応力緩衝部材の接着工程を追加することによ
り簡便に行なうことができる。
In the production of the lead frame of the present invention, constituent members such as a base and an outer lead member are formed by etching, pressing or the like according to a conventional method, and these are adhered to each other to be assembled into a predetermined structure, and further stress buffering is performed. This can be performed by adhering the member on the base, and can be easily performed by adding the adhering step of the stress buffering member to the normal lead frame manufacturing step.

【0017】[0017]

【発明の効果】本発明のリードフレームは、耐応力クラ
ック性、リード形状の保持性、機械的強度および放熱性
に優れるものである。そのため、本発明のリードフレー
ムは、近年、益々高集積化および高速化が進み、動作時
の発熱が問題となる半導体装置のリードフレームとして
有用である。また、特殊な接着剤を使用する必要がな
く、常用の接着剤で十分である、という利点もある。
The lead frame of the present invention is excellent in stress crack resistance, lead shape retention, mechanical strength and heat dissipation. Therefore, the lead frame of the present invention is useful as a lead frame of a semiconductor device in which the heat generation during operation becomes a problem due to the higher integration and higher speed in recent years. Further, there is an advantage that it is not necessary to use a special adhesive, and a commonly used adhesive is sufficient.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施態様に係るリードフレームを用
いてなる半導体装置パッケージを説明する模式部分断面
図。
FIG. 1 is a schematic partial sectional view illustrating a semiconductor device package including a lead frame according to an embodiment of the present invention.

【図2】 従来のリードフレームについて説明する模式
部分断面図。
FIG. 2 is a schematic partial cross-sectional view illustrating a conventional lead frame.

【符号の説明】[Explanation of symbols]

1 半導体装置 2 リードフレーム 3 樹脂モールド 4 放熱性基台 5 絶縁性接着層 6 応力緩衝部材 7 端部 8 絶縁性接着剤 9 外側リード部材 10 接着剤層 21 半導体装置 22 リードフレーム 23 樹脂モールド 24 基台 25 端部 26 外側リード部材 27 絶縁性接着層 28 絶縁性接着層 1 Semiconductor Device 2 Lead Frame 3 Resin Mold 4 Heat Dissipating Base 5 Insulating Adhesive Layer 6 Stress Buffer Member 7 End 8 Insulating Adhesive 9 Outer Lead Member 10 Adhesive Layer 21 Semiconductor Device 22 Lead Frame 23 Resin Mold 24 Units Stand 25 End 26 Outer Lead Member 27 Insulating Adhesive Layer 28 Insulating Adhesive Layer

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】放熱性基台と、該放熱性基台の上部に絶縁
性接着層を介して接着された応力緩衝部材と、該放熱性
基台の端部に絶縁性接着層を介して接着された、剛性金
属からなる外側リード部材とを有し、前記応力緩衝部材
の上部に接着剤層を介して半導体装置が固設されるよう
にしてなるリードフレーム。
1. A heat dissipation base, a stress buffer member adhered to an upper portion of the heat dissipation base via an insulating adhesive layer, and an end of the heat dissipation base via an insulating adhesive layer. An outer lead member made of a rigid metal that is adhered, and a semiconductor device is fixedly mounted on the stress cushioning member via an adhesive layer.
【請求項2】前記応力緩衝部材が、半導体装置の基板の
熱膨張率と等しいもしくは近似している熱膨張率を有す
る素材から形成されてなる請求項1に記載のリードフレ
ーム。
2. The lead frame according to claim 1, wherein the stress buffering member is formed of a material having a coefficient of thermal expansion equal to or close to that of the substrate of the semiconductor device.
JP43A 1992-12-24 1992-12-24 Lead frame Pending JPH06196614A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP43A JPH06196614A (en) 1992-12-24 1992-12-24 Lead frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP43A JPH06196614A (en) 1992-12-24 1992-12-24 Lead frame

Publications (1)

Publication Number Publication Date
JPH06196614A true JPH06196614A (en) 1994-07-15

Family

ID=18368019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP43A Pending JPH06196614A (en) 1992-12-24 1992-12-24 Lead frame

Country Status (1)

Country Link
JP (1) JPH06196614A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5834831A (en) * 1994-08-16 1998-11-10 Fujitsu Limited Semiconductor device with improved heat dissipation efficiency
US5929513A (en) * 1994-08-16 1999-07-27 Fujitsu Limited Semiconductor device and heat sink used therein
US7298039B2 (en) 2003-08-08 2007-11-20 Hitachi, Ltd. Electronic circuit device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5834831A (en) * 1994-08-16 1998-11-10 Fujitsu Limited Semiconductor device with improved heat dissipation efficiency
US5929513A (en) * 1994-08-16 1999-07-27 Fujitsu Limited Semiconductor device and heat sink used therein
US7298039B2 (en) 2003-08-08 2007-11-20 Hitachi, Ltd. Electronic circuit device

Similar Documents

Publication Publication Date Title
JP2974552B2 (en) Semiconductor device
JP5387685B2 (en) Manufacturing method of semiconductor device
JP4785917B2 (en) Multi-chip module manufacturing method
JPH07221218A (en) Semiconductor device
KR20010078174A (en) Semiconductor device and method of manufacturing the same
JPH04162756A (en) Semiconductor module
JPH08507656A (en) Device and method for reducing thermal cycling in a semiconductor package
JP3724954B2 (en) Electronic device and semiconductor package
JP2001210777A (en) Semiconductor device
JP2000031343A (en) Semiconductor device
US6576491B1 (en) Methods for producing high reliability lead frame and packaging semiconductor die using such lead frame
JP4626445B2 (en) Manufacturing method of semiconductor package
KR100271836B1 (en) Metallic electronic component package device
JPH06196614A (en) Lead frame
US6784536B1 (en) Symmetric stack up structure for organic BGA chip carriers
JPH08264566A (en) Package for mounting semiconductor element
US20050139974A1 (en) Chip package structure
JPH08222670A (en) Package for mounting semiconductor element
JP2531125B2 (en) IC chip carrier module
JP2504465B2 (en) Semiconductor device
TWM545363U (en) Chip package structure
JP4175339B2 (en) Manufacturing method of semiconductor device
JPH0831986A (en) Semiconductor device having heatsink
TWI607540B (en) Chip package structure and manufacturing method thereof
JPH06291217A (en) Heat dissipation type lead frame

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20010925