JPH06101042A - Film forming device - Google Patents

Film forming device

Info

Publication number
JPH06101042A
JPH06101042A JP4277795A JP27779592A JPH06101042A JP H06101042 A JPH06101042 A JP H06101042A JP 4277795 A JP4277795 A JP 4277795A JP 27779592 A JP27779592 A JP 27779592A JP H06101042 A JPH06101042 A JP H06101042A
Authority
JP
Japan
Prior art keywords
disk
chamber
film forming
film
room
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4277795A
Other languages
Japanese (ja)
Inventor
Hajime Hashimoto
一 橋本
Kazuo Kubota
和男 久保田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP4277795A priority Critical patent/JPH06101042A/en
Priority to US08/123,225 priority patent/US5482607A/en
Priority to DE69307445T priority patent/DE69307445T2/en
Priority to KR1019930019150A priority patent/KR100254129B1/en
Priority to EP93115193A priority patent/EP0589416B1/en
Publication of JPH06101042A publication Critical patent/JPH06101042A/en
Priority to US08/250,500 priority patent/US5674368A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To increase treating amt. per unit time by shortening the time to release the device to the air and to shorten the time for evacuation, and to simplify the constitution of an external carrying line of disks. CONSTITUTION:This device is equipped with a film forming room 1 wherein a film is formed on a disk 2 at the film forming position, an intake room 11 to exclusively take in the disk 2 provided on the film forming room 1 through a gate valve 12, a take-out room 13 to exclusively take out the disk 2 provided on the film forming room 1 through a gate valve 14, an axis 15 arranged in the film forming room 1, a carrying arm which is supported by the axis 15 freely rotatably and supports the disk 2 in the intake room 11 and carries the disk to the film forming position and then to the take-out room 13 after the film is formed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、イオンビ−ムスパッタ
リング装置の量産機において、単位時間当りの処理量
(スル−プット)を向上し、かつ、外部のディスク搬送
ラインの構成を簡単にする成膜装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention improves the throughput per unit time (sput) in a mass production machine of ion beam sputtering equipment and simplifies the construction of an external disk carrying line. The present invention relates to a membrane device.

【0002】[0002]

【従来の技術】従来の成膜装置は、概略平面図及び正面
図を示した図1及び図2のように構成されている。それ
らの図において、1は成膜位置のディスク2に成膜を行
う成膜室、3はそれぞれ角型ゲ−トバルブ4を介し成膜
室1に隣接して設けられた2個のロ−ドロック室、5は
成膜室1に立設された2本の支軸、6は両支軸5にそれ
ぞれ回転自在に支持された搬送ア−ムであり、ロ−ドロ
ック室3の成膜前のディスク2を成膜室1の成膜位置に
移行し、成膜後のディスク2をロ−ドロック室3に移行
する。
2. Description of the Related Art A conventional film forming apparatus is constructed as shown in FIGS. 1 and 2 showing a schematic plan view and a front view. In these drawings, 1 is a film forming chamber for forming a film on a disk 2 at a film forming position, and 3 is two load locks provided adjacent to the film forming chamber 1 through a square gate valve 4. A chamber 5 is provided with two support shafts standing upright in the film forming chamber 1, and a conveying arm 6 is rotatably supported by both support shafts 5, respectively. The disk 2 is moved to the film forming position of the film forming chamber 1, and the disk 2 after film forming is moved to the load lock chamber 3.

【0003】7はスパッタイオン源、8は成膜室1に設
けられイオン源7からのイオンビ−ム9が照射されるタ
−ゲット、10は成膜位置に移行されたディスク2を把
持して回転するディスクホルダである。
Reference numeral 7 is a sputter ion source, 8 is a target which is provided in the film forming chamber 1 and is irradiated with an ion beam 9 from the ion source 7, and 10 holds the disk 2 which has been moved to the film forming position. It is a rotating disk holder.

【0004】そして、一方のロ−ドロック室3の蓋を開
けて成膜前のディスク2をセットし、蓋を閉めて真空排
気し、一方のゲ−トバルブ4を開け、一方の搬送ア−ム
6によりディスク2をロ−ドロック室3から成膜位置に
移行し、ディスク2をディスクホルダ10により把持し
て成膜を行う。この間、他方のロ−ドロック室3におい
ては、成膜前のディスク2がセットされ、真空排気され
ている。
Then, the lid of one of the load lock chambers 3 is opened to set the disk 2 before film formation, the lid is closed and vacuum exhaust is performed, one gate valve 4 is opened, and one transport arm is opened. The disk 2 is moved from the load lock chamber 3 to the film forming position by 6 and the disk 2 is held by the disk holder 10 to form a film. In the meantime, in the other load lock chamber 3, the disk 2 before film formation is set and evacuated.

【0005】そして、成膜終了後、一方の搬送ア−ム6
により成膜後のディスク2を一方のゲ−トバルブ4を介
して一方のロ−ドロック室3にセットし、ア−ム6を成
膜室1に戻し、ゲ−トバルブ4を閉じ、そのロ−ドロッ
ク室3をリ−クし、蓋をあけて成膜後のディスク2を取
り出し、成膜前のディスク2をセットする。
After the film formation is completed, one transfer arm 6
The disk 2 after film formation is set in one load lock chamber 3 through one gate valve 4, the arm 6 is returned to the film formation chamber 1, the gate valve 4 is closed, and the load valve 4 is closed. The dock chamber 3 is leaked, the lid is opened, the disk 2 after film formation is taken out, and the disk 2 before film formation is set.

【0006】この間、他方のロ−ドロック室3のゲ−ト
バルブ4を開け、他方の搬送ア−ム6によりディスク2
を他方のロ−ドロック室3から成膜室1に移行し、前記
と同様成膜を行い、成膜終了後、成膜後のディスク2を
他方のロ−ドロック室3に戻し、前記を繰り返して順次
成膜を行う。
During this time, the gate valve 4 of the other load lock chamber 3 is opened, and the disc 2 is opened by the other transport arm 6.
Is transferred from the other load lock chamber 3 to the film forming chamber 1 and film formation is performed in the same manner as described above. After film formation is completed, the disk 2 after film formation is returned to the other load lock chamber 3 and the above process is repeated. To sequentially form films.

【0007】[0007]

【発明が解決しようとする課題】従来の前記成膜装置の
場合、それぞれのロ−ドロック室3において、成膜後の
ディスク2の取り出しと成膜前のディスク2の取り入れ
を行い、その間ロ−ドロック室3が長時間大気にさらさ
れ、ロ−ドロック室3の内壁に大気中の水分が多く吸着
し、そのため真空排気時間が長くなるという問題点があ
る。その上、各ロ−ドロック室3がそれぞれ独立してデ
ィスク2の取り入れ,取り出しを行うため、外部のディ
スク搬送ラインの構成が困難になる。
In the case of the conventional film forming apparatus, the disk 2 after film formation and the disk 2 before film formation are taken in the respective load lock chambers 3 during the loading. There is a problem in that the drock chamber 3 is exposed to the atmosphere for a long time, and a large amount of moisture in the atmosphere is adsorbed on the inner wall of the rodlock chamber 3, so that the evacuation time becomes long. Moreover, since each load lock chamber 3 independently takes in and takes out the disc 2, it becomes difficult to construct an external disc carrying line.

【0008】さらに、ロ−ドロック室3の数の搬送ア−
ム6を必要とし、コスト高になるという問題点がある。
本発明は、前記の点に留意し、ロ−ドロック室等の容器
の大気への開放時間を短くし、真空排気時間を短縮して
単位時間当りの処理量を増大し、外部のディスク搬送ラ
インの構成を簡単にし、搬送ア−ム数を減少して安価に
する成膜装置を提供することを目的とする。
Further, the number of transfer lock chambers 3 is equal to the number of transfer stations.
However, there is a problem in that the cost is high because the program 6 is required.
In consideration of the above points, the present invention shortens the open time of the container such as the load lock chamber to the atmosphere, shortens the vacuum exhaust time to increase the throughput per unit time, and the external disk transfer line. It is an object of the present invention to provide a film forming apparatus that simplifies the structure of (1), reduces the number of transfer arms, and makes it inexpensive.

【0009】[0009]

【課題を解決するための手段】前記課題を解決するため
に、本発明の成膜装置は、成膜位置のディスクに成膜を
行う成膜室と、成膜室にゲ−トバルブを介して設けられ
ディスクを専用に取り入れる取入室と、成膜室にゲ−ト
バルブを介して設けられディスクを専用に取り出す取出
室と、成膜室に設けられた支軸と、支軸に回転自在に支
持され,取入室のディスクを支持して成膜位置に移行
し,成膜後のディスクを取出室に移行する搬送ア−ムと
を備えたものである。
In order to solve the above-mentioned problems, a film forming apparatus of the present invention comprises a film forming chamber for forming a film on a disk at a film forming position and a gate valve in the film forming chamber. An intake chamber that is provided for exclusive use of the disk, an extraction chamber that is installed in the film formation chamber via a gate valve to exclusively take out the disk, a spindle provided in the film formation chamber, and rotatably supported by the support shaft. And a transfer arm that supports the disk in the intake chamber to move to the film formation position and moves the disk after film formation to the extraction chamber.

【0010】[0010]

【作用】前記のように構成された本発明の成膜装置は、
成膜前のディスクを専用に取り入れる取入室と、成膜後
のディスクを専用に取り出す取出室とに分離されている
ため、各室の大気にさらされる時間が従来に比しほぼ半
減し、真空排気時間が短縮され、単位時間当りの処理量
が増大する。その上、ディスクの取入部と取出部が分離
されているため、外部のディスク搬送ラインの構成が簡
単になり、かつ、1個の搬送ア−ムによりディスクを取
入室,成膜室,取出室に移行するため、従来に比しア−
ム数が半減し、低コストになる。
The film forming apparatus of the present invention configured as described above is
Separated into an intake chamber for taking in the disc before film formation and an take-out chamber for taking out the disc after film formation, the time of exposure to the atmosphere in each chamber is reduced by half compared to the conventional one, and the vacuum The exhaust time is shortened and the throughput per unit time is increased. In addition, since the disk loading and unloading sections are separated, the structure of the external disk transport line is simplified, and the disk is loaded into the loading chamber, film deposition chamber, and unloading chamber by a single transport arm. Because of the shift to
The cost is reduced by half and the cost is reduced.

【0011】[0011]

【実施例】1実施例について図1ないし図3を参照して
説明する。それらの図において図5および図6と同一符
号は同一もしくは相当するものを示し、11は成膜室1
の一側の前側に角型ゲ−トバルブ12を介して設けられ
ディスク2を専用に取り入れる取入室、13は成膜室1
の一側の後側に角型ゲ−トバルブ14を介して設けられ
ディスク2を専用に取り出す取出室、15は成膜室1内
の一側に立設された支軸、16は支軸15に回転自在に
支持された搬送ア−ムであり、取入室11の成膜前のデ
ィスク2を支持して成膜位置に移行し、成膜後のディス
ク2を取出室13に移行する。そして、成膜室1の他側
にも一側と同様、取入室11,取出室13,搬送ア−ム
16等が設けられている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment will be described with reference to FIGS. In these figures, the same reference numerals as those in FIGS. 5 and 6 denote the same or corresponding ones, and 11 denotes the film forming chamber 1.
An intake chamber provided on the front side of one side through a square gate valve 12 for exclusively taking in the disk 2, 13 is a film forming chamber 1
A take-out chamber provided on the rear side of one side through a square gate valve 14 to take out the disc 2 for exclusive use, a reference shaft 15 standing on one side in the film forming chamber 1, and a support shaft 15 The transfer arm rotatably supports the disk 2 in the intake chamber 11 to support the disk 2 before film formation and moves to the film formation position, and transfers the disk 2 after film formation to the ejection chamber 13. An intake chamber 11, an extraction chamber 13, a transfer arm 16 and the like are provided on the other side of the film forming chamber 1 as well as the one side.

【0012】17は成膜室1の載置台、18は載置台1
7の両側に平行に配設され移行する搬送ライン、19は
載置台17と搬送ライン18との間に設けられた搬送ロ
ボットであり、搬送ライン18の成膜前のディスク2を
把持して取入室11に搬入し、取出室13の成膜後のデ
ィスク2を把持して搬送ライン18に移行する。
Reference numeral 17 is a mounting table of the film forming chamber 1, and 18 is a mounting table 1.
A transfer line which is arranged in parallel on both sides of 7 and moves, and 19 is a transfer robot which is provided between the mounting table 17 and the transfer line 18, and grips and collects the disk 2 before film formation on the transfer line 18. It is carried into the entrance chamber 11, and the disk 2 after film formation in the unload chamber 13 is gripped and transferred to the transfer line 18.

【0013】そして、一方の搬送ライン18の成膜前の
ディスク2を搬送ロボット19が把持して取入室11に
セットし、取入室11が真空排気されたのち、ゲ−トバ
ルブ12が開き、搬送ア−ム16によりディスク2が成
膜室1に移行され、ゲ−トバルブ11が閉じ、ディスク
ホルダ10により把持され、成膜位置で成膜される。こ
の間、取入室11がリ−クされ、つぎの成膜前のディス
ク2がセットされ、真空排気される。
Then, the transfer robot 19 grips the pre-deposited disk 2 on one of the transfer lines 18 and sets it in the intake chamber 11. After the intake chamber 11 is evacuated, the gate valve 12 is opened and transferred. The disk 2 is transferred to the film forming chamber 1 by the arm 16, the gate valve 11 is closed, and the disk holder 10 holds the disk 2 to form a film at the film forming position. During this time, the intake chamber 11 is leaked, the next disk 2 before film formation is set, and the disk 2 is evacuated.

【0014】成膜終了後、搬送ア−ム16によりディス
ク2が把持され、ゲ−トバルブ14が開き、真空排気さ
れた取出室13にディスク2がセットされ、搬送ア−ム
16が成膜室1に戻り、ゲ−トバルブ14が閉じ、取出
室13がリ−クされ、ディスク2が搬送ロボット19に
より把持され、搬送ライン18に移行される。つぎに、
搬送ア−ム16が取入室11のディスク2を把持し、前
記と同様の動作を繰り返す。
After the film formation, the transfer arm 16 holds the disk 2, the gate valve 14 is opened, the disk 2 is set in the evacuated extraction chamber 13, and the transfer arm 16 is set in the film formation chamber. Returning to 1, the gate valve 14 is closed, the take-out chamber 13 is leaked, the disk 2 is gripped by the transfer robot 19, and transferred to the transfer line 18. Next,
The transfer arm 16 holds the disk 2 in the intake chamber 11 and repeats the same operation as described above.

【0015】一方、他方の搬送ライン18のディスク2
についても、前記と同様の動作により、成膜位置にディ
スク2が交互に移行されて成膜が行われ、ディスク2が
移行する。今、密閉容器へのディスク2の取り入れに6
秒を要し、取り出しに6秒を要するとすると、従来の場
合は12秒間容器の内壁が大気にさらされるが、本実施
例の場合、取入室11及び取出室13の大気にさらされ
る時間は半分の6秒である。
On the other hand, the disk 2 on the other carrying line 18
As for the above, by the same operation as described above, the disk 2 is alternately moved to the film formation position to perform film formation, and the disk 2 is moved. 6 now to take the disc 2 into the closed container
If it takes 2 seconds and 6 seconds to take out, in the conventional case, the inner wall of the container is exposed to the atmosphere for 12 seconds, but in the case of the present embodiment, the time of exposure to the atmosphere of the intake chamber 11 and the extraction chamber 13 is Half the time is 6 seconds.

【0016】図4は、大気開放の時間が排気時間に大き
く影響することを示し、容積が3リットルの密閉容器を
6秒間大気に開放した場合(四角黒塗り)と、12秒間
大気に開放した場合(四角白あき)の排気特性を示し、
矢印で示す所望の2×10-4Torrに達する時間差は
約6秒であり、この時間差は量産機の場合、単位時間当
たりの処理量(スル−プット)に大きく影響を与える。
FIG. 4 shows that the time of opening to the atmosphere has a great influence on the exhausting time. When a closed container having a volume of 3 liters was opened to the atmosphere for 6 seconds (painted in a square), it was opened to the atmosphere for 12 seconds. Shows the exhaust characteristics of the case (white square)
The time difference to reach the desired 2 × 10 −4 Torr shown by the arrow is about 6 seconds, and this time difference greatly affects the throughput (sput) per unit time in the case of a mass production machine.

【0017】[0017]

【発明の効果】本発明は、以上説明したように構成され
ているので、以下に記載する効果を奏する。本発明の成
膜装置は、成膜前のディスク2を専用に取り入れる取入
室11と、成膜後のディスク2を専用に取り出す取出室
13とに分離されているため、各室11,13の大気に
さらされる時間が従来に比しほぼ半減し、真空排気時間
が短縮され、単位時間当りの処理量を増大することがで
きる。その上、ディスク2の取入部と取出部が分離され
ているため、外部のディスク搬送ラインの構成を簡単に
することができ、かつ、1個の搬送ア−ム16によりデ
ィスク2を取入室11,成膜室1,取出室13に移行す
るため、従来に比しア−ム数が半減し、低コストにする
ことができる。
Since the present invention is configured as described above, it has the following effects. Since the film forming apparatus of the present invention is divided into an intake chamber 11 for exclusively taking in the disc 2 before film formation and an taking out chamber 13 for exclusively taking out the disc 2 after film formation, The time to be exposed to the air is reduced to about half that of the conventional one, the vacuum exhaust time is shortened, and the throughput per unit time can be increased. In addition, since the loading part and the unloading part of the disk 2 are separated, the structure of the external disk transport line can be simplified and the disk 2 can be loaded into the loading chamber 11 by one transport arm 16. Since the film forming chamber 1 and the take-out chamber 13 are moved to, the number of arms can be halved as compared with the conventional case, and the cost can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の1実施例の概略平面図である。FIG. 1 is a schematic plan view of an embodiment of the present invention.

【図2】図1の切断側面図である。2 is a cut side view of FIG. 1. FIG.

【図3】1実施例の全体の斜視図である。FIG. 3 is an overall perspective view of one embodiment.

【図4】排気特性図である。FIG. 4 is an exhaust characteristic diagram.

【図5】従来例の概略平面図である。FIG. 5 is a schematic plan view of a conventional example.

【図6】図5の切断正面図である。6 is a cut front view of FIG.

【符号の説明】[Explanation of symbols]

1 成膜室 2 ディスク 11 取入室 12 ゲ−トバルブ 13 取出室 14 ゲ−トバルブ 15 支軸 16 搬送ア−ム DESCRIPTION OF SYMBOLS 1 Deposition chamber 2 Disk 11 Intake chamber 12 Gate valve 13 Ejection chamber 14 Gate valve 15 Spindle 16 Transfer arm

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 成膜位置のディスクに成膜を行う成膜室
と、該成膜室にゲ−トバルブを介して設けられディスク
を専用に取り入れる取入室と、前記成膜室にゲ−トバル
ブを介して設けられディスクを専用に取り出す取出室
と、前記成膜室に設けられた支軸と、該支軸に回転自在
に支持され,前記取入室のディスクを支持して前記成膜
位置に移行し,成膜後のディスクを前記取出室に移行す
る搬送ア−ムとを備えた成膜装置。
1. A film forming chamber for forming a film on a disk at a film forming position, an intake chamber provided in the film forming chamber via a gate valve for exclusive use of the disk, and a gate valve for the film forming chamber. A take-out chamber for exclusively taking out the disc, a support shaft provided in the film-forming chamber, and a support shaft rotatably supported by the support shaft, supporting the disc in the take-in chamber to the film-forming position. A film forming apparatus provided with a transfer arm for transferring a disk after film formation to the ejection chamber.
JP4277795A 1992-09-21 1992-09-21 Film forming device Pending JPH06101042A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP4277795A JPH06101042A (en) 1992-09-21 1992-09-21 Film forming device
US08/123,225 US5482607A (en) 1992-09-21 1993-09-20 Film forming apparatus
DE69307445T DE69307445T2 (en) 1992-09-21 1993-09-21 Layer-forming device
KR1019930019150A KR100254129B1 (en) 1992-09-21 1993-09-21 Thin film forming apparatus
EP93115193A EP0589416B1 (en) 1992-09-21 1993-09-21 Film forming apparatus
US08/250,500 US5674368A (en) 1992-09-21 1994-05-27 Film forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4277795A JPH06101042A (en) 1992-09-21 1992-09-21 Film forming device

Publications (1)

Publication Number Publication Date
JPH06101042A true JPH06101042A (en) 1994-04-12

Family

ID=17588394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4277795A Pending JPH06101042A (en) 1992-09-21 1992-09-21 Film forming device

Country Status (1)

Country Link
JP (1) JPH06101042A (en)

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