JPH0572748B2 - - Google Patents

Info

Publication number
JPH0572748B2
JPH0572748B2 JP19800184A JP19800184A JPH0572748B2 JP H0572748 B2 JPH0572748 B2 JP H0572748B2 JP 19800184 A JP19800184 A JP 19800184A JP 19800184 A JP19800184 A JP 19800184A JP H0572748 B2 JPH0572748 B2 JP H0572748B2
Authority
JP
Japan
Prior art keywords
internal
wiring
layer wiring
layer
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19800184A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6175543A (ja
Inventor
Toshiji Ayabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP19800184A priority Critical patent/JPS6175543A/ja
Publication of JPS6175543A publication Critical patent/JPS6175543A/ja
Publication of JPH0572748B2 publication Critical patent/JPH0572748B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
JP19800184A 1984-09-21 1984-09-21 集積回路の形成方法 Granted JPS6175543A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19800184A JPS6175543A (ja) 1984-09-21 1984-09-21 集積回路の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19800184A JPS6175543A (ja) 1984-09-21 1984-09-21 集積回路の形成方法

Publications (2)

Publication Number Publication Date
JPS6175543A JPS6175543A (ja) 1986-04-17
JPH0572748B2 true JPH0572748B2 (en, 2012) 1993-10-12

Family

ID=16383860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19800184A Granted JPS6175543A (ja) 1984-09-21 1984-09-21 集積回路の形成方法

Country Status (1)

Country Link
JP (1) JPS6175543A (en, 2012)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0474438U (en, 2012) * 1990-11-09 1992-06-30

Also Published As

Publication number Publication date
JPS6175543A (ja) 1986-04-17

Similar Documents

Publication Publication Date Title
US5319224A (en) Integrated circuit device having a geometry to enhance fabrication and testing and manufacturing method thereof
US4466181A (en) Method for mounting conjoined devices
JPH0572748B2 (en, 2012)
JPS59141239A (ja) Ｉｃ測定用プロ−バ
JP3093216B2 (ja) 半導体装置及びその検査方法
JPH058859B2 (en, 2012)
JP2587614B2 (ja) 半導体装置
JP2665075B2 (ja) 集積回路チェックパターンおよびそのチェック方法
JPS6226178B2 (en, 2012)
JPH05157780A (ja) 抵抗素子プロセスモニター装置
JPH0496343A (ja) 半導体装置
JPH04228B2 (en, 2012)
JPS5834935B2 (ja) 半導体ウエハ−試験用探針器
JPH0680669B2 (ja) 半導体装置
JP3132400B2 (ja) Ｉｃテスタ用プローブカード
JP2639342B2 (ja) 電子部品搭載用パッド並びにパッド及び電子部品の検査方法
JPS618939A (ja) 半導体装置
JPH0435907B2 (en, 2012)
JPH02297993A (ja) 膜回路装置の製造方法
KR100248207B1 (ko) 반도체 소자의 테스트 패턴
JPS62217627A (ja) 半導体素子の探針装置
JPH0262947B2 (en, 2012)
JPH0666372B2 (ja) 集積回路
JPS63122233A (ja) 半導体集積回路の測定装置
JPS61139038A (ja) プロ−ビング装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term