JPH0570930B2 - - Google Patents

Info

Publication number
JPH0570930B2
JPH0570930B2 JP58194311A JP19431183A JPH0570930B2 JP H0570930 B2 JPH0570930 B2 JP H0570930B2 JP 58194311 A JP58194311 A JP 58194311A JP 19431183 A JP19431183 A JP 19431183A JP H0570930 B2 JPH0570930 B2 JP H0570930B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58194311A
Other versions
JPS6086831A (en
Inventor
Tooru Ootsubo
Susumu Aiuchi
Takashi Kamimura
Minoru Noguchi
Teru Fujii
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58194311A priority Critical patent/JPH0570930B2/ja
Priority claimed from KR8406435A external-priority patent/KR890004881B1/en
Publication of JPS6086831A publication Critical patent/JPS6086831A/en
Publication of JPH0570930B2 publication Critical patent/JPH0570930B2/ja
Anticipated expiration legal-status Critical
Application status is Expired - Lifetime legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146Amplitude modulation, includes pulsing
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155Frequency modulation
    • H01J37/32165Plural frequencies
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
JP58194311A 1983-10-19 1983-10-19 Expired - Lifetime JPH0570930B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58194311A JPH0570930B2 (en) 1983-10-19 1983-10-19

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP58194311A JPH0570930B2 (en) 1983-10-19 1983-10-19
KR8406435A KR890004881B1 (en) 1983-10-19 1984-10-17 Plasma treating method and device thereof
EP84112571A EP0140294B1 (en) 1983-10-19 1984-10-18 Plasma processing method and apparatus for carrying out the same
DE19843482076 DE3482076D1 (en) 1983-10-19 1984-10-18 Plasma processing method and apparatus for use of this procedure.
US06/662,014 US4808258A (en) 1983-10-19 1984-10-18 Plasma processing method and apparatus for carrying out the same

Publications (2)

Publication Number Publication Date
JPS6086831A JPS6086831A (en) 1985-05-16
JPH0570930B2 true JPH0570930B2 (en) 1993-10-06

Family

ID=16322492

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58194311A Expired - Lifetime JPH0570930B2 (en) 1983-10-19 1983-10-19

Country Status (1)

Country Link
JP (1) JPH0570930B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2974512B2 (en) * 1992-08-21 1999-11-10 日新電機株式会社 Etching method and apparatus
US5900103A (en) * 1994-04-20 1999-05-04 Tokyo Electron Limited Plasma treatment method and apparatus
US6391147B2 (en) 1994-04-28 2002-05-21 Tokyo Electron Limited Plasma treatment method and apparatus
JP2006260857A (en) * 2005-03-16 2006-09-28 Nagano Japan Radio Co Plasma treatment device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633839A (en) * 1979-08-29 1981-04-04 Hitachi Ltd Plasma treatment and device therefor
JPH0454373A (en) * 1990-06-22 1992-02-21 Jatco Corp Controller of transmission

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633839A (en) * 1979-08-29 1981-04-04 Hitachi Ltd Plasma treatment and device therefor
JPH0454373A (en) * 1990-06-22 1992-02-21 Jatco Corp Controller of transmission

Also Published As

Publication number Publication date
JPS6086831A (en) 1985-05-16

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