JPH0570297B2 - - Google Patents

Info

Publication number
JPH0570297B2
JPH0570297B2 JP2176465A JP17646590A JPH0570297B2 JP H0570297 B2 JPH0570297 B2 JP H0570297B2 JP 2176465 A JP2176465 A JP 2176465A JP 17646590 A JP17646590 A JP 17646590A JP H0570297 B2 JPH0570297 B2 JP H0570297B2
Authority
JP
Japan
Prior art keywords
mask
masking blade
alignment
rays
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2176465A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0465110A (ja
Inventor
Koichi Hara
Iwao Tokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SOLEX KK
SORUTETSUKU KK
Original Assignee
SOLEX KK
SORUTETSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SOLEX KK, SORUTETSUKU KK filed Critical SOLEX KK
Priority to JP2176465A priority Critical patent/JPH0465110A/ja
Publication of JPH0465110A publication Critical patent/JPH0465110A/ja
Publication of JPH0570297B2 publication Critical patent/JPH0570297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2176465A 1990-07-05 1990-07-05 Ｘ線転写装置 Granted JPH0465110A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2176465A JPH0465110A (ja) 1990-07-05 1990-07-05 Ｘ線転写装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2176465A JPH0465110A (ja) 1990-07-05 1990-07-05 Ｘ線転写装置

Publications (2)

Publication Number Publication Date
JPH0465110A JPH0465110A (ja) 1992-03-02
JPH0570297B2 true JPH0570297B2 (ko) 1993-10-04

Family

ID=16014161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2176465A Granted JPH0465110A (ja) 1990-07-05 1990-07-05 Ｘ線転写装置

Country Status (1)

Country Link
JP (1) JPH0465110A (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4630567B2 (ja) * 2004-04-23 2011-02-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP2007095767A (ja) * 2005-09-27 2007-04-12 Nikon Corp 露光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311613A (ja) * 1989-06-08 1991-01-18 Nippon Telegr & Teleph Corp <Ntt> ブラインド装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0311613A (ja) * 1989-06-08 1991-01-18 Nippon Telegr & Teleph Corp <Ntt> ブラインド装置

Also Published As

Publication number Publication date
JPH0465110A (ja) 1992-03-02

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