JPH0540917A - Production of nonmagnetic substrate for magnetic head - Google Patents
Production of nonmagnetic substrate for magnetic headInfo
- Publication number
- JPH0540917A JPH0540917A JP3216512A JP21651291A JPH0540917A JP H0540917 A JPH0540917 A JP H0540917A JP 3216512 A JP3216512 A JP 3216512A JP 21651291 A JP21651291 A JP 21651291A JP H0540917 A JPH0540917 A JP H0540917A
- Authority
- JP
- Japan
- Prior art keywords
- nio
- sintering
- coo
- production
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、金属性磁性膜を蒸着す
るための非磁性の磁気ヘッド用基板の製造方法に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a non-magnetic magnetic head substrate for depositing a metallic magnetic film.
【0002】[0002]
【従来技術】従来この種の用途のものとしては、チタン
酸バリウム、チタン酸カルシウム、アルミナ等が使用さ
れていた。しかしながら、その熱膨張率が磁性膜構造体
と大きく異なっていたため、蒸着した磁性膜構造体が剥
離しやすく、また熱膨張率の差により応力が発生しクラ
ックが発生することがあった。2. Description of the Related Art Barium titanate, calcium titanate, alumina, etc. have hitherto been used for such applications. However, since the coefficient of thermal expansion was largely different from that of the magnetic film structure, the vapor-deposited magnetic film structure was easily peeled off, and stress was generated due to the difference in the coefficient of thermal expansion, and cracks were sometimes generated.
【0003】本発明者等は上記の欠点を解決すべく酸化
物系セラミックスについて研究を進め、CoO及びNi
OまたはNiOを基本組成とした酸化物が有効であると
して既に開示した。(特開平01-287811、特開平02-1686
02、特願平01-214206)The present inventors have conducted research on oxide-based ceramics in order to solve the above-mentioned drawbacks, and have studied CoO and Ni.
It has already been disclosed that an oxide having a basic composition of O or NiO is effective. (JP-A-01-287811, JP-A-02-1686
02, Japanese Patent Application 01-214206)
【0004】さらに、CoO及びNiOまたはNiOを
基本組成とした磁気ヘッド用非磁性基板の製造方法とし
て、以下の工程からなる製造方法が有効であるとして既
に開示した。(特開平02-94407) すなわち、(1)原料粉を混合し、ふるい分けを行う混
合工程、(2)CIP成形した混合粉を仮焼し、粉砕し
た後ふるい分けを行う仮焼工程、(3)仮焼粉を1μm
以下に微粉砕する工程、(4)微粉砕粉を20μm以上
の球形に造粒する工程、(5)造粒粉をCIP成形する
工程、(6)成形体を焼結する工程、(7)焼結体をH
IP処理する工程である。Further, it has already been disclosed that a manufacturing method comprising the following steps is effective as a manufacturing method of a non-magnetic substrate for a magnetic head having a basic composition of CoO and NiO or NiO. (Japanese Patent Laid-Open No. 02-94407) That is, (1) a mixing step of mixing raw material powders and sieving, (2) a calcination step of calcination of the CIP-molded mixed powders, crushing and sieving, (3) 1 μm of calcined powder
Finely pulverizing the following, (4) Granulating the finely pulverized powder into spherical particles of 20 μm or more, (5) CIP molding the granulated powder, (6) Sintering the compact, (7) H for the sintered body
This is a process of IP processing.
【0005】成形体を焼結する工程については、常圧焼
結あるいはホットプレスを用いて行うことにした。しか
しながら、この焼結過程を大気中で行なうとCoOが室
温から600℃付近でCo3O4に変化する際の体積膨
張、或いは、それ以上の温度でCo3O4が再びCoOに
還元される際のO2の発生により焼結体に割れが生じる
と言った問題があった。そのため、CoOおよびNiO
またはNiOを基本組成とした磁気ヘッド用非磁性基板
を焼結する際、低温領域を真空あるいは窒素等の不活性
ガス雰囲気とし、高温領域では酸化雰囲気にして焼結を
行っていた。即ち、従来法は、焼結途中で、雰囲気の切
り換えが必ず必要であり、操作が複雑であった。Regarding the step of sintering the molded body, it is decided to use atmospheric pressure sintering or hot pressing. However, if this sintering process is performed in the atmosphere, the volume expansion of CoO when it changes from room temperature to Co 3 O 4 at around 600 ° C., or at a temperature higher than that, Co 3 O 4 is reduced to CoO again. There was a problem that the sintered body was cracked due to the generation of O 2 . Therefore, CoO and NiO
Alternatively, when a non-magnetic substrate for a magnetic head having a basic composition of NiO is sintered, the low temperature region is vacuum or an inert gas atmosphere such as nitrogen, and the high temperature region is an oxidizing atmosphere for sintering. That is, in the conventional method, it was necessary to switch the atmosphere during the sintering, and the operation was complicated.
【0006】[0006]
【問題点を解決するための手段】上記の問題点を解決す
るために、以下の発明をなした。In order to solve the above problems, the following inventions have been made.
【0007】[0007]
【発明の構成】即ち、本発明は、CoO及びNiOある
いはNiOを基本組成とする磁気ヘッド用非磁性基板の
製造方法において、焼結時の雰囲気を大気とし、室温か
ら800℃までの昇温速度を30℃/h以下とすること
を特徴とする磁気ヘッド用非磁性基板の製造方法に関す
る。That is, according to the present invention, in a method for manufacturing a non-magnetic substrate for a magnetic head having a basic composition of CoO and NiO or NiO, the atmosphere during sintering is atmospheric air, and the temperature rising rate from room temperature to 800 ° C. To 30 ° C./h or less, and to a method for manufacturing a non-magnetic substrate for a magnetic head.
【0008】[0008]
【発明の具体的説明】本発明の理解を容易にするため具
体的かつ詳細に説明する。基本組成は、NiO単独の酸
化物あるいはNiOとCoOの複合酸化物を意味し、例
えば、CoO/NiO(モル比)=0/100〜80/
20で、より好ましくは、CoO/NiO(モル比)=
3/97〜60/40である。更に、添加物として、例
えば、Al2O3、ZrO2、Y2O3等0.1〜5wt.
%程度添加することにより、また、粉体の非表面積は、
7m2/g以上であることにより、より好ましい基板が
得られる。DETAILED DESCRIPTION OF THE INVENTION Specific and detailed description will be given to facilitate understanding of the present invention. The basic composition means an oxide of NiO alone or a composite oxide of NiO and CoO. For example, CoO / NiO (molar ratio) = 0/100 to 80 /
20 and more preferably CoO / NiO (molar ratio) =
It is 3 / 97-60 / 40. Furthermore, as an additive, for example, Al 2 O 3 , ZrO 2 , Y 2 O 3, etc., 0.1 to 5 wt.
%, The non-surface area of the powder is
When it is 7 m 2 / g or more, a more preferable substrate can be obtained.
【0009】本発明は、上記組成の粉体を一軸成形、C
IP後、常圧で焼結する際の焼結条件に関するものであ
る。その焼結条件は、大気中において、800℃までの
昇温速度を30℃/h以下とすることであり、昇温速度
が30℃/hより高いと昇温時、成形体に割れが生じ
る。これは、大気中において、CoO酸化物が室温から
600℃付近までの間に、Co3O4に変化する際の体積
膨張、また、600℃から800℃の温度範囲で起るC
o3O4からCoOへの分解反応によるO2ガスの発生に
よるものと考えられる原因により成形体の割れを生ず
る。これに対し、800℃までの昇温速度を30℃/h
以下にすると昇温時の上記体積膨張、O2ガスの発生を
緩やかにし昇温時の成形体の割れ発生を防止できた。ま
た、この手法を採用することにより、従来行なっていた
昇温途中での真空或いは不活性ガス雰囲気から酸化雰囲
気への切り換えが不要となった。According to the present invention, the powder having the above composition is uniaxially molded, C
The present invention relates to the sintering conditions for sintering at normal pressure after IP. The sintering condition is to set the temperature rising rate up to 800 ° C. to 30 ° C./h or less in the atmosphere, and if the temperature rising rate is higher than 30 ° C./h, cracks will occur in the molded body during temperature rising. .. This is due to the volume expansion of CoO oxide in the air when it changes to Co 3 O 4 from room temperature to around 600 ° C., and C that occurs in the temperature range of 600 ° C. to 800 ° C.
Cracking of the compact occurs due to the cause of O 2 gas generated by the decomposition reaction of o 3 O 4 to CoO. On the other hand, the heating rate up to 800 ° C is 30 ° C / h.
By the following, it was possible to moderate the above-mentioned volume expansion and generation of O 2 gas at the time of temperature rise, and to prevent cracking of the molded body at the time of temperature rise. Further, by adopting this method, it is no longer necessary to switch from the vacuum or inert gas atmosphere to the oxidizing atmosphere during the temperature rise, which was conventionally done.
【0010】このようにして得られた焼結体には、割れ
の発生は認められず、密度、焼結体組織等は不活性ガス
雰囲気から酸化雰囲気へ切り換えて焼結したものと差は
認められなかった。No cracking was observed in the thus obtained sintered body, and the density, the structure of the sintered body, etc. were found to be different from those obtained by sintering by switching from the inert gas atmosphere to the oxidizing atmosphere. I couldn't do it.
【0011】以下、本発明の実施例について説明する。An embodiment of the present invention will be described below.
【実施例】CoO、NiOを原料にCoO/NiO(モ
ル比)=50/50組成となるように調整し、これに添
加材としてアルミナ2wt%を添加し混合した。混合
は、エタノ−ル中湿式ボ−ルミルで20時間行った。こ
の混合粉をAr中900℃で仮焼し、次いで粗砕機を用
いて粉砕し、150μmの篩で篩分けを行い仮焼粉を得
た。この仮焼粉を、エタノ−ル中湿式ボ−ルミルで40
時間粉砕した。この粉砕粉を造粒後CIP成形し、成形
体を800℃までの昇温速度を30℃/h、20℃/
h、10℃/hとし大気中にて1230℃ 1Hrの常
圧焼結を行った結果、焼結体に割れは認められず、焼結
体の相対密度98.8%であった。次に比較例を示す。EXAMPLE CoO and NiO were used as raw materials, and CoO / NiO (molar ratio) was adjusted to 50/50 composition, and 2 wt% of alumina was added and mixed as an additive. Mixing was carried out for 20 hours in a wet ball mill in ethanol. This mixed powder was calcined in Ar at 900 ° C., then pulverized using a coarse crusher, and sieved with a 150 μm sieve to obtain a calcined powder. This calcined powder was mixed with a wet ball mill in ethanol to 40
Crushed for hours. This crushed powder is granulated and then CIP molded, and the temperature of the molded product is increased to 800 ° C at 30 ° C / h and 20 ° C /
As a result of performing atmospheric pressure sintering at 1230 ° C. for 1 hour at 10 ° C./h for 10 hours, cracks were not observed in the sintered body and the relative density of the sintered body was 98.8%. A comparative example is shown below.
【0012】[0012]
【比較例】焼結時、800℃までの昇温速度を40℃/
h、50℃/hとした以外は全て上記実施例と同条件で
焼結したところ、いずれも焼結体に割れが生じていた。
割れのため相対密度は、測定不能であった。[Comparative Example] During sintering, the temperature rising rate up to 800 ° C was 40 ° C /
When sintering was carried out under the same conditions as in the above example except that h and 50 ° C./h were used, cracks were found in the sintered body in all cases.
The relative density could not be measured due to cracking.
【0013】[0013]
【発明の効果】本発明により得られた焼結体には、割れ
の発生は認められず、不活性ガス雰囲気から酸化雰囲気
に切り替えて焼結した焼結体と密度、組織等に差のない
ものが得られた。また、本発明により磁気ヘッド用非磁
性基板の焼結方法が極めて容易に行うことができるよう
になった。EFFECTS OF THE INVENTION No cracking was observed in the sintered body obtained according to the present invention, and there is no difference in density, structure, etc. from the sintered body sintered by switching from an inert gas atmosphere to an oxidizing atmosphere. I got things. Further, according to the present invention, the sintering method of the non-magnetic substrate for the magnetic head can be performed very easily.
Claims (1)
組成とする磁気ヘッド用非磁性基板の製造方法におい
て、成形体を常圧で焼結する際、大気雰囲気で、800
℃までの昇温速度を30℃/h以下とすることを特徴と
する磁気ヘッド用非磁性基板の製造方法1. A method of manufacturing a non-magnetic substrate for a magnetic head, which comprises CoO and NiO or NiO as a basic composition, and when a compact is sintered at atmospheric pressure, it is exposed to 800 in an air atmosphere.
A method for manufacturing a non-magnetic substrate for a magnetic head, characterized in that a temperature rising rate up to 30 ° C. is 30 ° C./h or less
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3216512A JPH0540917A (en) | 1991-08-02 | 1991-08-02 | Production of nonmagnetic substrate for magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3216512A JPH0540917A (en) | 1991-08-02 | 1991-08-02 | Production of nonmagnetic substrate for magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0540917A true JPH0540917A (en) | 1993-02-19 |
Family
ID=16689598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3216512A Pending JPH0540917A (en) | 1991-08-02 | 1991-08-02 | Production of nonmagnetic substrate for magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0540917A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6560100B1 (en) | 1996-10-24 | 2003-05-06 | Fujitsu Limited | Portable computer equipped with add-on battery |
-
1991
- 1991-08-02 JP JP3216512A patent/JPH0540917A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6560100B1 (en) | 1996-10-24 | 2003-05-06 | Fujitsu Limited | Portable computer equipped with add-on battery |
US6563702B1 (en) | 1996-10-24 | 2003-05-13 | Fujitsu Limited | Portable computer equipped with add-on battery |
US6674637B2 (en) | 1996-10-24 | 2004-01-06 | Fujitsu Limited | Portable computer equipped with add-on battery |
US6956734B2 (en) | 1996-10-24 | 2005-10-18 | Fujitsu Limited | Portable computer equipped with add-on battery |
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