JPH0540917A - Production of nonmagnetic substrate for magnetic head - Google Patents

Production of nonmagnetic substrate for magnetic head

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Publication number
JPH0540917A
JPH0540917A JP21651291A JP21651291A JPH0540917A JP H0540917 A JPH0540917 A JP H0540917A JP 21651291 A JP21651291 A JP 21651291A JP 21651291 A JP21651291 A JP 21651291A JP H0540917 A JPH0540917 A JP H0540917A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
nio
sintering
production
coo
nonmagnetic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21651291A
Other languages
Japanese (ja)
Inventor
Satoru Suzuki
了 鈴木
Original Assignee
Nikko Kyodo Co Ltd
日本鉱業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

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Abstract

PURPOSE:To provide the process for production of the nonmagnetic substrate for magnetic heads particularly consisting of CoO and NiO or the NiO as its basic compsn. relating to the process for production of the nonmagnetic substrate for magnetic heads for vapor deposition of magnetic metallic films. CONSTITUTION:The heating up rate up to 800 deg.C in an atm. atmosphere is set at <=30 deg.C/h at the time of sintering a molding under atm. pressure in the process for production of the nonmagnetic substrate for magnetic heads consisting of the CoO and the NiO or the NiO as its basic compsn. The molding can be sintered in the atm. without cracking the sintered body at the time of sintering in this way.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、金属性磁性膜を蒸着するための非磁性の磁気ヘッド用基板の製造方法に関するものである。 The present invention relates to a method for producing a non-magnetic substrate for a magnetic head for depositing a metallic magnetic film.

【0002】 [0002]

【従来技術】従来この種の用途のものとしては、チタン酸バリウム、チタン酸カルシウム、アルミナ等が使用されていた。 As those of the prior art] conventional this type application, barium titanate, calcium titanate, alumina or the like has been used. しかしながら、その熱膨張率が磁性膜構造体と大きく異なっていたため、蒸着した磁性膜構造体が剥離しやすく、また熱膨張率の差により応力が発生しクラックが発生することがあった。 However, the since the thermal expansion coefficient was significantly different from the magnetic film structure, the easier the magnetic film structure is separated deposition, also differential stress is generated due to cracks in the coefficient of thermal expansion may occur.

【0003】本発明者等は上記の欠点を解決すべく酸化物系セラミックスについて研究を進め、CoO及びNi [0003] The present inventors have proceeded with research on oxide ceramic in order to solve the above drawbacks, CoO and Ni
OまたはNiOを基本組成とした酸化物が有効であるとして既に開示した。 Oxides O or NiO basic composition has already disclosed as being effective. (特開平01-287811、特開平02-1686 (JP-A-01-287811, JP-A-02-1686
02、特願平01-214206) 02, Japanese Patent Application No. 01-214206)

【0004】さらに、CoO及びNiOまたはNiOを基本組成とした磁気ヘッド用非磁性基板の製造方法として、以下の工程からなる製造方法が有効であるとして既に開示した。 [0004] In addition, the CoO and NiO or NiO as the manufacturing method of the non-magnetic substrate for a magnetic head having a basic composition, the manufacturing method comprising the steps has already disclosed as being effective. (特開平02-94407) すなわち、(1)原料粉を混合し、ふるい分けを行う混合工程、(2)CIP成形した混合粉を仮焼し、粉砕した後ふるい分けを行う仮焼工程、(3)仮焼粉を1μm (JP-A 02-94407) (1) Raw material powder was mixed, the mixing step of performing sieving, (2) calcining the CIP molded mixed powder, calcining step for sieving after milling, (3) the calcined powder 1μm
以下に微粉砕する工程、(4)微粉砕粉を20μm以上の球形に造粒する工程、(5)造粒粉をCIP成形する工程、(6)成形体を焼結する工程、(7)焼結体をH A step of pulverizing below, (4) a step of granulating the finely pulverized powder or spherical 20 [mu] m, (5) a step of CIP shaping the granulated powder, the step of sintering (6) molded body, (7) sintered body of the H
IP処理する工程である。 It is a step for IP processing.

【0005】成形体を焼結する工程については、常圧焼結あるいはホットプレスを用いて行うことにした。 [0005] For the step of sintering the shaped body, and that performed using a pressureless sintering or hot pressing. しかしながら、この焼結過程を大気中で行なうとCoOが室温から600℃付近でCo 34に変化する際の体積膨張、或いは、それ以上の温度でCo 34が再びCoOに還元される際のO 2の発生により焼結体に割れが生じると言った問題があった。 However, volume expansion when CoO Doing this sintering process in air is changed to Co 3 O 4 at around 600 ° C. from room temperature, or is Co 3 O 4 at higher temperature is reduced again CoO cracks in the sintered body has a problem that said caused by the generation of O 2 at the time. そのため、CoOおよびNiO Therefore, CoO and NiO
またはNiOを基本組成とした磁気ヘッド用非磁性基板を焼結する際、低温領域を真空あるいは窒素等の不活性ガス雰囲気とし、高温領域では酸化雰囲気にして焼結を行っていた。 Or when sintering the non-magnetic substrate for a magnetic head a basic composition of NiO, the low temperature region and an inert gas atmosphere such as vacuum or nitrogen, in the high temperature region has been subjected to sintering in the oxidizing atmosphere. 即ち、従来法は、焼結途中で、雰囲気の切り換えが必ず必要であり、操作が複雑であった。 In other words, the conventional method, in the middle of the sintering, a switching of the atmosphere is necessary always, the operation is complicated.

【0006】 [0006]

【問題点を解決するための手段】上記の問題点を解決するために、以下の発明をなした。 In order to solve the above problems In order to solve the problems], it made a following invention.

【0007】 [0007]

【発明の構成】即ち、本発明は、CoO及びNiOあるいはNiOを基本組成とする磁気ヘッド用非磁性基板の製造方法において、焼結時の雰囲気を大気とし、室温から800℃までの昇温速度を30℃/h以下とすることを特徴とする磁気ヘッド用非磁性基板の製造方法に関する。 SUMMARY OF THE INVENTION Namely, the present invention provides a method of manufacturing a non-magnetic substrate for a magnetic head for a basic composition of CoO and NiO or NiO, the atmosphere during sintering to atmosphere, heating rate of up to 800 ° C. from room temperature the method of manufacturing a non-magnetic substrate for a magnetic head, characterized by a 30 ° C. / h or less.

【0008】 [0008]

【発明の具体的説明】本発明の理解を容易にするため具体的かつ詳細に説明する。 It is described in detail in order to facilitate understanding of the present invention DETAILED DESCRIPTION OF THE INVENTION. 基本組成は、NiO単独の酸化物あるいはNiOとCoOの複合酸化物を意味し、例えば、CoO/NiO(モル比)=0/100〜80/ The basic composition means an oxide or a composite oxide of NiO and CoO of NiO alone, for example, CoO / NiO (mole ratio) = 0/100 to 80 /
20で、より好ましくは、CoO/NiO(モル比)= 20, more preferably, CoO / NiO (mole ratio) =
3/97〜60/40である。 It is a 3 / 97-60 / 40. 更に、添加物として、例えば、Al 23 、ZrO 2 、Y 23等0.1〜5wt. Furthermore, as an additive, for example, Al 2 O 3, ZrO 2 , Y 2 O 3 , etc. 0.1-5 wt.
%程度添加することにより、また、粉体の非表面積は、 By adding about%, also specific surface area of ​​the powder,
7m 2 /g以上であることにより、より好ましい基板が得られる。 By at 7m 2 / g or more, and more preferably the substrate is obtained.

【0009】本発明は、上記組成の粉体を一軸成形、C The present invention, uniaxial molding a powder of the composition, C
IP後、常圧で焼結する際の焼結条件に関するものである。 After IP, the present invention relates to sintering conditions for sintering at atmospheric pressure. その焼結条件は、大気中において、800℃までの昇温速度を30℃/h以下とすることであり、昇温速度が30℃/hより高いと昇温時、成形体に割れが生じる。 As sintering conditions, in air, is to a heating rate of up to 800 ° C. and 30 ° C. / h or less, in heating the heating rate is higher than 30 ° C. / h, a crack in the molded body occurs . これは、大気中において、CoO酸化物が室温から600℃付近までの間に、Co 34に変化する際の体積膨張、また、600℃から800℃の温度範囲で起るC C This is in the atmosphere, while CoO oxide to around 600 ° C. from room temperature, the volume expansion at the time of changing the Co 3 O 4, also occurring in the temperature range of 800 ° C. from 600 ° C.
34からCoOへの分解反応によるO 2ガスの発生によるものと考えられる原因により成形体の割れを生ずる。 The possible causes of o 3 O 4 to be due to O 2 gas generated by decomposition reaction to CoO produce cracks in the molded body. これに対し、800℃までの昇温速度を30℃/h In contrast, the rate of temperature increase up to 800 ℃ 30 ℃ / h
以下にすると昇温時の上記体積膨張、O 2ガスの発生を緩やかにし昇温時の成形体の割れ発生を防止できた。 When below the volume expansion during heating and can be prevented cracking of the green body during heated to gentle generation of O 2 gas. また、この手法を採用することにより、従来行なっていた昇温途中での真空或いは不活性ガス雰囲気から酸化雰囲気への切り換えが不要となった。 Further, by adopting this approach, switching from a vacuum or an inert gas atmosphere in the middle heated which has been performed prior to the oxidizing atmosphere it becomes unnecessary.

【0010】このようにして得られた焼結体には、割れの発生は認められず、密度、焼結体組織等は不活性ガス雰囲気から酸化雰囲気へ切り換えて焼結したものと差は認められなかった。 [0010] The sintered body obtained in this manner, the occurrence of cracks was not observed, the density, the sintered body tissue or the like is observed difference to that sintering is switched to an oxidizing atmosphere from inert gas atmosphere It is did not.

【0011】以下、本発明の実施例について説明する。 [0011] Hereinafter, a description will be given of an embodiment of the present invention.

【実施例】CoO、NiOを原料にCoO/NiO(モル比)=50/50組成となるように調整し、これに添加材としてアルミナ2wt%を添加し混合した。 EXAMPLES CoO, the NiO raw material CoO / NiO (mole ratio) = 50/50 was adjusted so as to have the composition, to which was alumina 2 wt% were added and mixed as an additive material. 混合は、エタノ−ル中湿式ボ−ルミルで20時間行った。 Mixing ethanol - it was carried out in mill 20 hours - in Le wet ball. この混合粉をAr中900℃で仮焼し、次いで粗砕機を用いて粉砕し、150μmの篩で篩分けを行い仮焼粉を得た。 The mixed powder was calcined at 900 ° C. in Ar, then was pulverized with a crusher to obtain a calcined powder subjected to sieving with 150μm sieve. この仮焼粉を、エタノ−ル中湿式ボ−ルミルで40 The calcined powder, ethanol - in Le wet ball - in the mill 40
時間粉砕した。 Was time grinding. この粉砕粉を造粒後CIP成形し、成形体を800℃までの昇温速度を30℃/h、20℃/ The pulverized powder was granulated after CIP molding, molded body a heating rate of up to 800 ℃ 30 ℃ / h, 20 ℃ /
h、10℃/hとし大気中にて1230℃ 1Hrの常圧焼結を行った結果、焼結体に割れは認められず、焼結体の相対密度98.8%であった。 h, 10 ° C. / h and with a result of the pressureless sintering of 1230 ° C. 1 Hr in the air, cracks in the sintered body was not observed, and a relative density of 98.8% of the sintered body. 次に比較例を示す。 The following comparative examples.

【0012】 [0012]

【比較例】焼結時、800℃までの昇温速度を40℃/ [Comparative Example] During sintering, the heating rate up to 800 ° C. 40 ° C. /
h、50℃/hとした以外は全て上記実施例と同条件で焼結したところ、いずれも焼結体に割れが生じていた。 All except for using the h, 50 ° C. / h is was sintered under the same conditions as in the above embodiment, both were cracked in the sintered body.
割れのため相対密度は、測定不能であった。 The relative density for cracks was not measurable.

【0013】 [0013]

【発明の効果】本発明により得られた焼結体には、割れの発生は認められず、不活性ガス雰囲気から酸化雰囲気に切り替えて焼結した焼結体と密度、組織等に差のないものが得られた。 The sintered body obtained by the present invention according to the present invention, the occurrence of cracks was not observed, the sintered body and the density of sintered switched to an oxidizing atmosphere from the inert gas atmosphere, with no difference in tissue such as those were obtained. また、本発明により磁気ヘッド用非磁性基板の焼結方法が極めて容易に行うことができるようになった。 Also, the sintering process of the non-magnetic substrate for a magnetic head can now be carried out very easily by the present invention.

Claims (1)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 CoO及びNiOあるいはNiOを基本組成とする磁気ヘッド用非磁性基板の製造方法において、成形体を常圧で焼結する際、大気雰囲気で、800 1. A method for producing a non-magnetic substrate for a magnetic head for a basic composition of CoO and NiO or NiO, when sintering the molded body at normal pressure, in an air atmosphere, 800
    ℃までの昇温速度を30℃/h以下とすることを特徴とする磁気ヘッド用非磁性基板の製造方法 Method for producing a non-magnetic substrate for a magnetic head that the heating rate until ° C., characterized in that a 30 ° C. / h or less
JP21651291A 1991-08-02 1991-08-02 Production of nonmagnetic substrate for magnetic head Pending JPH0540917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21651291A JPH0540917A (en) 1991-08-02 1991-08-02 Production of nonmagnetic substrate for magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21651291A JPH0540917A (en) 1991-08-02 1991-08-02 Production of nonmagnetic substrate for magnetic head

Publications (1)

Publication Number Publication Date
JPH0540917A true true JPH0540917A (en) 1993-02-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP21651291A Pending JPH0540917A (en) 1991-08-02 1991-08-02 Production of nonmagnetic substrate for magnetic head

Country Status (1)

Country Link
JP (1) JPH0540917A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6560100B1 (en) 1996-10-24 2003-05-06 Fujitsu Limited Portable computer equipped with add-on battery

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6560100B1 (en) 1996-10-24 2003-05-06 Fujitsu Limited Portable computer equipped with add-on battery
US6563702B1 (en) 1996-10-24 2003-05-13 Fujitsu Limited Portable computer equipped with add-on battery
US6674637B2 (en) 1996-10-24 2004-01-06 Fujitsu Limited Portable computer equipped with add-on battery
US6956734B2 (en) 1996-10-24 2005-10-18 Fujitsu Limited Portable computer equipped with add-on battery

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