JPH0538048Y2 - - Google Patents
Info
- Publication number
- JPH0538048Y2 JPH0538048Y2 JP948788U JP948788U JPH0538048Y2 JP H0538048 Y2 JPH0538048 Y2 JP H0538048Y2 JP 948788 U JP948788 U JP 948788U JP 948788 U JP948788 U JP 948788U JP H0538048 Y2 JPH0538048 Y2 JP H0538048Y2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- source material
- crucible
- evaporation
- supply device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001704 evaporation Methods 0.000 claims description 72
- 230000008020 evaporation Effects 0.000 claims description 71
- 239000000463 material Substances 0.000 claims description 61
- 238000007738 vacuum evaporation Methods 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 238000007733 ion plating Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP948788U JPH0538048Y2 (zh) | 1988-01-29 | 1988-01-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP948788U JPH0538048Y2 (zh) | 1988-01-29 | 1988-01-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01114666U JPH01114666U (zh) | 1989-08-02 |
JPH0538048Y2 true JPH0538048Y2 (zh) | 1993-09-27 |
Family
ID=31216270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP948788U Expired - Lifetime JPH0538048Y2 (zh) | 1988-01-29 | 1988-01-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0538048Y2 (zh) |
-
1988
- 1988-01-29 JP JP948788U patent/JPH0538048Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH01114666U (zh) | 1989-08-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0595624A1 (en) | Film forming apparatus for filling fine pores of a substrate | |
JP2020164920A (ja) | 成膜装置及び成膜方法 | |
JP2000506226A (ja) | ばら物の真空成膜装置 | |
JPH0538048Y2 (zh) | ||
JPH0539567A (ja) | スパツタリングユニツト | |
JPS6352111B2 (zh) | ||
JP2000064042A (ja) | 回転アーム式スパッタ装置 | |
JPH0527482Y2 (zh) | ||
JP3808244B2 (ja) | ターゲットホルダー構造 | |
US3116958A (en) | Automatic feed for evaporation material | |
JPH0524996A (ja) | 酸化物超電導導体およびその製造方法 | |
JPH0798861A (ja) | 磁気記録媒体の製造装置 | |
JP2001140061A (ja) | デポジションアシスト蒸着装置及び薄膜形成方法 | |
JP2589525B2 (ja) | 半導体素子の裏メタル形成装置 | |
JPH0241165Y2 (zh) | ||
JPH0213483Y2 (zh) | ||
JP2890686B2 (ja) | レーザ・スパッタリング装置 | |
Wang et al. | Growth Mechanism of Multicomponent Alloy Film in MCSPVD | |
JPH01294861A (ja) | イオンビームミキシング法 | |
JP2001000854A (ja) | 付着物除去装置及び蒸着装置 | |
CN116438326A (zh) | 成膜装置、成膜单元和成膜方法 | |
JPH02254159A (ja) | イオンプレーティングによる薄膜形成方法 | |
Dykstra et al. | Replicas, shadowing, and negative staining | |
JPS62247067A (ja) | イオンプレ−テイング装置 | |
JPS6326352A (ja) | 蒸発源供給方法 |