JPH05340733A - Semiconductor device inspecting device - Google Patents

Semiconductor device inspecting device

Info

Publication number
JPH05340733A
JPH05340733A JP14573392A JP14573392A JPH05340733A JP H05340733 A JPH05340733 A JP H05340733A JP 14573392 A JP14573392 A JP 14573392A JP 14573392 A JP14573392 A JP 14573392A JP H05340733 A JPH05340733 A JP H05340733A
Authority
JP
Japan
Prior art keywords
semiconductor device
image
lead
inspection
inspected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP14573392A
Other languages
Japanese (ja)
Inventor
Kiyokazu Aoki
清和 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Microsystems Co Ltd
Asahi Kasei Microdevices Corp
Original Assignee
Asahi Kasei Microsystems Co Ltd
Asahi Kasei Microdevices Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Microsystems Co Ltd, Asahi Kasei Microdevices Corp filed Critical Asahi Kasei Microsystems Co Ltd
Priority to JP14573392A priority Critical patent/JPH05340733A/en
Publication of JPH05340733A publication Critical patent/JPH05340733A/en
Withdrawn legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To obtain a semiconductor device inspecting device which can perform high-speed processing by shortening the data processing time of the device in such a way that one piece of semiconductor device is inspected by one time of picture input. CONSTITUTION:Light reflecting means 5 are provided around a semiconductor device 1 mounted on a mounting stage 2. The image of the device 1 is picked up with an image pickup means 3 and the picture signal of the means 3 is inputted to a picture recognizing means 4 which recognizes the defect of the device 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、LSI等の半導体装置
(デバイス)の検査装置に関し、さらに詳しくはデバイ
スのリード曲がり、リード浮き、デバイス表面に印刷さ
れた文字等を検査する検査装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inspection apparatus for a semiconductor device (device) such as an LSI, and more particularly to an inspection apparatus for inspecting a lead bend, a lead float, a character printed on the surface of a device. Is.

【0002】[0002]

【従来の技術】LSI等の半導体装置は、前工程で製造
されたウェハをダイシングし、これをプラスチックある
いはセラミックに封止したのちに電気的な検査を行い、
次いで外観検査を行って出荷されている。外観検査はリ
ード曲がり、リード浮きおよび製品名,規格その他デバ
イス表面に印刷された文字等が検査される。
2. Description of the Related Art A semiconductor device such as an LSI is diced from a wafer manufactured in a previous step, sealed in plastic or ceramic, and then electrically inspected.
Then, they are visually inspected and shipped. In the visual inspection, lead bending, lead floating, product name, standard and other characters printed on the device surface are inspected.

【0003】従来、外観検査は画像認識技術によって行
うことにより、省力化が図られているが、リード曲が
り、リード浮き、文字等、それぞれの部分を撮像し、各
々画像処理によりなされていた。
Conventionally, the visual inspection is performed by image recognition technology in order to save labor, but it is performed by imaging each portion such as lead bending, lead floating, and characters, and performing image processing.

【0004】例えば、リード曲がりはデバイス上面から
撮像し検査し、リード浮きは側面から撮像し検査し、文
字部分は別個にデバイス上面から撮像し検査していた。
側面からの撮像は、フラットパッケージのようなもので
は、四方からする必要があり、カメラを4台設置する
か、あるいは設置台を回転させていた。
For example, the lead bend is imaged and inspected from the upper surface of the device, the lead float is imaged and inspected from the side surface, and the character portion is separately imaged and inspected from the upper surface of the device.
In the case of a flat package, it is necessary to image from the four sides, and four cameras are installed or the installation table is rotated.

【0005】[0005]

【発明が解決しようとする課題】このように従来の装置
では、カメラの台数が3〜6台必要であり、ハードウェ
アでこれらのカメラを切り換える機能が必要である上
に、照明の調整や入力タイミングにも制限があった。ま
た、ピント調整等の前調整が多く、時間がかかってい
た。
As described above, in the conventional device, the number of cameras is required to be 3 to 6, and the function of switching between these cameras is required by hardware, and the adjustment and input of illumination are required. There were also timing restrictions. Also, many pre-adjustments such as focus adjustments took time.

【0006】さらに、入力画像が多いため、LSI1個
当たりの処理時間が長くなり、時間当たりの処理個数に
限度があった。
Further, since there are many input images, the processing time per LSI becomes long, and the number of processings per time is limited.

【0007】以上の点に鑑み、本発明は一回の画像入力
で1個の半導体装置の検査を行うことができ、データ処
理時間が短く高速処理を行える半導体装置の検査装置を
提供することを課題とする。
In view of the above points, the present invention provides a semiconductor device inspection apparatus capable of inspecting one semiconductor device with one image input, and having a short data processing time and high-speed processing. It is an issue.

【0008】[0008]

【課題を解決するための手段】本発明は、検査すべき半
導体装置を設置する設置台と、該半導体装置を撮像する
撮像手段と、該撮像手段によって得られた画像信号によ
って前記半導体装置の不良を認識する画像認識手段とを
具備する半導体装置の検査装置において、前記設置台に
は前記半導体装置が設置される周辺に光反射手段を具備
したことを特徴とするものである。
SUMMARY OF THE INVENTION According to the present invention, a mounting table for mounting a semiconductor device to be inspected, an image pickup means for picking up an image of the semiconductor device, and a defect of the semiconductor device by an image signal obtained by the image pickup means. In the inspection apparatus for a semiconductor device, which is provided with an image recognition means for recognizing the above, the installation table is provided with a light reflection means around the semiconductor device.

【0009】[0009]

【作用】本発明によれば、光反射手段によって半導体装
置側面と上面を同時に撮像することができ、一画面で同
時に画像処理を行うことができるため、簡単な装置構成
で、高速に検査をすることができる。
According to the present invention, the side surface and the top surface of the semiconductor device can be simultaneously imaged by the light reflecting means, and the image processing can be performed simultaneously on one screen, so that the inspection can be performed at high speed with a simple device configuration. be able to.

【0010】[0010]

【実施例】以下、本発明を図面に基づいて詳細に説明す
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.

【0011】図1は、本発明の検査装置の要部を示す図
であり、図1(A)は側面図、図1(B)はその上面図
である。
1A and 1B are views showing a main part of an inspection apparatus according to the present invention. FIG. 1A is a side view and FIG. 1B is a top view thereof.

【0012】図において、1は検査すべき半導体装置
(デバイス)、1Aはリード、2は設置台、3は撮像手
段、4は画像認識手段、5は光反射手段(ミラー)、6
は照明である。
In the figure, 1 is a semiconductor device (device) to be inspected, 1A is a lead, 2 is an installation stand, 3 is an image pickup means, 4 is an image recognition means, 5 is a light reflection means (mirror), 6
Is lighting.

【0013】撮像手段3は、例えばCCD(Charg
e Coupled Device)カメラを用いるこ
とができる。画像認識手段4は、例えばマイクロコンピ
ュータである。
The image pickup means 3 is, for example, a CCD (Charg).
An e Coupled Device) camera can be used. The image recognition means 4 is, for example, a microcomputer.

【0014】ミラー5はデバイス1の4辺に設けられて
おり、デバイス1の上面から撮像手段3によって撮像し
たときに、デバイス1の側面が画像信号として入力され
るようになされている。すなわち、ミラー5は設置台2
の上面に対し、45〜60°の角度を有している。な
お、ミラー5はDIP等のように2辺にのみピンが設け
られているパッケージの場合には2辺にのみ設けてもよ
い。
The mirrors 5 are provided on four sides of the device 1 so that the side surface of the device 1 is input as an image signal when the image pickup means 3 picks up an image from the upper surface of the device 1. That is, the mirror 5 is the installation table 2
Has an angle of 45 to 60 with respect to the upper surface of the. The mirror 5 may be provided only on two sides in the case of a package in which pins are provided on only two sides such as DIP.

【0015】検査は以下のような手順で行われる。The inspection is performed in the following procedure.

【0016】デバイス1が設置台2に設置されると、照
明6が点灯され、撮像手段3によってデバイス1を撮像
する。図2は、上記の検査装置によって撮像した画像を
示す図である。この画像は例えば256階調で表現され
ている。
When the device 1 is installed on the installation table 2, the illumination 6 is turned on and the image pickup means 3 takes an image of the device 1. FIG. 2 is a diagram showing an image captured by the above inspection device. This image is represented by 256 gradations, for example.

【0017】図2において、7は撮像手段3によって直
接撮像されたデバイス上面の画像であり、7Aはリード
の像である。8はミラーを介して撮像されたデバイス側
面の画像であり、8Aはリードの像である。デバイス上
面の画像からリードの曲がりと文字を、デバイス側面の
画像からリードの浮きを認識,評価することができる。
撮像手段3からのこの画像信号は画像認識手段4に入力
され、公知の画像認識技術によりデバイス1が不良かど
うかを認識する。
In FIG. 2, 7 is an image of the upper surface of the device directly taken by the image pickup means 3, and 7A is an image of the lead. 8 is an image of the side surface of the device taken through the mirror, and 8A is an image of the lead. It is possible to recognize and evaluate the bending and characters of the lead from the image on the top of the device, and the floating of the lead from the image on the side of the device.
This image signal from the image pickup means 3 is inputted to the image recognition means 4, and the well-known image recognition technique is used to recognize whether or not the device 1 is defective.

【0018】図3は、画像認識手段4における動作を示
すフローチャートを示す図である。
FIG. 3 is a flowchart showing the operation of the image recognition means 4.

【0019】まず、図2のような画像信号は一括して画
像認識手段4の記憶装置に取り込まれる(ステップS1
00)。
First, the image signals as shown in FIG. 2 are collectively fetched into the storage device of the image recognition means 4 (step S1).
00).

【0020】次いで、図2の点線で示された各ウィンド
ウにより、必要なブロックに分割される。図2において
は、リード検査ウィンドウ(曲がり)10、リード検査
ウィンドウ(浮き)20、文字検査ウィンドウ30の3
ブロックに分割される(ステップS200)。
Then, each window shown by a dotted line in FIG. 2 is divided into necessary blocks. In FIG. 2, a lead inspection window (bending) 10, a lead inspection window (float) 20, and a character inspection window 30 are provided.
It is divided into blocks (step S200).

【0021】次に、各ウィンドウ毎に公知の画像認識技
術を用いて検査を行う(ステップS300)。リード検
査ウィンドウ(曲がり)10では、リードのセンターピ
ッチを測定し、予め記憶させた標準値と比較して、曲が
りを検出する。リード検査ウィンドウ(浮き)20で
は、ミラー5に写し出されたリードを予め記憶させた仮
想基準線に対し偏差を求めて、浮き量を算出する。文字
検査ウィンドウ30では、文字のパターンマッチングに
より文字検査を行う。最後に、以上のようにして得られ
た検査結果を出力する(ステップS400)。
Next, an inspection is performed for each window using a known image recognition technique (step S300). In the lead inspection window (bend) 10, the center pitch of the lead is measured and compared with a standard value stored in advance to detect the bend. In the lead inspection window (float) 20, the deviation is calculated with respect to a virtual reference line in which the lead projected on the mirror 5 is stored in advance, and the floating amount is calculated. In the character inspection window 30, character inspection is performed by pattern matching of characters. Finally, the inspection result obtained as described above is output (step S400).

【0022】このように1画面の撮像により各部分の検
査をすることができる。
In this way, each part can be inspected by imaging one screen.

【0023】[0023]

【発明の効果】以上のように、本発明によれば、一画面
の入力によりリード曲がり、リード浮き、文字検査を同
時に行うことができ、半導体装置1個当たりの処理時間
を短縮することができる。また、装置が簡単な構成にな
るので、セッティングが容易になると共に、安価な装置
となる。
As described above, according to the present invention, lead bending, lead floating, and character inspection can be simultaneously performed by inputting one screen, and the processing time per semiconductor device can be shortened. .. Also, since the device has a simple structure, setting is easy and the device is inexpensive.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の検査装置を示す図である。FIG. 1 is a diagram showing an inspection apparatus of the present invention.

【図2】本発明の検査装置によって得られる画像を示す
図である。
FIG. 2 is a diagram showing an image obtained by the inspection device of the present invention.

【図3】画像認識手段の動作を示すフローチャートであ
る。
FIG. 3 is a flowchart showing the operation of the image recognition means.

【符号の説明】[Explanation of symbols]

1 半導体装置(デバイス) 2 設置台 3 撮像手段 4 画像認識手段 5 光反射手段(ミラー) 6 照明 1 semiconductor device (device) 2 installation base 3 imaging means 4 image recognition means 5 light reflection means (mirror) 6 illumination

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 検査すべき半導体装置を設置する設置台
と、該半導体装置を撮像する撮像手段と、該撮像手段に
よって得られた画像信号によって前記半導体装置の不良
を認識する画像認識手段とを具備する半導体装置の検査
装置において、前記設置台には前記半導体装置が設置さ
れる周辺に光反射手段を具備したことを特徴とする半導
体装置の検査装置。
1. A mounting base for mounting a semiconductor device to be inspected, an image pickup means for picking up an image of the semiconductor device, and an image recognition means for recognizing a defect of the semiconductor device by an image signal obtained by the image pickup means. In the semiconductor device inspection device, the semiconductor device inspection device is characterized in that the installation table is provided with a light reflecting means around a periphery where the semiconductor device is installed.
JP14573392A 1992-06-05 1992-06-05 Semiconductor device inspecting device Withdrawn JPH05340733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14573392A JPH05340733A (en) 1992-06-05 1992-06-05 Semiconductor device inspecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14573392A JPH05340733A (en) 1992-06-05 1992-06-05 Semiconductor device inspecting device

Publications (1)

Publication Number Publication Date
JPH05340733A true JPH05340733A (en) 1993-12-21

Family

ID=15391890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14573392A Withdrawn JPH05340733A (en) 1992-06-05 1992-06-05 Semiconductor device inspecting device

Country Status (1)

Country Link
JP (1) JPH05340733A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001521140A (en) * 1997-10-21 2001-11-06 エルウィン エム ビーティ 3D inspection system
JP2003077778A (en) * 2001-09-04 2003-03-14 Mitsubishi Electric Corp Method for managing shipment of semiconductor device
WO2012164631A1 (en) * 2011-06-03 2012-12-06 上野精機株式会社 Semiconductor print test method, program, and device for same
US10871456B2 (en) 2019-02-07 2020-12-22 Kabushiki Kaisha Toshiba Semiconductor inspection system and semiconductor inspection apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001521140A (en) * 1997-10-21 2001-11-06 エルウィン エム ビーティ 3D inspection system
JP2003077778A (en) * 2001-09-04 2003-03-14 Mitsubishi Electric Corp Method for managing shipment of semiconductor device
WO2012164631A1 (en) * 2011-06-03 2012-12-06 上野精機株式会社 Semiconductor print test method, program, and device for same
JPWO2012164631A1 (en) * 2011-06-03 2014-07-31 上野精機株式会社 Semiconductor print inspection method, program, and apparatus
US10871456B2 (en) 2019-02-07 2020-12-22 Kabushiki Kaisha Toshiba Semiconductor inspection system and semiconductor inspection apparatus

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Effective date: 19990831