JPH05318296A - Polishing device - Google Patents

Polishing device

Info

Publication number
JPH05318296A
JPH05318296A JP3068650A JP6865091A JPH05318296A JP H05318296 A JPH05318296 A JP H05318296A JP 3068650 A JP3068650 A JP 3068650A JP 6865091 A JP6865091 A JP 6865091A JP H05318296 A JPH05318296 A JP H05318296A
Authority
JP
Japan
Prior art keywords
polishing
axis
polished
revolution
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3068650A
Other languages
Japanese (ja)
Other versions
JP3178852B2 (en
Inventor
Eiji Ino
英二 井野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebatetsuku Kk
Original Assignee
Ebatetsuku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebatetsuku Kk filed Critical Ebatetsuku Kk
Priority to JP06865091A priority Critical patent/JP3178852B2/en
Publication of JPH05318296A publication Critical patent/JPH05318296A/en
Application granted granted Critical
Publication of JP3178852B2 publication Critical patent/JP3178852B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To polish a work as specified by locating each polishing body in the specified position, putting it in orbiting and rotating round its own axis, moving a group of such polishing bodies by a moving device in the direction along the axis of orbiting, and putting them in contact with a work to be polished. CONSTITUTION:Each vertical shaft 48 is revolved round the orbit axis 37 by turning a supporting member 36 by a rotation drive device 39 and also is rotated round its owm axis 47 through a vertical shaft driving device 39, and thereby each polishing body is allowed to rotate round its own axis while making the orbit. A work to be polished 8 is located in the specified position, and a group of such polishing bodies 66, 67 are moved by a moving device 55 in the direction along the orbit axis 37 to put them in contact with the work 8. Thus the intended polishing operation is executed. Because therein at least one 66 of the polishing bodies has a major dia., the area near the orbit axis 37 is always polished wherever this major dia. polishing body 66 lies in orbiting. and thereby the front surface of the work 8 can be ground.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、たとえばガラス板、金
属板、石材板など板状物や、墓石などブロック物の表面
を研磨するのに使用される研磨装置に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus used for polishing the surface of a plate-like object such as a glass plate, a metal plate, a stone plate, or a block object such as a tombstone.

【0002】[0002]

【従来の技術】従来、この種の研磨装置としては、たと
えば図7に示す構造のものが提供されている。すなわち
回転駆動装置に連動する受動軸80を設け、この受動軸
80の公転軸心81の周りでの回転82により公転軌跡
83上で公転自在な複数の縦軸84を設け、これら縦軸
84を、前記公転軸心81に沿った自転軸心85の周り
で回転86自在としている。そして各縦軸84の下端に
等径の研磨体87を取り付けるとともに、全体を板状物
89の幅方向に移動88自在としている。
2. Description of the Related Art Conventionally, as this type of polishing apparatus, for example, a polishing apparatus having a structure shown in FIG. 7 has been provided. That is, a passive shaft 80 that interlocks with a rotary drive is provided, and a plurality of vertical axes 84 that can freely revolve on a revolution trajectory 83 are provided by rotation 82 of the passive shaft 80 around a revolution axis 81. The rotation 86 is freely rotatable around the rotation axis 85 along the revolution axis 81. A polishing body 87 having the same diameter is attached to the lower end of each vertical axis 84, and the entire body is movable 88 in the width direction of the plate-like object 89.

【0003】この従来形式によると、回転駆動装置によ
り受動軸80を回転82させることで、各縦軸84を公
転軸心81の周りでの公転させるとともに、歯車機構な
どを介して各縦軸84を、自転軸心85の周りで回転8
6させ、以て研磨体87を公転させながら自転させて板
状物89の研磨を行い、さらに幅方向に移動88により
全幅に対する研磨を行っている。
According to this conventional type, by rotating 82 the passive shaft 80 by the rotary drive device, each vertical axis 84 revolves around the revolution axis 81, and each vertical axis 84 via the gear mechanism or the like. Is rotated about the rotation axis 85.
Then, the plate 87 is polished by revolving the polishing body 87 while revolving, and the plate 89 is further polished by the movement 88 in the width direction.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記した従来
の構成によると、公転軸心81を含む範囲でかつ幅方向
の全長に亘って充分に研磨されない部分Aが生じ、以て
板状物の全面に対する均一な研磨を期待できない。
However, according to the above-described conventional structure, a portion A that is not sufficiently polished is formed in the range including the revolution axis 81 and over the entire length in the width direction, so that the plate-like material is formed. You cannot expect uniform polishing over the entire surface.

【0005】本発明の目的とするところは、複数の研磨
体を公転ならびに自転させる形式でありながら、被研磨
物の表面に対する研磨を、常に全面均一にして充分に行
える研磨装置を提供する点にある。
An object of the present invention is to provide a polishing apparatus which is capable of revolving and revolving a plurality of polishing bodies and rotating the surface of an object to be polished so that the surface of the object to be polished is always uniformly and sufficiently polished. is there.

【0006】[0006]

【課題を解決するための手段】上記目的を達成すべく本
第1発明の研磨装置は、公転軸心の周りで回転自在な支
持部材と、この支持部材に連動する回転駆動装置を設
け、前記支持部材に前記公転軸心に沿った自転軸心の周
りで回転自在な複数の縦軸を挿通するとともに、各縦軸
に連動する縦軸駆動装置を設け、各縦軸の下端に研磨体
を取り付け、これら研磨体の内の少なくとも一つの研磨
体を残りの研磨体よりも大径に設定し、前記研磨体を公
転軸心に沿った方向に移動させる移動装置を設けてい
る。
In order to achieve the above object, the polishing apparatus of the first aspect of the present invention is provided with a support member rotatable about an axis of revolution and a rotary drive unit interlocking with the support member, A plurality of vertical axes that are rotatable around the rotation axis along the revolution axis are inserted into the support member, and a vertical axis drive unit that interlocks with each vertical axis is provided, and a polishing body is provided at the lower end of each vertical axis. A moving device is provided which sets at least one of these polishing bodies to have a larger diameter than the remaining polishing bodies and moves the polishing bodies in a direction along the revolution axis.

【0007】そして本第2発明の研磨装置は、一つの大
径研磨体を、公転軸心を越える径に設定している。
In the polishing apparatus of the second aspect of the present invention, one large-diameter polishing body is set to have a diameter exceeding the revolution axis.

【0008】[0008]

【作用】かかる本第1発明の構成によると、回転駆動装
置により支持部材を回転させることで、各縦軸を公転軸
心の周りでの回転させるとともに、縦軸駆動装置を介し
て各縦軸を自転軸心の周りで回転させ得、以て研磨体を
公転させながら自転させ得る。そして被研磨物を所定の
位置にした状態で、移動装置により研磨体群を公転軸心
に沿った方向に移動させて被研磨物に当接させることで
所期の研磨を行える。その際に、少なくとも一つの研磨
体が大径であることから、この大径研磨体が公転のどの
位置でも公転軸心の付近は常に研磨されることになり、
以て被研磨物の全面に対する研磨を行える。
According to the first aspect of the present invention, by rotating the support member by the rotation drive device, each vertical axis is rotated about the revolution axis, and each vertical axis is rotated by the vertical drive device. Can be rotated around the axis of rotation, so that the polishing body can be rotated while revolving. Then, with the object to be polished in a predetermined position, the moving device moves the group of objects to be polished in the direction along the axis of revolution to bring the object into contact with the object to be polished, whereby desired polishing can be performed. At that time, since at least one polishing body has a large diameter, the large diameter polishing body will always be polished in the vicinity of the revolution axis at any position of revolution.
Thus, the entire surface of the object to be polished can be polished.

【0009】さらに本第2発明の構成によると、一つの
研磨体が公転軸心を越える大径であることから、この一
つの研磨体が公転のどの位置でも公転軸心を越えて研磨
することになり、以て被研磨物の全面に対する均一な研
磨を確実に行える。
Further, according to the structure of the second aspect of the present invention, since one polishing body has a large diameter exceeding the revolving axis, this one polishing body can be polished beyond the revolving axis at any position of revolution. Therefore, uniform polishing of the entire surface of the object to be polished can be reliably performed.

【0010】[0010]

【実施例】以下に本発明の一実施例を図1〜図6に基づ
いて説明する。1はコンベヤ装置で、フレーム2と、こ
のフレーム2に支持させた多数のローラ3と、これらロ
ーラ3にチェンなどの伝動装置4を介して連動連結する
減速機付きモータ5とから構成され、各ローラ3には幅
方向の位置ずれを防止するためのリング体6が左右一対
に設けられる。このコンベヤ装置1はパレット7を支持
して搬送し、またパレット7は被研磨物の一例である板
状物8を支持する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIGS. Reference numeral 1 denotes a conveyor device, which is composed of a frame 2, a large number of rollers 3 supported on the frame 2, and a motor 5 with a reduction gear which is interlockingly connected to the rollers 3 via a transmission device 4 such as a chain. The roller 3 is provided with a pair of left and right ring bodies 6 for preventing positional deviation in the width direction. The conveyor device 1 supports and conveys a pallet 7, and the pallet 7 supports a plate-like object 8 which is an example of an object to be polished.

【0011】このように構成されたコンベヤ装置1の搬
送経路の上方に3台の研磨装置30が設けられる。これ
ら研磨装置30は同様な構成であり、前記フレーム2か
ら立設した共通の機枠10に支持されて、搬送経路に沿
って配設される。なお研磨装置30は1台のみ配設して
もよい。左右一対からなる前記機枠10の上部間にガイ
ドロッド11が設けられ、前記研磨装置30の本体31
は、このガイドロッド11に支持案内されて左右方向に
移動自在となる。
Three polishing devices 30 are provided above the transport path of the conveyor device 1 thus constructed. These polishing devices 30 have the same configuration, are supported by a common machine frame 10 standing upright from the frame 2, and are arranged along the transport path. Note that only one polishing device 30 may be provided. A guide rod 11 is provided between the upper and lower parts of the machine frame 10 formed of a pair of left and right, and a main body 31 of the polishing device 30
Is supported and guided by the guide rod 11 and is movable in the left-right direction.

【0012】前記研磨装置30を左右方向に往復移動さ
せる往復動装置12は、一方のフレーム2に取り付けた
モータ13と、その駆動軸に連動する減速機14と、こ
の減速機14からの上向きの出力軸15に取り付けた輪
体16と、この輪体16の偏心位置に調整具17を介し
て設けたクランクピン18と、このクランクピン18に
一端が連結し他端が前記本体31にピン19を介して連
結した押し引きロッド20とから構成される。
The reciprocating device 12 for reciprocating the polishing device 30 in the left-right direction includes a motor 13 mounted on one frame 2, a speed reducer 14 interlocked with its drive shaft, and an upward direction from the speed reducer 14. A ring body 16 attached to the output shaft 15, a crank pin 18 provided at an eccentric position of the ring body 16 via an adjusting tool 17, one end of which is connected to the crank pin 18, and the other end of which is a pin 19 on the main body 31. And a push-pull rod 20 connected via

【0013】前記本体31の側部から角筒状のケース枠
32が垂設され、このケース枠32の下部内面側に、上
下方向の貫通孔33を有する固定部材34が連結され
る。前記貫通孔33内に軸受け35を介して支持部材3
6が回転のみ自在に配設され、その回転軸心は上下方向
の公転軸心37となる。
A rectangular tubular case frame 32 is vertically provided from the side portion of the main body 31, and a fixing member 34 having a vertical through hole 33 is connected to the lower inner surface side of the case frame 32. The support member 3 is inserted into the through hole 33 via a bearing 35.
6 is rotatably arranged, and its axis of rotation is an orbital axis 37 in the vertical direction.

【0014】この公転軸心37上に位置するように前記
支持部材36から受動軸38が立設される。この受動軸
38を公転軸心37の周りで回転させる回転駆動装置は
前記本体31に固定したモータ39からなり、その下向
きの出力軸40に駆動輪体41を固定している。そして
駆動輪体41と前記受動軸38の上端に固定した受動輪
体42とをタイミングベルトなどの無端回動体43を介
して連動している。
A passive shaft 38 is erected from the support member 36 so as to be located on the revolution axis 37. A rotary drive device for rotating the passive shaft 38 around the revolution axis 37 is composed of a motor 39 fixed to the main body 31, and a drive wheel body 41 is fixed to an output shaft 40 facing downward. The driving wheel body 41 and the passive wheel body 42 fixed to the upper end of the passive shaft 38 are interlocked with each other through an endless rotating body 43 such as a timing belt.

【0015】前記支持部材36を貫通して3本の筒軸4
5が配設され、これら筒軸45は前記公転軸心37に対
して等距離でかつ周方向に等角度に位置し、軸受け46
を介して回転自在に支持される。その回転軸心は前記公
転軸心37に沿った自転軸心47となる。各筒軸45内
には縦軸48が挿通され、この縦軸48はキー49など
を介して筒軸45に、自転軸心47に沿って摺動のみ自
在に結合される。各縦軸48を自転軸心47の周りで同
方向に自転させるために、前記固定部材34の上部に内
歯歯車50が固定され、そして内歯歯車50に常時噛合
する歯車51を前記筒軸45の上端に固定している。
The three cylindrical shafts 4 penetrate the support member 36.
5, the cylindrical shafts 45 are equidistant with respect to the revolution axis 37 and equiangular in the circumferential direction, and the bearings 46 are provided.
It is rotatably supported via. The rotation axis thereof is a rotation axis 47 along the revolution axis 37. A vertical axis 48 is inserted into each cylindrical shaft 45, and the vertical axis 48 is slidably coupled to the cylindrical shaft 45 along a rotation axis 47 via a key 49 or the like. In order to rotate each vertical axis 48 in the same direction around the rotation axis 47, an internal gear 50 is fixed to the upper portion of the fixing member 34, and a gear 51 that constantly meshes with the internal gear 50 is attached to the cylindrical shaft. It is fixed to the upper end of 45.

【0016】前記縦軸48を昇降させるために、前記本
体31の下面に複数の加圧シリンダ55を設け、これら
加圧シリンダ55の下向きのピストンロツド間に昇降部
材56を連結している。この昇降部材56は貫通部57
を介して前記受動軸38に外嵌する。
In order to move the vertical axis 48 up and down, a plurality of pressure cylinders 55 are provided on the lower surface of the main body 31, and a lifting member 56 is connected between the downward piston rods of these pressure cylinders 55. The elevating member 56 has a through portion 57.
It is fitted onto the passive shaft 38 via.

【0017】そして貫通部57内には、前記昇降部材5
6に軸受け58を介して相対回転のみ自在に支持され、
かつ前記受動軸38にキー59を介して昇降のみ自在に
外嵌した筒部材60が設けられる。この筒部材60の下
部には球軸受け61を介して可動部材62が外嵌され、
この可動部材62に前記縦軸48の上端が軸受け63を
介して回転のみ自在に支持される。
In the penetrating portion 57, the elevating member 5
6 is supported by a bearing 58 so that only relative rotation is possible,
A cylindrical member 60 is provided on the passive shaft 38 via a key 59 so as to be freely moved up and down. A movable member 62 is externally fitted to the lower portion of the tubular member 60 via a ball bearing 61,
The upper end of the vertical axis 48 is supported by the movable member 62 via a bearing 63 so as to be rotatable only.

【0018】各縦軸48の下端には、フランジ材64や
固定具65を介して円盤状の研磨体(砥石など)が取り
付けられている。ここで研磨体は、1個が大径研磨体6
6であり、そして残りの2個が小径研磨体67である。
そして大径研磨体66は、前記公転軸心37を越える径
に設定してある。
A disk-shaped polishing body (such as a grindstone) is attached to the lower end of each vertical axis 48 via a flange member 64 and a fixture 65. Here, one polishing body is a large-diameter polishing body 6.
6 and the remaining two are small-diameter polishing bodies 67.
The large-diameter polishing body 66 is set to have a diameter exceeding the revolution axis 37.

【0019】前記研磨装置30に対して研磨スラリーを
供給し得るように構成してある。すなわちローラ3群の
下方において、前記フレーム2側に回収用ホッパー21
が配設され、この回収用ホッパー21は配管22を介し
てタンク23に連通している。このタンク23からポン
プ24により汲み上げられた研磨スラリーは、前記縦軸
48に形成した供給路25などを通して、この縦軸48
の下端から各研磨体66,67に向けて噴射される。
A polishing slurry can be supplied to the polishing apparatus 30. That is, below the group of rollers 3, the recovery hopper 21 is provided on the frame 2 side.
The recovery hopper 21 communicates with a tank 23 via a pipe 22. The polishing slurry pumped up from the tank 23 by the pump 24 passes through the supply path 25 formed on the vertical axis 48 and the like, and the vertical axis 48
Is sprayed from the lower end of the polishing plate toward the polishing bodies 66 and 67.

【0020】回転駆動装置の一例である前記モータ39
は縦軸駆動装置を兼ねているが、この縦軸駆動装置は別
個に設けてもよい。また移動装置の一例である加圧シリ
ンダ55は螺子軸形式など他の形式であってもよい。
The motor 39, which is an example of a rotary drive device.
Also serves as a vertical drive unit, but this vertical drive unit may be provided separately. Further, the pressurizing cylinder 55, which is an example of the moving device, may have another type such as a screw shaft type.

【0021】以下に上記実施例における作用を説明す
る。上面側に板状物8を支持したパレット7は、ローラ
3群上に載置されることでリング体6により幅方向の規
制を受けてコンベヤ装置1で搬送される。このとき研磨
装置30では、加圧シリンダ55の収縮により筒部材6
0などを介して可動部材62が上昇されており、これに
より縦軸48を介して研磨体66,67群も上昇してい
る。したがってパレット7は研磨装置30の下方に搬入
され、そして所定の位置で停止される。
The operation of the above embodiment will be described below. The pallet 7, which supports the plate-like object 8 on the upper surface side, is placed on the group of rollers 3 and thus is regulated in the width direction by the ring body 6 to be conveyed by the conveyor device 1. At this time, in the polishing apparatus 30, due to the contraction of the pressure cylinder 55, the cylindrical member 6
The movable member 62 is lifted through 0 or the like, and thus the polishing bodies 66, 67 are also lifted through the vertical axis 48. Therefore, the pallet 7 is carried in below the polishing device 30 and stopped at a predetermined position.

【0022】パレット7が停止する前後においてモータ
39が駆動されている。したがって、その出力軸40の
回転は無端回動体43などを介して受動軸38に伝えら
れ、以て支持部材36を公転軸心37の周りに回転70
させる。この支持部材36の回転70により、各縦軸4
8を公転軌跡71上において公転軸心37の周りでの公
転させる。同時に、各縦軸48と一体に歯車51が公転
軸心37の周りでの公転し、その際に各歯車51は固定
の内歯歯車50に噛合していることから、この歯車51
を介して縦軸48群がそれぞれ自転軸心47の周りで自
転72される。これにより研磨体66,67は公転しな
がら自転することになる。
The motor 39 is driven before and after the pallet 7 is stopped. Therefore, the rotation of the output shaft 40 is transmitted to the passive shaft 38 via the endless rotating body 43, etc., and the support member 36 is rotated about the revolution axis 37 by the rotation 70.
Let By the rotation 70 of the support member 36, each vertical axis 4
8 is revolved around the revolution axis 37 on the revolution trajectory 71. At the same time, the gears 51 revolve around the revolution axis 37 integrally with the respective vertical shafts 48, and at this time, the gears 51 mesh with the fixed internal gear 50.
The groups of vertical axes 48 are respectively rotated 72 about the rotation axis 47 via the. As a result, the polishing bodies 66 and 67 rotate about their axes while revolving.

【0023】この状態で加圧シリンダ55の伸展により
筒部材60などを介して可動部材62を下降させ、縦軸
48を介して研磨体66,67群を下降させて板状物8
の上面に当接させる。その際に、一つの研磨体が前記公
転軸心37を越える大径研磨体66であることから、こ
の大径研磨体66が公転のどの位置でも公転軸心37の
付近を常に研磨することになり、以て研磨残りの生じな
い研磨を行える。
In this state, the movable cylinder 62 is lowered by the extension of the pressure cylinder 55 through the tubular member 60, and the polishing bodies 66, 67 are lowered through the vertical axis 48 to move the plate-like object 8.
Abut the upper surface of. At this time, since one polishing body is a large-diameter polishing body 66 that exceeds the revolution axis 37, it is necessary to always polish the vicinity of the revolution axis 37 at any position of the revolution with this large-diameter polishing body 66. As a result, it is possible to perform polishing with no polishing residue.

【0024】このように板状物8の研磨を行えるのであ
り、このとき、研磨体66,67群は幅方向に移動73
されている。すなわち、モータ13の作動によりクラン
ク機構を介して押し引きロッド20を押し引き動させ
る。これによりガイドロッド11に支持案内されて本体
31が移動し、以て研磨体66,67群を幅方向に移動
73させて板状物8の全幅に対する全面の研磨を均一に
行える。
The plate-like material 8 can be polished in this manner, and at this time, the polishing bodies 66, 67 are moved 73 in the width direction.
Has been done. That is, the push-pull rod 20 is pushed and pulled by the operation of the motor 13 via the crank mechanism. As a result, the main body 31 is supported and guided by the guide rod 11, and the group of polishing bodies 66 and 67 is moved 73 in the width direction, so that the entire surface of the plate-shaped object 8 can be polished uniformly.

【0025】さらに研磨中においては、前記縦軸48の
下端から各研磨体66,67に向けて研磨スラリーが噴
射され、その研磨を助長している。そして使用済みの研
磨スラリーは回収用ホッパー21に受け止められ、配管
22を介してタンク23に回収される。またタンク23
内の研磨スラリーはポンプ24により汲み上げられ、前
記縦軸48に形成した供給路25を通して、この縦軸4
8の下端に供給される。
Further, during the polishing, the polishing slurry is sprayed from the lower end of the vertical axis 48 toward the polishing bodies 66, 67 to promote the polishing. Then, the used polishing slurry is received by the recovery hopper 21, and is recovered in the tank 23 through the pipe 22. Also the tank 23
The polishing slurry in the inside is pumped up by a pump 24, passes through a supply passage 25 formed in the vertical axis 48, and the vertical axis 4
8 is supplied to the lower end.

【0026】上記実施例では板状物8をコンベヤ装置1
で搬送する形式を示したが、これは定置式とし、板状物
8を所定位置に投入したり所定位置から取り出したりす
る形式であってもよい。さらに被研磨物としては、板状
物8の他、墓石などのブロック物でもよく、その表面に
対して研磨が行われる。
In the above embodiment, the plate-like material 8 is moved to the conveyor device 1
However, this may be a stationary type, and the plate-like object 8 may be put in or taken out from a predetermined position. Further, the object to be polished may be a block object such as a tombstone in addition to the plate-like object 8, and the surface thereof is polished.

【0027】また上記実施例では一つの大径研磨体66
が前記公転軸心37を越える形式を示したが、本第1発
明においては、大径研磨体66が、前記公転軸心37の
近くに達するが公転軸心37を越えない径に設定しても
よい。この場合に、たとえば大径研磨体66を二つと
し、小径研磨体67を一つとした組み合わせも可能にな
る。
In the above embodiment, one large-diameter polishing body 66 is used.
In the first invention, the large-diameter polishing body 66 is set to have a diameter that reaches near the revolution axis 37 but does not exceed the revolution axis 37. Good. In this case, for example, it is possible to combine two large-diameter polishing bodies 66 and one small-diameter polishing body 67.

【0028】[0028]

【発明の効果】上記構成の本第1発明によると、研磨体
を所定の位置とした状態で、公転しながら自転している
研磨体群を移動装置により公転軸心に沿った方向に移動
させ被研磨物に当接させることで、被研磨物に対する所
期の研磨を行うことができる。その際に、少なくとも一
つの研磨体が大径であることから、この大径研磨体が公
転のどの位置でも公転軸心の付近を常に研磨することが
でき、以て被研磨物の全面に対する均一な研磨を行うこ
とができる。
According to the first aspect of the present invention having the above-mentioned structure, the polishing body group that is rotating while revolving is moved in the direction along the axis of revolution by the moving device with the polishing body in a predetermined position. By bringing the object to be polished into contact with the object to be polished, desired polishing can be performed on the object to be polished. At that time, since at least one polishing body has a large diameter, this large-diameter polishing body can always polish the vicinity of the revolving axis at any position of the revolution, thereby providing a uniform surface over the object to be polished. Polishing can be performed.

【0029】さらに本第2発明によると、一つの研磨体
が公転軸心を越える大径であることから、この一つの研
磨体が公転のどの位置でも公転軸心を越えて研磨するこ
とができ、以て被研磨物の全面に対する均一な研磨を確
実に行うことができる。
Further, according to the second aspect of the present invention, since one polishing body has a large diameter exceeding the revolution axis, it is possible to polish the one polishing body beyond the revolution axis at any position of revolution. As a result, uniform polishing of the entire surface of the object to be polished can be reliably performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示し、研磨装置の一部切欠
き側面図である。
FIG. 1 is a partially cutaway side view of a polishing apparatus according to an embodiment of the present invention.

【図2】同研磨装置の一部切欠き正面図である。FIG. 2 is a partially cutaway front view of the polishing apparatus.

【図3】同研磨装置の研磨状態を示す概略平面図であ
る。
FIG. 3 is a schematic plan view showing a polishing state of the polishing apparatus.

【図4】同研磨装置を組み込んだ研磨設備の正面図であ
る。
FIG. 4 is a front view of polishing equipment incorporating the same polishing apparatus.

【図5】同研磨装置を組み込んだ研磨設備の側面図であ
る。
FIG. 5 is a side view of polishing equipment incorporating the same polishing apparatus.

【図6】同研磨装置を組み込んだ研磨設備の平面図であ
る。
FIG. 6 is a plan view of polishing equipment incorporating the same polishing apparatus.

【図7】従来例を示し、研磨装置の研磨状態を示す概略
平面図である。
FIG. 7 is a schematic plan view showing a polishing state of a polishing apparatus according to a conventional example.

【符号の説明】[Explanation of symbols]

1 コンベヤ装置 7 パレット 8 板状物(被研磨物) 11 ガイドロッド 12 往復動装置 21 回収用ホッパー 30 研磨装置 31 本体 36 支持部材 37 公転軸心 38 受動軸 39 モータ(回転駆動装置、縦軸駆動装置) 47 自転軸心 48 縦軸 50 内歯歯車 51 歯車 55 加圧シリンダ(移動装置) 62 可動部材 66 大径研磨体 67 小計研磨体 71 公転軌跡 72 自転 DESCRIPTION OF SYMBOLS 1 Conveyor device 7 Pallet 8 Plate-like object (object to be polished) 11 Guide rod 12 Reciprocating device 21 Recovery hopper 30 Polishing device 31 Main body 36 Supporting member 37 Revolution shaft center 38 Passive shaft 39 Motor (rotary drive device, vertical drive) Device 47 Rotation axis 48 Vertical axis 50 Internal gear 51 Gear 55 Pressurizing cylinder (moving device) 62 Movable member 66 Large-diameter polishing body 67 Subtotal polishing body 71 Revolution locus 72 Rotation

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 公転軸心の周りで回転自在な支持部材
と、この支持部材に連動する回転駆動装置を設け、前記
支持部材に前記公転軸心に沿った自転軸心の周りで回転
自在な複数の縦軸を挿通するとともに、各縦軸に連動す
る縦軸駆動装置を設け、各縦軸の下端に研磨体を取り付
け、これら研磨体の内の少なくとも一つの研磨体を残り
の研磨体よりも大径に設定し、前記研磨体を公転軸心に
沿った方向に移動させる移動装置を設けたことを特徴と
する研磨装置。
1. A support member rotatable about an axis of revolution and a rotary drive device interlocking with the support member are provided, and the support member is rotatable about an axis of rotation along the axis of revolution. Along with inserting a plurality of vertical axes, a vertical axis drive unit that interlocks with each vertical axis is provided, a polishing body is attached to the lower end of each vertical axis, and at least one polishing body of these polishing bodies is Also has a large diameter and is provided with a moving device for moving the polishing body in a direction along the revolution axis.
【請求項2】 一つの大径研磨体を、公転軸心を越える
径に設定したことを特徴とする請求項1に記載の研磨装
置。
2. The polishing apparatus according to claim 1, wherein one large-diameter polishing body is set to have a diameter exceeding the revolution axis.
JP06865091A 1991-04-02 1991-04-02 Polishing equipment Expired - Lifetime JP3178852B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP06865091A JP3178852B2 (en) 1991-04-02 1991-04-02 Polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06865091A JP3178852B2 (en) 1991-04-02 1991-04-02 Polishing equipment

Publications (2)

Publication Number Publication Date
JPH05318296A true JPH05318296A (en) 1993-12-03
JP3178852B2 JP3178852B2 (en) 2001-06-25

Family

ID=13379792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06865091A Expired - Lifetime JP3178852B2 (en) 1991-04-02 1991-04-02 Polishing equipment

Country Status (1)

Country Link
JP (1) JP3178852B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10329038A (en) * 1997-05-30 1998-12-15 Kamei:Kk Diamond fullback
JP2009522124A (en) * 2006-01-04 2009-06-11 ジョン クウ イェオ, Polishing head of stone polishing machine
JP2009178799A (en) * 2008-01-30 2009-08-13 Jacks:Kk Optical disk polishing device
JP2010023150A (en) * 2008-07-17 2010-02-04 Nikon Corp Polishing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6434639A (en) * 1987-07-31 1989-02-06 Toshiba Corp Control device for tool life

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6434639A (en) * 1987-07-31 1989-02-06 Toshiba Corp Control device for tool life

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10329038A (en) * 1997-05-30 1998-12-15 Kamei:Kk Diamond fullback
JP2009522124A (en) * 2006-01-04 2009-06-11 ジョン クウ イェオ, Polishing head of stone polishing machine
JP2009178799A (en) * 2008-01-30 2009-08-13 Jacks:Kk Optical disk polishing device
JP2010023150A (en) * 2008-07-17 2010-02-04 Nikon Corp Polishing apparatus

Also Published As

Publication number Publication date
JP3178852B2 (en) 2001-06-25

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