JPH0517470A - Pyrazole derivative - Google Patents

Pyrazole derivative

Info

Publication number
JPH0517470A
JPH0517470A JP21980591A JP21980591A JPH0517470A JP H0517470 A JPH0517470 A JP H0517470A JP 21980591 A JP21980591 A JP 21980591A JP 21980591 A JP21980591 A JP 21980591A JP H0517470 A JPH0517470 A JP H0517470A
Authority
JP
Japan
Prior art keywords
compound
group
pyridyl
formula
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21980591A
Other languages
Japanese (ja)
Other versions
JP2753659B2 (en
Inventor
Kinji Hashimoto
謹治 橋本
Takahiro Tomoyasu
崇浩 友安
Makoto Inoue
誠 井上
Masatoshi Inai
正敏 稲井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Pharmaceutical Factory Inc
Original Assignee
Otsuka Pharmaceutical Factory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Pharmaceutical Factory Inc filed Critical Otsuka Pharmaceutical Factory Inc
Priority to JP21980591A priority Critical patent/JP2753659B2/en
Publication of JPH0517470A publication Critical patent/JPH0517470A/en
Application granted granted Critical
Publication of JP2753659B2 publication Critical patent/JP2753659B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Plural Heterocyclic Compounds (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)

Abstract

PURPOSE:To obtain the subject new compounds useful as medicines such as antiphlogistics, anti-rheumatics, antimicrobial agents or antiviral agents. CONSTITUTION:A compound expressed by formula I [R<1> is pyridyl or (substituted)phenyl; R<2> is pyridyl or NHR<5> (R<5> is H, lower alkyl, formyl, etc.); R<3> is pyridyl; R<4> is H, lower alkanoyl, (phenyl)-lower alkoxycarbonyl; R<3> and R<4> together may form formula II ((n) is 1 or 2) or formula III (R<6> is H or lower alkyl,), e.g. 3-amino-4-(4-fluorophenyl)-5-(2-pyridyl)-pyrazole. The compound expressed by formula I is e.g. obtained by reacting a nitrile derivative expressed by the formula R<1>-CH2CN with a carboxylic acid ester expressed by the formula R<3a>COOR<7> (R<3a> is pyridyl; R<7> is lower alkyl) in the presence of a base in an inert solvent to afford a compound expressed by formula IV and subjecting the compound expressed by formula IV to cyclic reaction with hydrazine.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、新規なピラゾール誘導
体に関する。
FIELD OF THE INVENTION The present invention relates to a novel pyrazole derivative.

【0002】[0002]

【従来の技術】本発明化合物は、文献未載の新規化合物
である。
The compound of the present invention is a novel compound which has not been published in the literature.

【0003】[0003]

【発明が解決しようとする課題】本発明は、後記するよ
うに医薬品として有用な化合物を提供することを目的と
する。
DISCLOSURE OF THE INVENTION An object of the present invention is to provide a compound useful as a medicine as described below.

【0004】[0004]

【課題を解決するための手段】本発明によれば、下記一
般式(1)で表されるピラゾール誘導体が提供される。
According to the present invention, a pyrazole derivative represented by the following general formula (1) is provided.

【0005】[0005]

【化4】 [Chemical 4]

【0006】[式中R1 はピリジル基又は置換基として
低級アルキル基、低級アルコシキ基、低級アルキルチオ
基、ハロゲン置換低級アルキル基、ハロゲン原子、フェ
ニル基、フェニルチオ基及びメチレンジオキシ基から選
ばれる基を1〜3個有することのあるフェニル基を、R
2 はピリジル基又は基−NHR5 (R5 は水素原子、低
級アルキル基、低級アルカノイル基又はホルミル基を示
す)を、R3 はピリジル基を、R4 は水素原子、低級ア
ルカノイル基、低級アルコキシカルボニル基又はフェニ
ル低級アルコキシカルボニル基をそれぞれ示し、またR
3 及びR4 は互いに結合して基
[Wherein R 1 is a pyridyl group or a group selected from a lower alkyl group, a lower alkoxy group, a lower alkylthio group, a halogen-substituted lower alkyl group, a halogen atom, a phenyl group, a phenylthio group and a methylenedioxy group as a substituent. A phenyl group which may have 1 to 3 R
2 is a pyridyl group or a group -NHR 5 (R 5 is a hydrogen atom, a lower alkyl group, a lower alkanoyl group or a formyl group), R 3 is a pyridyl group, R 4 is a hydrogen atom, a lower alkanoyl group or a lower alkoxy. A carbonyl group or a phenyl lower alkoxycarbonyl group, respectively, and R
3 and R 4 are bonded to each other to form a group

【0007】[0007]

【化5】 [Chemical 5]

【0008】(nは1又は2である)又は基(N is 1 or 2) or a group

【0009】[0009]

【化6】 [Chemical 6]

【0010】(R6 は水素原子又は低級アルキル基を示
す)を形成してもよい。]上記一般式(1)で表わされ
る本発明の化合物及びその塩は、抗炎症、抗リウマチ、
抗菌、抗ウイルス等の薬理作用を示し、従って抗炎症
剤、抗リウマチ剤、抗菌剤、抗ウイルス剤等の医薬品と
して有用である。
(R 6 represents a hydrogen atom or a lower alkyl group) may be formed. ] The compound of the present invention represented by the above general formula (1) and salts thereof are anti-inflammatory, anti-rheumatic,
It exhibits antibacterial and antiviral pharmacological effects, and is therefore useful as a drug such as an anti-inflammatory agent, antirheumatic agent, antibacterial agent and antiviral agent.

【0011】本明細書において、低級アルキル基として
は、例えばメチル、エチル、プロピル、イソプロピル、
ブチル、イソブチル、tert−ブチル、ペンチル、ヘ
キシル基等の直鎖又は分岐鎖状低級アルキル基を例示で
きる。
In the present specification, examples of the lower alkyl group include methyl, ethyl, propyl, isopropyl,
Examples thereof include linear or branched lower alkyl groups such as butyl, isobutyl, tert-butyl, pentyl and hexyl groups.

【0012】低級アルコキシ基としては、例えばメトキ
シ、エトキシ、プロポキシ、イソプロポキシ、ブトキ
シ、イソブトキシ、tert−ブトキシ、ペンチルオキ
シ、ヘキシルオキシ基等を例示できる。
Examples of the lower alkoxy group include methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, tert-butoxy, pentyloxy and hexyloxy groups.

【0013】低級アルコキシカルボニル基としては、例
えばメトキシカルボニル、エトキシカルボニル、プロポ
キシカルボニル、イソプロポキシカルボニル、ブトキシ
カルボニル、イソブトキシカルボニル、tert−ブト
キシカルボニル、ペンチルオキシカルボニル、ヘキシル
オキシカルボニル基等を例示できる。
Examples of the lower alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, tert-butoxycarbonyl, pentyloxycarbonyl and hexyloxycarbonyl groups.

【0014】フェニル低級アルコキシカルボニル基とし
ては、例えばベンジルオキシカルボニル、β−フェネチ
ルオキシカルボニル、3−フェニルプロポキシカルボニ
ル、4−フェニルブトキシカルボニル、5−フェニルペ
ンチルオキシカルボニル、6−フェニルヘキシルオキシ
カルボニル基等を例示できる。
Examples of the phenyl lower alkoxycarbonyl group include benzyloxycarbonyl, β-phenethyloxycarbonyl, 3-phenylpropoxycarbonyl, 4-phenylbutoxycarbonyl, 5-phenylpentyloxycarbonyl and 6-phenylhexyloxycarbonyl groups. It can be illustrated.

【0015】低級アルキルチオ基としては、例えばメチ
ルチオ、エチルチオ、プロピルチオ、イソプロピルチ
オ、ブチルチオ、イソブチルチオ、tert−ブチルチ
オ、ペンチルチオ、ヘキシルチオ基等を例示できる。
Examples of the lower alkylthio group include methylthio, ethylthio, propylthio, isopropylthio, butylthio, isobutylthio, tert-butylthio, pentylthio and hexylthio groups.

【0016】ハロゲン置換低級アルキル基としては、例
えばトリフルオロメチル、ペンタフルオロエチル、ヘプ
タフルオロプロピル、ノナフルオロブチル、ウンデカフ
ルオロペンチル、トリデカフルオロヘキシル基を例示で
きる。
Examples of the halogen-substituted lower alkyl group include trifluoromethyl, pentafluoroethyl, heptafluoropropyl, nonafluorobutyl, undecafluoropentyl and tridecafluorohexyl groups.

【0017】低級アルカノイル基としては、例えばアセ
チル、プロピオニル、ブチリル、イソブチリル、バレリ
ル、イソバレリル、トリメチルアセチル、ヘキサノイル
基等を例示できる。
Examples of the lower alkanoyl group include acetyl, propionyl, butyryl, isobutyryl, valeryl, isovaleryl, trimethylacetyl and hexanoyl groups.

【0018】ピリジル基には、2−ピリジル、3−ピリ
ジル、4−ピリジル基が包含される。
The pyridyl group includes 2-pyridyl, 3-pyridyl and 4-pyridyl groups.

【0019】ハロゲン原子には、フッ素原子、塩素原
子、臭素原子及びヨウ素原子が包含される。
The halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

【0020】本発明のピラゾール誘導体は、各種の方法
により製造することができる。その具体例を下記反応行
程式に示す。
The pyrazole derivative of the present invention can be produced by various methods. A specific example is shown in the following reaction process formula.

【0021】〈反応工程式−1〉<Reaction Process Formula-1>

【0022】[0022]

【化7】 [Chemical 7]

【0023】[式中R1 は前記に同じ。R3aはピリジル
基を、R7 は低級アルキル基をそれぞれ示す。]上記反
応工程式−1に示すニトリル誘導体(2)とカルボン酸
エステル(3)との反応は、塩基の存在下、適当な不活
性溶媒中で行なわれる。ここで用いられる塩基として
は、例えばナトリウムメトキシド、ナトリウムエトキシ
ド、カリウム−tert−ブトキシド等の金属アルコキ
シドや、水素化ナトリウム、水素化リチウム等の金属水
素化物等を例示できる。これら塩基は通常化合物(2)
に対して1〜2.5モル量程度使用される。また、不活
性溶媒としては、例えばN,N−ジメチルホルムアミド
(DMF)、ジメチルスルホキシド(DMSO)やベン
ゼン、トルエン、キシレン等の芳香族炭化水素類を好適
に使用することができる。反応は、一般に0〜130℃
程度の温度範囲にて1〜20時間程度を要して行なわれ
る。
[Wherein R 1 is the same as above. R 3a represents a pyridyl group and R 7 represents a lower alkyl group. The reaction of the nitrile derivative (2) represented by the above reaction process formula-1 with the carboxylic acid ester (3) is carried out in the presence of a base in a suitable inert solvent. Examples of the base used here include metal alkoxides such as sodium methoxide, sodium ethoxide, potassium tert-butoxide, and metal hydrides such as sodium hydride and lithium hydride. These bases are usually compound (2)
1 to 2.5 molar amount is used. Further, as the inert solvent, for example, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), aromatic hydrocarbons such as benzene, toluene, xylene and the like can be preferably used. The reaction is generally 0 to 130 ° C.
It is carried out in a temperature range of about 1 to 20 hours.

【0024】かくして得られる化合物(4)を、引き続
いてヒドラジンと環化反応させることにより、目的化合
物(1a)を収得できる。該環化反応は、酢酸中で或い
は酢酸等の酸触媒の存在下にベンゼン、トルエン、キシ
レン等の不活性溶媒中で行なわれる。酸触媒を使用する
場合、その使用量は化合物(4)に対して等モル量以上
とするのがよい。反応は、一般に50〜130℃程度の
温度範囲にて1〜20時間程度で完了する。
The target compound (1a) can be obtained by subjecting the compound (4) thus obtained to a cyclization reaction with hydrazine. The cyclization reaction is carried out in acetic acid or in the presence of an acid catalyst such as acetic acid in an inert solvent such as benzene, toluene and xylene. When an acid catalyst is used, the amount used is preferably equimolar or more based on the compound (4). The reaction is generally completed in a temperature range of about 50 to 130 ° C. in about 1 to 20 hours.

【0025】<反応工程式−2><Reaction Process Formula-2>

【0026】[0026]

【化8】 [Chemical 8]

【0027】[式中R1 及びR3aは前記に同じ。]上記
反応工程式−2に示すホルミル化反応は、化合物(1
a)をギ酸、ギ酸−無水酢酸等のホルミル化剤で処理す
ることにより行なわれる。本反応においては、上記ホル
ミル化剤が溶媒も兼ねるので特に溶媒を必要としない
が、適当な不活性溶媒を用いることもでき、該不活性溶
媒としては、例えばジクロロメタン、1,2−ジクロロ
エタン、クロロホルム等を例示できる。反応は、一般に
40〜100℃程度の温度範囲にて2〜12時間程度の
条件で実施され、かくして目的化合物(1b)を得るこ
とができる。
[Wherein R 1 and R 3a are the same as defined above. ] The formylation reaction shown in the above reaction scheme-2 is carried out by the compound (1
It is carried out by treating a) with a formylating agent such as formic acid or formic acid-acetic anhydride. In this reaction, since the above-mentioned formylating agent also serves as a solvent, no particular solvent is required, but a suitable inert solvent can also be used, and examples of the inert solvent include dichloromethane, 1,2-dichloroethane and chloroform. Etc. can be illustrated. The reaction is generally performed under a condition of a temperature range of about 40 to 100 ° C. for about 2 to 12 hours, and thus the target compound (1b) can be obtained.

【0028】〈反応工程式−3〉<Reaction Process Formula-3>

【0029】[0029]

【化9】 [Chemical 9]

【0030】[式中R1 及びR3aは前記に同じ。R
2a(=R3a)はピリジル基を、R4a及びR5aはそれぞれ
低級アルカノイル基を示す。]上記反応工程式−3にお
いて、化合物(1a)のアルカノイル化反応は、不活性
溶媒中で原料化合物と酸無水物とを反応させることによ
り行ない得る。上記不活性溶媒としては、例えばテトラ
ヒドロフラン(THF)、ジエチルエーテル、クロロホ
ルム、ジクロロメタン、DMF等を使用できる。上記反
応系内には更に必要に応じて、例えばピリジン、コリジ
ン、ルチジン、トリエチルアミン等の塩基触媒を添加存
在させることができる。また酸無水物としては、例えば
無水酢酸、無水プロピオン酸、無水酪酸、無水吉草酸、
無水カプロン酸、無水ヘプタン酸等を使用できる。反応
は、0〜100℃の温度条件下に、1〜24時間程度で
完結し、かくして目的化合物(1c)及び/又は(1
d)が得られる。
[In the formula, R 1 and R 3a are the same as defined above. R
2a (= R 3a ) represents a pyridyl group, and R 4a and R 5a each represent a lower alkanoyl group. In the above reaction process formula-3, the alkanoylation reaction of the compound (1a) can be carried out by reacting the starting compound with an acid anhydride in an inert solvent. As the above-mentioned inert solvent, for example, tetrahydrofuran (THF), diethyl ether, chloroform, dichloromethane, DMF and the like can be used. If necessary, a basic catalyst such as pyridine, collidine, lutidine, triethylamine and the like can be added and present in the reaction system. As the acid anhydride, for example, acetic anhydride, propionic anhydride, butyric anhydride, valeric anhydride,
Caproic anhydride, heptanoic anhydride, etc. can be used. The reaction is completed in about 1 to 24 hours under the temperature condition of 0 to 100 ° C., and thus the target compound (1c) and / or (1
d) is obtained.

【0031】〈反応工程式−4〉<Reaction Process Formula-4>

【0032】[0032]

【化10】 [Chemical 10]

【0033】[式中R1 、R2a及びR3bは前記に同じ。
4bは低級アルコキシカルボニル基又はフェニル低級ア
ルコキシカルボニル基を、Xはハロゲン原子をそれぞれ
示す。]上記反応工程式−4に示す化合物(1a)とハ
ロ蟻酸エステル誘導体(5)との反応は、適当な不活性
溶媒中、脱酸剤の存在下に実施される。上記不活性溶媒
としては、例えばジクロロメタン、クロロホルム、DM
F、THF、ジオキサン等を例示できる。ハロ蟻酸エス
テル誘導体(5)の使用量は、通常化合物(1a)に対
して1〜2.5倍モル量程度とするのがよい。また脱酸
剤としては、例えば水素化ナトリウム、炭酸カリウム、
炭酸ナトリウム、トリエチルアミン、ジイソプロピルエ
チルアミン等を好適に用いることができ、その使用量
は、化合物(1a)に対して1〜2.5倍モル量程度を
採用できる。反応は、0〜50℃程度の温度条件下に1
〜24時間程度で完結し、かくして目的化合物(1e)
が得られる。
[In the formula, R 1 , R 2a and R 3b are the same as defined above.
R 4b represents a lower alkoxycarbonyl group or a phenyl lower alkoxycarbonyl group, and X represents a halogen atom. The reaction of the compound (1a) represented by the above reaction scheme-4 with the haloformic acid ester derivative (5) is carried out in a suitable inert solvent in the presence of a deoxidizing agent. Examples of the inert solvent include dichloromethane, chloroform, DM
Examples include F, THF, dioxane and the like. The amount of the haloformic acid ester derivative (5) used is usually about 1 to 2.5 times the molar amount of the compound (1a). Examples of the deoxidizing agent include sodium hydride, potassium carbonate,
Sodium carbonate, triethylamine, diisopropylethylamine and the like can be preferably used, and the amount thereof used can be about 1 to 2.5 times the molar amount of the compound (1a). The reaction is carried out under the temperature condition of 0 to 50 ° C.
Is completed in about 24 hours, and thus the target compound (1e) is obtained.
Is obtained.

【0034】<反応工程式−5><Reaction Process Formula-5>

【0035】[0035]

【化11】 [Chemical 11]

【0036】[式中R1 及びR3aは前記に同じ。]上記
反応工程式−5に示す化合物(1b)の還元反応は、例
えばジエチルエーテル、THF、ベンゼン等の不活性溶
媒中、水素化リチウムアルミニウム、水素化ホウ素リチ
ウム等の還元剤を用いて実施される。該還元剤の使用量
は、通常化合物(1b)に対して等モル量以上とされ
る。反応は、一般に0〜70℃程度の温度条件下に、2
〜24時間程度で完結し、かくして目的化合物(1f)
が得られる。
[In the formula, R 1 and R 3a are the same as defined above. ] The reduction reaction of the compound (1b) shown in the above reaction process formula-5 is carried out using a reducing agent such as lithium aluminum hydride or lithium borohydride in an inert solvent such as diethyl ether, THF or benzene. It The amount of the reducing agent used is usually an equimolar amount or more with respect to the compound (1b). The reaction is generally carried out under the temperature condition of about 0 to 70 ° C.
Is completed in about 24 hours, and thus the target compound (1f) is obtained.
Is obtained.

【0037】<反応工程式−6><Reaction Process Formula-6>

【0038】[0038]

【化12】 [Chemical 12]

【0039】[式中R1 、R3a及びnは前記に同じ。R
8 は低級アルキル基を、Yはハロゲン原子をそれぞれ示
す。]上記反応工程式−6に示す環化反応は、化合物
(1a)とハロカルボン酸エステル(6)とを塩基の存
在下に反応させることにより実施される。ハロカルボン
酸エステル(6)の具体例としては、例えばブロム酢酸
エチル、クロル酢酸エチル、3−ブロムプロピオン酸エ
チル等を例示でき、その使用量は、化合物(1a)に対
し1〜3倍モル量程度とするのがよい。また塩基として
は、例えば炭酸カルシウム、炭酸ナトリウム等の無機塩
類や水素化ナトリウム、トリエチルアミン等を例示で
き、之等は通常ハロカルボン酸エステル(6)に対し1
〜2.5倍モル量程度使用される。反応は、DMF、ジ
メチルアセトアミド(DMA)等の不活性溶媒中、50
〜130℃程度の温度条件下で3〜30時間程度を要し
て実施され、かくして目的化合物(1g)を得ることが
できる。
[In the formula, R 1 , R 3a and n are the same as defined above. R
8 represents a lower alkyl group, and Y represents a halogen atom. The cyclization reaction represented by the above reaction process formula-6 is carried out by reacting the compound (1a) with the halocarboxylic acid ester (6) in the presence of a base. Specific examples of the halocarboxylic acid ester (6) include ethyl bromoacetate, ethyl chloroacetate, ethyl 3-bromopropionate, and the like, and the amount thereof is about 1 to 3 times the molar amount of the compound (1a). It is good to say Examples of the base include inorganic salts such as calcium carbonate and sodium carbonate, sodium hydride, triethylamine and the like.
~ 2.5 times the molar amount is used. The reaction is carried out in an inert solvent such as DMF or dimethylacetamide (DMA) at 50
It is carried out under a temperature condition of about 130 ° C. for about 3 to 30 hours, and thus the target compound (1 g) can be obtained.

【0040】<反応工程式−7><Reaction Process Formula-7>

【0041】[0041]

【化13】 [Chemical 13]

【0042】[式中R1 、R2a及びR3aは前記に同じ。
6a及びR9 はそれぞれ低級アルキル基を示す。]上記
反応工程式−7に示す化合物(1a)と化合物(7)と
の反応は、酢酸、エタノール−酢酸、ベンゼン、トルエ
ン等の不活性溶媒中で加熱処理することにより行なわれ
る。化合物(7)は一般に化合物(1a)に対して1〜
2倍モル量程度用いられる。加熱条件は、80〜150
℃程度で1〜24時間程度とするのがよい。かくして目
的化合物(1h)が得られる。
[In the formula, R 1 , R 2a and R 3a are the same as defined above.
R 6a and R 9 each represent a lower alkyl group. The reaction of the compound (1a) represented by the above reaction process formula-7 with the compound (7) is carried out by heat treatment in an inert solvent such as acetic acid, ethanol-acetic acid, benzene or toluene. The compound (7) is generally 1 to the compound (1a).
It is used in a double molar amount. The heating conditions are 80-150
It is preferable to set the temperature to about 1 to 24 hours. Thus, the target compound (1h) is obtained.

【0043】<反応工程式−8><Reaction Process Formula-8>

【0044】[0044]

【化14】 [Chemical 14]

【0045】[式中R1 、R2a及びR6aは前記に同
じ。]上記反応工程式−8に示す化合物(1a)の加水
分解反応は、メタノール、エタノール、THF、ジオキ
サン等の不活性溶媒中、水酸化ナトリウム水溶液、水酸
化カリウム水溶液等のアルカリ水溶液を用いて実施され
る。反応は、室温〜溶媒の沸点程度の温度で1〜15時
間程度を要して行なわれる。かくして目的化合物(1
i)が得られる。
[In the formula, R 1 , R 2a and R 6a are the same as defined above. ] The hydrolysis reaction of the compound (1a) shown in the above reaction process formula-8 is carried out using an alkaline aqueous solution such as an aqueous sodium hydroxide solution or an aqueous potassium hydroxide solution in an inert solvent such as methanol, ethanol, THF or dioxane. To be done. The reaction is carried out at room temperature to a boiling point of the solvent for about 1 to 15 hours. Thus, the target compound (1
i) is obtained.

【0046】上記各反応工程式に示す方法により得られ
る目的化合物は、慣用の分離手段により容易に単離精製
できる。該手段としては、例えば溶媒抽出、再結晶、カ
ラムクロマトグラフィー等を例示できる。
The target compound obtained by the method shown in each of the above reaction schemes can be easily isolated and purified by a conventional separation means. Examples of the means include solvent extraction, recrystallization, column chromatography and the like.

【0047】また、本発明化合物(1)は、これに常法
に従い適当な酸性化合物を付加反応させることにより容
易に医薬的に許容される酸付加塩とすることができる。
上記酸付加塩を形成し得る酸性化合物としては、例えば
塩酸、硫酸、リン酸、臭化水素酸等の無機酸及びシュウ
酸、マレイン酸、フマール酸、リンゴ酸、酒石酸、クエ
ン酸、安息香酸、ベンゼンスルホン酸等の有機酸を例示
できる。
The compound (1) of the present invention can be easily converted into a pharmaceutically acceptable acid addition salt by subjecting the compound (1) of the present invention to an addition reaction with an appropriate acidic compound according to a conventional method.
Examples of the acidic compound capable of forming the acid addition salt include inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid and hydrobromic acid, and oxalic acid, maleic acid, fumaric acid, malic acid, tartaric acid, citric acid, benzoic acid, An organic acid such as benzenesulfonic acid can be exemplified.

【0048】上記酸付加塩は、遊離形態の本発明化合物
と同様の薬理活性を有しており、本発明はかかる酸付加
塩をも包含する。
The above acid addition salts have the same pharmacological activity as the compound of the present invention in a free form, and the present invention also includes such acid addition salts.

【0049】尚、本発明のピラゾール誘導体のうち、下
記一般式(1j)で表される化合物は、下式に示す化合
物(1k)及び化合物(1l)の互変異性体として存在
することも可能であり、本発明はこれらの化合物をも包
含する。
Among the pyrazole derivatives of the present invention, the compound represented by the following general formula (1j) may exist as a tautomer of the compound (1k) and the compound (1l) represented by the following formula. The present invention also includes these compounds.

【0050】[0050]

【化15】 [Chemical 15]

【0051】[0051]

【実施例】以下、本発明を更に詳しく説明するため、本
発明化合物の製造例を実施例として挙げる。
EXAMPLES In order to explain the present invention in more detail, production examples of the compound of the present invention will be given below as Examples.

【0052】[0052]

【実施例1】3−アミノ−4−(4−フルオロフェニ
ル)−5−(2−ピリジル)−ピラゾールの製造 4−フルオロフェニルアセトニトリル27g(0.2モ
ル)、ピコリン酸エチル32g(0.21モル)及びナ
トリウムメトキシド23g(0.43モル)をトルエン
300mlに懸濁させ、90℃で2時間加熱撹拌した。
反応液を放冷後、析出した黄色結晶を濾過し、少量のト
ルエンで洗浄した。
Example 1 Preparation of 3-amino-4- (4-fluorophenyl) -5- (2-pyridyl) -pyrazole 4-fluorophenylacetonitrile 27 g (0.2 mol), ethyl picolinate 32 g (0.21) Mol) and 23 g (0.43 mol) of sodium methoxide were suspended in 300 ml of toluene, and the mixture was heated and stirred at 90 ° C. for 2 hours.
After allowing the reaction solution to cool, the precipitated yellow crystals were filtered and washed with a small amount of toluene.

【0053】次に、上記で得られた黄色結晶を酢酸20
0mlに懸濁させ、これに氷冷下抱水ヒドラジン40g
(0.8モル)を加え、そのまま30分間撹拌後、90
℃で1時間加熱撹拌した。反応液を氷水中に注ぎ込み、
ジクロロメタンで抽出し、有機層を炭酸水素ナトリウム
水溶液、飽和食塩水で順次洗浄後、無水硫酸ナトリウム
で乾燥し、減圧濃縮した。濃縮により生じた沈殿を濾取
して酢酸エチルで洗浄し、次いでこれを500mlのエ
タノール−酢酸エチル(2:3)に溶解して活性炭処理
を行なった。活性炭を濾別し、減圧濃縮後生成した結晶
を濾取し、エタノール−酢酸エチルより再結晶して目的
化合物11gを得た。
Next, the yellow crystals obtained above were mixed with acetic acid 20.
Suspend in 0 ml and add 40 g of hydrazine hydrate under ice cooling.
(0.8 mol) was added, and the mixture was stirred as it was for 30 minutes, then 90
The mixture was heated and stirred at ℃ for 1 hour. Pour the reaction solution into ice water,
The mixture was extracted with dichloromethane, the organic layer was washed successively with an aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The precipitate formed by concentration was collected by filtration and washed with ethyl acetate, and this was dissolved in 500 ml of ethanol-ethyl acetate (2: 3) and treated with activated carbon. Activated carbon was filtered off and the crystals formed after concentration under reduced pressure were collected by filtration and recrystallized from ethanol-ethyl acetate to obtain 11 g of the target compound.

【0054】得られた化合物の構造及び物性を、化合物
1として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 1.

【0055】[0055]

【実施例2〜18】実施例1と同様にして、第1表に示
す各化合物(化合物2〜18)を製造した。得られた化
合物の構造及び物性を第1表に併記する。
Examples 2 to 18 In the same manner as in Example 1, each compound shown in Table 1 (Compounds 2 to 18) was produced. The structure and physical properties of the obtained compound are also shown in Table 1.

【0056】[0056]

【実施例19】3−アミノ−4−(4−メトキシフェニ
ル)−5−(2−ピリジル)−ピラゾール二塩酸塩の製
造 4−メトキシフェニルアセトニトリル7.4g(50ミ
リモル)、ピコリン酸エチル7.6g(50ミリモル)
及びナトリウムメトキシド5.7g(100ミリモル)
をトルエン100mlに懸濁させ、90℃で1時間加熱
撹拌した。反応液を放冷後、減圧乾固した。次に、残渣
を酢酸60mlに懸濁させ、氷冷下抱水ヒドラジン9.
8ml(200ミリモル)を加え、そのまま10分間撹
拌後、90℃で1時間加熱撹拌した。反応液を氷水中に
注ぎ込み、ジクロロメタンで抽出し、有機層を炭酸水素
ナトリウム水溶液、飽和食塩水で順次洗浄後、無水硫酸
ナトリウムで乾燥し、減圧濃縮した。残渣に4N塩酸−
酢酸エチルを加え、生成した結晶を濾取し、メタノール
−ジエチルエーテルで再結晶して目的化合物5gを得
た。
Example 19 Preparation of 3-amino-4- (4-methoxyphenyl) -5- (2-pyridyl) -pyrazole dihydrochloride 7.4 g (50 mmol) 4-methoxyphenylacetonitrile, ethyl picolinate 7. 6 g (50 mmol)
And sodium methoxide (5.7 g, 100 mmol)
Was suspended in 100 ml of toluene and heated and stirred at 90 ° C. for 1 hour. The reaction solution was allowed to cool and then dried under reduced pressure. Next, the residue was suspended in 60 ml of acetic acid, and hydrazine hydrate under ice cooling was used.
8 ml (200 mmol) was added, and the mixture was stirred as it was for 10 minutes and then heated and stirred at 90 ° C. for 1 hour. The reaction solution was poured into ice water and extracted with dichloromethane. The organic layer was washed successively with an aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. 4N hydrochloric acid on the residue
Ethyl acetate was added, and the formed crystals were collected by filtration and recrystallized from methanol-diethyl ether to obtain 5 g of the target compound.

【0057】得られた化合物の構造及び物性を、化合物
19として第1表に示す。
The structure and physical properties of the resulting compound are shown in Table 1 as Compound 19.

【0058】[0058]

【実施例20〜24】実施例1と同様にして、第1表に
示す各化合物(化合物20〜24)を製造した。得られ
た化合物の構造及び物性を第1表に併記する。
Examples 20 to 24 In the same manner as in Example 1, each compound shown in Table 1 (Compounds 20 to 24) was produced. The structure and physical properties of the obtained compound are also shown in Table 1.

【0059】[0059]

【実施例25】3−ホルムアミド−4−(3,4−ジメ
トキシフェニル)−5−(2−ピリジル)−ピラゾール
の製造 化合物14の2.26g(7.6ミリモル)をジクロロ
メタン23mlに溶解し、氷冷下にギ酸−無水酢酸
(5:3,容量比)3mlを滴下し、室温で3日間撹拌
した。反応液を減圧濃縮し、更にキシレンを加えて3回
共沸下減圧濃縮し、得られた残渣を酢酸エチル、次いで
メタノール−酢酸エチルで再結晶して目的化合物1.6
gを得た。
Example 25 Preparation of 3-formamido-4- (3,4-dimethoxyphenyl) -5- (2-pyridyl) -pyrazole 2.26 g (7.6 mmol) of compound 14 was dissolved in 23 ml of dichloromethane, 3 ml of formic acid-acetic anhydride (5: 3, volume ratio) was added dropwise under ice cooling, and the mixture was stirred at room temperature for 3 days. The reaction mixture was concentrated under reduced pressure, xylene was further added, and the mixture was concentrated under reduced pressure three times under azeotropic distillation, and the obtained residue was recrystallized from ethyl acetate and then methanol-ethyl acetate to give the desired compound
g was obtained.

【0060】得られた化合物の構造及び物性を、化合物
25として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 25.

【0061】[0061]

【実施例26】実施例25と同様にして、第1表に示す
化合物26を製造した。得られた化合物の構造及び物性
を第1表に併記する。
Example 26 In the same manner as in Example 25, the compound 26 shown in Table 1 was prepared. The structure and physical properties of the obtained compound are also shown in Table 1.

【0062】また上記化合物26は、次の方法によって
も製造される。即ち化合物1の5.4g(21.2ミリ
モル)にギ酸9.5mlを加え、約60分で温度を10
0℃まで上げ、100℃で一晩加熱し、反応終了後、過
剰のギ酸を減圧留去し、更にキシレンを加えて2回共沸
下減圧濃縮し、得られた残渣を酢酸エチル、次いでジク
ロロメタン−メタノール−酢酸エチルで再結晶した。か
くして化合物26の5.3gを得た。
The above compound 26 can also be produced by the following method. That is, 9.5 ml of formic acid was added to 5.4 g (21.2 mmol) of compound 1, and the temperature was adjusted to 10 at about 60 minutes.
After raising the temperature to 0 ° C and heating at 100 ° C overnight, after completion of the reaction, excess formic acid was distilled off under reduced pressure, xylene was further added, and the mixture was concentrated twice under azeotropic distillation under reduced pressure, and the obtained residue was diluted with ethyl acetate and then with dichloromethane. -Recrystallized from methanol-ethyl acetate. Thus, 5.3 g of compound 26 was obtained.

【0063】[0063]

【実施例27〜28】3−アセトアミド−4−(4−フ
ルオロフェニル)−5−(2−ピリジル)−ピラゾール
及び1−アセチル−5−アミノ−4−(4−フルオロフ
ェニル)−3−(2−ピリジル)ピラゾールの製造 化合物1の5.0g(19.7ミリモル)をクロロホル
ム15mlに溶解させ、無水酢酸2.01g(19.7
ミリモル)を加え、室温で3日間反応させた。反応液を
減圧濃縮し、酢酸エチルで抽出し、無水硫酸ナトリウム
で乾燥させた後、減圧濃縮した。残渣をジエチルエーテ
ル、次いで酢酸エチル−ジエチルエーテルで再結晶し
て、目的化合物(化合物27)1.27gを得た。
Examples 27-28 3-Acetamido-4- (4-fluorophenyl) -5- (2-pyridyl) -pyrazole and 1-acetyl-5-amino-4- (4-fluorophenyl) -3- ( Preparation of 2-pyridyl) pyrazole 5.0 g (19.7 mmol) of compound 1 was dissolved in 15 ml of chloroform, and 2.01 g of acetic anhydride (19.7).
(Mmol) and added, and reacted at room temperature for 3 days. The reaction solution was concentrated under reduced pressure, extracted with ethyl acetate, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The residue was recrystallized from diethyl ether and then ethyl acetate-diethyl ether to obtain 1.27 g of the desired compound (Compound 27).

【0064】上記再結晶の母液を濃縮して得られる残渣
を、シリカゲルカラムクロマトグラフィー(溶出溶媒…
ジクロロメタン−メタノール=50:1)により精製
し、目的画分を更にジエチルエーテル、次いで酢酸エチ
ルで再結晶して、目的化合物(化合物28)1.05g
を得た。
The residue obtained by concentrating the mother liquor of the above recrystallization is subjected to silica gel column chromatography (elution solvent ...
Dichloromethane-methanol = 50: 1), and the target fraction was recrystallized from diethyl ether and then ethyl acetate to give the target compound (compound 28) (1.05 g).
Got

【0065】得られた各化合物の構造及び物性を第1表
に併記する。
Table 1 shows the structures and physical properties of the obtained compounds.

【0066】[0066]

【実施例29】5−アミノ−1−ベンジルオキシカルボ
ニル−4−(3,4−ジメトキシフェニル)−3−(2
−ピリジル)−ピラゾールの製造 化合物14の1.0g(2.7ミリモル)をジクロロメ
タン20mlに溶解し、トリエチルアミン0.74ml
(5.31ミリモル)を加え、更に氷冷下にクロロギ酸
ベンジル0.4ml(2.78ミリモル)を滴下した。
室温で3時間撹拌後、更にクロロギ酸ベンジル0.2m
lを追加し一晩反応させた。反応液に水を加え、ジクロ
ロメタンで抽出し、有機層を無水硫酸ナトリウムで乾燥
後、減圧濃縮した。得られた残渣を、シリカゲルカラム
クロマトグラフィー(溶出溶媒…ジクロロメタン−メタ
ノール=50:1)により精製し、目的画分を減圧濃縮
し、更にジエチルエーテル、次いでジクロロメタン−酢
酸エチルで再結晶して、目的化合物380mgを得た。
Example 29 5-Amino-1-benzyloxycarbonyl-4- (3,4-dimethoxyphenyl) -3- (2
Preparation of -pyridyl) -pyrazole 1.0 g (2.7 mmol) of compound 14 was dissolved in 20 ml of dichloromethane and 0.74 ml of triethylamine was dissolved.
(5.31 mmol) was added, and 0.4 ml (2.78 mmol) of benzyl chloroformate was further added dropwise under ice cooling.
After stirring for 3 hours at room temperature, benzyl chloroformate 0.2m
1 was added and reacted overnight. Water was added to the reaction solution, extraction was performed with dichloromethane, the organic layer was dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue is purified by silica gel column chromatography (elution solvent ... dichloromethane-methanol = 50: 1), the target fraction is concentrated under reduced pressure, and further recrystallized with diethyl ether and then dichloromethane-ethyl acetate to obtain the target. 380 mg of the compound are obtained.

【0067】得られた化合物の構造及び物性を、化合物
29として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 29.

【0068】[0068]

【実施例30】5−アミノ−4−(4−フルオロフェニ
ル)−1−メトキシカルボニル−3−(2−ピリジル)
−ピラゾールの製造 水素化ナトリウム1.0gのDMF40ml懸濁液に、
5.0g(19.7ミリモル)の化合物1のDMF(4
0ml)溶液を室温で滴下し、更に室温で1時間撹拌し
た。そこへ、クロロギ酸メチル1.68ml(21.7
ミリモル)を加え、室温で1時間撹拌した。反応液に水
及び酢酸エチルを加えて抽出し、有機層を3回水洗後、
無水硫酸ナトリウムで乾燥し、減圧濃縮した。得られた
残渣をジエチルエーテル−酢酸エチルで再結晶して、目
的化合物3.15gを得た。
Example 30 5-Amino-4- (4-fluorophenyl) -1-methoxycarbonyl-3- (2-pyridyl)
-Production of pyrazole In a suspension of 1.0 g of sodium hydride in 40 ml of DMF,
5.0 g (19.7 mmol) of Compound 1 DMF (4
(0 ml) solution was added dropwise at room temperature, and the mixture was further stirred at room temperature for 1 hour. There, 1.68 ml of methyl chloroformate (21.7
(Mmol) and added and stirred at room temperature for 1 hour. Water and ethyl acetate were added to the reaction solution for extraction, the organic layer was washed 3 times with water,
It was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was recrystallized from diethyl ether-ethyl acetate to obtain 3.15 g of the objective compound.

【0069】得られた化合物の構造及び物性を、化合物
30として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as compound 30.

【0070】[0070]

【実施例31】 4−(4−フルオロフェニル)−3−
メチルアミノ−5−(2−ピリジル)−ピラゾールの製
造 水素化リチウムアルミニウム0.8gのTHF30ml
の懸濁液に、化合物26の2.0g(7.09ミリモ
ル)のTHF(20ml)懸濁液を氷冷下に滴下した。
室温で一晩撹拌した後、反応液に水1ml及び5%水酸
化ナトリウム水溶液1mlを加えて数分撹拌し、更に水
を3ml追加して撹拌した。不溶物を充分生成させた
後、これをセライトで濾別し、濾液にジクロロメタンと
水を加えて抽出した。有機層を無水硫酸ナトリウムで乾
燥して減圧濃縮し、得られた残渣を酢酸エチル−ジエチ
ルエーテル、次いでジクロロメタン−ジエチルエーテル
で再結晶して、目的化合物0.94gを得た。
Example 31 4- (4-fluorophenyl) -3-
Preparation of Methylamino-5- (2-pyridyl) -pyrazole 0.8 g lithium aluminum hydride, 30 ml THF
A suspension of 2.0 g (7.09 mmol) of compound 26 in THF (20 ml) was added dropwise to the suspension prepared in (1) under ice cooling.
After stirring overnight at room temperature, 1 ml of water and 1 ml of 5% aqueous sodium hydroxide solution were added to the reaction solution and the mixture was stirred for several minutes, and 3 ml of water was further added and stirred. After sufficient insoluble matter was formed, this was filtered off with Celite, and dichloromethane and water were added to the filtrate for extraction. The organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure, and the obtained residue was recrystallized from ethyl acetate-diethyl ether and then dichloromethane-diethyl ether to obtain 0.94 g of the target compound.

【0071】得られた化合物の構造及び物性を、化合物
31として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 31.

【0072】[0072]

【実施例32】6,7−ジヒドロ−3−(4−フルオロ
フェニル)−2−(2−ピリジル)−4H−ピラゾロ
[1,5−a]−ピリミジン−5−オンの製造 化合物1の1.0g(3.93ミリモル)、3−ブロモ
プロピオン酸エチル0.56ml(4.33ミリモル)
及び無水炭酸カリウム543mg(3.93ミリモル)
をDMF20mlに加え、110℃で5時間加熱した。
その後、3−ブロムプロピオン酸エチル及び無水炭酸カ
リウムをそれぞれ1当量ずつ追加し、110℃で一晩加
熱した。反応終了後、放冷し、水及び酢酸エチルを加え
て抽出した。酢酸エチル層を飽和食塩水で2回洗浄し、
無水硫酸ナトリウムで乾燥させ、減圧濃縮した。得られ
た残渣をジエチルエーテルで再結晶して、目的化合物の
400mgを得た。
Example 32 Preparation of 6,7-dihydro-3- (4-fluorophenyl) -2- (2-pyridyl) -4H-pyrazolo [1,5-a] -pyrimidin-5-one Compound 1 1 0.0 g (3.93 mmol), ethyl 3-bromopropionate 0.56 ml (4.33 mmol)
And anhydrous potassium carbonate 543 mg (3.93 mmol)
Was added to 20 ml of DMF and heated at 110 ° C. for 5 hours.
Then, ethyl 3-bromopropionate and anhydrous potassium carbonate were added in an amount of 1 equivalent each, and the mixture was heated at 110 ° C. overnight. After completion of the reaction, the mixture was allowed to cool, and water and ethyl acetate were added for extraction. The ethyl acetate layer was washed twice with saturated saline,
It was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The obtained residue was recrystallized from diethyl ether to obtain 400 mg of the target compound.

【0073】得られた化合物の構造及び物性を、化合物
32として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 32.

【0074】[0074]

【実施例33】エチル3−(4−フルオロフェニル)−
7−ヒドロキシ−2−(2−ピリジル)−ピラゾロ
[1,5−a]−ピリミジン−6−カルボキシレートの
製造 5g(19.7ミリモル)の化合物1及び4.5g(2
0.8ミリモル)のエトキシメチレンマロン酸ジエチル
に酢酸50mlを加え、この混合液を7時間加熱還流し
た。反応後、減圧濃縮し、生成した結晶を濾取し、更に
ジエチルエーテルで洗浄して6.5gの目的化合物を得
た。
Example 33 Ethyl 3- (4-fluorophenyl)-
Preparation of 7-hydroxy-2- (2-pyridyl) -pyrazolo [1,5-a] -pyrimidine-6-carboxylate 5 g (19.7 mmol) of compound 1 and 4.5 g (2
50 ml of acetic acid was added to (0.8 mmol) diethyl ethoxymethylenemalonate, and the mixture was heated under reflux for 7 hours. After the reaction, the reaction mixture was concentrated under reduced pressure, the produced crystals were collected by filtration, and washed with diethyl ether to obtain 6.5 g of the objective compound.

【0075】得られた化合物の構造及び物性を、化合物
33として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as Compound 33.

【0076】[0076]

【実施例34】3−(4−フルオロフェニル)−7−ヒ
ドロキシ−2−(2−ピリジル)−ピラゾロ[1,5−
a]−ピリミジン−6−カルボン酸の製造 化合物1の4.5g(11.9ミリモル)をエタノール
60mlに溶かし、12.5%水酸化ナトリウム水溶液
40mlを加え、80℃で4時間加熱した。反応液を放
冷し、塩酸を滴下してpHを約4に調整後、生じた沈殿
物を濾取し、更にメタノール次いでジエチルエーテルで
洗浄して3.6gの目的化合物を得た。
Example 34 3- (4-Fluorophenyl) -7-hydroxy-2- (2-pyridyl) -pyrazolo [1,5-
a] -Production of pyrimidine-6-carboxylic acid 4.5 g (11.9 mmol) of Compound 1 was dissolved in 60 ml of ethanol, 40 ml of 12.5% sodium hydroxide aqueous solution was added, and the mixture was heated at 80 ° C for 4 hours. The reaction solution was allowed to cool, hydrochloric acid was added dropwise to adjust the pH to about 4, and the resulting precipitate was collected by filtration and washed with methanol and then diethyl ether to obtain 3.6 g of the target compound.

【0077】得られた化合物の構造及び物性を、化合物
34として第1表に示す。
The structure and physical properties of the obtained compound are shown in Table 1 as compound 34.

【0078】[0078]

【実施例35】実施例1と同様にして、第1表に示す化
合物35を製造した。得られた化合物の構造及び物性を
第1表に併記する。
Example 35 Compound 35 shown in Table 1 was produced in the same manner as in Example 1. The structure and physical properties of the obtained compound are also shown in Table 1.

【0079】[0079]

【実施例36】実施例25と同様にして、第1表に示す
化合物36を製造した。得られた化合物の構造及び物性
を第1表に併記する。
Example 36 In the same manner as in Example 25, the compound 36 shown in Table 1 was prepared. The structure and physical properties of the obtained compound are also shown in Table 1.

【0080】[0080]

【実施例37】実施例31と同様にして、第1表に示す
化合物37を製造した。得られた化合物の構造及び物性
を第1表に併記する。
Example 37 In the same manner as in Example 31, the compound 37 shown in Table 1 was prepared. The structure and physical properties of the obtained compound are also shown in Table 1.

【0081】[0081]

【実施例38及び39】実施例30と同様にして、第1
表に示す化合物38及び化合物39を製造した。得られ
た化合物の構造及び物性を第1表に併記する。
[Embodiments 38 and 39]
Compound 38 and compound 39 shown in the table were produced. The structure and physical properties of the obtained compound are also shown in Table 1.

【0082】[0082]

【表1】 [Table 1]

【0083】[0083]

【表2】 [Table 2]

【0084】[0084]

【表3】 [Table 3]

【0085】[0085]

【表4】 [Table 4]

【0086】[0086]

【表5】 [Table 5]

【0087】[0087]

【表6】 [Table 6]

【0088】[0088]

【表7】 [Table 7]

【0089】[0089]

【表8】 [Table 8]

【0090】[0090]

【表9】 [Table 9]

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 A61K 31/505 7252−4C C07D 401/14 231 8829−4C 405/14 8829−4C 487/04 142 7019−4C //(C07D 487/04 231:00 6701−4C 239:00) 7038−4C (72)発明者 稲井 正敏 徳島県板野郡土成町大字郡554番地の1─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical indication location A61K 31/505 7252-4C C07D 401/14 231 8829-4C 405/14 8829-4C 487/04 142 7019-4C // (C07D 487/04 231: 00 6701-4C 239: 00) 7038-4C (72) Inventor Masatoshi Inai 1 of 554, Oza-gun, Dosei-cho, Itano-gun, Tokushima Prefecture

Claims (1)

【特許請求の範囲】 【請求項1】 一般式 【化1】 [式中R1 はピリジル基又は置換基として低級アルキル
基、低級アルコシキ基、低級アルキルチオ基、ハロゲン
置換低級アルキル基、ハロゲン原子、フェニル基、フェ
ニルチオ基及びメチレンジオキシ基から選ばれる基を1
〜3個有することのあるフェニル基を、R2 はピリジル
基又は基−NHR5 (R5 は水素原子、低級アルキル
基、低級アルカノイル基又はホルミル基を示す)を、R
3 はピリジル基を、R4 は水素原子、低級アルカノイル
基、低級アルコキシカルボニル基又はフェニル低級アル
コキシカルボニル基をそれぞれ示し、また、R3 及びR
4 は互いに結合して基 【化2】 (nは1又は2である)又は基 【化3】 (R6 は水素原子又は低級アルキル基を示す)を形成し
てもよい。]で表されるピラゾール誘導体。
What is claimed is: 1. A general formula: [Wherein R 1 is a pyridyl group or a substituent selected from a lower alkyl group, a lower alkoxy group, a lower alkylthio group, a halogen-substituted lower alkyl group, a halogen atom, a phenyl group, a phenylthio group and a methylenedioxy group.
R 2 is a pyridyl group or a group —NHR 5 (R 5 is a hydrogen atom, a lower alkyl group, a lower alkanoyl group or a formyl group),
3 represents a pyridyl group, R 4 represents a hydrogen atom, a lower alkanoyl group, a lower alkoxycarbonyl group or a phenyl lower alkoxycarbonyl group, and R 3 and R
4 are bonded to each other to form a group (N is 1 or 2) or a group (R 6 represents a hydrogen atom or a lower alkyl group) may be formed. ] The pyrazole derivative represented by these.
JP21980591A 1990-09-03 1991-08-30 Pyrazole derivatives Expired - Fee Related JP2753659B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21980591A JP2753659B2 (en) 1990-09-03 1991-08-30 Pyrazole derivatives

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23362290 1990-09-03
JP2-233622 1990-09-03
JP21980591A JP2753659B2 (en) 1990-09-03 1991-08-30 Pyrazole derivatives

Publications (2)

Publication Number Publication Date
JPH0517470A true JPH0517470A (en) 1993-01-26
JP2753659B2 JP2753659B2 (en) 1998-05-20

Family

ID=26523342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21980591A Expired - Fee Related JP2753659B2 (en) 1990-09-03 1991-08-30 Pyrazole derivatives

Country Status (1)

Country Link
JP (1) JP2753659B2 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0795555A1 (en) * 1995-09-28 1997-09-17 Otsuka Pharmaceutical Factory, Inc. Analgesics
WO1998052937A3 (en) * 1997-05-22 1999-03-11 Searle & Co 4-aryl-3(5)-heteroaryl substituted pyrazoles as p38 kinase
US6087496A (en) * 1998-05-22 2000-07-11 G. D. Searle & Co. Substituted pyrazoles suitable as p38 kinase inhibitors
US6087381A (en) * 1997-05-22 2000-07-11 G. D. Searle & Company Pyrazole derivatives as p38 kinase inhibitors
EP1142890A1 (en) * 1998-12-25 2001-10-10 Teikoku Hormone Mfg. Co., Ltd. Aminopyrazole derivatives
US6423713B1 (en) 1997-05-22 2002-07-23 G. D. Searle & Company Substituted pyrazoles as p38 kinase inhibitors
US6750230B2 (en) 2000-07-07 2004-06-15 Pfizer, Inc. Pyrazole derivatives
US6897318B2 (en) 2001-09-25 2005-05-24 Pharmacia Corporation Process for making substituted pyrazoles
JP2005533040A (en) * 2002-06-04 2005-11-04 ネオジェネシス ファーマシューティカルズ インコーポレイテッド Pyrazolo [1,5A] pyrimidine compounds as antiviral agents
US6979686B1 (en) 2001-12-07 2005-12-27 Pharmacia Corporation Substituted pyrazoles as p38 kinase inhibitors
US7037880B2 (en) 1996-04-25 2006-05-02 Nissan Chemical Industries, Ltd. Ethylene derivatives and pesticides containing said derivatives
US7057049B2 (en) 2001-09-25 2006-06-06 Pharmacia Corporation Process for making substituted pyrazoles
JP2006517592A (en) * 2003-02-12 2006-07-27 バイオジェン・アイデック・エムエイ・インコーポレイテッド Pyrazole and methods of making and using them
US7491829B2 (en) 2005-02-04 2009-02-17 Array Biopharma Inc. RAF inhibitor compounds and methods
US7691865B2 (en) * 2002-09-06 2010-04-06 Biogen Idec Ma Inc. Pyrazolopyridines and methods of making and using the same
US7985288B2 (en) 2008-10-14 2011-07-26 Canon Kabushiki Kaisha Colorant compound and ink including the colorant compound
US20170020879A1 (en) * 2011-09-22 2017-01-26 Merck Sharp & Dohme Corp. Pyrazolopyridyl compounds as aldosterone synthase inhibitors

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0795555A1 (en) * 1995-09-28 1997-09-17 Otsuka Pharmaceutical Factory, Inc. Analgesics
EP0795555A4 (en) * 1995-09-28 1998-01-07 Otsuka Pharma Co Ltd Analgesics
US7566683B2 (en) 1996-04-25 2009-07-28 Nissan Chemical Industries, Ltd. Ethylene derivatives and pesticides containing said derivatives
US7037880B2 (en) 1996-04-25 2006-05-02 Nissan Chemical Industries, Ltd. Ethylene derivatives and pesticides containing said derivatives
US6617324B1 (en) 1997-05-22 2003-09-09 G. D. Searle & Company Substituted pyrazoles as p38 kinase inhibitors
WO1998052937A3 (en) * 1997-05-22 1999-03-11 Searle & Co 4-aryl-3(5)-heteroaryl substituted pyrazoles as p38 kinase
US6087381A (en) * 1997-05-22 2000-07-11 G. D. Searle & Company Pyrazole derivatives as p38 kinase inhibitors
US6335336B1 (en) 1997-05-22 2002-01-01 G.D. Searle & Company 3(5)-Heteroaryl substituted pyrazoles as p38 kinase inhibitors
US7153959B2 (en) 1997-05-22 2006-12-26 Pharmacia Corporation Substituted pyrazoles as p38 kinase inhibitors
US6423713B1 (en) 1997-05-22 2002-07-23 G. D. Searle & Company Substituted pyrazoles as p38 kinase inhibitors
US6503930B1 (en) 1997-05-22 2003-01-07 G.D. Searle & Company Pyrazole derivatives as p38 kinase inhibitors
US6514977B1 (en) 1997-05-22 2003-02-04 G.D. Searle & Company Substituted pyrazoles as p38 kinase inhibitors
US6852740B2 (en) 1997-05-22 2005-02-08 G. D. Searle & Co. Pyrazole derivatives as p38 kinase inhibitors
US6579873B2 (en) 1997-05-22 2003-06-17 Pharmacia Corporation 3 (5)-heteroaryl substituted pyrazoles as p38 kinase inhibitors
US5932576A (en) * 1997-05-22 1999-08-03 G. D. Searle & Company 3(5)-heteroaryl substituted pyrazoles as p38 kinase inhibitors
US6087496A (en) * 1998-05-22 2000-07-11 G. D. Searle & Co. Substituted pyrazoles suitable as p38 kinase inhibitors
US6525059B1 (en) 1998-11-20 2003-02-25 G. D. Searle & Company Substituted pyrazoles as p38 kinase inhibitors
EP1142890A4 (en) * 1998-12-25 2002-06-19 Teikoku Hormone Mfg Co Ltd Aminopyrazole derivatives
EP1142890A1 (en) * 1998-12-25 2001-10-10 Teikoku Hormone Mfg. Co., Ltd. Aminopyrazole derivatives
US7141585B2 (en) 2000-07-07 2006-11-28 Agouron Pharmaceuticals, Inc. Pyrazole derivatives
US6750230B2 (en) 2000-07-07 2004-06-15 Pfizer, Inc. Pyrazole derivatives
US7057049B2 (en) 2001-09-25 2006-06-06 Pharmacia Corporation Process for making substituted pyrazoles
US6897318B2 (en) 2001-09-25 2005-05-24 Pharmacia Corporation Process for making substituted pyrazoles
US6979686B1 (en) 2001-12-07 2005-12-27 Pharmacia Corporation Substituted pyrazoles as p38 kinase inhibitors
JP2005533040A (en) * 2002-06-04 2005-11-04 ネオジェネシス ファーマシューティカルズ インコーポレイテッド Pyrazolo [1,5A] pyrimidine compounds as antiviral agents
US7691865B2 (en) * 2002-09-06 2010-04-06 Biogen Idec Ma Inc. Pyrazolopyridines and methods of making and using the same
JP2006517592A (en) * 2003-02-12 2006-07-27 バイオジェン・アイデック・エムエイ・インコーポレイテッド Pyrazole and methods of making and using them
US7491829B2 (en) 2005-02-04 2009-02-17 Array Biopharma Inc. RAF inhibitor compounds and methods
US7985288B2 (en) 2008-10-14 2011-07-26 Canon Kabushiki Kaisha Colorant compound and ink including the colorant compound
US20170020879A1 (en) * 2011-09-22 2017-01-26 Merck Sharp & Dohme Corp. Pyrazolopyridyl compounds as aldosterone synthase inhibitors
US9844553B2 (en) * 2011-09-22 2017-12-19 Merck Sharp & Dohme Corp. Pyrazolopyridyl compounds as aldosterone synthase inhibitors

Also Published As

Publication number Publication date
JP2753659B2 (en) 1998-05-20

Similar Documents

Publication Publication Date Title
JP2753659B2 (en) Pyrazole derivatives
US5977118A (en) 6-substituted pyrazolo[3,4-d]pyrimidin-4-ones and compositions and methods of use thereof
JP4018182B2 (en) Process for producing dihaloazolopyrimidines
US4973695A (en) Process for preparing pyridine-2,3-dicarboxylic acid compounds
CA1216291A (en) Imidazoquinoxaline compounds
HU210870A9 (en) Pyrazolopyrimidinone antianginal agents
JPS6339875A (en) Pyrimidine derivative
JP2520549B2 (en) Fluorocyclopropyl amino acrylate derivative
JPS6277380A (en) Manufacture of heterocyclic compound
AU6332499A (en) Tricyclic phthalazine derivatives as phosphodiesterase 4 inhibitors
HU180081B (en) Process for producing hystamine antagonic 2-amino-pirimidone derivatives
JPH05125079A (en) Pyrazolo(1,5-a)pyrimidine derivative
JPH08253484A (en) 1h-pyrazolo(3,4-d)pyrimidin-4-one derivative
JPH0717608B2 (en) 6-alkoxyquinolonecarboxylic acid derivative
JPH05132484A (en) Pyrazoloquinoline and pyrazolonaphthylidene derivative
JP2997828B2 (en) Quinoline and naphthyridine derivatives
JPH07188269A (en) Phoshonate diester derivative
JP3479708B2 (en) Benzoic acid derivative
JP3219946B2 (en) New production intermediate and method for producing pyridine derivative
SK99894A3 (en) Pyrazolopyrimidine derivatives, method of their preparation pharmaceutical agent and use
JPS63141969A (en) Novel imidazole derivative
EP0101517B1 (en) Novel s-triazole(1,5-a)pyrimidine derivatives
JP2549931B2 (en) Pyrimidobenzimidazole derivative
JPH02289563A (en) Improved process for producing ortho-carboxypyridyl- and ortho-carboxyquinolylimidazolinones
JPH07121931B2 (en) Benzo [b] furan derivative

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees