JPH051612B2 - - Google Patents
Info
- Publication number
- JPH051612B2 JPH051612B2 JP18029683A JP18029683A JPH051612B2 JP H051612 B2 JPH051612 B2 JP H051612B2 JP 18029683 A JP18029683 A JP 18029683A JP 18029683 A JP18029683 A JP 18029683A JP H051612 B2 JPH051612 B2 JP H051612B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- substrate
- dry etching
- etching apparatus
- preparatory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 54
- 238000001312 dry etching Methods 0.000 claims description 15
- 230000000903 blocking effect Effects 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 238000005530 etching Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18029683A JPS6074530A (ja) | 1983-09-30 | 1983-09-30 | ドライエッチング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18029683A JPS6074530A (ja) | 1983-09-30 | 1983-09-30 | ドライエッチング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6074530A JPS6074530A (ja) | 1985-04-26 |
| JPH051612B2 true JPH051612B2 (enrdf_load_stackoverflow) | 1993-01-08 |
Family
ID=16080724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18029683A Granted JPS6074530A (ja) | 1983-09-30 | 1983-09-30 | ドライエッチング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6074530A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06177073A (ja) * | 1992-12-07 | 1994-06-24 | Nippon Ee S M Kk | エッチング装置 |
-
1983
- 1983-09-30 JP JP18029683A patent/JPS6074530A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6074530A (ja) | 1985-04-26 |
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