JPH05108014A - Formation of light emitting film for color display of el display panel - Google Patents

Formation of light emitting film for color display of el display panel

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Publication number
JPH05108014A
JPH05108014A JP26657791A JP26657791A JPH05108014A JP H05108014 A JPH05108014 A JP H05108014A JP 26657791 A JP26657791 A JP 26657791A JP 26657791 A JP26657791 A JP 26657791A JP H05108014 A JPH05108014 A JP H05108014A
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film
display
light
emitting
parts
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JP26657791A
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Japanese (ja)
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Tomoyuki Kawashima
朋之 河島
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Fuji Electric Co Ltd
富士電機株式会社
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Abstract

PURPOSE: To rationalize the process for production and to decrease the generation of defective picture elements by forming films while deviating positions for each of display colors by using a mask having window patterns opened in correspondence to the light emitting film parts of the same display color.
CONSTITUTION: The window patterns 11 corresponding to the respective picture elements for the color display are opened in a mask plate 10. The mask plate is positioned so as to make approximate contact with the panel surface and the light emitting film parts 4g are selectively and simultaneously formed in this state on the insulating film 3 within the window patterns 11 of the mask plate 10 by, for example, a vacuum vapor deposition method in the film forming stage of the light emitting film parts 4g for green display. The film forming stages for the light emitting film parts 4r for display and the light emitting film parts 4b for green display are similar and the films are formed by shifting the positions of the window patterns 11 for each of the display colors. Since the light emitting film parts are formed in small patterns, the need for patterning after the film formation is eliminated and the number of the man-hours for production is decreased. The generation of the defective picture elements occurring in the moisture absorption of the light emitting films is thus obviated.
COPYRIGHT: (C)1993,JPO&Japio

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は薄膜積層構造のEL(エレクトロルミネッセンス)形の表示パネルにカラー表示用発光膜を組み込むための成膜方法に関する。 The present invention relates to a film forming method for incorporating the light emitting film for color display on the display panel of the EL (electroluminescence) form of thin film stack.

【0002】 [0002]

【従来の技術】EL表示パネルは自己発光性でかついわゆるフラットパネル構造である利点を生かしてパーソナルコンピュータやOA機器用の軽量薄形の表示装置として広く利用されるに至っているが、現在はまだ単色表示用が実用化されている段階で、表示性能を高めるためにカラー表示化が進められている。 BACKGROUND ART EL display panel has come to be widely used as a display device for light-weight thin forms for personal computers, OA equipment taking advantage of self-luminous a and a so-called flat panel structure, now still in stage for monochrome display has been put into practical use, color display is being advanced in order to improve the display performance. ビデオ画像等をカラー表示するにはRGBの各色の表示画素としてこれらの色をそれぞれEL発光する材料からなる発光膜を小さなパターンでパネル面内にマトリックス配置する必要があり、以下その従来方法の要点を図2を参照して説明する。 To display a color video image, etc., it is necessary to matrix arrangement of these colors in each EL a light emitting be material emitting film panel surface with a small pattern as the display pixel of each color of RGB, the following main points of the conventional method It will be described with reference to FIG.

【0003】図2(a) は発光膜を配設する前の状態を示す。 [0003] FIG. 2 (a) shows a state before arranging the light emitting layer. EL表示パネルの透明なガラスからなる基板1の表面に ITO等の透明な導電性膜を被着してフォトエッチングを施すことにより、透明電極膜2を図の左右方向に細長いストライプ状パターンで図の前後方向に多数個並べて配設し、その全面上にSiO 2 ,Si 3 N 4 ,Ta 2 O 5 ,Al 2 O 3等の絶縁膜3を被着して図示の状態とする。 Figure a transparent conductive film of ITO or the like on the surface of the substrate 1 made of transparent glass of the EL display panel by applying a photo-etching and deposition, the transparent electrode film 2 in an elongated stripe pattern in the lateral direction in FIG. the large number side by side arranged in the longitudinal direction, SiO 2, Si 3 N 4 , Ta 2 O 5, the Al 2 O 3 insulating film 3, such as the state shown by adhering to the entire surface.

【0004】図2(b) と(c) は緑表示用の発光膜4gの配設工程である。 [0004] FIG. 2 (b) (c) is about distribution 設工 luminescent film 4g for green display. この発光膜4gの材料にはZnSからなる母材に発光中心元素としてTbを微量添加したものが用いられ、図2(b) ではこれを電子ビーム蒸着法により絶縁膜3の上に成膜した後にフォトレジスト膜30をスピンコートしてフォトプロセスにより各画素に対応する小さなパターンに形成する。 The ones of Tb in the material of the light-emitting layer 4g in the base material made of ZnS as the luminescent center element was added small amount used, was deposited on the insulating film 3 by an electron beam deposition method which in FIG. 2 (b) after the photoresist film 30 by spin coating to form a small pattern corresponding to each pixel by a photo process. 図2(c) はフォトレジスト膜30をマスクとする発光膜4gのパターンニング工程で、従来からこれには化学エッチング法が採用されており、塩酸や硝酸の水溶液への浸漬, 水洗, レジストの剥離等の作業を経て発光膜4gを図示の状態とする。 In FIG. 2 (c) patterning process of the light emitting layer 4g of the mask a photoresist film 30, to this conventionally have chemical etching method is employed, immersion in an aqueous solution of hydrochloric acid and nitric acid, washed with water, resist through the work of peeling the state of illustrating a light emitting layer 4g.

【0005】図2(d) と(e) に示す赤表示の発光膜4r用の材料にはCaSの母材中にEuを発光中心元素として含むものが用いられる。 [0005] is used to include Eu as the luminescent center element to the base material in CaS the material for the luminescent film 4r red display shown in FIG. 2 and (d) (e). 図2(d) でこれを全面に成膜してその上にフォトレジスト膜30を所定パターンに形成した後、図2(e) で化学エッチングにより発光膜4rを各画素用にパターンニングする。 After forming a photoresist film 30 thereon in a predetermined pattern by forming it on the entire surface in FIG. 2 (d), patterning the luminescent film 4r by chemical etching in FIG. 2 (e) for each pixel. 青表示用の発光膜の材料には The material of the light-emitting film for blue display is
SrSの母材にCeを添加したものを用い、上述と同様な要領で図2(f) に示された青表示画素用の発光膜4bを作り込む。 Used after addition of Ce in the base material of SrS, fabricated a light-emitting layer 4b for blue display pixels shown in FIG. 2 (f) in the same manner as described above.

【0006】以後は、図2(f) に示すようにこれらの発光膜4g,4r,4bを覆うよう絶縁膜5を絶縁膜3と同じ要領で被着し、その上側にアルミを被着してフォトエッチングを施すことにより裏面電極膜6を図の前後方向に細長いストライプ状のパターンで配設して完成状態とする。 [0006] Thereafter, it deposited these luminescent film 4g as shown in FIG. 2 (f), 4r, the insulating film 5 so as to cover the 4b in the same manner as the insulating film 3, aluminum is deposited on its upper side Te to the back electrode film 6 in an elongated stripe pattern in the longitudinal direction of view as disposed to completed state by performing photo-etching.
このEL表示パネルは電極膜2と6の間に表示電圧を与えて、両者の各交点の画素用の発光膜4g,4r,4bをそれぞれ緑, 赤, 青の3色にEL発光させることによりカラー表示を行なうことができる。 The EL display panel is provided a display voltage between the electrode films 2 and 6, the light emitting layer 4g of the pixels of each intersection of both, 4r, 4b, respectively green, red, by EL emission to three colors of blue it is possible to perform a color display.

【0007】 [0007]

【発明が解決しようとする課題】上述のようにカラー表示用のEL表示パネルでは、単色表示の場合に発光膜が単一の連続膜でよいのに対し、RGB用の3種の発光膜が必要でかつそれぞれを各画素用の個別パターンにパターンニングする必要があるので製造工程数が多くなって非常に手間が掛かるほか、カラー表示用発光膜のパターンニング工程中に欠陥画素が発生しやすいために製造歩留まりが低下する問題があって実用化上の隘路になっている。 In the [0006] EL display panels for color display as described above, while the light-emitting layer in the case of monochrome display may be a single continuous film, the three light emitting film for RGB must be and very time-consuming in addition an increasing number number of manufacturing processes because it is necessary to pattern the individual pattern for each pixel of each defective pixel is likely to occur during the patterning process of a color display light-emitting layer manufacturing yield becomes a bottleneck on practical use there is a problem to decrease in order.

【0008】欠陥画素が発生しやすい主な原因は発光膜の母材,とくに赤表示画素用のCaSや青表示画素用のSr [0008] The base material of the main causes of the defective pixel is likely to occur light-emitting film, especially Sr for CaS and blue display pixel for red display pixel
Sが吸湿性で、しかも従来からそのパターンニングにフォトレジスト膜の現像,化学エッチング,水洗等の水を使用するウエットプロセスを利用している点にある。 S is hygroscopic, yet development of the photoresist film on the patterning conventionally, chemical etching, in that it utilizes a wet process using water such as washing with water. 例えば、ある呈色用の発光膜をパターンニングする際や後工程で他の呈色用の発光膜をパターンニングする際のウエットプロセス中に、各画素用の小パターンの発光膜が吸湿して下地から剥離してしまう等の欠陥画素が発生しやすいからである。 For example, during the wet process when there patterned luminescent films for other coloring the light-emitting layer in a subsequent step or during patterning for coloring, luminescent film of a small pattern for each pixel by moisture defective pixels, such as peels from the base is because prone.

【0009】本発明の目的は、かかる問題を解決して、 [0009] It is an object of the present invention is to solve such a problem,
カラー表示用EL表示パネルの製造工程を合理化しかつ欠陥画素の発生を減少させるに役立ち得るEL表示パネルのカラー表示用発光膜の成膜方法を提供することにある。 It is to provide a film forming method of an EL display panel color display light-emitting layer that can serve the manufacturing process of a color display EL display panel to reduce the streamline and the occurrence of defective pixels.

【0010】 [0010]

【課題を解決するための手段】本発明によれば上述の目的は、EL表示パネルの表示面内にマトリックス状に配置されるRGBのカラー表示画素用の発光膜を作り込むに際して、同一の表示カラーの画素用の発光膜部分に対応して開口された窓パターンを備えるマスク板をパネル面にほぼ接して配設した状態でこの表示カラーの発光膜部分をその各窓パターンの位置に選択的にかつ表示面内に一斉に成膜するようにし、表示カラーの異なる発光膜部分を表示カラーごとに順次に位置をずらせながら成膜することによって達成される Means for Solving the Problems] The present invention according If the above object, when fabricated a light-emitting layer for color display pixels of RGB arranged in a matrix within the display surface of the EL display panel, display the same selectively emitting layer portion of the display color at the position of the each window pattern while disposed substantially in contact with the panel surface of the mask plate having a window pattern having an opening corresponding to the light emitting layer portion of the color pixel and so as to deposit simultaneously on the display surface is achieved by depositing while shifting the sequential position for each display color different emission film portion of the display color

【0011】上述の発光膜部分の成膜には真空蒸着法とくに電子ビーム加熱の真空蒸着法を利用するのが発光輝度を上げるため望ましいが、絶縁膜との積層構造体の工程を統一して製造コストを下げるには表示カラー用の発光膜部分の成膜にスパッタ法を利用するのが有利である。 [0011] Although to a vacuum deposition method of a vacuum evaporation method, especially electron beam heating in the film formation of the light emitting layer portion of the above is desired to increase the light emission luminance, and unified process of the laminated structure of the insulating film to reduce manufacturing costs it is advantageous to use a sputtering method for forming a film of the light emitting layer portion of the display color. マスク板は薄い金属の板に各画素用の窓パターンをフォトエッチング等により多数開口したものでよく、R Mask plate may be those obtained by many open windows pattern by photoetching or the like for each pixel in the thin metal plate, R
GBの各カラー表示画素のパネル面内の配列が互いに少しずつずれているだけなので、これらの3色用の発光膜の成膜に対して共通に用いることができる。 Since sequence in the panel surface of the color display pixels of the GB is only deviates slightly from one another, it can be used in common to the formation of the light-emitting layer for these three colors.

【0012】また、本発明方法では表示カラーが異なる発光膜部分を周縁部が互いに重なり合うように成膜するのが、その上側の絶縁膜の絶縁破壊や劣化を防止し各画素の発光面積を大きくとる上で有利である。 Further, the peripheral portion of the light emitting layer portion in which the display color is different in the process of the invention is formed so as to overlap each other, the light emission area of ​​each pixel to prevent the breakdown or deterioration of the upper insulating film greater it is advantageous in taking. このためには、マスク板の窓パターンのサイズを例えば透明電極膜や裏面電極膜の前述のストライプ状のパターンの幅と同程度とするのがよい。 For this purpose, it is preferable to the width about the same foregoing striped pattern of the size of the window pattern of the mask plate, for example, a transparent electrode film and the back electrode film.

【0013】 [0013]

【作用】上記構成にいうよう本発明は、同じ表示カラーの画素に対応する窓パターンを備えるマスク板を利用して、これをパネル面にほぼ接して配設した状態で各表示カラーの画素に対応する小パターンの発光膜部分を成膜することにより、成膜後にパターンニングを施す必要をなくして表示パネルの製造工程を簡略化し、かつ従来のように吸湿性の発光膜にウエットプロセスを施す必要をなくして欠陥画素の発生を減少させるものである。 SUMMARY OF invention to refer to the above configuration, by using a mask plate having a window pattern corresponding to a pixel of the same display color, which in a state of being disposed substantially in contact with the panel surface in the pixel of the display color by forming the light emitting layer portion of the corresponding small pattern, simplifying the manufacturing process of the display panel eliminates the need to perform patterning after the film formation, and subjected to a wet process hygroscopic luminescent film as in the prior art it is intended to reduce the occurrence of defective pixels to eliminate the need.

【0014】 [0014]

【実施例】以下、図1を参照して本発明によるカラー表示用発光膜の成膜方法の実施例を説明する。 EXAMPLES Hereinafter, an embodiment of a method of forming a color display light-emitting layer according to the present invention with reference to FIG. 同図(a) に発光膜部分の成膜前の状態を,同図(b) 〜(d) に緑, A state before formation of the light emitting layer portion in FIG. 6 (a), green in the drawing (b) ~ (d),
赤,青のカラー表示用の発光膜部分の成膜時の状態を, Red, the state at the time of film formation of the light-emitting film portion for color display of blue,
同図(e) にEL表示パネルの完成時の状態をそれぞれ一部拡大断面で示す。 In FIG. (E) shows a state upon completion of the EL display panel in a partially enlarged cross-section, respectively. なお、前の図2に対応する部分に同じ符号が付されているので重複部分の説明は適宜省略することとする。 Incidentally, description of the overlapping parts will be omitted as appropriate because the same reference numerals are used in parts corresponding to the previous figure 2.

【0015】図1(a) は前の図2(a) と同じ発光膜の成膜前の状態を示す。 [0015] Figure 1 (a) shows a state before formation of the same emission film as the previous figure 2 (a). 透明電極膜2は例えば2000Åの膜厚の導電性膜から形成され、絶縁膜3用には例えば Si 3 N 4 The transparent electrode film 2 is formed of a conductive film having a film thickness of, for example 2000 Å, the insulating film 3, for example Si 3 N 4
膜がスパッタ法によって3000Å程度の膜厚で被着される。 Film is deposited to a thickness of about 3000Å ​​by sputtering. 次の図1(b) 〜(d) の成膜工程にはすべてマスク板 The following figure 1 (b) ~ all mask plate film formation step of (d)
10を用いる。 10 is used. このマスク板10には 0.1〜0.5 mmの厚みの例えばステンレスからなる薄い金属板を用いるのがよく、これにカラー表示用の各画素に対応する 0.3〜0.5m This is the mask plate 10 may to use a thin metal plate made of a thickness of 0.1 to 0.5 mm, for example, stainless, 0.3~0.5M corresponding to each pixel for color display which
m角の窓パターン11を例えばフォトエッチング法により図示のように開口させる。 The window pattern 11 m square for example, a photo-etching method is opened as shown. この窓パターン11のサイズは図1(e) に示す裏面電極膜6のストライプ幅とほぼ同程度にするのがよい。 The size of the window pattern 11 it is preferable to substantially the same as the stripe width of the back electrode film 6 shown in FIG. 1 (e). なお、このマスク板10の基板1へのマスク合わせは数十μmの精度で行なわれる。 Incidentally, mask alignment to the substrate 1 of the mask plate 10 is performed at several tens of μm of accuracy.

【0016】図1(b) の緑表示用の発光膜部分4gの成膜工程では、マスク板10をパネル面にほぼ接するように位置決めした状態でTbを微量添加したZnSを母材とする発光膜部分4gを例えば蒸発源を電子ビーム加熱する真空蒸着法によって5000〜8000Åの膜厚でマスク板10の窓パターン11内の絶縁膜3の上に選択的に蒸着ないしは堆積させる。 [0016] In the light emitting layer portion 4g of the film forming process for green display in FIG. 1 (b), a ZnS with a Tb slightly added in a positioned state so as to substantially contact the mask plate 10 to the panel surface emitting whose base material the membrane portion 4g e.g. evaporation source is selectively deposited or deposited on the insulating film 3 in the window pattern 11 of the mask plate 10 with a thickness of 5000~8000Å by a vacuum deposition method to electron beam heating. この際、マスク板10が完全にはパネル面に密着せず実際には僅かに浮き上がるので、発光膜部分4gの周縁に図示のように若干のだれないしは傾斜が発生するが差し支えは生じない。 At this time, since the full mask plate 10 floats slightly from the actual without close contact with the panel surface, some sagging or inclination as the periphery in the drawing of the light emitting film portions 4g does not occur permissible but occurs. 本発明方法では、この図1(b) の工程終了後すぐに次の図1(c) の工程に移ることができる。 In the method of the invention, it is possible to move to step of FIG. 1 FIG immediately follows after step completion of (b) 1 (c).

【0017】図1(c) は赤表示用の発光膜部分4rの成膜工程であり、それ専用または前工程と共用のマスク板10 [0017] FIG. 1 (c) is a step of forming the light emitting layer portion 4r for red display, the mask plate 10 of its own, or pre-process shared
を同様にパネル面にほぼ接するように位置決めした状態で、Euを添加したCaSを母材とする発光膜部分4rを前と同様な要領で同程度の膜厚にマスク板10の窓パターン11 While positioned so likewise substantially in contact with the panel surface, window patterns 11 of the mask plate 10 to CaS with the addition of Eu in layer thickness comparable in the same manner as before the light emitting layer portion 4r of the base material
の位置に選択的に成膜する。 Selectively forming a film on location. この発光膜部分4rの周縁のだれ部分は前工程で成膜された発光膜部分4gの周縁部と図のように若干重なり合う。 This sagging portion of the periphery of the light emitting layer portion 4r overlap somewhat like the periphery and Figure luminescent film portion 4g which is formed in the previous step. 図1(d) に示す青表示用の発光膜部分4bの成膜工程も同様であって、Ceを添加した The step of forming the light emitting layer portion 4b of the blue display shown in FIG. 1 (d) be similar, it was added Ce
SrSを母材とする青表示用の発光膜部分4bを図1(b) の工程と同要領で同程度の膜厚に図1(c) の工程からさらにずらせて位置決めされたマスク板10の窓パターン11の位置に選択的に成膜する。 SrS a comparable process in the same manner shown in FIG. 1 (b) a light emitting layer portion 4b for blue display to a base material thickness in FIG. 1 step further shifted to the mask plate 10 positioned from the (c) selectively forming a film on the position of the window patterns 11.

【0018】なお、この図1の実施例では図2の従来例と同様に便宜上緑, 赤, 青表示用の発光膜部分4g,4r,4b [0018] Incidentally, the conventional example as well as convenience green implemented in the example 2 of FIG. 1, the red, the light emitting film portions 4g for blue display, 4r, 4b
の順序で成膜するようにしたが、従来はウエットプロセスを利用していたために吸湿性の高い発光膜を後工程に回す必要があったに対して、本発明ではその必要はなく上述の発光膜部分4g,4r,4bの成膜順序は任意でよい。 Was to be deposited in order, conventional for had to turn to post-process a high luminous film hygroscopic to have utilized wet process, it need not the above emission in the present invention membrane portion 4g, 4r, deposition order of 4b may be arbitrary. また、以上では成膜を真空蒸着法によるとしたが、もちろん成膜にスパッタ法やプラズマCVD法も利用できる。 In the above has been due to deposition in the vacuum deposition method, it may also be utilized of course sputtering method or a plasma CVD method in the film forming.
とくにスパッタ法は絶縁膜3や5が同じ方法で被着されるのでこれらとの積層構造体を構成する上で工程上の整合がよい利点がある。 Especially sputtering is consistent good advantage over steps in constructing a laminated structure of these since the insulating films 3 and 5 are deposited in the same way. またこのスパッタ法による場合は、成膜時に基板1が搭載される電極板や透明電極膜2 In the case of this sputtering, the electrode plate and the transparent electrode film 2 where the substrate 1 is mounted at the time of deposition
にバイアス用の高周波電界を掛け、マスク板10にはこれと逆方向の直流バイアス電圧を掛けた状態で成膜することによりマスク板10への発光膜材料の堆積量を減少させることができる。 To multiply the high-frequency electric field of the bias, the mask plate 10 can be reduced deposition quantity of the light emitting layer material to the mask plate 10 by forming a film while applying a DC bias voltage of which the opposite direction.

【0019】図1(e) のEL表示パネルの完成状態とするには、まず発光膜部分4g,4r,4bの上に絶縁膜3と同じ材料と要領でかつ同じ膜厚で絶縁膜5を成膜する。 [0019] To a finished state of the EL display panel shown in FIG. 1 (e), first light emitting layer portion 4g, 4r, an insulating film 5 at and in the same thickness of the same material and manner as the insulating film 3 on the 4b It is deposited. この際、図2(f) と比較すればわかるように本発明方法では発光膜部分4g,4r,4bの上面が従来よりずっと平坦で段差がないので絶縁膜5を良好な膜質で成膜でき、しかも発光膜部分に角がないので絶縁膜5への電界集中がずっと少なくなり、EL表示パネルの長期使用中に絶縁破壊や絶縁劣化が発生するおそれが減少する。 In this case, the present invention method As can be seen from comparison with FIG. 2 (f) film can be formed light emitting layer portion 4g, 4r, the insulating film 5 so that no step is much flatter than the conventional upper surface of 4b with good film quality , and since there is no corner to the light emitting layer portion field concentration much less in the insulating film 5, dielectric breakdown and insulation deterioration may decrease occurring during long-term use of the EL display panel. 次に、アルミの Then, of aluminum
5000Å程度の膜厚の裏面電極膜6を従来と同様に配設して図の完成状態とする。 The back electrode film 6 having a thickness of about 5000Å was arranged similarly to the conventional a completed state of FIG. なお、この本発明によるEL表示パネルでは従来の図2(f) の場合より各画素のEL発光面積を広くとることができる。 In the EL display panel according to the present invention can be widened EL light-emitting area of ​​each pixel than in conventional FIG 2 (f).

【0020】 [0020]

【発明の効果】以上説明したとおり本発明方法では、同じ表示カラーの画素用の発光膜部分に対応して開口された窓パターンをもつマスク板をパネル面にほぼ接して配設した状態で同じ表示カラーの発光膜部分を各窓パターンの位置に選択的にかつ一斉に成膜し、表示カラーの異なる発光膜部分を表示カラーごとに位置をずらせて順次成膜することにより、次の効果を得ることができる。 In the above-described as the present invention a method according to the present invention, the same in the state which is disposed substantially adjacent the mask plate having a window pattern having an opening corresponding to the light emitting layer portion of the pixels in the same display color on the panel by the light emitting film portions of the display color selectively and deposited simultaneously on the position of each window pattern is sequentially formed by shifting the position for each display color different emission film portion of the display color, the following effects it is possible to obtain.

【0021】(a) 窓パターンを備えるマスク板を利用して発光膜部分を各表示カラーの画素に対応する小パターンで成膜するので、従来のように発光膜の成膜後にパターンニングを施す必要がなくなり、EL表示パネルの製造工程数を減少させて量産時の製造コストを大幅に低減することができる。 [0021] Since (a) using a mask plate having a window pattern forming the light emitting layer portion in a small pattern corresponding to the pixels of each display color, subjected to patterning after forming the light emitting layer as in the prior art it is unnecessary, the manufacturing cost of mass production to reduce the number of manufacturing steps of the EL display panel can be greatly reduced. (b) 従来のように発光膜部分のパターンニングのためウエットプロセスを施す必要がないので、発光膜の吸湿に起因する欠陥画素の発生を減少させてEL表示パネルの量産時の歩留まりを向上することができる。 Since (b) it is not necessary to perform a wet process for patterning the light emitting layer portion as in the prior art, to reduce the occurrence of defective pixels due to moisture absorption of the light-emitting layer to improve the yield in mass production of the EL display panel be able to. (c) 従来のようにエッチングを施すために発光膜部分を相互離間させる必要がないので発光膜の表面がほぼ平坦になり、その上の絶縁膜を段差がほどんどない下地面に良好な膜質で成膜でき、かつ絶縁膜への電界集中を軽減して絶縁破壊や絶縁劣化による欠陥画素の発生や表示輝度の劣化を防止して、EL表示パネルの長期信頼性を向上することができる。 (C) it is not necessary to mutually separate the light emitting layer portion in order to perform as in the conventional etching becomes substantially flat surface of the light emitting film, excellent film quality of the insulating film thereon in step is Hodondo no underlying surface in formation can film, and it is possible to reduce the electric field concentration on the insulating film to prevent the deterioration of the generation and display brightness of the defective pixel due to dielectric breakdown and insulation deterioration, to improve the long-term reliability of the EL display panel. (d) 異なる表示カラーの発光膜部分の周縁部を若干重なり合うよう成膜できるので、各表示カラーの画素用の発光膜部分の実効面積を増加させてEL発光量を高め、表示パネルのカラー表示を明るくすることができる。 (D) Since the periphery of the light emitting film portions of different display colors can be formed so as to slightly overlap, increasing the EL light emission amount by increasing the effective area of ​​the light emitting film portions of the pixels of the display color, the color display of the display panel it is possible to brighten.

【0022】このように本発明方法は、カラー表示用E [0022] The method of the present invention in this way, the color display for E
L表示パネルの製造工程の簡略化と製造歩留まりの向上によって製造コストを低減し、かつ表示性能と長期信頼性を高める効果をもち、とくにその量産に適用してこれらの効果を有利に発揮でき、カラー用EL表示パネルの量産上の従来からの難点を解決して実用化上の隘路を開拓する貢献を果たし得るものである。 Reducing manufacturing costs through increased simplification and manufacturing yield of the manufacturing process of L display panel, and has the effect of increasing display performance and long-term reliability, it can advantageously exhibit these effects particularly when applied to the mass production, those may play a contribution to open up bottlenecks on practical to resolve difficulties from conventional mass production of the color for the EL display panel.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明によるカラー表示用発光膜の成膜方法の実施例をEL表示パネルの一部拡大断面で示し、同図 [1] shows an embodiment of a method of forming a color display light-emitting layer according to the invention in partially enlarged cross section of the EL display panel, Fig.
(a) は発光膜部分の成膜前の状態を,同図(b) は緑表示用の発光膜部分の成膜時の状態を,同図(c) は赤表示用の発光膜部分の成膜時の状態を,同図(d) は青表示用の発光膜部分の成膜時の状態を,同図(e) はEL表示パネルの完成時の状態をそれぞれ示す断面図 (A) is a state before formation of the light emitting layer portion, FIG. (B) is a state at the time of film formation of the light emitting film portions for green display, FIG. (C) The light emitting film portions for red display the state at the time of film formation, and FIG. (d) shows a state during film formation of the light emitting film portions for blue display, FIG. (e) is a sectional view showing a state at the time of completion of the EL display panel, respectively

【図2】従来のカラー表示用のEL表示パネルの製造方法をその一部拡大断面で示し、同図(a) は発光膜の成膜前の状態を,同図(b) は緑表示用発光膜の成膜時の状態を,同図(c) はそのパターンニング時の状態を,同図 [Figure 2] shows the manufacturing method of the conventional EL display panels for color display with a portion enlarged cross-section, FIG. (A) For a state before formation of the light-emitting layer, FIG. (B) the green display the state at the time of film formation of the light-emitting layer, and FIG. (c) shows a state at the time of patterning, FIG
(d) は赤表示用の発光膜の成膜時の状態を,同図(e) はそのパターンニング時の状態を,同図(f) は青表示用の発光膜の成膜およびパターンニング工程を含めEL表示パネルの完成状態をそれぞれ示す断面図 (D) shows the state at the time of film formation of the light-emitting layer for red display, FIG. (E) is deposited and patterned in the state at the time of patterning, FIG (f) a light-emitting layer for blue display sectional view respectively showing the finished state of the EL display panel including the steps

【符号の説明】 DESCRIPTION OF SYMBOLS

1 EL表示パネルの基板 2 透明電極膜 3 絶縁膜 4b 青表示用の発光膜部分 4g 緑表示用の発光膜部分 4r 赤表示用の発光膜部分 5 絶縁膜 6 裏面電極膜 10 マスク板 11 窓パターン Emitting film portions 4g emitting layer portion 4r emitting film portions 5 insulating film 6 back electrode film 10 mask plate 11 window pattern for red display for displaying green for 1 EL display substrate 2 transparent electrode film 3 insulating film 4b blue display panel

Claims (3)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】表示面内にカラー表示画素がマトリックス配置されるEL表示パネルにカラー表示用の発光膜を成膜する方法であって、同じ表示カラーの画素用の発光膜部分に対応して開口された窓パターンを備えるマスク板をパネル面にほぼ接して配設した状態で同じ表示カラーの発光膜部分を各窓パターンの位置に選択的にかつ一斉に成膜し、表示カラーの異なる発光膜部分を表示カラーごとに位置をずらせて順次に成膜することを特徴とするEL表示パネルのカラー表示用発光膜の成膜方法。 1. A color display pixels in the display surface is a method of forming a light emitting layer for color display on an EL display panel which is a matrix arrangement, in correspondence with the light emitting layer portion of the pixels in the same display color the light emitting film portions of the same display color of the mask plate with an opening and a window pattern while disposed substantially in contact with the panel surface selectively and deposited simultaneously on the position of each window patterns, different light emission color display EL color display method of forming the display light-emitting layer of the panel, characterized in that sequentially deposited by shifting the position of the membrane portion for each display color.
  2. 【請求項2】請求項1に記載の成膜方法において、表示カラーが異なる発光膜部分を周縁部が互いに重なり合うように成膜することを特徴とするカラー表示用発光膜の成膜方法。 2. A wherein A film forming method according to claim 1, the film formation method of a color display light-emitting layer, wherein the peripheral portion of the light emitting layer portion in which the display color is different is formed so as to overlap each other.
  3. 【請求項3】請求項1に記載の成膜方法において、発光膜部分をスパッタ法により成膜することを特徴とするカラー表示用発光膜の成膜方法。 3. A film forming method according to claim 1, the film formation method of a color display light-emitting layer, which comprises an emitting film portions by sputtering.
JP26657791A 1991-10-16 1991-10-16 Formation of light emitting film for color display of el display panel Pending JPH05108014A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26657791A JPH05108014A (en) 1991-10-16 1991-10-16 Formation of light emitting film for color display of el display panel

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Application Number Priority Date Filing Date Title
JP26657791A JPH05108014A (en) 1991-10-16 1991-10-16 Formation of light emitting film for color display of el display panel

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JPH05108014A true true JPH05108014A (en) 1993-04-30

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US6303255B1 (en) 1997-10-24 2001-10-16 Nec Corporation Organic EL panel and method of manufacturing the same
JP2002303676A (en) * 2001-04-03 2002-10-18 Matsushita Electric Ind Co Ltd Radiation detecting element and method of manufacturing the same
US6514649B1 (en) 1998-10-05 2003-02-04 Nec Corporation Organic EL panel and method for forming the same
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US6303255B1 (en) 1997-10-24 2001-10-16 Nec Corporation Organic EL panel and method of manufacturing the same
US6514649B1 (en) 1998-10-05 2003-02-04 Nec Corporation Organic EL panel and method for forming the same
US6794816B2 (en) 1998-10-05 2004-09-21 Samsung Sdi Co., Ltd. Organic EL panel and the manufacture thereof
JP2002303676A (en) * 2001-04-03 2002-10-18 Matsushita Electric Ind Co Ltd Radiation detecting element and method of manufacturing the same
US9450030B2 (en) 2001-12-28 2016-09-20 Semiconductor Energy Laboratory Co., Ltd. Active matrix light-emitting device with overlapping electroluminescent layers
US9048203B2 (en) 2001-12-28 2015-06-02 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of manufacturing the same, and manufacturing apparatus therefor
JP2013048108A (en) * 2001-12-28 2013-03-07 Semiconductor Energy Lab Co Ltd Light-emitting device
JP2013069701A (en) * 2002-01-24 2013-04-18 Semiconductor Energy Lab Co Ltd Light-emitting device
JP2012114093A (en) * 2002-01-24 2012-06-14 Semiconductor Energy Lab Co Ltd Light-emitting device
JP2014026983A (en) * 2002-01-24 2014-02-06 Semiconductor Energy Lab Co Ltd Light-emitting device
US9236418B2 (en) 2002-01-24 2016-01-12 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
JP2015099791A (en) * 2002-01-24 2015-05-28 株式会社半導体エネルギー研究所 Light-emitting device
JP2010109394A (en) * 2002-01-24 2010-05-13 Semiconductor Energy Lab Co Ltd Light emitting device and method of preparing the same
US9653519B2 (en) 2002-01-24 2017-05-16 Semiconductor Energy Laboratory Co., Ltd. Light emitting device, method of preparing the same and device for fabricating the same
JP2006028583A (en) * 2004-07-15 2006-02-02 Semiconductor Energy Lab Co Ltd Production apparatus
WO2015043303A1 (en) * 2013-09-25 2015-04-02 京东方科技集团股份有限公司 Evaporation method and evaporation device

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