JPH0478003B2 - - Google Patents
Info
- Publication number
- JPH0478003B2 JPH0478003B2 JP58024825A JP2482583A JPH0478003B2 JP H0478003 B2 JPH0478003 B2 JP H0478003B2 JP 58024825 A JP58024825 A JP 58024825A JP 2482583 A JP2482583 A JP 2482583A JP H0478003 B2 JPH0478003 B2 JP H0478003B2
- Authority
- JP
- Japan
- Prior art keywords
- heater cover
- reactor
- ring
- heater
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2482583A JPS59151418A (ja) | 1983-02-18 | 1983-02-18 | 反応炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2482583A JPS59151418A (ja) | 1983-02-18 | 1983-02-18 | 反応炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59151418A JPS59151418A (ja) | 1984-08-29 |
| JPH0478003B2 true JPH0478003B2 (https=) | 1992-12-10 |
Family
ID=12148953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2482583A Granted JPS59151418A (ja) | 1983-02-18 | 1983-02-18 | 反応炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59151418A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63157425A (ja) * | 1986-12-22 | 1988-06-30 | Hitachi Electronics Eng Co Ltd | 気相反応装置 |
| JPS63176474A (ja) * | 1987-01-14 | 1988-07-20 | Hitachi Electronics Eng Co Ltd | 気相反応装置 |
| JP5997952B2 (ja) * | 2012-07-06 | 2016-09-28 | 大陽日酸株式会社 | 気相成長装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5748851A (en) * | 1980-09-08 | 1982-03-20 | Goda Tadayoshi | Display device for calling number of telephone set |
-
1983
- 1983-02-18 JP JP2482583A patent/JPS59151418A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59151418A (ja) | 1984-08-29 |
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