JPH0464245A - Electron microscope with optical microscope and appearance inspection device using it - Google Patents

Electron microscope with optical microscope and appearance inspection device using it

Info

Publication number
JPH0464245A
JPH0464245A JP2175204A JP17520490A JPH0464245A JP H0464245 A JPH0464245 A JP H0464245A JP 2175204 A JP2175204 A JP 2175204A JP 17520490 A JP17520490 A JP 17520490A JP H0464245 A JPH0464245 A JP H0464245A
Authority
JP
Japan
Prior art keywords
alignment
microscope
optical microscope
placement
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2175204A
Other languages
Japanese (ja)
Inventor
Toshio Saito
Kazuko Mitarai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2175204A priority Critical patent/JPH0464245A/en
Publication of JPH0464245A publication Critical patent/JPH0464245A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make a series of quick operation, from alignment of a point to be inspected through detailed inspection, possible by macro-alignment of placement with an optical microscope and micro-inspection with an electron microscope.
CONSTITUTION: A semiconductor substrate 1 is kept in a vacuum vessel 5 which is maintained at vacuum after it is placed on the sample stage 8. Placement alignment for a point of the substrate to be inspected, i.e., required integrated circuit pattern of part A, is made by use of an optical microscope, with controlling both horizontal movement and oblique angle of the sample stage 8. Easy alignment of the sample placement becomes possible with short period of time because the macro-alignment of the inspection part can be made.
COPYRIGHT: (C)1992,JPO&Japio
JP2175204A 1990-07-04 1990-07-04 Electron microscope with optical microscope and appearance inspection device using it Pending JPH0464245A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2175204A JPH0464245A (en) 1990-07-04 1990-07-04 Electron microscope with optical microscope and appearance inspection device using it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2175204A JPH0464245A (en) 1990-07-04 1990-07-04 Electron microscope with optical microscope and appearance inspection device using it

Publications (1)

Publication Number Publication Date
JPH0464245A true JPH0464245A (en) 1992-02-28

Family

ID=15992118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2175204A Pending JPH0464245A (en) 1990-07-04 1990-07-04 Electron microscope with optical microscope and appearance inspection device using it

Country Status (1)

Country Link
JP (1) JPH0464245A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133417A (en) * 1999-06-15 2001-05-18 Applied Materials Inc Apparatus and method for reinspection of defect on object
JP2012114117A (en) * 2010-11-19 2012-06-14 Hitachi High-Technologies Corp Inspection method and inspection device
WO2022070258A1 (en) * 2020-09-29 2022-04-07 株式会社日立ハイテク Semiconductor inspection device and semiconductor sample inspection method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133417A (en) * 1999-06-15 2001-05-18 Applied Materials Inc Apparatus and method for reinspection of defect on object
JP2012114117A (en) * 2010-11-19 2012-06-14 Hitachi High-Technologies Corp Inspection method and inspection device
WO2022070258A1 (en) * 2020-09-29 2022-04-07 株式会社日立ハイテク Semiconductor inspection device and semiconductor sample inspection method

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