JPH045485B2 - - Google Patents
Info
- Publication number
- JPH045485B2 JPH045485B2 JP62139860A JP13986087A JPH045485B2 JP H045485 B2 JPH045485 B2 JP H045485B2 JP 62139860 A JP62139860 A JP 62139860A JP 13986087 A JP13986087 A JP 13986087A JP H045485 B2 JPH045485 B2 JP H045485B2
- Authority
- JP
- Japan
- Prior art keywords
- ozone
- waste ozone
- photocatalyst
- waste
- electric field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 76
- 238000000034 method Methods 0.000 claims description 54
- 239000002699 waste material Substances 0.000 claims description 45
- 239000011941 photocatalyst Substances 0.000 claims description 32
- 230000005684 electric field Effects 0.000 claims description 23
- 239000003054 catalyst Substances 0.000 claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 239000002516 radical scavenger Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 229910052785 arsenic Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 22
- 230000001699 photocatalysis Effects 0.000 description 13
- 229910010413 TiO 2 Inorganic materials 0.000 description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910020599 Co 3 O 4 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002370 SrTiO3 Inorganic materials 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- UBEWDCMIDFGDOO-UHFFFAOYSA-N cobalt(II,III) oxide Inorganic materials [O-2].[O-2].[O-2].[O-2].[Co+2].[Co+3].[Co+3] UBEWDCMIDFGDOO-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- MXCPYJZDGPQDRA-UHFFFAOYSA-N dialuminum;2-acetyloxybenzoic acid;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3].CC(=O)OC1=CC=CC=C1C(O)=O MXCPYJZDGPQDRA-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001603 reducing effect Effects 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910000108 silver(I,III) oxide Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Landscapes
- Catalysts (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
Description
〔産業上の利用分野〕
本発明は、廃オゾンの無害化処理方法に関する
ものである。
〔従来の技術及びその問題点〕
オゾンはその殺菌力や酸化力が強いことから広
い分野で利用されている。
即ち、排水の高次処理などの水処理への利用、
居住域や生産工程での脱臭への利用、食品の貯蔵
や医療分野への利用など、表−１に示す如く広い
分野で各種の用途に用いられている。
[Industrial Application Field] The present invention relates to a method for detoxifying waste ozone. [Prior art and its problems] Ozone is used in a wide range of fields because of its strong sterilizing and oxidizing power. In other words, use for water treatment such as higher level treatment of wastewater,
As shown in Table 1, they are used for a variety of purposes in a wide range of fields, including deodorization in living areas and production processes, food storage, and medical applications.
【表】【table】
本発明は、上記問題点を解決したもので、種々
の濃度レベルの廃オゾンを低濃度まで分解し、か
つ長期間にわたつて安定に連続運転できる廃オゾ
ンの処理方法を提供することを目的とするもので
ある。
〔発明の構成〕
本発明は、電場において光照射されている光触
媒上に廃オゾン含有ガスを通ずることによりオゾ
ンを分解処理する方法、並びに該方法と該方法以
外の廃オゾンの処理方法、例えば活性炭法、触媒
法及び／又はオゾン捕集剤を用いる方法とを組み
合わせてオゾンを処理する方法である。
つぎに図面に基づいて本発明を説明する。
第１図は、電場において光照射されている光触
媒を用いて廃オゾンの処理設備を例えば食品工場
の廃オゾン処理に適用する例を示すものである。
符号１は、食品殺菌に際して排出される廃オゾ
ンの入口部である。中程度の濃度の廃オゾンは、
電場を形成しかつ光照射された光触媒反応器２中
で分解処理され、極低濃度（0.1ppm以下）とな
り、出口３から排出される。
光触媒反応器２は、光触媒剤４（４−１〜４−
６）、紫外線ランプ５及び光触媒材表面に電場を
形成するための電極（第２図、後述）から成る。
光触媒材４は、紫外線ランプ５により紫外線の
照射を受けており、又電極により光触媒材の周囲
には電場が形成されている。
第２図は、電場形成の一実施例を示す。
光触媒材４は、Ti板電極６上に固定されてお
り、Ti板電極６と他の電極（タングステン）７
との間に電圧を印加することにより電場が形成さ
れる。
光触媒材面を光線により照射することによりそ
の近傍に電子が放出され、廃オゾンは先ず電子の
作用で分解、除去される。次いで、
電子の作用で分解、除去されなかつた廃オゾン
は、光触媒表面で分解、除去される。
ここで、光触媒における廃オゾンの分解、除去
機能は、上述のごとく光触媒に電場を形成するこ
とにより向上し、廃オゾンは、極低濃度まで分
解、除去される。これは、光触媒材を電場におく
ことにより光触媒表面がオゾンに対して還元作用
を持つようになるため光触媒によるオゾンの分解
性が顕著に向上するものと考えられる。
本発明によれば通常、１〜数10ppm程度のオゾ
ンが0.1ppm以下、好ましくは0.05ppm以下まで
処理される。
つぎに光触媒材４−１〜４−６について説明す
る。
光触媒材は、光照射により励起され、電子を放
出すると共に電場におくことにより、オゾン分解
作用が促進されるものであれば何れでも良い。通
常半導体材料が効果的であり容易に入手出来、加
工性も良いことから好ましい。
硬化や経済性の面から、Se、Ti、Zn、Cu、
Al、Sn、Ga、In、Ｐ、As、Sb、Bi、Cd、Ｓ、
Te、Ni、Fe、Co、Ag、Mo、Sr、Ｗ、Cr、Pb
の化合物、又は合金、又は酸化物が好ましく、こ
れらは単独で、又二種類以上を複合して用いる。
例えば、化合物としてはAlP、AlAs、GaP、
AlSb、GaAs、InP、GaSb、InAs、InSb、CdS、
CdSe、ZnS、MoS2、WTe2、Cr2Te3、MoTe、
Cu2S、Ws2、酸化物としてはTiO2、Bi2O3、
CuO、CuO2、ZnO、MoO3、InO3、Ag2O、
PbO、SrTiO3、BaTiO3、Co3O4、Fe2O3、NiO
がある。
電場の形成方法は、第２図に示すごとく周知の
方法を適宜用いることが出来る。光触媒材として
TiO2をTi板上に固定し、TiO2の上方1.5mm位の位
置にタングステン電極を設置すればよい。
光触媒材の固定方法は、焼結、蒸着、スパツタ
リング等の周知の方法を適宜用いることが出来
る。
電極の材料及び構造は、通常の電場形成の機器
類に使用されているもので良い。例えば電極材と
しては、ステンレス、銅、タングステンが線状、
網状、板状等の形状で適宜用いられる。
これらの材料は、光照射やオゾンによる劣化を
考慮し、空気中での加熱処理、薬品処理、金属薄
膜の蒸着、TiO2などの安定な半導体で表面コー
テイングなどを行い長期間にわたつての安定な材
料とすることが出来る。
第２図において８は入口ガス流、９は出口ガス
流を示す。
光触媒材４の形状は、廃オゾン含有空気が通過
出来る構造となつており、装置の形式などにより
格子状、板状、粒状、プリーツ状、網目状等何れ
でも良い。又、担体に担持して用いることが出来
る。これにより任意の構造のものとすることが出
来る。
電場として印加する電圧は50V〜30KV、好ま
しくは0.1〜20KVであり、該電圧は装置の形式、
使用する電極の材質、構造或いは効率、経済性等
に基き適宜予備試験等で決めることが出来る。
紫外線は、光触媒材の種類により定まる光吸収
領域の波長を放出するランプを選べば良い。例え
ばTiO2の場合は、光吸収が近紫外部にあるため
近紫外部の波長の光を放出するランプを使用す
る。
光源は、水銀灯、水素放電管、キセノン放電
管、ライマン放電管などを適宜利用することが出
来る。
ランプは、オゾンレスランプのように、紫外線
の照射によるオゾンの生成がないタイプのものが
好ましいことは言うまでもない。
光源の位置は、第１図に示すように光触媒反応
器内部に設置してもよいが、別の例として該反応
器外側に設置し紫外線を反射面の利用により、あ
るいは照射窓を通して光触媒材に照射するように
しても良い。
次に、本発明方法による廃オゾン処理と、本発
明以外の方法による廃オゾン処理とを組合せて行
なう場合を説明する。
第３図は、電場を形成した光触媒による廃オゾ
ン処理設備と、該方法以外の廃オゾン処理設備と
して触媒法による設備を併用した下水処理におけ
る廃オゾン処理法を説明するためのフロー図であ
る。
第３図において符号１０は、下水処理における
オゾン反応装置（図示されていない）から排出さ
れる廃オゾンの入口部であり、高濃度の廃オゾン
は、触媒充填部１１で比較的低濃度まで分解さ
れ、次いで電場を形成した光触媒部１２で分解処
理され、極低濃度（0.1ppm以下）となり、出口
１３から排出される。
触媒充填部１１は触媒が充填された反応器であ
る。触媒としては、通常MnO2、Co酸化物添加
MnO2、FeO、NiOなどの金属酸化物触媒、Ag、
Pt、Pdなどの貴金属触媒をSiO2やγ−アルミナ
などに担持させた触媒が用いられる。
触媒充填部１１におけるオゾン分解率は、通常
90〜99％程度である。
すなわち、触媒充填部１１では、数ppm〜数
1000ppm、通常数10ppm〜数100ppmの廃オゾン
が１〜数10ppm程度まで処理される。
１２は、電場を形成した光触媒反応器であり該
反応器は、前述実施例の第１図及び第２図で説明
したのと同様である。
光触媒反応器１２では、触媒充填部１１で処理
出来ないで排出される廃オゾン（１〜数10ppm）
を電場において光照射されている光触媒上に通ず
ることにより極低濃度にまで分解、除去される。
本発明方法と組み合わせる本発明以外の廃オゾ
ン処理法は、高濃度のオゾンが比較的低濃度まで
処理される方法であれば何れでも良く、処理効
果、コスト、操作性、装置規模等から触媒法、又
は活性炭法が好ましい。
又、廃オゾン濃度が比較的低い場合は処理効
果、操作性、装置の規模等から本発明者がすでに
提案したオゾン捕集剤を用いる方法（特願昭62−
17324）を好適に用いることが出来る。
廃オゾン処理法の好ましい形態の例を下に示
す。
廃オゾン処理方法として、本発明方法を単独で
行なうか、あるいは本発明方法以外との併用を行
なうかは、廃オゾンの発生源の種類、規模、共存
成分、経済性、操作性、効果等に基いて適宜決め
ることが出来る。
The present invention solves the above-mentioned problems, and aims to provide a waste ozone treatment method that decomposes waste ozone of various concentration levels to a low concentration and that can be operated stably and continuously for a long period of time. It is something to do. [Structure of the Invention] The present invention provides a method for decomposing ozone by passing a waste ozone-containing gas over a photocatalyst that is irradiated with light in an electric field, and this method and other methods for treating waste ozone, such as activated carbon. This is a method of treating ozone by combining a method using an ozone scavenger, a catalyst method, and/or a method using an ozone scavenger. Next, the present invention will be explained based on the drawings. FIG. 1 shows an example in which waste ozone treatment equipment is applied to waste ozone treatment in a food factory, for example, using a photocatalyst that is irradiated with light in an electric field. Reference numeral 1 indicates an inlet portion for waste ozone discharged during food sterilization. Medium concentration waste ozone is
It is decomposed in the photocatalytic reactor 2 in which an electric field is formed and is irradiated with light, resulting in an extremely low concentration (0.1 ppm or less), which is discharged from the outlet 3. The photocatalytic reactor 2 contains photocatalytic agents 4 (4-1 to 4-
6) It consists of an ultraviolet lamp 5 and an electrode (FIG. 2, described later) for forming an electric field on the surface of the photocatalyst material. The photocatalytic material 4 is irradiated with ultraviolet light by an ultraviolet lamp 5, and an electric field is formed around the photocatalytic material by the electrodes. FIG. 2 shows an example of electric field formation. The photocatalytic material 4 is fixed on the Ti plate electrode 6, and the Ti plate electrode 6 and another electrode (tungsten) 7
An electric field is created by applying a voltage between the two. By irradiating the surface of the photocatalyst material with light, electrons are released in the vicinity, and the waste ozone is first decomposed and removed by the action of the electrons. Next, waste ozone that has not been decomposed and removed by the action of electrons is decomposed and removed on the photocatalyst surface. Here, the function of decomposing and removing waste ozone in the photocatalyst is improved by forming an electric field in the photocatalyst as described above, and the waste ozone is decomposed and removed to an extremely low concentration. This is thought to be because by placing the photocatalytic material in an electric field, the surface of the photocatalyst has a reducing effect on ozone, so that the ability of the photocatalyst to decompose ozone is significantly improved. According to the present invention, ozone of about 1 to several tens of ppm is normally treated to 0.1 ppm or less, preferably 0.05 ppm or less. Next, the photocatalyst materials 4-1 to 4-6 will be explained. The photocatalyst material may be any material as long as it is excited by light irradiation, emits electrons, and promotes ozone decomposition by being placed in an electric field. Generally, semiconductor materials are preferred because they are effective, readily available, and have good processability. Se, Ti, Zn, Cu,
Al, Sn, Ga, In, P, As, Sb, Bi, Cd, S,
Te, Ni, Fe, Co, Ag, Mo, Sr, W, Cr, Pb
Compounds, alloys, or oxides are preferred, and these are used alone or in combination of two or more. For example, the compounds include AlP, AlAs, GaP,
AlSb, GaAs, InP, GaSb, InAs, InSb, CdS,
CdSe, ZnS, MoS2 , WTe2 , Cr2Te3 , MoTe,
Cu 2 S, Ws 2 , TiO 2 , Bi 2 O 3 as oxides,
CuO, CuO2 , ZnO, MoO3 , InO3 , Ag2O ,
PbO, SrTiO3 , BaTiO3 , Co3O4 , Fe2O3 , NiO
There is. As a method for forming the electric field, a well-known method as shown in FIG. 2 can be used as appropriate. As a photocatalyst material
TiO 2 is fixed on a Ti plate, and a tungsten electrode is installed at a position of about 1.5 mm above TiO 2 . As a method for fixing the photocatalytic material, well-known methods such as sintering, vapor deposition, sputtering, etc. can be used as appropriate. The material and structure of the electrode may be those used in conventional electric field generation equipment. For example, stainless steel, copper, and tungsten are used as electrode materials in the form of wires,
It is appropriately used in a shape such as a net shape or a plate shape. In consideration of deterioration due to light irradiation and ozone, these materials are made stable over long periods of time through heat treatment in air, chemical treatment, vapor deposition of metal thin films, and surface coating with stable semiconductors such as TiO 2 . It can be used as a material. In FIG. 2, 8 indicates an inlet gas flow, and 9 indicates an outlet gas flow. The shape of the photocatalyst material 4 is such that waste ozone-containing air can pass therethrough, and may be in any shape such as a grid, a plate, a granule, a pleat, a mesh, etc. depending on the type of device. Further, it can be used by being supported on a carrier. This allows it to have an arbitrary structure. The voltage applied as an electric field is 50V to 30KV, preferably 0.1 to 20KV, and the voltage depends on the type of device,
It can be determined through preliminary tests as appropriate based on the material, structure, efficiency, economical, etc. of the electrode to be used. For ultraviolet rays, a lamp that emits wavelengths in the light absorption region determined by the type of photocatalyst material may be selected. For example, in the case of TiO 2 , light absorption is in the near-ultraviolet region, so a lamp that emits light at a wavelength in the near-ultraviolet region is used. As the light source, a mercury lamp, a hydrogen discharge tube, a xenon discharge tube, a Lyman discharge tube, etc. can be used as appropriate. It goes without saying that the lamp is preferably of a type that does not generate ozone due to ultraviolet irradiation, such as an ozone-less lamp. The light source may be installed inside the photocatalytic reactor as shown in Figure 1, but as another example, it may be installed outside the reactor and the ultraviolet rays can be applied to the photocatalytic material by using a reflective surface or through an irradiation window. It may also be irradiated. Next, a case will be described in which waste ozone treatment by the method of the present invention and waste ozone treatment by a method other than the present invention are performed in combination. FIG. 3 is a flow diagram illustrating a waste ozone treatment method in sewage treatment that uses waste ozone treatment equipment using a photocatalyst that forms an electric field, and equipment using a catalyst method as waste ozone treatment equipment other than this method. In FIG. 3, reference numeral 10 is an inlet of waste ozone discharged from an ozone reactor (not shown) in sewage treatment, and high concentration waste ozone is decomposed into a relatively low concentration in a catalyst filling section 11. Then, it is decomposed in the photocatalyst section 12 in which an electric field is formed, resulting in an extremely low concentration (0.1 ppm or less), and is discharged from the outlet 13. The catalyst filling section 11 is a reactor filled with a catalyst. As a catalyst, usually MnO 2 or Co oxide is added.
Metal oxide catalysts such as MnO 2 , FeO, NiO, Ag,
A catalyst in which a noble metal catalyst such as Pt or Pd is supported on SiO 2 or γ-alumina is used. The ozone decomposition rate in the catalyst filling section 11 is usually
It is about 90-99%. That is, in the catalyst filling part 11, the amount of
Waste ozone of 1000ppm, usually several tens to several hundred ppm, is treated to about one to several tens of ppm. Reference numeral 12 denotes a photocatalytic reactor in which an electric field is formed, and this reactor is the same as that described in FIGS. 1 and 2 of the previous embodiment. In the photocatalytic reactor 12, waste ozone (1 to several tens of ppm) is discharged without being able to be treated in the catalyst filling section 11.
By passing it over a photocatalyst that is irradiated with light in an electric field, it is decomposed and removed to an extremely low concentration. The waste ozone treatment method other than the present invention in combination with the method of the present invention may be any method as long as high concentration ozone is treated to a relatively low concentration. , or activated carbon method is preferred. In addition, when the waste ozone concentration is relatively low, the method of using an ozone scavenger already proposed by the present inventor (Patent Application No. 1983-1982) is recommended due to the treatment effect, operability, scale of the device, etc.
17324) can be suitably used. An example of a preferred form of the waste ozone treatment method is shown below. Whether to use the method of the present invention alone or in combination with methods other than the present invention as a waste ozone treatment method depends on the type of waste ozone source, scale, coexisting components, economic efficiency, operability, effectiveness, etc. You can decide accordingly.
【表】
つぎに実施例を記載する。
実施例 １
第１図に示すごとき、廃オゾン処理装置に、オ
ゾン発生器から5ppmのオゾンを含む空気を0.1
／minで流し、出口オゾン濃度を測定した。
結果を表２に示す。
電場の形成：第２図に示すごとく光触媒をTi板
（負極）上に固定し、光触媒表面とタングステ
ン電極（正極）を1.5mm離して2.0KVを印加。
オゾン発生器：放電方式
紫外線ランプ：水銀灯20W
装置大きさ：50×100×200mm[Table] Examples are described below. Example 1 As shown in Figure 1, 0.1% of air containing 5ppm of ozone is supplied from an ozone generator to the waste ozone treatment equipment.
/min, and the outlet ozone concentration was measured. The results are shown in Table 2. Formation of electric field: As shown in Figure 2, the photocatalyst was fixed on a Ti plate (negative electrode), and 2.0 KV was applied with the photocatalyst surface and tungsten electrode (positive electrode) separated by 1.5 mm. Ozone generator: Discharge method Ultraviolet lamp: Mercury lamp 20W Device size: 50 x 100 x 200 mm
【表】
又、TiO2とCo3O4光触媒材について、約１カ
月の連続運転した結果（出口オゾン濃度）を表３
に示す。[Table] Table 3 also shows the results (outlet ozone concentration) of TiO 2 and Co 3 O 4 photocatalyst materials after approximately one month of continuous operation.
Shown below.
【表】
尚、比較例として、光触媒に電場をかけないで
行なつた結果は、いずれの光触媒も出口オゾン濃
度は1.1〜2.5ppmであつた。
実施例 ２
実施例１と同様にオゾン発生器より350ppmの
オゾンを発生させ、第３図に示す如き廃オゾン処
理装置に0.3／minで通過させ、同様に出口オ
ゾン濃度を測定した。
結果を表４に示す。
触 媒：Co酸化物10重量％添加MnO2（150℃）
光触媒：TiO2、Ag2O
紫外線ランプ：水銀灯20W
装置大きさ：80縦×100横×300mm[Table] As a comparative example, results were obtained without applying an electric field to the photocatalyst, and the ozone concentration at the exit of each photocatalyst was 1.1 to 2.5 ppm. Example 2 In the same manner as in Example 1, 350 ppm ozone was generated from an ozone generator and passed through a waste ozone treatment device as shown in FIG. 3 at a rate of 0.3/min, and the outlet ozone concentration was measured in the same manner. The results are shown in Table 4. Catalyst: MnO 2 with 10% by weight of Co oxide (150℃) Photocatalyst: TiO 2 , Ag 2 O Ultraviolet lamp: Mercury lamp 20W Equipment size: 80 mm x 100 mm x 300 mm
【表】
又、TiO2とAg2O光触媒材について、約１ケ月
の連続運転した結果（出口オゾン濃度）を表５に
示す。[Table] Table 5 also shows the results (outlet ozone concentration) of TiO 2 and Ag 2 O photocatalyst materials after approximately one month of continuous operation.
１ 廃オゾン処理方法として、光触媒を用い光触
媒又はその周囲に電場を形成することにより、
光触媒によるオゾン分解作用が顕著に向上
した。
廃オゾンを高効率で長期間安定して処理す
ることが出来た。
排出オゾン濃度を実質上無視出来る濃度
（極低濃度）まで減少することが出来た。
連続使用、間欠使用のいずれの場合でも同
様の効果がある。
２ 本発明方法と本発明以外の廃オゾン処理法を
併用することにより、
多種多様な発生源に対応出来る廃オゾン処
理装置を提供出来た。
両方法の特長（長所）を生かした実用上効
果的な装置が出来た。
即ち、触媒法及び活性炭法は、主に分解反
応によるので一般に高濃度オゾン程効果的で
ある。
又、オゾン捕集剤による方法は、捕集（吸
着）作用を用いているので中程度の濃度ない
し低濃度程効果的である。
これに対し、本発明方法は中程度の濃度な
いし低濃度で効果的である。
連続運転、間欠運転、又は入口濃度の変動
する排ガスにおいても、実用性に富んだ排オ
ゾン処理装置が出来た。
高濃度廃オゾンを極低濃度まで減少するこ
とが出来た。
1. As a waste ozone treatment method, the ozone decomposition effect of the photocatalyst was significantly improved by using a photocatalyst and creating an electric field at or around the photocatalyst. We were able to process waste ozone with high efficiency and stability over a long period of time. It was possible to reduce the emitted ozone concentration to a virtually negligible concentration (extremely low concentration). The same effect is obtained whether it is used continuously or intermittently. 2. By using the method of the present invention in combination with a waste ozone treatment method other than the present invention, it was possible to provide a waste ozone treatment device that can deal with a wide variety of sources. We have created a practically effective device that takes advantage of the features (advantages) of both methods. That is, since the catalyst method and the activated carbon method mainly rely on decomposition reactions, the higher the concentration of ozone, the more effective they are. Furthermore, since the method using an ozone scavenger uses a scavenging (adsorption) action, it is more effective at moderate to low concentrations. In contrast, the method of the present invention is effective at moderate to low concentrations. We have created an exhaust ozone treatment device that is highly practical for continuous operation, intermittent operation, or fluctuating exhaust gas concentration at the inlet. We were able to reduce high concentration waste ozone to an extremely low concentration.
第１図は本発明方法を説明するため光触媒反応
器の概略を示す図、第２図は電場を形成するため
の電圧の一例を示す図、第３図は本発明方法と本
発明以外の方法とを組み合わせて行なう場合を説
明するための概略図である。
４，４−１〜４−６……光触媒材、５……紫外
線ランプ、６……Ti板電極、７……タングステ
ン電極、１１……触媒充填部、１２……光触媒反
応器。
Fig. 1 is a diagram showing an outline of a photocatalytic reactor to explain the method of the present invention, Fig. 2 is a diagram showing an example of voltage for forming an electric field, and Fig. 3 is a diagram showing a method of the present invention and a method other than the present invention. FIG. 4,4-1 to 4-6...Photocatalyst material, 5...Ultraviolet lamp, 6...Ti plate electrode, 7...Tungsten electrode, 11...Catalyst filling part, 12...Photocatalyst reactor.
Claims (1)
オゾン含有ガスを通ずることを特徴とする廃オゾ
ンの処理方法。 ２ 光触媒が半導体である特許請求の範囲第１項
記載の廃オゾンの処理方法。 ３ 光触媒がSe、Ti、Zn、Cu、Sn、Al、Ga、
In、Ｐ、As、Sb、Bi、Cd、Ｓ、Te、Ni、Fe、
Co、Ag、Mo、Sr、Ｗ、Cr、Pbの化合物、又は
合金、又は酸化物より選ばれた一種又は二種以上
の複合体よりなる特許請求の範囲第２項記載の廃
オゾンの処理方法。 ４ 電場の電圧が50V〜30KVの範囲内にある特
許請求の範囲第１項乃至第３項の何れか１つに記
載の廃オゾンの処理方法。 ５ 特許請求の範囲１記載の方法とは別の廃オゾ
ンの処理方法と、特許請求の範囲１記載の廃オゾ
ンの処理方法とを組合せてなる特許請求の範囲第
１項記載の廃オゾンの処理方法。 ６ 特許請求の範囲１記載の方法とは別の廃オゾ
ンの処理方法として活性炭法、触媒法及びオゾン
捕集剤を用いる方法の内少なくとも１種の方法を
用いる特許請求の範囲第５項記載の廃オゾンの処
理方法。[Claims] 1. A method for treating waste ozone, which comprises passing waste ozone-containing gas over a photocatalyst that is irradiated with light in an electric field. 2. The method for treating waste ozone according to claim 1, wherein the photocatalyst is a semiconductor. 3 Photocatalysts include Se, Ti, Zn, Cu, Sn, Al, Ga,
In, P, As, Sb, Bi, Cd, S, Te, Ni, Fe,
The method for treating waste ozone according to claim 2, comprising a composite of one or more selected from Co, Ag, Mo, Sr, W, Cr, Pb compounds, alloys, or oxides. . 4. The waste ozone treatment method according to any one of claims 1 to 3, wherein the voltage of the electric field is within the range of 50V to 30KV. 5. Waste ozone treatment according to claim 1, which is a combination of a waste ozone treatment method different from the method according to claim 1 and the waste ozone treatment method according to claim 1. Method. 6. A waste ozone treatment method other than the method described in claim 1, which uses at least one method among the activated carbon method, catalyst method, and method using an ozone scavenger. How to treat waste ozone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62139860A JPS63305922A (en) | 1987-06-05 | 1987-06-05 | Method for treating waste ozone |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62139860A JPS63305922A (en) | 1987-06-05 | 1987-06-05 | Method for treating waste ozone |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63305922A JPS63305922A (en) | 1988-12-13 |
| JPH045485B2 true JPH045485B2 (en) | 1992-01-31 |
Family
ID=15255224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62139860A Granted JPS63305922A (en) | 1987-06-05 | 1987-06-05 | Method for treating waste ozone |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63305922A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0722681B2 (en) * | 1991-04-10 | 1995-03-15 | 岡谷電機産業株式会社 | Ozone extinction device |
| JP2913265B2 (en) * | 1995-09-11 | 1999-06-28 | 岡谷電機産業株式会社 | Photocatalyst consolidation method |
| JP3389187B2 (en) * | 1998-12-31 | 2003-03-24 | エルジー電子株式会社 | Film type photocatalyst |
| GB2415774B (en) | 2004-06-30 | 2007-06-13 | Alan Mole | Air decontamination device and method |
| CN103537179B (en) * | 2013-10-25 | 2016-09-21 | 临安清云环保设备有限公司 | Photocatalytic ozonation goes the method for removing exhaust gas |
| CN106390984A (en) * | 2016-09-13 | 2017-02-15 | 福州大学 | Strontium antimonate photocatalyst and preparation and application thereof |
-
1987
- 1987-06-05 JP JP62139860A patent/JPS63305922A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63305922A (en) | 1988-12-13 |
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