JPH0443408B2 - - Google Patents

Info

Publication number
JPH0443408B2
JPH0443408B2 JP59195271A JP19527184A JPH0443408B2 JP H0443408 B2 JPH0443408 B2 JP H0443408B2 JP 59195271 A JP59195271 A JP 59195271A JP 19527184 A JP19527184 A JP 19527184A JP H0443408 B2 JPH0443408 B2 JP H0443408B2
Authority
JP
Japan
Prior art keywords
wafer
shot
exposed
exposure
stepper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59195271A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6172253A (ja
Inventor
Mitsuyoshi Araki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59195271A priority Critical patent/JPS6172253A/ja
Publication of JPS6172253A publication Critical patent/JPS6172253A/ja
Publication of JPH0443408B2 publication Critical patent/JPH0443408B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59195271A 1984-09-17 1984-09-17 ステツパ Granted JPS6172253A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59195271A JPS6172253A (ja) 1984-09-17 1984-09-17 ステツパ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59195271A JPS6172253A (ja) 1984-09-17 1984-09-17 ステツパ

Publications (2)

Publication Number Publication Date
JPS6172253A JPS6172253A (ja) 1986-04-14
JPH0443408B2 true JPH0443408B2 (enrdf_load_stackoverflow) 1992-07-16

Family

ID=16338377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59195271A Granted JPS6172253A (ja) 1984-09-17 1984-09-17 ステツパ

Country Status (1)

Country Link
JP (1) JPS6172253A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63228719A (ja) * 1987-03-18 1988-09-22 Sumitomo Electric Ind Ltd 縮小露光装置
JPH0774089A (ja) * 1994-03-14 1995-03-17 Nikon Corp 投影露光装置
JP3610834B2 (ja) * 1999-08-17 2005-01-19 松下電器産業株式会社 面位置検出方法
US20050134865A1 (en) * 2003-12-17 2005-06-23 Asml Netherlands B.V. Method for determining a map, device manufacturing method, and lithographic apparatus

Also Published As

Publication number Publication date
JPS6172253A (ja) 1986-04-14

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees