JPH0430969A - Manufacture of mask for blast engraving - Google Patents

Manufacture of mask for blast engraving

Info

Publication number
JPH0430969A
JPH0430969A JP2134899A JP13489990A JPH0430969A JP H0430969 A JPH0430969 A JP H0430969A JP 2134899 A JP2134899 A JP 2134899A JP 13489990 A JP13489990 A JP 13489990A JP H0430969 A JPH0430969 A JP H0430969A
Authority
JP
Japan
Prior art keywords
resin layer
film
adhesive
mask
blast
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2134899A
Other languages
Japanese (ja)
Inventor
Kuninobu Kurumisawa
楜澤 邦伸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP2134899A priority Critical patent/JPH0430969A/en
Publication of JPH0430969A publication Critical patent/JPH0430969A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve engraving accuracy and engraving workability, by taking a monoblock body located on an original film out of an exposer after exposing a resin layer for a fixed time by a parallel light via an original film from a exposing glass side and peeling off a protection film after washing the nonexposed part of the resin layer with a support film being peeled off. CONSTITUTION:A resin layer in a constant thickness is formed with a photosensitive resin 6 being flowed in via a nonadhesive support film 3 onto the original film 2 which is placed on the exposing glass 1 of the exposer inside. Then, the resin layer is flatly pressed from the above of a protection film 7 with the adhesives side of the nonadhesive protection film 7 on whose one face adhesive 4 is coated being placed so as to meet the resin layer side. The monoblock body of the original film 2 above is then taken off from the exposer, after exposing the resin layer 6 for a fixed time by a parallel light via the original film 2 from the exposing glass 1 side and a blast engraving mask is made with the protection film 7 being peeled off, after washing the nonexposed part of the resin layer with the support film 3 being peeled off.

Description

【発明の詳細な説明】 [産業上の利用分野1 本発明は、石材、陶磁器、コンクリート材、ガラス材、
金属材等の硬質材の表面にマスクを畜着して高圧噴射粒
子をブラストすることにより、そのマスクの露出部形状
に応じた所望の文字或は形状を刻削するのに好適するブ
ラスト刻削用マスクの製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field 1] The present invention is applicable to stone, ceramics, concrete, glass,
Blast cutting is suitable for carving desired characters or shapes according to the shape of the exposed part of the mask by attaching a mask to the surface of a hard material such as a metal material and blasting high-pressure spray particles. The present invention relates to a method of manufacturing a mask for use.

〔従来の技術1 従来、石材、陶磁器、コンクリート材、ガラス材、金属
材等の硬質材の表面加工法としては、手ノミ、ドリル加
工、又はと粒による噴射加工法がその被加工材質に応じ
て用いられている。
[Conventional technology 1] Conventionally, as a surface processing method for hard materials such as stone, ceramics, concrete, glass, metal, etc., hand chiseling, drilling, or abrasive blasting have been used depending on the material to be processed. It is used as

[発明が解決しようとする課題1 このような加工法において、手ノミによればある程度細
微な刻削が可能であるが、甚大な労力を要するばかりか
熟練を要し、量産性に優れず、またドリル加工によれば
手ノミによる場合より労力は幾分軽減されるもののやは
り熟練を要し、量産性もあまり期待できない。一方、と
粒による噴射加工は、労力、熟練共に軽減されるもので
あるが、微細な加工ができず、精緻な文字及び形状の刻
削は到底不可能であった。
[Problem to be solved by the invention 1 In such a processing method, it is possible to perform fine cutting to a certain extent using a hand chisel, but it not only requires a great deal of labor but also requires skill, and is not suitable for mass production. Drilling requires less labor than hand chiseling, but it still requires skill and is not very likely to be mass-produced. On the other hand, jet machining using carcass particles requires less labor and skill, but it does not allow fine machining, and it has been impossible to carve precise characters and shapes.

ところで、と粒による噴射加工法は、と粒を被加工物表
面に噴出して表面を刻削するものであるが、近年になっ
て被刻削部分を露出したマスクを密着して該露出部にと
粒を噴射する方法も開発されつつある。
Incidentally, the carcass grain injection machining method involves jetting carcass grains onto the surface of the workpiece to carve the surface. A method of spraying nicotine particles is also being developed.

ところが、従来のマスクはゴム版にカットナイフの切抜
きにより作成されるため、加工に手間がかかるばかりか
、加工表面に密着されたマスクが噴射圧によって剥れた
り捲れたりし、これを防止するため、マスクを接着剤を
用いて加工面に密着させると、剥すのに困難であるとい
う問題点があった。また、この種のマスクは微細なマス
ク作成が困難であり、精緻な刻削加工は不可能であった
However, conventional masks are made by cutting out a rubber plate with a cut knife, which not only takes time and effort to process, but also prevents the mask, which is tightly attached to the processed surface, from peeling off or rolling up due to the spray pressure. However, when a mask is attached to a processed surface using an adhesive, there is a problem in that it is difficult to remove the mask. Furthermore, it is difficult to create a fine mask with this type of mask, and precise cutting is impossible.

本発明は、このような事情に鑑みてなされたもので、ブ
ラスト機を用いた刻削加工において、非刻削部を被覆処
理するためのマスク付着部がブラスト機の噴射圧によっ
て捲れたり剥れたりしない高密着性を有することにより
マスク画像に応じた文字・形状を忠実に表現する刻削加
工をなし、かつ刻削後には容易に剥すことができるブラ
スト刻削用マスクを提供することを目的とする。
The present invention was made in view of the above circumstances, and it is possible that during cutting using a blasting machine, the part to which the mask is attached for coating the non-cutting part may be turned over or peeled off due to the blasting pressure of the blasting machine. The purpose of the present invention is to provide a blast engraving mask that has high adhesion that does not cause the mask to smear, allows engraving to faithfully express characters and shapes according to the mask image, and that can be easily peeled off after engraving. shall be.

[課題を解決するための手段] そこで、上記の課題を解決するために、本発明のブラス
ト刻削用マスクの製造方法は、被刻削材の表面に接着し
て前記被刻削材の露出部に高圧噴射粒子をブラストする
ことにより前記露出部形状の刻削をなすのに用いるブラ
スト刻削用マスクの製造方法において、露光器内の露光
ガラス上に載置された原稿フィルム上に非接着性支持フ
ィルムを介して感光性樹脂を流入して一定厚さの樹脂層
を形成した後、片面に粘着剤が塗着された非接着性保護
フィルムの前記粘着剤側が前記樹脂層側に対面するよう
載置して前記保護フィルムの上から前記樹脂層を平坦に
押圧し、次いで前記露光ガラス側から前記原稿フィルム
を介して前記樹脂層を平行光により一定時間露光した後
、前記原稿フィルム上の一体物を露光器から取出し、前
記支持フィルムを剥して前記樹脂層の非露光部を水洗い
した後、前記保護フィルムを剥してブラスト刻削用マス
クとしたことを特徴とする。
[Means for Solving the Problems] Therefore, in order to solve the above-mentioned problems, the method for manufacturing a blast cutting mask of the present invention is to adhere to the surface of a workpiece to expose the workpiece. In the method for manufacturing a blast engraving mask used to engrave the shape of the exposed part by blasting high-pressure jet particles onto the exposed part, a non-adhesive mask is placed on the original film placed on the exposure glass in the exposure device. After a photosensitive resin is injected through the adhesive support film to form a resin layer of a certain thickness, the adhesive side of a non-adhesive protective film coated with an adhesive on one side faces the resin layer side. The resin layer is pressed flat from above the protective film, and then the resin layer is exposed to parallel light for a certain period of time from the exposure glass side through the original film. The integrated object is taken out from the exposure device, the supporting film is peeled off, the non-exposed portion of the resin layer is washed with water, and the protective film is peeled off to obtain a mask for blast cutting.

[作用1 上記発明において、露光器内の露光ガラス上に載置され
た原稿フィルムと感光性樹脂層との間に介在させる支持
フィルムは、感光性樹脂が原稿フィルムに粘着しないよ
う原稿フィルムと感光性樹脂とを非接触とするために設
けられる。
[Function 1] In the above invention, the support film interposed between the original film placed on the exposure glass in the exposure device and the photosensitive resin layer is a support film interposed between the original film and the photosensitive resin layer to prevent the photosensitive resin from adhering to the original film. This is provided to prevent contact with the synthetic resin.

そして、片面に粘着剤が被膜された保護フィルムの粘着
剤側が樹脂層側に対面するよう載置して保護フィルムの
上から樹脂層を平坦に押圧すると、露光ガラス面に添っ
て樹脂層が平坦にされると共に保護フィルムの粘着剤と
樹脂層とが密着される。そこで、露光ガラス側から原稿
フィルムを介して感光性樹脂層に平行光をあて一定時間
露光すると原稿フィルムの画像に応じた感光がなされる
結果、該感光部は硬質化され、非感光部は元の樹脂質を
保ったままとなる。
Then, by placing a protective film coated with adhesive on one side so that the adhesive side faces the resin layer side and pressing the resin layer flat from above the protective film, the resin layer will flatten along the exposed glass surface. At the same time, the adhesive of the protective film and the resin layer are brought into close contact with each other. Therefore, if parallel light is applied to the photosensitive resin layer from the exposure glass side through the original film and exposed for a certain period of time, the photosensitive resin layer will be exposed to light according to the image on the original film, and as a result, the exposed areas will become hard and the non-exposed areas will remain in their original state. The resin quality is maintained.

本発明において、感光性樹脂層の露光は平行光照射によ
るものであるから、感光による硬質化部は樹脂層面に対
して鉛直に形成され、硬質化形状は樹脂層の裏面と表面
とで異なることなく原稿フィルムの画像に忠実に形成さ
れる。
In the present invention, since the exposure of the photosensitive resin layer is by parallel light irradiation, the hardened portion due to exposure to light is formed perpendicularly to the surface of the resin layer, and the hardened shape is different between the back surface and the front surface of the resin layer. The image is formed faithfully to the image on the original film.

露光後、原稿フィルム上の支持フィルムと樹脂層と保護
フィルムとの一体物を露光器から取出し、その支持フィ
ルムを剥す。該支持フィルムは非接着性であるから、樹
脂層から容易に剥れる。
After exposure, the integrated support film, resin layer, and protective film on the original film is taken out from the exposure device, and the support film is peeled off. Since the support film is non-adhesive, it can be easily peeled off from the resin layer.

そして、前記樹脂層の非露光部を洗い出して感光による
硬質化形状を残す。この硬質化形状が原稿フィルムの画
像に応じたブラスト刻削のレジスト形状をなしてブラス
ト刻削用マスクとしての機能を果たす。
Then, the non-exposed portions of the resin layer are washed out to leave a hardened shape due to exposure to light. This hardened shape forms a resist shape for blasting according to the image on the original film, and functions as a mask for blasting.

そこで、このような樹脂マスクを用いてブラスト刻削す
るには、樹脂層の片側に付着しである保護フィルムを剥
すと、この保護フィルムも非接着性であるから容易に剥
れるが、保護フィルムの片側に塗着された粘着剤(ジア
ゾ樹脂とポリビニルアルコールと酢酸ビニルイマルジヨ
ンとの混合物からなる)は上記露光により適度の粘着性
を有する結果、非接着性の保護フィルムより樹脂層に対
して大きな付着力を有し、保護フィルムを剥した時、粘
着剤は樹脂層側に付着した状態となる。そして、この粘
着剤により上記樹脂マスクは被刻削材表面に密着性良く
付着し、ブラスト噴射圧に耐えて剥れたり捲れたすせず
、除去すべきときには容易に剥れるという特性を発揮し
、ブラスト刻削に最適なレジストマスクとして使用する
ことができる。
Therefore, in order to perform blast cutting using such a resin mask, remove the protective film attached to one side of the resin layer.This protective film is also non-adhesive and can be easily peeled off, but the protective film The adhesive (consisting of a mixture of diazo resin, polyvinyl alcohol, and vinyl acetate imulsion) applied to one side of the film has moderate tackiness due to the above exposure, and as a result, it is more adhesive to the resin layer than the non-adhesive protective film. It has a strong adhesive force, and when the protective film is removed, the adhesive remains attached to the resin layer side. With this adhesive, the resin mask adheres well to the surface of the material to be cut, withstands blasting pressure without peeling or rolling up, and easily peels off when it needs to be removed. , it can be used as a resist mask that is ideal for blast engraving.

〔実施例1 以下、本発明の実施例を図面を参照しながら説明する。[Example 1 Embodiments of the present invention will be described below with reference to the drawings.

第1図は、本発明のブラスト刻削用マスクの製造方法の
一実施例を工程順に示す模式的断面図である。
FIG. 1 is a schematic cross-sectional view showing, in order of steps, an embodiment of the method for manufacturing a blast cutting mask of the present invention.

まず、露光器(不図示)内の露光ガラス1上に原稿フィ
ルム2を載置する((a)図)。このフィルムには、刻
削すべき所定形状を遮光部2aとし、非刻削部を透光部
2bとする画像が現像されている。
First, an original film 2 is placed on an exposure glass 1 in an exposure device (not shown) (FIG. 1A). On this film, an image is developed in which the predetermined shape to be carved is the light-shielding part 2a and the non-cutting part is the light-transmitting part 2b.

この原稿フィルム2上に支持フィルム3を載置する((
b)図)。該支持フィルムは0.2mm厚程度のポリプ
ロピレンフィルム(またはポリエステルフィルムでも良
い)を用いてあり、非接着性を有するものである。
The support film 3 is placed on this original film 2 ((
b) Figure). The supporting film is a polypropylene film (or a polyester film may also be used) having a thickness of about 0.2 mm, and is non-adhesive.

この支持フィルム3上或はその外周にある程度の厚みの
ある接着テープを用いて土手5を形成する((C)図)
。そして、この土手5内に感光性樹脂として流動性の感
光性ナイロン樹脂を流入し、1.5mm厚程度の感光性
樹脂層6を形成する((d)図)。この際、原稿フィル
ム2は支持フィルム3により感光性樹脂層6から保護さ
れる。
A bank 5 is formed on or around the support film 3 using adhesive tape with a certain thickness (Figure (C))
. Then, a fluid photosensitive nylon resin is poured into the bank 5 as a photosensitive resin to form a photosensitive resin layer 6 with a thickness of about 1.5 mm (see figure (d)). At this time, the original film 2 is protected from the photosensitive resin layer 6 by the support film 3.

次いで、上記同様012ffllT+厚程度のポリプロ
ピレンフィルムによる保護フィルム7を樹脂6の上に付
着するが、この保護フィルム70片面にはジアゾ樹脂と
ポリビニルアルコールと酢酸ビニルイマルジヨンとの混
合物を用いた粘着剤4がロールコーティングにより20
μm程度の厚さに塗着され、該粘着剤4側が感光性樹脂
層6側に対面するよう敷かれる((e)図)。
Next, a protective film 7 made of a polypropylene film having a thickness of approximately 012ffllT+ is adhered to the resin 6 in the same manner as described above, but one side of this protective film 70 is coated with an adhesive 4 made of a mixture of diazo resin, polyvinyl alcohol, and vinyl acetate imulsion. 20 by roll coating
It is applied to a thickness of about μm, and laid so that the adhesive 4 side faces the photosensitive resin layer 6 side (Figure (e)).

しかして、保護フィルム7の上からローラ8を用いて押
圧ローリングし、保護フィルム7を介して感光性樹脂6
を平坦にする((f)図)。
Then, pressure rolling is performed using a roller 8 from above the protective film 7 to pass the photosensitive resin 6 through the protective film 7.
flatten it (Figure (f)).

次いで、露光器周辺を暗室状態にし、露光ガラス1の下
方から平行光補正手段10を介してハロゲンランプまた
は水銀ランプ等の光源9からの光を平行光に補正して露
光し、原稿フィルム2を介して感光性樹脂6をその直進
光によって20〜30秒間程度感光する((g)図)。
Next, the area around the exposure device is placed in a dark room, and light from a light source 9 such as a halogen lamp or a mercury lamp is corrected to parallel light from below the exposure glass 1 via a parallel light correction means 10 and exposed, and the original film 2 is exposed. The photosensitive resin 6 is then exposed to the straight light for about 20 to 30 seconds (see figure (g)).

このような感光方法によって、感光性樹脂層6には光が
傾斜状に当たらず、原稿フィルム2の画像に対して忠実
な感光が行われる結果、原稿フィルム2の透光部2aに
対応した樹脂層6の露光部6bのみが感光されて当該部
分が硬質化する。
With this exposure method, the light does not fall on the photosensitive resin layer 6 in an oblique manner, and as a result, the image on the original film 2 is faithfully exposed to light, and as a result, the resin corresponding to the transparent portion 2a of the original film 2 is exposed. Only the exposed portion 6b of the layer 6 is exposed to light, and that portion is hardened.

次に、露光器から原稿フィルム2上の一体物3.5.6
.7全体を持ち出し、支持フィルム3を剥す((h)図
)。支持フィルム3は非接着性であるから、樹脂層6か
ら容易に離脱する。そこで樹脂層6全体を露出したとこ
ろで、水、又は湯、或はこれらに3%濃度のカセイソー
ダを混入した溶剤で水洗いすると、非露光部6aの非硬
質化部分が容易に除去される((1)図)。
Next, from the exposure device, the integral object 3.5.6 on the original film 2 is
.. Take out the whole 7 and peel off the support film 3 (Figure (h)). Since the support film 3 is non-adhesive, it easily separates from the resin layer 6. When the entire resin layer 6 is exposed, the non-hardened portion of the non-exposed portion 6a is easily removed by washing with water, hot water, or a solvent containing 3% caustic soda ((1) )figure).

かくして、ブラスト刻削用マスクの作成が完了するが、
これを使用する場合には、保護フィルム3をはがしく(
J)図)、樹脂層6の粘着剤4側を被刻削材11に対面
させ、所定の刻削箇所に烹看させる。
In this way, the creation of the blast engraving mask is completed, but
When using this, remove the protective film 3 (
J), the adhesive 4 side of the resin layer 6 is made to face the material to be cut 11, and a predetermined part to be cut is exposed.

そして、樹脂層6の露出部(非露光部6a)に対し、ブ
ラスト機を用いてセラミック粒子等をノズル12から高
圧噴射させてブラスト刻削する((1)図)。この際、
当初露出部6aに粘着剤4が付着したままであるが、ブ
ラストにより容易に打ち破られる。
Then, the exposed portion (non-exposed portion 6a) of the resin layer 6 is blast-cut by injecting ceramic particles or the like from the nozzle 12 at high pressure using a blasting machine (Figure (1)). On this occasion,
Initially, the adhesive 4 remains attached to the exposed portion 6a, but is easily broken off by blasting.

このブラスト刻削によれば、被刻削材11の材質を問わ
ず、ノズル12の噴射角度及び噴射圧の調節により、第
1図(m)に示す2種の刻削断面形状14a(中ぐり加
工)と14b(深穴の鉛直孔刻削)の他、自在な深度の
刻削穴及び形状が形成できる。
According to this blast cutting, regardless of the material of the workpiece 11, by adjusting the injection angle and injection pressure of the nozzle 12, two types of cutting cross-sectional shapes 14a (boring) shown in FIG. In addition to machining) and 14b (deep hole vertical hole cutting), it is possible to form cut holes and shapes of arbitrary depth.

なお、上記のようにマスクを製造する過程において、保
護フィルム7側に粘着剤4を塗着したが、支持フィルム
3側に塗着するようにしても同様の結果が得られる。
Although the adhesive 4 is applied to the protective film 7 side in the process of manufacturing the mask as described above, the same result can be obtained even if the adhesive 4 is applied to the support film 3 side.

[発明の効果] 以上説明したように、本発明のブラスト刻削用マスクの
製造方法によれば、被刻削材表面に密着性良く付着し、
ブラスト噴射圧に耐えて剥れたり捲れたすせず、除去す
べきときには容易に剥れるという、ブラスト用マスクと
して最適な特性を有するブラスト刻削用マスクが得られ
、従来法に比べ刻削精度及び刻削作業性共に優良な改善
が可能となる。
[Effects of the Invention] As explained above, according to the method of manufacturing a blast cutting mask of the present invention, the mask adheres well to the surface of the workpiece, and
A blast cutting mask that can withstand blasting pressure without peeling or curling up, and easily peels off when it needs to be removed, has been obtained, and has the optimal characteristics as a blasting mask, and has improved cutting accuracy compared to conventional methods. Excellent improvements can be made in both cutting and cutting workability.

従って、従来この種の刻削方法では不可能であったガラ
ス材、石材、金属材等の硬質材料への微細な文字・形状
の刻削加工が可能となる。
Therefore, it becomes possible to carve minute characters and shapes into hard materials such as glass, stone, and metal, which was previously impossible with this type of cutting method.

具体的には、従来、平面ガラスの加工には、せいぜいダ
イヤモンドカッターによる直線切断、或はダイヤモンド
ホルンによる円形切削を行う程度であったが、本発明に
よる樹脂マスクを使用すれば、従来不可能であった自在
形状の中抜き加工ばかりか文字の刻削加工を行うことが
でき、またガラス板のみならず立体ガラス形状に対し精
緻な刻削表現をなす工芸品の造作が可能となる。
Specifically, in the past, the processing of flat glass required at most straight cutting with a diamond cutter or circular cutting with a diamond horn, but by using the resin mask of the present invention, it is possible to process flat glass that was previously impossible. It is possible to perform not only hollowing out of any shape, but also engraving of characters, and it is also possible to create crafts that make precise engraving expressions not only on glass plates but also on three-dimensional glass shapes.

また、墓石の文字刻削、石材等に自然石のような窪みを
付けたり、自然石に窪みを作り鉢として形成することも
できる。
It is also possible to engrave characters on gravestones, add depressions like natural stones to stone materials, or make depressions in natural stones to form pots.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明のブラスト刻削用マスクの製造方法の
一実施例を工程順に示す模式的断面図である。 1・・・露光ガラス、2・・・原稿フィルム、3・・・
支持フィルム、4・・・粘着剤、5・・・土手、6・・
・感光性樹脂、6a・・・非露光部、6b・・・露光部
、7・・・保護フィルム、 9・・・露光用照射源、 10・・・平行光補正子 段、 ■・・・被刻削材
FIG. 1 is a schematic cross-sectional view showing, in order of steps, an embodiment of the method for manufacturing a blast cutting mask of the present invention. 1... Exposure glass, 2... Original film, 3...
Support film, 4...adhesive, 5...bank, 6...
- Photosensitive resin, 6a... Non-exposed area, 6b... Exposed area, 7... Protective film, 9... Irradiation source for exposure, 10... Parallel light corrector stage, ■... Material to be cut

Claims (2)

【特許請求の範囲】[Claims] (1)被刻削材の表面に接着して前記被刻削材の露出部
に高圧噴射粒子をブラストすることにより前記露出部形
状の刻削をなすのに用いるブラスト刻削用マスクの製造
方法において、露光器内の露光ガラス上に載置された原
稿フィルム上に非接着性支持フィルムを介して感光性樹
脂を流入して一定厚さの樹脂層を形成した後、片面に粘
着剤が塗着された非接着性保護フィルムの前記粘着剤側
が前記樹脂層側に対面するよう載置して前記保護フィル
ムの上から前記樹脂層を平坦に押圧し、次いで前記露光
ガラス側から前記原稿フィルムを介して前記樹脂層を平
行光により一定時間露光した後、前記原稿フィルム上の
一体物を露光器から取出し、前記支持フィルムを剥して
前記樹脂層の非露光部を水洗いした後、前記保護フィル
ムを剥してブラスト刻削用マスクとしたことを特徴とす
るブラスト刻削用マスクの製造方法。
(1) Method for manufacturing a blast cutting mask used to adhere to the surface of a workpiece and blast high-pressure spray particles onto the exposed part of the workpiece to carve the shape of the exposed part. In this process, a photosensitive resin is poured onto a document film placed on an exposure glass in an exposure device through a non-adhesive support film to form a resin layer of a certain thickness, and then an adhesive is applied to one side. Place the applied non-adhesive protective film so that the adhesive side faces the resin layer side, press the resin layer flat from above the protective film, and then press the original film from the exposed glass side. After exposing the resin layer to parallel light for a certain period of time through a wafer, the integrated object on the original film is taken out from the exposure device, the support film is peeled off, the non-exposed part of the resin layer is washed with water, and the protective film is removed. A method for manufacturing a blast engraving mask, characterized in that the blast engraving mask is obtained by peeling it off.
(2)前記非接着性保護フィルムの片側に塗着された粘
着剤は、ジアゾ樹脂とポリビニルアルコールと酢酸ビニ
ルイマルジヨンとの混合物からなることを特徴とする請
求項1記載のブラスト刻削用マスクの製造方法。
(2) The blast cutting mask according to claim 1, wherein the adhesive applied to one side of the non-adhesive protective film is made of a mixture of diazo resin, polyvinyl alcohol, and vinyl acetate imulsion. manufacturing method.
JP2134899A 1990-05-24 1990-05-24 Manufacture of mask for blast engraving Pending JPH0430969A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2134899A JPH0430969A (en) 1990-05-24 1990-05-24 Manufacture of mask for blast engraving

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2134899A JPH0430969A (en) 1990-05-24 1990-05-24 Manufacture of mask for blast engraving

Publications (1)

Publication Number Publication Date
JPH0430969A true JPH0430969A (en) 1992-02-03

Family

ID=15139127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2134899A Pending JPH0430969A (en) 1990-05-24 1990-05-24 Manufacture of mask for blast engraving

Country Status (1)

Country Link
JP (1) JPH0430969A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0735925A (en) * 1993-06-29 1995-02-07 Kaiser Aerospace & Electron Corp High rate chiral nematic liquid crystal polarization body

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0735925A (en) * 1993-06-29 1995-02-07 Kaiser Aerospace & Electron Corp High rate chiral nematic liquid crystal polarization body

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