JPH04307763A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH04307763A
JPH04307763A JP3071360A JP7136091A JPH04307763A JP H04307763 A JPH04307763 A JP H04307763A JP 3071360 A JP3071360 A JP 3071360A JP 7136091 A JP7136091 A JP 7136091A JP H04307763 A JPH04307763 A JP H04307763A
Authority
JP
Japan
Prior art keywords
substrate potential
control signal
potential detection
pmos transistor
period
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3071360A
Other languages
Japanese (ja)
Inventor
Shuji Kubota
修司 久保田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC IC Microcomputer Systems Co Ltd
Original Assignee
NEC IC Microcomputer Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC IC Microcomputer Systems Co Ltd filed Critical NEC IC Microcomputer Systems Co Ltd
Priority to JP3071360A priority Critical patent/JPH04307763A/en
Publication of JPH04307763A publication Critical patent/JPH04307763A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce the steady-state current flow in a substrate potential detection circuit in a semiconductor integrated circuit making the substrate potential detection circuit. CONSTITUTION:The control signals 101 in a control signal transmitting circuit 1 are inputted to the respective gates of a PMOS transistor 3, another PMOS transistor 7 and an NMOS transistor 9 while the control signal 102 are inputted to the respective gates of an NMOS transistor 6 and a PMOS transistor 10. In the PMOS transistor 3, the conduction/cut-off modes are periodically repeated by the control signals 101 so that the substrate potential may be detected to be outputted in the conduction period but not to be detected in the cut-off period. In the conduction period of the PMOS transistor 3, the substrate potential detected output is inputted in an inverter 8 to be inverted and outputted from a terminal 28. Furthermore, in the cut-off period, the output from the substrate potential detection part is latched up.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は半導体集積回路に関し、
特に、基板電位検出回路を形成する半導体集積回路に関
する。
[Industrial Application Field] The present invention relates to semiconductor integrated circuits.
In particular, the present invention relates to a semiconductor integrated circuit forming a substrate potential detection circuit.

【0002】0002

【従来の技術】従来の、この種の半導体集積回路におい
ては、図2に一例が示されるように、電源(電圧Vcc
)と基板電位Vb 間に、基板電位検出部として、PM
OSトランジスタ12とNMOSトランジスタ13およ
び14が直列に接続されており、PMOSトランジスタ
12のゲートは接地電位に設定され、NMOSトランジ
スタ13および14は、電源から基板電位Vb に対応
して順方向となるようにダイオード接続されている。こ
の基板電位検出部の節点Aにおける検出出力は、インバ
ータ15に入力されて反転され、端子29より出力され
る。この基盤電位検出部においては、常時電源から基盤
電位Vb に電流が流れており、変動する基板電位に対
応する節点Aの電位により、基板電位Vb の変動が検
知される。
2. Description of the Related Art In a conventional semiconductor integrated circuit of this type, as shown in FIG.
) and the substrate potential Vb, as a substrate potential detection section, a PM
The OS transistor 12 and the NMOS transistors 13 and 14 are connected in series, the gate of the PMOS transistor 12 is set to the ground potential, and the NMOS transistors 13 and 14 are connected in a forward direction from the power supply in accordance with the substrate potential Vb. diode connected to. The detection output at node A of this substrate potential detection section is input to the inverter 15, inverted, and output from the terminal 29. In this base potential detection section, a current is constantly flowing from the power supply to the base potential Vb, and fluctuations in the base potential Vb are detected based on the potential at node A corresponding to the fluctuating base potential.

【0003】節点Aにおける検知出力は、インバータ1
5により反転され、所定の基板電位発生回路(図示され
ない)に入力されるが、基板電位Vb が所望の電位よ
りも上昇した場合には、この基板電位発生回路は動作す
るように制御され、また基板電位Vb が所定の電位以
下に低下した場合には、当該基板電位発生回路は動作を
停止するように制御される。
[0003] The detection output at node A is
5 and is input to a predetermined substrate potential generation circuit (not shown), but if the substrate potential Vb rises above a desired potential, this substrate potential generation circuit is controlled to operate, and When the substrate potential Vb drops below a predetermined potential, the substrate potential generation circuit is controlled to stop operating.

【0004】0004

【発明が解決しようとする課題】上述した従来の半導体
集積回路においては、動作条件上、基板電位検出部にお
いて、電源より基板電位に対して常時定常電流を流さざ
るを得ないという欠点がある。
The above-mentioned conventional semiconductor integrated circuit has a drawback in that, due to operating conditions, a steady current must always be applied to the substrate potential from the power source in the substrate potential detection section.

【0005】[0005]

【課題を解決するための手段】本発明の半導体集積回路
は、基板電位検出回路を形成する半導体集積回路におい
て、周期的な制御信号ならびに当該制御信号を反転させ
た反転制御信号を生成して出力する制御信号発生手段と
、前記制御信号により制御されて、基板電位検出期間に
おいては所望の基板電位を検出して出力するとともに、
基板電位検出期間外においては前記基板電位の検出を停
止する基板電位検出手段と、前記制御信号および反転制
御信号により制御されて、前記基板電位検出期間におい
ては前記基板電位検出手段から出力される基板電位を入
力して出力するとともに、前記基板電位検出期間外にお
いては前記基板電位検出手段から出力電圧をラッチする
ラッチ手段と、を備えて構成される。
[Means for Solving the Problems] A semiconductor integrated circuit of the present invention generates and outputs a periodic control signal and an inverted control signal obtained by inverting the control signal in a semiconductor integrated circuit forming a substrate potential detection circuit. control signal generating means for detecting and outputting a desired substrate potential during a substrate potential detection period under the control of the control signal;
a substrate potential detection means that stops detecting the substrate potential outside the substrate potential detection period; and a substrate that is controlled by the control signal and the inversion control signal and output from the substrate potential detection means during the substrate potential detection period. A latch means inputs and outputs a potential, and latches the output voltage from the substrate potential detecting means outside the substrate potential detecting period.

【0006】[0006]

【実施例】次に、本発明について図面を参照して説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be explained with reference to the drawings.

【0007】図1は本発明の一実施例を示すブロック図
である。図1に示されるように、本実施例は、制御信号
発生回路1およびインバータ2により形成される制御信
号発生部と、PMOSトランジスタ3、NMOSトラン
ジスタ4および5により形成される基板電位検出部と、
NMOSトランジスタ6およびPMOSトランジスタ7
を含む第1の相補型トランスファゲート、NMOSトラ
ンジスタ9およびPMOSトランジスタ10を含む第2
の相補型トランスファゲート、およびインバータ8およ
び11により形成されるラッチ部とを備えて構成される
FIG. 1 is a block diagram showing one embodiment of the present invention. As shown in FIG. 1, this embodiment includes a control signal generating section formed by a control signal generating circuit 1 and an inverter 2, a substrate potential detecting section formed by a PMOS transistor 3, NMOS transistors 4 and 5,
NMOS transistor 6 and PMOS transistor 7
a first complementary transfer gate comprising an NMOS transistor 9 and a second complementary transfer gate comprising an NMOS transistor 9 and a PMOS transistor 10;
, and a latch section formed by inverters 8 and 11.

【0008】図1において、制御信号発生回路1から出
力される制御信号101は、端子21より出力されて基
板電位検出部の端子23を介してPMOSトランジスタ
3のゲートに入力されるとともに、ラッチ部の第1の相
補型トランスファゲートの端子25を介してPMOSト
ランジスタ7のゲートと、第2の相補型トランスファゲ
ートの端子26を介してNMOSトランジスタ9のゲー
トに入力される。また、制御信号発生回路1より出力さ
れ、インバータ2により反転された制御信号102は、
第1の相補型トランスファゲートの端子24を介してN
MOSトランジスタ6に入力されるとともに、第2の相
補型トランスファゲートの端子27を介してPMOSト
ランジスタのゲートに入力される。
In FIG. 1, a control signal 101 outputted from a control signal generation circuit 1 is outputted from a terminal 21, inputted to the gate of a PMOS transistor 3 via a terminal 23 of a substrate potential detection section, and is also input to a gate of a PMOS transistor 3. The signal is input to the gate of the PMOS transistor 7 via the terminal 25 of the first complementary transfer gate, and to the gate of the NMOS transistor 9 via the terminal 26 of the second complementary transfer gate. Further, the control signal 102 output from the control signal generation circuit 1 and inverted by the inverter 2 is
N via terminal 24 of the first complementary transfer gate
The signal is input to the MOS transistor 6, and is also input to the gate of the PMOS transistor via the terminal 27 of the second complementary transfer gate.

【0009】PMOSトランジスタ3、NMOSトラン
ジスタ4および5より成る基板電位検出部の構成につい
ては従来例の場合と同様であるが、PMOSトランジス
タ3のゲートに制御信号101が入力されている点のみ
が従来例と異なっている。PMOSトランジスタ3にお
いては、端子23を介してゲートに入力される制御信号
101により制御されて、周期的に導通/遮断の状態が
繰返されており、導通時の期間においては基板電位を検
出する機能を有しているものの、遮断時の期間において
は基板電位を検出する機能は失われている。
The structure of the substrate potential detection section consisting of the PMOS transistor 3 and the NMOS transistors 4 and 5 is the same as that of the conventional example, except that the control signal 101 is input to the gate of the PMOS transistor 3. It is different from the example. The PMOS transistor 3 is controlled by a control signal 101 that is input to the gate via the terminal 23, and is periodically turned on/off, and has a function of detecting the substrate potential during the period of conduction. However, the function of detecting the substrate potential is lost during the cut-off period.

【0010】端子23よりゲート入力される制御信号1
01を介して、PMOSトランジスタ3が導通状態にあ
る期間においては、第1の相補型トランスファゲートお
よび第2の相補型トランスファゲートは、制御信号10
1および102を介して、それぞれ導通状態および遮断
状態にあり、従って、基板電位検出部の検出出力である
節点Aの電位は、第1の相補型トランスファゲートにお
けるNMOSトランジスタ6を介して、インバータ8に
入力されて反転され、端子28より出力されて所定の基
板電位発生回路(図示されない)に送られて、当該基板
電位発生回路の動作/停止に対する制御が行われる。こ
の点については、前述の従来例の場合と同様である。
Control signal 1 input to the gate from terminal 23
During the period in which the PMOS transistor 3 is in a conductive state, the first complementary transfer gate and the second complementary transfer gate receive the control signal 10 via the control signal 10.
1 and 102, respectively, and the potential at node A, which is the detection output of the substrate potential detection section, is transferred to the inverter 8 via the NMOS transistor 6 in the first complementary transfer gate. The signal is inputted to the terminal 28, inverted, and outputted from the terminal 28 and sent to a predetermined substrate potential generation circuit (not shown) to control the operation/stop of the substrate potential generation circuit. This point is similar to the case of the conventional example described above.

【0011】次に、端子23よりゲート入力される制御
信号101を介して、PMOSトランジスタ3が遮断状
態にある期間においては、第1の相補型トランスファゲ
ートおよび第2の相補型トランスファゲートは、制御信
号101および102を介して、それぞれ遮断状態およ
び導通状態にあり、この場合においては、基板電位検出
部の検出出力である節点Aの電位はラッチされ、端子2
8より出力されることはない。即ち、基板電位検出機能
が失われている期間においては、電源から基板電位Vb
 に対して電流が流れることは阻止される。
Next, during the period in which the PMOS transistor 3 is in the cut-off state, the first complementary transfer gate and the second complementary transfer gate are controlled via the control signal 101 inputted to the gate from the terminal 23. Via signals 101 and 102, they are in a cutoff state and a conduction state, respectively, and in this case, the potential at node A, which is the detection output of the substrate potential detection section, is latched and the terminal 2
8 will not be output. That is, during the period when the substrate potential detection function is lost, the substrate potential Vb is
Current is prevented from flowing through.

【0012】0012

【発明の効果】以上説明したように、本発明は、制御信
号発生回路を付与して基板電位検出部を形成するPMO
Sトランジスタの導通/遮断を制御することにより、基
板電位検出期間外においては、電源から基板電位検出部
に流入する電流を停止させ、基板電位検出部における定
常電流を低減することができるという効果がある。
Effects of the Invention As explained above, the present invention provides a control signal generation circuit to a PMO which forms a substrate potential detection section.
By controlling conduction/cutoff of the S transistor, the current flowing from the power supply to the substrate potential detection section can be stopped outside the substrate potential detection period, and the steady current in the substrate potential detection section can be reduced. be.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の一実施例を示す回路図である。FIG. 1 is a circuit diagram showing one embodiment of the present invention.

【図2】従来例を示す回路図である。FIG. 2 is a circuit diagram showing a conventional example.

【符号の説明】[Explanation of symbols]

1    制御信号発生回路 1 Control signal generation circuit

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  基板電位検出回路を形成する半導体集
積回路において、周期的な制御信号ならびに当該制御信
号を反転させた反転制御信号を生成して出力する制御信
号発生手段と、前記制御信号により制御されて、基板電
位検出期間においては所望の基板電位を検出して出力す
るとともに、基板電位検出期間外においては前記基板電
位の検出を停止する基板電位検出手段と、前記制御信号
および反転制御信号により制御されて、前記基板電位検
出期間においては前記基板電位検出手段から出力される
基板電位を入力して出力するとともに、前記基板電位検
出期間外においては前記基板電位検出手段から出力電圧
をラッチするラッチ手段と、を備えることを特徴とする
半導体集積回路。
1. A semiconductor integrated circuit forming a substrate potential detection circuit, comprising: a control signal generating means for generating and outputting a periodic control signal and an inverted control signal obtained by inverting the control signal; a substrate potential detection means for detecting and outputting a desired substrate potential during the substrate potential detection period and stopping detection of the substrate potential outside the substrate potential detection period; a latch that is controlled to input and output the substrate potential output from the substrate potential detection means during the substrate potential detection period, and to latch the output voltage from the substrate potential detection means outside the substrate potential detection period; A semiconductor integrated circuit comprising means.
JP3071360A 1991-04-04 1991-04-04 Semiconductor integrated circuit Pending JPH04307763A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3071360A JPH04307763A (en) 1991-04-04 1991-04-04 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3071360A JPH04307763A (en) 1991-04-04 1991-04-04 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH04307763A true JPH04307763A (en) 1992-10-29

Family

ID=13458253

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3071360A Pending JPH04307763A (en) 1991-04-04 1991-04-04 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH04307763A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08315574A (en) * 1995-04-26 1996-11-29 Samsung Electron Co Ltd Generation circuit of substrate voltage
EP0803909A1 (en) * 1996-04-25 1997-10-29 Nec Corporation Semiconductor integrated circuit device having an interrupting circuit connected between a substrate potential detecting circuit and a common conductive line for reducing damage due to static electric charges

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02137254A (en) * 1988-11-17 1990-05-25 Nec Ic Microcomput Syst Ltd Substrate potential detecting circuit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02137254A (en) * 1988-11-17 1990-05-25 Nec Ic Microcomput Syst Ltd Substrate potential detecting circuit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08315574A (en) * 1995-04-26 1996-11-29 Samsung Electron Co Ltd Generation circuit of substrate voltage
EP0803909A1 (en) * 1996-04-25 1997-10-29 Nec Corporation Semiconductor integrated circuit device having an interrupting circuit connected between a substrate potential detecting circuit and a common conductive line for reducing damage due to static electric charges

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Effective date: 19970722