JPH04273148A - Gate array type semiconductor integrated circuit and drive method thereof - Google Patents

Gate array type semiconductor integrated circuit and drive method thereof

Info

Publication number
JPH04273148A
JPH04273148A JP3103698A JP10369891A JPH04273148A JP H04273148 A JPH04273148 A JP H04273148A JP 3103698 A JP3103698 A JP 3103698A JP 10369891 A JP10369891 A JP 10369891A JP H04273148 A JPH04273148 A JP H04273148A
Authority
JP
Japan
Prior art keywords
type semiconductor
gate array
semiconductor integrated
array type
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3103698A
Other languages
Japanese (ja)
Inventor
Takeshi Kobayashi
剛 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3103698A priority Critical patent/JPH04273148A/en
Publication of JPH04273148A publication Critical patent/JPH04273148A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Wire Bonding (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To inhibit the generation of noise induced by level fluctuations in a power source line. CONSTITUTION:An unused bonding pad 4u is connected to a power supply line (GND line 6) by way of transistors 2A1 to 2An in an outer cell. Bias voltage VB1, which turns on or off a transistor connected between an unused bonding pad and the power supply line, responding to level fluctuations in a power supply line is applied.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、ゲートアレー型半導体
集積回路に利用され、特に、LSIテスタ検査において
その出力バッファの同時動作によるチップ内のVDD、
GND等の電源線におけるノイズ発生を低減したゲート
アレー型半導体集積回路に関する。
[Industrial Application Field] The present invention is applied to gate array type semiconductor integrated circuits, and in particular, in LSI tester inspection, VDD within a chip is reduced by simultaneous operation of its output buffers.
The present invention relates to a gate array type semiconductor integrated circuit that reduces noise generation in power supply lines such as GND.

【0002】0002

【従来の技術】一般にゲートアレー型半導体集積回路は
、図3に示すように、チップ1に外部セル2、内部セル
3および複数個のボンディングパッド4を配置し、かつ
VDD線5とGND線6の各電源線を周囲に配置した構
成となっている。ここでVDD線5にはボンディングパ
ッド4V を接続し、GND線6にはボンディングパッ
ド4g を接続している。また、ボンディングパッド4
s は信号用として外部セル2に接続し、ボンディング
パッド4u は未使用となっている。
2. Description of the Related Art In general, a gate array type semiconductor integrated circuit has an external cell 2, an internal cell 3, and a plurality of bonding pads 4 disposed on a chip 1, and a VDD line 5 and a GND line 6, as shown in FIG. The configuration is such that each power supply line is placed around the periphery. Here, a bonding pad 4V is connected to the VDD line 5, and a bonding pad 4g is connected to the GND line 6. Also, bonding pad 4
s is connected to the external cell 2 for signal use, and the bonding pad 4u is unused.

【0003】0003

【発明が解決しようとする課題】前述した従来のゲート
アレー型半導体集積回路は、配線形成後および組立完了
後にLSIテスタによる検査を行うが、このLSIテス
タの構造上の理由からかなりの負荷容量が生じ、ゲート
アレー型半導体集積回路ではこの負荷によって電源線に
ノイズが発生しやすくなる。この対策としては出力バッ
ファの同時動作数を制限したり、出力バッファを電源線
の近くに配置する構造をとることが有効であるが、ゲー
トアレー型半導体集積回路を設計する上での大きな制約
になる課題がある。
[Problems to be Solved by the Invention] The conventional gate array type semiconductor integrated circuit described above is tested using an LSI tester after wiring is formed and after assembly is completed, but due to the structure of this LSI tester, a considerable load capacity is required. In gate array type semiconductor integrated circuits, noise is likely to occur on the power supply line due to this load. As a countermeasure to this problem, it is effective to limit the number of output buffers that operate simultaneously or to adopt a structure in which the output buffer is placed near the power supply line, but this poses a major constraint when designing gate array type semiconductor integrated circuits. There is a problem.

【0004】本発明の目的は、前記の課題を解消するこ
とにより、電源線におけるノイズの発生を抑制したゲー
トアレー型半導体集積回路を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a gate array type semiconductor integrated circuit which suppresses noise generation in a power supply line by solving the above-mentioned problems.

【0005】[0005]

【課題を解決するための手段】本発明のゲートアレー型
半導体集積回路は、チップの周辺に配置された複数のボ
ンディングパッドおよび外部セルと、電源線とを含むゲ
ートアレー型半導体集積回路において、前記ボンディン
グパッドは、前記外部セル内のトランジスタを介して前
記電源線に接続された未使用のボンディングパッドを含
むことを特徴とする。
Means for Solving the Problems The gate array type semiconductor integrated circuit of the present invention includes a plurality of bonding pads and external cells arranged around a chip, and a power supply line. The bonding pad is characterized in that it includes an unused bonding pad connected to the power supply line via a transistor in the external cell.

【0006】また、本発明のゲートアレー型半導体集積
回路の駆動方法は、請求項1に記載のゲートアレー型半
導体装置において、前記未使用のボンディングパッドと
前記電源線との間に、前記電源線のレベル変動に応じて
接続されたトランジスタを導通させるバイアス電圧を印
加することを特徴とする。
Further, the method for driving a gate array type semiconductor integrated circuit of the present invention provides a method for driving a gate array type semiconductor integrated circuit according to claim 1, wherein in the gate array type semiconductor device according to claim 1, the power line is connected between the unused bonding pad and the power line. A bias voltage is applied to make the connected transistors conductive in response to level fluctuations.

【0007】[0007]

【作用】外部セル内のトランジスタを介して電源線に接
続された未使用のボンディングパッドと、電源線との間
には、バイアス電圧が印加されており、電源線のレベル
が変動すると、接続されたトランジスタが導通して電源
線のレベル変動を防止する。
[Operation] A bias voltage is applied between the unused bonding pad connected to the power line via a transistor in the external cell and the power line, and if the level of the power line changes, the connection will be interrupted. The connected transistor becomes conductive to prevent level fluctuations in the power supply line.

【0008】従って、電源線レベル変動に基づくノイズ
の発生を抑止することが可能となる。
[0008] Therefore, it is possible to suppress the generation of noise due to power line level fluctuations.

【0009】[0009]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。
Embodiments Hereinafter, embodiments of the present invention will be described with reference to the drawings.

【0010】図1は本発明の第一実施例の要部を示す回
路図である。本第一実施例は、図3に示したゲートアレ
ー型半導体集積回路のチップに適用した例であり、複数
個のボンディングパッドの内、未使用のボンディングパ
ッド4u を利用している。すなわち、本発明の特徴と
するところの、GND線6におけるノイズ低減策として
、図1に示すように未使用のボンディングパッド4uを
外部セル2内のNチャネルMOSトランジスタ2A1 
、2A2 、…、2An を介してGND線6に接続し
ている。 ここで、NチャネルMOSトランジスタ2A1 、2A
2 、…、2An は、ソースおよびドレインをそれぞ
れ未使用のボンディングパッド4u およびGND線6
に接続し、ゲートはGND線6に接続している。さらに
、未使用のボンディングパッド4u には−0.6 V
程度のバイアス電圧VB1を印加する。
FIG. 1 is a circuit diagram showing the main parts of a first embodiment of the present invention. The first embodiment is an example applied to the gate array type semiconductor integrated circuit chip shown in FIG. 3, and uses an unused bonding pad 4u among a plurality of bonding pads. That is, as a noise reduction measure in the GND line 6, which is a feature of the present invention, as shown in FIG.
, 2A2, . . . , 2An are connected to the GND line 6. Here, N channel MOS transistors 2A1, 2A
2,..., 2An connect the source and drain to the unused bonding pad 4u and the GND line 6, respectively.
The gate is connected to the GND line 6. Furthermore, -0.6 V is applied to unused bonding pad 4u.
Apply a bias voltage VB1 of approximately

【0011】この回路構成とすることにより、出力バッ
ファの「H」レベルから「L」レベルの同時動作により
GNDレベルが約 0.1V以上上昇すると、Nチャネ
ルMOSトランジスタ2A1 、2A2 、…、2An
 が導通してGNDレベルを下げる方向に動作し、ノイ
ズの発生を抑制する。
With this circuit configuration, when the GND level rises by about 0.1V or more due to the simultaneous operation of the output buffer from the "H" level to the "L" level, the N-channel MOS transistors 2A1, 2A2, . . . , 2An
conducts and operates to lower the GND level, suppressing noise generation.

【0012】図2は本発明の第二実施例の要部を示す回
路図で、VDD線5におけるノイズ低減策を施した例を
示す。すなわち、本発明の特徴とするところの、VDD
線5と未使用ボンディングパッド4u とを外部セル2
内のPチャネルMOSトランジスタ2B1 、2B2 
、…、2Bn を介して接続している。ここではPチャ
ネルMOSトランジスタ2B1 、2B2 、…、2B
n は、ソースおよびドレインをそれぞれ未使用のボン
ディングパッド4u およびVDDライン5に接続し、
ゲートは未使用のボンディングパッド4u に接続して
いる。また未使用のボンディングパッド4u とVDD
線5間には+0.6 V程度のバイアス電圧VB2を印
加する。この回路構成では、出力バッファの「L」レベ
ルから「H」レベルへの同時動作により、VDDレベル
が約 0.1V以上下がるとPチャネルMOSトランジ
スタ2B1、2B2 、…、2Bn が導通してVDD
レベルを上げる方向に動作し、ノイズの発生を抑制する
FIG. 2 is a circuit diagram showing the main part of a second embodiment of the present invention, and shows an example in which measures are taken to reduce noise in the VDD line 5. That is, the VDD, which is a feature of the present invention,
Connect wire 5 and unused bonding pad 4u to external cell 2.
P-channel MOS transistors 2B1 and 2B2 in
,..., are connected via 2Bn. Here, P channel MOS transistors 2B1, 2B2,..., 2B
n connects the source and drain to unused bonding pad 4u and VDD line 5, respectively;
The gate is connected to an unused bonding pad 4u. Also unused bonding pad 4u and VDD
A bias voltage VB2 of about +0.6 V is applied between the lines 5. In this circuit configuration, when the VDD level drops by about 0.1V or more due to simultaneous operation of the output buffer from "L" level to "H" level, P channel MOS transistors 2B1, 2B2, ..., 2Bn become conductive and VDD
It operates in the direction of raising the level and suppresses noise generation.

【0013】[0013]

【発明の効果】以上説明したように、本発明は、VDD
およびGNDの電源線のレベルが変動したときに、未使
用ボンディングパッドとの間に接続したトランジスタが
導通してそのレベル変動を抑え、電源線におけるノイズ
の発生を抑制する効果がある。これにより、出力バッフ
ァの同時動作数や出力バッファの配置の制限をとる必要
はなく、ゲートアレー型半導体集積回路の設計の自由度
を向上でき、その効果は大である。
[Effects of the Invention] As explained above, the present invention provides VDD
When the level of the GND power supply line fluctuates, the transistor connected between the unused bonding pad becomes conductive, suppressing the level fluctuation, and suppressing the generation of noise in the power supply line. As a result, there is no need to limit the number of output buffers that operate simultaneously or the arrangement of output buffers, and the degree of freedom in designing a gate array type semiconductor integrated circuit can be improved, which is highly effective.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】  本発明の第一実施例の要部を示す回路図。FIG. 1 is a circuit diagram showing the main parts of a first embodiment of the present invention.

【図2】  本発明の第二実施例の要部を示す回路図。FIG. 2 is a circuit diagram showing the main parts of a second embodiment of the present invention.

【図3】  本発明の対象となるチップの平面レイアウ
ト図。
FIG. 3 is a plan layout diagram of a chip to which the present invention is applied.

【符号の説明】[Explanation of symbols]

1    チップ 2    外部セル 2A1 、2A2 、…、2An     Nチャネル
MOSトランジスタ 2B1 、2B2 、…、2Bn     Pチャネル
MOSトランジスタ 3    内部セル 4g 、4s 、4u 、4v     ボンディング
パッド5    VDD線 6    GND線 VB1、VB2    バイアス電圧
1 Chip 2 External cells 2A1, 2A2,..., 2An N-channel MOS transistors 2B1, 2B2,..., 2Bn P-channel MOS transistors 3 Internal cells 4g, 4s, 4u, 4v Bonding pad 5 VDD line 6 GND line VB1, VB2 Bias voltage

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  チップの周辺に配置された複数のボン
ディングパッドおよび外部セルと、電源線とを含むゲー
トアレー型半導体集積回路において、前記ボンディング
パッドは、前記外部セル内のトランジスタを介して前記
電源線に接続された未使用のボンディングパッドを含む
ことを特徴とするゲートアレー型半導体集積回路。
1. In a gate array type semiconductor integrated circuit including a plurality of bonding pads and external cells arranged around a chip, and a power supply line, the bonding pad connects the power supply through a transistor in the external cell. A gate array type semiconductor integrated circuit characterized in that it includes an unused bonding pad connected to a line.
【請求項2】  請求項1に記載のゲートアレー型半導
体集積回路において、前記未使用のボンディングパッド
と前記電源線との間に、前記電源線のレベル変動に応じ
て接続されたトランジスタを導通させるバイアス電圧を
印加することを特徴とするゲートアレー型半導体集積回
路の駆動方法。
2. The gate array type semiconductor integrated circuit according to claim 1, wherein a transistor connected between the unused bonding pad and the power supply line is made conductive according to a level fluctuation of the power supply line. A method for driving a gate array type semiconductor integrated circuit, the method comprising applying a bias voltage.
JP3103698A 1991-02-27 1991-02-27 Gate array type semiconductor integrated circuit and drive method thereof Pending JPH04273148A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3103698A JPH04273148A (en) 1991-02-27 1991-02-27 Gate array type semiconductor integrated circuit and drive method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3103698A JPH04273148A (en) 1991-02-27 1991-02-27 Gate array type semiconductor integrated circuit and drive method thereof

Publications (1)

Publication Number Publication Date
JPH04273148A true JPH04273148A (en) 1992-09-29

Family

ID=14360988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3103698A Pending JPH04273148A (en) 1991-02-27 1991-02-27 Gate array type semiconductor integrated circuit and drive method thereof

Country Status (1)

Country Link
JP (1) JPH04273148A (en)

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