JPH04261537A - Mask - Google Patents

Mask

Info

Publication number
JPH04261537A
JPH04261537A JP429991A JP429991A JPH04261537A JP H04261537 A JPH04261537 A JP H04261537A JP 429991 A JP429991 A JP 429991A JP 429991 A JP429991 A JP 429991A JP H04261537 A JPH04261537 A JP H04261537A
Authority
JP
Japan
Prior art keywords
mask
filter
allows
time
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP429991A
Other languages
Japanese (ja)
Inventor
Isao Murase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP429991A priority Critical patent/JPH04261537A/en
Publication of JPH04261537A publication Critical patent/JPH04261537A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain the mask which allows the use of the alignment marks of a semiconductor substrate to be used at the time of pattern transfer in plural stages of the process for producing a semiconductor device.
CONSTITUTION: A filter 14 is so provided as to cover the substrate side alignment mark image transmission region 5 of the mask. This filter 14 allows the transmission of the alignment light at the time of transferring the patterns by using the mask. and shuts off the light of the sensitivity region of a photosensitive resin film.
COPYRIGHT: (C)1992,JPO&Japio
JP429991A 1991-01-18 1991-01-18 Mask Pending JPH04261537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP429991A JPH04261537A (en) 1991-01-18 1991-01-18 Mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP429991A JPH04261537A (en) 1991-01-18 1991-01-18 Mask

Publications (1)

Publication Number Publication Date
JPH04261537A true JPH04261537A (en) 1992-09-17

Family

ID=11580637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP429991A Pending JPH04261537A (en) 1991-01-18 1991-01-18 Mask

Country Status (1)

Country Link
JP (1) JPH04261537A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116847A (en) * 2003-10-09 2005-04-28 Dainippon Printing Co Ltd Photomask and method for manufacturing mask for exposure of charged corpuscular beam by using photomask
WO2005043242A1 (en) * 2003-10-30 2005-05-12 Hoya Corporation Photomask and video device manufacturing method
US20190179229A1 (en) * 2017-12-11 2019-06-13 Boe Technology Group Co., Ltd. Mask, device and method for exposure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005116847A (en) * 2003-10-09 2005-04-28 Dainippon Printing Co Ltd Photomask and method for manufacturing mask for exposure of charged corpuscular beam by using photomask
WO2005043242A1 (en) * 2003-10-30 2005-05-12 Hoya Corporation Photomask and video device manufacturing method
US20190179229A1 (en) * 2017-12-11 2019-06-13 Boe Technology Group Co., Ltd. Mask, device and method for exposure
US11086228B2 (en) * 2017-12-11 2021-08-10 Boe Technology Group Co., Ltd. Mask, device and method for exposure

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