JPH04237937A - Hollow cathode electron gun - Google Patents
Hollow cathode electron gunInfo
- Publication number
- JPH04237937A JPH04237937A JP3005563A JP556391A JPH04237937A JP H04237937 A JPH04237937 A JP H04237937A JP 3005563 A JP3005563 A JP 3005563A JP 556391 A JP556391 A JP 556391A JP H04237937 A JPH04237937 A JP H04237937A
- Authority
- JP
- Japan
- Prior art keywords
- electron gun
- hollow cathode
- film
- argon ions
- generated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010894 electron beam technology Methods 0.000 claims description 9
- 238000000605 extraction Methods 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 238000010891 electric arc Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 26
- 229910052786 argon Inorganic materials 0.000 abstract description 21
- -1 argon ions Chemical class 0.000 abstract description 16
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- 238000007733 ion plating Methods 0.000 abstract description 5
- 230000005684 electric field Effects 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 13
- 239000012212 insulator Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Solid Thermionic Cathode (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、治工具、機械部品、装
飾品への被覆に利用されるイオンプレーティング装置に
用いられるホロカソード電子銃に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hollow cathode electron gun used in an ion plating apparatus used for coating jigs, machine parts, and decorative items.
【０００２】0002
【従来の技術】従来のホロカソード電子銃は、例えば特
願平０１−２９３０３９号に記載されているように、イ
オンプレーティングを行う際、物質を蒸発かつイオン化
させるために低電圧、大電流の電子ビームを照射するよ
うにしている。BACKGROUND OF THE INVENTION Conventional hollow cathode electron guns use low-voltage, high-current electrons to evaporate and ionize substances when performing ion plating, as described in Japanese Patent Application No. 01-293039. I'm trying to emit a beam.
【０００３】0003
【発明が解決しようとする課題】ホロカソード電子銃を
用いて被膜を作成する場合、セラミック製または水冷構
造の銅製るつぼに設置したチタンなどの金属に、大量の
電子ビームを照射して前記金属を溶融蒸発させて行う。[Problem to be Solved by the Invention] When creating a film using a hollow cathode electron gun, a large amount of electron beam is irradiated onto a metal such as titanium placed in a ceramic or water-cooled copper crucible to melt the metal. It is done by evaporation.
【０００４】この際、前記ホロカソード電子銃内に供給
されたアルゴンガスをイオン化させることにより電子を
発生させるため、大電流のビームを得るためには大量の
アルゴンイオンを生成させる必要がある。At this time, since electrons are generated by ionizing the argon gas supplied to the hollow cathode electron gun, it is necessary to generate a large amount of argon ions in order to obtain a large current beam.
【０００５】ところが、前記アルゴンイオンを大量に生
成すると、該アルゴンイオンは電子銃から真空容器内へ
入り込み、バイアス電位によって蒸着される粒子と共に
基板に衝突して生成される膜上に損傷を与えてしまうと
いう問題を生じる。However, when a large amount of argon ions are generated, the argon ions enter the vacuum chamber from the electron gun and collide with the substrate together with the particles deposited by the bias potential, causing damage to the formed film. This causes the problem of storage.
【０００６】前記問題点の解決方法としてバイアス電圧
を下げる方法があるが、該方法では蒸着される金属が膜
へ付着する強度を低下させてしまうという問題がある。[0006] As a solution to the above problem, there is a method of lowering the bias voltage, but this method has the problem of reducing the strength with which the deposited metal adheres to the film.
【０００７】そこで、本発明はアルゴンイオンによる生
成膜の損傷を防止して、密着性に富んだ高品質の膜の生
成を可能にするホロカソード電子銃を得ることを目的と
している。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a hollow cathode electron gun that prevents damage to the produced film due to argon ions and makes it possible to produce a high-quality film with excellent adhesion.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
、本発明はホロカソード電子銃の中空陰極と被照射体の
間に電子ビームを通過させる孔を有する引き出し電極を
設け、該電極に正電位を印加することにより、アルゴン
イオンによる生成膜の損傷を防止するようにしたもので
ある。[Means for Solving the Problems] In order to achieve the above object, the present invention provides an extraction electrode having a hole through which an electron beam passes between the hollow cathode of a hollow cathode electron gun and an irradiated object, and the electrode has a positive potential. By applying this, damage to the produced film due to argon ions is prevented.
【０００９】[0009]
【作用】上記のように構成されたホロカソード電子銃の
引き出し電極は、該電子銃内で発生するアルゴンイオン
を銃内に閉じ込め、真空容器内への流出を極力抑えるの
で、成膜時に発生していたアルゴンイオンによる膜の損
傷を防止するような作用をする。[Function] The extraction electrode of the hollow cathode electron gun configured as described above confines the argon ions generated within the electron gun and prevents them from flowing into the vacuum chamber as much as possible, so that no argon ions are generated during film formation. This acts to prevent damage to the membrane caused by argon ions.
【００１０】0010
【実施例】以下、本発明を具体的実施例により詳述する
。EXAMPLES The present invention will be explained in detail below using specific examples.
【００１１】図１のイオンプレーティング装置は、真空
容器１に設置された引き出し電極を持つホロカソード電
子銃２、蒸着される金属１２を載せるルツボ３、直流電
源４を用いて該ルツボ３に対し負のバイアス電圧が印加
される試料ホルダ５、成膜モニタ６、前記ルツボ３と試
料ホルダ５の間に回動可能に設けられたシャッタ７、反
応性ガス導入口８が設けられている。The ion plating apparatus shown in FIG. 1 uses a hollow cathode electron gun 2 with an extraction electrode installed in a vacuum container 1, a crucible 3 on which a metal 12 to be deposited is placed, and a DC power source 4 to provide a negative voltage to the crucible 3. A sample holder 5 to which a bias voltage of is applied, a film formation monitor 6, a shutter 7 rotatably provided between the crucible 3 and the sample holder 5, and a reactive gas inlet 8 are provided.
【００１２】図２は、本発明のホロカソード電子銃の実
施例を示している。FIG. 2 shows an embodiment of the hollow cathode electron gun of the present invention.
【００１３】本実施例で薄膜を作成するには、酸素など
の不純物の膜中への混入を防ぐため、まず、真空容器１
内を２／１０４ Ｐａまで排気し、続いて、アルゴンガ
スをアルゴンガス導入口９から電子銃２内に導入する。
次に、スイッチ１０を閉じ、直流電源１１により、蒸着
金属１２が設置されたルツボ３とカソード１３間に４０
Ｖ程度の電圧をかけ、同時に、スイッチ１４を閉じ、交
流電源１５でタングステンフィラメント１６に交流電流
を流して熱電子を生成させる。生成した熱電子は、カソ
ード１３とルツボ３間にかけられた電圧によって電子銃
２内、または、真空容器１内に引き出され、アルゴンガ
スと衝突し、電子とアルゴンイオンの安定したプラズマ
状態、すなわち、グロー放電を発生させる。このとき、
スイッチ１７を閉じ、単孔の引出し電極１８に電源１９
で適当な電圧をかけると、電極１８、カソード１３間に
発生した電場勾配によって、アルゴンイオンの銃外への
漏れが減少し、真空容器１内を高真空に保つことができ
、アルゴンイオンによる生成膜の損傷を防ぐことができ
る。更に、アルゴンイオンは、電場勾配によって銃内に
閉じ込められるので、銃内のプラズマ密度を容易に上げ
ることができ、グロー放電からアーク放電への移行が容
易になる。なお、アーク放電への移行と同時にスイッチ
１４は開けられる。発生した電子ビーム２０は上記した
電極１８、カソード１３間の電場の勾配によって容易に
真空容器内に引き出すことができ、高真空の真空容器内
で、不純物の少ない高品質の成膜が可能となる。In order to form a thin film in this example, in order to prevent impurities such as oxygen from entering the film, first the vacuum vessel 1 is
The inside of the electron gun 2 is evacuated to 2/104 Pa, and then argon gas is introduced into the electron gun 2 from the argon gas inlet 9. Next, the switch 10 is closed, and a
A voltage of approximately V is applied, and at the same time, the switch 14 is closed, and an alternating current is caused to flow through the tungsten filament 16 using an alternating current power source 15 to generate thermoelectrons. The generated thermoelectrons are drawn into the electron gun 2 or the vacuum vessel 1 by the voltage applied between the cathode 13 and the crucible 3, collide with argon gas, and create a stable plasma state of electrons and argon ions, that is, Generates a glow discharge. At this time,
Close the switch 17 and connect the power source 19 to the single-hole extraction electrode 18.
When an appropriate voltage is applied, the electric field gradient generated between the electrode 18 and the cathode 13 reduces the leakage of argon ions to the outside of the gun, making it possible to maintain a high vacuum inside the vacuum chamber 1, and reducing the amount of argon ions generated. Damage to the membrane can be prevented. Furthermore, since the argon ions are confined within the gun by the electric field gradient, the plasma density within the gun can be easily increased, facilitating the transition from glow discharge to arc discharge. Note that the switch 14 is opened at the same time as the transition to arc discharge occurs. The generated electron beam 20 can be easily drawn into the vacuum container by the gradient of the electric field between the electrode 18 and the cathode 13 described above, making it possible to form a high-quality film with few impurities in the high-vacuum container. .
【００１４】[0014]
【発明の効果】以上詳述したように、本発明によれば、
ホロカソ−ド電子銃に電子ビーム通過孔を有する引出し
電極を取り付けることにより、ホロカソ−ドから真空容
器内へのアルゴンイオンの漏れを防ぐことができ、被膜
損傷のない、付着力の強い膜を形成することができる。
また、アルゴンイオンが銃内に閉じ込められるので、銃
内のプラズマ密度を容易に上げることができ、効率よく
電子ビームを発生させることができる。[Effects of the Invention] As detailed above, according to the present invention,
By attaching an extraction electrode with an electron beam passage hole to the hollow cathode electron gun, it is possible to prevent the leakage of argon ions from the hollow cathode into the vacuum chamber, forming a film with strong adhesion and no damage to the film. can do. Furthermore, since argon ions are confined within the gun, the plasma density within the gun can be easily increased and an electron beam can be generated efficiently.
【図１】 本発明になる電子銃を設置したイオンプレ
ーティング装置の側面断面図である。FIG. 1 is a side sectional view of an ion plating apparatus equipped with an electron gun according to the present invention.
【図２】 本発明になるホロカソード電子銃の一実施
例を示す縦断面図である。FIG. 2 is a longitudinal sectional view showing an embodiment of the hollow cathode electron gun according to the present invention.
１は真空容器、２はホロカソ−ド電子銃、３はルツボ、
４はバイアス用直流電源、５は試料ホルダ、６は成膜モ
ニタ、７はシャッタ、８は反応ガス導入口、９はアルゴ
ンガス導入口、１０、１４、１７はスイッチ、１１、１
９はバリアブル直流電源、１２は蒸着される金属、１３
はカソード、、１５は交流電源、１６はタングステンフ
ィラメント、、１８は引出し電極、、２０は電子ビ−ム
、２１、２３、２５は冷却水入口、２２、２４、２６は
冷却水出口、２７は電極絶縁用碍子、２８は異常放電防
止用碍子、２９はチャンバ・電子銃間絶縁用碍子、３０
はカソード絶縁用碍子、３１は水冷電子銃カバー、３２
は熱遮断用カソードカバー、３３はマイナス側電極、３
４はプラス側電極、３５はフィラメント用電極である。1 is a vacuum container, 2 is a hollow cathode electron gun, 3 is a crucible,
4 is a bias DC power supply, 5 is a sample holder, 6 is a film formation monitor, 7 is a shutter, 8 is a reaction gas inlet, 9 is an argon gas inlet, 10, 14, 17 are switches, 11, 1
9 is a variable DC power supply, 12 is a metal to be deposited, 13
is a cathode, 15 is an AC power supply, 16 is a tungsten filament, 18 is an extraction electrode, 20 is an electron beam, 21, 23, 25 are cooling water inlets, 22, 24, 26 are cooling water outlets, 27 is a Insulator for electrode insulation, 28, insulator for preventing abnormal discharge, 29, insulator for insulation between chamber and electron gun, 30
31 is a water-cooled electron gun cover, 32 is a cathode insulator, and 32 is a water-cooled electron gun cover.
3 is the cathode cover for thermal insulation, 33 is the negative electrode, 3
4 is a positive electrode, and 35 is a filament electrode.
Claims (1)
られ、負電位が印加される円筒状の中空陰極と、該中空
陰極の先端部近傍外周に取付けられたヒータとを有し、
前記中空陰極内に不活性ガスを導入すると共に放電起動
時に前記ヒータに電流を流して加熱しながらグロー放電
、アーク放電を行わせて電子ビームを発生させ、前記電
子ビームを被照射体に照射するホロカソード電子銃であ
って前記中空陰極先端と被照射体との間に電子ビームを
通過させる孔を有する引き出し電極を設け、該引き出し
電極に正電位を印加したことを特徴とするホロカソード
電子銃。1. A cylindrical hollow cathode to which a gas introduction pipe is attached to one open end and a negative potential is applied, and a heater attached to the outer periphery near the tip of the hollow cathode,
An inert gas is introduced into the hollow cathode, and at the time of starting discharge, a current is passed through the heater to heat it and cause glow discharge or arc discharge to generate an electron beam, and the electron beam is irradiated onto the object to be irradiated. 1. A hollow cathode electron gun, characterized in that an extraction electrode having a hole through which an electron beam passes is provided between the hollow cathode tip and an object to be irradiated, and a positive potential is applied to the extraction electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3005563A JPH04237937A (en) | 1991-01-22 | 1991-01-22 | Hollow cathode electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3005563A JPH04237937A (en) | 1991-01-22 | 1991-01-22 | Hollow cathode electron gun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04237937A true JPH04237937A (en) | 1992-08-26 |
Family
ID=11614675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3005563A Withdrawn JPH04237937A (en) | 1991-01-22 | 1991-01-22 | Hollow cathode electron gun |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04237937A (en) |
-
1991
- 1991-01-22 JP JP3005563A patent/JPH04237937A/en not_active Withdrawn
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |