JPH0418669U - - Google Patents
Info
- Publication number
- JPH0418669U JPH0418669U JP5769790U JP5769790U JPH0418669U JP H0418669 U JPH0418669 U JP H0418669U JP 5769790 U JP5769790 U JP 5769790U JP 5769790 U JP5769790 U JP 5769790U JP H0418669 U JPH0418669 U JP H0418669U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- particle sensor
- heating chamber
- sensor section
- particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 1
- 239000000376 reactant Substances 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5769790U JPH0418669U (enrdf_load_stackoverflow) | 1990-05-30 | 1990-05-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5769790U JPH0418669U (enrdf_load_stackoverflow) | 1990-05-30 | 1990-05-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0418669U true JPH0418669U (enrdf_load_stackoverflow) | 1992-02-17 |
Family
ID=31582644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5769790U Pending JPH0418669U (enrdf_load_stackoverflow) | 1990-05-30 | 1990-05-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0418669U (enrdf_load_stackoverflow) |
-
1990
- 1990-05-30 JP JP5769790U patent/JPH0418669U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0418669U (enrdf_load_stackoverflow) | ||
| JP2625108B2 (ja) | プラズマ増強化学蒸着のためのプラズマ装置 | |
| JP2697250B2 (ja) | 熱cvd装置 | |
| JPH0560256B2 (enrdf_load_stackoverflow) | ||
| JPH0533524U (ja) | 枚葉式cvd装置用ヒータ | |
| JPS61127877A (ja) | ドライエツチング装置 | |
| JPS61159572A (ja) | 連続スパツタ装置 | |
| JPH0532902B2 (enrdf_load_stackoverflow) | ||
| JPS61289623A (ja) | 気相反応装置 | |
| JPH08162422A (ja) | 熱処理装置 | |
| JPH0248422Y2 (enrdf_load_stackoverflow) | ||
| JPH0532991Y2 (enrdf_load_stackoverflow) | ||
| JP3415272B2 (ja) | 処理装置 | |
| JPH0746562B2 (ja) | 表示管の製造装置 | |
| JPH0526734Y2 (enrdf_load_stackoverflow) | ||
| JPH01232725A (ja) | ドライエッチング装置 | |
| JPS61188352U (enrdf_load_stackoverflow) | ||
| JPH0397222A (ja) | 枚葉式cvd装置 | |
| JPS6346837U (enrdf_load_stackoverflow) | ||
| JPS61104080A (ja) | プラズマcvd装置の電極構造 | |
| JPS6158532A (ja) | ベ−キング装置 | |
| KR19980059776A (ko) | 반도체의 금속 박막 증착 장치 | |
| JPH01107542A (ja) | プラズマ処理装置 | |
| JPH0525953B2 (enrdf_load_stackoverflow) | ||
| JPS63124424A (ja) | 試料の加熱方法 |